Surface Deformation Means Only Patents (Class 425/385)
  • Patent number: 11143957
    Abstract: An apparatus is described for separation of a nanoimprint template from a solidified patterned layer on a substrate that minimize separation defects, including last point of separation (LPOS) defects. The apparatus is configured to move the template and substrate relative to one another and determining an amount of pressure to apply to the backsides of the template and the substrate.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: October 12, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventor: Byung-Jin Choi
  • Patent number: 10996561
    Abstract: A head module of an imprint lithography system includes a base, a control body coupled to the base, a first set of actuators configured to generate a first force to translate the control body relative to the base along a first axis and to rotate the control body relative to the base about a second axis perpendicular to the first axis and about a third axis perpendicular to the first axis and to the second axis, a second set of actuators configured to generate a second force to translate the control body relative to the base in a plane defined by the second axis and the third axis and to rotate the control body relative to the base about the first axis, and a flexure coupling the base and the control body and restricting translation and rotation of the control body with respect to the base.
    Type: Grant
    Filed: December 26, 2017
    Date of Patent: May 4, 2021
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Seth J. Bamesberger, Jeremy Sevier, Byung-Jin Choi, Philip D. Schumaker, Mario Johannes Meissl
  • Patent number: 10875248
    Abstract: The present invention relates generally to methods of fabricating surface topography based on a scanned surface topography. The method converts 3D scanned surface topography data that have submicron resolution to digital formats that can be stored, manipulated, or tiled, and used as an input for replicating the surface topography with submicron resolution on another substrate. The digitized surface topography data is then converted to input for 1) 3D printing to replicate the scanned surface topography with submicron resolution, with or without a subsequent coating layer or layers to impart additional properties and/or features, 2) 3D printing a master that replicates the scanned surface topography with submicron resolution, which will be used for fast replica molding of the surface topography onto another substrate, and 3) creating a photomask with submicron resolution for transferring the surface topography to a metal substrate surface through subsequent photolithography and etching processes.
    Type: Grant
    Filed: February 11, 2019
    Date of Patent: December 29, 2020
    Assignee: Board Of Trustees Of The University Of Arkansas
    Inventors: Mahyar Afshar Mohajer, Josue Goss, Dipankar Choudhury, Min Zou, Shelby Robert Maddox
  • Patent number: 10773357
    Abstract: A method for machining at least one portion of a surface of a component for a vehicle, which is painted with a layer of clear coat of a given first layer thickness. The component is situated in an inner space of a blasting chamber. An opening of at least one conveying device for a blasting material emerges into the inner space. The inner space of the blasting chamber and the component are placed entirely under a partial vacuum. Blasting material in a carrier air flow generated by the partial vacuum is supplied through the opening of the conveying device to the inner space. The portion of the surface being machined and the opening of the conveying device are moved relative to each other. The blasting material is shot from the opening of the conveying device onto the portion of the surface being machined.
    Type: Grant
    Filed: May 30, 2016
    Date of Patent: September 15, 2020
    Assignee: AUDI AG
    Inventors: Erhard Brandl, Maurice Langer, Thomas Kuntze
  • Patent number: 10712678
    Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
    Type: Grant
    Filed: February 17, 2016
    Date of Patent: July 14, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Yvonne Wendela Kruijt-Stegeman, Andre Bernardus Jeunink, Arie Jeffrey Den Boef, Vadim Yevgenyevich Banine, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Johan Frederik Dijksman, Carolus Johannes Catharina Schoormans, Adrianus Hendrik Koevoets, Catharinus De Schiffart, Sander Frederik Wuister
  • Patent number: 10627715
    Abstract: Methods and apparatus are described for separation of a nanoimprint template from a solidified patterned layer on a substrate that minimize separation defects, including last point of separation (LPOS) defects. The method can include: moving the template and substrate relative to one another to create a tensional force that is applied to the template and the substrate; measuring the tensional force applied to the template and the substrate; determining an amount of pressure to apply to the backsides of the template and the substrate to reduce the amount of applied tensional force; reducing the tensional force applied to the template or the substrate by applying the determined amount of pressure to the backsides of the template and the substrate; and then repeating the above steps one or more times until the template fully separates from the solidified patterned layer.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: April 21, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventor: Byung-Jin Choi
  • Patent number: 10559730
    Abstract: The present disclosure generally relates to light field displays and methods of displaying images with light field arrays. In one example, the present disclosure relates to pixel arrangements for use in light field displays. Each pixel includes a plurality of LEDs, such as micro LEDs, positioned adjacent respective micro-lenses of each pixel.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: February 11, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Manivannan Thothadri, Christopher Dennis Bencher, Robert Jan Visser, John M. White
  • Patent number: 10457070
    Abstract: An object surface treatment system facilitates the treatment of articles of manufacture before they are printed. The system includes a chamber having walls and a lid configured to close the chamber, a flexible member mounted to the lid of the chamber, a vacuum source operatively connected to an interior volume of the chamber, and a plurality of actuators. A controller is configured to operate the actuators and vacuum source to move the applicator to apply a chemical to the flexible member, move the lid to close the chamber, produce a vacuum within the chamber and move a portion of the surface of the flexible member into engagement with a surface of an object within the chamber, cease operation of the vacuum source to enable the flexible member to return to a position adjacent the lid, and remove the lid from the chamber for removal of the object from the chamber.
