With Rf Input Means Patents (Class 422/186.29)
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Patent number: 8420021Abstract: There is provided an ignition or plasma generation apparatus that eliminates the need for resonance means in a combustion chamber and simplifies the electrode structure within the combustion chamber in an instance where energy from each of a spark discharge and microwaves is used to ignite an air-fuel mixture gas in an internal combustion engine. The ignition or plasma generation apparatus includes a mixing circuit for mixing a high-voltage pulse from a high-voltage pulse generator and microwave energy from a microwave generator; and an ignition plug into which an output from the mixing circuit is supplied, the plug used for introducing the output into a combustion chamber of an internal combustion engine. The output supplied from the mixing circuit to the ignition plug is supplied in a manner in which the microwave energy and the high-voltage pulse are superimposed on each other on a same transmission line.Type: GrantFiled: June 21, 2012Date of Patent: April 16, 2013Assignee: Imagineering, Inc.Inventors: Minoru Makita, Yuji Ikeda
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Patent number: 8361282Abstract: Approaches for producing fuel from a carbon-containing feedstock are described. Feedstock is introduced into a substantially microwave-transparent reaction chamber. A microwave source emits microwaves which are directed through the microwave-transparent wall of the reaction chamber to impinge on the feedstock within the reaction chamber. The microwave source may be rotated relative to the reaction chamber. The feedstock is subjected to microwaves until the desired reaction occurs to produce a fuel. A catalyst can be mixed with the feedstock to enhance the reaction process.Type: GrantFiled: August 11, 2010Date of Patent: January 29, 2013Assignee: TekGar, LLCInventors: Douglas Van Thorre, Michael Catto, Sherman Aaron
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Patent number: 8337769Abstract: A method for heating materials by application of radio frequency (“RF”) energy is disclosed. For example, the disclosure concerns a method and apparatus for RF heating of petroleum ore, such as bitumen, oil sands, oil shale, tar sands, or heavy oil. Petroleum ore is mixed with a substance comprising mini-dipole susceptors such as carbon strands. A source is provided which applies RF energy to the mixture of a power and frequency sufficient to heat the mini-dipole susceptors. The RF energy is applied for a sufficient time to allow the mini-dipole susceptors to heat the mixture to an average temperature greater than about 212° F. (100° C.). Optionally, the mini-dipole susceptors can be removed after the desired average temperature has been achieved. The susceptors may provide advantages for the RF heating of hydrocarbons, such as higher temperatures (sufficient for distillation or pyrolysis), anhydrous processing, and greater speed or efficiency.Type: GrantFiled: March 7, 2012Date of Patent: December 25, 2012Assignee: Harris CorporationInventor: Francis Eugene Parsche
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Patent number: 8337764Abstract: A recess waveguide microwave chemical plant for production of ethene from natural gas and a process for production of ethene using the plant. The plant includes a recess waveguide, a mode transducer and coupling orifice plate, an adjustable short-circuiting plunger, and a chemical reactor; wherein with the recess waveguide as a main body, the mode transducer and coupling orifice plate is at the left side of the recess waveguide, the adjustable short-circuiting plunger is at the right side of the recess waveguide, and the chemical reactor is across the recess waveguide.Type: GrantFiled: November 10, 2006Date of Patent: December 25, 2012Inventors: Hongsheng Yang, Dekun Sun
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Publication number: 20120297673Abstract: A system for creating a nitrate combined with a liquid. A corona discharge cell to generate an electrical field. The corona discharge cell further comprising a conduit to pass air through the electrical field to produce nitric oxide NO, wherein the air comprises a mixture of at least nitrogen N2 and oxygen O2, the conduit for combining the nitric oxide NO with the oxygen O2 to form nitrogen dioxide NO2. The corona discharge cell further comprising an injector for combining the nitrogen dioxide NO2 with the liquid to generate nitric acid HNO3 which combines with the liquid to generate the nitrate comprised of nitrate radical NO3 mixed with the liquid.Type: ApplicationFiled: May 15, 2012Publication date: November 29, 2012Inventor: Russell J. Keller
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Patent number: 8226901Abstract: There is provided an ignition or plasma generation apparatus that eliminates the need for resonance means in a combustion chamber and simplifies the electrode structure within the combustion chamber in an instance where energy from each of a spark discharge and microwaves is used to ignite an air-fuel mixture gas in an internal combustion engine. The ignition or plasma generation apparatus includes a mixing circuit for mixing a high-voltage pulse from a high-voltage pulse generator and microwave energy from a microwave generator; and an ignition plug into which an output from the mixing circuit is supplied, the plug used for introducing the output into a combustion chamber of an internal combustion engine. The output supplied from the mixing circuit to the ignition plug is supplied in a manner in which the microwave energy and the high-voltage pulse are superimposed on each other on a same transmission line.Type: GrantFiled: July 12, 2008Date of Patent: July 24, 2012Assignee: Imagineering, Inc.Inventors: Minoru Makita, Yuji Ikeda
