Abstract: The present invention is a deposition system for the production of coated substrates that provides a first deposition process that subsequently feeds a second deposition process and where the two deposition processes are occurring concurrently. The consecutive deposition system includes two dynamically isolated deposition chambers. The substrate is helically wrapped about a cooling block within the first deposition chamber such that the tape is exposed to a deposition zone a number of times sufficient to correspond to the desired film thickness. A shielding element may be included in the second deposition chamber to limit the size of the second chamber deposition zone and thus the film thickness of the second coating layer.

Abstract: A process for producing a spatially shaped carrier layer (3) which is of foil-like design from hard brittle material includes: providing a basic mold (1) having a spatially shaped surface, depositing a material which is in the gas or liquid phase on the spatially shaped surface, solidifying the material which has been deposited on the spatially shaped surface to form a hard brittle material layer (3), and separating the hard brittle material layer (3) from the spatially shaped surface in order to obtain the carrier layer (3) which consists of hard brittle material.

Abstract: A method for production of endless plastic hollow profiles, in particular tubes, comprises several production stages for the plastic tube and a coating stage for a metal coating. A reduced pressure is provided in the coating stage, whereby the metal is transferred into the gas phase and deposited on the tube as a surface layer homogeneously bonded thereto.

Abstract: A PVD process and apparatus (120) for depositing a coating (132) from multiple sources (110, 111) of different materials. The process and apparatus (120) are particulaity intended to deposit a beta-nickel aluminide coating (132) containing one or more elements whose vapor pressures are lower than NiAl. The PVD process and apparatus (120) entail feeding at least two materials (110, 111) into a coating chamber (122) and evaporating the materials (110, 111) at different rates from separate molten pools (114, 115) thereof. Articles (130) to be coated are suspended within the coating chamber (122), and transported with a support apparatus (118) relative to the two molten pools (114, 115) so as to deposit a coating (132) with a controlled composition that is a mixture of the first and second materials (110, 111).

Abstract: A method of inhibiting production of projections in a metal deposited-film according to the present invention is characterized by using a vapor deposition apparatus comprising, in a vacuum-treating chamber, an evaporating section for a depositing material, and an accommodating member and/or a holding member for accommodation and/or hold of work pieces, respectively, and, in depositing a metal depositing material on each of the surface of the work pieces with the accommodating member and/or the holding member being made rotated about the horizontal rotational axis thereof, carrying out vapor deposition with a Vickers hardness of a film formed on each of the surface of the work pieces maintained at 25 or more. According to the present invention, production of projections in a metal deposited-film can be effectively inhibited when forming the metal deposited-film of aluminum, zinc or the like on the surface of a work piece such as a rare earth metal-based permanent magnet.

Abstract: A surface-treating support member for supporting a plurality of works, including an upper cage and a lower cage including a plurality of compartments, so that the cages are openable and closeable in a lengthwise direction. A process for surface-treating a plurality of works rotates the works about their axes using the support member.

Abstract: A method is disclosed for forming an epitaxial layer on a front side of a substrate formed of a monocrystalline material, using a chemical vapor deposition system. In this method, a plurality of gettering wafers formed of a gettering material are arranged in the CVD system, such that the front side of each substrate is facing one of the gettering wafers. Impurities present in the CVD system during formation of the epitaxial layer are gettered by the gettering wafers. Alternatively, a layer of a gettering material is deposited on a back side of each of the plurality of substrates, and the substrates are arranged such that the front side of each substrate is facing the backside of another of the substrates. In another embodiment, a layer of a gettering material is deposited on an interior surface of the CVD system. Impurities removed from the CVD system during epitaxial formation include oxygen, water vapor and other oxygen-containing contaminants.

Abstract: A method of exchanging a thin film coated tray (30) for a clean tray (30) is provided. The method replaces the tray (30) at an intermediate position on the handler (10) and not at an intermediate disk loading position of the rotating disk loading mechanism.

