Abstract: An apparatus for manufacturing stamp printing blocks by a local exposure and heating of a stamp plate blank made of a porous thermoplastic material; with the apparatus includes at least one exposure lamp which is arranged in a housing below a glass plate support for the blank; the glass plate support is formed by two glass plates which are arranged on top of each other in a spaced apart manner, thereby forming a gap between them.

Abstract: According to one embodiment, provided is a template in which a transfer region on which a first pattern to be transferred to a processing target is arranged and a non-transfer region surrounding the transfer region are formed on a principal surface of a template substrate. The template includes a second pattern used to measure deviation of a pattern formed on the template substrate from a design position in at least the transfer region. The second pattern arranged on the transfer region is not transferred to the processing target when a transfer to the processing target is performed through an imprint material.

Abstract: Disclosed is an imprinting apparatus and imprinting method using the same that prevent a process of forming a pattern on a substrate from being affected by flatness of a stage. The imprinting apparatus comprises a chamber unit in which a process of forming a pattern on a substrate is carried out; a stage for supporting the substrate on which a resin layer is formed; an installing member positioned above the stage and having a mold member attached to transform the resin layer so as to form the pattern on the substrate; and a first spraying unit for spraying fluid to separate the substrate supported by the stage from the stage, wherein the installing member moves the mold member in the direction getting near to the substrate separated from the stage so that the mold member and the resin layer are brought into contact with each other.

Abstract: A 3-D printer system moves a printed tool over a print surface with a mechanism controlling a rotational angle of an arm holding the print tool and a revolutionary angle of axis of rotation of the printable area to eliminate the disadvantages of conventionally used linear motion mechanisms.

Abstract: A pressure-sensitive adhesive sheet used for integrally immobilizing an imprint mold to a pressure application unit in an imprint apparatus for transferring a profile of a fine pattern formed on the imprint mold to a transfer-receiving body by pressing the imprint mold having the fine pattern thereon against the transfer-receiving body, having a substrate, a pressure-sensitive adhesive layer (A) provided on one surface of the substrate and a pressure-sensitive adhesive layer (B) provided on the other surface of the substrate. The adhesive strength of the pressure-sensitive adhesive layer (B) at 23° C. is higher than the adhesive strength of the pressure-sensitive adhesive layer (A) at 23° C., the pressure-sensitive adhesive layer (A) has an adhesive strength of 1 to 10 N/25 mm at 23° C. and an adhesive strength of 1 to 30 N/25 mm after allowed to stand for 7 hours at 80° C. and a humidity of 65%, and the pressure-sensitive adhesive layer (B) has an adhesive strength of 3 to 30 N/25 mm at 23° C.

Abstract: Provided herein is an apparatus, including an imprint template including a dual-imprint pattern, wherein the dual-imprint pattern is characteristic of imprinting a first pattern on the template with a first template and a second pattern on the template with a second template, and wherein the first pattern and the second pattern at least partially overlap to form the dual-imprint pattern.

Abstract: A pattern forming method for forming an imprinted pattern on a coating material disposed on a substrate with a pattern provided to a mold. The method includes preparing a mold provided with a first surface including a pattern area, a second surface located opposite from the first surface, and an alignment mark provided at a position at which the alignment mark is away from the first surface, contacting the pattern area of the mold with the coating material disposed on the substrate, obtaining information about positions of the mold and the substrate by using the alignment mark and a mark provided to the substrate in a state in which the coating material is disposed on the substrate at a portion where the alignment mark and the substrate are opposite to each other, and effecting alignment of the substrate with the mold in an in-plane direction of the pattern area, on the basis of the information in a state in which the pattern area and the coating material contact each other.

Abstract: A microstructure transferring device is characterized in that the device comprises a stamper made from a first photo-curable resin composition cured with light with a first wavelength, and a light source emitting light with a second wavelength longer than the first wavelength. The microstructure is transferred to an impression receptor supplied with a second photo-curable resin composition, which is curable with light with the second wavelength emitted by the light source.