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Publication number: 20120055781Abstract: An instrument and method for accelerating the solid phase synthesis of peptides are disclosed. The method includes the steps of deprotecting a protected first amino acid linked to a solid phase resin by admixing the protected linked acid with a deprotecting solution in a microwave transparent vessel while irradiating the admixed acid and solution with microwaves, activating a second amino acid, coupling the second amino acid to the first acid while irradiating the composition in the same vessel with microwaves, and cleaving the linked peptide from the solid phase resin by admixing the linked peptide with a cleaving composition in the same vessel while irradiating the composition with microwaves.Type: ApplicationFiled: November 11, 2011Publication date: March 8, 2012Applicant: CEM CORPORATIONInventors: JONATHAN MCKINNON COLLINS, JOSEPH JOSHUA LAMBERT, MICHAEL JOHN COLLINS
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Patent number: 8128786Abstract: Equipment and a process for separating bitumen from oil sand in a process stream are described. The equipment includes several processing vessels and one or more local area radio frequency applicators to selectively heat the process stream in local areas of the equipment. The local area can be adjacent to an input or output of a component of the equipment. Also described is equipment for processing an oil sand—water slurry, including a slurrying vessel, a slurry pipe, and a local area radio frequency applicator. The local area radio frequency applicator is located outside of the slurry pipe, and heats the local area without significantly heating the contents of the slurrying vessel or of the downstream portion of the slurry pipe.Type: GrantFiled: March 2, 2009Date of Patent: March 6, 2012Assignee: Harris CorporationInventors: John White, Francis Eugene Parsche, Victor Hernandez, Derik T. Ehresman, Mark E. Blue
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Publication number: 20120034137Abstract: A reaction vessel has a reaction chamber; and one or more plasma sources coupled to the reaction chamber. Each plasma source has a plasma generator in fluid communication with a reaction region within the reaction chamber whereby the plasma generator at least partly ionises material to form a plasma prior to entry of the at least partly ionised material into the reaction region. The reaction vessel further includes a flow inducer for establishing a fluid flow within the reaction chamber. The flow inducer has the coupling of the one or more plasma sources to the reaction chamber. The coupling induces the flow of the at least partly ionised material from the plasma generator to establish a fluid flow within the reaction chamber. The flow of the at least partly ionised material from the plasma generator is a vortex.Type: ApplicationFiled: February 19, 2010Publication date: February 9, 2012Applicant: GASPLAS ASInventor: Philip John Risby
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Publication number: 20120034136Abstract: A coaxial VHF power coupler includes conductive element inside a hollow cylindrical outer conductor of the power coupler and surrounding an axial section of a hollow cylindrical inner conductor of the power coupler. Respective plural motor drives contacting the hollow cylindrical outer conductor are connected to respective locations of the movable conductive element.Type: ApplicationFiled: March 17, 2011Publication date: February 9, 2012Applicant: Applied Materials, Inc.Inventors: Kenneth S. Collins, Zhigang Chen, Kartik Ramaswamy, James D. Carducci, Shahid Rauf, Andrew Nguyen
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Publication number: 20110262309Abstract: In accordance with the present invention, there are provided simplified systems and methods for deactivating, removing, or reducing the levels of reactive component(s) from vapor phase fluids prior to introduction thereof into fuel storage tanks. The simple apparatus described herein can be utilized to replace complex systems on the market. Simply stated, in one embodiment of the invention, the vapor phase fluid contemplated for introduction into the fuel storage tank is passed through a reaction zone (e.g., a catalytic bed) operated at appropriate temperatures to allow the reaction between free reactive components therein (e.g., oxygen and hydrogen or other fuel vapor), thereby deactivating reactive component(s) in the gas phase.Type: ApplicationFiled: August 20, 2008Publication date: October 27, 2011Inventors: Santosh Y. Limaye, Stuart Robertson, Donald Koenig, Wesley Jung
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Publication number: 20110263843Abstract: The present invention provides a microwave radiating device which treats a radiated material by microwave irradiation; and further provides a method of producing a sugar ingredient from a plant material. The microwave radiating device of the present invention is equipped with an irradiating means which has a microwave radiating source, and containers which accept radiated material inside. Further, the container of the device has supply means which provides radiated material to the container, and discharge means which discharges radiated material from the container, and a microwave receiving section which makes microwaves that irradiate from radiating means, penetrate into the container through the medium of dielectric material. Further, there is provided at least one layer that is composed of non-dielectric material, between the atmosphere of the inner side and the outer side of the container. Yet, irradiating means and the above container are connected in a removable mode.Type: ApplicationFiled: July 28, 2009Publication date: October 27, 2011Applicants: Japan Chemical Engineering & Machinery Co., Ltd., Kyoto UniversityInventors: Takashi Watanabe, Naoki Shinohara, Tomohiko Mitani, Masafumi Oyadomari, Yasunori Ohashi, Pradeep Verma, Takahiko Tsumiya, Hisayuki Sego, Yasuhiro Takami
