Abstract: A line narrowed ultraviolet laser having a line narrowing system which includes a grating and an all reflective beam expander. In a preferred embodiment, the beam expander consists of a relatively small circular cylindrical mirror and relatively larger elliptical cylindrical mirror and the grating is an eschelle grating mounted in a Littrow configuration.

Abstract: An excimer laser system having a precisely calibratable absolute emission wavelength is provided wherein at least one source of reference light is used. The reference light may be a laser such as a HeNe laser or a cathode lamp such as a hollow Pt, As, C, or Fe cathode lamp. The reference light and the excimer laser beam are directed along substantially the same optical path. The beams are broadened and recollimated by beam expanding optics. The broadened beams impinge upon a dispersive element, preferably an echelle grating, and various orders for each incident wavelength are dispersed. The beams are refocused onto a position sensitive detector such as a CCD camera. Different orders of one or more lines of known wavelength of the reference light and a line from the excimer laser emission are also incident at the detector simultaneously.

Abstract: To restrain nonuniformity of irradiation when a linear laser beam is irradiated by scanning the beam, linear laser pulses are irradiated by scanning the pulses in an oblique direction by which irradiation is carried out without overlapping peaks periodically present in the longitudinal direction of the linear laser beam and accordingly, nonuniformity of irradiation can be restrained.

Abstract: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor.

Abstract: An F.sub.2 -laser has a discharge chamber containing a laser gas mixture including fluorine as a laser active component and neon as a buffer gas. The gas mixture is surrounded by a resonator and supplied with a pulsed discharge by a pair of electrodes connected to a power supply circuit. The concentration of neon within the gas mixture is preferably higher than any other constituent gas, and is more preferably the only gas accompanying the laser active molecular fluorine. In addition, the gas mixture is preferably maintained at an elevated temperature such as near, yet below, a temperature at which outgassing occurs within the discharge chamber.

Abstract: A molecular fluorine (F.sub.2) laser is provided wherein the gas mixture comprises molecular fluorine for generating a spectral emission including two or three closely spaced lines around 157 nm. An etalon provides line selection such that the output beam only includes one of these lines. The etalon may also serve to outcouple the beam and/or narrow the selected line. Alternatively, a prism provides the line selection and the etalon narrows the selected line. The etalon may be a resonator reflector which also selects a line, while another element outcouples the beam. The etalon plates, preferably uncoated, comprise a material that is transparent at 157 nm, such as CaF.sub.2, MgF.sub.2, LiF.sub.2, BaF.sub.2, SrF.sub.2, quartz and fluorine doped quartz. The etalon plates are separated by spacers comprising a material having a low thermal expansion constant, such as invar, zerodur.RTM., ultra low expansion glass, and quartz. A gas such as helium or a solid such as CaF.sub.

Abstract: An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F.sub.2 "sweet spot" in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines .DELTA.E/.DELTA.V, the change of pulse energy with voltage, and automatically and precisely controls the fluorine concentration based on .DELTA.E/.DELTA.V without the need to actually measure the fluorine concentration.

Abstract: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

Abstract: A gas laser outputs a prescribed high power from the start of laser oscillation immediately after the laser gas is changed. The laser, in which used laser gas in a laser chamber (1) is replaced with a fresh laser gas, is provided with: a gas leaving means, which leaves a prescribed amount of used gas for mixing with the fresh laser gas during laser gas replacement, or an impurity gas adding means which provides a prescribed amount of impurity gas for mixing with the fresh laser gas; and a controller (11). It is preferable that the concentration of the used gas after a replacement is within a range of 1.5-60%. The gas leaving means can be a gas discharge control mechanism (10), which controls the amount of used gas exhausted so that a prescribed amount of used gas can be left for mixing with the fresh gas, or a laser gas container (21), which can provide a prescribed amount of stored used gas for mixing with the fresh gas.

