With Standardization Patents (Class 378/48)
  • Patent number: 12092594
    Abstract: A method for measuring average thickness of a metal or alloy coating on a metal or alloy substrate using an X-ray fluorescence (XRF) spectrometer is used when the coating has an uneven surface at different distances from a measurement window of the XRF spectrometer. The method includes measuring elemental composition of the coating or substrate using the XRF spectrometer and obtaining the average thickness of the coating using a calibration relationship between coating thickness and elemental composition of the coating or substrate. The metal or alloy coating may be a metal or alloy coating of a plurality of outer armor wires wrapped around a cable. The method may be used to analyze coating thickness changes over time or along the length of the cable, or to analyze a corrosive environment in order to choose optimal material for a metal or alloy coating.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: September 17, 2024
    Assignee: Schlumberger Technology Corporation
    Inventors: Jill F. Geddes, Trevor Lloyd Hughes, Evgeny Borisovich Barmatov
  • Patent number: 11169100
    Abstract: A portable hand held XRF analyzer and method wherein an X-ray source directs X-rays to a sample and a detector detects photons emitted by the sample. A controller subsystem controlling the X-ray source an I/O section and is responsive to the detector and I/O section. The controller subsystem is configured to present to the user, via the I/O section, a choice to invoke an aluminum alloy algorithm test. An aluminum alloy algorithm test is invoked if the operator chooses the aluminum alloy algorithm test. Then, the X-ray source is operated at a predetermined voltage level and predetermined current level and the detector output is analyzed to determine elements and their concentrations present in the sample. Preferably, if the analysis fails to detect one or more common aluminum alloy elements present in the sample and/or fails to specify a particular aluminum alloy, then the X-ray source is automatically operated at a higher voltage and lower current level to repeat the analysis step.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: November 9, 2021
    Assignee: SciAps, Inc.
    Inventor: Donald W. Sackett
  • Patent number: 10967404
    Abstract: The present invention discloses a novel XRF analyzer capable of simultaneously identifying the presence of a marking composition in a plurality of objects by modulating/varying the intensity of the excitation beam on the different objects and measuring the secondary radiation thereof.
    Type: Grant
    Filed: June 21, 2017
    Date of Patent: April 6, 2021
    Assignees: SOREQ NUCLEAR RESEARCH CENTER, SECURITY MATTERS LTD.
    Inventors: Yair Grof, Tzemah Kislev, Nadav Yoran, Haggai Alon, Mor Kaplinsky
  • Patent number: 10921267
    Abstract: An X-ray fluorescence analysis method according to an FP method uses a predefined theoretical intensity formula in a standard sample theoretical intensity calculation step for obtaining a sensitivity constant and in an unknown sample theoretical intensity calculation step during iterative calculation. In the formula, only in an absorption term relating to absorption of X-rays, a mass fraction of each component is normalized so that a sum of the mass fractions of all components becomes 1.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: February 16, 2021
    Assignee: Rigaku Corporation
    Inventors: Yoshiyuki Kataoka, Kosuke Kawakyu
  • Patent number: 9726625
    Abstract: The disclosure provides methods and systems for identifying materials using charged particle beam systems combined with x-ray spectroscopy systems.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: August 8, 2017
    Assignee: Carl Zeiss Microscopy Ltd.
    Inventor: Edward Hill
  • Patent number: 8908827
    Abstract: This invention relates in general to the determination of silicon levels in fuel mixtures, such as petroleum products. More particularly, the present invention relates to compositions for use as standards in an x-ray analyzer for the measurement of silicon in various fuel mixtures, and to methods of using these compositions.
    Type: Grant
    Filed: June 14, 2012
    Date of Patent: December 9, 2014
    Assignee: X-Ray Optical Systems, Inc.
    Inventors: James Carnahan, Zewu Chen, Leslie Johnson
  • Publication number: 20140219418
    Abstract: A handheld X-ray fluorescence spectrometer includes a pyroelectric radiation source for directing X-rays toward a sample to be analyzed and a detector for receiving secondary X-rays emitted from the sample and converting the secondary X-rays into one or more electrical signals representative of the received secondary X-rays. A module is configured to receive the one or more electrical signals and send a representation of the one or more signals over a communication channel to a computing device without performing any spectral analysis on the one or more electrical signals to characterize the sample. The computing device is configured to perform spectral analysis on the one or more electrical signals and send the spectral analysis to the spectrometer over the communications channel.
    Type: Application
    Filed: January 2, 2014
    Publication date: August 7, 2014
    Applicant: i-Nalysis LLC
    Inventors: Andrew Hession-Kunz, Robert Allard, Jerzy Wilder
  • Publication number: 20130322595
    Abstract: The method uses an XRF instrument for identifying a specified element on a jewelry sample by illuminating its surface with excitation radiation and measuring first and second intensities of characteristic emission lines of a specified element and calculating the ratio between the intensities to establish a measured thickness and to determine based on a certain range criteria whether the sample can be considered to be plated jewelry.