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Publication number: 20110262315Abstract: A substrate support useful for a plasma processing apparatus includes a metallic heat transfer member and an overlying electrostatic chuck having a substrate support surface. The heat transfer member includes one or more passage through which a liquid is circulated to heat and/or cool the heat transfer member. The heat transfer member has a low thermal mass and can be rapidly heated and/or cooled to a desired temperature by the liquid, so as to rapidly change the substrate temperature during plasma processing.Type: ApplicationFiled: June 24, 2011Publication date: October 27, 2011Applicant: Lam Research CorporationInventor: Robert J. Steger
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Publication number: 20110240567Abstract: The invention provides a method and apparatus for creating plasma particles and applying the plasma particles to a liquid. Liquid feedstock (e.g., water and/or hydrocarbons mixed with biomass) is pumped through a pipeline; the single-phase stream is then transformed into a biphasic liquid-and-gas stream inside a chamber. The transformation is achieved by transitioning the stream from a high pressure zone to a lower-pressure zone. The pressure drop may occur when the stream further passes through a device for atomizing liquid. Inside the chamber, an electric field is generated with an intensity level that exceeds the threshold of breakdown voltage of the biphasic medium leading to a generation of a plasma state. Furthermore, the invention provides an energy-efficient highly adaptable and versatile method and apparatus for sanitizing water using plasma particles to inactivate biological agents contaminating water.Type: ApplicationFiled: February 4, 2011Publication date: October 6, 2011Inventor: Alfredo ZOLEZZI-GARRETON
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Patent number: 8012546Abstract: A method for producing a semiconductor film having a chalcopyrite structure including a Ib group element, a IIIb group element and a VIb group element including selenium, the method including cracking selenium with plasma to generate radical selenium, and using the radical selenium in the process of forming the semiconductor film.Type: GrantFiled: August 23, 2007Date of Patent: September 6, 2011Assignee: National Institute of Advanced Industrial Science and TechnologyInventors: Shogo Ishizuka, Shigeru Niki, Keiichiro Sakurai, Akimasa Yamada, Koji Matsubara
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Publication number: 20110180385Abstract: According to one embodiment, a method for controlling a chemical process comprises receiving a catalytic materials composition. The catalytic materials composition comprise at least one catalyst material and at least one reactant material. Nanostructure material is added to the catalytic materials composition. The nanostructure material comprises at least one nanoscale-sized space therein. The nanostructure material is irradiated with electromagnetic radiation such that the nanostructure material facilitates energy transfer between the nanostructure material and the catalytic materials composition.Type: ApplicationFiled: January 28, 2010Publication date: July 28, 2011Applicant: Raytheon CompanyInventor: Timothy J. Imholt
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Device and method for destroying liquid, powder or gaseous waste using an inductively coupled plasma
Patent number: 7981371Abstract: The invention relates to a device and a process for the destruction of toxic or hazardous chemical products using inductively coupled plasma. These products may occur in liquid, gaseous or powder form and belong to the family of organic or halogenated organic compounds.Type: GrantFiled: February 16, 2005Date of Patent: July 19, 2011Assignee: Commissariat a l'Energie AtomiqueInventors: Erick Meillot, David Guenadou -
Publication number: 20110036706Abstract: Approaches for producing fuel from a carbon-containing feedstock are described. Feedstock is introduced into a substantially microwave-transparent reaction chamber. A microwave source emits microwaves which are directed through the microwave-transparent wall of the reaction chamber to impinge on the feedstock within the reaction chamber. The microwave source may be rotated relative to the reaction chamber. The feedstock is subjected to microwaves until the desired reaction occurs to produce a fuel. A catalyst can be mixed with the feedstock to enhance the reaction process.Type: ApplicationFiled: August 11, 2010Publication date: February 17, 2011Inventors: Douglas Van Thorre, Michael Catto, Sherman Aaron
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Patent number: 7842252Abstract: The present disclosure provides a system and method to dissociate water molecules into H2 and O2 and includes a reaction vessel having at least one radiolysis apparatus, at least one photolysis apparatus, at least one catalyst apparatus, and at least one electromagnetic fielding apparatus. The reaction vessel has a body, a first end and a second end defining an interior reaction chamber, an inlet for receiving water vapor and at least two outlets. A plurality of windings of a contiguous electrical conductor are wound in a first direction adjacent the first outlet and plurality of windings of a contiguous electrical conductor wound in a second direction adjacent the second outlet such that the first direction is opposite the second direction. When a current is applied to the conductor, an electromagnetic field is generated to migrate the disassociated H2 and O2 molecules toward the respective first outlet or second outlet.Type: GrantFiled: February 28, 2007Date of Patent: November 30, 2010Assignee: Coastal Hydrogen Energy, Inc.Inventor: Gary N. Austin
