Abstract: A reflecting type of zoom optical system comprises a plurality of optical elements each of which includes a transparent body and two refracting surfaces and a plurality of reflecting surfaces formed on the transparent body and is arranged so that a light beam enters the transparent body from one of the two refracting surfaces, repeatedly undergoes reflection by the plurality of reflecting surfaces, and exits from the other of the two refracting surfaces, and/or a plurality of optical elements on each of which a plurality of reflecting surfaces made from surface reflecting mirrors are integrally formed, and each of which is arranged so that an entering light beam repeatedly undergoes reflection by the plurality of reflecting surfaces and exits from the optical element.

Abstract: An optical element formed from a transparent optical material includes two refraction surfaces, a first reflection surface group having a plurality of internal reflection surfaces arrayed in a predetermined direction, a second reflection surface group opposing the first reflection surface group and having at least one internal reflection surface and two side surfaces opposing each other in parallel to the predetermined direction. Light incident from one of the refraction surfaces is alternately reflected by the internal reflection surfaces of the first reflection surface group and the internal reflection surface of the second reflection surface group and guided to the other refraction surface.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: A system for multiple mode imaging is disclosed herein. The system is a catadioptric system preferably having an NA greater than 0.9, highly corrected for low and high order monochromatic aberrations. This system uses unique illumination entrances and can collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. The catadioptric group includes a focusing mirror and a refractive lens/mirror element. The focusing optics group is proximate to an intermediate image, and corrects for aberrations from the catadioptric group, especially high order spherical aberration and coma. The tube lens group forms the magnified image. Different tube lens groups can be used to obtain different magnifications, such as a varifocal tube lens group to continuously change magnifications from 20 to 200×. Multiple imaging modes are possible by varying the illumination geometry and apertures at the pupil plane.

Abstract: An imaging optical system includes a polarization beam splitter, a quarter waveplate, a reflection mirror and polarization state changing unit. The beam from an object plane is projected by way of the polarization beam splitter and the quarter waveplate to reflection mirror. The projected beam is reflected by the reflection mirror and is projected through the quarter waveplate and by way of the polarization beam splitter to an image plane, and the polarization state changing unit is disposed between the polarization beam splitter and the image plane to change the state of polarization of the beam projected by way of the polarization beam splitter. The polarization state changing unit includes a half waveplate effective to transform the beam projected by way of the polarization beam splitter into a rectilinearly polarized beam, being polarized in a desired direction.

Abstract: An aspheric reduction objective has a catadioptric partial objective (L1), an intermediate image (IMI) and a refractive partial objective (L2). The catadioptric partial objective has an assembly centered to the optical axis and this assembly includes two mutually facing concave mirrors (M1, M2). The cutouts in the mirrors (B1, B2) lead to an aperture obscuration which can be held to be very small by utilizing lenses close to the mirrors and having a high negative refractive power and aspheric lens surfaces (27, 33). The position of the entry and exit pupils can be corrected with aspherical lens surfaces (12, 48, 53) in the field lens groups. The number of spherical lenses in the refractive partial objective can be reduced with aspherical lens surfaces (66, 78) arranged symmetrically to the diaphragm plane. Neighboring aspheric lens surfaces (172, 173) form additional correction possibilities.

Abstract: This invention has as its object to prevent deterioration of optical performance by suppressing the respective reflection surfaces from being decentered relative to each other in an optical element formed by placing a plurality of reflection surfaces having curvatures at neighboring positions. In order to achieve this object, an optical element according to this invention has a first reflection surface block formed by placing a plurality of reflection surfaces having curvatures at neighboring positions, and a second reflection surface block which faces the first reflection surface block, and is formed by placing one or more reflection surfaces at neighboring positions, and the first and second reflection surface blocks are formed by a metal mold.

Abstract: In a method for correcting oscillation-induced imaging errors in an objective, in particular a projection objective in microlithography for fabricating semiconductor elements, an at least first objective part and a second objective part are provided. In this case, the first objective part has a first optical axis and the second objective part has an optical axis which deviates from the first optical axis. Beam deflection takes place between the two objective parts via at least one optical beam deflection element. The oscillations occurring in the second objective part are measured and evaluated by means of a sensor system. The results are used as input data for a device, which adjusts the beam direction in the objective, in such a way that imaging errors occurring as a result of the oscillations of the second objective part are compensated for.