    Type: Grant
    Filed: April 7, 2017
    Date of Patent: October 29, 2019
    Assignee: Xerox Corporation
    Inventors: Jason M. LeFevre, Paul J. McConville, Chu-heng Liu, Erwin Ruiz, James A. Winters
  • Patent number: 10459355
    Abstract: A template substrate according to an embodiment includes a first face and a second face on an opposite side to the first face. A first region is located on the first face to be protruded from a peripheral portion thereof. A second region is located at least at an end portion of the first region, and is a region in which an alignment mark used at a time of transfer of a pattern is intended to be formed. The second region contains a first impurity and a second impurity.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: October 29, 2019
    Assignee: Toshiba Memory Corporation
    Inventors: Shingo Kanamitsu, Sr., Masamitsu Ito
  • Patent number: 10423066
    Abstract: According to an embodiment, a template includes steps in first to Nth (N is an integer of 2 or greater) stairs formed in a staircase pattern in a height direction. The steps include first steps in the first to Kth (K is an integer of 1 or greater and N?1 or less) stairs and second steps in (K+1)th to Mth (M is an integer of K+1 or greater and N or less) stairs. A height of the second steps is greater than a height of the first steps.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: September 24, 2019
    Assignee: Toshiba Memory Corporation
    Inventors: Yusaku Izawa, Masaki Mae
  • Patent number: 10288999
    Abstract: A method that can be used in the formation of replica imprint templates. The method can include providing a substrate with a substrate mesa defining an active region having a first area and a template with a template mesa defining a patterning region having a second area, where first area is larger than the second area. The template can then be positioned relative to the substrate such that patterning region of the template mesa overlaps the active region of the substrate mesa. The method can be used in forming a replica template. The formed replica template can be used to form a patterned layer on e.g. a semiconductor wafer in fabricating an electronic device. A system can be configured to carry out the methods.
    Type: Grant
    Filed: December 20, 2016
    Date of Patent: May 14, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Byung-Jin Choi
  • Patent number: 10265724
    Abstract: An imprint mold has a base, an uneven structure area set on a surface of the base, a measurement area set in the uneven structure area, and a measurement mark structure positioned in the measurement area, the measurement mark structure having a plurality of pattern sets each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: April 23, 2019
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Naoko Nakata, Kouji Yoshida, Naoshi Kawamata, Takaharu Nagai, Koji Ichimura
  • Patent number: 10175572
    Abstract: A method of forming patterns is provided. The method includes forming a resist layer on a substrate, forming a lattice-shaped extrusion barrier region in the resist layer to define pattern transfer regions corresponding to a plurality of separate windows, and positioning a template on the resist layer so that a patterned surface of the template faces the resist layer. The patterned surface provides a plurality of transfer patterns. The template is pressed to perform an imprint step for embedding the transfer patterns of the template into the pattern transfer regions of the resist layer.
    Type: Grant
    Filed: May 8, 2017
    Date of Patent: January 8, 2019
    Assignee: SK Hynix Inc.
    Inventor: Woo Yung Jung
  • Patent number: 10078166
    Abstract: The present invention provides a light guide plate and a manufacture method of the light guide plate. The light guide plate comprises an illuminating surface and a plurality of quantum dot modules, and the quantum dot module is filled with quantum dots, and the quantum dot module is embedded in the light guide plate, and the quantum dot modules are located close to the illuminating surface and the quantum dot modules are distributed in an array.
