Electric Charge Generating Or Conducting Means (e.g., Charging Of Gases) Patents (Class 361/230)
  • Patent number: 12165855
    Abstract: A ceramic heater includes an AlN ceramic substrate having a wafer placement surface in which, from a position closer to the wafer placement surface, a plasma-generation RF electrode and a heater electrode are embedded in this order so as to be separated from each other. The AlN ceramic substrate includes an AlN ceramic high-resistivity layer disposed between the RF electrode and the heater electrode, and an AlN ceramic low-resistivity layer other than the high-resistivity layer. The high-resistivity layer and the low-resistivity layer each contain Si, Mg, and Ti. The high-resistivity layer has higher Mg and Ti contents and a higher volume resistivity than the low-resistivity layer.
    Type: Grant
    Filed: August 18, 2021
    Date of Patent: December 10, 2024
    Assignee: NGK INSULATORS, LTD.
    Inventor: Hideaki Takasaki
  • Patent number: 12142493
    Abstract: A substrate processing apparatus includes: a nozzle unit configured to discharge a processing liquid to a substrate; a pipe connected to the nozzle unit and a processing liquid supply unit supplying the processing liquid; a charge amount control unit disposed at the pipe, including a filter unit charged with positive charges or negative charges, and including at least one of a control valve, controlling a flow rate of the processing liquid passing through an inside of the filter unit, and a power supply unit, applying a voltage to the filter unit, to control a charge amount of the processing liquid; and a control unit connected to the charge amount control unit.
    Type: Grant
    Filed: November 15, 2022
    Date of Patent: November 12, 2024
    Assignee: SEMES CO., LTD.
    Inventors: Young Jun Son, Tae Hoon Lee, Sung Gyu Lee, Hyun Yoon, Do Yeon Kim
  • Patent number: 12068148
    Abstract: The invention generally relates to mass spectrometers that utilize ionic wind and methods of use thereof.
    Type: Grant
    Filed: April 4, 2023
    Date of Patent: August 20, 2024
    Assignee: Purdue Research Foundation
    Inventors: Robert Graham Cooks, Brett M. Marsh
  • Patent number: 12066779
    Abstract: A fixing device includes a fixation member, a fixing member that has an outer peripheral surface and an inner peripheral surface, is rotatably provided with respect to the fixation member, comes into contact with, of a recording material on which an image is formed, a surface on which the image is formed, and fixes the image to the recording material, a rotating member that includes a contact surface, which is in contact with the inner peripheral surface of the fixing member, at an outer peripheral portion, includes a heat generating portion generating heat due to electric resistance, and is rotatable together with the heat generating portion with respect to the fixation member, and a power receiving member that includes a power receiving surface receiving power from the fixation member with a peripheral surface, has a spring characteristic of biasing the power receiving surface in a direction of the fixation member, and rotates together with the rotating member.
    Type: Grant
    Filed: August 24, 2022
    Date of Patent: August 20, 2024
    Assignee: FUJIFILM Business Innovation Corp.
    Inventors: Takashi Ohashi, Takashi Matsubara, Takuma Ishihara
  • Patent number: 12046456
    Abstract: A plasma processing apparatus in which each of a plurality of source gas supply paths includes a first valve, a second valve disposed on an upstream side of the first valve, a flow rate regulator disposed between the first valve and the second valve, and a connection unit between the source gas supply path and an inert gas supply path. For each of the source gas supply paths, leakage in the first valve is sequentially determined, in a first inspection step, using a flow rate of the inert gas passing through the flow rate regulator, and in a second inspection step of, supplying the inert gas and detecting the leakage of the first valve on the source gas supply path using a change amount of a pressure of the inert gas if it is not determined in the first inspection step that there is a leakage in the first valve.
    Type: Grant
    Filed: May 15, 2020
    Date of Patent: July 23, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Kota Kakimoto, Masahiro Nagatani, Yusuke Takegawa
  • Patent number: 11961754
    Abstract: A substrate fixing device includes a baseplate, an electrostatic attraction member, and an electrode pin. The baseplate includes a metallic member in which a through hole is famed. The electrostatic attraction member is over a surface of the baseplate and includes an attraction electrode. The electrode pin is inserted through the through hole to be connected to the attraction electrode. A recess communicating with the through hole is formed in the surface of the metallic member with the through hole being within the recess in a plan view from a direction perpendicular to the surface of the metallic member.
    Type: Grant
    Filed: November 4, 2021
    Date of Patent: April 16, 2024
    Assignee: SHINKO ELECTRIC INDUSTRIES CO., LTD.
