Moving The Base Patents (Class 427/255.5)
  • Patent number: 10503152
    Abstract: Described herein is a technique capable of improving the productivity of a substrate processing system including a plurality of process chambers. According to the technique described herein, there is provided a method of manufacturing a semiconductor device, including: (a) placing a storage container accommodating substrates on a loading port shelf; (b) transferring the substrates in a predetermined order from the storage container to process chambers capable of processing the substrates; (c) perform a substrate processing in the process chambers; (d) generating first count data corresponding to the processing chambers; (e) storing the first count data; (f) assigning transfer flag data to one of the process chambers next to another of the process chambers corresponding to a maximum count number of the first count data; and (g) transferring substrates accommodated in a next storage container of the storage container in the predetermined order based on the transfer flag data.
    Type: Grant
    Filed: September 19, 2018
    Date of Patent: December 10, 2019
    Assignee: Kokusai Electric Corporation
    Inventors: Naofumi Ohashi, Toshiyuki Kikuchi, Shun Matsui, Tadashi Takasaki
  • Patent number: 10450225
    Abstract: The present invention relates to a glass having a surface with improved water-repellency or hydrophobicity and low reflectance, and a fabrication method thereof. A technology is employed, in which a thin film containing silicon or silicon oxide is formed on the glass surface, the nano-structures are formed by selective etching treatment using a reactive gas such as CF4 or the like to provide superhydrophobicity and low reflectance properties, and a material with low surface energy is coated onto the nano-structures. The fabrication method of the low-reflective and superhydrophobic or super water-repellent glass may execute deposition and etching processes for the glass having the superhydrophobicity and the low reflectance, and provide excellent superhydrophobicity and low reflectance to the surface of the glass which was difficult to be treated. Also, the method is sustainable due to non-use of a toxic etching solution during these processes.
    Type: Grant
    Filed: December 2, 2014
    Date of Patent: October 22, 2019
    Assignee: Korea Institute of Science and Technology
    Inventors: Myoung Woon Moon, Heon Ju Lee, Jeong Sim Lee, Tae Jun Ko, Kyu Hwan Oh, Do Hyun Kim, Eu Sun Yu
  • Patent number: 10415137
    Abstract: Gas distribution assemblies and processing chambers using same are described. The gas distribution assemblies comprise a cooling plate with a quartz puck, a plurality of reactive gas sectors and a plurality of purge gas sectors suspended therefrom. The reactive gas sectors and purge gas sectors having a coaxial gas inlet with inner tubes and outer tubes, the inner tubes and outer tubes in fluid communication with different gas or vacuum ports in the front faces of the sectors. The sectors may be suspended from the cooling plate by a plurality of suspension rods comprising a metal rod body with an enlarged lower end positioned within a quartz frame with a silicon washer around the enlarged lower end.
    Type: Grant
    Filed: December 28, 2016
    Date of Patent: September 17, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Alexander S. Polyak, Joseph Yudovsky
  • Patent number: 10158074
    Abstract: An organic layer deposition assembly for depositing a deposition material on a substrate includes a deposition source configured to spray the deposition material, a deposition source nozzle arranged in one side of the deposition source and including deposition source nozzles arranged in a first direction, a patterning slit sheet arranged to face the deposition source nozzle and having patterning slits in a second direction that crosses the first direction, and a correction sheet arranged between the deposition source nozzle and the patterning slit sheet and configured to block at least a part of the deposition material sprayed from the deposition source.
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: December 18, 2018
    Assignee: Samsung Display Co., Ltd.
    Inventors: Youngsun Cho, Daeyong Kim, Jongbum Kim, Jongho Yang, Yoonchan Oh
  • Patent number: 10147625
    Abstract: A gas floated workpiece supporting apparatus includes a gas upward ejector ejecting gas upward, and a gas downward ejector located at an upper side from the gas upward ejector and ejecting gas downward. The gas downward ejector is installed at a position where the gas downward ejector ejects the gas downward from above a plate-shaped workpiece to apply pressure to the plate-shaped workpiece that is floated and supported by the gas ejected from the gas upward ejector, whereby a uniform floating amount supports the plate-shaped workpiece with high flatness at a time of floating and supporting the plate-shaped workpiece.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: December 4, 2018
    Assignee: THE JAPAN STEEL WORKS, LTD.