Abstract: An imprint apparatus includes: a support member which supports the mold; a substrate stage which supports the substrate; a detector which detects a force applied to the mold; a mechanism which forms a space for removing the mold supported by the support member, between the support member and the substrate stage, and a controller. The controller determines a release force required to detach the mold from the cured resin, based on a detection result from the detector, compares the determined release force with a first threshold value, and causes the mechanism to form the space if the determined release force is larger than the first threshold value.

Abstract: A mold may include a plurality of nanostructures configured to form a lithographic pattern when imprinted into a material. Imprinting may include imprinting the mold a first predetermined distance, modifying a temperature of the material, and altering a position of the mold based on the temperature modification. One or more thermal elements may alter a temperature of a first section of the material and/or one or more nanostructures for a predetermined pulse time less than an equilibrium time required for the mold and/or material to reach a stable temperature state. A first thermal element may selectively alter the temperature of a first section of the material and/or a first nanostructure and a second thermal element may selectively alter the temperature of a second section of the material and/or a second nanostructure. The one or more thermal elements may include one or more thermoelectric elements.

Abstract: A mold may include a plurality of nanostructures configured to form a lithographic pattern when imprinted into a material. Imprinting may include imprinting the mold a first predetermined distance, modifying a temperature of the material, and altering a position of the mold based on the temperature modification. One or more thermal elements may alter a temperature of a first section of the material and/or one or more nanostructures for a predetermined pulse time less than an equilibrium time required for the mold and/or material to reach a stable temperature state. A first thermal element may selectively alter the temperature of a first section of the material and/or a first nanostructure and a second thermal element may selectively alter the temperature of a second section of the material and/or a second nanostructure. The one or more thermal elements may include one or more thermoelectric elements.

Abstract: A method for making a conducting structure comprising steps of: forming on a given face of the support comprising at least one conducting element, at least one area for absorbing stresses based on a dielectric material, forming at least one aperture in said dielectric material by applying a mold on said dielectric material, said aperture being provided with inclined walls relatively to a normal to the main plane of said support, the bottom of said aperture revealing said conducting element, filling said aperture with a conducting material.

Abstract: According to one embodiment, a pattern formation method includes placing a master on a substrate including a concave-convex pattern, performing alignment between the master and the substrate, curing a photosensitive resin applied onto the substrate, with the pattern brought into contact with the resin, and removing the master from the resin. The performing alignment includes measuring amount of misalignment of first marks provided at least three of four corners of the shot region and performing alignment of the corners, after the alignment of the corners, measuring misalignment of a second mark, calculating a target value of amount of movement of the corners so as to minimize the amount of misalignment of the first marks and amount of misalignment of the second mark, and performing alignment between the master and the substrate so that the amount of movement of the corners is made close to the value.

Abstract: In a method for transcripting fine patterns and an apparatus for transcripting fine patterns, the ingress of bubbles is prevented and patterns are transcripted with a high throughput by a relatively compact apparatus. For this purpose, a back surface of a stamper is vacuum sucked and the stamper is brought into close contact with a target of transcription with its surfaces coated with resist and pressure is applied thereto. At this time, the stamper is deformed into a spherical shape or bent to expand the close contact face from a central area to a peripheral area to prevent the ingress of air bubbles into between the target of transcription and the stamper.

Abstract: An apparatus for forming a pattern using a laser is provided. The apparatus includes a pattern storing unit, a controller, a laser oscillating unit, an X-Y driver, a header unit, and a stage. The pattern storing unit stores data on light guide patterns of a discontinuous straight line shape. The controller transmits position signal of the light guide patterns to the X-Y driver and simultaneously, transmits a switching signal to the laser oscillating unit. The laser oscillating unit outputs a laser beam synchronized with a movement of the header unit. The X-Y driver moves the header unit and the stage. The header unit moves along a first guide rail. The stage moves along a fixed second guide rail in the front and rear direction of the light guide panel.

Abstract: According to one embodiment, an imprint mask includes a quartz plate. The quartz plate has a plurality of concave sections formed in part of an upper surface on the quartz plate, and impurities are contained in a portion between the concave sections in the quartz plate.

