Metal Coating Patents (Class 427/250)
  • Patent number: 11545626
    Abstract: A deposition mask assembly for manufacturing a plurality of display devices includes a frame having an opening area, a first open mask disposed on the frame and having a first body portion defining a plurality of patterns overlapping the opening area, and a second open mask disposed on the first open mask and having a second body portion defining a plurality of opening portions overlapping the patterns of the first open mask, in which each of the patterns includes an auxiliary pattern spaced apart from the first body portion and a first bridge pattern connecting the first body portion and the auxiliary pattern.
    Type: Grant
    Filed: January 11, 2018
    Date of Patent: January 3, 2023
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jinyeong Kim, Haseok Jeon
  • Patent number: 11515167
    Abstract: Provided is a plasma etching method which enables etching with high accuracy while controlling and reducing surface roughness of a transition metal film. The etching is performed for the transition metal film, which is formed on a sample and contains a transition metal element, by a first step of isotropically generating a layer of transition metal oxide on a surface of the transition metal film while a temperature of the sample is maintained at 100° C. or lower, a second step of raising the temperature of the sample to a predetermined temperature of 150° C. or higher and 250° C. or lower while a complexation gas is supplied to the layer of transition metal oxide, a third step of subliming and removing a reactant generated by an reaction between the complexation gas and the transition metal oxide formed in the first step while the temperature of the sample is maintained at 150° C. or higher and 250° C. or lower, and a fourth step of cooling the sample.
    Type: Grant
    Filed: February 1, 2019
    Date of Patent: November 29, 2022
    Inventors: Sumiko Fujisaki, Yoshihide Yamaguchi, Hiroyuki Kobayashi, Kazunori Shinoda, Kohei Kawamura, Yutaka Kouzuma, Masaru Izawa
  • Patent number: 11504455
    Abstract: A processing technique for creating nanowires and hierarchically porous micro/nano structures of ceramic materials is provided. The process includes evaporation of micron-sized water droplets containing dissolved organic salts on heated substrates followed by thermal decomposition of the deposited material. The micron-sized droplets may be generated by supercritical CO2 assisted nebulization, in which high-pressure streams of aqueous solution and supercritical CO2 are mixed, followed by controlled depressurization through a fine capillary. Rapid evaporation takes place on the heated substrates and structures are generated due to CO2 effervescence from the droplets and evaporation of water, along with the pinning of the three phase contact line. Depending on the mass deposited, a mesh of nano-wires or membrane-like structures may result. Sintering of the membrane-like scaffolds above the decomposition temperature of the organic salt creates nanopores within the structures, creating a dual hierarchy of pores.
    Type: Grant
    Filed: February 10, 2020
    Date of Patent: November 22, 2022
    Assignee: New York University
    Inventors: Sachin Khapli, Ramesh Jagannathan
  • Patent number: 11446907
    Abstract: A non-foil packaging laminate for liquid food packaging comprises a layer of paper or other cellulose-based material, outermost liquid tight, heat sealable layers of polyolefin-based polymers and, vapour-deposition coated onto the inner side of the layer of paper or cellulose-based material, an induction heat susceptible metal coating. Also disclosed is a method for manufacturing of the packaging laminate, a packaging container that is made from the packaging laminate and a method of induction heat sealing the packaging laminate into packaging containers.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: September 20, 2022
    Inventors: Nils Toft, Magnus Wijk, Magnus Råbe, Eva Ehrenberg
  • Patent number: 11434560
    Abstract: The invention relates to a vapour generator for the deposition of a metal coating onto a substrate (7), preferably a steel strip, that comprises a vacuum chamber (6) in the form of a housing including a vapour deposition head or ejector (3) in tight communication via a supply duct (4) with at least one crucible (1) containing the coating metal in a liquid form and located outside the vacuum chamber (6), characterised in that the ejector (3) includes a longitudinal slot for the vapour outlet acting as a sonic throat and extending on the entire width of the substrate (7), a filtration medium or a charge loss member (3A) made of a sintered material being provided in the ejector immediately before said slot on the vapour path in order to equalise the flow speed of the vapour exiting the ejector (3) through the sonic throat.