Abstract: Physical vapor deposition of radiopaque markings onto a graft is described. A graft is placed into a chamber, and a radiopaque material is vaporized and then deposited onto the graft. The chamber is kept at a temperature below the damage threshold of the graft material. A template optionally placed on the graft may define the design of the deposited radiopaque markings. The deposited radiopaque markings of the present invention may have any design and may comprise any radiopaque material.

Abstract: Geldhart class C tungsten carbide particles are provided with a discontinuous coating of grain growth inhibitor. Further, the fine tungsten carbide coatings are preferably provided with a continuous coating of another discreet phase material, such as, for example, a continuous coating of cobalt. Compacts produced using such materials are particularly useful as WC—Co hardmetals wherein the compacts are extremely fine grained.

Abstract: Chain parts and other steel articles are provided with hard, wear-resistant carbide coatings by tumbling them in a heated retort with a particulate mix which includes a source of vanadium and/or niobium. The steel substrate comprises a steel having at least 0.2% carbon, preferably 0.7-1.2%. Where the chromium content of the steel is 4-12%, preferably 4-8%, the chemical deposition process includes drawing a small amount of chromium from the steel substrate into the vanadium or niobium carbide coating, where it is distributed substantially homogeneously, helping to provide adhesion strength to the coating.

Abstract: A method of reducing black spots in a light-emitting device comprising a light-emissive material interposed between a first electrode and a second electrode such that the first and second electrodes are capable of injecting charge carriers into the light-emissive organic material, the method comprising: forming at least one of the first and second electrodes by depositing onto the light-emissive organic material a first layer of a material by a deposition technique which intrinsically results in undesirable pin-holes; and depositing a second layer of a material onto the first layer by a conformable deposition technique.

Abstract: A method and apparatus for fabricating a submicrometer structure. The method incorporates a sputtering process to deposit an electromagnetic material from a seedlayer onto a vertical sidewall. The vertical sidewall is subsequently removed, leaving a free-standing pole-tip. The resulting structure formed can have a a width of less than 0.3 micrometers, if desired. This structure can be used as a magnetic pole of a thin film head (“TFH”) for a data storage device.

Abstract: A method for forming metallic nanoclusters upon a substrate includes moving the substrate through a deposition chamber at a predetermined uniform velocity and depositing metallic precursor compounds onto the substrate. The metallic precursor compounds are subsequently bombarded with an ultrasonic jet of atomic hydrogen to form the metallic nanoclusters.

Abstract: A chemical vapor deposition (CVD) system is provided for processing a substrate 110. The system 100 includes a heated muffle 115, a chamber 120 having an injector assembly 130 for introducing chemical vapor to process the substrate 110, and a belt 105 for moving the substrate through the muffle and chamber. The belt 105 has an oxidation-resistant coating 175 to reduce formation of deposits thereon. The coating 175 is particularly useful for resisting formation of chromium oxides on belts made from a chromium-containing alloy. In one embodiment, the oxidation-resistant coating 175 comprises a securely-adhered oxide layer 185 that is substantially free of transition metals. Preferably, the oxidation-resistant coating 175 comprises aluminum oxide. More preferably, the coating 175 comprises an aluminum oxide layer 185 securely adhered over a nickel aluminide layer 180.

Abstract: The invention relates to a method of producing an antifriction element (6), by means of which a coating is applied to at least one surface (10) of the antifriction element (6) under vacuum, by guiding the antifriction element (6) through a particle flow (4), which at least partially forms the coating, in a rotary motion about an axis perpendicular to the particle flow longitudinal median axis (5) or parallel with a length of a device containing the coating substance (2).

Abstract: A method for producing a laminated metal ribbon comprises the steps of (a) vapor-depositing a third metal layer on at least one welding surface of a first metal ribbon 4 and a second metal ribbon 5 in a vacuum chamber 1, the third metal being the same as or different from a metal or an alloy of the first and second metal ribbons 4, 5; (b) pressure-welding the first metal ribbon 4 to the second metal ribbon 5; and (c) subjecting the resultant laminate 9 to a heat treatment for thermal diffusion.