    Inventors: Hiroki Oguro, Yusuke Kinoshita, Yuichi Nakamura
  • Patent number: 11951583
    Abstract: An electrostatic chuck includes a ceramic base, a ceramic dielectric layer, an electrostatic electrode, and a ceramic insulating layer. The ceramic dielectric layer is positioned on the ceramic base and is thinner than the ceramic base. The electrostatic electrode is embedded between the ceramic dielectric layer and the ceramic base. The ceramic insulating layer is positioned on the ceramic dielectric layer and is thinner than the ceramic dielectric layer. The ceramic insulating layer has a higher volume resistivity and withstand voltage than the ceramic dielectric layer, and the ceramic dielectric layer has a higher dielectric constant than the ceramic insulating layer.
    Type: Grant
    Filed: August 31, 2021
    Date of Patent: April 9, 2024
    Assignee: NGK INSULATORS, LTD.
    Inventors: Hiroshi Takebayashi, Kenichiro Aikawa, Tatsuya Kuno
  • Patent number: 11951488
    Abstract: An axial cyclone air filtration apparatus integrated with a bipolar-charged agglomeration includes a pre-charge region and an axial cyclone coagulation dust separation apparatus, and the pre-charge region is arranged on an air inlet side of the axial cyclone coagulation dust separation apparatus. Suspended particles in air are charged with charges of different polarities in the pre-charge region before entering the axial cyclone coagulation dust separation apparatus. The organic combination of electric coagulation technology and axial cyclone dust separation technology improves the filtering efficiency for ultra-fine particles in air.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: April 9, 2024
    Assignee: BEIJING COMFORT TECHNOLOGIES CO., LTD.
    Inventor: Jacques Ao
  • Patent number: 11930584
    Abstract: A plasma actuator includes: a dielectric layer; a first electrode provided on the obverse surface of the dielectric layer; a second electrode provided, on the reverse-surface side of the dielectric layer, in one direction from the first electrode; a floating conductor pair that is provided between the first electrode and the second electrode and that has an obverse-surface conductor provided on the obverse surface of the dielectric layer and a reverse-surface conductor provided on the reverse-surface side of the dielectric layer, the obverse-surface conductor and the reverse-surface conductor being electrically connected to each other, electrically insulated from the first electrode and the second electrode, and positioned in the order of the reverse-surface conductor and the obverse-surface conductor in the one direction from the first electrode in plan view; and a power source connected to the first electrode and the second electrode.
    Type: Grant
    Filed: August 21, 2020
    Date of Patent: March 12, 2024
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventor: Takehiko Segawa
  • Patent number: 11881685
    Abstract: An ion generation device includes a discharge electrode substrate, an induction electrode substrate, and an insulating resin. The discharge electrode substrate on which a discharge electrode is mounted and a first electrode connected to the discharge electrode is formed. The induction electrode substrate on which an induction electrode configured to generate a discharge between the induction electrode and the discharge electrode and a second electrode connected to the induction electrode are formed. The insulating resin is filled at least between the discharge electrode and the induction electrode. The insulating resin provides insulation between the discharge electrode and the induction electrode. The first electrode and the second electrode are disposed and face each other at least partially. The first electrode, the second electrode, and the insulating resin interposed between the first electrode and the second electrode form a capacitor.
    Type: Grant
    Filed: November 20, 2019
    Date of Patent: January 23, 2024
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Nobuyuki Ohe, Tetsuya Ezaki, Satoshi Okano
  • Patent number: 11835868
    Abstract: An ElectroStatic Chuck (ESC) including a chucking surface having at least a portion covered with a coating of silicon oxide (SiO2), silicon nitride (Si3N4) or a combination of both. The coating can be applied in situ a processing chamber of a substrate processing tool and periodically removed and re-applied in situ to create fresh coating.
    Type: Grant
    Filed: July 7, 2021
    Date of Patent: December 5, 2023
    Assignee: Lam Research Corporation
    Inventors: Stephen Topping, Vincent Burkhart
  • Patent number: 11798791
    Abstract: A substrate support for a plasma processing apparatus includes a first support area configured to support a substrate placed thereon; and a second support area configured to support a focus ring placed thereon. The second support area includes a lower electrode, a chuck area, and a bonding area. The chuck area includes a first electrode and a second electrode, and is configured to hold the focus ring by a potential difference set between the first electrode and the second electrode. The first electrode and the second electrode extend in the circumferential direction, and the first electrode is provided inward in the radial direction with respect to the second electrode. The substrate support further includes a first conducting wire and a second conducting wire each extending around a center or on the center between an inner boundary and an outer boundary of the second support area.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: October 24, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yasuharu Sasaki, Shingo Koiwa
  • Patent number: 11368000
    Abstract: An ion generating device can include a housing having an opening, an anode and a cathode disposed within the housing and having a space between them in fluid communication with the opening, a power source having a negative terminal and a positive terminal with a first connection between the negative terminal and the anode and a second connection between the positive terminal and the cathode, and an air mover disposed to direct an air flow through the space and out of the opening.