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Publication number: 20100247403Abstract: Sterilisation apparatus arranged controllably to generate and emit hydroxyl radicals. The apparatus includes an applicator which receives RF or microwave energy, gas and water mist in a hydroxyl radical generating region. The impedance at the hydroxyl radical generating region is controlled to be high to promote creation of an ionisation discharge which in turn generates hydroxyl radicals when water mist is present. The applicator may be a coaxial assembly or waveguide. A dynamic tuning mechanism e.g. integrated in the applicator may control the impedance at the hydroxyl radical generating region. The mist and/or gas and/or energy delivery means may be integrated with each other.Type: ApplicationFiled: November 6, 2008Publication date: September 30, 2010Applicant: Microoncology LimitedInventor: Christopher Paul Hancock
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Patent number: 7771672Abstract: A variety of reactors that are arranged to treat aerosol particulates that are carried in a fluid stream passing through the reactor is described. In one aspect, the reactor includes a plasma chamber arranged to receive the fluid stream and subject particulates carried in the fluid stream to a cold plasma that has a sufficiently high concentration of reactive species to treat at least some of the particulates passing therethrough. A catalyst is provided downstream of the plasma chamber. The catalyst is arranged to enhance the conversion of reactive species that are contained in the fluid stream before the stream emerges from the reactor. In another aspect, a catalyst electrode is described. The catalyst electrode may include a catalyst material carried on an electrode. A potential may be applied to the electrode during use to attract charged species towards the catalyst.Type: GrantFiled: April 18, 2006Date of Patent: August 10, 2010Assignee: Airinspace B.V.Inventors: Vance Bergeron, Laurent Adrien Fullana
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Publication number: 20100175987Abstract: The invention relates to a surface dielectric barrier discharge plasma unit. The unit comprises a solid dielectric structure provided with an interior space wherein an interior electrode is arranged. Further, the unit comprises a further electrode for generating in concert with the interior electrode a surface dielectric barrier discharge plasma. The unit is also provided with a gas flow path along a surface of the structure.Type: ApplicationFiled: December 28, 2007Publication date: July 15, 2010Applicant: Nederlandse Organisatie Voor Toegepast- Natuurwetenschappelijk Onderzoek TNOInventors: Yves Lodewijk Maria Creyghton, Marcel Simor, Timo Huijser
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Publication number: 20100170778Abstract: The present invention relates to a process for the production of polyaluminium salts, preferably polyaluminium sulphate and polyaluminium chloride, and derivatives thereof, from aluminium containing raw materials and acids, wherein microwaves are used for partial heating of the reaction mixture. The present invention also relates to a system for the production of polyaluminium salts and derivatives thereof.Type: ApplicationFiled: June 5, 2008Publication date: July 8, 2010Applicant: KEMIRA KEMI ABInventors: Stig Gunnarsson, Marten Soderlund
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Publication number: 20100129272Abstract: The plasma generating apparatus includes: an antenna chamber which is disposed adjacently to a plasma chamber that produces a plasma, and which is exhausted to vacuum; an antenna which is disposed in the antenna chamber, and which radiates a high-frequency wave; a partition plate which is made of an insulator, which separates the plasma chamber from the antenna chamber to block a gas from entering the antenna chamber, and which allows the high-frequency wave radiated from the antenna to pass through the partition plate; and a magnet device which is disposed outside the plasma chamber, and which generates a magnetic field for causing electron cyclotron resonance in the plasma chamber.Type: ApplicationFiled: September 18, 2009Publication date: May 27, 2010Applicant: NISSIN ION EQUIPMENT CO., LTD.Inventors: Hideki Fujita, Kibatsu Shinohara
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Publication number: 20100096109Abstract: Methods and apparatus for regulating the temperature of a component in a plasma-enhanced process chamber are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber and an RF source to provide RF energy to form a plasma in the process chamber. A component is disposed in the process chamber so as to be heated by the plasma when formed. A heater is configured to heat the component and a heat exchanger is configured to remove heat from the component. A chiller is coupled to the heat exchanger via a first flow conduit having an on/off flow control valve disposed therein and a bypass loop to bypass the flow control valve, wherein the bypass loop has a flow ratio valve disposed therein.Type: ApplicationFiled: October 17, 2008Publication date: April 22, 2010Applicant: APPLIED MATERIALS, INC.Inventors: CHUNLEI ZHANG, Richard Fovell, Ezra Robert Gold, Ajit Balakrishna, James P. Cruse