    Inventors: Yuki Suzuki, Sadao Tanigawa
  • Patent number: 10131571
    Abstract: A method of forming an optical coating, including the steps: depositing a buffer layer on a glass substrate via plasma deposition at a first plasma bias voltage; and depositing at least one layer of an optical coating on the buffer layer via plasma deposition, the deposition of the optical coating carried out at a second plasma bias voltage.
    Type: Grant
    Filed: May 12, 2017
    Date of Patent: November 20, 2018
    Assignee: Corning Incorporated
    Inventors: Jean-Francois Oudard, James Edward Platten, Jue Wang
  • Patent number: 10014432
    Abstract: Provided is a method for manufacturing a solar cell with improved output characteristics. A hydrogen radical treatment, in which ions are not used, is performed on at least one of the first and second semiconductor layers (11, 13).
    Type: Grant
    Filed: February 25, 2016
    Date of Patent: July 3, 2018
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Tomonori Ueyama, Motohide Kai, Masaki Shima
  • Patent number: 9968963
    Abstract: A method for creating a functional coating on a substrate in vacuum from a deposited monomer material in absence of oxygen and/or radiation from a radiation source. The substrate may be preliminarily activated with inert gas to form an activated layer thereon. The method may include depositing a fluorine containing monomer having a first CF3:CF2 ratio, and forming, on the substrate, the self-assembled polymer coating that has a second CF3:CF2 ratio, where the first and second CF3:CF2 ratios are equal.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: May 15, 2018
    Assignee: SIGMA LABORATORIES OF ARIZONA, LLC
    Inventor: Angelo Yializis
  • Patent number: 9601330
    Abstract: To provide a plasma processing device and a plasma processing method capable of generating plasma stably and efficiently and processing the entire desired treated region of a substrate efficiently for a short period of time.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: March 21, 2017
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventors: Tomohiro Okumura, Hiroshi Kawaura
  • Patent number: 9601339
    Abstract: Provided are atomic layer deposition methods to deposit a tungsten film or tungsten-containing film using a tungsten-containing reactive gas comprising one or more of tungsten pentachloride, a compound with the empirical formula WCl5 or WCl6.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: March 21, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, Mei Chang, David Thompson, Steve G. Ghanayem
  • Patent number: 9583667
    Abstract: Systems and methods for forming solar cells with CuInSe2 and Cu(In,Ga)Se2 films are provided. In one embodiment, a method comprises: during a first stage (220), performing a mass transport through vapor transport of an indium chloride (InClx) vapor (143, 223) and Se vapor (121, 225) to deposit a semiconductor film (212, 232, 252) upon a substrate (114, 210, 230, 250); heating the substrate (114, 210, 230, 250) and the semiconductor film to a desired temperature (112); during a second stage (240) following the first stage (220), performing a mass transport through vapor transport of a copper chloride (CuClx) vapor (143, 243) and Se vapor (121, 245) to the semiconductor film (212, 232, 252); and during a third stage (260) following the second stage (240), performing a mass transport through vapor transport of an indium chloride (InClx) vapor (143, 263) and Se vapor (121, 265) to the semiconductor film (212, 232, 252).
    Type: Grant
    Filed: February 27, 2013
    Date of Patent: February 28, 2017
    Assignees: Alliance for Sustainable Energy, LLC, Abengoa Solar New Technologies, S.A.