    Type: Grant
    Filed: July 13, 2018
    Date of Patent: June 21, 2022
    Assignee: NATURION PTE. LTD.
    Inventors: Warren Edwin Guthrie, John Gregory Videtich, Kenneth James Orr, Eric Joshua Emens
  • Patent number: 11121649
    Abstract: An electrostatic workpiece-holding method includes an initialization step, a static elimination step, a workpiece setting step, a workpiece attracting step, and a workpiece release step. The initialization step is a step of applying a positive voltage to electrode of the electrostatic attracting part while applying a negative voltage to electrode. The static elimination step is a step of removing the static charge on the surface of the electrostatic attracting part. The workpiece setting step is a step of placing the workpiece in contact with the surface of the electrostatic attracting part. The workpiece attracting step is a step of interrupting the application of the positive voltage to electrode of the electrostatic attracting part and the application of the negative voltage to electrode. The workpiece release step is a step of applying the positive voltage to electrode of the electrostatic attracting part while applying the negative voltage to electrode.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: September 14, 2021
    Assignee: CREATIVE TECHNOLOGY CORPORATION
    Inventor: Masaru Ozawa
  • Patent number: 11086233
    Abstract: An ElectroStatic Chuck (ESC) including a chucking surface having at least a portion covered with a coating of silicon oxide (SiO2), silicon nitride (Si3N4) or a combination of both. The coating can be applied in situ a processing chamber of a substrate processing tool and periodically removed and re-applied in situ to create fresh coating.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: August 10, 2021
    Assignee: Lam Research Corporation
    Inventors: Stephen Topping, Vincent Burkhart
  • Patent number: 11019711
    Abstract: A static-neutralization system includes a plurality of alternating current (AC) static bars that is coupled to a common, high-voltage power supply. The power supply includes a transformer that steps up AC mains electricity to deliver high-voltage, AC power to the static bars. A monitoring circuit is provided in the power supply that determines the ionization current of the static bars through isolation of the second harmonic of the total load current. By monitoring the ionization current, the power supply can identify when the ion generation efficiency of the static bars falls beneath a user-defined threshold. The monitoring circuit additionally determines the discharge voltage of the static bars through isolation of the fourth harmonic of the total output voltage. By monitoring the discharge voltage, a voltage-suppression circuit can suspend delivery of power to the static bars upon detecting a full-discharge event, which often results from dielectric breakdown.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: May 25, 2021
    Assignee: STATIC CLEAN INTERNATIONAL, INC.
    Inventor: Kenneth Martin MacKillop
  • Patent number: 11012008
    Abstract: According to an electrostatic chuck device of the present invention, a cross-sectional shape of a base body in a thickness direction is a convex curved surface or a concave curved surface that gradually curves from a center of one main surface toward an outer periphery of the one main surface, an annular projection portion is provided on a peripheral portion on the one main surface of the base body so as to go around the peripheral portion, a plurality of convex projection portions are provided in a region surrounded by the annular projection portion, the convex projection portion has the top surface in contact with the plate-shaped sample, a side surface, and an R surface continuously connecting the top surface and the side surface.
    Type: Grant
    Filed: November 11, 2019
    Date of Patent: May 18, 2021
    Assignee: SUMITOMO OSAKA CEMENT CO., LTD.
    Inventor: Shinichi Maeta
  • Patent number: 10998159
    Abstract: An ion generator includes a high-voltage transformer having a secondary side that is not grounded; a discharge wire-pattern; an induction wire-pattern; a discharge electrode connected to a first terminal via the discharge wire-pattern, the first terminal being disposed on the secondary side of the high-voltage transformer; and an induction electrode connected to a second terminal via the induction wire-pattern, the second terminal being disposed on the secondary side of the high-voltage transformer. The first terminal has a first width. The discharge wire-pattern includes a discharge wide region having a second width greater than the first width. The discharge wide region and the induction wire-pattern at least partly overlap each other in plan view.
    Type: Grant
    Filed: April 29, 2020
    Date of Patent: May 4, 2021
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Nobuyuki Ohe, Tetsuya Ezaki, Satoshi Okano
  • Patent number: 10955741
    Abstract: A method for cleaning a reticle includes rotating the reticle, providing a cleaning liquid to clean the reticle, detecting a static charge value on the reticle during rotating the reticle, and reducing static charges on the reticle in response to the detected static charge value. Hence, the electrostatic discharge (ESD) occurred to the reticle can be prevented.