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Publication number: 20100074810Abstract: The present invention provides a plasma generating system that includes at least one nozzle. The nozzle includes: a housing having a cavity formed therein, where the cavity forms a gas flow passageway; a rod-shaped conductor disposed in the cavity and operative to transmit microwave energy along the surface thereof so that the microwave energy excites gas flowing through the cavity; and means for moving a proximal end of the rod-shaped conductor relative to a downstream end of the gas flow passageway.Type: ApplicationFiled: November 12, 2008Publication date: March 25, 2010Inventor: Sang Hun Lee
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Publication number: 20100040516Abstract: A plasma generating apparatus includes a linear electrode for generating a high voltage by resonance caused when the linear electrode is supplied with an AC signal current, an grounded electrode for defining an internal space spaced from the linear electrode around the linear electrode, and a control device for controlling the power feed to the linear electrode. The control device has a field probe for measuring the electric field in the internal space, and a bandpass filter for filtering the measurement signal into a predetermined frequency band to output an AC signal, a variable phase shifter for shifting the phase of the AC signal so that the AC signal is synchronized with the resonance signal in the internal space when the AC signal is supplied to the linear electrode as a current, and an amplifier for amplifying the AC signal of which the phase is shifted.Type: ApplicationFiled: March 27, 2008Publication date: February 18, 2010Applicant: MITSUI ENGINEERING & SHIPBUILDING CO., LTD.Inventor: Noriaki Kimura
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Publication number: 20090304553Abstract: A system for sanitizing or sterilizing an item and storing the item in a sanitized or sterile environment. The system includes an enclosure into which a sealable package containing the item is placed. At least one ozone source is configured to introduce ozone inside the package. The ozone sterilizes the interior of the package and the item. The ozone source can include an electron beam which ionizes the oxygen, a corona discharge generated within the package, or Vacuum Ultra-Violet (“VUV”) radiation emitted into the package. A germicidal radiation source can be used to sanitize the item and generate ozone. The package containing the item is substantially transparent to germicidal radiation so that the germicidal radiation sanitizes the item as well as the interior of the package. Ultrasonic transducers can introduce ultrasonic energy into the item being sanitized, to break apart groups of clumped pathogens resident on the item.Type: ApplicationFiled: December 8, 2008Publication date: December 10, 2009Applicant: Germgard Lighting, LLCInventor: Eugene I. Gordon
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Publication number: 20090297409Abstract: The present invention is generally directed to a single or dual dielectric barrier discharge reactor for generating flow discharge plasmas at atmospheric pressure or higher pressures. In particular, the present invention relates to a providing stable, energy efficient, glow discharge plasmas having a controlled discharge gap.Type: ApplicationFiled: May 30, 2008Publication date: December 3, 2009Inventors: Walter R. Buchanan, Christopher D. Hruska
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Publication number: 20090291027Abstract: There is provided a plasma reactor with an internal transformer. The plasma reactor comprises: a plasma chamber with a gas inlet and a gas outlet, for providing a plasma discharging space; one or more core cylinder jackets for providing a core storage space in the plasma discharging space and forming a plasma centralized channel and a plasma decentralized channel by including one or more through-apertures; and one or more transformers each including a magnetic core with primary winding surrounding the through-aperture and installed in the core storage space, wherein the plasma discharging space comprises one or more first spatial regions to form the plasma centralized channel and one or more second spatial regions to form the plasma decentralized channel. In the plasma reactor, since the transformer is installed in the plasma chamber, energy is transferred with almost no loss from the transformer to the plasma discharging space and therefore the energy transfer efficiency is very high.Type: ApplicationFiled: May 23, 2008Publication date: November 26, 2009Inventor: Dae-Kyu CHOI
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Publication number: 20090274592Abstract: In one aspect of the invention, a plasma reactor is arranged to treat aerosol particulates in a fluid stream passing through the reactor. The plasma reactor includes a plasma chamber having a self-cleaning electrode. The self-cleaning electrode is configured to clean various residues from the electrode without need to open or otherwise service the unit. In another aspect, the invention comprises a carbon-based pre-filter arranged to filter in flowing air to reduce the amount of silicone-based contaminant in the air flow before the air reaches the ionization chamber.Type: ApplicationFiled: April 22, 2009Publication date: November 5, 2009Applicant: AirlnSpace B.V.Inventor: Vance BERGERON