    Type: Grant
    Filed: October 10, 2008
    Date of Patent: September 6, 2022
    Assignee: Arcelormittal France
    Inventors: Pierre Banaszak, Didier Marneffe, Eric Silberberg, Luc Vanhee
  • Patent number: 11421318
    Abstract: Methods and apparatus for increasing reflectivity of an aluminum layer on a substrate. In some embodiments, a method of depositing an aluminum layer on a substrate comprises depositing a layer of cobalt or cobalt alloy or a layer of titanium or titanium alloy on the substrate with a chemical vapor deposition (CVD) process, pre-treating the layer of cobalt or cobalt alloy with a thermal hydrogen anneal at a temperature of approximately 400 degrees Celsius if a top surface of the layer of cobalt or cobalt alloy is compromised, and depositing a layer of aluminum on the layer of cobalt or cobalt alloy or the layer of titanium or titanium alloy with a CVD process at a temperature of approximately 120 degrees Celsius. Pre-treatment of the layer of cobalt or cobalt alloy may be accomplished for a duration of approximately 60 seconds to approximately 120 seconds.
    Type: Grant
    Filed: April 30, 2019
    Date of Patent: August 23, 2022
    Inventors: Jacqueline Wrench, Liqi Wu, Hsiang Ning Wu, Paul Ma, Sang-Ho Yu, Fuqun Grace Vasiknanonte, Nobuyuki Sasaki
  • Patent number: 11408069
    Abstract: A method of the present invention for producing a metallic ruthenium thin film on a substrate by atomic layer deposition includes: (A) a step of introducing a feedstock gas containing a specific ruthenium compound into a treatment atmosphere, and allowing the ruthenium compound to deposit on the substrate; and a step of introducing a reactive gas containing a specific compound into the treatment atmosphere, and allowing the reactive gas to react with the specific ruthenium compound deposited on the substrate.
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: August 9, 2022
    Inventors: Akihiro Nishida, Masaki Enzu
  • Patent number: 11395891
    Abstract: A method of purifying herbal extract(s) from an herbaceous plant composition includes heating the herbal extracts-containing composition to volatilize at least one of herbal extract(s) into a vapor and condensing the vapor on a substrate or wet extracting the herbal extract(s) by treatment of the herbaceous plant composition or a derivative thereof with a solvent for the herbal extract(s), separating the solution of herbal extract(s), forming a concentrate and casting the concentrate on the substrate to form a coating of the herbal extract(s) on the substrate. A corresponding delivery cartridge and delivery system can include a controllable heating element and the substrate coated with at least one of herbal extract(s). These are configured to allow passage of air over the substrate to volatilize or entrain the herbal extract(s) as a vapor, gas or aerosol for administration to a user.
    Type: Grant
    Filed: March 18, 2020
    Date of Patent: July 26, 2022
    Assignee: Vapor Cartridge Technology LLC
    Inventor: Timothy McCullough
  • Patent number: 11332626
    Abstract: A new paint which makes it possible for a coating film to have both brightness and radiotransparency is demanded. The paint includes a flake, wherein the flake has a sea-island structure of including a plurality of island phases which are formed of metal, and a sea phase that is formed of resin or DLC, the sea phase linking the island phases to each other.
    Type: Grant
    Filed: October 3, 2019
    Date of Patent: May 17, 2022
    Inventors: Takeshi Yamakawa, Naohide Uchida, Yoshihisa Serizawa, Shoichi Hayasaka
  • Patent number: 11289331
    Abstract: A method of forming graphene layers is disclosed. A method of improving graphene deposition is also disclosed. Some methods are advantageously performed at lower temperatures. Some methods advantageously provide graphene layers with lower resistance. Some methods advantageously provide graphene layers in a relatively short period of time.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: March 29, 2022
    Inventors: Jie Zhou, Erica Chen, Qiwei Liang, Chentsau Chris Ying, Srinivas D. Nemani, Ellie Y. Yieh
  • Patent number: 11254698
    Abstract: The inventive concept relates to a cobalt precursor, a method for manufacturing a cobalt-containing layer using the same, and a method for manufacturing a semiconductor device using the same. More particularly, the cobalt precursor of the inventive concept includes at least one compound selected from the group consisting of a compound of Formula 1 and a compound of Formula 2.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: February 22, 2022
    Inventors: Soyoung Lee, Hiroshi Nihei, Takamasa Miyazaki, Yousuke Satou, Kouhei Sugimoto, Masashi Shirai, Jaesoon Lim, Younsoo Kim, Younjoung Cho
  • Patent number: 11208716
    Abstract: Provided is a multilayer zinc alloy plated steel material comprising a base steel material and multiple plating layers formed on the base steel material, wherein each of the multiple plating layers includes one of a Zn plating layer, a Mg plating layer, and a Zn—Mg alloy plating layer, and the ratio of the weight of Mg contained in the multiple plating layers to the total weight of the multiple plating layers is from 0.13 to 0.24.