    Type: Grant
    Filed: September 23, 2015
    Date of Patent: September 18, 2018
    Assignees: Shenzhen China Star Optoelectronics Technology Co., Ltd., Wuhan China Star Optoelectronics Technology Co., Ltd.
    Inventors: Shih-Hsiang Chen, Yingbo Zheng
  • Patent number: 10052798
    Abstract: An imprint method including the steps of: an exposing step to irradiate a photo curing resin, coated on a large-area substrate, with a curing light while the light-transmitting imprint mold is pressed against the photo curing resin, an amount of the curing light applied onto the photo curing resin in a light shielding region provided with the light shielding member made less than an amount of the curing light applied onto the photo curing resin in a light transmitting region of the mold so that a portion of the photo curing resin in the light shielding region is semi-cured by the use of the light shielding member provided so as to reproduce the concave-convex pattern of the transparent substrate.
    Type: Grant
    Filed: January 21, 2014
    Date of Patent: August 21, 2018
    Assignee: SOKEN CHEMICAL & ENGINEERING CO., LTD.
    Inventor: Yukihiro Miyazawa
  • Patent number: 9962916
    Abstract: The present disclosure relates to a packaging device and a packaging method. The packaging device includes a first platform and a second platform facing the first platform. The first platform moves back and forth towards or away from the second platform. The first platform is provided with a first electromagnetic device. The packaging device further includes at least one patch which is capable of being adsorbed by the first electromagnetic device. One side of the patch is attached to the first platform, and the other side of the patch is configured to be attached to a substrate to be packaged. The substrate is detachably fixed onto the first platform.
    Type: Grant
    Filed: August 10, 2015
    Date of Patent: May 8, 2018
    Assignee: BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Wei Wang, Zhongyuan Sun
  • Patent number: 9770850
    Abstract: Provided is an imprint apparatus that imprints a pattern formed on a mold onto a substrate. The imprint apparatus includes a substrate holder that holds the substrate and can move in a direction along the surface of the substrate; a gas supply unit for supplying a gas into a space between a pattern part of the mold and the substrate; and a wall part that is disposed so as to enclose the space that is supplied with gas, wherein at a position opposed to the substrate and the mold, the wall part faces the substrate holder or the substrate with a gap therebetween.
    Type: Grant
    Filed: April 16, 2014
    Date of Patent: September 26, 2017
    Assignees: CANON KABUSHIKI KAISHA, CANON NANOTECHNOLOGIES, INC., MOLECULAR IMPRINTS, INC.
    Inventors: Makoto Mizuno, Tsuyoshi Arai, Yukio Takabayashi, Steven C. Shackleton, Byung-Jin Choi
  • Patent number: 9738765
    Abstract: Hybrid pre-patterns were prepared for directed self-assembly of a given block copolymer capable of forming a lamellar domain pattern. The hybrid pre-patterns have top surfaces comprising independent elevated surfaces interspersed with adjacent recessed surfaces. The elevated surfaces are neutral wetting to the domains formed by self-assembly. Material below the elevated surfaces has greater etch-resistance than material below the recessed surfaces in a given etch process. Following other dimensional constraints of the hybrid pre-pattern described herein, a layer of the given block copolymer was formed on the hybrid pre-pattern. Self-assembly of the layer produced a lamellar domain pattern comprising self-aligned, unidirectional, perpendicularly oriented lamellae over the elevated surfaces, and parallel and/or perpendicularly oriented lamellae over recessed surfaces. The domain patterns displayed long range order along the major axis of the pre-pattern.
    Type: Grant
    Filed: February 19, 2015
    Date of Patent: August 22, 2017
    Assignee: International Business Machines Corporation
    Inventors: Markus Brink, Joy Cheng, Gregory S. Doerk, Alexander M. Friz, Michael A. Guillorn, Chi-Chun Liu, Daniel P. Sanders, Gurpreet Singh, Melia Tjio, HsinYu Tsai
  • Patent number: 9696468
    Abstract: Methods for rapidly fabricating color image display for any given color image from a prefabricated generic stamp comprising arrays of structural pixels. The pixels are composed of micro-gratings and/or sub-wavelength structures that give structural colors. Different methods based on micro-patterning techniques may be used to fabricate the color image display devices, including: 1) selectively masking the generic stamp and imprinting from the masked stamp; 2) imprinting from the generic stamp and thermal-optical patterning on an imprinted layer. The fabricated color image display device can further function as a stand-alone display device or a color image stamp for replicating multiple color image display devices.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: July 4, 2017
    Assignee: NANOMEDIA SOLUTIONS INC.