Abstract: A tangential fan and cutoff assembly for recirculating a lasing gas mixture has blade members, which vary in circumferential position stepwise from end to end, and/or a tapered anode assembly. The number of blade members can be constant or variable between ends. The circumferential position of blade members can shift monotonically or reversibly between ends. Blade members are stiffened by optimally selecting the number and placement of hub members to control the natural vibration frequency of the fan. Methods of forming tangential fans include casting, and machining from a solid block. Monolithic structures can be joined, typically by electron-beam welding. Casting, welding, and machining processes introduce no additional contaminants. Tangential fans produced have mechanical rigidity, accurate tolerances, and low contaminant concentrations. Blade members can be formed into air foil shapes.

Abstract: A durable etalon based laser output coupler. The output coupler is especially useful for ultraviolet lasers such as an ArF excimer laser or an F.sub.2 laser. The principal elements of the etalon based output coupler are two prisms aligned so that a first surface of one of the two prisms is parallel to a first surface of the other prism. The first of the two prisms have a second surface forming an angle with a beam from a laser cavity equal to or approximately equal to Brewster's angle. The second of the two prisms has a second surface forming an angle with the coupler exit beam equal to or approximately equal to Brewster's angle. Preferably, the prisms are comprised of CaF.sub.2 and surrounded by nitrogen at about one atmosphere. Assuming the laser beam is at a wavelength of 193 nm (for ArF excimer laser), Brewster's angle is about 57 degrees and each of the first and second surfaces define an apex angle of about 34 degrees.

Abstract: In an excimer laser apparatus in which halogen gas, rare gas and buffer gas are fed into the laser chamber, before laser oscillation, the oscillation stop time is calculated, and, if the calculated oscillation stop time exceeds a prescribed time, the calculated oscillation stop time is used to calculate a feeding amount of mixed gas comprising rare gas or buffer gas, and the mixed gas is fed, prior to laser oscillation, in the calculated feeding amount; stable laser output is thereby obtained from the initial period of laser oscillation.

Abstract: The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0.6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control.

Abstract: A system for providing support for the movement of a laser chamber of a laser system during the installation and removal of the laser chamber from the laser system housing. The system includes a rail assembly that is retractable and extendible from the laser system housing and provides support for moving the laser chamber between an operating position within the housing and a position outside of the housing for removal. The rail assembly is retractable to reside within the housing when not in use. The system may also include at least one actuator for controlling the movement of the laser chamber in a direction having a vertical component. Actuator types that may be used include rotary, piston cylinder, hydraulic, pneumatic, and/or electrical mechanical. One type of rail assembly includes opposing rail structures that retract and extend by moving laterally out from the housing or by pivoting out from the housing. The system may be implemented with a gas laser system such as an excimer laser system.

Abstract: The present invention provides an electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported by an active radial magnetic bearing system and driven by a brushless DC motor in which the rotor of the motor and the rotors of at least two radial bearings are sealed within the gas environment of the laser cavity and the motor stator and the coils of the bearing magnets are located outside the gas environment. No thrust bearing is provided. Axial positioning of the shaft is provided by reluctance centering produced by the at least two radial magnetic bearings and the brushless DC motor. In a preferred embodiment the motor stator is larger in the axial direction than the rotor to increase the magnetic centering effect.

Abstract: An improved excimer laser is disclosed. In one embodiment, the laser includes laser beam generating circuitry operable to generate a laser beam and a vessel enclosing the laser beam generating circuitry. The vessel contains a volume of gas conducive to the formation of the laser beam by the laser beam generating circuitry. The vessel has a wall with a beam aperture formed therein to permit the laser beam generated by the laser beam generating circuitry to pass through it. A window mount assembly is attached to the wall of the vessel. The window mount assembly encloses a beam cavity and has a window that transmits the laser beam. The window is positioned at a first, closed end of the beam cavity. The beam cavity has a second, open end adjoining the beam aperture formed in the vessel wall. The beam cavity has a lateral surface extending between the first and second ends. A plenum lies outside the beam cavity. A gas handling system extracts the gas from the vessel and provides the gas to the plenum.