Abstract: A process for producing a metal evaporated article, which includes a metallization step of evaporating a metal and depositing the evaporated metal onto a continuously running substrate and an auxiliary material deposition step of evaporating an auxiliary material contained in an evaporator and depositing the evaporated auxiliary material onto the continuously running substrate, before or after the metallization step, comprising the steps of detecting the pressure of the atmosphere where the auxiliary material evaporated from the evaporator exists, and controlling the evaporation condition of the auxiliary material in the evaporator based on the information concerning the detected pressure.

Abstract: A method of conditioning a deposition chamber. The method comprises performing a pre-coat step and a plasma treatment step. The pre-coat step deposits a material layer upon interior surfaces of the chamber and its interior components, while the plasma treatment step further reduces the amount of undesirable residual gases.

Abstract: A wiring layer transfer composite constituted by a laminate composed of a carrier layer, a barrier layer and a wiring-forming layer, the barrier layer being a continuous layer substantially free from defects, can be produced by (a) preparing a first Cu-based metal foil having an average thickness of 50 &mgr;m or less and an average surface roughness Rz of 5 &mgr;m or less in both surfaces for the carrier layer; (b) preparing a second Cu-based metal foil having an average thickness of 20 &mgr;m or less and an average surface roughness Rz of 5 &mgr;m or less in both surfaces for the wiring-forming layer; (c) vapor-depositing a metal having different etchability from that of Cu onto at least one of the first metal foil and the second metal foil to form the barrier layer having an average thickness of 1 &mgr;m or less; and (b) pressure-welding both metal foils via the barrier layer.

Abstract: A manufacturing device of an optical recording medium having a plurality of recording layers formed on a substrate is provided. The manufacturing device includes a vacuum pre-treatment chamber(52), a plurality of recording layer forming chambers (54, 56) each for forming a recording layer by vapor-depositing an organic pigment material, a reflective layer forming chamber (58), and a vacuum post-treatment chamber (60). Each of the recording layer forming chambers has at least one recording layer forming unit (84, 86), and the reflective layer forming chamber has at least one reflective layer forming unit (88).

Abstract: A process for the continuous production of coated metallic bands obtained by physical phase vapor deposition includes the following steps carried out on a band, eventually coated with zinc or its alloys, in motion and maintained in a vacuum environment: heating the band to be coated; activating the band surface; heat stabilizing the band; depositing a zinc layer on the metallic band; secondary heat stabilizing the band; and depositing one or more elements or compounds on the zinc layer, these elements being able to synergistically interact with the zinc layer to obtain high corrosion resistance, weldability, ductility, and adhesion.

Abstract: In a process for surface-treating a plurality of works, the surfaces of the works are treated in a treating chamber, while being rotated about their axes, or about a rotational axis, or about their axes and about the rotational axis. The works are supported in a support member which may be comprised of an upper cage and a lower cage including a large number of compartments, so that the cages are openable and closable in a lengthwise direction. The support member may be comprised of plate-like elements openably and closably foldable in a lengthwise direction, so that a plurality of narrow sections each having a length corresponding to an inside diameter of a work are defined in opened states of the plate-like elements. The works may be supported in a holder which is formed by coiling a wire at distances in such a manner that it is formed as a spring-like tubular structure, so that the works can be accommodated in the tubular structure.

Abstract: A process for surface-treating a plurality of works which includes the step of surface-treating the works in a treating chamber, while rotating the works about their axes in spaced apart states, wherein the surface treatment is a vapor deposition on a sintered article and the support member includes plate-like elements openably and closably foldable in a lengthwise direction, the plate-like elements defining a plurality of narrow sections each having a length in opened states corresponding to an inside diameter of a work. The support member may also include an upper cage and a lower cage which are openable and closable in a lengthwise direction.