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Publication number: 20090263295Abstract: An apparatus for treating polymeric materials comprises a treatment chamber adapted to maintain a selected atmosphere; a means for supporting the polymeric material within the chamber; and, a source of plasma-derived gas containing at least one reactive oxidative species whereby the polymer is stabilized and cross linked through exposure to the oxidative species in the chamber at a selected temperature. The polymer may be directly exposed to the plasma, or alternatively, the plasma may be established in a separate volume from which the reactive species may be extracted and introduced into the vicinity of the polymer. The apparatus may be configured for either batch-type or continuous-type processing. The apparatus and method are especially useful for preparing polymer fibers, particularly PAN fibers, for later carbonization treatments.Type: ApplicationFiled: May 14, 2009Publication date: October 22, 2009Applicant: UT-BATTELLE, LLCInventors: Felix L. Paulauskas, Terry L. White, Daniel M. Sherman
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Publication number: 20090260973Abstract: A method and apparatus are described that couples a plurality of electromagnetic sources to a material for the purpose of either processing the material or promoting a chemical reaction. The apparatus couples various electromagnetic sources of various frequencies, including provision for static magnetic fields, radio frequency fields, and microwave fields, with the possibility of applying them all simultaneously or in any combination.Type: ApplicationFiled: April 8, 2009Publication date: October 22, 2009Inventors: Vassilli P. Proudkii, Kirk McNeil, Joe Michael Yarborough
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Publication number: 20090257927Abstract: A method for constructing a distributed element coaxial resonator includes folding a coaxial resonator to provide a structure having a decreased physical length compared to its electrical length. In various embodiments, the resonator is tuned to affect a standing wave when excited by a signal of a specific wavelength. The coaxial resonator includes inner, middle and outer conductor sections, wherein the characteristic impedance is maintained throughout the resonator.Type: ApplicationFiled: February 16, 2009Publication date: October 15, 2009Applicant: APPLIED MATERIALS, INC.Inventors: KARTIK RAMASWAMY, HIROJI HANAWA, KENNETH S. COLLINS, LAWRENCE WONG, ANDREW NGUYEN, STEVEN LANE
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Publication number: 20090255800Abstract: A plasma processing apparatus includes a vacuum evacuable processing chamber; a first electrode for supporting a substrate to be processed in the processing chamber; a processing gas supply unit for supplying a processing gas into a processing space; a plasma excitation unit for generating a plasma by exciting the processing gas in the processing chamber; a first radio frequency power supply unit for supplying a first radio frequency power to the first electrode to attract ions in the plasma to the substrate; and a first radio frequency power amplitude modulation unit for modulating an amplitude of the first radio frequency power at a predetermined interval. The plasma processing apparatus further includes a first radio frequency power frequency modulation unit for modulating a frequency of the first radio frequency power in substantially synchronously with the amplitude modulation of the first radio frequency power.Type: ApplicationFiled: March 31, 2009Publication date: October 15, 2009Applicant: TOKYO ELECTRON LIMITEDInventor: Chishio Koshimizu
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Publication number: 20090214402Abstract: The invention relates to a microplasma array for producing low-temperature plasmas at or close to atmospheric pressure. According to the invention, the walls of holes which are introduced into a substrate (1) at regular intervals from each other and form hollow electrodes (2) are metal-coated, and said hollow electrodes (2) are supplied individually or in groups with electrical excitation in the GHz range from one side of the substrate (1).Type: ApplicationFiled: January 11, 2006Publication date: August 27, 2009Applicant: FORSCHUNGSVERBUND BERLIN E.V.Inventor: Roland Gesche
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Publication number: 20090194236Abstract: A plurality of concentric ring-shaped slots (300) to (304) are formed in a planar antenna member (3), and the thickness of conductors in the central part is made relatively thin and the thickness of peripheral conductors is made relatively thick, so that a microwave can easily pass through the slots (300) to (304) without being attenuated, and a uniform electric field distribution can be provided and uniform high-density plasma can be generated in a processing space on an average. As a result, an object to be processed can be provided close to the antenna member (3) and the object can be uniformly processed at high speed.Type: ApplicationFiled: June 20, 2005Publication date: August 6, 2009Applicants: KYOTO UNIVERSITY, TOKYO ELETRON LIMITEDInventors: Kouichi Ono, Hiroyuki Kousaka, Kiyotaka Ishibashi, Ikuo Sawada
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Patent number: 7553353Abstract: A system for decontaminating a gas is provided. The system includes: a passageway containing at least one set of two or three electrodes. If the set contains three electrodes, it has two outer electrodes electrically connected together and one inner electrode.Type: GrantFiled: February 10, 2005Date of Patent: June 30, 2009Inventor: Jean-Pierre Lepage