Abstract: A design for inspecting specimens, such as photomasks, for unwanted particles and features such as pattern defects is provided. The system provides no central obscuration, an external pupil for aperturing and Fourier filtering, and relatively relaxed manufacturing tolerances, and is suited for both broad-band bright-field and laser dark field imaging and inspection at wavelengths below 365 nm. In many instances, the lenses used may be fashioned or fabricated using a single material. Multiple embodiments of the objective lensing arrangement are disclosed, all including at least one small fold mirror and a Mangin mirror. The system is implemented off axis such that the returning second image is displaced laterally from the first image so that the lateral separation permits optical receipt and manipulation of each image separately.

Abstract: A cataoptric projection optical system for projecting a pattern on an object surface onto an image surface and for serving as an imaging system that forms an intermediate image includes first, second, third and fourth mirrors serving substantially as a coaxial system so as to sequentially reflect light from an object side to an image side, and being arranged so that light from the object surface to the first mirror may intersect light from the second mirror to the third mirror.

Abstract: A reflection type projection optical system includes six mirrors that serve substantially as a coaxial system, and include, in order from an object side to an image side, a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, and a sixth mirror to sequentially reflect light, wherein the reflection type projection optical system serves as an imaging system that forms an intermediate image along an optical path between the third mirror and the fifth mirror, and wherein a displacement direction of a principal ray viewed from an optical axis from the first mirror to the second mirror is reverse to that from the third mirror to the sixth mirror.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: An optical switching system and apparatus includes a plurality of micro-machined mirrors and a covering lens for adjusting the optical field of at least one of the plurality of micro-machined mirrors. The covering lens has a positive focal length.

Abstract: A projection exposure system for microlithography that has a catadioptric projection objective and a light source is claimed. The projection objective has at least one mirror and at least one lens that are composed of specified materials. Also the positions of the mirror and of the lens within the projection objective are also specified. The material and position are specified in such a way that imaging changes in the projection objective that are due to illumination-induced change in the reflecting surface of the mirror counteract illumination-induced imaging changes in the lens. Illumination-induced imaging changes in the entire projection objective are reduced in this way.

Abstract: An image reading apparatus includes a laser source, a stage on which an image carrier can be placed, a light detector for detecting light released from the image carrier, and an optical head for condensing the laser beam emitted from the laser source onto the image carrier and condensing light released from the image carrier to lead it to the light detector and being two-dimensionally movable parallel to the stage, and a perforated mirror formed with a hole at a center portion thereof, and fixed in a path of the laser beam so that the laser beam can pass through the hole and light released from the image carrier and condensed by the optical head can be reflected thereby in such a manner that a path of the light is branched off from the path of the laser beam.

Abstract: A compact, high numerical aperture, high resolution, ultra-wide field of view concentric scanning optical sensor. In a most general embodiment, the inventive optical arrangement (10) includes an at least semi-spherical lens (14) having a base; a reflective surface (16) centered at a center of said base and parallel thereto; and an array (20) of detectors dispose to receive electromagnetic energy received through said lens and reflected by said surface. In the illustrative embodiment, the semi-spherical lens is a ball lens (14). The reflective surface is aspheric and designed to effect aberration correction. A mechanism (19) is included for rotating the ball lens (14) causing the system to scan. A dome lens (18) is disposed over the ball lens and concentric therewith. Electromagnetic energy is received through the dome and ball lenses and reflected by the mirror to the detector array. A field lens assembly (21) is disposed between the detectors and the mirror.

Abstract: A double mirror objective lens system uses a three optical surface refractor incorporating a convex mirror into a right surface thereof that reflects incident light to a concave mirror, which reflects the light back through the refractor and on toward a focal point of the system. This arrangement yields better resolution images with low spherical aberration, minimal chromatic aberration, and long working distance. A variation of the invention includes another refractor, a right surface of which carries the concave mirror to form a Mangin mirror. This variation on of the invention has even less aberration over increased wavelength range due to better corrected chromatic aberration.