    Inventors: David S. Albin, Nirav Vora, Sebastian Caparros Jimenez, Joaquin Murillo Gutierrez, Emilio Sanchez Cortezon, Manuel Romero
  • Patent number: 9559302
    Abstract: An organic material for a light emitting device is deposited over a substrate by evaporating the organic material from an evaporation source. The evaporation source comprises a plurality of discrete evaporation cells separated from each other, wherein each of the plurality of discrete evaporation cells contains the organic material. The evaporation source has a length along a first direction and a width along a second direction orthogonal to the first direction, the length being greater than the width. The plurality of discrete evaporation cells is arranged along the first direction. When the organic material is evaporated, a relative location of the evaporation source with respect to the substrate is changed along the second direction, and the evaporation of the organic material is initiated by heating the plurality of discrete evaporation cells.
    Type: Grant
    Filed: February 27, 2015
    Date of Patent: January 31, 2017
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Takeshi Fukunaga
  • Patent number: 9441288
    Abstract: A mask for thin film deposition used in forming an organic thin film or a conductive layer in an organic light emitting device is disclosed. In one embodiment, the mask includes i) a base member, ii) a plurality of slits configured to penetrate through the base member, wherein the plurality of slits have a predetermined length and extend in a first direction, wherein the plurality of slits comprise an outermost slit positioned in an outermost in a second direction having a predetermined angle with respect to the first direction, and wherein the outermost slit comprises two sub-slits separated from each other and iii) a rib supporting part formed between and contacting the two sub-slits, wherein the rib supporting part extends from a rib which is adjacent to the outermost slit.
    Type: Grant
    Filed: January 23, 2009
    Date of Patent: September 13, 2016
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Young Sung, Hong-Ryul Kim
  • Patent number: 9441294
    Abstract: A high quality thin film is formed by forming a layer in which remaining residues are suppressed for each cycle. When a substrate sequentially passes through a first processing region, a second processing region, and a third processing region by rotating a substrate placement unit, a first layer is formed on the substrate while the substrate passes through the first processing region, a second layer is formed by reacting plasma of a reactive gas with the first layer while the substrate passes through the second processing region, and the second layer is modified by plasma of a modifying gas while the substrate passes through the third processing region.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: September 13, 2016
    Assignee: Hitachi Kokusai Electric, Inc.
    Inventors: Katsuhiko Yamamoto, Yuki Taira
  • Patent number: 9238868
    Abstract: Systems and methods for atomic layer deposition (ALD) on a flexible substrate involve guiding the substrate back and forth between spaced-apart first and second precursor zones, so that the substrate transits through each of the precursor zones multiple times. Systems may include a series of turning guides, such as rollers, spaced apart along the precursor zones for supporting the substrate along an undulating transport path. As the substrate traverses back and forth between precursor zones, it passes through a series of flow-restricting passageways of an isolation zone into which an inert gas is injected to inhibit migration of precursor gases out of the precursor zones. Also disclosed are systems and methods for utilizing more than two precursor chemicals and for recycling precursor gases exhausted from the precursor zones.
    Type: Grant
    Filed: March 9, 2012
    Date of Patent: January 19, 2016
    Assignee: Lotus Applied Technology, LLC
    Inventors: Eric R. Dickey, William A. Barrow
  • Publication number: 20150140213
    Abstract: Method and apparatus for producing glancing angle deposited thin films. There is a source of collimated vapour flux, the source of collimated vapour flux having a deposition field; and a travelling substrate disposed within the deposition field of the source of collimated vapour flux, the collimated vapor flux being collimated at a defined non-zero angle to a normal to the travelling substrate.
    Type: Application
    Filed: September 24, 2014
    Publication date: May 21, 2015
    Inventors: Michael Thomas Taschuk, Michael Julian Brett, Andy Christopher van Popta, Peter Charles Philip Hrudey
  • Publication number: 20150140212
    Abstract: There is provided a film-forming apparatus including a roll-to-roll mechanism and a heating unit. The roll-to-roll mechanism is configured to transport a film-forming target and includes a tensile force relaxation unit configured to relax a tensile force applied to the transported film-forming target. The heating unit is configured to heat the film-forming target transported by the roll-to-roll mechanism.