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Publication number: 20090159424Abstract: The present invention generally provides apparatus and method for processing a substrate. Particularly, the present invention provides apparatus and methods to obtain a desired distribution of a process gas. One embodiment of the present invention provides an apparatus for processing a substrate comprising an injection nozzle having a first fluid path including a first inlet configured to receive a fluid input, and a plurality of first injection ports connected with the first inlet, wherein the plurality of first injection ports are configured to direct a fluid from the first inlet towards a first region of a process volume, and a second fluid path including a second inlet configured to receive a fluid input, and a plurality of second injection ports connected with the second inlet, wherein the second injection ports are configured to direct a fluid from the second inlet towards a second region of the process volume.Type: ApplicationFiled: December 19, 2007Publication date: June 25, 2009Inventors: Wei Liu, Johanes S. Swenberg, Hanh D. Nguyen, Son T. Nguyen, Roger Curtis, Philip A. Bottini
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Publication number: 20090145553Abstract: A chamber component configured to be coupled to a process chamber and a method of fabricating the chamber component is described. The chamber component comprises a chamber element comprising a first surface on a supply side of the chamber element and a second surface on a process side of the chamber element, wherein the chamber element comprises a reentrant cavity formed in the first surface and a conduit having an inlet coupled to the reentrant cavity and an outlet coupled to the second surface. Furthermore, the chamber component comprises an insertable member configured to couple with the reentrant cavity, the insertable member having one or more passages formed there through and each of the one or more passages are aligned off-axis from the conduit, wherein the one or more passages are configured to receive a process fluid on the supply side and the conduit is configured to distribute the process fluid from the one or more passages on the process side.Type: ApplicationFiled: December 6, 2007Publication date: June 11, 2009Applicant: TOKYO ELECTRON LIMITEDInventors: Lee CHEN, Lin XU
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Publication number: 20090071816Abstract: A radio frequency plasma-water dissociator incorporates a plasma boiler, a RF Conduit, a dummy load, and a magnetron. The plasma boiler is in communication with the RF Conduit. The RF Conduit is in communication with the dummy load. And the dummy load is in communication with the magnetron. The magnetron is used for the purpose of generating the radio frequency waves.Type: ApplicationFiled: September 18, 2007Publication date: March 19, 2009Inventor: Todd William Wallin
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Patent number: 7485258Abstract: A method and device for sterilizing containers in which a plasma treatment is executed through excitation of an electromagnetic oscillation so that the plasma is excited in a vacuum in the vicinity of the container regions to be sterilized. Between arrival and discharge, the container regions to be sterilized are moved closer to the oscillation-generating device in the chamber, with continuous movement of the container and/or of the oscillation-generating device for one or more predetermined time intervals in such a way that a plasma is excited in these regions inside and/or outside the container. The chamber is provided with a transport apparatus inside it, which produces an essentially rotating motion of the container during the transport from the arrival to the discharge in the chamber.Type: GrantFiled: July 9, 2002Date of Patent: February 3, 2009Assignee: Robert Bosch GmbHInventors: Kurt Burger, Guenter Schneider, Thomas Beck, Wolfgang Szczerba, Bernd Wilke, Johannes Rauschnabel, Sascha Henke, Bernd Goetzelmann, Heinrich Van De Loecht, Wolfgang Schmitt
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Publication number: 20080308409Abstract: Plasma generating devices, systems and processes are provided in which hybrid capacitively coupled plasma (CCP) and inductively coupled plasma (ICP) sources use a plurality of primary plasma generating cells embedded into large area electrode or elsewhere in communication with a plasma processing chamber. Plasma is generated and maintained by a shaped low-inductance element within each of a plurality of locally enhanced ICP micro-cells coupled to the chamber through a CCP electrode. The source is suitable for processing large diameter (300 mm and larger) semiconductor wafers and large area panels, including plasma screen displays.Type: ApplicationFiled: June 13, 2007Publication date: December 18, 2008Applicant: TOKYO ELECTRON LIMITEDInventor: Jozef Brcka
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Patent number: 7462335Abstract: A method of adjusting plasma processing of a substrate in a plasma reactor having an electrode assembly. The method includes the steps of positioning the substrate in the plasma reactor, creating a plasma in the plasma reactor, monitoring optical emissions emanating from a plurality of different regions of the plasma in a direction substantially parallel to the surface of the substrate during plasma processing of the substrate, and determining an integrated power spectrum for each of the different plasma regions and comparing each of the integrated power spectra to a predetermined value. One aspect of the method includes utilizing an electrode assembly having a plurality of electrode segments and adjusting RF power delivered to the one or more electrode segments based on differences in the integrated power spectra from the predetermined value.Type: GrantFiled: September 30, 2002Date of Patent: December 9, 2008Assignee: Tokyo Electron LimitedInventors: Lianjun Liu, Wayne L. Johnson