    Type: Grant
    Filed: October 26, 2018
    Date of Patent: March 23, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Chang Cheng, Chi-Hung Liao
  • Patent number: 10896281
    Abstract: A method for the computer-aided characterization of a circuit comprising a semiconductor layer and a semiconductor component region embedded in the semiconductor layer in an electrically insulated manner, wherein the semiconductor component region is optionally coupled to a dielectric layer structure to be protected, the method comprising determining an indication representing vis-à-vis the semiconductor layer an intensity of an electrical charging of the semiconductor component region by a production process used to produce the circuit, wherein a physical construction of the semiconductor component region is taken into account when determining the indication, and classifying the semiconductor component region taking account of the indication.
    Type: Grant
    Filed: November 14, 2019
    Date of Patent: January 19, 2021
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Andreas Martin, Daniel Beckmeier
  • Patent number: 10842905
    Abstract: Provided is an air sterilizer for filtering and discharging harmful components from inflowing air, comprising: a body having an air inlet part, through which outside air is introduced, and an air outlet part, through which the air filtered inside is discharged; a primary filtering part detachably provided in the body and filtering contaminant particles from the inflowing and moving air; an air intake fan for allowing the air to inflow through the air inlet part; a secondary electrostatic filter part for sterilizing harmful components from the air, which has been filtered through the primary filtering part, by applying continuous and repetitive damage to the harmful components; and an ion-generating part for supplying anions to the air, from which the harmful components have been filtered through the secondary electrostatic filter part, so as to allow the air to be discharged to the outside.
    Type: Grant
    Filed: November 28, 2018
    Date of Patent: November 24, 2020
    Assignee: SMI CO., LTD.
    Inventor: Myung Soo Baek
  • Patent number: 10832932
    Abstract: A semiconductor product testing device using an electric static carrier includes a movable carrier plate serving to carry at least one semiconductor product for transferring or testing process; the movable carrier plate being arranged with at least one electric static circuit to suck the at least one semiconductor product; a movable detecting probe set including: a probe set includes at one probe or a plurality of probes; a robot being connected to the probe set for deriving the probe set to a predetermined test position; a control device connected to the robot and including a control circuit for controlling movements of the robot and a testing circuit; and a computer connected to the control device for getting testing data from the testing circuit; the computer providing functions to cause the user to determine test items and ways of the testing circuit and the moving paths of the robot.
    Type: Grant
    Filed: February 8, 2018
    Date of Patent: November 10, 2020
    Inventor: Hsiu Hui Yeh
  • Patent number: 10825700
    Abstract: The invention provides a plasma processing apparatus which includes a processing chamber, a radio frequency power source to supply a radio frequency power for plasma generation, a sample stage equipped with an electrostatic chuck electrode of a sample, a DC power source to apply a DC voltage to the electrode, and a control unit to change the DC voltage from a predetermined value to almost 0 V when a predetermined time elapses since the supplying of the radio frequency power is stopped. The predetermined value is a predetermined value indicating that a potential of the sample when the DC voltage is almost 0 V becomes almost 0 V. The predetermined time is a time defined on the basis of a time when charged particles generated by the plasma processing disappear or a time when an afterglow discharge disappears.
    Type: Grant
    Filed: February 6, 2017
    Date of Patent: November 3, 2020
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Masaki Ishiguro, Masahiro Sumiya
  • Patent number: 10755957
    Abstract: A measurement method includes vibrating a wafer through up-and-down movement of one or more pins supporting the wafer after performing processing with gas-based plasma generated through application of high-frequency electric power while the wafer, which is placed on a stage in a processing container, is electrostatically adhered by an electro-static chuck, calculating a residual charge amount of the wafer from an induced current flowing through an attracting electrode upon the vibrating of the wafer, and calculating a voltage to be applied to the attracting electrode in response to the calculated residual charge amount of the wafer.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: August 25, 2020
    Assignee: Tokyo Electron Limited
    Inventor: Masanori Sato
  • Patent number: 10698025
    Abstract: Probe systems and methods for collecting an optical image of a device under test (DUT) are disclosed herein. The probe systems include a chuck, a chuck thermal module, an enclosure, an imaging device, and a flow-regulating structure. The chuck defines a support surface configured to support a substrate and the chuck thermal module is configured to regulate a temperature of the chuck. The enclosure defines an enclosed volume, which contains the support surface of the chuck, and an aperture. The imaging device is at least partially external the enclosed volume and the enclosure and the imaging device defines a gap therebetween. The gap at least partially defines a fluid conduit that permits fluid flow between the enclosed volume and an external region. The flow-regulating structure is configured to regulate fluid flow through the fluid conduit. The methods include methods of utilizing the systems.
    Type: Grant
    Filed: June 19, 2019
    Date of Patent: June 30, 2020
    Assignee: FormFactor Beaverton, Inc.