    Type: Grant
    Filed: December 22, 2017
    Date of Patent: December 28, 2021
    Assignee: POSCO
    Inventors: Young-Jin Kwak, Goo-Hwa Kim, Mun-Jong Eom, Seok-Jun Hong, Kyoung-Pil Ko, Yong-Hwa Jung, Dong-Yoeul Lee, Tae-Yeob Kim, Kyung-Hoon Nam
  • Patent number: 11118263
    Abstract: A method of forming a protective coating film for halide plasma resistance includes depositing a seed layer on a surface of an article via an atomic layer deposition (ALD) process, depositing a rare-earth containing oxide layer on the seed layer via an ALD process, and exposing the rare-earth containing oxide layer to fluorine-containing plasma.
    Type: Grant
    Filed: May 10, 2019
    Date of Patent: September 14, 2021
    Inventors: Yogita Pareek, Kevin A. Papke, Emily Sierra Thomson, Mahmut Sami Kavrik, Andrew C. Kummel
  • Patent number: 10988845
    Abstract: Provided is a plated steel sheet often used as materials for vehicles, home appliances, construction and the like and, more specifically, to a plated steel sheet having a multilayer structure and a method for manufacturing the same.
    Type: Grant
    Filed: December 21, 2017
    Date of Patent: April 27, 2021
    Assignee: POSCO
    Inventors: Kyoung-Pil Ko, Kyung-Hoon Nam, Tae-Yeob Kim, Dong-Yoeul Lee, Yong-Hwa Jung, Woo-Sung Jung
  • Patent number: 10934451
    Abstract: Disclosed is a liquid polymerizable composition including a phosphine oxide or a phosphine sulphide monomer composition with mineral nanoparticles homogeneously dispersed therein, as well as its use for the preparation of a transparent polymeric material having a high refractive index and its use in the optical field.
    Type: Grant
    Filed: June 26, 2013
    Date of Patent: March 2, 2021
    Assignees: Nikon Corporation, Essilor International
    Inventors: Mathieu Feuillade, Guillaume Cantagrel
  • Patent number: 10907097
    Abstract: The present application discloses a method of preparing quantum dots. The method includes combining a first quantum dots precursor and a second quantum dots precursor to form a first reaction mixture including a supercritical liquid medium; nucleating and growing the quantum dots from the first quantum dots precursor and the second quantum dots precursor in the first reaction mixture including the supercritical liquid medium; and forming a solid quantum dots material in the presence of the supercritical liquid medium.
    Type: Grant
    Filed: April 13, 2017
    Date of Patent: February 2, 2021
    Inventor: Zhuo Chen
  • Patent number: 10906925
    Abstract: Metal coordination complexes comprising a metal atom coordinated to at least one diazabutadiene ligand having a structure represented by: where each R is independently a C1-C13 alkyl or aryl group and each R? is independently H, C1-C10 alkyl or aryl group are described. Processing methods using the metal coordination complexes are also described.
    Type: Grant
    Filed: January 20, 2020
    Date of Patent: February 2, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Benjamin Schmiege, Jeffrey W. Anthis, David Thompson
  • Patent number: 10900363
    Abstract: Cladding material is applied by laser to a net-shape. A method of cladding a host component includes installing the component in a fixture. A shroud component is located against the host component adjacent a select location for the cladding. Cladding is applied to the host component to the select location and adjacent to shroud component so that the shroud component defines an edge of the cladding as applied. The edge of the cladding as defined by the shroud component defines a desired cladding profile requiring no/approximately no post-cladding processing to remove over-cladded material.
