Abstract: The present invention relates to a method of growing a ZnO film using chemical vapour deposition (CVD), and to a ZnO film grown according to the method. The method includes providing a precursor in vapour form, the precursor substantially comprising Zn4O(O2CNRARB)6, where RA and RB are any combination of akyl or perfluoroalkyl groups, and decomposing at least some of the vapour at the surface of the substrate such that the film of zinc oxide forms. An advantage of using this precursor material is that, unlike in the prior art, no deliberate introduction of water vapour to improve christallographic orientation is required. Higher purities in oxide films are produced.

Abstract: A method for preparing an &agr;-Al2O3 nanotemplate of fully crystalline &agr;-Al2O3 directly on the surface of a metal alloy is provided. Also provided is a related apparatus.

Abstract: A method is disclosed to effectively achieve a low deposition temperature of CMO memory materials by depositing the CMO memory material at relatively low temperatures that give an amorphous film, then to later melt and re-crystallize the CMO memory material with a laser (laser annealing).

Abstract: Organic molecules are partially oxidized in that the gas phase on supported and immobilized photocatalysts deposited having a nanostructure. the photocatalysts are semiconductors such as titanium dioxide and are preferentially coated onto a substrate by flame aerosol coating.

Abstract: A method with which all semiconductor lasers can be used as products is provided by regulating reflectance variations of all the semiconductor laser end faces arranged in an electron beam deposition apparatus after completion of deposition to a predetermined range when semiconductor laser end faces are coated. An end face (3) that is placed at a position at which the film thickness is made relatively thicker than those of other coat batches due to the large flux of a deposition beam is inclined by an angle &bgr; to adjust the incident angle of the deposition beam. The relationship, actual film thickness (9b)=film thickness (9b) in direction of deposition beams central axis (8a)×cos &bgr;, is utilized to reduce the film thickness of the end face (3) to the predetermined range.

Abstract: An aerogel substrate useful for an electrically conductive substrate, a heat insulating substrate, an optical waveguide substrate, a substrate for a light emitting device or a light emitting device is provided. The aerogel substrate is characterized by comprising a functional layer and an aerogel layer, and an intermediate layer formed between the functional layer and the aerogel layer to allow the functional layer to be formed uniformly thereon. The intermediate layer is formed on at least one surface of the aerogel layer by a gas phase method, by the Langmuir-Blodgett method or by adsorption of an inorganic layered compound; or formed by a hydrophilicizing treatment of at least one surface of the aerogel layer followed by coating and drying an aqueous coating fluid, by an annealing treatment of at least one surface of the aerogel layer, or by a hydrophilicizing treatment of at least one surface of the aerogel layer.

Abstract: An article protected by a thermal barrier coating system is fabricated by providing an article substrate having a substrate surface, thereafter depositing a bond coat on the substrate surface, the bond coat having a bond coat surface, and thereafter processing the bond coat to flatten the bond coat surface. A thermal barrier coating is deposited overlying the bond coat surface. The thermal barrier coating is yttria-stabilized zirconia having a yttria content of from about 3 percent by weight to about 5 percent by weight of the yttria-stabilized zirconia.

Abstract: Substrate that is vapor-deposited with dopant-added ZnO thin film is loaded into a heat-treating chamber, and heat-treated quickly under gas atmosphere to activate the dopant. A thin film phosphor having new luminescence peak can be fabricated by quick-heat-treatment of zinc compound semiconductor under hydrogen atmosphere. This thin film phosphor can replace the conventional blue luminescence using alloy-type ZnO and furthermore can be utilized as blue light emitting material for flat plate display elements such as FED and PDP.

Abstract: A process for the production of durable photocatalytically active self-cleaning coating on glass by contacting a hot glass surface with a fluid mixture of titanium chloride, a source of oxygen and a tin precursor. The coating preferably comprises less than 10 atom % tin in the bulk of the coating and preferably there is a greater atomic percent tin in the surface of the coating than there is in the bulk of the coating. Preferably, the coating is durable to abrasion and humidity cycling.