    Inventors: Hao Jiang, Mohamad Rezaei, Bozena Kaminska
  • Patent number: 9613807
    Abstract: Methods for directed self-assembly (DSA) using chemoepitaxy in the design and fabrication of integrated circuits are disclosed herein. An exemplary method includes forming an A or B-block attracting layer over a base semiconductor layer, forming a trench in the A or B-block attracting layer to expose a portion of the base semiconductor layer, and forming a neutral brush or mat or SAMs layer coating within the trench and over the base semiconductor layer. The method further includes forming a block copolymer layer over the neutral layer coating and over the A or B-block attracting layer and annealing the block copolymer layer to form a plurality of vertically-oriented, cylindrical structures within the block copolymer layer.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: April 4, 2017
    Assignee: GLOBALFOUNDRIES, INC.
    Inventors: Ji Xu, Gerard Schmid, Richard A. Farrell
  • Patent number: 9563119
    Abstract: The present invention discloses a nanoimprint apparatus and method useful in the cost-effective mass production of nanostructures over large areas on various substrates or surfaces, especially suitable for non-flat substrates or curved surfaces. The nanoimprint apparatus is composed of a wafer stage, a vacuum chuck, a substrate, a UV-curable nanoimprint resist and the like. The method implementing large-area nanopatterning based on the apparatus includes the following steps: (1) pretreatment, (2) imprinting, (3) curing, (4) demolding, (5) post treatment and (6) transferring of imprinted patterns. By utilizing the apparatus and the approach, large-area, and/or high-aspect-ratio micro/nanostructures can be mass produced, especially on a non-flat substrate or a curved surface or a fragile substrate at low cost and high throughput.
    Type: Grant
    Filed: October 25, 2012
    Date of Patent: February 7, 2017
    Assignee: QINGDAO BONA OPTOELECTRONICS EQUIPMENT CO., LTD.
    Inventor: Hongbo Lan
  • Patent number: 9523796
    Abstract: A fine-concave-convex transfer mold with which defect regions of a molded body having a fine-concave-convex structure can be easily identified, and deformation of the fine-concave-convex structure can be inhibited even if the molded product is wound. A mold for the production of an optical article has, provided to a surface thereof, a plurality of convex portions at a cycle equal to or less than the wavelengths of visible light, and a plurality of concave portions formed between the adjacent convex portions. The mold has a surface provided with a transfer area having concave portions and convex portions that have a size and shape complementing the convex portions and the concave portions of the optical article. The mold can include, in the transfer area, marking portions. The height of the convex portions in the transfer area is less than the height of convex portions in sections other than the transfer area.
    Type: Grant
    Filed: December 27, 2013
    Date of Patent: December 20, 2016
    Assignee: MITSUBISHI RAYON CO., LTD.
    Inventors: Hiroshi Onomoto, Shima Nakanishi, Hideki Kawachi, Tetsuya Jigami
  • Patent number: 9452572
    Abstract: A transfer molding method has a transfer molding step of performing transfer molding to a resin sheet between a first die and a second die, which are disposed while facing each other, by heating at least one of the first and second dies, and a cooling step of cooling the resin sheet. The cooling step includes a first cooling step of cooling the resin sheet while an applied pressure is maintained at a first setting value smaller than a value of an applied pressure in the transfer molding step, and a second cooling step of cooling the resin sheet while the applied pressure is reduced to a second setting value smaller than the first setting value.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: September 27, 2016
    Assignee: OMRON Corporation
    Inventors: Koichi Takemura, Tomofusa Shibata, Yoshihisa Yamanaka, Kenji Suzuki, Kazutaka Kaneko, Yoshikaga Taguchi, Masayuki Kojima
  • Patent number: 9387607
    Abstract: An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.
