Abstract: A charging device comprises first and second electrodes forming a charging zone. A plurality of nanostructures adhere to at least one of the first and second electrodes. A charging voltage supply couples to the electrodes to support the formation of gaseous ions in the charging zone. An aperture electrode or grid proximate to the first and second electrodes is coupled to a grid control voltage supply which grid control voltage supply, in turn, controls a flow of gaseous ions from the charging zone to thereby charge a proximately-located receptor. In one embodiment, the charging voltage supply is arranged to provide a pulsed-voltage waveform. In one variation of this embodiment, the pulsed-voltage waveform comprises a pulsed-DC waveform. In another embodiment, the charging voltage supply is arranged to provide an alternating-current waveform. In one embodiment, the charging device itself is comprised in an image forming device.

Abstract: To provide an electrostatic holding apparatus which is capable of performing handling for a long period of time even when a direct current high-voltage power supply is separated from the electrostatic holding apparatus. The electrostatic holding apparatus holds a workpiece to be held with an electrostatic force by applying prescribed voltages from the direct current high-voltage power supply to a plurality of electrode groups having the electrode groups as a holding section. The electrostatic holding apparatus is provided with an electrode potential drop modifying apparatus which modifies drops of potentials applied to the electrode groups by being separated from the direct current high-voltage power supply by switches. The electrode potential drop modifying apparatus includes, for instance, capacitors.

Abstract: An electrostatic chuck device provided with a dielectric plate with a surface embossed to give it a plurality of projections, an electrode, and an external power source, wherein substrate supporting surfaces of the plurality of projections are covered by conductor wiring and the conductor wiring electrically connects the substrate supporting surfaces of the plurality of projections. At the time of substrate processing, when the embossed projections contact the back of the substrate, the back of the substrate and the conductor wiring is made the same in potential due to the migration of the charges, the generation of force between the back of the substrate and the conductor wiring being in contact with the same is prevented, and a rubbing state between the two is prevented. Due to this, the electrostatic chuck device reduces the generation of particles, easily and stably removes and conveys substrates, and realizes a high yield and system operating rate.

Abstract: A method and apparatus for correcting overlay errors in a lithography system. During lithographic exposure, features being exposed on the wafer need to overlay existing features on the wafer. Overlay is a critical performance parameter of lithography tools. The wafer is locally heated during exposure. Thermal expansion causes stress between the wafer and the wafer table, which will cause the wafer to slip if it exceeds the local frictional force. To increase the amount of expansion allowed before slipping occurs, the wafer chuck is uniformly expanded after the wafer has been loaded. This creates an initial stress between the wafer and the wafer table. As the wafer expands due to heating during exposure, the expansion first acts to relieve the initial stress before causing an opposite stress from thermal expansion. The wafer may be also be heated prior to attachment to the wafer chuck, creating the initial stress as the wafer cools.

Abstract: A high voltage generating circuit includes a boosting portion (e.g., a trigger coil (22)) for boosting DC voltage delivered from a DC power supply (26) so as to deliver high voltage at a secondary side, a switching element (e.g., a MOSFET (23)) for turning on and off current flowing in the primary side of the boosting portion, and a pulse signal generating portion (24B) for generating a pulse signal for controlling on and off of the switching element.

Abstract: An electron emitting element of the present invention includes an electron acceleration layer between an electrode substrate and a thin-film electrode. The electron acceleration layer includes a binder component in which insulating fine particles and conductive fine particles are dispersed. Therefore, the electron emitting element of the present invention is capable of preventing degradation of the electron acceleration layer and can efficiently and steadily emit electrons not only in vacuum but also under the atmospheric pressure. Further, the electron emitting element of the present invention can be formed so as to have an improved mechanical strength.

