Abstract: Laser annealing is performed by irradiating, while scanning, a semiconductor thin-film with laser light. The laser light that is linear on the irradiation surface is moved in its line-width direction and applied non-continuously. The laser light has, in its line-width direction, an energy density profile that assumes a step-like form in which the energy density varies in a step-like manner. In particular, the scanning pitch D and the step widths Ln are so set as to satisfy a relationship Ln≧D.

Abstract: A gas discharge laser having a laser chamber with two elongated electrode elements, each having a discharge section having an optimum array of discharge peaks and sputter cavities. The sputter cavities provide sputter metal ions to contribute to a plasma between the electrodes and support a glow-type discharge. The peaks provide very high fields which produce a very large number of filament-type discharges. The electrodes erode gradually but since the discharge region is confined to the array of discharge peaks and sputter cavities, the shape of he discharge remains approximately constant for billions of pulses. A pulse power system provides electrical pulses of at least 2J at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.

Abstract: The present invention provides a narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. The laser gas comprises F2 at a partial pressure less than about 1% with a buffer gas comprised of helium or neon or a combination of helium and neon. Control of center wavelength of the output beam is provided by adjusting one or more of the following parameters in the first laser: the total laser gas pressure, the relative concentration of helium or neon, F2 partial pressure, laser gas temperature, discharge voltage and pulse energy.

Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion.

Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost.

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. The resonator includes an interferometric device, which may be a resonator reflector such as an output coupling interferometer or HR reflector, or a transmissive intracavity component, including a pair of opposing reflecting surfaces tuned to produce a response maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is preferably configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress at least one side band or outer portions of the response maximum to reduce spectral purity.

Abstract: A reliable modular production quality ArF excimer laser capable of producing laser pulses at repetition rates in the range of 3,000 to 4,000 Hz or greater with pulse energies in the range of about 2 mJ to 5 mJ or greater with a full width half, maximum bandwidth of about 0.4 pm or less and dose stability of less than 0.4 percent. Using this laser as an illumination source, stepper or scanner equipment can produce integrated circuit resolution of 0.10 &mgr;m (100 nm) or less. Replaceable modules include a laser chamber; a modular pulse power system; and a line narrowing module. For a given laser power output, the higher repetition rate provides two important advantages. The lower per pulse energy means less optical damage and the larger number of pulses for a specified illumination dose means better dose stability.

Abstract: An excimer or molecular fluorine laser system includes a discharge chamber containing a gas mixture, multiple electrodes connected to a power supply circuit for energizing the gas mixture, a resonator for generating a laser beam, a processor, and means for monitoring an amplified spontaneous emission (ASE) signal of the laser, such as preferably an ASE detector. The processor receives a signal from the preferred ASE detector indicative of the ASE signal of the laser. Based on the signal from the ASE detector, the processor determines whether to initiate a responsive action for adjusting a parameter of the laser system.

Abstract: A narrow band laser system having two laser subsystems. The first laser subsystem is configured to provide a very narrow band pulsed output beam which is used to injection seed the second laser subsystem where the narrow band pulsed seed beam is amplified to produce a narrow band pulsed output beam. A pulse power supply is provided which is specially configured to precisely time the discharges in the two laser subsystem so that the discharges are properly synchronized. Preferred embodiments include a pulse power system with a pulse transformer unit having two sets of transformer cores. A single upstream pulse compression circuit provides high voltage pulses in parallel to the primary windings of all of the cores in both sets. Separate secondary conductors (one passing through one set of cores and the other passing through the other set of cores) provide very high voltage pulses respectively to separate downstream circuits supplying discharge pulses to the electrodes in each of two separate laser chambers.

Abstract: A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.

Abstract: A method and devices for preionizing the main discharge gas volume of a gas discharge laser are described. The method and devices provide a preionizing discharge to the main gas discharge volume from above or below the main gas discharge volume. In combination with a shielding arrangement which reduces the spread of the preionization discharge other than to the main gas discharge volume, the exposure of other laser components and gas volumes to said preionization discharge is thereby minimized.