    Type: Grant
    Filed: April 20, 2012
    Date of Patent: July 12, 2016
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hideki Matsumoto, Fumio Sakai
  • Patent number: 9343089
    Abstract: Nanoimprint lithography can be used in a variety of ways to improve resolution, pattern fidelity and symmetry of microelectronic structures for thin film head manufacturing. For example, write poles, readers, and near-field transducers can be manufactured with tighter tolerances that improve the performance of the microelectronic structures. Further, entire bars of thin film heads can be manufactured simultaneously using nanoimprint lithography, which reduces or eliminated alignment errors between neighboring thin film heads in a bar of thin film heads.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: May 17, 2016
    Assignee: SEAGATE TECHNOLOGY LLC
    Inventors: Andrew David Habermas, Dongsung Hong, Daniel Boyd Sullivan
  • Patent number: 9267284
    Abstract: A decorative concrete product and method of making the same is provided. The concrete surface carries a unique textural and visual decorative pattern that is troweled over the uncured surface. The decorative pattern strategically conceals any imperfections in the concrete surface. A decorative finishing tool is utilized to create a unique and consistent pattern throughout the exposed surface of the concrete. Unique visual patterns may include any aesthetic design including wood grain, or lightly finished honed or cut stone. The decorative finishing tool may be configured so that varying textures and contours may consistently be imprinted throughout the concrete. Advantageously, the cured concrete retains the durability of a concrete surface while carrying a visually and texturally appealing appearance.
    Type: Grant
    Filed: February 11, 2014
    Date of Patent: February 23, 2016
    Assignee: Lithocrete, Inc.
    Inventor: Ronald D. Shaw
  • Patent number: 9241555
    Abstract: Hair was coated with polymer-containing fluid and then hot pressed to form a composite of hair and a polymer film imprinted with a nanopattern. Polychromatic light incident on the nanopattern is diffracted into dispersed colored light.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: January 26, 2016
    Assignees: The Procter & Gamble Company, Los Alamos National Security, LLC
    Inventors: Bruce Carvell Lamartine, E. Bruce Orler, Richard Matthew Charles Sutton, Shuangqi Song
  • Patent number: 9149978
    Abstract: An imprinting method is described. The imprinting method including clamping a portion of an embossing foil to a first die of a die press with a spring tensioned clamp, receiving a magnetic recording disk in the die press, and pressing the embossing foil against the magnetic recording disk to emboss a side of the magnetic recording disk with a discrete track recording pattern.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: October 6, 2015
    Assignee: WD Media, LLC
    Inventors: David Treves, Paul C. Dorsey
  • Patent number: 9120348
    Abstract: A press system including a first die and a second die. The press system further includes a mandrel extending along a longitudinal mandrel axis through the first die. A rod portion of the mandrel to receive a magnetic recording disk to be pressed. The press system further includes a foil holder coupled to the first die. The foil holder to clamp a first portion of an embossing foil to the first die and allow the clamped foil portion to move in a radial direction relative to the foil holder.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: September 1, 2015
    Assignee: WD Media, LLC
    Inventors: David Treves, Paul C. Dorsey
  • Patent number: 9046762
    Abstract: A molding system includes a mold having a base and at least one protuberance extending from the base. The protuberance has an end surface. The system also includes a first photo-catalyst layer on the end surface. The first photo-catalyst layer is configured to at least partially break down a residual layer on a substrate in response to activation of the first photo-catalyst layer by a first radiation.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: June 2, 2015
    Assignee: EMPIRE TECHNOLOGY DEVELOPMENT LLC
    Inventor: Takahisa Kusuura
  • Publication number: 20150147533
    Abstract: Provided is a photocurable resin composition in which curing shrinkage in photo-imprinting is suppressed, and capable of producing by photo-imprinting a structure which has high surface hardness and in which the occurrence of yellowing is suppressed even when irradiated with e.g., ultraviolet ray. The photocurable resin composition includes a (meth)acrylic monomer (A) and a photoinitiator (B), wherein the photoinitiator (B) has a combination of an alkylphenone-based photoinitiator (B1) and an acylphosphine oxide-based photoinitiator (B2), wherein a blending weight ratio (B1:B2) of the alkylphenone-based photoinitiator (B1) to the acylphosphine oxide-based photoinitiator (B2) is in the range of 1:99 to 90:10.