Abstract: An optical element of a transparent body has two refracting surfaces formed in surfaces of the transparent body, and a plurality of reflecting surfaces formed in surfaces of the transparent body. Light incident through one refracting surface into the transparent body is reflected successively by the plurality of reflecting surfaces to be guided to the other refracting surface. At least one of the two refracting surfaces and reflecting surfaces has an optical low pass filter.

Abstract: The invention features an imaging system for imaging an object point to an image point. The system includes: a beam splitter positioned to receive light rays from the object point and separate each ray into a transmitted portion and a reflected portion, the transmitted portions defining a first set of rays and the reflected portions defining a second set of rays; and a reflecting surface positioned to receive one of the sets of rays from the beam splitter and focus that set of rays towards the image point via the beam splitter. Interferometric techniques may be applied to increase the light throughput of the system.

Abstract: A projection optical system has excellent optical performance without substantially being affected by birefringence despite the use of an optical material with intrinsic birefringence such as fluorite, for example. A projection optical system forms a reduced image of a first surface onto a second surface . A first group of radiation transmissive members is formed such that a crystal axis [100] and the optical axis nearly align and similarly a second group of radiation transmissive members is formed such that the crystal axis [100] and the optical axis nearly align. The first grout of radiation transmissive members and the second group of radiation transmissive members have a positional relationship rotated relatively 45 degrees around the center of the light axis. Both the first group of radiation transmissive members and the second group of radiation transmissive members are arranged in an optical path between a pupil position on the second surface side and the second surface.

Abstract: An optical reduction system for use in the photolithographic manufacture of semiconductor devices having one or more quarter-wave plates operating near the long conjugate end. A quarter-wave plate after the reticle provides linearly polarized light at or near the beamsplitter. A quarter-wave plate before the reticle provides circularly polarized or generally unpolarized light at or near the reticle. Additional quarter-wave plates are used to further reduce transmission loss and asymmetries from feature orientation. The optical reduction system provides a relatively high numerical aperture of 0.7 capable of patterning features smaller than 0.25 microns over a 26 mm×5 mm field. The optical reduction system is thereby well adapted to a step and scan microlithographic exposure tool as used in semiconductor manufacturing. Several other embodiments combine elements of different refracting power to widen the spectral bandwidth which can be achieved.

Abstract: An optical system invention is interposed between a pupil plane and an image plane, and includes a first prism, a second prism, and a holographic element which is sandwiched between the first prism and the second prism and is cemented to these prisms. When a light beam traveling along the optical path connecting the pupil plane and the image plane through the optical system is called a first beam, the first prism has a 1-1 surface placed on the pupil side, combining the function of transmission with the function of reflection of the first beam; a 1-2 surface placed on the opposite side of the pupil with respect to the 1-1 surface; and a 1-3 surface placed on the image side, transmitting the first beam. The second prism includes a 2-1 surface having the same shape as the 1-2 surface and placed opposite thereto, transmitting the first beam at least twice, and a 2-2 surface placed on the opposite side of the pupil with respect to the 2-1 surface of the second prism, reflecting the first beam.

Abstract: A catadioptric projection lens configured for imaging a pattern arranged in an object plane (2) onto an image plane (4) while creating a single, real, intermediate image (3) has a catadioptric first section (5) having a concave mirror (6) and a beam-deflection device (7), and a dioptric second section (8) that commences after the beam-deflection device. The system is configured such that the intermediate image follows the first lens (17) of the dioptric section (8) and is preferably readily accessible. Arranging the intermediate image both between a pair of lenses (17, 21) of the dioptric section and at a large distance behind the final reflective surface of the beam-deflection device helps to avoid imaging aberrations.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: A projection exposure apparatus includes a projection optical system, which is arranged in an optical path between a first surface and a second surface, projects a pattern on a negative plate arranged on the first surface onto a workpiece arranged on the second surface and exposes the pattern thereon. The projection optical system includes a first imaging optical subsystem having a dioptric imaging optical system; a second imaging optical subsystem having a concave reflecting system; a third imaging optical subsystem having a dioptric imaging optical system; a first folding mirror arranged in an optical path between the first imaging optical subsystem and the second imaging optical subsystem; and a second folding mirror arranged in an optical path between the second imaging optical subsystem and the third imaging optical subsystem.