    Type: Grant
    Filed: August 1, 2018
    Date of Patent: January 26, 2021
    Inventors: Brent Ludwig, Don Mittendorf, David R. Waldman, Malak Fouad Malak
  • Patent number: 10752992
    Abstract: Provided is a method for depositing a gallium-containing thin film by atomic layer deposition (ALD) without using radical species such as plasma and ozone using a gallium-containing precursor having a high vapor pressure even at low temperature and high thermal stability. Gallium (I) having a cyclopentadienyl ligand as illustrated below has a sufficiently high thermal decomposition temperature, a sufficiently high vapor pressure at a low temperature, and high reactivity, and as a result, is suitable for low temperature ALD. An atomic layer deposition method of a metal-containing thin film using a precursor represented by the following general formula (1) (In general formula (1), R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms).
    Type: Grant
    Filed: November 19, 2018
    Date of Patent: August 25, 2020
    Inventors: Fumikazu Mizutani, Shintaro Higashi
  • Patent number: 10745430
    Abstract: Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I): wherein R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 are independently selected from the group consisting of hydrogen, alkyl, and trialkylsilyl; and at least one of R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 is trialkylsilyl.
    Type: Grant
    Filed: March 10, 2015
    Date of Patent: August 18, 2020
    Inventors: Shaun Garratt, Paul Williams
  • Patent number: 10679858
    Abstract: A deposition apparatus includes a chamber, a susceptor that supports a substrate in the chamber, an upper electrode facing the susceptor, a showerhead defining a gas inlet space between the upper electrode and the susceptor, a metal source storage to store a metal source supplied to the chamber, a vaporizer to vaporize the metal source, a first gas source to supply a first gas to move the metal source toward the vaporizer, a second gas source to supply a second gas to move the metal source in the vaporizer toward the chamber, a third gas source connected to the chamber to supply a third gas into a reaction space defined between the susceptor and the upper electrode such that the third gas reacts with the metal source, and a fourth gas source connected to the chamber to supply a fourth gas used to clean an inside of the chamber.
    Type: Grant
    Filed: October 18, 2018
    Date of Patent: June 9, 2020
    Inventors: Dong Kyun Ko, Woo Jin Kim, Myung Soo Huh, In Kyo Kim, Keun Hee Park
  • Patent number: 10619242
    Abstract: Methods for depositing rhenium-containing thin films are provided. In some embodiments metallic rhenium-containing thin films are deposited. In some embodiments rhenium sulfide thin films are deposited. In some embodiments films comprising rhenium nitride are deposited. The rhenium-containing thin films may be deposited by cyclic vapor deposition processes, for example using rhenium halide precursors. The rhenium-containing thin films may find use, for example, as 2D materials.
    Type: Grant
    Filed: November 30, 2017
    Date of Patent: April 14, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Jani Hamalainen, Mikko Ritala, Markku Leskela
  • Patent number: 10562055
    Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.
    Type: Grant
    Filed: February 18, 2016
    Date of Patent: February 18, 2020
    Assignee: SI-WARE SYSTEMS
    Inventors: Mostafa Medhat, Bassem Mortada, Yasser Sabry, Sebastian Nazeer, Yasseen Nada, Mohamed Sadek, Bassam A. Saadany
  • Patent number: 10539039
    Abstract: A method of measuring temperature reached by a part, for example a turbine engine part, in operation, the method including: mechanically treating the part; oxidizing the part; and depositing a layer including a temperature indicator for indicating the temperature reached by the part in operation.
    Type: Grant
    Filed: August 12, 2013
    Date of Patent: January 21, 2020
    Inventors: Nadine Alice Helene Harivel, Sarah Hamadi
  • Patent number: 10495146
    Abstract: ZnO sputtering is performed while a rolling body is housed in a basket made of a metal wire and is rotated. By setting a ratio of a mesh size of the basket to a diameter of the rolling body in a range of 40 to 95%, fine and uniform ZnO coating can be formed on a surface of the rolling body. By using the rolling body with ZnO coating prepared in this manner in a bearing which is rotated at high speed in a high-load state, a friction coefficient can significantly be lowered in comparison with a case of no coating.
    Type: Grant
    Filed: August 25, 2016
    Date of Patent: December 3, 2019
    Inventors: Masahiro Goto, Michiko Sasaki, Akira Kasahara, Masahiro Tosa
  • Patent number: 10457834
    Abstract: The present invention provides a chromium-free coating composition having high blackening resistance and corrosion resistance, the composition comprising: 20 to 70 wt % of waterborne silane modified polyurethane; 0.5 to 5 wt % of a hardener; 0.5 to 5 wt % of a blackening inhibitor; 0.5 to 5 wt % of a corrosion inhibitor; and 0.5 to 5 wt % of a lubricant, with the balance being a solvent. The chromium-free coating composition has the effect of improving blackening resistance, corrosion resistance, alkali resistance, solvent resistance and fingerprint resistance of a steel sheet on which a coating layer comprising the composition is formed.