    Type: Application
    Filed: May 15, 2013
    Publication date: May 28, 2015
    Applicant: Soken Chemical & Engineering Co., Ltd.
    Inventors: Hiroko Yamada, Yasuo Suto, Yukihiro Miyazawa
  • Patent number: 9039402
    Abstract: There is provided an imprinting apparatus that transfers a pattern of a mold to a resin on a substrate, the imprinting apparatus including a deposition mechanism configured to deposit the resin onto the substrate; a first driving mechanism configured to change a relative position, on a plane parallel to the surface of the substrate, of the substrate and the mold; a second driving mechanism configured to change the relative position, on a plane parallel to the surface of the substrate, of the substrate and the deposition mechanism; and a control unit configured to control the deposition mechanism and the driving mechanism so as to perform a resin deposition process of depositing the resin onto the substrate and an imprint process of transferring the pattern of the mold to the resin on the substrate in parallel.
    Type: Grant
    Filed: September 24, 2009
    Date of Patent: May 26, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Eigo Kawakami, Shingo Okushima, Hideki Ina, Junichi Seki, Atsunori Terasaki, Motoki Okinaka
  • Publication number: 20150140156
    Abstract: A non-deformable patterned template includes a stable mesh, wherein the stable mesh is resistant to deformation; a polymer sheet with the stable mesh embedded therein, wherein the polymer sheet is formed using a liquid polymer adapted to receive the stable mesh, and wherein the liquid polymer is cured after the stable mesh has been placed within the liquid polymer; and a surface pattern on at least one face of the polymer sheet.
    Type: Application
    Filed: November 20, 2013
    Publication date: May 21, 2015
    Inventor: Thomas W. Palone
  • Publication number: 20150129138
    Abstract: Transfer of nanoscale elements from a substrate on which they were manufactured or transferred to a flexible sheet may be performed by local and progressive deformation of the flexible sheet over the surface of the substrate to attach and lift the nanoscale elements from the substrate with controlled inter-element registration.
    Type: Application
    Filed: June 22, 2012
    Publication date: May 14, 2015
    Inventors: Kevin Thomas Turner, David Scott Grierson
  • Patent number: 9028242
    Abstract: Template and method of making high aspect ratio template, stamp, and imprinting at nanoscale using nanostructures for the purpose of lithography, and to the use of the template to create perforations on materials and products.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: May 12, 2015
    Assignee: Smoltek AB
    Inventors: Amin Saleem Muhammad, David Brud, Jonas Berg, Mohammad Shafiqul Kabir, Vincent Desmaris
  • Publication number: 20150123313
    Abstract: An imprint apparatus for forming a pattern on a substrate by contacting an imprint material on the substrate with a mold includes a mold holding member configured to hold the mold and a mold deforming mechanism for applying a force to a side surface of the mold in a direction along a pattern face of the mold in which the pattern is formed in order to deform the pattern formed in the mold held by the mold holding member. The mold deforming mechanism includes a contact portion to contact with the side surface of the mold to press against the side surface. The contact portion is shaped such that a dimension of part of the contact portion to contact with the side surface of the mold is less than a dimension of part of the contact portion away from the side surface of the mold.
    Type: Application
    Filed: November 5, 2014
    Publication date: May 7, 2015
    Inventors: Yusuke Tanaka, Hirotoshi Torii
  • Publication number: 20150123312
    Abstract: The present invention provides an imprint apparatus for performing an imprint process of molding an imprint material on a substrate with a mold to form a pattern on the substrate, the apparatus including a supply device configured to supply, to a space between the imprint material on the substrate and the mold, a penetrating gas that penetrates at least one of the mold, the imprint material and the substrate and a condensable gas that is liquefied by pressure rise due to the molding, and a controller configured to control the supply device so as to change at least one of a supply amount of the penetrating gas and a supply amount of the condensable gas based on information on a recipe for the imprint process.
    Type: Application
    Filed: October 27, 2014
    Publication date: May 7, 2015
    Inventor: Hitoshi NAKANO
  • Publication number: 20150124315
    Abstract: A linear Fresnel lens sheet (3) includes: a lens layer (10) having a first surface (11) in which a linear Fresnel lens portion (13), having a number of lens surfaces (14) arranged in a first direction d1, is formed, and a second surface (12) opposite the first surface (11); and a diffusion layer (20) disposed on the side of the second surface (12) of the lens layer (10).