Abstract: The present invention provides an ultra pure purge system for discharge lasers. The LNP, the output coupler, the wavemeter and selected high voltage components are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is filtered and directed to each of the inlet ports. Gas exiting the outlet ports may be directed to flow monitors having alarms so that any loss of purge will be immediately detected. Purge gas may be exhausted or recirculated.

Abstract: The present invention provides a discharge-pumped excimer laser device which includes a laser chamber filled with a laser gas that is deteriorated to a small extent, magnetic bearings and a motor that are resistant to the entry of dust particles, and parts that are held in contact with the laser gas and suffer little damage, and has a long service life.

Abstract: An excimer laser device which neither corrodes due to a laser gas nor contaminates the laser gas is provided. For this purpose, in an excimer laser device including a cross flow fan (1) disposed in a chamber (2) for circulating a laser gas, magnetic bearings (12, 12) having outer ring magnet coils (11, 11) and inner ring magnetic substances (10, 10) for rotatably supporting a rotating shaft (9) by magnetic force, and a motor (49) having a stator (47) and a rotor (48) for directly and rotationally driving the cross flow fan (1), the outer ring magnet coils (11, 11), the inner ring magnetic substances (10, 10), the rotor (48), and the stator (47) are respectively housed in shielded spaces shielded from the laser gas.

Abstract: An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization step of irradiating a semiconductor film with a laser light, a continuous light emission excimer laser emission device is used as a laser light source. For example, in a method of fabricating an active matrix type liquid crystal display device, a continuous light emission excimer laser beam is irradiated to a semiconductor film, which is processed to be a linear shape, while scanning in a vertical direction to the linear direction. Therefore, more uniform crystallization can be performed because irradiation marks can be avoided by a conventional pulse laser.

Abstract: An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to three millisecond and on a very fast time frame of a few microseconds. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control and a piezoelectric load cell in combination with the piezoelectric driver to provide the very fast (few microseconds) wavelength control.

Abstract: In an excimer laser apparatus comprising a laser chamber 1 filled with a laser gas, a discharge excitation portion 2 provided in the laser chamber 1, a rotary shaft 3 to which a gas circulating fan 4 for circulating the laser gas is fixed, a shield partition wall 61 for forming a sealed space to enclose the rotary shaft 3, a magnetic bearing of a control type including a rotor portion 32 provided on the rotary shaft 3 side and a stator portion 6 provided outside the shield partition wall 61 and serving to pivotally support the rotary shaft 3 in non-contact, a driving motor 13 provided outside the laser chamber 1, magnetic coupling portions 33, 11 and 121 for transmitting driving force of the driving motor 13 to the rotary shaft 3 through the shield partition wall 61 in non-contact, and rotary shaft sensors 8 and 9 for detecting a position of the rotor portion 32 with respect to the stator portion 6.

Abstract: Electric discharge laser with fast chirp correction. Fast wavelength chirp correction equipment includes at least one piezoelectric drive and a fast wavelength detection means and has a feedback response time of less than 1.0 millisecond. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.

Abstract: A beam parameter monitoring unit is provided for use with a F2 laser system including means for filtering the red light from the VUV light of a beam portion split off from the mainbeam of the F2 laser before the beam portion reaches a detector. The filtering means includes a mirror that is highly reflective of VUV light (“VUV HR mirror”), particularly around 157 nm, and transparent to red light. The VUV HR mirror reflects the VUV light to a detector such that the properties and parameters of the main beam can be monitored, adjusted, controlled and/or stabilized. The VUV HR mirror is preferably surrounded by a shield for absorbing the red light transmitted through or around the VUV HR mirror. Also preferably, an aperture is provided that is just wide enough to permit the VUV radiation to substantially pass through, and to block the outer portions of the incident beam portion including substantially only red light.

Abstract: An efficient and practical means and method is provided for monitoring the F2 concentration in an F2 excimer laser. The F2 concentration is monitored by measuring the concentration F atoms and more specifically by measuring the amount of red laser light emitted during discharge. The amount of red laser light emitted during discharge is a function of the concentration of F atoms because such red laser light is emitted by excited F atoms. There is also a relationship between the concentration of F atoms and the concentration of molecular F2 in the discharge chamber. Accordingly, the concentration of F2 gas may be monitored by measuring the amount of red laser light emitted during discharge.