Abstract: An apparatus and method technique for producing plane-parallel flakes is disclosed. In a preferred embodiment, the present invention is realized through a multi-chamber apparatus for producing plane-parallel flakes from layers vapor deposited in vacuum on an endlessly circulating substrate. The present invention includes the sequential steps of: vapor deposition of a separating agent layer in high vacuum on the endlessly circulating substrate; vapor deposition of one or more layers of metal, oxides, fluorides, and nitrides in high vacuum on the separating agent layer; and stripping the vapor deposited layers from the endlessly circulating substrate under low vacuum. The vapor deposited layers are subsequently present in a separate vacuum stage separated from the vapor deposition chamber by dynamic locks as a suspension of fine flakes in a mixture of solvent. and separating agent. The suspension may continuously or intermittently be transferred out of the separate vacuum stage for further processing.

Abstract: A substrate cassette contains two physically spaced and parallel reels. A relatively long web of flexible substrate material is wound about one reel and the exposed end of the web is connected to the other reel, to thus expose a relatively short length of the substrate material at a deposition-plane that lies between the two reels. A first idler roller is associated with the first reel, a second idler roller is associated with the second reel, and the web is guided by the two idler rollers as the web moves between the two reels. The two idler rollers are mounted at fixed positions in order to accurately establish a fixed-position deposition-plane. The substrate cassette is placed within one or more vacuum deposition chambers, the web is advanced between the two reels, and one or more semiconductor layers are deposited on substantially the entire length of the web. A protective layer is provided as part of the web in order to protect the semiconductor layer(s) when the web is wound unto a take-up reel.

Abstract: A method and apparatus for producing a coating or a near net shaped monolithic ceramic part by chemical vapor deposition, where the resultant coatings or parts consume less deposit material and require less machining. Mandrel substrates are closely designed for producing a specific, near net shaped final part, including negative relief features. Several of the mandrel substrates are mounted through centers in a spaced relationship on one or more rotable shafts as tooling for a chemical vapor deposition furnace. The tooling is installed in a chemical vapor deposition furnace so that the shafts are oriented perpendicular and the substrate planar surfaces are parallel to the flow pattern of reactant gases through the furnace. The shafts are rotated during the deposition process so that the mandrel substrates each receive a uniformly distributed ceramic deposit in the near net shape of the final part.

Abstract: A metallic article (30) comprises a bond coating (34) on the metallic article (30) and a ceramic thermal barrier coating (38) on the bond coating (34). The ceramic thermal barrier coating (38) comprises a plurality of columnar grains (40) extending substantially perpendicular to the surface of the metallic article (30). The ceramic thermal barrier coating (38) has an inner portion (44), a transition portion (46) and an outer portion (48). Each columnar grain (40) has a substantially constant cross-sectional area throughout its length in the outer portion (48), has smooth surfaces and there are distinct uniform gaps (42) between columnar grains to minimize the stress/strain in the columnar grains (40) and/or to minimize the stress/strain between adjacent columnar grains (40) and thereby increases the resistance to spallation of the ceramic thermal barrier coating. The columnar grains (40) are produced by controlling the evaporation rate of the ceramic, the temperature and speed of rotation of the article (30).

Abstract: A process for the manufacture of wires with a brass surface and a predefined zinc content for application in wire electroerosion. Wire (32) made of copper or brass is passed through heated treatment chamber (14) filled with a zinc vapor, wherein the zinc in gas phase diffuses in wire (32). The concentration of zinc in gas phase and the temperature (T.sub.D) of wire (32) in treatment chamber (14) are regulated in such a way that the zinc content of the brass phase forming on the surface of the wire suitably corresponds to the predefined zinc content.

Abstract: A projection having a micro-aperture is formed by formiNg a dent having a pointed front end on a substrate, then depositing a light blocking material on the substrate except the front end of the dent, and peeling off the light blocking material from the substrate. The projection is suited as an optical probe of scanning near-field optical microscope (SNOM) for detecting or emitting light through the micro-aperture. For this purpose, the projection is formed on the end of a cantilever or on the end of an optical fiber. The dent having a pointed front end can be formed typically by patterned crystal-axis-anisotropic etching of a silicon substrate and subsequent thermal oxidation of the silicon surface.