    Type: Application
    Filed: May 31, 2013
    Publication date: December 5, 2013
    Inventor: Brendan CONNORS
  • Patent number: 8582717
    Abstract: In the present invention, a fluorescent X-ray analysis is made for a sample such as a liquid fuel including an object component such as sulfur. A background related to scattered X-rays and a system peak is subtracted from a fluorescent X-ray intensity of the object component, which is obtained from a spectrum acquired by the fluorescent X-ray analysis. A correction corresponding to the composition of the sample is performed for the fluorescent X-ray intensity obtained by subtracting the background. A calibration curve representing the relation between a value, which is obtained after performing the correction for the fluorescent X-ray intensity obtained by subtracting the background, and a concentration of the object component is preset. The concentration of the object component in the sample is calculated on the basis of the calibration curve.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: November 12, 2013
    Assignee: Horiba, Ltd.
    Inventor: Sumito Ohzawa
  • Patent number: 8532256
    Abstract: A method and apparatus for the metallurgical qualitative analysis (assay) and valuation of precious metals objects such as jewelry or coins. The system integrates a commercially available x-ray florescence (XRF) metals analyzer with associated peripheral devices including a personal computer and keyboard or touchpad computing device, a digitizing scale, a printer, an Internet link for obtaining current precious metals market price quotations, and software for processing the qualitative results with the current market price data and presenting the results to the system operator in real time. The system optionally includes a customer interface including a display screen for presenting the customer with the results of the analysis and valuation, and customer input means for accepting and recording a purchase transaction.
    Type: Grant
    Filed: March 5, 2012
    Date of Patent: September 10, 2013
    Inventors: Bobby D. Jeter, John Bosjancic
  • Publication number: 20130156155
    Abstract: A handheld X-ray fluorescence spectrometer includes a pyroelectric radiation source for directing X-rays toward a sample to be analyzed and a detector for receiving secondary X-rays emitted from the sample and converting the secondary X-rays into one or more electrical signals representative of the received secondary X-rays. A module is configured to receive the one or more electrical signals and send a representation of the one or more signals over a communication channel to a computing device without performing any spectral analysis on the one or more electrical signals to characterize the sample. The computing device is configured to perform spectral analysis on the one or more electrical signals and send the spectral analysis to the spectrometer over the communications channel.
    Type: Application
    Filed: June 20, 2012
    Publication date: June 20, 2013
    Applicant: i-Nalysis LLC
    Inventors: Andrew Hession-Kunz, Robert Allard, Jerzy Wilder
  • Publication number: 20130066605
    Abstract: An apparatus for estimating properties of an earth formation includes a carrier configured to be disposed in a borehole in the earth formation, and a sample retriever configured to remove a sample of the earth formation, the sample including solid components of the earth formation. The apparatus also includes an analysis assembly including a chamber disposed with the carrier and configured to hold the sample, an X-ray source configured to irradiate the sample with X-ray radiation while the sample is disposed in the chamber, and one or more X-ray detectors configured to detect radiation emitted from the sample in response to irradiation from the X-ray source.
    Type: Application
    Filed: March 1, 2012
    Publication date: March 14, 2013
    Applicant: BAKER HUGHES INCORPORATED
    Inventor: Fusheng Li
  • Patent number: 8346521
    Abstract: A method of determining the feasibility of a proposed structure analysis process is disclosed. The process involved the electron beam excitation of x-rays from a multi-layered structure. The method comprises generating predicted x-ray data represents the x-ray excitation response of the multi-layered structure according to one or more sets of process conditions. The x-ray data are generated using structure data defining the structure and composition of the layers. The effects upon the x-ray data of changes to the structure data are then analyzed in accordance with one or more predetermined feasibility criteria, so as to determine the feasibility of performing the proposed structure analysis process upon the multi-layered structure.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: January 1, 2013
    Assignee: Oxford Instruments Nanotechnology Tools Limited
    Inventors: Peter John Statham, Charles Penman
  • Patent number: 8065094
    Abstract: A method is provided of calculating the structure of an inhomogeneous sample in which an electron beam is used to cause excitation of x-rays from the sample under known conditions of beam energy and geometry with respect to the sample. Notably the beam current is unknown. Measured x-ray intensity data for the sample corresponding to one or more sets of beam conditions and beam currents are firstly obtained, together with comparative x-ray intensity data for samples having known structures. A beam current factor for each beam condition is estimated and effective x-ray intensity data for each of the sets of conditions are then calculated using the measured and comparative x-ray intensity data and the beam current factor. The structure of the sample is then calculated for each of the sets of conditions using the effective x-ray intensity data. Predicting x-ray intensity data are produced corresponding to the calculated structure and compared with the effective x-ray intensity data.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: November 22, 2011
    Assignee: Oxford Instruments Nonotechnology Tools Unlimited
    Inventor: Peter John Statham
  • Patent number: 7916834
    Abstract: A hand-held, self-contained x-ray fluorescence (XRF) analyzer produces a small x-ray spot on a sample to interrogate the elemental composition of a sample region of millimeter-size characteristic dimension. The analyzer includes a collimator for aiming an x-ray beam toward a desired location on the sample and for determining the size of the spot produced on the sample. The analyzer may include a digital camera oriented toward the portion of the sample that is, or would be, interrogated by the x-ray spot to facilitate aiming the analyzer. The analyzer may generate a reticule in a displayed image to indicate the portion of the sample that is, or would be, illuminated by the x-ray beam. The analyzer may automatically annotate the image of the sample with text or graphics that contain information about the analyzed sample. The image may be stored in the hand -held analyzer or provided for external storage or display.