    Type: Grant
    Filed: December 22, 2015
    Date of Patent: October 29, 2019
    Assignees: POSCO, NOROO Coil Coatings Co., Ltd.
    Inventors: Young-Jin Kwak, Tae-Yeob Kim, Dong-Yun Kim, Yong-Jin Cho, Myoung-Hee Choi
  • Patent number: 10364490
    Abstract: The present invention provides a Cr-rich cathodic arc coating, an article in turbine blade coated with the chromizing over cathodic arc coating, and a method to produce the coating thereof. The Cr-rich cathodic arc coating in the present invention comprises a cathodic arc coating and a diffusion coating deposited atop the cathodic arc coating to enforce hot corrosion resistance. The hardware coated with the chromizing over cathodic arc coating in the present invention is reinforced with superior-hot corrosion resistance. The present invention further provides a novel method for producing the chromizing over cathodic arc coating by re-sequencing coating deposition order. The method in the present invention is efficient and cost-reducing by eliminating some operations, e.g., DHT and peening, between the cathodic arc coating and the diffusion coating. The hot corrosion resistance in the present invention results from the high Cr content in the surface of the coating.
    Type: Grant
    Filed: November 19, 2014
    Date of Patent: July 30, 2019
    Inventors: Frank J. Trzcinski, Thomas Balzano, Prentice M. Sinesi, Mark A. Livings, Michael N. Task
  • Patent number: 10350856
    Abstract: The invention relates to compositions and methods for coating a zirconium alloy cladding of a fuel element for a nuclear water reactor. The composition includes a master alloy including one or more alloying elements selected from chromium, silicon and aluminum, a chemical activator and an inert filler. The alloying element(s) is deposited or are co-deposited on the cladding using a pack cementation process. When the coated zirconium alloy cladding is exposed to and contacted with water in a nuclear reactor, a protective oxide layer can form on the coated surface of the cladding.
    Type: Grant
    Filed: November 2, 2017
    Date of Patent: July 16, 2019
    Assignee: Westinghouse Electric Company LLC
    Inventors: Peng Xu, Lu Cai
  • Patent number: 10280499
    Abstract: A composition and a coating structure applying with the same are provided. The composition includes 3 wt % to less than 15 wt % of Al, 10 wt % to less than 30 wt % of Cr, higher than 0 wt % to 15 wt % of O, higher than 0 wt % to 15 wt % of Y, and the remainder being at least one of Co or Ni.
    Type: Grant
    Filed: November 30, 2015
    Date of Patent: May 7, 2019
    Inventors: Zhong-Ren Wu, Mao-Shin Liu, Wu-Han Liu, Wei-Tien Hsiao, Ming-Sheng Leu
  • Patent number: 10260660
    Abstract: A multi-walled pipe and a method for its manufacture involves a steel sheet forming a steel source layer to which a nickel source layer is applied on at least one or both sides. A solder source layer is applied to the one nickel source layer, or one of the two, or both, nickel source layers. The multi-walled pipe is formed from a strip of the coated metal sheet by rolling. The walls of the pipe are soldered by heating. In one form, the heating takes place by radiation. In another, it takes place by induction.
    Type: Grant
    Filed: October 30, 2015
    Date of Patent: April 16, 2019
    Inventor: Sebastian Meier
  • Patent number: 10131983
    Abstract: An apparatus and method for controlling the composition of liquid metal fed to an evaporator in a vacuum chamber used in a physical vapor deposition process.