Abstract: An electron emitting element of the present invention includes an electron acceleration layer provided between an electrode substrate and a thin-film electrode, which electron acceleration layer includes (a) conductive fine particles and (b) insulating fine particles having an average particle diameter greater than that of the conductive fine particles. The electron emitting element satisfies the following relational expression: 0.3x+3.9?y?75, where x (nm) is an average particle diameter of the insulating fine particles, and y (nm) is a thickness of the thin-film electrode 3. Such a configuration allows modification of the thickness of the thin-film electrode with respect to the size of the insulating particles, thereby ensuring electrical conduction and allowing sufficient current to flow inside the element. As a result, stable emission of ballistic electrons from the thin-film electrode is possible.

Abstract: A support for a substrate processing chamber comprises a fluid circulating reservoir comprising a channel having serpentine convolutions. A fluid inlet supplies a heat transfer fluid to the fluid circulating reservoir and a fluid outlet discharges the heat transfer fluid. In one version, the channel is doubled over to turn back upon itself.

Abstract: An ion generator is provided which includes a discharge electrode, a ground electrode and vitamins housed in the discharge electrode which is adapted to be installed inside a discharge outlet of an air conditioner. A power supply for applying power is connected to the discharge electrode. A reservoir for storing water generated in the heat exchanger of the air conditioner supplies water to the discharge electrode. The water housed in the reservoir is transferred to the discharge electrode. The vitamins housed in the discharge electrode are dissolved in the water, exposed to the surface of the discharge electrode and discharged in the direction of the ground electrode by power applied to the discharge electrode. The discharged vitamin ions are externally discharged from the air conditioner by a ventilator of the air conditioner. The vitamin C ions are coupled with the electrons from the discharge electrode.

Abstract: A bar type ionizer has a discharging electrode, a ground electrode, a high voltage unit, and a controller unit and uses the technique of eliminating static electricity by corona discharging. The ionizer also has a FND unit mounted on the bar which lets the user see the bar information including address of the bar, frequency, duty rate, alarm, run/stop state easily, plus buttons that let the user control the bar information easily, an air supply device installed around the needles in the air injecting socket which sends air, and a second air supply device installed around the needles having round sections and sending air to the end of the needles to eliminate the dust attached on the end of the needles. The ionizer has a streamlined section so that inside air flows smoothly. The second air supply device is elliptic with the minor axis smaller than the radius of the needle. The needle is positioned at the center of this elliptic groove and fixed by it.

Abstract: Method for handling a substrate with polarizable molecules including providing a carrier with a first junction electrode and disposing the substrate between the first junction electrode and a second junction electrode. Fixing the substrate on the carrier is achieved by applying a voltage between the first junction electrode and the second junction electrode, so that the polarizable molecules are polarized. After removing the second junction electrode, the substrate remains fixed on the carrier.

Abstract: A substrate holding system including a substrate attracting device, an exhausting device, and a control device to operate the exhausting device so that a pressure around the substrate and a pressure at an interval between the substrate and the substrate attracting device are lowered to a first pressure and that only the pressure at the interval is subsequently lowered to a second pressure, which is lower than the first pressure.

Abstract: An apparatus and method for monitoring the output of an ionizing blower. A measuring channel captures a portion of the air ion stream, and measures balance plus air ion current. Since the measurement channel is isolated from extraneous electrostatic fields, measurements contain less analytical noise. Air flow through the measurement chamber is created by the inherent pressure difference between the high pressure and low pressure sides of an air mover. Two electrodes inside the measurement chamber are combined with a power supply, a low current amplifier, and a controller. The controller also makes adjustments to the ionizing blower.

Abstract: A strip-shaped emitter electrode including at least one emission edge extending along the length of such emitter electrode. When the strip-shaped emitter electrode is coupled to a voltage supply, current or an electrical charge at the emission edge ionizes the air and generates corona discharge, resulting in ion production. Erosion occurs at the emission edge such that the lifespan of the strip emitter electrode is dependent, at least in part, on the width of the strip emitter electrode.