    Type: Grant
    Filed: February 11, 2008
    Date of Patent: March 29, 2011
    Assignee: Thermo Niton Analyzers LLC
    Inventors: Stanislaw Piorek, Mark Hamilton, Kenneth P. Martin, Pratheev Sreetharan, Michael E. Dugas, Paul Estabrooks, Lee Grodzins
  • Patent number: 7786433
    Abstract: A phantom for quality monitoring of a medical system, in particular a medical therapy system, or particle therapy system, is described. The phantom has a fixation device for coupling the phantom to a positioning device. In an aspect, a method for quality monitoring in a medical system, in particular a medical therapy system or particle therapy system is described, in which such a phantom is coupled via a fixation device to a positioning device and, with the aid of the positioning device, is brought to a predefined position. In another aspect, a particle therapy system has a treatment chamber, with a positioning device to which a phantom can be coupled so that the phantom can be brought to a predefined spatial position using the positioning device.
    Type: Grant
    Filed: February 28, 2008
    Date of Patent: August 31, 2010
    Assignee: Siemens Aktiengesellschaft
    Inventors: Konstanze Gunzert-Marx, Sophia Knop, Tim Use
  • Patent number: 7720193
    Abstract: An object of the present invention is to shorten the time required by processing, and to simplify the work and increase the number of samples processed, in the X-ray analysis of a specific substance contained in a sample. To achieve the object, a method for assaying the content of a specific substance in a sample 106, comprises a measurement step (S3) of irradiating the sample 106 with X-rays, and measuring the spectrum of the sample 106, and an assay step (S4) of comparing the components of the specific substance in the spectrum of the sample 106 and in a reference spectrum that has been pre-stored for the sample 106, and determining whether the specific substance is contained in the sample 106 in an amount equal to or greater than a specific value.
    Type: Grant
    Filed: August 14, 2006
    Date of Patent: May 18, 2010
    Assignee: Panasonic Corporation
    Inventors: Yoshiyuki Tani, Hiroshi Iwamoto, Takao Hisazumi, Yukihiro Iwata
  • Patent number: 7688943
    Abstract: Elemental concentrations in hair (head and body hair) and dried serum have been measured by x-ray fluorescence analysis using synchrotron radiation. The relative concentration defined by log P?log S are obtained from the fluorescent spectra, where P is the peak height for the element and S is the background height. The observation shows that hair has two separate [Ca] concentration levels, the upper level and lower level. Since the content in hair growing at a steady state must be equal to the supply from serum, the upper and the lower level of hair [Ca] are attributed to open and close Ca ion channels of the hair matrix cells and can be derived from the serum concentrations of Ca ion and Ca atoms included in serum protein, respectively. The hair analysis is useful for cancer detection and protection as well as for diagnosing the Ca metabolism.
    Type: Grant
    Filed: August 10, 2005
    Date of Patent: March 30, 2010
    Inventor: Jun-ichi Chikawa
  • Patent number: 7646846
    Abstract: The press formability of a galvanized steel sheet including an oxide film, which has a thickness of 10 nm to 100 nm, as a surface layer is nondestructively speedily evaluated.