    Type: Grant
    Filed: November 5, 2014
    Date of Patent: November 20, 2018
    Inventors: Edzo Zoestbergen, Jörgen van de Langkruis, Theodorus Franciscus Jozef Maalman
  • Patent number: 10131987
    Abstract: The invention provides a raw material for chemical deposition having properties required for a CVD compound, that is, which has a high vapor pressure, can be formed into a film at low temperatures (about 250° C. or less), and also has moderate thermal stability. The invention relates to a raw material for chemical deposition, for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, the raw material for chemical deposition including an organoruthenium compound represented by the following formula, in which a cyclohexadienyl group or a derivative thereof and a pentadienyl group or a derivative thereof are coordinated to ruthenium: wherein the substituents R1 to R12 are each independently a hydrogen atom, a linear or cyclic hydrocarbon, an amine, an imine, an ether, a ketone, or an ester, and the substituents R1 to R12 each have 6 or less carbon atoms.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: November 20, 2018
    Inventors: Ryosuke Harada, Toshiyuki Shigetomi, Kazuharu Suzuki, Shunichi Nabeya, Takayuki Sone, Akiko Kumakura
  • Patent number: 10080259
    Abstract: A three-dimensional ceramic heater, such as a cylindrical ceramic heater, is proposed in which the conductive ceramic heating element is multi-furcated into lanes at least in the folded-back sections so that the electric current tends to flow in a more uniform and hence laminar manner with the effect that the localized over heating is suppressed greatly.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: September 18, 2018
    Inventors: Takuma Kushihashi, Noboru Kimura, Kazuyoshi Tamura
  • Patent number: 10052724
    Abstract: A braze composition, brazing process, and brazed article are disclosed. The braze composition includes a MCrAlY alloy at a concentration, by weight, of between 50% and 70%, where M is selected from the group consisting of nickel, cobalt, iron, alloys thereof, and combinations thereof, and a nickel-based alloy at a concentration, by weight, of between 30% and 50%. The brazing process includes forming a braze paste, brazing the braze paste to a portion of a component, and shaping the braze paste to form a brazed article. The brazed article includes a component and a braze composition brazed to the component, the braze composition including a MCrAlY alloy at a concentration, by weight, of between 50% and 70%, where M is selected from the group consisting of nickel, cobalt, iron, alloys thereof, and combinations thereof, and a nickel-based alloy at a concentration, by weight, of between 30% and 50%.
    Type: Grant
    Filed: March 2, 2016
    Date of Patent: August 21, 2018
    Assignee: General Electric Company
    Inventors: Dheepa Srinivasan, Dayananda Narayana, Surinder Singh Pabla, Srikanth Chandrudu Kottilingam
  • Patent number: 10023749
    Abstract: A process for applying a chromium layer on a substrate, specifically a turbine engine airfoil, by contacting at least a portion of the substrate with a gaseous chromium wherein the gaseous chromium is generated from a substantially nitrogen free source.
    Type: Grant
    Filed: January 15, 2015
    Date of Patent: July 17, 2018
    Assignee: United Technologies Corporation
    Inventors: Kevin L. Collins, Michael J. Minor
  • Patent number: 9971064
    Abstract: An optical film to be arranged on a display surface is adapted so as to allow uniform application of an interlayer filler and thus also is applicable to an image display device equipped with a front plate. Preferably, such optical film is for use in an image display device. The optical film is adapted so that a relationship of the following formula (1) is satisfied: b?0.2a+1.8??(1), where a is the viscosity (Pa·s) of an interlayer filler at the time of attaching the front plate to a surface of the optical film via the interlayer filler, and b is the atomic percentage (atm %) of silicon atoms on the surface of the optical film. The atomic percentage of oxygen atoms on the surface of the optical film is at least 26 atm %.
    Type: Grant
    Filed: November 8, 2012
    Date of Patent: May 15, 2018
    Inventors: Naoki Hashimoto, Katsunori Takada, Hiroyuki Takemoto
  • Patent number: 9953984
    Abstract: Disclosed herein are methods and related apparatus for formation of tungsten wordlines in memory devices. Also disclosed herein are methods and related apparatus for deposition of fluorine-free tungsten (FFW). According to various embodiments, the methods involve deposition of multi-component tungsten films using tungsten chloride (WClx) precursors and boron (B)-containing, silicon (Si)-containing or germanium (Ge)-containing reducing agents.
    Type: Grant
    Filed: February 10, 2016
    Date of Patent: April 24, 2018
    Assignee: Lam Research Corporation
    Inventors: Michal Danek, Hanna Bamnolker, Raashina Humayun, Juwen Gao
  • Patent number: 9919493
    Abstract: An object of the present invention is to provide an electromagnetic wave penetrative metal film having high mass productivity and an extremely low attenuation rate in the electromagnetic wave penetrated through, a manufacturing method of the electromagnetic wave penetrative metal film, and a radome for a vehicle-mounted radar devices using the electromagnetic wave penetrative metal file. To achieve the object, the present invention provides an electromagnetic wave penetrative metal film composed of more than 10000 of fine metal film pieces per unit area (1 mm2) provided on a surface of a substrate through an electroless plating step, wherein fine metal film pieces adjacent to each other are electrically isolated, a manufacturing method of the electromagnetic wave penetrative metal film, and a radome for a vehicle-mounted radar devices using the electromagnetic wave penetrative metal film.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: March 20, 2018
    Assignee: Sankei Giken Kogyo Co., Ltd.