Abstract: An optical element of a transparent body has two refracting surfaces formed in surfaces of the transparent body, and a plurality of reflecting surfaces formed in surfaces of the transparent body. Light incident through one refracting surface into the transparent body is reflected successively by the plurality of reflecting surfaces to be guided to the other refracting surface. At least one of the two refracting surfaces and reflecting surfaces has an optical low pass filter.

Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.

Abstract: A high resolution lens is provided as a condensing lens for collecting light made incident from a light source, of which one face is plane and the other face is curved. The curved face of the lens is coated with a reflecting material except for its central apex portion, and incident light is made incident through the plan portion of the lens. The curved face of the high resolution lens may be spherical or is a parabolic face to reduce aberration. When a parallel light is made incident on the plane face of the high resolution lens, it is reflected in the lens and totally reflected, and then is transmitted through the uncoated apex to an external object.

Abstract: A catadioptric projection optical system for use in photolithography used in manufacturing semiconductors having a quarter waveplate following a reticle and multiple aspheric surfaces and calcium fluoride lens elements. A quarter waveplate following the reticle eliminates asymmetry in reticle diffraction caused by polarized illumination. The use of additional aspheric surfaces reduces the number of lens elements and aids in reducing aberrations. Calcium fluoride elements are used in the lens group adjacent the wafer to help minimize compaction. In one embodiment, only calcium fluoride material is used. The present invention provides a projection optics system having a numerical aperture of 0.75 for use with wavelengths in the 248, 193, and 157 nanometer range. The object and image locations are separated by a predetermined distance, making possible retrofitting of older optical systems.

Abstract: A catadioptric projection lens for projecting a pattern located in an object plane onto an image plane without an intermediate image includes the following components between the object plane and the image plane in the given order: a first lens part for creating a beam that is directed at a physical beam splitter, a physical beam splitter with a beam splitter surface, a mirror group with a concave mirror, and a second lens part with positive focal power to create an image of the pattern on the image plane. The mirror group preferably has no free-standing lens, and the focal power of the mirror group is largely determined by the magnification of the concave mirror. The focal power of the mirror group is large enough to convert the incident divergent beam into a convergent beam. The system aperture is located on the image side behind of the concave mirror, preferably at the exit of the beam splitter.

Abstract: An eyepiece optical system for projecting an enlarged virtual image of a two-dimensional image on an observer's pupil has a first reflective/transmissive surface formed as a flat surface, a second reflective/transmissive surface so shaped as to be concave to the pupil side, and a negative-powered optical element having a negative power and arranged between the second reflective/transmissive surface and the two-dimensional image. Here the focal length of the negative-powered optical element f2 and the focal length of the entire eyepiece optical system fs are so determined as to fulfill the following condition: −1.0<fs/f2<−0.1.

Abstract: The present invention relates to providing enhanced panoramic images with an improved panoramic mirror. A panoramic mirror is provided with a controlled vertical field of view. The controlled vertical field of view improves the resolution of a viewable panoramic image by eliminating portions of unwanted images from the viewable panoramic image.

Abstract: A flood light includes a lamp that is located at a focus of a reflecting mirror having a reflecting surface whose cross-section is oval and partially arcuate. A concave lens having negative refracting power is disposed between first and second foci about which an elliptical reflecting surface of the reflecting mirror is disposed. Some light rays from the lamp pass directly from the lamp through the lens while other rays from the lamp are reflected by the mirror before passing through the lens. Generally speaking, on the upstream side of the lens, the reflected rays enter the lens outboard of the rays that pass directly from the lamp to the lens. This construction provides a small flood light that has a high optical output, and effectively uses bundles of rays emitted from the lamp to produce a luminous intensity distribution desirable as light for range finding.

Abstract: According to one aspect of the invention there is provided a panoramic imaging arrangement comprising a first and second transparent component both rotationally symmetric about an axis of revolution. The first transparent component has an upper surface and a lower surface. The lower surface includes a reflective portion and a refractive portion both about the axis of revolution. The refractive portion extends radially from the axis of revolution to the start of the reflective portion. The second transparent component is attached to the first transparent component at a refractive interface that extends into the upper surface. The second transparent component includes a distal reflective surface. Light from a portion of a surrounding panoramic scene is refracted by a portion of the upper surface, is reflected by the reflective portion of the lower surface through the refractive interface to the distal reflective surface.