    Type: Grant
    Filed: September 22, 2005
    Date of Patent: January 12, 2010
    Assignee: JFE Steel Corporation
    Inventors: Wataru Tanimoto, Hisato Noro
  • Publication number: 20090262890
    Abstract: An object of the present invention is to shorten the time required by processing, and to simplify the work and increase the number of samples processed, in the X-ray analysis of a specific substance contained in a sample. To achieve the object, a method for assaying the content of a specific substance in a sample 106, comprises a measurement step (S3) of irradiating the sample 106 with X-rays, and measuring the spectrum of the sample 106, and an assay step (S4) of comparing the components of the specific substance in the spectrum of the sample 106 and in a reference spectrum that has been pre-stored for the sample 106, and determining whether the specific substance is contained in the sample 106 in an amount equal to or greater than a specific value.
    Type: Application
    Filed: August 14, 2006
    Publication date: October 22, 2009
    Inventors: Yoshiyuki Tani, Hiroshi Iwamoto, Takao Hisazumi, Yukihiro Iwata
  • Publication number: 20090177411
    Abstract: Process of placing a sample of known concentrations of known elements in a spectrometer; measuring the intensity II, I2 . . . In of the different elements included in the sample, by relating known concentrations C1, C2 . . . Cn for the elements included in the sample to the measured intensities II, I2 . . . In so as to calculate a fictive intensity for a 100%-pure element for each of the elements included; calculating calibration constants K1, K2 . . . Kn for each of the elements as the relationship between measured intensity II, I2 . . . In and the calculated intensity of respective 100%-pure elements; placing a sample of unknown concentrations of the elements in the spectrometer and reading-off the intensity of the different elements; and calculating the concentration of respective elements in the last mentioned sample as the measured intensity multiplied by respective calibration constants for the elements present in the sample.
    Type: Application
    Filed: April 17, 2007
    Publication date: July 9, 2009
    Applicant: XRF ANALYTICAL AB
    Inventors: Lars Kumbrandt, Johan Malmqvist
  • Patent number: 7539282
    Abstract: A method of analyzing a fluid sample by XRF includes the steps of: depositing the fluid sample onto a substrate, exposing the sample and the substrate to an x-ray emission, generating a first analytical signal responsive to the x-ray emission, providing an operable first reference material having a first extended position above the substrate and in communication with the x-ray emission, periodically extending the first reference material to its first extended position, generating a first calibration signal, providing an operable second reference material having a first extended position below the substrate and in communication with the x-ray emission, and periodically extending the second reference material to its first extended position and generating at least one second calibration signal. The first and second calibration signals are compared with predetermined values. The first and second reference materials also have second retracted positions.
    Type: Grant
    Filed: April 7, 2005
    Date of Patent: May 26, 2009
    Assignee: Cooper Environmental Services LLC
    Inventors: John Arthur Cooper, Sarah Catherine Fry, Bruce Edward Johnsen
  • Patent number: 7474730
    Abstract: An X-ray source (101) is configured to controllably irradiate a sample (105) with incident X-rays through a sample window (104) that has a two-dimensional area. A detector (102) is configured to detect fluorescent radiation coming from the irradiated sample. A carrier (301, 401, 402, 501, 601) is essentially transparent to X-rays and disposed to spatially coincide with a substantial part of the two-dimensional area of the sample window (104). Marker material (303, 403, 602), which is responsive to X-rays by emitting fluorescent radiation, is mechanically supported by said carrier and essentially evenly distributed across at least that part of the carrier that spatially coincides with said two-dimensional area of the sample window.
    Type: Grant
    Filed: October 17, 2006
    Date of Patent: January 6, 2009
    Assignee: Oxford Instruments Analytical OY
    Inventors: Erkki Tapani Puusaari, Oleg Shirokobrod
  • Patent number: 7469034
    Abstract: The invention relates to a method and an x-ray examination unit for analyzing and representing x-ray projection images with an x-ray examination unit, where the function relation bU=ƒU?1(J˜/J0) is established between the attenuation value and a material-equivalent value as a function of the energy spectrum used, and for the purposes of projection representation, the magnitude of the material-equivalent value bU of a specific material is represented as an image value.
    Type: Grant
    Filed: April 21, 2006
    Date of Patent: December 23, 2008
    Assignee: Siemens Aktiengesellschaft
    Inventors: Philipp Bernhardt, Friedrich Koch, Martin Kolarjk, Ernst Peter Rührnschopf, Helmuth Schramm
  • Patent number: 7289598
    Abstract: The change in the sample size and a change in background intensity due to the coexisting element are measured in real time to thereby automatically change a measurement time, the detection lower limit is kept constant, so that a fluorescent X-ray apparatus is provided that is capable of measuring every time in the same detection lower limit even in a case where there have existed a change in size of a sample, a change in sensitivity due to a difference in main ingredient, and a change of a magnitude in background due to an influence of a coexisting element.
    Type: Grant
    Filed: November 1, 2005
    Date of Patent: October 30, 2007
    Assignee: SII Nano Technology Inc.