Abstract: Mold structures for imprint lithography are provided. Mold chip patterns including patterns for nano structures are disposed on a mold substrate. A trench region is provided between the mold chip patterns. Protrusion portions protrude from a bottom surface of the trench region. The protrusion portions extend along the trench region in a plan view.

Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Abstract: A nanoimprint stamp having an alignment mark includes a transparent substrate having a plurality of convex portions, and a semitransparent layer on each of the plurality of convex portions. The semitransparent layer has a transmittance of about 20% to about 80% with respect to ultraviolet rays.

Abstract: The invention disclosed apparatuses and methods to do nanoimprint lithography using a deformable mold. Generally, the apparatus has a chamber with a transparent section on its top wall, which is capable of vacuuming and pressurizing. The deformable mold fixed firmly onto a hollow mold holder around its full periphery is attached to top inner surface of the chamber and positioned underneath the transparent section. The central area of the mold is freely accessible from underneath through the opening of the mold holder. An enclosed volume referring to mold mini-chamber is formed between the mold/holder and top wall of the chamber. Inside chamber, a stage assembly is installed. A chuck to vacuumly hold a substrate is mounted on top of the stage assembly. At beginning of the imprinting, the substrate with a layer of resist is positioned underneath the mold at a predetermined gap between them. Then, the substrate is moved up to contact with the mold either under vacuum or under atmosphere.

Abstract: Disclosed, among others, are a multilayer film that permits thermal printing or printing by application of pressure from pressure-applying devices. The structure includes an extruded, outer skin layer and an extruded internal pigment layer. Further, the structure includes an extruded image-rendering layer intermediate to the outer skin layer and the pigment layer, the image-rendering layer including a collapsible layer structure, sensitive to the application of temperature and/or pressure, having dispersed therein a plurality of voids, the collapsible layer structure in uncollapsed condition being substantially opaque to obscure from view the pigment layer there beneath.

Abstract: Disclosed is a layered product for fine pattern formation and a method of manufacturing the layered product for fine pattern formation, capable of easily forming a fine pattern having a thin or no remaining film in order to form a fine pattern having a high aspect ratio on a processing object. The layered product for fine pattern formation (1) of the present invention used to form a fine pattern (220) in a processing object (200) using a first mask layer (103) includes: a mold (101) having a concavo-convex structure (101a) on a surface; and a second mask layer (102) provided on the concavo-convex structure (101a), wherein in the second mask layer (102), a distance (lcc) and a height (h) of the concavo-convex structure (101a) satisfy Formula (1) 0<lcc<1.0 h, and a distance (lcv) and the height (h) satisfy Formula (2) 0?lcv?0.05 h.

Abstract: An imprint apparatus for coating a substrate with a resin by a coating mechanism, and curing the resin while pressing at least one of the substrate and a mold against the other, includes a measurement device configured to detect a position of the coating mechanism, a substrate stage configured to hold a substrate, a positioning system configured to position the substrate stage, and a controller configured to control positioning of the substrate stage by the positioning system, based on the measurement result.

Abstract: The present application relates to a full wafer nanoimprint lithography device comprises a wafer stage, a full wafer coated with a liquid resist, a demolding nozzle, a composite mold, an imprint head, a pressure passageway, a vacuum passageway and a UV light source. The present application also relates to an imprinting method using the full wafer nanoimprint lithography device comprises the following steps: 1) a pretreatment process; 2) an imprinting process; 3) a curing process; and 4) a demolding process. The device and the method can be used for high volume manufacturing photonic crystal LEDs, nano patterned sapphire substrates and the like in large scale patterning on the non-planar surface or substrate.

Abstract: An imprint apparatus of the present invention that molds and cures an imprint material on a substrate using a mold to form a pattern on the substrate. The imprint apparatus includes a supply unit configured to supply a gas into a gap between the imprint material on the substrate and the mold. The supply unit is configured to supply a mixed gas in which a permeable gas, which permeates at least one of the mold, the imprint material and the substrate, and a condensable gas, which is liquefied under a pressure generated by the molding, is mixed with each other.