Abstract: Method and apparatus are disclosed for low temperature deposition of CVD and PECVD films utilizing a gas-dispersing showerhead position within one inch of a rotating substrate. The showerhead is positioned a suitable distance below a gas-dispensing apparatus such as a steady stay flow of gas develops between the ring and showerhead. A cylindrical structure extends between the gas-dispersing ring and a showerhead to contain the gas over the showerhead yielding a small boundary layer over the substrate to ensure efficient uniform deposition of a film on a substrate surface. In the one embodiment of the present invention the showerhead is bias with RF energy such that it acts as an electrode to incite a plasma proximate with the substrate for PECVD. The cylinder is isolated from the showerhead such as by a quartz insulator ring to prevent ignition of a plasma within the cylinder, or alternatively, the cylinder is fabricated of quartz material.

Abstract: A flexible, modular thin film deposition machine comprises a number of batch process stations which define a batch process path. At least one of the batch process stations is a thin film deposition station including a serial deposition chamber and an inter-chamber disk transfer mechanism. The disks move in batches along the process path, being individually processed only at the deposition station. Within the serial sputtering chambers of at least one deposition station there is at most partial environmental separation, whereas between different deposition stations the separation is complete. The resulting simplification of the transport mechanism provides for a high throughput rate while simultaneously minimizing contamination of individual thin film layers.

Abstract: A metal vapor 12 passing through a guide duct 13 from a vapor source 10 to a steel strip 1 is sampled through a takeoff pipe 14 to a measuring chamber 15. The metal vapor is irradiated with a measuring beam 20 in the chamber 15, to detect the absorbance of luminous energy in the metal vapor. The detected value of absorbance is used for the quantitative calculation of the metal vapor 12 passing through the guide duct 13, and the opening ratio of a shutter 17 provided in the guide duct 13 is adjusted on the basis of the calculation result so as to control the flow amount of the metal vapor 12 passing through the guide duct 13. In the case where a large amount of the metal vapor 12 passes through the guide duct 13, the amount of the metal vapor 12 reaching the measuring beam 20 is reduced by partially discharging the metal vapor 12 from the measuring chamber 15.

Abstract: A starting gas feeding apparatus for forming a gaseous starting material from a liquid starting material and feeding the gaseous starting material into a reaction chamber of a CVD apparatus, comprises; a container that holds the liquid starting material, pressure reducing means for reducing the pressure inside the container, and heating means for heating the liquid starting material held in the container; the liquid starting material being boiled.

Abstract: A liquid primer is misted, flowed into a deposition chamber and deposited on a substrate. A liquid precursor is then misted, flowed into a deposition chamber and deposited on the substrate. The primer and precursor are dried to form a solid thin film, which is then annealed to form a part of an electronic component in an integrated circuit, such as the dielectric in a memory cell. The primer is a solvent, and the precursor includes a metal carboxylate, a metal alkoxide, or a metal alkoxycarboxylate in a precursor solvent. Preferably, the primer and the precursor solvent are the same solvent, such as 2-methoxyethanol, xylenes, or n-butyl acetate.

Abstract: A metallized film capacitor formed from a pair of metallized films. Each of the metallized films includes a dielectric film with a metal evaporated electrode formed thereon. One electrode has longitudinal electrode partitioning lines and a plurality of small blocks separated by fuse areas, while the other electrode does not. Each metallized film is formed by moving the film over a screen cylinder having a side wall with openings formed therein. A nozzle is disposed inside the screen cylinder, adjacent to the side wall. Oil is ejected from the nozzle, while the screen cylinder is rotated. The oil passes through the side wall and is deposited on the film to form a pattern thereon. Subsequently, evaporated metal is deposited on the film.

Abstract: The invention relates to the encapsulation of Geldhart class C substrate powders with a coating of metal, binder, or sintering aid. Encapsulation is achieved using chemical vapor deposition techniques in a recirculating fast-fluidized or turbulent fluidization flow bed reactor. Thin, smooth, generally uniform, fully encapsulating coatings are produced on the fine substrate particles. The coated Geldhart class C particles, and products made therefrom, exhibit excellent improved physical properties.