Abstract: A ceramic thermal barrier coating on a substrate wherein the coating comprises primary columnar grains that extend transversely of a surface of the substrate and that include integral secondary columnar grains extending laterally therefrom relative to a respective column axis. The secondary columnar grains typically extend from the primary columnar grains at an acute angle of less than 90 degrees relative to the column axis of the primary columnar grains. The coating structure exhibits reduced thermal conductivity as compared to a conventional thermal barrier coating.

Abstract: The invention relates to a method and apparatus for the production of protective coatings on parts. A coating formed in accordance with the invention has a chemical composition and structure gradient across its thickness. The coating is obtained by heating of a composite ingot including a body and at least one insert disposed within the body. As the composite ingot is heated it sequentially evaporates to produce a vapor with a chemical composition varying over the evaporation time period. The composition of the body and composition and location of the insert within the body function to determine the chemical composition of the vapor at any time. Condensation and/or deposition of the vapor onto a substrate forms the inventive coating.

Abstract: A non-carbon, metal-based, high temperature resistant, electrically conductive and electrochemically active anode of a cell for the production of aluminum has a metal-based substrate to which an adherent coating is applied prior to its immersion into the electrolyte and start up of the electrolysis by connection to the positive current supply. The coating is obtainable from one or more layers applied from: a liquid solution, a dispersion in a liquid or a paste, a suspension in a liquid or a paste, and a pasty or non-pasty slurry, and combinations thereof with or without one or more further applied layers, with or without heat treatment between two consecutively applied layers when at least two layers are applied.

Abstract: The subject of the invention is a glass-, ceramic- or vitroceramic-based substrate (1) provided on at least part of at least one of its faces with a coating (3) with a photocatalytic property containing at least partially crystalline titanium oxide.

Abstract: Ion texturing methods and articles are disclosed.

Abstract: A structure protected by a ceramic coating is prepared by providing a substrate having a surface, and depositing a layer of a sacrificial ceramic precursor material, preferably silica, onto the surface of the substrate. The method further includes furnishing a reactive gas, preferably an aluminum-containing gas, that is reactive with the sacrificial ceramic to produce a protective ceramic different from the sacrificial ceramic, and contacting the reactive gas to the layer of the precursor material to produce a protective ceramic layer.

Abstract: A protective coating system and method for protecting a thermal barrier coating from CMAS infiltration. The coating system comprises inner and outer alumina layers and a platinum-group metal layer therebetween. The outer alumina layer is intended as a sacrificial layer that reacts with molten CMAS, forming a compound with a melting temperature significantly higher than CMAS. As a result, the reaction product of the outer alumina layer and CMAS resolidifies before it can infiltrate the TBC. The platinum-group metal layer is believed to serve as a barrier to infiltration of CMAS into the TBC, while the inner alumina layer appears to enhance the ability of the platinum-group metal layer to prevent CMAS infiltration.

Abstract: Ion conducting solid electrolytes are constructed from nanoscale precursor material. Nanocrystalline powders are pressed into disc structures and sintered to the appropriate degree of densification. Metallic material is mixed with 0 to 65 vol % nanostructured electrolyte powders to form a cermet mix and then coated on each side of the disc and fitted with electrical leads. The electrical conductivity of a Ag/YSZ/Ag cell so assembled exhibited about an order of magnitude enhancement in oxygen ion conductivity. As an oxygen-sensing element in a standard O2/Ag/YSZ/Ag/N2 set up, the nanocrystalline YSZ element exhibited commercially significant oxygen ion conductivity at low temperatures. The invention can be utilized to prepare nanostructured ion conducting solid electrolytes for a wide range of applications, including sensors, oxygen pumps, fuel cells, batteries, electrosynthesis reactors and catalytic membranes.

Abstract: There is described a process and apparatus for the physical vapor deposition of an anisotropic phosphor composition with an auto-collimating, optical waveguide structure.