    Inventors: Michael Teich, Axel Becker
  • Patent number: 10692698
    Abstract: A system for controlling RF power supplies applying power to a load, such as a plasma chamber, includes a master power supply and a slave power supply. The master power supply provides a control signal, such as a frequency and phase signal, to the slave power supply. The slave power supply receives the frequency and phase signal and also receives signals characteristic of the spectral emissions detected from the load. The slave RF power supply varies the phase and power of its RF output signal applied to the load. Varying the power controls the width of an ion distribution function, and varying the phase controls a peak of the ion distribution. Depending upon the coupling between the RF generators and the load, different spectral emissions are detected, including first harmonics, second harmonics, and, in the case of a dual frequency drive system, intermodulation distortion.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: June 23, 2020
    Assignee: MKS Instruments, Inc.
    Inventors: David J. Coumou, Ross Reinhardt, Yuriy Elner, Daniel M. Gill, Richard Pham
  • Patent number: 10615058
    Abstract: A process chamber having moveable electrodes for generating a parallel field within a process volume filled with a fluid is provided. In one implementation, a major axis of the process chamber is oriented vertically and a substrate support is disposed opposite a plurality of moveable electrodes extending along the major axis of the process chamber. In certain implementations, the substrate support is electrically floating and capable of rotating about a minor axis of the process chamber during processing of a substrate.
    Type: Grant
    Filed: March 2, 2017
    Date of Patent: April 7, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ludovic Godet, Christine Y. Ouyang, Viachslav Babayan
  • Patent number: 10581227
    Abstract: A discharge unit includes a discharge electrode, a counter electrode opposed to the discharge electrode, and an insulation member having a surface. The surface is continuous from the discharge electrode to the counter electrode. A wall portion is provided on one side with respect to a discharge region formed by the discharge electrode. The wall portion is configured to suppress a contaminant from adhering to the surface of the insulation member.
    Type: Grant
    Filed: December 24, 2015
    Date of Patent: March 3, 2020
    Assignee: Daikin Industries, Ltd.
    Inventors: Shunji Haruna, Tatsumi Enokida, Kei Suzumura, Kiyoshi Kuroi, Toshio Tanaka
  • Patent number: 10566769
    Abstract: The present invention provides methods and systems for a modular ion generator device that includes a bottom portion, two opposed side portions, a front end, a back end, and a top portion. A cavity is formed within the two opposed side portions, front end, back end, and top portion. At least one electrode is positioned within the cavity, and an engagement device is engaged to the front end and/or an engagement device engaged to the back end for allowing one or more modular ion generator devices to be selectively secured to one another.
    Type: Grant
    Filed: June 8, 2018
    Date of Patent: February 18, 2020
    Assignee: Global Plasma Solutions, Inc.
    Inventor: Charles Houston Waddell
  • Patent number: 10543466
    Abstract: Designs of a digital microfluidic devices are described comprising droplet control electrodes and heating electrodes that have effects in the regions for droplet manipulations. Specifically, the digital microfluidic device comprises a first substrate having liquid control electrodes for droplet control and a second substrate having heating electrodes for temperature control. Shielding electrodes are disposed on the second substrate to ensure that the heating electrodes can control the digital microfluidic device to a desired temperature profile without interfering the droplet operations such as transport, merging/mixing, splitting, particle distribution, etc.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: January 28, 2020
    Assignee: Digital BioSystems
    Inventor: Chuanyong Wu
  • Patent number: 10492285
    Abstract: A plasma electrode device, a method of manufacturing plasma electrode device, and an air conditioner are provided. The plasma discharge device may include an insulating body; a discharge electrode formed in a first surface of the insulating body to generate plasma discharge; and a ground electrode formed in a second surface of the insulating body to generate plasma discharge by reacting with the discharge electrode. The discharge electrode may have a prescribed pattern having a plurality of branches, and the insulating body may include a flexible material configured to be curved at a predetermined curvature.
    Type: Grant
    Filed: December 5, 2016
    Date of Patent: November 26, 2019
    Assignee: LG ELECTRONICS INC.
    Inventors: Sanggu Lee, Jaesoo Jang, Bongjo Sung, Chulwoo Park
  • Patent number: 10410464
    Abstract: An air filtration and cooling system for an electronic gaming machine is described. The electronic gaming machine can provide play of a wager-based game. The air filtration and cooling system is disposed within an interior of the gaming machine cabinet. The air filtration and cooling system can include a plenum which guides air through system. Electrical components, such as a game controller and a power supply, can be located within the plenum. For cooling purposes, air from outside the cabinet can be blown over the electrical components. Prior to allowing the air to pass over the electrical components, the air from outside the cabinet can be filtered, such as using a two-stage filter. The filtration system is configured to remove contaminants in the air which can damage the electrical components, such as contaminants associated with cigarette smoke.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: September 10, 2019
    Assignee: AGS LLC
    Inventor: Gerald Francis Wasinger
  • Patent number: 10337240
    Abstract: We disclose a window blind that includes a capacitor within each slat. Each plate of the capacitor may be connected to one of two batteries. At least one switch may be placed between each capacitor plate and its adjoining battery. When one switch is open, another switch may be closed thereby sending current to only one plate at a time. The plate that receives the current is negatively charged and the remaining plate is positively charged. The switch that is open may be changed to reverse the charges of the plates. This charge reversal may be actuated through a series of pull cord gestures from a user. By creating an electrical charge on the plates, dust is pulled from the air according to the net charge of the dust particles. The window blind therefore functions as an air purifier as well as a traditional window blind.