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Patent number: 7455828Abstract: A process and apparatus for obtaining a hydrogen product and a sulfur product from a feed gas comprised of hydrogen sulfide. In the process, a first separating step separates the feed gas to obtain a first purified hydrogen sulfide fraction comprised of at least about 90 percent hydrogen sulfide by volume. A dissociating step dissociates hydrogen sulfide present in the first purified hydrogen sulfide fraction to convert it into a dissociated first purified hydrogen sulfide fraction comprised of elemental hydrogen and sulfur. A second separating step separates the dissociated first purified hydrogen sulfide fraction to obtain a hydrogen rich fraction comprised of elemental hydrogen. The sulfur product may also be obtained from the dissociated first purified hydrogen sulfide fraction. Finally, the hydrogen product is obtained from the hydrogen rich fraction. The apparatus is provided for performing the process.Type: GrantFiled: March 1, 2004Date of Patent: November 25, 2008Assignee: H2S Technologies, Ltd.Inventors: Richard R. Selinger, Brian R. Thicke
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Publication number: 20080271987Abstract: A system for preparing nanoparticles using non-thermal pulsed plasma is provided. The system comprises a reaction chamber having two divided regions, i.e. a first region where nanoparticles are to be formed and a second region where the nanoparticles are to be received, to prevent the formation of a thin film of nanoparticles in the second region. The use of the system enables the preparation of nanoparticles with improved uniformity and high collection efficiency. In addition, collection and deposition of nanoparticles can be simultaneously performed in the second region. Therefore, the system can find applications in various fields, including devices, secondary cells and sensors. Further provided is a method for preparing nanoparticles using the system.Type: ApplicationFiled: December 6, 2007Publication date: November 6, 2008Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Chang Ho NOH, Tae Sung KIM, Kwang Su KIM
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Publication number: 20080267858Abstract: A method of continuously producing reduced compounds, which comprises continuously feeding our oxidised compound into a reaction chamber and contracting the oxidised compound with a reductant gas. The oxidised compound may be titanium dioxide. the reaction chamber may be a rotating kiln.Type: ApplicationFiled: June 1, 2005Publication date: October 30, 2008Applicant: ATRAVERDA LIMITEDInventors: Andrew Hill, John Hill
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Publication number: 20080267841Abstract: An instrument and associated method are disclosed for conducting microwave assisted chemical reactions. The instrument includes a microwave cavity, preferably a closed microwave cavity, for conducting microwave assisted chemical reactions, and a source for applying microwave radiation within the cavity and to a vessel and its contents. The instrument also includes an illumination source for illuminating the vessel and its contents, as well as means for visually observing the vessel and its contents, an infrared detector for monitoring the temperature of the vessel and its contents, and means for preventing the illumination source from saturating the infrared detector, thereby enabling concurrent visual observation and infrared monitoring.Type: ApplicationFiled: June 26, 2008Publication date: October 30, 2008Applicant: CEM CORPORATIONInventor: Edward Earl King
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Publication number: 20080241517Abstract: Aluminum-plated components of semiconductor material processing apparatuses are disclosed. The components include a substrate and an optional intermediate layer formed on at least one surface of the substrate. The intermediate layer includes at least one surface. An aluminum plating is formed on the substrate, or on the optional intermediate layer. The surface on which the aluminum plating is formed is electrically-conductive. An anodized layer can optionally be formed on the aluminum plating. The aluminum plating or optional the anodized layer comprises a process-exposed surface of the component. Semiconductor material processing apparatuses including one or more aluminum-plated components, methods of processing substrates, and methods of making the aluminum-plated components are also disclosed.Type: ApplicationFiled: March 29, 2007Publication date: October 2, 2008Applicant: Lam Research CorporationInventors: Ian J. Kenworthy, Kelly W. Fong, Leonard J. Sharpless
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Publication number: 20080124254Abstract: There is provided a plasma reactor comprising: a vacuum chamber having a substrate support on which a treated substrate is positioned; a gas shower head supplying gas into the interior of the vacuum chamber; a dielectric window installed at an upper portion of the vacuum chamber; and a radio frequency antenna installed above the dielectric window. The gas shower head and the substrate support are capacitively coupled to plasma in the interior of the vacuum chamber and the radio frequency antenna is inductively coupled to the plasma in the interior of the vacuum chamber. The capacitive and inductive coupling of the plasma reactor allows generation of plasma in a large area inside the vacuum chamber more uniformly and more accurate control of plasma ion energy, thereby increasing the yield and the productivity. The plasma reactor includes a magnetic core installed above the dielectric window so that an entrance for a magnetic flux faces the interior of the vacuum chamber and covers the radio frequency antenna.Type: ApplicationFiled: May 22, 2007Publication date: May 29, 2008Inventor: Dae-Kyu Choi