    Inventor: Yoshiki Matoba
  • Patent number: 7046760
    Abstract: A method of measuring a concentration of dopants of an objective thin film includes measuring a concentration of dopants of a first wafer, forming the objective thin film on the first wafer to form a second wafer, measuring a concentration of dopants of the second wafer, and obtaining the concentration of dopants of the objective thin film by subtracting the concentration of dopants of the first wafer from the concentration of dopants of the second wafer. Therefore, the concentration of dopants of the objective thin film may be measured without the use of a criterion wafer, thereby reducing measuring time. Also, the concentration of dopants of the objective thin film may be easily controlled, and therefore promptly corrected if necessary.
    Type: Grant
    Filed: March 1, 2004
    Date of Patent: May 16, 2006
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Kyoung Kim, Sun-Yong Choi, Chung-Sam Jun, Jeong-Hyun Choi
  • Patent number: 7016462
    Abstract: A device, system and method for detecting and measuring concentrations of elements in fluids comprises: flowing a fluid through a central flow interelectrode gap of an ionic preconcentration cell separating an upper high specific surface area electrode from a lower high specific surface area electrode of the ionic preconcentration cell by a predetermined interelectrode gap width; and applying a voltage differential between the upper high surface area electrode and the lower high surface area electrode while the fluid is flowing through the central flow interelectrode gap. As such, this cell that utilizes its inherent capacitance for double layer formation to extract ultra-trace levels of ionic contaminants from fluids in order to enhance detection by x-ray fluorescence analysis.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: March 21, 2006
    Assignees: InterScience, Inc., KMD Science, Inc.
    Inventors: Robert F. Keville, Daniel D. Dietrich
  • Patent number: 6782072
    Abstract: A method of analyzing a composition depth profile of a solid surface layer, wherein actually-measured intensity of photoelectrons emitted from the solid surface layer by irradiating the solid surface layer containing at least two or more species of element with X rays and photoelectron calculated intensity obtained by making a calculation assuming an elemental composition ratio for each of a plurality of sub-layers into which the solid surface layer has been temporarily divided are utilized to determine a composition depth profile of the solid surface layer, the method including a step of at least repeating an approximate calculation including: distinguishing a specified sub-layer such that the calculated intensity best converges to the actually-measured intensity in the sub-layers; and correcting an elemental composition ratio at least for the specified sub-layer so that the calculated intensity converges to the actually-measured intensity, thereby determining the composition depth profile of the solid surfa
    Type: Grant
    Filed: April 24, 2003
    Date of Patent: August 24, 2004
    Assignee: Oki Electric Industry Co., Ltd.
    Inventor: Liu guo Lin
  • Patent number: 6777676
    Abstract: Disclosed are apparatus and methods for characterizing a potential defect of a semiconductor structure. A charged particle beam is scanned over a structure which has a potential defect. X-rays are detected from the scanned structure. The X-rays are in response to the charged particle beam being scanned over the structure. The potential defect of the scanned structure is characterized based on the detected X-rays. For example, it may be determined whether a potentially defective via has a SiO2 plug defect by comparing an X-ray count ratio of oxygen over silicon of the defective via with an X-ray count ratio of a known defect-free reference via. If the defective via has a relatively high ratio (more oxygen than silicon) as compared to the reference via, then it may be determined that a SiO2 plug defect is present within the defective via. Otherwise, the via may be defmed as having a different type of defect (e.g., not a SiO2 plug defect) or defined resulting in a “false” defect.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: August 17, 2004
    Assignee: KLA-Tencor Technologies Corporation
    Inventors: Ying Wang, Yeishin Tung, Anne Testoni
  • Patent number: 6765986
    Abstract: An x-ray fluorescence analyzer and method. The analyzer and method use a single radio-active source, such as, 241Am to determine the composition of a metal alloy or precious metal. The method compensates for Rayleigh scattering by first determining a scaling factor using a particular energy line in the spectrum of the test material and comparing that line to the same energy line for a pure metal. Based on the scaling factor the energy spectrum for the pure is compensated and then subtracted from the energy spectrum of the test material at discrete points.
    Type: Grant
    Filed: February 4, 2002
    Date of Patent: July 20, 2004
    Assignee: Niton Corporation
    Inventors: Lee Grodzins, Hal Grodzins
  • Patent number: 6697454
    Abstract: An x-ray apparatus and method are presented for controlling x-rays to analyze combinatorial libraries for the rapid screening of different materials and different conditions. The apparatus includes a laboratory x-ray source, one or more x-ray optics, a combinatorial library, and a detector such as an x-ray detector or an electron energy detector. The apparatus can be used to perform analytical measurements on individual members of the library, where the measurements may comprise x-ray fluorescence, x-ray diffraction, total reflection x-ray fluorescent spectrometry, and/or extended x-ray absorption fine structure.