Abstract: A process for depositing an antimony-containing coating upon a surface of a heated glass substrate includes dissolving an antimony halide in an organic solvent to form an antimony halide containing solution. This solution is then vaporized to form a gaseous antimony precursor. The gaseous antimony precursor is then directed toward and along the surface of the heated glass substrate. The antimony precursor is reacted at or near the surface to form an antimony containing coating.

Abstract: An anti-stick coating that inhibits the adhesion of contaminants that form deposits on the internal cooling passages of gas turbine engine components. The anti-stick coating is formed as an outer coating of the internal cooling passages, and preferably overlies an environmental coating such as a diffusion aluminide coating formed on the passage surfaces. The outer coating has a thickness of not greater than three micrometers, and is resistant to adhesion by dirt contaminants as a result of comprising at least one layer of tantala, titania, hafnia, niobium oxide, yttria, silica and/or alumina. The outer coating is preferably deposited directly on the environmental coating by chemical vapor deposition.

Abstract: The present invention relates to a method of applying glass layers, which may or may not be doped, to the interior of a substrate tube by means of a chemical vapor deposition (CVD) technique, using a reactive gas mixture, in order to obtain a preform that exhibits a precisely defined refractive index profile, which method comprises a number of steps.

Abstract: There is disclosed a coated body having as the outer layer a layer of &ggr;-Al2O3 deposited by chemical vapor deposition, preferably at a temperature of from 700-900° C. The &ggr;-Al2O3 layer is formed through the use of a gaseous mixture including H2S in amounts significantly higher than those presently used and at a temperature of from 700-900° C. The method is also disclosed.

Abstract: A ZnO film forming method is a method of letting an electric current flow between a conductive substrate immersed in at least one forming bath containing at least zinc ions, and a counter electrode immersed in the at least one forming bath, thereby forming a zinc oxide film on the conductive substrate, wherein deposition of a zinc oxide film on a back surface of the conductive substrate is decreased by adjusting (1) a distance between the back surface of the conductive substrate and a region facing at least the periphery of the back surface in a surface facing the back surface, and (2) an electric conductivity of the forming bath, and (3) an electric current density between the conductive substrate and the counter electrode, thereby establishing a mass production technology based on electrolytic deposition of the zinc oxide film as a low cost technology and providing the method of forming the ZnO film with high performance and excellent adhesion to the substrate while reducing the amount of the film deposited

Abstract: The invention relates to a process for preparing niobium(V) alkoxides and tantalum(V) alkoxides, in particular niobium(V) ethoxide and tantalum(V) ethoxide, by reacting NbCl5 or TaCl5 with an appropriate alcohol in the presence of ammonia, wherein NbCl5 or TaCl5 is dissolved at a temperature of from about 0° C. to −50° C. in the alcohol containing from about 5 to about 7 mol of ammonia per mol of NbCl5 or TaCl5 to be reacted.

Abstract: The present invention provides a method for manufacturing a high quality oxide layer having a uniform thickness. The method includes providing a semiconductor substrate, and forming an oxide layer having a substantially uniform thickness on the semiconductor substrate, and in a zone of pressure of less than about 4 Torr or greater than about 25 Torr.

Abstract: An article includes a substrate and an adhesion layer overlying the substrate. The adhesion layer includes a first phase including particles, and a second phase including braze alloy that bonds the particles to the substrate. The article further includes a ceramic layer overlying the adhesion layer. In one embodiment, the ceramic layer is a thermal barrier coating (TBC), formed of stabilized zirconia (ZrO2).

Abstract: A niobium doped tin oxide coating is applied onto a glass substrate to produce a low emissivity (low E) glass. The coating can optionally be doped with both niobium and other dopant(s), such as fluorine. The low emissivity glass has properties comparable or superior to conventional low E glass with fluorine doped tin oxide coatings.