Abstract: An imprinting device is provided which is capable of using small an opening/closing device even when a transfer area increases. The imprinting device that transfers a molding pattern of a die to a molding target includes a pressurization unit that includes a pressurization chamber to pressurize the die and the molding target by a fluid, a stage that supports the die and the molding target pressurized by the pressurization unit, a pressurization device for adjusting the pressure of the fluid inside the pressurization chamber, an opening/closing device for relatively moving the pressurization unit and the stage, and a securing tool that secures the pressurization unit and the stage so as to prevent or suppress an application of force generated by the pressurization unit to the opening/closing device.

Abstract: A mold for nanoimprint lithography assisted by a determined wavelength is disclosed. According to some aspects, a layer made from a first material including, on a first face, a layer made from a second rigid material in which n structured zones with micrometric or nanometric patterns (n?1) are made, and, on the face opposite said first face, a layer made from a third rigid material in which n recesses are formed, opposite the n structured zones. The n recesses are filled with a fourth material to form n portions. The transmittance at the determined wavelength of the layer of third material is lower than the transmittance of any one of the n portions; and the transmittance of the layers of first, second, and third materials at the determined wavelength ?det is such that the transmission of a light with determined wavelength ?det through said layers is lower than the transmission of the light through any one of the n portions and the layers of first and second materials.

Abstract: An imprint apparatus, which performs an imprint process for forming a pattern of a mold on a resin coated on a substrate, includes an imaging unit configured to image the resin on which the pattern is formed, and a controller configured to control the imprint process. When the pattern is continuously formed on the substrate, the controller compares an image of at least a partial area imaged by the imaging unit and an image of a reference state, which is obtained in advance, and when patterns each having a difference, which falls outside an allowable range, between the images are continuously formed, it determines a transfer error.

Abstract: An imprint apparatus molds and cures an imprint material on a substrate using a mold to thereby form a pattern on the substrate. The apparatus includes a first drive mechanism configured to apply a force in a planar direction of the mold and change the planar shape of the pattern portion formed in the mold, and a second drive mechanism configured to deform the mold about an axis (for example, the Y axis) that is orthogonal to the pressing direction of the mold and the uncured resin (for example, the Z axis) and a direction of the force applied by the first drive mechanism (for example, the X axis).

Abstract: Apparatus and methods of forming selected portions of integral sheets of material are disclosed. Unformed portions of the sheets may remain undistorted during the forming process, allowing them to contain text, art work, or other desired information without material risk of the information being degraded or becoming unintelligible during the forming process. This result may be accomplished, moreover, with less trim than usually occurs in conventional forming processes.

Abstract: An apparatus for etching a pattern in an etching zone laid out on a substrate includes a pen that can be freely moved manually relative to the etching zone, the pen being equipped with an etching head able to etch the substrate at an etching point when etching is triggered, a measuring unit for measuring position and orientation of the etching head relative to the substrate, a control unit configured to calculate coordinates of the etching point as a function of the measured position and orientation of the etching head relative to the substrate, to trigger etching at the etching point if the calculated coordinates of the etching point correspond to coordinates of a point to be etched, the coordinates of the point to be etched being encoded in a prerecorded drawing of the pattern, and to automatically prevent etching otherwise.

Abstract: A method includes: a main body processing step of forming a lens main body having the concave lens surface; a molding step of coating a molding resin on the concave lens surface, pressing a microstructure forming mold, having a molding surface portion transferring the reflection preventing part formed on the surface of a deformable base body part thereof, against the concave lens surface, and curing the molding resin; and a mold release step of exerting a moment of a force relating to the surface top of the molding surface portion so as to deform the base body part to gradually separate the microstructure forming mold from an outer peripheral side thereof in a direction in which the concavo-convex shape of the reflection preventing part extends, thereby performing mold release.

