Abstract: The present invention provides an imprint apparatus for transferring a pattern of a mold to a shot region on a substrate by curing an imprint material on the substrate while the mold and the imprint material are in contact with each other, comprising a heating unit configured to deform a shape of the shot region by heating each of a plurality of portions of the substrate, and a control unit configured to obtain a target heat quantity in each of the plurality of portions so that the shape of the shot region becomes closer to a target shape, generate a heating profile for each of the plurality of portions so that a heat quantity in the portion becomes equal to the target heat quantity, and control the heating unit to heat each of the plurality of portions according to the generated heating profile.

Abstract: Manufacture of a roller die configured for molding microstructures onto an optical film, includes an uncoated roller and a number of micro-structures formed on an outer surface of the roller, and a layer of diamond-like carbon film being formed on the surfaces of the micro-structures.

Abstract: The present invention relates to a blank for a nanoimprint mold, comprising a glass substrate and a hard mask layer formed on the glass substrate, wherein the hard mask layer contains chromium (Cr) and nitrogen (N) and has a Cr content of 45 to 95 at %, an N content of 5 to 55 at % and a total content of Cr and N of 95 at % or more and the thickness of the hard mask layer is 1.5 nm or more and less than 5 nm.

Abstract: A method for producing a fine convex pattern structure having a fine convex pattern projecting from a flat portion in a predetermined direction with respect to the flat portion includes: using an imprint mold that has a fine concave pattern corresponding to the fine convex pattern and forming the fine convex pattern projecting from the flat portion under a condition in which the fine convex pattern is inclined to the flat portion side from the predetermined direction; and causing the fine convex pattern to project in the predetermined direction with respect to the flat portion by inducing electric charges at least on the inclined fine convex pattern.

Abstract: An object is to provide an imprint method or an imprint apparatus that not only reduces the time for filling with resin or reduces pattern defects, but also reduces the surface roughness of resin. An imprint method brings a resin on a substrate and a mold having a pattern into contact with each other to transfer the pattern onto the substrate. The imprint method includes a step of bringing the resin on the substrate and the mold into contact with each other while a space between the substrate and the mold is filled with a predetermined gas, a step of curing the resin while the resin and the mold are in contact with each other, and a step of separating the resin and the mold. The predetermined gas contains a first gas having a solubility of 0.36 mol/liter or more in the resin and a second gas having a solubility of less than 0.36 mol/liter in the resin, at 20° C. and a pressure of 1 atmosphere.

Abstract: A device for embossing a receiver is disclosed. The device includes a means for depositing an embossing pattern of embossing particles means to press the receiver of receiver between a hard nip roller and a compliant nip roller, the pressure selected so that with a large enough load so that the embossing pattern permanently deforms the receiver; wherein, the embossing pattern consists of a digitally created pattern of embossing toner particles having an embossing-pattern thickness corresponding to a fixed stack height of at least 30% of the thickness of the receiver.

Abstract: Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.

Abstract: To provide an anti-reflection article which can be manufactured by using an anti-reflection article manufacturing mold plate having improved abrasion resistance compared to the related art and has a sufficient anti-reflection property. An anti-reflection article is formed as an anti-reflection article in which minute concave portions are densely arranged and the gap between the adjacent minute concave portions is the shortest wavelength of a wavelength band or less of an electromagnetic wave for anti-reflection. In the anti-reflection article, at least some of the minute concave portions are a minute concave portion with multiple lowermost points in the minute concave portion.

Abstract: An imprinting device to transfer the mold pattern on a die to a molding target includes a casing forming a pressure-adjusting chamber, a stage supporting the die and the molding target, a frame encircling a circumference of the stage, first moving means moving the casing and the stage in a direction coming close to each other or becoming distant from each other, second moving means moving the casing and the frame in a direction coming close to each other or becoming distant from each other, pressure-adjusting means that adjusts the pressure of a fluid in the pressure-adjusting chamber, and decompression means which decompresses a decompression chamber formed by the stage, a frame, and the die or the molding target, and which eliminates a fluid present between the die and the molding target.