Abstract: An electrostatic chuck device provided with a dielectric plate with a surface embossed to give it a plurality of projections, an electrode, and an external power source, wherein substrate supporting surfaces of the plurality of projections are covered by conductor wiring and the conductor wiring electrically connects the substrate supporting surfaces of the plurality of projections. At the time of substrate processing, when the embossed projections contact the back of the substrate, the back of the substrate and the conductor wiring is made the same in potential due to the migration of the charges, the generation of force between the back of the substrate and the conductor wiring being in contact with the same is prevented, and a rubbing state between the two is prevented. Due to this, the electrostatic chuck device reduces the generation of particles, easily and stably removes and conveys substrates, and realizes a high yield and system operating rate.

Abstract: A cleaning apparatus comprises a housing, a driving mechanism and a plurality of cleaning elements. The driving mechanism is disposed in the housing. The cleaning elements are connected to the driving mechanism. The driving mechanism rotates the cleaning elements to clean the emitters.

Abstract: The present invention is a method of controlling the electric field in a corona wind fan to eliminate sparks and thereby increase the operating window and mechanical output of the device. A corona wind device moves a gas using ions that are generated by two electrodes. The electric field in a corona wind system is highly non-uniform. An intense field, of limited size, is needed to generate ions. It is desirable for the remainder of the system to be at as low a field as possible so as to prevent sparks from forming between electrodes. A contoured collector electrode creates this desirable electric field over most of a corona wind device. However, the electric field at the edges and ends of a contoured collector remain as weak points in the device. If not addressed, sparks will form prematurely at these points limiting the overall performance. Several methods to control the field at these points were developed.

Abstract: At least one orifice is added to an AC ionizer with nozzles and ionizing electrodes that are used to remove static charge. The orifice is placed in a location where electrostatic forces are weak and where gas ions can be easily extracted from the ionizer. Ionizer effectiveness is enhanced by recovering gas ions that are normally trapped between the nozzles and under a portion of the ionizer from which the nozzles project. Without the orifice properly positioned, the trapped gas ions are lost by recombination or grounding. With the orifice positioned in an area of weak electrostatic forces, more gas ions are available for discharging the charged object. The combined air consumption of nozzles plus at least one orifice is the same or less than nozzles alone would consume for a given discharge time.

Abstract: An ion generating device generates O2?(H2O)n (where n is a natural number) as negative ions and H+(H2O)m (where m is a natural number) as positive ions, and discharges those ions into the air so that airborne germs are killed through an oxidation reaction by hydrogen peroxide H2O2 or radical hydroxyl OH generated through as an active species a chemical reaction between the negative and positive ions. Satisfactory sterilization is achieved when the negative and positive ions are generated in such a way that the concentrations of the negative and positive ions are both 10,000 ion/cc at a distance of 10 cm from the point at which they are generated.

Abstract: The present invention discloses an electrostatic chuck for clamping work substrates, said chuck comprising three layers, where the dielectric constant of included non-conductive layers is selected to provide overall lower capacitance to the chuck. In the chuck assembly of the present invention, the top dielectric layer that is in contact with a substrate, such as, a wafer, has a dielectric constant that is preferably greater than about 5, with a resistivity that is preferably greater than about 1E6 ohm.m, whereas the bottom dielectric layer has a dielectric constant that is preferably less than about 5 and a resistivity that is preferably greater than about 1E10 ohm.m. The intermediate layer preferably has a conductive layer where the resistivity is less than about 1 ohm.m.

Abstract: An electrostatic chuck for attracting and holding a substrate by using an electrostatic force includes a plurality of protrusion portions to be brought into contact with the substrate. The protrusion portions are formed of a ceramic dielectric including grains each having a specified particle diameter, and contact surfaces of the protrusion portions with the substrate are formed to have a surface roughness depending on the particle diameter.