Abstract: A transfer molding method includes an insertion step of inserting a resin sheet between a first die and a second die, which are disposed opposite each other, a sandwiching step of sandwiching the resin sheet between the first and second dies while a transfer surface of a transfer member is brought into contact with at least one of surfaces of the resin sheet, and a transfer molding step of heating at least one of the first and second dies to melt at least a surface portion of the resin sheet with which the transfer surface of the transfer member is brought into contact, and exhausting residual air remaining in a recess through a groove portion connected to the recess when a thick portion is formed by the recess formed in the transfer surface.

Abstract: A rectangular substrate is used as a mold after it is provided with a topological pattern. The substrate has A-side and B-side opposed surfaces, the A-side surface being provided with the topological pattern. The A-side surface includes a central rectangular region of 1 to 50 mm by 1 to 50 mm having a flatness of up to 350 nm. Use of the mold-forming substrate prevents the occurrence of a pattern misalignment or pattern error between the step of forming a pattern on a mold-forming substrate and the transfer step. Transfer of a fine size and complex pattern is possible.

Abstract: A mold capable of a highly accurate alignment with a member to be processed in such a state that a photocurable resin material is disposed between the mold and the member to be processed, and is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmissivities to light in a part of an ultraviolet wavelength range. The second material has a refractive index of not less than 1.7.

Abstract: Passive stamp alignment system. The system includes a stamp supported by a stamp holder resting on three balls affixed to a top platform. A bottom platform supports a substrate to be aligned with the stamp. Means are provided for moving either the top or the bottom platform and holding the other platform stationary so as to contact the substrate with the stamp whereby the stamp holder is lifted away from each of the balls in sequence resulting in alignment of the stamp and the substrate parallel to each other.

Abstract: An imprint apparatus includes: a mold that forms a pattern in a resin on a base plate; a press unit that presses the mold against the resin; a flow channel that is formed by a wall of the mold and a surface of the resin, air flowing along the wall and the surface; a supply unit that supplies air to the flow channel; wherein the supply unit supplies air with a first pressure to the flow channel when the mold makes contact with the resin.

Abstract: A fine pattern is formed with high pattern precision, and a time required for fabricating a mold is considerably shortened. Provided are mask blanks used for manufacturing a sub-master mold by transferring the fine pattern provided on a surface of an original mold by imprint, having a hard mask layer including a chromium compound layer expressed by a chemical formula CrOxNyCz (x>0), on a substrate.

Abstract: Heat press platens for a shoe customization/decoration system and a method of using the same are disclosed. The platens may be quickly interchanged to allow the same equipment to be used to dye shoes of different sizes. The platens individually accommodate a pair of assembled shoes and are shaped to: reduce print sizes, maintain symmetry and flatness of the shoe, and accommodate a range of shoe sizes. The size and shape of the platens enable one shoe to be fitted on one side of a platen and another shoe to be fitted on the opposite side. The platens position the shoes so that they are mirror images of each other. This positioning allows a single print, including mirror images of the same design, to be applied to two shoes at the same time.

Abstract: The present invention discloses a molding system, more particularly, a shrinking type molding system comprising an outer mold, an inner mold and a first pattern layer. An adjustable gap is formed between the outer mold and the inner mold to contain a work piece therein. Furthermore, the work piece with a pattern structure on the surface thereof can be formed by the first pattern layer. The difference between the present invention and the prior art is that the molding system of the present invention is capable of optionally or simultaneously forming the pattern structure on the inner surface or the outer surface of the work piece, so as to solve the long last problem that not all the surfaces of the work piece could have the pattern structure thereon in the prior art.

Abstract: An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.

Abstract: The present invention provides a nano-imprinting resin stamper including a micro structure layer on a transmissive support basal material, the micro structure layer being formed of a polymer of a resin composition that contains a silsesquioxane derivative as a major constituent having a plurality of polymerizable functional groups, another polymerizable resin component having a plurality of polymerizable functional groups and different from the silsesquioxane derivative, and a photopolymerizable initiator, in which the content percentage of the photopolymerizable initiator is equal to or more than 0.3 mass % and equal to or less than 3 mass % relative to a total mass of the silsesquioxane derivative and the polymerizable resin component, and the micro structure layer permits equal to or more than 80% of light to pass therethrough at a wavelength of 365 nm.