Abstract: A method is provided for determining the status of a gas mixture of a laser system including a gas discharge laser which generates an output beam and has a discharge chamber containing a gas mixture within which energy is supplied to the gas mixture by a power supply via application of a driving voltage to a discharge circuit. A master data set of an output parameter such as any of output beam energy, bandwidth, spectrum width, long axial beam profile, short axial beam profile, beam divergence, energy stability, energy efficiency, width of the discharge, temporal beam coherence, spatial beam coherence, spatial pulse width, amplified spontaneous emission and temporal pulse width versus an input parameter such as driving voltage is generated corresponding to an optimal gas mixture status, preferably after a new fill and typically at the factory, and alternatively following a new fill at the fab.

Abstract: The pulsed laser control system comprises a plurality of controllers (2) through (6) for controlling devices (21) through (30) constituting the pulsed laser apparatus (1); parallel communication lines (P1) to (P4) for parallel connection of the plurality of controllers (2) through (6); an Ethernet (S) for serial connection of the plurality of controllers (2) through (6); parallel communication line (PP) for parallel connection between the external apparatus (10) and the main controller (2); and an Ethernet (SS) for serial connection between the external apparatus (10) and the main controller (2); wherein the parallel communication lines (P1) to (P4) and (PP) transmit signals for which realtime performance is required. With this construction, even if design changes are frequently made to a pulsed laser apparatus, the changes can be made easily and with little expansion space. Moreover, management of the devices constituting the pulsed laser apparatus can be easily performed.

Abstract: A pulse oscillating gas laser device, which can reduce an influence of a shock wave caused by primary discharge and perform stable laser oscillation is provided. To this end, the device is a pulse oscillating gas laser device for exciting a laser gas by causing primary discharge in a pulse form between a pair of discharge electrodes (14, 15) opposing each other and oscillating laser light, in which a rib portion (42) with insulating properties for preventing creeping discharge is provided on a cathode base (36) with insulating properties, to which the discharge electrode (15) at a high voltage side is fixed, and a damping material (45) for attenuating a shock wave (41) caused by the primary discharge is inserted in an inside of a groove portion (52) between a raised portion (43) of the rib portion (42) and the high-voltage side discharge electrode (15).

Abstract: An excimer or molecular fluorine laser includes a discharge chamber filled with a gas mixture, multiple electrodes within the discharge chamber connected to a power supply circuit for energizing the gas mixture, and a resonator including the discharge chamber and a pair of resonator reflectors for generating an output laser beam. One of the resonator reflectors is an output coupling interferometer including a pair of opposing reflecting surfaces tuned to produce a reflectivity maximum at a selected wavelength for narrowing a linewidth of the output laser beam. One of the pair of opposing reflecting surfaces is configured such that the opposing reflecting surfaces of the interferometer have a varying optical distance therebetween over an incident beam cross-section which serves to suppress outer portions of the reflectivity maximum to reduce spectral purity.

Abstract: To restrain nonuniformity of irradiation when a linear laser beam is irradiated by scanning the beam, linear laser pulses are irradiated by scanning the pulses in an oblique direction by which irradiation is carried out without overlapping peaks periodically present in the longitudinal direction of the linear laser beam and accordingly, nonuniformity of irradiation can be restrained.

Abstract: The invention provides a ≧4 kHz repetition rate argon fluoride excimer laser system for producing an UV wavelength 193 nm output. The ≧4 kHz repetition rate argon fluoride excimer laser system includes an argon fluoride excimer laser chamber for producing a 193 nm discharge at a pulse repetition rate ≧4 kHz. The ≧4 kHz repetition rate argon fluoride excimer laser chamber includes magnesium fluoride crystal optic windows for outputting the 193 nm discharge as a ≧4 kHz repetition rate excimer laser 193 nm output with the magnesium fluoride crystal optic windows having a 255 nm induced absorption less than 0.08 Abs/42 mm when exposed to 5 million pulses of 193 nm light a fluence ≧40 mj/cm2/pulse and a 42 mm crystal 120 nm transmission of at least 30%.