Abstract: A substrate holding system for holding a substrate based on vacuum attraction and electrostatic attraction including a rim configured to support the substrate, a protrusion for the electrostatic attraction, configured to support the substrate inside the rim, and a protrusion for the vacuum attraction, configured to support the substrate inside the rim. A substrate supporting surface area of the protrusion of the electrostatic attraction is larger than a substrate supporting surface area of the protrusion for the vacuum attraction.

Abstract: A negative ion generating device includes a housing having a number of water flowing passages, a number of electrically conductive boards engaged with sockets of the housing and electrically coupled to negative and conductive electricity respectively and disposed alternatively with each other for generating an electromagnetic field in the water, a copper plate is disposed in the housing and disposed above the electrically conductive boards for attracting and removing positive ions and for generating negative ions, and a processor device coupled to the conductive boards for receiving signals and for controlling the conductive boards.

Abstract: An electronic weapon system includes a terminal for a local stun function, a deployment unit for a remote stun function, and a barrier, removal of which during deployment enables a circuit for the remote stun function that includes the terminal.

Abstract: An ion generating element (10) has at least one first discharger (12) for generating positive ions and at least one second discharger (13) for generating negative ions, both fitted or printed on a single dielectric member (11). The first and second dischargers (12) and (13) are each composed of a pair of a first or second discharging electrode (12a) or (13a), respectively, formed on the surface of the dielectric member (11) and a first or second induction electrode (12b) or (13b), respectively, buried in the dielectric member (11), and are arranged both on the same flat surface of the dielectric member (11) but separately from and independently of each other. This construction helps to alleviate the neutralization among the generated ions themselves, thus to effectively release both positive and negative ions, and thereby to enhance the ion generation efficiency.

Abstract: An ion generating component includes, on an insulating substrate, a ground electrode, a high-voltage electrode, an insulating film on the surface of the ground electrode, and a linear electrode. The ground electrode is disposed at the outer region of the insulating substrate and includes a pair of legs, which are substantially parallel to the linear electrode, which is disposed between the legs. The ground electrode further includes a contact portion in contact with a terminal and an insulating casing contact portion in contact with the upper resin casing. The insulating film is disposed on substantially the entire surface of the insulating substrate so that the high-voltage electrode, the contact portion, and the insulating casing contact portion of the ground electrode remain uncovered.

Abstract: The ion chip operating module allows for the inevitable ionizing electrode erosion by high voltage ionization of the prior art ion chip, by extending its life, improving its performance and maintenance. A ionizing module is provided which lengthens the life of its ionizing structure by providing more ionizing electrodes, which usually operate sequentially, and also allows replacement of an exhausted module by a fresh one. The ionizing electrodes are provided by ionizing needles, conductive carbon coated fibers and mixtures thereof. The carbon coated fibers when in brush form present a very large number of potential ionizing electrodes. The module is a metal plate with the ionizing structure on one side and a pin adapted to engage a socket on the other. The advantage of injecting negative ions into air conditioning systems to enhance air quality by increasing negative ions and by precipitating particulate contaminants is known.

Abstract: An electrostatic chuck device provided with a dielectric plate with a surface embossed to give it a plurality of projections, an electrode, and an external power source, wherein substrate supporting surfaces of the plurality of projections are covered by conductor wiring and the conductor wiring electrically connects the substrate supporting surfaces of the plurality of projections. At the time of substrate processing, when the embossed projections contact the back of the substrate, the back of the substrate and the conductor wiring is made the same in potential due to the migration of the charges, the generation of force between the back of the substrate and the conductor wiring being in contact with the same is prevented, and a rubbing state between the two is prevented. Due to this, the electrostatic chuck device reduces the generation of particles, easily and stably removes and conveys substrates, and realizes a high yield and system operating rate.