Abstract: A heat-reactive resist material contains copper oxide, and silicon or silicon oxide, and is formed so that the content of silicon or silicon oxide in the heat-reactive resist material is 4.0 mol % or more less than 10.0 mol % in terms of mole of silicon. A heat-reactive resist layer is formed using the heat-reactive resist material, is exposed, and then, is developed with a developing solution. Using the obtained heat-reactive resist layer as a mask, dry etching is performed on a substrate with a fluorocarbon to manufacture a mold having a concavo-convex shape on the substrate surface. At this point, it is possible to control a fine pattern comprised of the concavo-convex shape.

Abstract: Methods and systems are provided for fabricating polymer-based imprint lithography templates having thin metallic or oxide coated patterning surfaces. Such templates show enhanced fluid spreading and filling (even in absence of purging gases), good release properties, and longevity of use. Methods and systems for fabricating oxide coated versions, in particular, can be performed under atmospheric pressure conditions, allowing for lower cost processing and enhanced throughput.

Abstract: Implementations of the present disclosure relate to systems, methods, and apparatus for finishing polymer products and producing one or more designs, textures, and/or embossment patterns on the surface thereof. At least one implementation includes a printed mold that a manufacturer can produce quickly and inexpensively by producing a three-dimensional representation of a two-dimensional image on the surface of a substrate material. The printed mold also can allow the manufacturer to customize designs, textures, and/or embossment patterns on polymer products, while reducing manufacturing costs.

Abstract: A heating mould for thermal nanoimprint lithography, a process of producing the heating mould, and a process for producing a nanostructured substrate which include the heating mould. The heating mould includes the heating mould. The heating mould includes a substrate having a first principal surface and a second principal surface, and a through-cavity extending from a first orifice in the first principal surface up to a second orifice in the second principal surface. The mould also includes a heating layer, an electrically and thermally insulating layer which covers the heating layer and, at least partially, imprint patterns, and leads for supplying an electric current to the heating layer.

Abstract: Described is a resinous structure derived from fluorine-containing polymers useful as a mold having excellent dimensional stability.

Abstract: Disclosed are an apparatus and method for fabricating a flat panel display device to realize easy separation of a substrate from an imprinting mold. The apparatus includes an imprinting mold connected to a substrate to form a thin film pattern on the substrate, a first adsorption pad to vacuum-adsorb the center of the imprinting mold, a second adsorption pad to vacuum-adsorb the periphery of the imprinting mold, and a connector connected to vacuum pins to vertically move in different regions of the first and second adsorption pads.

Abstract: A molding roller includes a roller body and a molding film. The roller body includes a substantially cylindrical surface. The molding film is coated onto the cylindrical surface and includes a molding surface facing away from the cylindrical surface. A micro-structure pattern is formed on the molding surface. The molding film is made of a polymer material including a PDMS and a number of SiO2 nano-particles permeating in a network structure of the PDMS.

Abstract: A molding roller includes a roller body and a molding film. The roller body includes a cylindrical surface. The molding film is coated on the cylindrical surface and includes a molding surface facing away from the cylindrical surface. A micro-structure pattern is formed on the molding surface. The molding film is made of polymer material including polyether-ether-ketone (PEEK).

Abstract: A molding roller includes a roller body and a molding film. The roller body includes a cylindrical surface. The molding film is sprayed on the cylindrical surface and includes a molding surface facing away from the cylindrical surface. A micro-structure pattern is formed on the molding surface. The molding film is made of a polymer material including PDMS.

Abstract: The present invention is directed towards a choice of the shape of the patterned fields for Level 0 (patterned by imprint or photolithography or e-beam, etc.) and Level 1 (patterned by imprint) such that these shapes when tessellated together eliminate the open areas causes by the moats.

Abstract: A lens manufacturing apparatus includes a concave-convex shape forming unit that makes a notch in the surface of a workpiece to form a concave-convex shape portion, a resin supply unit that supplies resin for a lens onto the surface of the workpiece, a resin curing unit that cures the supplied resin for a lens, a moving unit that moves the concave-convex shape forming unit, the resin supply unit, and the resin curing unit relative to the workpiece, and a control unit that controls driving of the concave-convex shape forming unit, the resin supply unit, the resin curing unit, and the moving unit so as to form the concave-convex shape portion extending in a predetermined direction, supply the resin for a lens between adjacent concave-convex shape portions and cure the supplied resin for a lens.