    Type: Application
    Filed: April 24, 2013
    Publication date: May 21, 2015
    Inventors: Toshiyuki Kobayashi, Keisuke Shimizu, Koji Kadono, Yukiko Mizuguchi, Yosuke Murakami
  • Patent number: 9028613
    Abstract: A rotating type thin film deposition apparatus having an improved structure that allows continuous deposition, and a thin film deposition method used by the rotating type thin film deposition apparatus are provided. The rotating type thin film deposition apparatus includes a deposition device; a circulation running unit that runs a deposition target on a circulation track via a deposition region of the deposition device; and a support unit that supports the deposition target and moves along the circulation track. Thin layers can be precisely and uniformly formed on the entire surface of a deposition target, and since deposition is performed while a plurality of deposition targets move along a caterpillar track, a working speed is faster compared to a method involving a general reciprocating motion, and the size of the thin film deposition apparatus can be reduced.
    Type: Grant
    Filed: April 10, 2012
    Date of Patent: May 12, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jin-Kwang Kim, Sang-Joon Seo, Seung-Hun Kim
  • Patent number: 9029471
    Abstract: Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: May 12, 2015
    Assignee: E I du Pont du Nemours and Company
    Inventors: Romain Severac, Agnes Ibos, Lamia Heuze, Renaud Laloux-Walther
  • Patent number: 9017763
    Abstract: An injector for forming films respectively on a stack of wafers is provided. The injector includes a plurality of hole structures. Every adjacent two of the wafers have therebetween a wafer spacing, and each of the wafers has a working surface. The hole structures respectively correspond to the respective wafer spacings. The working surface and a respective hole structure have therebetween a parallel distance. The parallel distance is larger than a half of the wafer spacing. A wafer processing apparatus and a method for forming films respectively on a stack of wafers are also provided.
    Type: Grant
    Filed: December 14, 2012
    Date of Patent: April 28, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-Che Hsieh, Brian Wang, Tze-Liang Lee, Yi-Hung Lin, Hao-Ming Lien, Shiang-Rung Tsai, Tai-Chun Huang
  • Patent number: 9012257
    Abstract: A vapor deposition apparatus, which is capable of performing a thin film deposition process and improving characteristics of a formed thin film, includes a chamber having an exhaust opening; a stage located in the chamber, and including a plurality of mounting surfaces on which the plurality of substrates may be mounted; and an injection unit having at least one injection opening for injecting a gas into the chamber in a direction parallel with surfaces of the plurality of substrates.
    Type: Grant
    Filed: January 23, 2012
    Date of Patent: April 21, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sang-Joon Seo, Seung-Hun Kim, Jin-Kwang Kim, Seung-Yong Song
  • Patent number: 8986785
    Abstract: An apparatus for continuous sulfonization of discrete articles comprising a feeder box for drying the discrete articles with ultra-dry air, a sulfonization chamber for treating the discrete articles with sulfur trioxide gas, a conveyor assembly for transporting the discrete articles from the feeder box to the sulfonization chamber, and a neutralizing tank for treating the discrete articles with neutralizing fluid. The sulfonization chamber includes a rotating dial plate with a circular periphery and an upper surface extending radially from and rotatable about a center axis (A) for receiving the discrete articles at the circular periphery. A plurality of arcuate guides extend perpendicularly from a guide arm toward the rotating dial plate and are spaced radially outward from one another along a radial (R) extending radially from the center axis (A) for moving the discrete articles radially inward in a spiral path during rotation of the rotating dial plate.
    Type: Grant
    Filed: June 23, 2011
    Date of Patent: March 24, 2015
    Assignee: Surface Activation Technologies
    Inventors: John Scripps Wallace, Bradlee Norman Radke
  • Patent number: 8974858
    Abstract: An apparatus for depositing an organic material and a depositing method thereof, wherein a deposition process is performed with respect to a second substrate while transfer and alignment processes are performed with respect to a first substrate in a chamber, so that loss of an organic material wasted in the transfer and alignment processes can be reduced, thereby maximizing material efficiency and minimizing a processing tack time. The apparatus includes a chamber having an interior divided into a first substrate deposition area and a second substrate deposition area, an organic material deposition source transferred to within ones of the first and second substrate deposition areas to spray particles of an organic material onto respective ones of first and second substrates and a first transferring unit to rotate the organic material deposition source in a first direction from one of the first and second substrate deposition areas to an other of the first and second substrate deposition areas.