Abstract: An electrostatic chuck device includes an electrostatic chuck section including a substrate and a power supply terminal for applying a DC voltage to an electrostatic-adsorption inner electrode; and a metal base section fixed to the other main surface of the electrostatic chuck section. Here, a concave portion is formed in the main surface of the metal base section facing the electrostatic chuck section and a dielectric plate is fixed to the concave portion. The dielectric plate and the electrostatic chuck section are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric plate and the concave portion are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric constant of the insulating adhesive bonding layer is smaller than that of any one of the dielectric plate and the substrate.

Abstract: The present invention is relating to an ion generator and an ionizer, in which the ion generator can obtain stable ion generation even if the electrode and the power supply slightly change, satisfies voltage and frequency conditions for realizing an ozone concentration less than 50 ppb as an allowable concentration.

Abstract: A plasma etch process for etching a dielectric material employing two primary etchants at low flows and pressures, and a relatively low temperature environment within the etch chamber. The two primary etchant gases are CHF3 and CH2F2, delivered at flow rates on the order of between about 10 sccm and 40 sccm for CHF3 and between about 10 sccm and 40 sccm for CH2F2. Small quantities, on the order of 10 sccm or less, of other gases such as C2HF5 and CF4 may be added.

Abstract: An ionizer is formed by coupling a fan unit provided with a discharge electrode and a fan and a control unit provided with an indicator and an adjuster to each other, and both units are changeable between a normal coupling condition, where both are directed in the same direction, and an opposite coupling condition, where they are directed in opposite directions to each other, and in addition, a power/signal arrangement of the connection terminals of the separate connector is bilaterally symmetrical such that same power and signals ale transmitted and received between the separate connectors of both units connected to each other in either coupling condition of aforementioned both units.

Abstract: An apparatus is provided to improve clamping of a work piece to a support surface. The apparatus includes a support base, an insulator layer disposed on the support base, an electrode layer disposed on the insulator layer, and a clamping layer comprising aluminum oxynitride disposed on the electrode layer wherein the workpiece is clamped to the surface of the clamping layer. The apparatus provides a higher clamping force for the workpiece while reducing gas leakage and particle levels in addition to maintaining a declamping time suitable for high throughput processing. The apparatus may further provide a raised surface geometry or embossments on the dielectric or a dielectric comprising an outer ring a center cavity for reducing particle contamination to the backside of the workpiece.

Abstract: An electron bombardment heating apparatus, in which thermions emitted from filaments are accelerated and impinge upon a heating plate, so as to heat the heating plate, wherein a peripheral wall of a heated material supporting member having a heating plate as a ceiling thereof is made of multi-staged peripheral wall portions, positioned vertically and having a different radius, and those peripheral wall portions are connected with each other by means of a ring-like horizontal wall. With this, thermal stress can be mitigated, which is caused due to a difference in temperature between the lower end portion of the heated material supporting member and the heating plate when heating up the heating plate, thereby causing no breakage in the heated material supporting member when conducting heating and cooling upon the heating plate, repetitively.

Abstract: An electrostatic chuck having a good soaking feature and allowing a wafer to reach a saturation temperature quickly is provided. The chuck, which has a platy body with a pair of main surfaces, one main surface being used as a mounting surface for mounting a wafer, and an attracting electrode on the other main surface or inside the body, has at least one gas introducing through hole formed so as to pass through the body, a gas flow path formed in the mounting surface by a plurality of mutually separated protrusions and formed so as to communicate with the through hole, and an annular wall portion formed on the outer periphery of the body, characterized in that the planar shape of each of the above protrusions consists of four sides and arc-shaped portions connecting the four sides, and the above protrusions are uniformly arranged on the mounting surface.

Abstract: A method for removing a substrate that is attached to a bipolar electrostatic chuck (ESC) by application of a bipolar ESC voltage is provided which includes discontinuing the bipolar ESC voltage after processing a current substrate, and determining a monopolar component error of the processing. The method also includes correcting the monopolar component error for a subsequent substrate.