    Type: Grant
    Filed: March 13, 2017
    Date of Patent: July 2, 2019
    Assignee: Hall Labs LLC
    Inventors: David R. Hall, Emily Brimhall, Austin Carlson, Terrece Pearman
  • Patent number: 10304713
    Abstract: A substrate carrier adapted to use in a processing system includes an electrode assembly and a support base. The electrode assembly is configured to generate an electrostatic chucking force for securing a substrate to the substrate carrier. The support base has a heating/cooling reservoir formed therein. The electrode assembly and the support base form an unitary body configured for transport within a processing system. A quick disconnect is coupled to the body and configured to trap a heat regulating medium in the reservoir heating/cooling reservoir when the body is decoupled from a source of heat regulating medium.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: May 28, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: John M. White, Zuoqian Wang
  • Patent number: 10199163
    Abstract: A ground-side coil unit is provided with: a magnetic material plate disposed adjacent to a power transmission coil that transmits electric power to a power reception coil in a wireless manner; and a first filter coil disposed facing the power transmission coil with the magnetic material plate interposed therebetween. The first filter coil is disposed in a position where a magnetic flux generated by the first filter coil cancels out a magnetic flux generated by the power transmission coil in the magnetic material plate.
    Type: Grant
    Filed: April 8, 2015
    Date of Patent: February 5, 2019
    Assignee: NISSAN MOTOR CO., LTD.
    Inventors: Yuji Naruse, Yuusuke Minagawa
  • Patent number: 10136507
    Abstract: An embodiment of the invention provides a method for low emission charge neutralization, comprising: generating a high frequency alternating current (AC) voltage; transmitting the high frequency AC voltage to at least one non-metallic emitter; wherein the at least one non-metallic emitter comprises at least 70% silicon by weight and less than 99.99% silicon by weight; wherein the at least one emitter comprises at least one treated surface section with a destroyed oxidation layer; and generating ions from the at least one non-metallic emitter in response to the high frequency AC voltage. Another embodiment of the invention provides an apparatus for low emission charge neutralization wherein the apparatus can perform the above-described operations.
    Type: Grant
    Filed: May 1, 2017
    Date of Patent: November 20, 2018
    Assignee: Illinois Tool Works Inc.
    Inventors: Peter Gefter, Aleksey Klochkov
  • Patent number: 10090700
    Abstract: The present disclosure discloses a charging device, a charging method, a power adapter and a terminal. The device includes: a charging receiving terminal configured to receive a first alternating current; a voltage adjusting circuit, including a first rectifier configured to rectify the first alternating current and output a first voltage with a first pulsating waveform, a switch unit configured to modulate the first voltage according to a control signal to obtain a modulated first voltage, a transformer configured to output a plurality of voltages with pulsating waveforms according to the modulated first voltage, and a synthesizing unit configured to synthesize the plurality of voltages to output a second alternating current; and a central control module configured to output the control signal to the switch unit so as to adjust voltage and/or current of the second alternating current in response to a charging requirement of the battery.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: October 2, 2018
    Assignee: GUANGDONG OPPO MOBILE TELECOMMUNICATIONS CORP., LTD.
    Inventors: Jialiang Zhang, Shebiao Chen, Jun Zhang, Chen Tian, Shiming Wan, Jiada Li
  • Patent number: 9999947
    Abstract: A method for the repair of a heater, or an electrostatic chuck, using a ceramic top layer joined with a hermetically sealed joint. The heater or electrostatic chuck may be machined down to remove a damaged top surface, and to allow for the joining of a new top surface. The new top pieces may be aluminum nitride and the pieces may be brazed with an aluminum alloy under controlled atmosphere. The joint material is adapted to later withstand both the environments within a process chamber during substrate processing, and the oxygenated atmosphere which may be seen within the shaft of a heater or electrostatic chuck.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: June 19, 2018
    Assignee: Component Re-Engineering Company, Inc.