    Type: Grant
    Filed: July 17, 2013
    Date of Patent: March 10, 2015
    Assignee: Samsung Display Co., Ltd.
    Inventors: Jae-Wan Park, You-Min Cha, Won-Seok Cho, Jae-Mork Park, Jae-Hong Ahn, Min-Jeong Hwang, Tae-Wook Kim, Jong-Woo Lee, Tae-Seung Kim
  • Patent number: 8968823
    Abstract: Disclosed is an evaporation method to form a thin film over a substrate, which is characterized in the use of an evaporation source equipped with a plurality of evaporation cells. The evaporation source has a rectangular shape with a long side and a short side wherein the long side is longer than the short side. At least one of the evaporation source and the substrate is relatively moved during the evaporation, which allows the formation of a thin film having a highly uniform thickness in a short time.
    Type: Grant
    Filed: May 18, 2009
    Date of Patent: March 3, 2015
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Takeshi Fukunaga
  • Patent number: 8968830
    Abstract: A vacuum coating unit includes a reactive gas inlet, at least one PVD coating source with a laminar cathode and a substrate carrier containing a multiplicity of substrates. The substrate carrier forms a two dimensional horizontal extent, and the carrier is between at least two PVD coating sources. The substrates are cutting tools with at least one cutting edge in their peripheral margin region, which are distributed in a plane of the two dimensional extent of the substrate carrier. The substrate carrier is in a horizontal plane in the vacuum process chamber spaced between the laminar cathodes of the PVD coating sources and positioned such that at least a portion of each of the at least one cutting edge includes an active cutting edge and this active cutting edge is oriented opposite at least one of the cathodes of the PVD coating sources exposed at any time along a line of sight.
    Type: Grant
    Filed: November 13, 2008
    Date of Patent: March 3, 2015
    Assignee: Oerlikon Trading AG, Trubbach
    Inventors: Juergen Ramm, Christian Wohlbab
  • Publication number: 20150050421
    Abstract: A method of depositing a layer includes spraying a source gas and a reactant gas onto a substrate disposed on a susceptor unit using at least one source gas spray nozzle and at least one reactant gas nozzle to form a first source gas region and a first reactant gas region on the substrate, respectively, moving the susceptor unit by a distance corresponding to a width of the source gas spray nozzle or a width of the reactant gas spray nozzle in a first direction, and spraying the source gas and the reactant gas onto the first reactant gas region and the first source gas region using the source gas spray nozzle and the reactant gas nozzle, respectively, to form a first monolayer.
    Type: Application
    Filed: June 4, 2014
    Publication date: February 19, 2015
    Inventors: Choel-Min JANG, Sung-Hun KEY, In-Kyo KIM, Suk-Won JUNG, Myung-Soo HUH
  • Patent number: 8956686
    Abstract: Disclosed is a preparation method of a radiation image conversion panel by a vapor deposition method, in which a support member is supported and rotated and the stimulable phosphor evaporated from the evaporation source is deposited onto the support member to form a stimulable phosphor layer. The radiation image conversion panel manufactured by the method is also disclosed.
    Type: Grant
    Filed: January 18, 2006
    Date of Patent: February 17, 2015
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventors: Masashi Kondo, Kuniaki Nakano, Shigetami Kasai, Hideki Shibuya
  • Patent number: 8945676
    Abstract: The invention relates to a method and an apparatus for coating one or more objects (1) by exposing an object (1) to alternately repeating surface reactions of two or more gaseous precursors. The apparatus comprises a reaction chamber (2, 40), means for forming at least one distinct precursor region inside the reaction chamber, and means for causing translational, essentially mechanically unsupported and unsuspended, motion of an object (1) inside the reaction chamber, relative to the reaction chamber, for bringing the surface of the object (1) into contact with a gaseous precursor, the means for causing the translational motion comprising means for moving the object (1) essentially through the at least one distinct precursor region inside the reaction chamber.