Abstract: The disclosed mold includes recessed parts which have a shape corresponding to embossed portions of the barrier rib to be fabricated, and protruding parts which have a shape corresponding to depressed portions of the barrier rib to be fabricated, protrude adjacent to the recessed parts, and are tapered. The protruding parts and the recessed parts are arranged at regular intervals. It is possible to simply fabricate the two-layered barrier rib for inkjet application through a single embossing process at low cost using the mold for fabricating the barrier rib of the present invention.

Abstract: An imprint apparatus for imprinting a mold pattern onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.

Abstract: An arrangement suitable for use in an imprint lithography apparatus is disclosed. The arrangement includes a support structure arranged to support an imprint template arrangement, a first actuator configured to apply a force to the imprint template arrangement, and a second actuator attached to the support structure, and arranged in use to extend between the support structure and the imprint template arrangement, the second actuator configured to apply a force to the imprint template arrangement, a range of movement of the second actuator being greater than a range of movement of the first actuator.

Abstract: According to one embodiment, a mold includes a base, a first concave pattern, a second concave pattern, and a third concave pattern. The base includes a first surface and a pedestal projecting from the first surface. The pedestal includes a first region and a second region disposed outside the first region. The first concave pattern is formed in the first region. The second concave pattern is formed in the second region. The third concave pattern extends from the first region to the second region.

Abstract: A method using directed self-assembly of block copolymers (BCPs) for making an imprint template has the required patterns for both the features in the template's active area and the optically-detectable alignment marks in the template's non-active area. A chemical contrast pattern defined by a lithographic technique forms patterns of lines in both the active area and non-active area, as well as patterns of featureless gap regions in the non-active area. The pattern of lines has the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of featureless gap regions has the BCP components aligned as lamellae parallel to the substrate. The patterns of lines and featureless gap regions in the non-active area define the optically detectable alignment marks. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate the imprint template.

Abstract: A transfer mold that is used in production of a component by electroplating and has high workability and superior durability as well as a component produced thereby are provided. A method therefor includes the steps of forming a pattern of a desired component by providing a reverse pattern of the pattern of the desired component on a metal substrate and etching the metal substrate using the reverse pattern as a mask and treating the reverse pattern with heat or removing the reverse pattern and forming an insulation layer in a portion where the reverse pattern has been removed.

Abstract: Imprinting tools and processes for making such tools, circuitry that includes narrow, high aspect ratio traces having reduced parasitic capacitance to adjacent circuit features and processes for making such circuitry using the imprinting tools are described.

Abstract: Disclosed are embodiments of methods and devices for providing enhanced echogenicity to medical devices. The method includes rolling an impression roller having a plurality of protrusions and an outer surface against a medical device. The protrusions create depressions in the surface of the medical device. A guide roller forms a ridge of the depression into the depression to create a lobe. The lobe forms a pocket between a bottom surface of the depression and the lobe.

Abstract: The embodiments disclose a method including depositing a resist layer using a mixture of several different length polymer strings materials spanning a range of natural periodicity, and imprinting the mixture of several different length polymer strings using sheared guiding patterns to increase flexibility.

Abstract: Passive stamp alignment system. The system includes a stamp supported by a stamp holder resting on three balls affixed to a top platform. A bottom platform supports a substrate to be aligned with the stamp. Means are provided for moving either the top or the bottom platform and holding the other platform stationary so as to contact the substrate with the stamp whereby the stamp holder is lifted away from each of the balls in sequence resulting in alignment of the stamp and the substrate parallel to each other.

Abstract: The present invention provides an imprint apparatus including a mold and a stage that holds a substrate, the imprint apparatus executing a curing process of curing a resin while the mold and the resin applied to the substrate contact and a demolding process of releasing the mold from the resin cured in the curing process, the imprint apparatus including a structure that holds the mold, a pillar that supports the structure mechanically independently from the stage through an anti-vibration mount that reduces propagation of vibration, and a force providing unit that provides, to the structure, force in an opposite direction from a direction of force generated in the structure by providing demolding force to the mold during the demolding process.

Abstract: An imprinting machine that brings a mold having a pattern into contact with an object and transfers the pattern onto the object includes a measurement unit that measures a position of the mold when the mold contacts the object.