Abstract: An excimer laser with optical pulse multiplication. A pulse multiplier optical system receives the laser output beam and produces a multiplier output beam having a larger number of pulses, each with substantially reduced intensity values as compared to the laser output beam. The present invention is particularly important as an improvement to the ArF excimer laser to reduce two-photon absorption damage to optical equipment in lithography machines. For damage mechanisms involving two-photon processes, such as the compaction and solarization of fused silica in the DUV spectral region, a factor of 4 reduction in peak power decreases the quantity of two photon absorption damage done by the synthesized 4-pulse burst by a factor of about 16 compared to delivering all of the energy in the single pulse emitted by the laser.

Abstract: Dispersion of energy density in the longitudinal direction of excimer laser shaped into a linear beam is corrected. A gas introducing system which extends in the longitudinal direction of an oscillator and which is provided with a large number of gas injecting holes is provided within the oscillator. It allows to suppress dispersion of laser oscillating positions and to suppress the dispersion of irradiation energy density within the linear laser beam.

Abstract: A tangential fan for recirculating a lasing gas mixture has blade members, which vary in circumferential position stepwise from end to end. The number of blade members can be constant or variable between ends. The circumferential position of blade members can shift monotonically or reversibly between ends. Blade members are stiffened by one or more transverse annular hub members. A method of forming a tangential fan involves forming monolithic structures by casting or by machining from a solid block. Two or more monolithic structures can be joined together, typically by electron-beam welding. Casting, welding, and machining processes introduce no additional contaminants. Tangential fans produced have mechanical rigidity, accurate tolerances, and low contaminant concentrations. Methods provided by the invention facilitate forming of blade members into an air foil shape. Finishing processes typically include post-machining, electropolishing, and electroless nickel coating.

Abstract: A new cartridge excimer laser system and method for generating an excimer laser beam using the system are provided. The system utilizes a cartridge (10) which contains a halogen-noble gas mixture (19), electrodes (50, 60) having external electrical connections (30, 40), and assembly (20) for transmitting a laser beam output (400), and an external gas port (90). The cartridge (10) fits onto a receptacle (100) located within a receiving compartment (200) of the laser base (300) of the new system. The cartridge (10) is easily replaced by the system operator and is refurbished by the manufacturer when the gas mixture (19) therein is exhausted.

Abstract: Excimers are generated by directing an electron beam at about 5 KeV to about 40 KeV into an excimer forming gas such as He, Ne, Ar, Kr, and Xe or mixtures of these with other gases through a ceramic foil such as SiN.sub.x. Vacuum ultraviolet (VUV) light is emitted by the excimers or by other species in contact therewith. The invention can provide intense, continuously operable broadband or monochromatic VUV light sources.

Abstract: A gas discharge laser with fast response gas temperature control to maintain laser gas temperature within desired limits during burst mode operation. Preferred embodiments include a passive temperature stabilizer having fins with surface areas exposed to flowing laser gas at least equal to the surface area of the cooling fins of a laser gas heat exchanger. Preferred embodiments utilize heating elements and coolant flow control to regulate laser gas temperatures using processors programmed to anticipate idle periods.

Abstract: A line narrowed laser having a grating based line narrowing module, etalon-based line narrowing output coupler and a technique for tuning the laser. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. Several preferred methods are disclosed for tuning the etalon based output coupler to match the wavelength selected by the grating based line narrowing module.

Abstract: An excimer laser system with a fluorine control having a fixed volume inject bottle in which fluorine is injected prior to it being injected into the laser chamber. A manifold and feedback control system is provided to permit precise injection at rates approaching continuous fluorine injection. The system permits the laser to be operated in a small sweet spot as measured by a narrow range of charging voltage.

Abstract: An electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported in position radially by a roller bearing system and axially at least in part by magnetic forces. In a preferred embodiment the magnetic forces are supplied by a brushless DC motor in which the rotor of the motor is sealed within the gas environment of the laser cavity and the motor stator is located outside the gas environment. The magnetic center of the rotor is offset from the center of the stator to produce a magnetic reluctance generated force on the shaft that acts axially on the shaft toward the non-drive end and is reacted by a ball and plate bearing assembly mounted along the axis of rotation at the opposite end of the shaft.