    Inventors: Brent Elliot, Frank Balma, Alexander Veytser, Michael Parker, Jeff Cunha
  • Patent number: 9918374
    Abstract: In one embodiment of the invention, a method of automatically balancing ionized air stream created in bipolar corona discharge is provided. The method comprises: providing an air moving device with at least one ion emitter and reference electrode connected to a micro-pulsed AC power source, and a control system with at least one ion balance monitor and corona discharge adjustment control; generating variable polarity groups of short duration ionizing micro-pulses: wherein said micro-pulses are predominantly asymmetric in amplitude and duration of both polarity voltages and have a magnitude of at least one polarity ionizing pulses exceed the corona threshold.
    Type: Grant
    Filed: November 28, 2016
    Date of Patent: March 13, 2018
    Assignee: Illinois Tool Works Inc.
    Inventors: Edward Oldynski, Peter Gefter, Leslie Partridge
  • Patent number: 9899933
    Abstract: An apparatus and corresponding systems and methods for managing electric power, particularly a transformer system and method. An example apparatus includes a chamber configured to contain plasma. The apparatus includes at least two input electrodes disposed at least partially within the chamber, and configured to receive an alternating current into the chamber. The input electrodes are configured to direct the alternating current to induce motion in the plasma. The apparatus also includes at least two output electrodes extending from the chamber. The output electrodes are configured to conduct a direct current, from the induced motion in the plasma, for delivery from the chamber.
    Type: Grant
    Filed: July 14, 2016
    Date of Patent: February 20, 2018
    Assignee: TIBBAR PLASMA TECHNOLOGIES, INC.
    Inventors: Richard A. Nebel, William L. Gibson, Keith Moser
  • Patent number: 9658558
    Abstract: Provided is a blower pipe with an inlet, an outlet, a passage part formed with a passage space to cause air to flow therein, and suppressing parts that are provided in different parts in a direction in which air in the passage space of the passage part is caused to flow and that suppress the flow of the air, wherein an outlet suppressing part constructed so that the passage space in the outlet is closed by a permeable member dotted with ventilation portions is provided in the outlet of the passage part as one of the suppressing parts, and wherein the permeability of an end region present at least at one end in the lateral direction orthogonal to the longitudinal direction among regions along the longitudinal direction of the opening shape of the outlet is set to a smaller value than the permeability of regions other than the end region.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: May 23, 2017
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Masafumi Kudo, Koji Otsuka, Yuki Nagamori, Kazuki Inami, Yasunori Momomura
  • Patent number: 9642232
    Abstract: An embodiment of the invention provides a method for low emission charge neutralization, comprising: generating a high frequency alternating current (AC) voltage; transmitting the high frequency AC voltage to at least one non-metallic emitter; wherein the at least one non-metallic emitter comprises at least 70% silicon by weight and less than 99.99% silicon by weight; wherein the at least one emitter comprises at least one treated surface section with a destroyed oxidation layer; and generating ions from the at least one non-metallic emitter in response to the high frequency AC voltage. Another embodiment of the invention provides an apparatus for low emission charge neutralization wherein the apparatus can perform the above-described operations.
    Type: Grant
    Filed: June 9, 2016
    Date of Patent: May 2, 2017
    Assignee: Illinois Tool Works Inc.
    Inventors: Peter Gefter, Aleksey Klochkov
  • Patent number: 9607260
    Abstract: An antenna device is configured as a jacket of a communication terminal, such as a mobile terminal, and a communication apparatus includes the antenna device attached to the communication terminal. The antenna device uses an HF-band high frequency signal as a carrier frequency, and is configured as a reader/writer antenna device for a near field communication system. The base body of the antenna device is a plate-shaped base member made of a resin. An antenna coil and a feeding coil are provided integrally with the plate-shaped base member. High-frequency signals are transmitted between the feeding coil and the antenna coil through magnetic coupling in a non-contact manner.
    Type: Grant
    Filed: April 11, 2014
    Date of Patent: March 28, 2017
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Kuniaki Yosui, Takahiro Baba, Yuki Wakabayashi, Naoki Gouchi, Nobuo Ikemoto
  • Patent number: 9570272
    Abstract: A plasma processing apparatus includes: a reaction chamber; a stage which is disposed inside the reaction chamber and on which a conveyance carrier is mountable; an electrostatic chuck mechanism including an electrode portion that is disposed inside the stage; a support portion which supports the conveyance carrier between a stage-mounted position on the stage and a transfer position that is distant from the stage upward; and an elevation mechanism which elevates and lowers the support portion relative to the stage. In a case in which the conveyance carrier is mounted on the stage by lowering the support portion, the electrostatic chuck mechanism starts applying a voltage to the electrode portion before contact of an outer circumferential portion of a holding sheet which holds the conveyance carrier to the stage.