Abstract: Antimony doped tin oxide coatings on glass are prepared by providing a uniform, vaporized reactant mixture containing an organotin compound, an organoantimony compound, water and oxygen, and delivering the reactant mixture to the surface of the hot ribbon of glass, where the compounds react to form an antimony doped tin oxide coating. The antimony doped tin oxide coatings applied in accordance with the invention exhibit improved uniformity in thickness and sheet resistance over the coated surface of the glass, and increased coating/manufacturing efficiency.

Abstract: A metallic substrate has a substrate surface having a substrate surface of nickel, a substrate aluminum content, and other alloying elements. A maskant is applied overlying the substrate surface to produce a masked substrate surface having an exposed region and a protected region. The maskant includes a plurality of maskant particles, each particle having a maskant particle composition comprising a maskant metal selected from the group of nickel, cobalt, titanium, chromium, iron, and combinations thereof, and a maskant aluminum content. The substrate is aluminided by contacting a source of aluminum to the masked substrate surface, whereby aluminum deposits on the exposed region and does not deposit on the protected region.

Abstract: A venturi mist generator creates a mist comprising droplets having a mean diameter less than one micron from liquid precursors containing multi-metal polyalkoxide compounds. The mist is mixed and then passed into a gasifier where the mist droplets are gasified at a temperature of between 100° C. and 250° C., which is lower than the temperature at which the precursor compounds decompose. The gasified precursor compounds are transported by carrier gas through insulated tubing at ambient temperature to prevent both condensation and premature decomposition. The gasified precursors are mixed with oxidant gas, and the gaseous reactant mixture is injected through a showerhead inlet into a deposition reactor in which a substrate is heated at a temperature of from 300° C. to 600 ° C. The gasified precursors decompose at the substrate and form a thin film of solid material on the substrate. The thin film is treated at elevated temperatures of from 500° C. to 900° C.

Abstract: Improved adhesion of thermal barrier coatings to nonmetallic substrates using a dense layer of ceramic on an underlying nonmetallic substrate that includes at least one oxidizable component. The improved adhesion occurs because the application of the dense ceramic layer forms a diffusion barrier for oxygen. This diffusion barrier prevents the oxidizable component of the substrate from decomposing. The present invention applies ceramic by a process that deposits a relatively thick and dense ceramic layer on the underlying substrate. The formation of the dense layer of ceramic avoids the problem of void formation associated with ceramic formation by most prior art thermal decomposition processes. The formation of voids has been associated with premature spalling of thermal barrier layers and other protective layers applied to substrates.

Abstract: A method is described for reducing surface oxide growth which heating aluminum containing surfaces in a vacuum environment prior to the deposition of a ceramic coating. The method comprises flowing an inert or non reactive gas into the coating apparatus adjacent to the surface to be coated to reduce oxygen reaction with the surface.

Abstract: The present invention is directed to transparent articles including a microembossed image such as a hologram or diffraction grating, coated at least in-part, with a layer of material having a refractive index that differs from the refractive index of the transparent layer by about 0.2 units and can be prepared by solution coating techniques such as conventional printing, e.g., rotogravure.

Abstract: A material having a titanium dioxide crystalline orientation film oriented in a specific direction on a surface of a substrate is produced by spraying a vaporized titanium alkoxide onto the surface of the substrate heated under atmospheric pressure along with an inert gas as a carrier. The material having the titanium dioxide crystalline orientation film is excellent in properties such as an antimicrobial activity, a stain resistance, an ultra-hydrophilic property and the like, and is widely used as kitchen appliances such as cooking utensils, tableware and a refrigerator, tools for medical care, materials for a toilet or a toilet room, a filter of an air-conditioner, electronic parts, building materials and road-associated materials.