    Inventor: Shuji Yamamoto
  • Patent number: 9914404
    Abstract: A method of manufacturing a chrome plated component can include performing a two-shot (2K) molding process to form a component comprising first and second \members. A non-plateable resin can be molded to form the first member defining a front surface that defines a recess. A plateable resin can be molded to form the second member defining a back surface that defines the protrusion. The component can then be removed from its mold, where (i) an exposed surface of the second member defines a front surface of the component and (ii) the recess receives the protrusion such that the front surface of the first member is substantially flush with the back surface of the second member. An exposed surface of the second member can then be chrome plated to obtain the chrome plated component.
    Type: Grant
    Filed: August 8, 2016
    Date of Patent: March 13, 2018
    Assignee: SRG GLOBAL INC.
    Inventors: Rob Frayer, Marlon Anderson, Bill Michael Doroghazi
  • Patent number: 9917247
    Abstract: A mechanism is provided for fabricating a thermally assisted magnetoresistive random access memory device. A bottom thermal barrier is formed on a bottom contact. A magnetic tunnel junction is formed on the bottom thermal barrier. The magnetic tunnel junction includes a top ferromagnetic layer formed on a tunnel barrier. The tunnel barrier is formed on a bottom ferromagnetic layer. A top thermal barrier is formed on the top ferromagnetic layer. A top contact is formed on the top thermal barrier. The top contact is reduced to a first diameter. The tunnel barrier and the bottom ferromagnetic layer each have a second diameter. The first diameter of the top contact is smaller than the second diameter.
    Type: Grant
    Filed: November 9, 2016
    Date of Patent: March 13, 2018
    Inventors: Anthony J. Annunziata, Lucian Prejbeanu, Philip L. Trouilloud, Daniel C. Worledge
  • Patent number: 9896468
    Abstract: Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.
    Type: Grant
    Filed: October 21, 2013
    Date of Patent: February 20, 2018
    Inventors: Atsushi Sakurai, Masako Hatase, Naoki Yamada, Tsubasa Shiratori, Akio Saito, Tomoharu Yoshino
  • Patent number: 9873936
    Abstract: A slurry composition for aluminizing a superalloy component is provided, wherein the slurry includes an organic binder and a solid content including at least aluminum, silicon, and at least one of hafnium or yttrium.
    Type: Grant
    Filed: June 12, 2015
    Date of Patent: January 23, 2018
    Inventor: Paul Mathew Walker
  • Patent number: 9816167
    Abstract: The invention relates to a method for the production of carbon fiber reinforced aluminum matrix composite wires by drawing carbon fibers through molten salt and molten aluminum in such a way that the molten aluminum and the molten salt are spatially separated, and the carbon fibers are drawn through first the molten salt, then the molten aluminum separated from it. The invention further relates to an apparatus for the implementation of the method.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: November 14, 2017
    Inventors: György Kaptay, Csaba Mekler, Dávid Stomp, Péter Baumli, István Budai, Koppány Levente Juhász, Dávid Szabó, József Szabó
  • Patent number: 9765445
    Abstract: A new set of branched nanowire or nanotree structures and their fabrication process. Some structures have one or more of the following distinctions from other branched nanowires: (1) the trunk and branch diameter and branching number density can be changed along the trunk's length; (2) the branch's azimuthal direction can be controlled along the trunk's length; (3) the branch's diameter can be modulated along its length; (4) the crystal orientation and branches of the ensemble of nanowires can be aligned on a non-epitaxially matched substrate. The structures are made by a geometrically controlled kinetic growth method.
    Type: Grant
    Filed: November 27, 2013
    Date of Patent: September 19, 2017
    Assignee: The Governors of the University of Alberta
    Inventors: Ryan Thomas Tucker, Allan Leo Beaudry, Joshua Michael LaForge, Michael Thomas Taschuk, Michael Julian Brett
  • Patent number: 9657405
    Abstract: A removable mask for a platform or a nozzle sector of a turbine engine blade, the blade or sector configured to be covered in an electrolytic deposit, the mask including a mechanism to engage on the platform and a mechanism to cover outer surfaces of the platform that are not to be covered by the electrolytic deposit.