    Type: Grant
    Filed: March 25, 2010
    Date of Patent: February 3, 2015
    Assignee: Beneq Oy
    Inventor: Jarmo Maula
  • Patent number: 8889224
    Abstract: A method for forming a parylene film is provided, which includes following steps. Providing a chemical vapor deposition apparatus including a buffer chamber having first and second valves and a rotative carrying apparatus, an evaporator connected with the second valve, a pyrolysis chamber connected with the evaporator, and a deposition chamber connected with the pyrolysis chamber. Placing a parylene material in the rotative carrying apparatus of the buffer chamber through the first valve. Turning off the first and second valves and balancing a pressure in the buffer chamber and a pressure in the evaporator. Turning on the second valve and delivering the parylene material into the evaporator. Evaporating the parylene material in the evaporator to form a parylene gas. Pyrolyzing the parylene gas in the pyrolysis chamber to form a parylene monomer. Delivering the parylene monomer to the deposition chamber for deposition so as to form a parylene film.
    Type: Grant
    Filed: September 6, 2010
    Date of Patent: November 18, 2014
    Assignee: Industrial Technology Research institute
    Inventors: Chun-Hao Chang, Chuan-Sheng Zhuang
  • Publication number: 20140322527
    Abstract: A multilayer encapsulation thin-film and a method and apparatus for preparing a multilayer encapsulation thin-film are provided. The multilayer encapsulation thin-film includes an inorganic thin film that includes a metal oxide, and an organic thin film that includes a polymer and is formed on the inorganic thin film, where the inorganic thin film and the organic thin film are alternately stacked in multiple layers.
    Type: Application
    Filed: April 24, 2014
    Publication date: October 30, 2014
    Applicant: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Sungmin Cho, Ho Kyoon Chung, Heeyeop Chae, Sang Joon Seo, Seung Woo Seo
  • Patent number: 8815341
    Abstract: Processes for growing carbon nanotubes on carbon fiber substrates are described herein. The processes can include depositing a catalyst precursor on a carbon fiber substrate, optionally depositing a non-catalytic material on the carbon fiber substrate, and after depositing the catalyst precursor and the optional non-catalytic material, exposing the carbon fiber substrate to carbon nanotube growth conditions so as to grow carbon nanotubes thereon. The carbon nanotube growth conditions can convert the catalyst precursor into a catalyst that is operable for growing carbon nanotubes. The carbon fiber substrate can remain stationary or be transported while the carbon nanotubes are being grown. Optionally, the carbon fiber substrates can include a barrier coating and/or be free of a sizing agent. Carbon fiber substrates having carbon nanotubes grown thereon are also described.
    Type: Grant
    Filed: September 13, 2011
    Date of Patent: August 26, 2014
    Assignee: Applied NanoStructured Solutions, LLC
    Inventors: Brandon K. Malet, Tushar K. Shah
  • Patent number: 8808793
    Abstract: A method comprising introducing a workpiece support into a chamber of an apparatus. The workpiece support is for supporting thereon a plurality of workpieces. The apparatus comprising: the chamber having an interior space configured to be maintained at a pressure below atmospheric pressure; a vapor source for supplying the interior space of the chamber with a linearly extending stream of lubricant vapor; the workpiece support for supporting thereon a plurality of workpieces with surfaces facing the vapor source; and a conveyor for continuously moving the workpiece support transversely past the linearly extending stream of lubricant vapor from the vapor source. The method also comprising continuously moving the workpiece support with the plurality of workpieces supported thereon transversely past the linearly extending stream of lubricant vapor from the vapor source and depositing a uniform thickness film of the lubricant on at least one surface of each of the plurality of workpieces.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: August 19, 2014
    Assignee: Seagate Technology LLC
    Inventor: Paul Stephen McLeod
  • Publication number: 20140220248
    Abstract: A method for surface treating a carbon-containing material in which carbon-containing material is reacted with decomposing ozone in a reactor (e.g., a hollow tube reactor), wherein a concentration of ozone is maintained throughout the reactor by appropriate selection of at least processing temperature, gas stream flow rate, reactor dimensions, ozone concentration entering the reactor, and position of one or more ozone inlets (ports) in the reactor, wherein the method produces a surface-oxidized carbon or carbon-containing material, preferably having a surface atomic oxygen content of at least 15%. The resulting surface-oxidized carbon material and solid composites made therefrom are also described.