Abstract: A tangential fan with cutoff assembly for recirculating a lasing gas mixture has blade members, which vary in circumferential position stepwise from end to end, and/or a tapered anode assembly. The number of blade members can be constant or variable between ends. The circumferential positions of blade members can shift monotonically or reversibly between ends. Blade members can be formed into air foil shapes and are stiffened by one or more transverse annular hub members. Processes for making tangential fans include soldering, casting, and machining from a solid block. Monolithic structures can be joined, typically by soldering or electron-beam welding. Casting, welding, and machining processes introduce no additional contaminants. Soldering produces substantially silicon-free assemblies. Tangential fans produced in accordance with the invention have improved mechanical rigidity, accurate tolerances, and low contaminant concentrations.

Abstract: Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber and heat-generating electronics that are enclosed in a baffled enclosure that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger, thereby providing a continuously variable rate of heat exchange through the heat exchanger to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.

Abstract: A coated ceramic insulator in a laser chamber that is exposed to a gaseous environment where impurities in the ceramic insulator are prevented from detrimentally contaminating the laser chamber by a high-purity insulating coating. The insulating coating prevents chemical interactions between the ceramic insulator and the gaseous environment. In particular, the coating prevents contamination, by impurities in the ceramic insulator, of the lasing gas.

Abstract: The present invention provides a very narrow band pulse excimer laser capable of producing pulses at a rate in the range of about 500 to 2000 Hz with enhanced energy dose control and reproducibility. Very small quantities of a stablizing additive consisting of oxygen or a heavy noble gas (xenon or radon for KrF lasers, or krypton, xenon or radon for ArF lasers), are added to the gas mixture. Tests performed show substantial improvements in energy stability with the addition of about 30 ppm of xenon to a KrF laser. Tests show improved performance for the ArF lasers with the addition of about 6-10 ppm of Xe or 40 ppm of Kr. In a preferred embodiment very narrow bandwidth is achieved on a KrF laser by reducing fluorine partial pressure to less than 0.10 percent and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line-narrowing module were replaced with calcium fluoride prisms.

Abstract: A process for controlling pulse energy and integrated energy dose in bursts of pulses produced by an excimer laser. The energy of each pulse in each burst is measured. The rate of change of pulse energy with charging voltage is determined. A pulse energy error is determined for a previous pulse of the present burst. An integrated dose error is also determined for all previous pulses in the current burst. A charging voltage for the next pulse is determined using the pulse energy error, the integrated dose error, the rate of change of energy with charging voltage and a reference voltage. In a preferred embodiment, the rate of change of energy with voltage is determined by dithering the voltage during two pulses of each burst, once lower and once higher. The reference voltage is a voltage calculated using prior energy and voltage data. In this embodiment, the method of determining the reference voltage during a first portion of the pulse is different from the method used during a latter portion of the burst.

Abstract: A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

Abstract: A very narrow band pulse excimer laser capable of producing pulses at a rate in the range of about 500 to 2000 Hz with enhanced energy dose control and reproducibility. A prior art burst mode "slug effect" occuring at one gas circulation time after the beginning of a burst of pulses is eliminated by the addition of a minute quantity of oxygen. In a preferred embodiment very narrow bandwidth is achieved by reducing fluorine partial pressure to less than 0.10 percent and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line narrowing module were replaced with calcium fluoride prisms.

Abstract: An excimer laser system having a laser chamber containing elongated electrodes and an excimer laser gas and a high voltage pulse power supply having fine digital regulation for supplying high voltage electrical pulses to the electrodes. The high voltage pulse power supply includes a power supply and a magnetic switch circuit for compressing and amplifying the output of the power supply. The power supply includes a silicon controlled rectifier which provides a direct current output to an inverter which converts the output of the silicon controlled rectifier to high frequency alternating current which is in turn amplified by a step up transformer. An output stage diode rectifier in combination with an inductor converts this high frequency high voltage current back to direct current. A control board comprising electronic circuits controls the power supply to provide high voltage pulses at a frequency of at least 1000 Hz.