Abstract: A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.

Abstract: In an excimer laser or a molecular fluorine laser, a heating element (12) is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas.

Abstract: A line-narrowed excimer or molecular fluorine laser system includes a gain medium surrounded by a resonator for generating a laser beam, a discharge circuit including a plurality of electrodes for energizing the gain medium and a line-narrowing unit within the resonator for narrowing the bandwidth of the laser system. The resonator includes a deformable resonator reflector. A technique for adjusting the bandwidth of the laser system includes adjusting a surface contour of the deformable resonator reflector. A desired bandwidth may be selected manually or using a processor which automatically controls the surface contour adjustment.

Abstract: A grating based line narrowing device for line narrowing lasers producing high energy laser beams. Techniques are provided for minimizing adverse effects of heat produced by the laser beam inside the line narrowing device. A flexural grating mount is provided which virtually eliminates stress on the grating caused by differential thermal expansion between the grating and the LNP housing structure. In a preferred embodiment the grating which is comprised of a very thin lined aluminum surface on a thick ultra low expansion glass substrate is attached to an aluminum housing structure using a flexural grating mount. At least one flexure joint is provided in the grating mount which permits thermal expansion and contraction of the aluminum housing without producing undesirable mechanical stresses in the glass substrate of the grating. In some embodiments the mount comprises a metal plate and the flexure joint is a H-Flex joint which is machined into the metal plate.

Abstract: An excimer or molecular fluorine laser system generates a laser output bandwidth of less than 0.6 pm, and preferably 0.5-0.4 pm or less. The laser resonator has a line-narrowing unit preferably including a grating, and preferably also a beam expander, and may include one or more etalons or other interferometric devices. The grating may be preferably a blazed grating having a blaze angle greater than 76°, and is preferably around 80°. The grating structure is preferably defined by the surface of the grating substrate. The substrate is preferably aluminum. The system may further include an amplifier for increasing the energy of the sub-0.6 nm output beam.

Abstract: A smart laser having automatic computer control of pulse energy, wavelength and bandwidth using feedback signals from a wavemeter. Pulse energy is controlled by controlling discharge voltage, wavelength by controlling the position of an RMAX mirror and bandwidth is controller by adjusting the curvature of a grating to shapes more complicated than simple convex or simple concave. A preferred embodiment provides seven piezoelectric driven pressure-tension locations on the back side of the grating at 5 horizontal locations to produce shapes such as S shapes, W shapes and twisted shapes. Preferred embodiments include automatic feedback control of horizontal and vertical beam profile by automatic adjustment of a prism plate on which beam expander prisms are located and automatic adjustment of the RMAX tilt.

Abstract: When an excimer laser device is stopped from operating, an alternating current is applied to a coil of an electromagnet of a magnetic bearing for a fan so as to erase a residual magnetic field and thus weaken the adhesiveness of dust to the electromagnet. A dust sucking unit sucks to remove the dust attaching to the electromagnet together with a gas introduced into a chamber. In this way, accumulation of the dust on the magnetic bearing for the fan can be prevented.

Abstract: A method and apparatus is provided for stabilizing output beam parameters of a gas discharge laser by maintaining a constituent gas of the laser gas mixture at a predetermined partial pressure using a gas supply unit and a processor. The constituent gas of the laser gas mixture is provided at an initial partial pressure and the constituent gas is subject to depletion within the laser discharge chamber. A parameter such as time, pulse count, driving voltage for maintaining a constant laser beam output energy, pulse shape, pulse duration, pulse stability, beam profile, bandwidth of the laser beam, temporal or spatial coherence, discharge width, or a combination thereof, which varies with a known correspondence to the partial pressure of the constituent gas is monitored. Injections of the constituent gas are performed each to increase the partial pressure by a selected amount in the discharge chamber.

Abstract: A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.