    Type: Grant
    Filed: June 29, 2000
    Date of Patent: February 24, 2004
    Assignee: X-Ray Optical Systems, Inc.
    Inventors: Jeffrey P. Nicolich, David M. Gibson
  • Patent number: 6611577
    Abstract: In order to render the value of the fluorescent X-ray strength Ia2 of a standard sample 2 multiplied by the ratio PF1/PF2 between respective grading coefficients of standard samples 1 and 2 to approach the value of the fluorescent X-ray strength Ia1 of the standard sample 1, specific glancing angles øa* and øb* are determined. The abundance of a substance of interest is determined from fluorescent X-ray strengths Ia3 and Ib3 of a sample to be measured that is irradiated at the determined specific glancing angles øa* and øb*, to thereby provide an accurate determination of the abundance of the substance of interest.
    Type: Grant
    Filed: February 11, 2002
    Date of Patent: August 26, 2003
    Assignee: Rigaku Industrial Corporation
    Inventor: Motoyuki Yamagami
  • Patent number: 6611576
    Abstract: A novel method of automatically controlling thickness of a metal film during film deposition in a deposition chamber. The method involves producing an X-ray beam directed to the metal film deposited on a wafer in a deposition chamber, and detecting X-ray fluorescence of the metal film. The thickness of the metal film determined based on the detected X-ray fluorescence is compared with a preset value to continue deposition if the determined thickness is less than the preset value. Deposition is stopped when the determined thickness reaches the preset value.
    Type: Grant
    Filed: February 12, 2001
    Date of Patent: August 26, 2003
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Paul R. Besser, Paul L. King
  • Publication number: 20030152191
    Abstract: In order to render the value of the fluorescent X-ray strength Ia2 of a standard sample 2 multiplied by the ratio PF1/PF2 between respective grading coefficients of standard samples 1 and 2 to approach the value of the fluorescent X-ray strength Ia1 of the standard sample 1, specific glancing angles øa* and øb* are determined. The abundance of a substance of interest is determined from fluorescent X-ray strengths Ia3 and Ib3 of a sample to be measured that is irradiated at the determined specific glancing angles øa* and øb*, to thereby provide an accurate determination of the abundance of the substance of interest.
    Type: Application
    Filed: February 11, 2002
    Publication date: August 14, 2003
    Inventor: Motoyuki Yamagami
  • Patent number: 6590955
    Abstract: An open chamber-type X-ray fluorescence analysis apparatus is provided to analyze a large-sized sample located outside the open chamber. The apparatus has a helium inlet provided in the open chamber for injecting helium gas into the chamber to replace gas within the chamber with helium, a film attaching/removing mechanism for covering the opening in the chamber with a film having high transmittance with respect to X-rays, and a gas outlet provided in the chamber for allowing gas to exit the chamber.
    Type: Grant
    Filed: April 5, 2001
    Date of Patent: July 8, 2003
    Assignee: Seiko Instruments Inc.
    Inventors: Yoshiki Matoba, Mitsuo Naito, Koichi Tamura
  • Publication number: 20020097832
    Abstract: Secure documents and methods and apparatus for making the same. The documents are made secure using apparatus and methods in which one or more taggants are placed in the paper or ink of the document. The present or absence of the taggant within the document is detected by x-ray fluorescence analysis, thereby identifying or verifying the document.
    Type: Application
    Filed: January 19, 2001
    Publication date: July 25, 2002
    Inventors: Bruce J. Kaiser, Gerhard A. Meyer
  • Publication number: 20020094058
    Abstract: An apparatus and method in which one or more taggants that are intrinsically located—or extrinsically placed—in an article or product, such as plastic. The taggants are detected by x-ray fluorescence analysis to identify or verify the article or its point of manufacture. The taggants are manufactured as part of the article or the taggant is placed into a coating, label, or otherwise embedded within the article for the purpose of later verifying the presence or absence of these elements by x-ray fluorescence, thus determining the unique elemental composition of the taggant within the article.
    Type: Application
    Filed: January 16, 2001
    Publication date: July 18, 2002
    Inventors: Bruce J. Kaiser, L. Stephen Price, David J. Watson, Don Kenning, Dan Schoepflin, Robert D. Kuhlman
  • Publication number: 20020085667
    Abstract: A preferred embodiment of the present invention provides a method and apparatus for automatic offset correction in digital fluoroscopic x-ray imaging systems. In a preferred embodiment, the method comprises exposing a detector to an energy source to obtain image exposure data from an exposed detector section within the detector. The method further comprises obtaining reference data from at least one reference area that is unaffected by the energy source. The method further comprises generating a diagnostic image based on a relation between the image exposure data and the reference data. In a preferred embodiment, the apparatus comprises an energy source and a detector. The detector comprises an exposed detector section. The detector includes at least one reference area. The at least one reference area is unaffected by the energy source.