Abstract: Apparatus providing ultrasonic control of a fluid medium to provide selective motion and cavitation comprising a transducer and an associated chamber providing a controllable acoustic travelling wave therein. The chamber includes an inlet, an outlet and a tapered passage through which the liquid medium flows and/or cavitation is induced and/or controlled. Embodiments of the present invention provide the production of light by controlled sonoluminescence and the generation of electrical energy by the flow of a medium through a magnetic field.

Abstract: The preferred embodiment of the invention uses known atomic or molecular absorptions as absolute wavelength standards for calibrating wavelength measurement instruments used in tunable lasers. Examples of atomic and molecular absorptions are carbon and molecular oxygen that have absorptions including 193.0905 nm and 193.2728 nm, respectively, for use with a tunable Argon Fluoride excimer laser at approximately 193 nm. A wavelength measuring device (e.g., a wavemeter) is equipped with a gas cell containing the absorption gas. During a calibration procedure, the wavelength measured by the wavemeter is compared to the atomic or molecular absorption. The wavemeter's calibration constants are then adjusted accordingly to match the wavemeter's output to the atomic or molecular absorption wavelength. Such calibration procedures, therefore, calibrate the wavemeter to absolute standards and correct for any drift in the wavemeter that may occur between calibrations.

Abstract: A laser chamber has angled reflectors that reflect acoustic and shock waves away from the laser discharge area to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves.

Abstract: A wavelength system for measuring and controlling the wavelength of a narrowband laser. The system includes a wavemeter for measuring incremental changes in wavelength and an atomic wavelength reference for calibrating the wavemeter. The atomic wavelength reference includes a vapor cell for providing a vapor having at least one absorption line near a desired operating wavelength. The system includes a wavelength tuning device with a tuning range sufficient to tune the laser to operate at the wavelength of the absorption line in order to calibrate the wavemeter.In a preferred embodiment, the laser is an ArF laser, and the vapor is platinum and the absorption line is either 193,224.3 pm or 193,436.9. Improvements over prior art devices include an improved etalon having a support flange to provide a low stress three-point hanging support for the etalon without use of elastomers.

Abstract: A grating based line-narrowing apparatus having a prism beam expander with at least four prisms. Each prism is positioned at an incidence angle between 67 and 71 degrees. A single layer coating of high refractive index, robust material, such as Al.sub.2 O.sub.3, is applied to the hypotenuse face of each prism, providing an efficient, anti-reflection coating. In a preferred embodiment the incident angle of the four prisms are each at about 68.2 degrees. The laser of the preferred embodiment has similar line narrowing efficiency and bandwidth as that for a laser with a 3 prism, ideal multi-layer anti-reflection coated beam expander. The primary benefit of the new four prism arrangement is that the prism coatings should be much less expensive and have greatly increased durability. Applicants have tested the new prisms for 30 million, 10 mJ pulses in air with no noticeable degradation. No present day dielectric multi-layer stack coating could survive such exposure.

Abstract: An excimer laser with a laser gas containing fluorine in which the fluorine concentration is maintained continuously at or substantially at desired predetermined levels. A real time or substantially real time fluorine monitor provides a feedback signal to a fluorine flow control system which provides continuous fluorine injection flow into the laser chamber to precisely compensate for fluorine depletion and maintain fluorine concentration precisely at desired levels. In a preferred embodiment, fluorine detector which may be a chemical detector periodically measures the fluorine concentration in laser gas discharged from the laser in order to calibrate the real time or substantially real time fluorine monitor. In a second preferred embodiment, the continuous inlet flow is from two gas sources, one containing fluorine, a noble gas and a buffer gas and the other containing only the noble gas and the buffer gas.

Abstract: A very narrow band laser. The very narrow bandwidth is achieved by creating an unstable resonance cavity using a cylindrical, partially-reflecting mirror to provide an output coupler in combination with a line narrowing module having a beam expander and a curved grating.

Abstract: A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.

Abstract: A discharge electrode for an excimer laser oscillator according to the present invention contains oxygen at a content of not more than 10 ppm, and a method of restoring the shape of a discharge electrode according to the present invention comprises introducing an inert gas into a laser chamber, and conducting discharge for several seconds.