Abstract: According to one embodiment, an imprint mask includes a quartz plate. The quartz plate has a plurality of concave sections formed in part of an upper surface on the quartz plate, and impurities are contained in a portion between the concave sections in the quartz plate.

Abstract: A nano-imprint mold includes a mold base; mold body having a first surface and a second surface opposite the first surface; and an elastic body disposed between a surface of the mold base and the first surface of the mold body, the elastic body being composed of resin. The second surface of the mold body is provided with a nano-imprint pattern. In addition, the elastic body has a bulk modulus lower than a bulk modulus of the mold body.

Abstract: The present invention provides an imprinting apparatus or an imprint transfer method in which uniformity of curing quality by UV light is maintained and a uniform application thickness of a UV curable resin is achieved, even if glass is contaminated with dust and/or smudges or has a flaw.

Abstract: An optical unit having an antireflection function includes a wave surface having a wavelength equal to or shorter than a wavelength of visible light. The wave surface has a curved plane which curves in a recessed shape between an apex portion and a bottom portion of the wave surface. An inflection point of an area of a cross section obtained by cutting through the wave surface in a plane perpendicular to a direction of vibration of the wave surface is positioned toward the bottom portion of the wave surface from a center of the vibration.

Abstract: A manufacturing method of a color filter substrate includes forming a black matrix on a substrate, the black matrix including first, second, third and fourth openings, forming first, second and third color filter patterns in the first, second and third openings, forming an overcoat layer on the substrate, disposing a soft mold on the organic material layer, the soft mold including first depressed portions and a second depressed portion, the first depressed portions corresponding to the black matrix, and the second depressed portion corresponding to the fourth opening, wherein a first depth of the first depressed portions is larger than a second depth of the second depressed portion, applying pressure to the soft mold such that the first and second depressed portions are filled with the overcoat layer, first curing the overcoat layer, detaching the soft mold from the overcoat layer, and second curing the overcoat layer.

Abstract: A method for manufacturing a sheet having a shape transferred thereon, in which a sheet-like base made of a thermoplastic resin is placed between an imprint mold and an intermediate base and the sheet-like base is then pressed by a pair of pressing plates to imprint the shape of surface irregularity of the imprint mold to the sheet-like base. The sheet-like base is pressed such that, when pressing force of the pressing plates is maximum, an imprinting pressure difference is present in an imprinting surface of the imprint mold, a maximum imprinting pressure section is present in the imprinting surface, and a portion where the imprinting pressure is minimum is not present in the imprinting surface. The method achieves uniform and highly accurate shape transfer without trapping of air.

Abstract: A method for building a three-dimensional model with an extrusion-based additive manufacturing system having an extrusion head, the method comprising depositing a consumable material from a liquefier assembly at an extrusion rate to substantially normalize a meniscus height within the liquefier assembly.

Abstract: The photocuring efficiency of a photoinitiator is increased by mixing it with an organic phosphite and an aldehyde. This mixture or photoinitiator composition can be used to cure acrylates or other photocurable compounds, particularly in an oxygen-containing environment, and the photocurable compositions can be used to form various articles.

Abstract: Improved sidewall image transfer (SIT) techniques are provided. In one aspect, a SIT method includes the following steps. An oxide layer is formed on a substrate. A transfer layer is formed on a side of the oxide layer opposite the substrate. A mandrel layer is formed on a side of the transfer layer opposite the oxide layer. The mandrel layer is patterned to form at least one mandrel. Sidewall spacers are formed on opposite sides of the at least one mandrel. The at least one mandrel is removed, wherein the transfer layer covers and protects the substrate during removal of the at least one mandrel. The transfer layer is etched using the sidewall spacers as a hardmask to form a patterned transfer layer. The oxide layer and the sidewall spacers are removed from the substrate. The substrate is etched using the patterned transfer layer as a hardmask.

Abstract: An imprint apparatus which cures a resin dispensed on a substrate while the resin and a pattern surface of a mold are in contact with each other, comprises a supply portion configured to supply a gas, used to accelerate filling of a concave portion of the pattern surface of the mold with the resin, to a space which the pattern surface of the mold faces, and a controller configured to control the supply portion to supply the gas to the space before the resin and the pattern surface of the mold are brought into contact with each other, wherein the supply portion is configured to supply the gas to the space via a porous portion formed in at least part of the mold.