    Type: Application
    Filed: December 28, 2000
    Publication date: July 4, 2002
    Inventor: Christopher Miller
  • Patent number: 6324251
    Abstract: A fluorescent x-ray analyzer has a sample table with a movable part such as a turret which can be moved such that a sample which is placed at a specified sample position thereon can be moved to a specified position for analysis, an x-ray source for emitting primary x-rays, a detector for detecting secondary x-rays emitted from the irradiated sample, and a correcting device for correcting the detection signal outputted from the detector for an error caused by the variation in the sample position, or the variations in the distance between the plane of measurement and the x-ray source and/or the detector.
    Type: Grant
    Filed: December 16, 1999
    Date of Patent: November 27, 2001
    Assignee: Shimadzu Corporation
    Inventor: Shoji Kuwabara
  • Patent number: 6314158
    Abstract: A data processor for fluorescent x-ray spectroscopy calculates theoretical x-ray intensity which is theoretically expected to be obtained by a fluorescent x-ray spectroscopy measurement of a standard sample with known composition by taking into account the effects of x-ray attenuation by the possible presence of an environmental gas along the optical path of the x-rays between the x-ray tube and the sample and between the sample and the detector. The element sensitivity for each of elements in the standard sample is obtained from this calculated x-ray intensity and the intensity actually measured and is stored in a memory. When a fluorescent x-ray spectroscopy measurement is carried out on an unknown sample, the sample is quantitatively analyzed, a theoretically calculated x-ray intensity obtained also by taking into account the effects of x-ray attenuation by an environmental gas is used together with the actually measured x-ray intensity and the element sensitivities stored in the memory.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: November 6, 2001
    Assignee: Shimadzu Corporation
    Inventors: Tadahiro Shiota, Makoto Nishino, Shoji Kuwabara
  • Patent number: 6292532
    Abstract: A fluorescent X-ray analyzing apparatus capable of being used as either a wavelength dispersive type or an energy dispersive type is provided, with which the analysis can be performed quickly and accurately. The fluorescent X-ray analyzing apparatus includes a detecting unit for detecting and analyzing fluorescent X-ray (5) emitted from at least one target area (1a) of a sample (1) to be analyzed as a result of excitation of such target area (1a) with a primary X-ray (3). The detecting unit includes a wavelength dispersive type detecting unit (6) including a spectroscope (8) and a first detector (9), and an energy dispersive type detecting unit (11) including a second detector (12) of an energy dispersive type.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: September 18, 2001
    Assignee: Rigaku Industrial Corporation
    Inventors: Naoki Kawahara, Takashi Shoji, Takashi Misonoo, Kouichi Aoyagi, Akira Arake, Takashi Sakamoto, Minoru Inoue, Yasujiro Yamada
  • Patent number: 6225136
    Abstract: A method of controllably adding at least one contaminant to a surface of a silicon wafer. The method includes providing a solution containing a known concentration of one or more contaminants and having a known pH. The solution is applied to a surface of a silicon wafer and allowed to remain there for a predetermined period of time so that the one or more contaminants adsorb to the wafer surface. The solution is then removed while leaving the adsorbed one or more contaminants on the surface.
    Type: Grant
    Filed: August 25, 1999
    Date of Patent: May 1, 2001
    Assignee: SEH America, Inc.
    Inventors: Justin R. Lydon, Brian L. Tansy
  • Patent number: 6140643
    Abstract: The present invention relates to a method for determining the mineral composition of an unknown material using both a fuzzy classification system and a confidence measure of substances identified by the fuzzy classification system. The method can be adapted for identification of pore space and sample points containing more than one material.
    Type: Grant
    Filed: March 9, 1999
    Date of Patent: October 31, 2000
    Assignee: ExxonMobil Upstream Research Company
    Inventors: Roy W. Brown, Chul-Sung Kim
  • Patent number: 6118844
    Abstract: In a method for the determination of the measuring uncertainty for a device for X-ray fluorescence slice thickness measurements during measurement of a layer of a sample under investigation, a spectrum S(K) simulating an actual fluorescent radiation spectrum is generated for the channels K of a spectrum and for a given thickness d of the layer and, in each channel K, a random number generator is used to repetitively accumulate a random value to construct a total number N(K) of events registered in the K-th channel in measurement time t and the standard deviation .sigma.(d) is determined from the spectrum of slice thicknesses d extracted by means of the repetitive random values as measure of the measurement uncertainty.
