Abstract: A calibration technique is provided that utilizes a standard sample that allows for calibration in the wavelengths of interest even when the standard sample may exhibit significant reflectance variations at those wavelengths for subtle variations in the properties of the standard sample. A second sample, a reference sample may have a relatively featureless reflectance spectrum over the same spectral region and is used in combination with the calibration sample to achieve the calibration. In one embodiment the spectral region may include the VUV spectral region.

Abstract: A dental colorimetry apparatus that allows the color balance of an entire row of teeth to be checked is provided. The invention provides a dental colorimetry apparatus 2 including a multiband-image storing section 21 storing images of teeth in association with information about the positions of the teeth in row of teeth; a contour-line extracting section 25 for extracting contour lines of the teeth from the images of the teeth; a rectangle-setting section 27 for setting rectangles in the images of the teeth so as to include the contour lines extracted by the contour-line extracting section 25 and so as to circumscribe at least both sides of the teeth; and an image-generating section 29 for generating a row-of-teeth image by arranging the images of the teeth based on the information about the positions of the teeth in the row of teeth so that the rectangles adjoin each other.

Abstract: A method of manufacturing an optical system comprises assembling an optical element on a mounting frame thereof. The mounting frame is disposed on a rotary table having an axis of rotation, and the mounting frame is adjusted such that a predefined axis of symmetry thereof is parallel to the axis of rotation. The optical element is placed on the mounting frame, and an interferometric measurement of a surface of the optical element is performed. The interferometric measurement is analyzed to arrange the optical element relative to the mounting frame such that a predefined axis of the optical element is parallel to the axis of rotation.

Abstract: The invention provides a crystal structure analysis method so as to analyze crystal structures in detail. The inventive method comprises incrementing the tilting angle &psgr; of the SBT thin film 1 by one degree in a range of 0 degree ≦y≦90 degrees, for each of the increments of the tilting angle &psgr; irradiating the X-ray onto the SBT thin film with the incident angle &thgr; being incremented by 0.025 degrees in a range of 0 degree ≦&thgr;≦90 degrees and detecting the X-rays diffracted from the SBT thin film 1 by the detector 3.

Abstract: A method of measuring the lattice parameter in an unknown single crystal by omparing its diffraction angle to a standard single crystal, on a double-crystal diffractometer is disclosed.

Abstract: The invention comprises a method of, and apparatus for, measuring the orientation error in a single crystal. An X-ray beam is reflected from the surface of the crystal while it is rotated, and the orientation error is determined from the figure traced at a detector by the reflected beam. The orientation error may be calculated from the major axes of the traced figure, or, if the X-ray beam contains a characteristic line, from the separation of the two bright spots produced in the traced figure.