    Type: Application
    Filed: November 12, 2014
    Publication date: May 7, 2015
    Inventor: Kazuhiro SASAHARA
  • Publication number: 20150125585
    Abstract: The invention relates to a method for stamping a plurality of articles (2), the method comprising the steps of transporting the plurality of articles (2) along a first conveyance path (4), splitting a transport flow of the plurality of articles (2) along the first conveyance path {4} into at least two parallel transport lines so as to transport the plurality of articles (2) along at least two parallel second conveyance paths (8, 10), stamping the plurality of articles (2) transported along the at least two parallel second conveyance paths (8, 10) using at least two parallel stamping units (12, 14) and merging transport flows of the plurality of articles (2) along the at least two parallel second conveyance paths (8, 10) so as to transport the plurality of articles (2) along a third conveyance path (18).
    Type: Application
    Filed: May 15, 2013
    Publication date: May 7, 2015
    Inventors: Gustav Thorsten, Christian Jung
  • Patent number: 9023261
    Abstract: A method for making apertures in a web comprising providing a precursor web material; providing a pair of counter-rotating, intermeshing rollers, wherein a first roller comprises circumferentially-extending ridges and grooves, and a second roller comprises teeth being tapered from a base and a tip, the teeth being joined to the second roller at the base, the base of the tooth having a cross-sectional length dimension greater than a cross-sectional width dimension; and moving the web material through a nip of the counter-rotating, intermeshing rollers; wherein apertures are formed in the precursor web material as the teeth on one of the rollers intermesh with grooves on the other of the rollers.
    Type: Grant
    Filed: August 7, 2012
    Date of Patent: May 5, 2015
    Assignee: The Procter & Gamble Company
    Inventor: Timothy Ian Mullane
  • Publication number: 20150118344
    Abstract: A fabricating apparatus and a method of a flat plate display are disclosed. A fabricating apparatus of a flat plate display includes a stage on which a substrate having liquid resin formed thereon is seated, a imprinting mold bonded with the liquid resin of the substrate to form a thin film pattern on the substrate, the imprinting mold comprises projections and grooves, and a planarization layer formed between the stage and the substrate to planarize a surface of the stage.
    Type: Application
    Filed: January 5, 2015
    Publication date: April 30, 2015
    Inventors: Ju-Hyuk KIM, Tae-Joon Song, Seong-Pil Cho
  • Publication number: 20150114062
    Abstract: A seamless, embossed or cast substrate is formed using a seamless sleeve having a seamless surface relief formed thereon and configured to slide over an cylindrical base in an embossing or casting assembly. The substrate is a flat web, foil, or film of, for example, paper, polyester, polypropylene, metal or other elongated flat material. The surface relief can be applied through interfering ablation, non-interfering ablation, ink jet printing, or other techniques wherein a seamless surface relief is formed onto the seamless sleeve. A method of making a seamless, embossed or cast substrate includes expanding a diameter of a seamless sleeve having a seamless surface relief formed thereon, sliding the expanded seamless sleeve onto a cylindrical base, allowing the diameter of the seamless sleeve to contract around the cylindrical base, and conveying a substrate through the embossing or casting assembly and embossing or casting the seamless surface relief into the substrate.
    Type: Application
    Filed: December 29, 2014
    Publication date: April 30, 2015
    Inventors: Louis M. Spoto, Dean J. Randazzo, Matthew J. Deschner, William A. Herring, Shannon K. Crawford-Taylor, Suwit Sangkaratana, Paul R. Jelonek, Alan J. Varacins
  • Publication number: 20150111393
    Abstract: In the manufacturing method of a semiconductor device according to the present embodiment, a resist is supplied on a base material. A template including a first template region having a device pattern and a second template region being adjacent to the device pattern and having supporting column patterns is pressed against the resist on the base material. The resist is cured, thereby transferring the device pattern to the resist on a first material region of the base material corresponding to the first template region and at the same time transferring the supporting column patterns to the resist on a second material region of the base material corresponding to the second template region to form supporting columns. The supporting columns are contacted with the first template region when the device pattern is transferred to a resist supplied to the second material region.