Abstract: A refractory composite structure is formed which comprises a ductile refractory metallic layer with a roughened surface which is tightly bonded to a refractory composite structural shell. The roughened surface is preferably dendritic in form and produced by chemical vapor deposition techniques. The refractory composite structural shell is preferably a carbon-carbon composite formed by applying a carbon filament preform to the roughened surface, infiltrating the preform with a carbon matrix precursor, and carbonizing the precursor.

Abstract: A method for preparing X-ray image capture panels suitable for use in digital, radiography is disclosed. Array modules with sharp, steep edges suitable for tiling to form X-ray image capture panels are prepared placing an array module against an edge piece, and vacuum depositing a radiation detecting material on the top surface of the array module and the edge piece while simultaneously moving at least one of them relative to the other in the horizontal and/or the vertical direction.

Abstract: The present invention relates to an improved fixture for facilitating the coating of workpieces such as turbine blades and vanes. The fixture has a hollow core member and a plurality of workpiece receptacles positioned along the length of and about the periphery of the core member. Each of the workpiece receptacles comprises an open sided workpiece support structure and a cover for closing the open side of the support structure. During the coating operation, the fixture of the present invention is rotated about its longitudinal axis while the workpieces being coated remain stationary within the receptacles.

Abstract: Microchannel plates for use in image intensifiers and night vision devices having both improved gain and signal-to-noise ratio are provided. The microchannel plates disclosed herein provide an initial electron impact area having a surface electron-emissivity coefficient greater than one (1) that is not occluded by low electron-emissivity conductive coatings. In one embodiment angulated deposition of a coating material is used to provide a high electron-emissivity initial electron-impact area while in another embodiment nonmetallic electrodes provide increased amplification of a signal electron. Besides improving gain and sensitivity, the microchannel plates of the present invention provide a higher signal-to-noise ratio, better resolution, high open area ratios and are significantly more cost effective to produce.

Abstract: The invention relates to a titanium article of manufacture having an oxidation resistant surface and a process for producing such article wherein said titanium has an aluminized surface layer formed on it by the vapor deposition of aluminum on the titanium followed by oxidizing the surface layer.

Abstract: Treatment systems and associated methods for exposing one or more articles to at least one treatment source are disclosed herein. In one embodiment the system includes a single treatment source. The treatment source and the article or articles being treated are positioned in separately evacuable chambers. In a method of using the first embodiment, the article or articles can be removed from a handling chamber while the treatment source remains in an evacuated environment within a source chamber. Multi-source treatment systems and associated methods are also disclosed herein. Each treatment source in the multi-source systems is positioned in a respective evacuable chamber completely isolated from the other sources which make up the overall system. An evacuable multi-source handling chamber is arranged for selective movement between the source chambers.

Abstract: A Zn-Mg binary coating layer formed on a steel sheet has the tri-layered structure that the first sublayer composed of a Zn-Mg alloy having Mg concentration of 0.5 wt. % or less, the second sublayer composed of a Zn-Mg alloy having Mg concentration of 7 wt. % or more and the third sublayer composed of a Zn-Mg alloy having Mg concentration of 0.5 wt. % or less are successively laminated. The coating layer may have the penta-layered structure wherein sublayers composed of a Zn-Mg alloy having Mg concentration of 2-7 wt. % are additionally interposed between the high-Mg and low-Mg sublayers. A Zn-Fe or Zn-Fe-Mg alloy layer may be formed at the boundary between the substrate steel and the coating layer. The adhesion ratio of the first sublayer to the top sublayer is preferably 1.2 or more, while the high-Mg sublayer is preferably conditioned to the mixed structure of a Zn.sub.2 Mg phase with a Mg-dissolved Zn phase.