Abstract: A corrosion resistant component of semiconductor processing equipment such as a plasma chamber comprises a cerium oxide containing ceramic material as an outermost surface of the component. The cerium oxide containing ceramic material comprises one or more cerium oxides as the single largest constituent thereof. The component can be made entirely of the cerium oxide containing ceramic material or, alternatively, the cerium oxide containing ceramic can be provided as a layer on a substrate such as aluminum or an aluminum alloy, a ceramic material, stainless steel, or a refractory metal. The cerium oxide containing ceramic layer can be provided as a coating by a technique such as plasma spraying. One or more intermediate layers may be provided between the component and the cerium oxide containing ceramic coating.

Abstract: A method for producing a thermal barrier coating system on an article that will be subjected to a hostile environment. The thermal barrier coating system is composed of a metallic bond coat and a ceramic thermal barrier coating having a columnar grain structure. The method generally entails forming the bond coat on the surface of a component, and then grit blasting the bond coat with an abrasive media having a particle size of greater than 80 mesh. The component is then supported within a coating chamber containing at least two ingots of the desired ceramic material. An absolute pressure of greater than 0.014 mbar is established within the chamber containing oxygen and an inert gas. Thereafter, the ceramic ingots are vaporized with an electron beam such that the vapor deposits on the surface of the component to form a layer of the ceramic material on the surface.

Abstract: Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.

Abstract: Novel ligated compounds of tin, titanium, and zinc are useful as metal oxide CVD precursor compounds without the detriments of extreme reactivity yet maintaining the ability to produce high quality metal oxide coating by contact with heated substrates.

Abstract: This invention, in one aspect, relates to a method of applying a corrosion-resistant coating on an article and is particularly, but not exclusively, concerned with a method of applying a corrosion-resistant coating on an Nd—Fe—B magnet. In another aspect, the present invention relates to a method of applying a coherent coating on the surfaces of the particles of a powder. Such powder may be one which is susceptible to oxidative corrosion and/or one which is used to form a magnet (e.g Nd—Fe—B powder).

Abstract: The present invention relates to a method for carrying out a magnesium oxide based deposition on the dielectric surface of a glass plate of a display panel. The method includes the creation of a mist from a metalorganic compound of magnesium dissolved in a solvent, the conveying of the mist to the dielectric surface of the plate, the evaporation the solvent when approaching the dielectric surface of the plate which is taken to a temperature of about 380° to 430°, and the pyrolysis of the metalorganic compound leading to the magnesium oxide based deposit on the surface of the plate and the evaporation of the organic radical of the compound, this deposit being practically waterproof. The method is especially useful in the manufacture of plasma panels.

Abstract: A thermal barrier coating for superalloy turbine engine vanes and blades that are exposed to high temperature gas is disclosed. The coating includes an aluminide or MCrAIY layer, an alumina layer, and a ceramic top layer. The ceramic layer has a columnar grain microstructure. A bond inhibitor is disposed in the gaps between the columnar grains. This inhibitor is either unstabilized zirconia, unstabilized hafnia, or a mixture thereof.

Abstract: The invention includes chemical vapor deposition and physical vapor deposition methods of forming high k ABO3 comprising dielectric layers on a substrate, where “A” is selected from the group consisting of Group IIA and Group IVB elements and mixtures thereof, and where “B” is selected from the group consisting of Group IVA metal elements and mixtures thereof. In one implementation, a plurality of precursors comprising A, B and O are fed to a chemical vapor deposition chamber having a substrate positioned therein under conditions effective to deposit a high k ABO3 comprising dielectric layer over the substrate. During the feeding, pressure within the chamber is varied effective to produce different concentrations of A at different elevations in the deposited layer and where higher comparative pressure produces greater concentration of B in the deposited layer.

Abstract: A method of making a spinner disc for a rotary fiberization process, such as but not limited to a glass fiberization process, includes: forming a spinner disc from an alloy that forms a protective oxide film on surfaces of the spinner disc exposed to the atmosphere; forming fiberizing holes in an annular peripheral sidewall of the spinner disc; and applying a plasma to a surface of the spinner disc to remove hydrocarbons and sulfurous compounds from the surface of the spinner disc which would otherwise reduce and/or react with and degrade the protective oxide film forming on the surface of the spinner disc when the spinner disc is exposed to the atmosphere.