Abstract: The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface.

Abstract: Most camera systems only record an image from a limited viewing angle. A new panoramic camera apparatus is disclosed that instantaneously captures a 360 degree panoramic image. In the camera device, virtually all of the light that converges on a point in space is captured. Specifically, in the camera of the present invention, light striking this point in space is captured if it comes from any direction, 360 degrees around the point and from angles 50 degrees or more above and below the horizon. The panoramic image is recorded as a two dimensional annular image. Furthermore, various different systems for displaying the panoramic images and distributing the panoramic images. Specifically, methods and apparatus for digitally performing a geometric transformation of the two dimensional annular image into rectangular projections such that the panoramic image can be displayed using conventional methods such as printed images and televised images.

Abstract: A common corrective eyeglass lens blank and a common mirror, Plano or magnifying, are brought together in a “compact” (small sized) construction and assembly to provide the very thing long desired in mirrors and not elsewhere found—corrected vision and ample working room between the eyes and any lenses, at the same time, at reasonable cost, in an elegance of implementation.

Abstract: An optical system of reflecting type according to the invention comprises an optical element composed of a transparent body having an entrance surface, an exit surface and at least three curved reflecting surfaces of internal reflection, wherein a light beam coming from an object and entering at the entrance surface is reflected from at least one of the reflecting surfaces to form a primary image within the optical element and is, then, made to exit from the exit surface through the remaining reflecting surfaces to form an object image on a predetermined plane, and wherein 70% or more of the length of a reference axis in the optical element lies in one plane.

Abstract: Most camera systems only record an image from a limited viewing angle. A new panoramic camera apparatus is disclosed that instantaneously captures a 360 degree panoramic image. In the camera device, virtually all of the light that converges on a point in space is captured. Specifically, in the camera of the present invention, light striking this point in space is captured if it comes from any direction, 360 degrees around the point and from angles 50 degrees or more above and below the horizon. The panoramic image is recorded as a two dimensional annular image. Furthermore, various different systems for displaying the panoramic images and distributing the panoramic images. Specifically, methods and apparatus for digitally performing a geometric transformation of the two dimensional annular image into rectangular projections such that the panoramic image can be displayed using conventional methods such as printed images and televised images.

Abstract: A low f-number, single-element, catadioptric condenser lens (30) with four optical surfaces (21-24), which is capable of collecting light at large angles and large pupil diameters. Two of the four surfaces (22, 23) are reflective surfaces immersed in the lens refractive material (25), while the other two surfaces (21, 24) are refractive surfaces and fabricated on the surface of the lens. Two embodiments of the lens are disclosed; a low-obscuration type and a wide-field type. This condenser lens provides improved light collection efficiency overall and has lower obscuration in the center portion of the reformed light source (26), as well as improved optical aberration and stray light properties. The integration of the optical surfaces into a single package results in a more reliable and lower cost condenser lens.

Abstract: An optical device having a semi-spherical or hemispherical field-of-view is provided. A conically-shaped piece of optical material has an annular surface satisfying Snell's Law for total internal reflection with respect to light passing through the piece and incident on the annular surface from within the piece.

Abstract: A catadioptric projection objective comprises an object plane, a physical beam splitter, a concave mirror, an image plane, a first objective part, a second objective part, and a third objective part. The first objective part is located between the object plane and the physical beam splitter. The second objective part is located between the physical beam splitter and the concave mirror, and includes at least two divergent lenses. The third objective part is located between the physical beam splitter and the image plane.

Abstract: An ultraviolet (UV) catadioptric imaging system, with broad spectrum correction of primary and residual, longitudinal and lateral, chromatic aberrations for wavelengths extending into the deep UV (as short as about 0.16 &mgr;m), comprises a focusing lens group with multiple lens elements that provide high levels of correction of both image aberrations and chromatic variation of aberrations over a selected wavelength band, a field lens group formed from lens elements with at least two different refractive materials, such as silica and a fluoride glass, and a catadioptric group including a concave reflective surface providing most of the focusing power of the system and a thick lens providing primary color correction in combination with the focusing lens group. The field lens group is located near the intermediate image provided by the focusing lens group and functions to correct the residual chromatic aberrations. The system is characterized by a high numerical aperture (typ, greater than 0.