Abstract: A line narrowed laser having a grating based line narrowing module and etalon-based line narrowing output coupler and a technique for tuning the laser. The etalon based output coupler is adjusted to preferentially reflect light at or near the spectral maximum produced by the grating. Substantial improvement in line narrowing results from the amplification in the laser resonance chamber of light at or near the grating spectral maximum which is preferentially reflected by the etalon based output coupler. A special tuning technique takes advantage of the fact that a grating based line narrowing module naturally produces a laser beam having spacial variation in wavelength along a beam cross sectional direction. By comparing profiles of the beam into and out of the etalon in the output coupler, the grating and/or the etalon can be adjusted to achieve desired spectral performance.

Abstract: An excimer laser having reduced spectral bandwidth variation is provided. The laser has an assembly of components comprising a beam expander having at least two prisms that reduces the spectral bandwidth of the laser beam that is passed through the assembly. At least one of the prisms of the beam expander is made of a thermally stable material, wherein the material has an coefficient of absorption of no more than about 0.1 percent/cm for light having the desired wavelength, a rate of change of refractive index with temperature of no more than about 2.3.times.10.sup.-6 .degree.C..sup.-1, a thermal conductivity of at least about 9.71 W/m-.degree.C. at 20 deg C., and/or a coefficient of thermal expansion of at least about 9.times.10.sup.-6 (deg C.).sup.-1. In a preferred embodiment, the stability of beam profile is improved, the variation in spectral bandwidth of the beam from the laser is reduced, the spectral bandwidth itself is also reduced, and the laser exhibits greater voltage stability.

Abstract: A very narrow band excimer laser. The very narrow bandwidth is achieved by using an etalon as an output coupler in combination with a line narrowing element located at the rear of the laser. Preferred embodiments are capable of producing 10 mJ laser pulses at 1000 Hz with a 95% integral bandwidth of less than 1.5 pm.

Abstract: The illumination energy of an excimer laser is measured and adjusted to always effect illumination at constant energy. A laser beam output from an optics is reflected by a mirror, and applied to a sample. A beam profiler is disposed behind the mirror to measure the energy of an illumination laser beam. An energy attenuating device disposed between another mirror and the optics is operated based on the measurement value so that the energy of the laser beam applied to the sample is kept constant.

Abstract: An electric discharge gas laser having a laser cavity in which is contained a laser gas and a fan for circulating the laser gas. The fan is supported by an active magnetic bearing system and driven by a brushless DC motor in which the rotor of the motor and at least two magnetic bearings sealed within the gas environment of the laser cavity and the motor stator and the coils of the bearing magnets are located outside the gas environment.

Abstract: A very narrow band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of less than 0.6 nm (FWHM). The very narrow bandwidth is achieved by reducing fluorine partial pressure to less than 0.08 and by increasing the reflectance of the output coupler to greater than 25 percent. In a preferred embodiment, prior art fused silica beam expansion prisms used in the prior art line narrowing module were replaced with calcium fluoride prisms.

Abstract: A new cartridge excimer laser system and method for generating an excimer laser beam using the system are provided. The system utilizes a cartridge (10) which contains a halogen-noble gas mixture (19), electrodes (50, 60) having external electrical connections (30, 40), and assembly (20) for transmitting a laser beam output (400), and an external gas port (90). The cartridge (10) fits onto a receptacle (100) located within a receiving compartment (200) of the laser base (300) of the new system. The cartridge (10) is easily replaced by the system operator and is refurbished by the manufacturer when the gas mixture (19) therein is exhausted.

Abstract: A narrow band excimer laser capable of easily adjusting the rotation of the laser beam by an image rotator provided between a laser chamber and a grating and on the laser beam optical axis. The image rotator is supported with freedom of rotation on the laser beam optical axis and rotates the laser beam about the optical axis so that the plane containing the direction in which the width of the laser beam incident upon the beam expander is narrower is parallel with the plane containing the beam-expansion direction of the beam expander, and the beam expansion direction of the laser beam incident upon the grating is perpendicular to the direction of the grooves of the grating. With this arrangement, a laser beam of narrowed bandwidth can be obtained with high efficiency.