Abstract: Disclosed is a multi-frequency electromagnetic field generator that is capable of generating electromagnetic flux fields that are projected at a distance from the device. Radial fields, horizontal fields and spiral fields are generated by the electromagnetic field generator and are projected at a distance from the device. A wide range of frequencies is generated as a result of the fast rise time pulses produced by the device. The geometry and structure of the device cause the electromagnetic fields to encircle the device and be collected at the far end of the device by an antenna. An inner coil antenna, that is centrally disposed in the device, receives electromagnetic waves that are transformed into a current that is applied to an inner coil. The inner coil produces a strong electromagnetic field that extends outwardly in a horizontal direction that increases the projected horizontal distance of the electromagnetic field.

Abstract: An electrostatic chuck structure according to example embodiments of the present invention may include at least one specific region of a conductor having a thickness relatively smaller than those of other regions, at least one specific region of a dielectric having a thickness relatively larger than those of other regions, or at least one specific region of a conductor having a thickness relatively smaller than those of other regions and at least one specific region of a dielectric having a thickness relatively larger than those of other regions. Therefore, etching rate and CD uniformity can be improved during a semiconductor manufacturing process.

Abstract: An electrostatic chuck includes a ceramic base having an electrode embedded in vicinity to a holding face for holding a substrate. On a back side of this ceramic base, provided are a terminal connected to the electrode, a wafer temperature control member, and an insulating member for insulating the temperature control member from the terminal. This insulating member has a flange portion on its end portion in contact with the ceramic base, and is made of highly thermal conductive ceramics.

Abstract: In the plasma processing apparatus including a processing chamber for plasma-processing a processed substrate, plasma generating unit that generates plasma in the processing chamber, and a wafer stage which is mounted in the processing chamber and has an electrostatic chuck for holding the processed substrate, a current detector that detects a current value of leakage current flowing in a circuit formed of a power supply for electrostatic attraction, an electrostatic chuck, a substrate, plasma, a grounded line, and a controlling unit which sets an attraction condition to the current value and controls the applied voltage so that the leakage current reaches the set current value are included.

Abstract: The ion chip operating module allows for the inevitable ionising electrode erosion by high voltage ionisation of the prior art ion chip, by extending its life, improving its performance and maintenance. A ionising module is provided which lengthens the life of its ionising structure by providing more ionising electrodes, which usually operate sequentially, and also allows replacement of an exhausted module by a fresh one. The ionising electrodes are provided by ionising needles, conductive carbon coated fibres and mixtures thereof. The carbon coated fibres when in brush form present a very large number of potential ionising electrodes. The module is a metal plate with the ionising structure on one side and a pin adapted to engage a socket on the other. The advantage of injecting negative ions into air conditioning systems to enhance air quality by increasing negative ions and by precipitating particulate contaminants is known.

Abstract: A static eliminator capable of replacing a discharge needle and improving maintainability of the eliminator is disclosed. The static eliminator comprises: an air-guiding duct having a tubular portion provided with an outer electrode and a boss portion; and an electric discharge module detachably mounted on the tubular portion, wherein ionized air is supplied to the air-guiding duct by a fan of an air blower. The electric discharge module has a holder fitted in a boss portion and a plurality of discharge electrodes attached to the holder so as to protrude toward the outer electrode in an outer-radial direction. When foreign substances or the like adhere to a tip of the discharge electrode or when the discharge electrode deteriorates, the electric discharge module is detached from the boss portion.

Abstract: A structure for reducing or eliminating electrostatic discharge from a finger into the platen of a biometric sensor is disclosed. The structure is designed to be positioned above and around the platen such that conductive components in the structure stimulate corona discharge and dielectric breakdown from an approaching finger into the conductive components of the structure rather than into the platen itself. The structure is designed to eliminate, reduce or otherwise neutralize the charge on an approaching finger prior to the finger coining into contact with the platen of the biometric sensor and prior to the finger coming close enough to the platen so that the electrostatic discharge causes an are to strike the platen.