Abstract: According to one embodiment, a fine processing method includes determining a resist amount required for each first region of a pattern formation surface and a total amount of resist. The method include dividing the total amount of resist by a volume of one resist drop to determine the resist drops total number. The method include determining a provisional position for the resist drop of the total number. The method include assigning the each first region to nearest one resist drop, and partitioning again the pattern formation surface into second regions assigned to the each resist drop. The method include determining a divided value by dividing the volume of the one resist drop by the required total amount of resist determined. The method include finalizing a final position of the each resist drop, if a distribution of the divided value in the pattern formation surface falls within a target range.

Abstract: An imprint lithography alignment apparatus is disclosed that includes at least two detectors which are configured to detect an imprint template alignment mark, wherein the alignment apparatus further comprises alignment radiation adjustment optics which are configured to provide adjustment of locations from which the at least two alignment detectors receive alignment radiation.

Abstract: This microstructure forming mold forms a concavoconvex reflection preventing part on a concave lens surface of a lens main body including the concave lens surface with curvature. The reflection preventing part is formed using a surface processing device including: a molding surface part that transfers the reflection preventing part; a base body part that supports the molding surface part in a bendable manner; and a cavity portion, an annular cavity portion, and a liquid supply unit that deform the base body part to bend the molding surface part.

Abstract: Provided is a resin mold which is free from separation from another resin mold at the joined portions and does not impair appearance or function. Thus provided is a resin mold which is preferable for forming a large-area mold, a production process therefor, and uses thereof. The resin mold has a mold constituent to constitute one half of the resin mold having a fine depression-protrusion pattern formed on the surface by transferring, a mold constituent to constitute the other half thereof, and a connecting section between the mold constituent to constitute one half of the resin mold and the mold constituent to constitute the other half thereof, wherein the connecting section comprises an inclined plane, a production process for this resin mold, and uses of the resin mold.

Abstract: Provided is a floor construction apparatus that includes a guide unit that is disposed on surface of a floor to be constructed, and a flattening unit that is guided by the guide unit, to then be transferred to flatten the surface of the floor to be constructed, and to thereby reduce a construction time and expense for flattening of the construction surface of the floor.

Abstract: An imprint lithography apparatus is disclosed. The apparatus includes an electromagnetic Lorentz actuator arrangement configured to move an imprint template arrangement, the electromagnetic Lorentz actuator arrangement comprising: an array of magnets; and an array of conductors, each conductor configured to carry an electric current, one of the array of magnets or the array of conductors being moveable and connected to the imprint template arrangement, and the other of the array of magnets or the array of conductors extending at least partially around or forming a part of a substrate holder; the array of magnets and the array of conductors together being in a configuration which facilitates moving of the moveable one of the array of magnets or the array of conductors in six degrees of freedom, such that the imprint template arrangement is also movable in six degrees of freedom.

Abstract: Various embodiments are disclosed herein that relate to the molding of an item having a non-uniform thickness and an undercut structure. One disclosed embodiment provides an injection molding device for molding a part having a non-uniform thickness and an undercut structure, the injection molding device comprising a pair of opposing end walls, a first mold surface being stationary with respect to the pair of opposing end walls, and a second mold surface being movable toward the first mold surface such that a first end of the second mold surface is movable a larger travel distance toward the first mold surface than a second end during a molding process. Further, the pair of opposing end walls comprises a slider with an undercut mold surface that is movable in a direction transverse to a direction in which the second mold surface is movable toward the first mold surface.

Abstract: The present disclosure relates to mold components and imprint lithography techniques applied on the basis of organic mold materials in order to form polymer microstructure elements. It has been recognized that adapting surface characteristics of at least one mold component may significantly enhance performance of the lithography process, in particular with respect to suppressing residual polymer material, which in conventional strategies may have to be removed on the basis of an additional etch process.