    Type: Grant
    Filed: April 14, 2011
    Date of Patent: May 23, 2017
    Assignee: SNECMA
    Inventors: Pascal Etuve, Frederic Lagrange, Patrick Marquereau, Pascal Sainz
  • Patent number: 9623632
    Abstract: A vacuum deposition process suitable for coating discrete articles with a zinc-rich, fully alloyed layer is described. In a process step of contacting the article with metallic Zn vapor, the temperature of the article is equal to or higher than the dew point of the Zn vapor. The process results in a coating having a uniform thickness, even on less accessible surfaces. Additionally, the roughness of the steel substrate is essentially preserved. By properly engineering the surface of the substrate, coated articles can be obtained having a roughness providing for optimal paint adhesion.
    Type: Grant
    Filed: May 13, 2015
    Date of Patent: April 18, 2017
    Assignee: Umicore
    Inventors: Bruno Gay, Etienne Petit
  • Patent number: 9574264
    Abstract: In a method for evaporation depositing uniform thin films, a film is deposited on a substrate of a vacuum environment while maintaining a constant deposition rate. A cover is installed on a wall of the evaporation vessel. When the evaporation material is heated to an evaporation state and the interior of the evaporation vessel reaches a first vapor saturation pressure, the vapor of the evaporation material flows towards a pressure stabilizing chamber. When the pressure stabilizing chamber reaches a second vapor saturation pressure which is smaller than the first vapor saturation pressure, the vacuum environment has a vacuum background pressure which is smaller than the second vapor saturation pressure, so that the evaporation material vapor flows from the pressure stabilizing chamber towards the vacuum environment at constant rate due to the pressure difference, so as to evaporate the substrate.
    Type: Grant
    Filed: May 20, 2015
    Date of Patent: February 21, 2017
    Inventors: Shih-Chang Liang, Wei-Chieh Huang, Chao-Nan Wei, Cuo-Yo Ni, Hui-Yun Bor
  • Patent number: 9557859
    Abstract: Method of making a touch sensor including one or more multilayer electrodes and an underlayer disposed on a substrate. The underlayer is disposed between the multilayer electrodes and the substrate. The multilayer electrodes including at least two transparent or semitransparent conductive layers separated by a transparent or semitransparent intervening layer. The intervening layer includes electrically conductive pathways between the first and second conductive layers to help reduce interfacial reflections occurring between particular layers in devices incorporating the conducting film or electrode.
    Type: Grant
    Filed: June 5, 2012
    Date of Patent: January 31, 2017
    Assignee: 3M Innovative Properties Company
    Inventors: Clark I. Bright, Nancy S. Lennhoff, Mark E. Flanzer, Dennis M. Brunner
  • Patent number: 9490211
    Abstract: A method of filling features in a dielectric layer is provided. A pure Co or pure Ru adhesion layer is deposited against surfaces of the features, wherein the adhesion layer is separated from some of the surfaces of the features of the low-k dielectric layer by no more than 10 ?. The features are filled with Cu or a Cu alloy.
    Type: Grant
    Filed: June 23, 2015
    Date of Patent: November 8, 2016
    Assignee: Lam Research Corporation
    Inventors: Lie Zhao, Artur Kolics
  • Patent number: 9349583
    Abstract: Methods of fabricating a semiconductor device include forming a deposited film on a semiconductor substrate in a process chamber by repeatedly forming unit layers on the semiconductor substrate. The unit layer is formed by forming a preliminary unit layer on the semiconductor substrate by supplying a process material including a precursor material and film-control material into the process chamber, purging the process chamber, forming a unit layer from the preliminary unit layer, and again purging the process chamber. The precursor material includes a central atom and a ligand bonded to the central atom, and the film-control material includes a hydride of the ligand.
    Type: Grant
    Filed: February 25, 2013
    Date of Patent: May 24, 2016
    Assignee: Samsung Electronis Co., Ltd.
    Inventors: Min-Young Park, Youn-Soo Kim, Sang-Yeol Kang, Cha-Young Yoo, Jae-Soon Lim, Jae-Hyoung Choi