Abstract: There is provided a mold blank comprising a hard mask, wherein the hard mask layer has a composition containing chromium, nitrogen, and oxygen and has a content variation structure in which content of the nitrogen is varied continuously or gradually in a layer thickness direction and content of the oxygen is varied in the layer thickness direction continuously or gradually substantially in an opposite direction to the nitrogen.

Abstract: A method for making an imprint mold uses sidewall spacer line doubling, but without the need to transfer the sidewall spacer patterns into the mold substrate. A base layer is deposited on the mold substrate, followed by deposition and patterning of a mandrel layer into stripes with tops and sidewalls. A layer of spacer material is deposited on the tops and sidewalls of the mandrel stripes and on the base layer between the mandrel stripes. The spacer material on the tops of the mandrel stripes and on the base layer between the mandrel stripes is then removed. The mandrel stripes are then etched away, leaving stripes of sidewall spacer material on the base layer. The resulting mold is a substrate with pillars of sidewall spacer material patterned as stripes and extending from the substrate, with the sidewall spacers serving as the mold features for imprinting.

Abstract: There is provided a template inspection apparatus which inspects a replica template, manufactured by an imprinting method from a master template having a depression/protrusion pattern, the template inspection apparatus including: an inspection light source part which radiates inspection light of plane waves; a stage configured to dispose the master template and the replica template so as to be in close proximity with each other and be irradiated by the inspection light; and a detection part which detects light of a component transmitting through the master template and the replica template and different from the plane waves. Accordingly, a template can be inspected in a short time.

Abstract: A lens (1) includes a plurality of optical surfaces (S1, S2) each of which is made up of an alternation of active zones (ZA1, ZA2) and separation zones (ZS1, ZS2). The active zones of one of the surfaces are situated beside the separation zones of the other surface. The shape of one at least of the optical surfaces is then adapted into the separation zones in order to augment the acute angles that are situated at the convergence of active zones and separation zones. The lens can thus be made with improved accuracy with respect to a target optical function.

Abstract: The present invention aims to provide a light-concentrating film capable of concentrating at least one of direct sunlight and diffuse sunlight with high efficiency; a photovoltaic module having the light-concentrating film; and a transfer mold (die) for producing the light-concentrating film. The present invention relates to a light-concentrating film including alternating fine concavo-convex structure on at least one surface, the film having a concavo-convex height (H) of 0.05 to 15 ?m and a concavo-convex pitch (P) of 0.05 to 50 ?m, the film concentrating at least one of direct sunlight and diffuse sunlight.

Abstract: A translating die apparatus and method for forming a piece of material into a part having complex contours. The translating die apparatus may comprise upper and lower mounts, fixed upper and lower dies fixed to the upper and lower mounts, respectively, and movable upper and lower dies translatably coupled with the mounts and configured to translate laterally toward and away from the fixed upper and lower dies. The piece of material may be placed between the upper and lower dies and one of the mounts may be actuated toward another of the mounts to sandwich the piece of material between the upper and lower dies. Simultaneously, the movable upper and lower dies may translate toward the fixed upper and lower dies, until the movable and fixed dies abut each other when the upper and lower dies are fully pressing the piece of material therebetween.

Abstract: A stamping structure for imprinting micro-sized features is provided. The stamping structure includes one or more optical flats. A flexure arrangement includes a plurality of beam flexures arranged in a symmetric configuration around the one or more optical flats so as to minimize the error yaw motion (?z) from thermal fluctuations associated with fixturing the one or more optical flats.

Abstract: A nanoimprinting mold includes: a mold main body having a fine pattern of protrusions and recesses on a surface thereof; and a mold release layer formed on the surface of the mold main body. The mold release layer is formed within a mold release layer forming region, which is a region of the mold main body that includes a patterned region where the fine pattern of protrusions and recesses is formed and has an outer edge positioned outside the outer edge of the patterned region. An outer peripheral mold release layer has a thickness distribution in which the thickness of the outer peripheral mold release layer is locally maximal at positions outside the outer edge of the patterned region, substantially continuously along the entire periphery. Thereby, it becomes possible to restrict the region in which resist flows during nanoimprinting, without employing a mesa type substrate.