Abstract: Methods of protecting from atmospheric contaminants, or removing atmospheric contaminants from, the bonding surfaces of copper semiconductor bond pads by coating a bond pad with a layer of a ceramic material having a thickness that is suitable for soldering without fluxing and that is sufficiently frangible during ball or wedge wire bonding to obtain metal-to-metal contact between the bonding surfaces and the wires bonded thereto. Coated semiconductor wafers are also disclosed.

Abstract: The present invention provides a method for making a stain-resistant float glass and an apparatus for carrying out such a method. In keeping with this method, SO3 is applied to the upper surface of float glass in an amount efficacious to materially reduce staining of the upper surface of the glass. Optimally, SO3 gas can be applied directly onto the upper surface of the glass. An apparatus of the invention generally includes a downwardly open hood positioned above the upper surface of the glass and having walls defining an enclosure. SO3 gas (either as such or as a reactive mixture of S02 gas and an oxygen-containing gas) is delivered through a delivery tube to the enclosure.

Abstract: Multilayer deposition of thin films onto glass substrates to form thin film transistors can be carried out in the same chamber under similar reaction conditions at high deposition rates. We have found that sequential thin layers of silicon nitride and amorphous silicon can be deposited in the same chamber by chemical vapor deposition using pressure of at least 0.5 Torr and substrate temperatures of about 250-370° C. Subsequently deposited different thin films can also be deposited in separate chemical vapor deposition chambers which are part of a single multichamber vacuum system.

Abstract: A chemical vapor deposition method of forming a high k dielectric layer includes positioning a substrate within a chemical vapor deposition reactor. At least one metal comprising precursor and N2O are provided within the reactor under conditions effective to deposit a high k dielectric layer on the substrate comprising oxygen and the metal of the at least one metal precursor. The N2O is present within the reactor during at least a portion of the deposit at greater than or equal to at least 90% concentration by volume as compared with any O2, O3, NO, and NOX injected to within the reactor. In one implementation, the conditions are void of injection of any of O2, O3, NO, and NOX to within the reactor during the portion of the deposit. In one implementation, a capacitor is formed using the above methods. In preferred implementations, the technique can be used to yield smooth, continuous dielectric layers in the absence of haze or isolated island-like nuclei.

Abstract: A metallic substrate has a substrate surface having a substrate surface of nickel, a substrate aluminum content, and other alloying elements. A maskant is applied overlying the substrate surface to produce a masked substrate surface having an exposed region and a protected region. The maskant includes a plurality of maskant particles, each particle having a maskant particle composition comprising a maskant metal selected from the group of nickel, cobalt, titanium, chromium, iron, and combinations thereof, and a maskant aluminum content. The substrate is aluminided by contacting a source of aluminum to the masked substrate surface, whereby aluminum deposits on the exposed region and does not deposit on the protected region.

Abstract: Layered ceramic coatings in which some layers contain porosity as described as are methods for producing such coatings. The different layers have different compositions and/or are applied under different conditions. As applied, some of the layers have a Zone I structure and some have a Zone II/III type structure (as defined by Movchan). Heat treatment can be used to increase the porosity in the Zone I structure layers.

Abstract: A cathode ray tube has a panel portion 1 with a phosphor layer 5 formed on its inner face, a neck portion 2 accommodating an electron gun 9, a funnel portion 2 for coupling the panel portion 1 to the neck portion 2 and a color selective electrode assembly 6 having a number of electron beam passing openings arranged opposite to the phosphor layer 5 with a space therebetween. The color selective electrode assembly is installed within the panel portion 1. An electron beam reflection film of a bismuth oxide thin film 6R having a bulk density of at least 1 g/cm3, e.g., from 1 to 9.3 g/cm3, is formed on the face of the color selective electrode assembly 6 against which the electron beams 14 emitted from the electron gun 9 collide. The cathode ray tube is capable of displaying high density and high resolution image.