    Type: Grant
    Filed: September 8, 1998
    Date of Patent: September 12, 2000
    Assignee: Helmut Fischer GmbH & Co Institut fur Elektronik und Messtechnik
    Inventor: Helmut Fischer
  • Patent number: 6043486
    Abstract: A concentration measurement device is calibrated for a target element by performing a concentration measurement on a reference standard sample which includes a number of atoms of a radioactive marker element in known ratio to a number of atoms of the target element. Both the ratio of atoms of the target element to those of the radioactive marker element and a count of decay products of the radioactive marker element are analytically quantified. Because the count of decay products is correlated with the number of atoms of the radioactive marker element, the ratio and the count of decay products are used to accurately calculate the otherwise unknown number of impurity atoms and to calibrate a concentration measurement signal from the concentration measurement device.
    Type: Grant
    Filed: January 5, 1999
    Date of Patent: March 28, 2000
    Assignee: Advanced Micro Devices, Inc.
    Inventor: Tim Z. Hossain
  • Patent number: 6041096
    Abstract: A method and an apparatus for total reflection X-ray fluorescence spectroscopy which facilitates total reflection X-ray fluorescent spectroscopy of a sample having irregularities.
    Type: Grant
    Filed: February 6, 1998
    Date of Patent: March 21, 2000
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Ichiro Doi, Shoichiro Tonomura
  • Patent number: 6012325
    Abstract: A method and apparatus for measuring metallic impurities within a fluid by X-ray fluorescence in which a sample stream flowing at a constant flow rate is passed through a microporous filter. The microporous filter contains substantially no metallic impurities and is configured to adsorb the particulate solid phase and vapor phase of the compounds. Excitation of the metallic compounds by X-ray produces an X-ray florescence having an intensity that can be measured. The change in intensity is compared with that produced by a calibrated inflow of a standard gas sample to derive the impurity concentration. In a preferred embodiment, the filter is housed within a chamber having a window that is preferably fabricated from Beryllium so as not to appreciably attenuate the X-rays.
    Type: Grant
    Filed: November 5, 1997
    Date of Patent: January 11, 2000
    Assignee: The BOC Group, Inc. (a Delaware Corporation)
    Inventor: Ce Ma
  • Patent number: 5663997
    Abstract: A method and apparatus for determining the composition of glass, and for sorting glass according to composition. Glass of unknown composition is irradiated and an x-ray fluorescence spectrum is detected from the glass. The detected x-ray fluorescence spectrum is then compared with a plurality of fluorescence spectra corresponding to glasses of known composition. The glass of unknown composition is then determined to correspond in composition to the glass of known composition having an x-ray fluorescence spectrum most closely matching the spectrum detected from the glass of unknown composition. The glass may then be sorted according to determined composition. In operation, a substantially continuous stream of glass pieces is irradiated and detected while the stream is moving. Once the composition of a piece of glass in the stream is determined, it is diverted into an appropriate container of like compositioned glass.
    Type: Grant
    Filed: January 27, 1995
    Date of Patent: September 2, 1997
    Assignees: Asoma Instruments, Inc., Dunkirk International Glass and Ceramics Corporation
    Inventors: James E. Willis, Andrew L. Heilveil, Robert Dejaiffe
  • Patent number: 5570406
    Abstract: A method and apparatus for determining the concentration of an element in a sample with a fluorescent X-ray qualitative analytical procedure is provided. An X-ray tube radiates a sample with primary X-rays to create fluorescent X-rays from elements in the sample. The computer system can have preset conditions for a measurement of a predetermined concentration amount of an element at a predetermined probability of accuracy. The X-rays coming from the sample are detected, and calculations are performed to determine both the concentration of the element and the predetermined probability of accuracy. These values can be compared automatically with the predetermined values and, when the comparison indicates that the calculated concentration of the element meets the predetermined amount or is greater within the predetermined probability of accuracy, the measurement cycle can be stopped, thereby avoiding unnecessary measurement time.
    Type: Grant
    Filed: July 18, 1995
    Date of Patent: October 29, 1996
    Assignee: Horiba, Ltd.
    Inventor: Shintaro Komatani
  • Patent number: 5541973
    Abstract: A method for analyzing a micro area in a micro area X-ray analyzing device which detects X-rays from a sample irradiated by a primary beam and analyzes the sample by analyzing spectra of the X-rays, which method includes selecting a combination of a plurality of stage positions in which an overlapped area of a plurality of primary beam spots nearly conforms with a predetermined analytical area, and calculating a common element of X-ray spectra acquired in the plural stage positions to obtain information on the predetermined analytical area and a background of the sample.
    Type: Grant
    Filed: March 29, 1995
    Date of Patent: July 30, 1996
    Assignee: Seiko Instruments Inc.
    Inventor: Kouichi Tamura