Abstract: The subject invention describes a light assembly using light emitting diodes (LEDs) especially suited for use as a daytime running lamp. The catadioptric light assembly comprises a circuit board, a first set of LEDs secured to a first board, a first collimator disposed in front of the first set of LEDs for directing resultant parallel light beams to a reflective surface. The light beams are reflected by the reflective surface to an inner reflective surface of a housing and are directed, in a parallel fashion, to a lens. A second collimator is disposed in from of the second set of LEDs for directing the resultant parallel light beams directly to the lens. First and second support members, connected to the first and second boards, respectively, absorb and dissipate the heat generated by the LEDs.

Abstract: An optical architecture for observation telescopes, in particular for telescopes intended to be installed on board a vehicle, such as a space satellite, for observing terrestrial areas, includes a concave and off-axis mirror which is aspherical or possibly spherical and reflects in the form of a convergent beam a beam consisting of radiation that it receives from a terrestrial area that it is observing, a dioptric and achromatic aperture correction plate inserted on the path of the convergent beam reflected by the mirror, a dioptric and achromatic field correction plate inserted on the path of the convergent beam reflected by the mirror on the downstream side of the aperture correction plate relative to the mirror, and a pupil on the path of the reflected convergent beam to obtain an off-axis field of view preventing central obscuration. It constitutes a simple way of imaging stereoscopically.

Abstract: A system for imaging is disclosed herein. The system has a numerical aperture (NA) preferably greater than 0.9, but greater than 0.65, and uses unique illumination entrances to collect reflected, diffracted, and scattered light over a range of angles. The system includes a catadioptric group, focusing optics group, and tube lens group. Illumination can enter the catadioptric optical system using an auxiliary beamsplitter or mirror, or through the catadioptric group at any angle from 0 to 85 degrees from vertical. The high NA catadioptric system can also have a relayed pupil plane, used to select different imaging modes, providing simultaneous operation of different imaging modes, Fourier filtering, and other pupil shaping operations.

Abstract: A projector for producing a visually perceptible light image along predetermined vector coordinates, includes a light source for producing a beam of light along a light path; a deflector positioned to deflect the beam of light along the vector coordinates; a focusing lens for focusing the deflected light beam; and a projection reflector for reflecting the beam along the vector coordinates to thereby form the visually perceptible light image. A preferred light source comprises a laser, and a preferred reflecting surface has a substantially convex shape, preferably including a parabolic reflector.

Abstract: An optical imaging system especially for microlithography includes a first imaging system forming an intermediate image of an object, and a second imaging system forming, on a surface, an image of the intermediate image. A reflective surface directs light from the first imaging system to the second imaging system. An aspherical corrective optical surface is located at or near the location of the intermediate image for correcting aberrations such as high-order distortion, aberrations due to accumulation of manufacturing tolerances, and spherical aberration. The first imaging system comprises a positive power refractive element and a concave mirror. The second imaging system comprises refractive elements and no concave mirror.

Abstract: According to one aspect the invention, a panoramic imaging arrangement is provided which includes at least a first lens block including a convex reflective surface and a transparent component. The convex reflective surface has a substantially vertically extending axis of revolution and is capable of receiving light from a 360° surrounding panoramic scene, and reflecting the light for further manipulation. The transparent component covers the convex reflective surface. The convex reflective surface is thereby protected from environmental conditions which may otherwise result in damage to the convex reflective surface.

Abstract: The invention relates to a solar compound concentrator of an electric power generation system. A compound parabolic concentrator (CPC) is mounted under an acrylic concentrating fresnel lens that concentrates the intensity of sunlight to five to ten times above normal level. Then the focused sunlight is further concentrated twenty to fifty times by the CPC collector. The intensified sunlight is focused on the bottom of the CPC. The high mirror quality of CPC allows 98% of the reflected rays to be incident on the bottom of the CPC. A cermet coating is spattered onto the top of a stainless steel heat pipe (heat exchanger) allowing for an absorptivity of 96%.