Abstract: A discharge electrode for a laser device allowing return plates to be easily attached/detached and a laser device with the discharge electrode are provided. To this end, structure in which a pair of an anode (5A) and a cathode (5B), provided facing each other inside a laser chamber (2) sealing in laser gases, for discharging electricity to excite the laser gases flowing through a space between them, thereby oscillating a laser beam, a conductive anode base (6) for holding the anode (5A), an insulating cathode base (8) for holding the cathode (5B), and a plurality of return plates (9B) for electrically connecting the anode base (6) and the laser chamber (2) and supplying an electric current to the anode (5A) are provided, and in which upper portions and lower portions of the return plates (9B) are connected respectively with an upper fixed plate (9A) and a lower fixed plate (9C), is given.

Abstract: A system is provided for delivering a laser beam of wavelength less than 200 nm from a laser, such as an F2 laser or ArF laser, through a sealed enclosure sealably connected to the laser, and preferably to another housing, leading ultimately to a workpiece. The enclosure is preferably evacuated and back-filled with an inert gas to adequately deplete any air, water, hydrocarbons or oxygen within the enclosure. Thereafter or alternatively, an inert gas flow is established and maintained within the enclosure during operation of the laser. The inert gas preferably has high purity, e.g., more than 99.5% and preferably more than 99.999%, wherein the inert is preferably nitrogen or a noble gas. The enclosure is preferably sealed by a window transparent to the sub-200 nm radiation for preventing contaminants generated in the enclosure from entering the housing and contaminating surfaces therein. The enclosure is preferably made of steel and/or copper, and the window is preferably made of CaF2.

Abstract: A system is provided for delivering a laser beam of wavelength less than 200 nm from a laser, such as an F2 laser or ArF laser, through a sealed enclosure sealably connected to the laser, and preferably to another housing, leading ultimately to a workpiece. The enclosure is preferably evacuated and back-filled with an inert gas to adequately deplete any air, water, hydrocarbons or oxygen within the enclosure. Thereafter or alternatively, an inert gas flow is established and maintained within the enclosure during operation of the laser. The inert gas preferably has high purity, e.g., more than 99.5% and preferably more than 99.999%, wherein the inert is preferably nitrogen or a noble gas. The enclosure is preferably sealed by a window transparent to the sub-200 nm radiation for preventing contaminants generated in the enclosure from entering the housing and contaminating surfaces therein. The enclosure is preferably made of steel and/or copper, and the window is preferably made of CaF2.

Abstract: A line-narrowed excimer or molecular fluorine laser system includes a gain medium surrounded by a resonator for generating a laser beam, a discharge circuit including a plurality of electrodes for energizing the gain medium and a line narrowing unit within the resonator for narrowing the bandwidth of the laser system. The resonator includes a deformable resonator reflector. A technique for adjusting the bandwidth of the laser system includes adjusting a surface contour of the deformable resonator reflector. A desired bandwidth may be selected manually or using a processor which automatically controls the surface contour adjustment.

Abstract: A fiber-coupled laser based on a whispering-gallery-mode resonator formed of a laser gain medium and an angle-polished fiber coupler.

Abstract: An electrode arrangement for a gas laser is provided. The electrode arrangement includes an elongated high voltage electrode, an elongated ground electrode disposed adjacent to the high voltage electrode, a discharge gap between the two electrodes an insulator element, a high voltage conductor having a first end connected to the high voltage electrode and extending through the insulator element, and a shadow plate interposed between the discharge gap and the insulator element. The electrode arrangement may be employed in a variety of gas lasers, including excimer lasers.

Abstract: A synthetic glass member for use in excimer laser lithography, having superior homogeneity, high transmittance for ArF excimer laser beams and an excellent resistance against lasers is made from high purity synthetic quartz glass, and it is characterized in that layered structures, striae in three directions and internal strains are thermally and mechanically removed, the distribution of refractive index (&Dgr;n) in a plane orthogonal to the optical axis is up to about 1×10−6, the distribution of refractive index (&Dgr;n) in a plane parallel to the optical axis is up to about 5×10−6, the birefringence is up to about 2 nm/cm, the hydrogen molecule concentration is at least about 2×1017 molecules/cm3, and the internal transmittance is at least about 99.8% at a wavelength of 193.4 nm.