Abstract: A method and apparatus for correcting overlay errors in a lithography system. During lithographic exposure, features being exposed on the wafer need to overlay existing features on the wafer. Overlay is a critical performance parameter of lithography tools. The wafer is locally heated during exposure. Thermal expansion causes stress between the wafer and the wafer table, which will cause the wafer to slip if it exceeds the local frictional force. To increase the amount of expansion allowed before slipping occurs, the wafer chuck is uniformly expanded after the wafer has been loaded. This creates an initial stress between the wafer and the wafer table. As the wafer expands due to heating during exposure, the expansion first acts to relieve the initial stress before causing an opposite stress from thermal expansion. The wafer may be also be heated prior to attachment to the wafer chuck, creating the initial stress as the wafer cools.

Abstract: An apparatus for generating atmospheric-pressure plasma includes: a substrate; an antenna arranged on the substrate; a discharge tube arranged in the vicinity of the antenna; a high-frequency power supply for supplying VHF band high-frequency power to the antenna; and a matching circuit for receiving a high frequency from the high-frequency power supply and adjusting a reflection wave. In this apparatus for generating atmospheric-pressure plasma, a phase circuit is connected between the matching circuit and the antenna, and the phase circuit has a circuit constant setting such that a position of a maximum value of a current amplitude of a standing wave or a position of a minimum value of a voltage amplitude of the standing wave is in the vicinity of the antenna. This configuration can efficiently generate plasma and reduce the size of the apparatus.

Abstract: An electrostatic chuck assembly having a dielectric material and/or having a cavity with varying thickness, profile and/or shape is disclosed. The electrostatic chuck assembly includes a conductive support and an electrostatic chuck ceramic layer. A dielectric layer or insert is located between the conductive support and an electrostatic chuck ceramic layer. A cavity is located in a seating surface of the electrostatic chuck ceramic layer. An embedded pole pattern can be optionally incorporated in the electrostatic chuck assembly. Methods of manufacturing the electrostatic chuck assembly are disclosed as are methods to improve the uniformity of a flux field above a workpiece during a plasma processing process.

Abstract: A voltage converter having a sealed case, a pair of opposing, spaced apart planar electrodes located within the sealed case, a pack of porous dielectric powder filled between the planar electrodes, and an auxiliary electrode electrically connected to one of the planar electrodes and having a portion extending through the pack of porous dielectric powder toward the other planar electrode. When a DC high voltage is applied to one of the planar electrodes, a DC source voltage containing a specific pulsating component is outputted from the other planar electrode.

Abstract: A surface discharge type air cleaning device including an insulating dielectric body formed in the shape of a sheet, a discharge electrode formed at the upper surface of the insulating dielectric body, and a ground electrode formed at the lower surface of the insulating dielectric body. The discharge electrode is formed of a closed pattern having a predetermined area on the upper surface of the insulating dielectric body. The discharge electrode has a non-pattern part disposed in a pattern part where the pattern is formed. The electrode is not formed at the non-pattern part. The ground electrode is formed at a predetermined position corresponding to the non-pattern part. The area of the non-pattern part is reduced to decrease generation of ozone, and the area of the pattern part is enlarged to increase generation of negative ions and hydroxyl radicals.

Abstract: A stage system includes a fine-motion stage on which a substrate holding member for holding a substrate is mounted, a rough-motion stage on which the fine-motion stage is mounted, a stage for supporting and moving a substrate, and a probe configured to measure a potential of the substrate without contact thereto, the probe being supported by the rough-motion stage so as to be opposed to one of a bottom face and a side face of the substrate.

Abstract: An electrode for atmospheric corona discharge apparatus provide a passive conductor whose surface is decorated with nanostructures such as carbon nanotubes. The nanotubes provide for a lower corona discharge initiation voltage and raise the possibility for reduced ozone production on corona discharge devices.