Abstract: A Mg source 3 is received in a vessel 1 having an opening 8, and the vessel 1 is heated at 670.degree. C. or higher to effuse Mg vapor through the opening 8. Since the vessel 1 is filled with Mg vapor, Mg is evaporated from molten state under stable condition without fluctuations in evaporation speed. The Mg vapor is effectively consumed for vapor deposition. A reflector plate may be provided at the outlet of the opening 8, or a duct for introducing Mg vapor from the vessel to the surface of a substrate sheet may be provided. In order to evaporate Mg from stabilized molten state, operational conditions are preferably determined so as to satisfy the relationships of W.sub.1 /W.sub.2 <0.6.times.(P.sub.Mg /V.sup.3) and W.sub.1 /W.sub.2 <0.04.times.P.sub.Mg, wherein W.sub.1 represents the area (mm.sup.2) of the opening 8, W.sub.2 represents the evaporation surface area (mm.sup.2) of the Mg source 3, P.sub.Mg represents Mg vapor pressure (torr.) and V represents the degree of vacuum.

Abstract: A thin film magnetic recording medium is manufactured with vacuum deposition or sputtering technique. One or more reflectors are provided between the substrate and an evaporation source around a path through which evaporated atoms travel onto a substrate. When a thin film is deposited on a substrate, the one or more reflectors are heated above a melting point of an evaporation material to reflect evaporated atoms arriving them. Thus, atoms reflected by the one or more reflectors also contribute to deposition of a thin film as well as evaporated atoms arriving directly from the evaporation source, and deposition efficiency is improved. Such a reflector is also used to limit a boundary or the path through which evaporated atoms travel onto a substrate. Then, a range of incident angles of evaporated atoms onto the substrate is kept the same for a long time on deposition, and characteristics of the thin film are stable.

Abstract: An area of an insulating strip (3) which is to remain free of metal is covered by an endless cover strip (4), which rests on the insulating strip (3) and travels along with it at the same speed. Before it enters a vapor deposition zone (5), the cover strip is provided with a film of oil on the side facing the metal evaporator (6) and, after the cover strip (4) has passed through the vapor deposition zone (5) and after the cover strip (4) and the insulating strip (3) have been separated from each other, the oil which has been deposited from the vapor phase onto the cover strip (4) is removed by heating the cover strip (4) with a heater (7) installed in the immediate vicinity of the cover strip (4).

Abstract: A two-step nucleation W-CVD process has been developed to suppress volcano formation which usually appears at W/TiN boundary. The process using different combination of spacing of W-CVD chamber between the shower head and heater and chamber pressure has been used to form an uniform nucleation layer (with uniformity of 5-6%). An uniform nucleation layer can prevent WF.sub.6 penetration during W-bulk deposition. Moreover, the reaction between WF.sub.6 and Ti can be suppressed. The formation of volcano at the clamp area around the wafer edge can be effectively reduced.

Abstract: Items of material are patterned on a substrate by forming a layer of photoresist on the substrate and a layer of metal on the photoresist. The photoresist is patterned to define an opening exposing a portion of the substrate and the metal is patterned to define an aperture smaller than the opening so as to divide the exposed surface of the substrate into shadow areas and a non-shadow area. A first material system is evaporated generally perpendicular to the aperture to form a first organic light emitting diode on the surface of the substrate in the non-shadow area and second and third material systems are evaporated at angles to the aperture to form second and third organic light emitting diodes in the shadow areas. Passivation material is evaporated perpendicularly onto the first diode and at the angle onto the second diode.

Abstract: Disclosed is a process of making an elastomeric metallized fabric composed of an elastomeric fabric and a metallic coating substantially covering at least a portion of at least one side of the fabric. The elastomeric fabric may be an elastomeric knit fabric, an elastomeric woven fabric, an elastomeric nonwoven fibrous web, or laminates of one or more of the same. The elastomeric metallized fabric has a metallic coating with a thickness ranging from about 1 nanometer to about 5 microns and which remains on the fabric when the fabric is stretched at least about 25 percent. The elastomeric metallized fabric may be joined with other materials to form multi-layer laminates.