    Type: Grant
    Filed: January 19, 2016
    Date of Patent: February 14, 2017
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Shogo Okita, Atsushi Harikai, Noriyuki Matsubara
  • Patent number: 9488937
    Abstract: An image forming apparatus includes an image carrier that carries an electrostatic latent image; a developing unit that develops the electrostatic latent image using a toner; an intermediate transfer body onto which toner image is transferred; a secondary transfer member that comes in contact with a surface of the intermediate transfer body; a power supply that outputs a voltage for transferring the toner image on the intermediate transfer body onto a recording member; and a protective agent supply unit that applies a protective agent including zinc stearate and boron nitride onto a surface of the image carrier. The voltage is alternatively switched in a transfer direction and an opposite direction. The voltage in the transfer direction enables transfer of the toner image from the intermediate transfer body to the recording member, and the voltage in the opposite direction has polarity opposite to polarity of the voltage in the transfer direction.
    Type: Grant
    Filed: January 11, 2013
    Date of Patent: November 8, 2016
    Assignee: RICOH COMPANY, LTD.
    Inventors: Shinya Tanaka, Hirokazu Ishii, Hiromi Ogiyama, Yasunobu Shimizu, Keigo Nakamura
  • Patent number: 9484180
    Abstract: A plasma processing apparatus includes a processing chamber; a conductive base within the processing chamber; an electrostatic chuck, having an electrode, provided on the base; a high frequency power supply that applies a high frequency power to the base; a first DC power supply that applies a DC voltage to the electrostatic chuck; and a plasma generation unit that generates plasma of a processing gas within the processing chamber. A plasma processing method performed in the plasma processing apparatus includes connecting the first DC power supply to the electrode of the electrostatic chuck; cutting off connection between the first DC power supply and the electrode of the electrostatic chuck; and generating the plasma within the processing chamber by applying the high frequency power to the base in a state that the connection between the first DC power supply and the electrode of the electrostatic chuck is cut off.
    Type: Grant
    Filed: September 3, 2014
    Date of Patent: November 1, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Manabu Iwata, Yasuharu Sasaki
  • Patent number: 9478948
    Abstract: The present invention provides methods and systems for an ion generator mounting device for application of bipolar ionization to airflow within a conduit, the device includes a housing for mounting to the conduit having an internal panel within the enclosure, and an arm extending from the housing for extension into the conduit and containing at least one opening. At least one coupling for mounting an ion generator to the arm oriented with an axis extending between a pair of electrodes of the ion generator being generally perpendicular to a flow direction of the airflow within the conduit.
    Type: Grant
    Filed: September 22, 2015
    Date of Patent: October 25, 2016
    Assignee: Global Plasma Solutions, LLC
    Inventor: Charles Houston Waddell
  • Patent number: 9463472
    Abstract: A separator unit having a panel-shaped separator electrode on which at least one separator surface is formed for the overspray. A feed device ensures that a separator liquid can be fed to the separator surface of the separator electrode. It has a channel that can be filled with the separator liquid, and a removal device which can remove separator liquid from the channel. The latter includes a shape-changing, flexible and/or elastic expansion element arranged in the channel, which at least partially delimits a closed cavity. The removal device includes a pump device with which a pressure medium can be pushed into the closed cavity. As a result of the volume expansion of the closed cavity when “pumping up” said expansion element, separator liquid is displaced over the edges of the channel and from here it can be conducted onto the separator surface of the separator electrode in a suitable manner.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: October 11, 2016
    Assignee: EISENMANN SE
    Inventor: Juergen Roeckle
  • Patent number: 9301563
    Abstract: An pressure sensing glove in which at least five, preferably at least seven and most preferably at least nine pressure sensors are intrinsic to the glove manufacture, usually sandwiched between layers of the glove. Between five to nine pressure sensors are positioned throughout the glove, and the pressure sensors themselves may be capacitive sensors, piezoelectric sensors, air filled bladder pressure sensors in communication with hollow tubes further connected to electronic pressure sensors, or any other sensor known in the art.
    Type: Grant
    Filed: February 7, 2013
    Date of Patent: April 5, 2016
    Assignee: Nova Diagnostics, LLC
    Inventors: Timothy J. Hardy, Nicholas G. Datyner
  • Patent number: 9236211
    Abstract: An electrode for dielectric barrier discharge treatment of a substrate includes a tubular housing that is made of electrically insulating material and has a bottom wall facing the substrate, two side walls extending away from the substrate, and a top wall connecting the distal ends of the side walls. The electrode further includes an electrically conductive electrode member disposed inside the housing and having a plate that engages an internal surface of the bottom wall of the housing. The electrode has two wings formed in one piece with the plate and engaging internal surfaces of the side walls of the housing.
    Type: Grant
    Filed: October 23, 2014
    Date of Patent: January 12, 2016
    Assignee: OCE-TECHNOLOGIES B.V.
    Inventor: Herman Kuypers