    Type: Application
    Filed: February 4, 2014
    Publication date: April 23, 2015
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Taishi ISHIKURA, Atsunobu ISOBAYASHI, Akihiro KAJITA
  • Publication number: 20150108673
    Abstract: A micro-contact imprinting apparatus for transferring patterns of a stamp to a substrate.
    Type: Application
    Filed: October 18, 2013
    Publication date: April 23, 2015
    Applicant: The Chinese University of Hong Kong
    Inventors: Shih-Chi Chen, Jianwei Chen, Jiyi Cheng
  • Publication number: 20150097304
    Abstract: The present invention relates to a TiO2-containing quartz glass substrate for an imprint mold having a main surface and a side surface, in which the side surface has an arithmetic average roughness (Ra) of 1 nm or less, and the side surface has a root mean square (MSFR_rms) of concaves and convexes in the wavelength region of from 10 ?m to 1 mm being 10 nm or less.
    Type: Application
    Filed: December 15, 2014
    Publication date: April 9, 2015
    Applicant: Asahi Glass Company, Limited
    Inventors: Akio KOIKE, Junko Miyasaka, Hiroshi Nakanishi
  • Publication number: 20150099028
    Abstract: Means, apparatus, systems, and/or methods are described for forming improved rigid or flexible semi-transparent imprinting templates. These templates can be used to produce patterning masks having improved resolution that do not require plasma etching for residue removal. The methods and apparatus are compatible with roll-to-roll manufacturing processes and enable roll-to-roll formation of a wide range of metal patterned films.
    Type: Application
    Filed: September 18, 2014
    Publication date: April 9, 2015
    Inventor: W. Dennis Slafer
  • Publication number: 20150091205
    Abstract: A method of producing a mold includes obtaining a master mold, the master mold including surface details; exposing a curable material to the surface details; and curing the curable material with the surface details. A mold includes a surface for molding a composite part, the surface including surface details, wherein the mold is made of phenolic material.
    Type: Application
    Filed: August 26, 2014
    Publication date: April 2, 2015
    Inventors: Mark Vincent Greaney, Bing-Ling Chao, Herbert Stanley Heffernan, III
  • Patent number: 8992206
    Abstract: An imprint apparatus which brings a resin on a substrate into contact with a pattern surface of a mold and cures the resin, includes a substrate holder which holds the substrate, a mold holder which holds the mold with a mold holding surface, a driving mechanism which moves the substrate holder relative to the mold holder, and a controller which controls the driving mechanism such that the substrate holder moves relative to the mold holder while the substrate holder holds a cleaning member instead of the substrate, and the cleaning member is in contact with the mold holding surface, thereby cleaning the mold holding surface.
    Type: Grant
    Filed: March 7, 2012
    Date of Patent: March 31, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kohei Wakabayashi
  • Patent number: 8985994
    Abstract: A patterning apparatus includes a stage arranged under a flexible substrate, a plurality of correction units arranged closely to the stage, attached to the flexible substrate, and configured to apply a tension force to the flexible substrate, and a pattern forming unit configured to form a pattern on the flexible substrate. The patterning apparatus corrects distortion of the flexible substrate by using the correction units.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: March 24, 2015
    Assignee: LG Display Co., Ltd.
    Inventors: Nam Seok Lee, Seung Hee Nam, Shin Bok Lee
  • Publication number: 20150079341
    Abstract: Disclosed is fabrication of a resin compact using a mold. The mold includes a resin mold body satisfies any one of conditions which are: a width of a protrusion is 5 nm or greater and less than 50 nm, an aspect ratio of the protrusion is 2 or greater, and Martens hardness is 200 or greater; the width of the protrusion is 50 nm or greater and less than 100 nm, the aspect ratio of the protrusion is 3 or greater, and Martens hardness is 200 or greater; and the width of the protrusion is 100 nm or greater and less than 1 ?m, the aspect ratio of the protrusion is 4 or greater, and Martens hardness is 150 or greater. The inversion pattern has a space between the adjacent protrusions less than twice a height of the protrusion. The mold further includes an adhesion layer and a release layer.
    Type: Application
    Filed: September 16, 2013
    Publication date: March 19, 2015
    Applicants: Tokyo University of Sci. Ed. Foundation Admin. Org, KURARAY Co., Ltd.
    Inventors: Go TAZAKI, Toshiyuki Zento, Jun Taniguchi