Abstract: A beam delivery system for a laser emitting at a relevant wavelength of less than 200 nm is provided. The system includes a sealed enclosure connected to the laser and surrounding the path of the beam as it exits the laser resonator. The enclosure extends between the laser output coupler and a photodetector sensitive at the wavelength of the relevant laser emission. The interior of the enclosure, and thus the beam path between the output coupler and the detector, is substantially free of species that strongly photoabsorb radiation at the relevant laser emission wavelength. A beam splitting element diverts at least a portion of the beam for measurement by the detector. The beam splitting element preferably includes a beam splitting mirror, holographic beam sampler or diffraction grating. In addition, optics are preferably provided for filtering a visible portion of the diverted beam, so that substantially only a VUV portion of the diverted beam is received at the detector.

Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost.

Abstract: An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in a F2 laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses.

Abstract: A gas discharge modular laser with beam train isolation between laser chamber module and front and rear optics which define the laser resonant cavity. Beam train isolation units isolates the beam train from atmospheric air while permitting quick and easy removal of the laser chamber without disturbing the optics of the resonant cavity. In preferred embodiments, metal bellows units are bolted at only side so that the chamber module can be removed and replaced without unbolting the bellows unit.

Abstract: An F2-excimer laser has multiple closely-spaced spectral lines of interest around 157 nm, and one of the lines is selected by wavelength selection optics. The wavelength selection optics of a first preferred embodiment include a birefringent Brewster window enclosing the laser gas volume of the discharge chamber. The window preferably comprises MgF2 and is located at one end of the discharge chamber. One line is selected of the two when the optical thickness of the window is selected in coordination with rotatably adjustable, orthogonal refractive indices of the window. The transmissivity of the window is dependent on the orthogonal refractive indices and the optical thickness of the window. The wavelength selection optics of a second preferred embodiment include are at least partially within the laser active volume. In this way, line selection is performed in a manner which optimizes the combination of optical and discharge efficiency, resonator size and cost.

Abstract: A laser for an excimer or molecular fluorine laser includes an electrode chamber connected with a gas flow vessel and having a pair of main electrodes and a preionization unit each connected to a discharge circuit. A spoiler is provided within the electrode chamber and is shaped to provide a more uniform gas flow through the discharge area between the main electrodes, to shield one of the preionization units from one of the main electrodes, and to reflect acoustic waves generated in the discharge area into the gas flow vessel for absorption therein. A spoiler unit may include a pair of opposed spoiler elements on either side of the discharge area. One or both main electrodes includes a base portion and a center portion which may be a nipple protruding from the base portion. The center portion substantially carries the periodic discharge current such that the discharge width is and may be significantly less than the width of the base portion.

Abstract: A gas discharge laser having a laser chamber with two elongated erodable electrode elements, each having an erodable section and an electrode with support configured to minimize discharge region laser gas turbulence and with the electrode elements being configured to permit gradual erosion over more than 8 billion pulses without causing substantial changes in the shape of electrical discharges between the electrode elements. A pulse power system provides electrical pulses of at least 2J at rates of at least 2 KHz. A blower circulates laser gas between the electrodes at speeds of at least 2 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges.

Abstract: A narrow band molecular fluorine laser system includes an oscillator and an amplifier, wherein the oscillator produces a 157 nm beam having a linewidth less than 1 pm and the amplifier increases the power of the beam above a predetermined amount, such as more than one or several Watts. The oscillator includes a discharge chamber filled with a laser gas including molecular fluorine and a buffer gas, electrodes within the discharge chamber connected to a discharge circuit for energizing the molecular fluorine, and a resonator including the discharge chamber for generating a laser beam having a wavelength around 157 nm. Line-narrowing optics are included intra- and/or extra-resonator for reducing the linewidth of the laser beam to less than 1 pm. The amplifier may be the same or a different discharge chamber, and optical and/or electronic delays may be used for timing pulses from the oscillator to reach the amplifier at a maximum in the discharge current of the amplifier.