    Type: Application
    Filed: April 8, 2014
    Publication date: August 7, 2014
    Applicant: UT-Battelle, LLC
    Inventors: Felix Leonard Paulauskas, Soydan Ozcan, Amit K. Naskar
  • Publication number: 20140206137
    Abstract: A process for depositing a thin film material on a substrate is disclosed, comprising simultaneously directing a series of gas flows from the output face of a delivery head of a thin film deposition system toward the surface of a substrate, and wherein the series of gas flows comprises at least a first reactive gaseous material, an inert purge gas, and a second reactive gaseous material, wherein the first reactive gaseous material is capable of reacting with a substrate surface treated with the second reactive gaseous material, wherein one or more of the gas flows provides a pressure that at least contributes to the separation of the surface of the substrate from the face of the delivery head. A system capable of carrying out such a process is also disclosed.
    Type: Application
    Filed: January 23, 2013
    Publication date: July 24, 2014
    Inventors: David H. Levy, Roger S. Kerr, Jeffrey T. Carey
  • Patent number: 8784937
    Abstract: Methods for growing carbon nanotubes on glass substrates, particularly glass fiber substrates, are described herein. The methods can include depositing a catalytic material or a catalyst precursor on a glass substrate; depositing a non-catalytic material on the glass substrate prior to, after, or concurrently with the catalytic material or catalyst precursor; and exposing the glass substrate to carbon nanotube growth conditions so as to grow carbon nanotubes thereon. The glass substrate, particularly a glass fiber substrate, can be transported while the carbon nanotubes are being grown thereon. Catalyst precursors can be converted into a catalyst when exposed to carbon nanotube growth conditions. The catalytic material or catalyst precursor and the non-catalytic material can be deposited from a solution containing water as a solvent. Illustrative deposition techniques include, for example, spray coating and dip coating.
    Type: Grant
    Filed: September 12, 2011
    Date of Patent: July 22, 2014
    Assignee: Applied NanoStructured Solutions, LLC
    Inventors: Brandon K. Malet, Tushar K. Shah
  • Patent number: 8771791
    Abstract: Atomic layer deposition is performed by reciprocating a susceptor in two directions, subjecting a substrate on the susceptor to two different sequences of processes. By subjecting the susceptor to different sequences of processes, the substrate undergoes different processes that otherwise would have required an additional set of injectors or reactors. The reduced number of injectors or reactors enables a more compact deposition device, and reduces the cost associated with the deposition device.
    Type: Grant
    Filed: October 13, 2011
    Date of Patent: July 8, 2014
    Assignee: Veeco ALD Inc.
    Inventors: Sang In Lee, Chang Wan Hwang
  • Publication number: 20140170319
    Abstract: An injector for forming films respectively on a stack of wafers is provided. The injector includes a plurality of hole structures. Every adjacent two of the wafers have therebetween a wafer spacing, and each of the wafers has a working surface. The hole structures respectively correspond to the respective wafer spacings. The working surface and a respective hole structure have therebetween a parallel distance. The parallel distance is larger than a half of the wafer spacing. A wafer processing apparatus and a method for forming films respectively on a stack of wafers are also provided.
    Type: Application
    Filed: December 14, 2012
    Publication date: June 19, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventor: Taiwan Semiconductor Manufacturing Company, Ltd.
  • Patent number: 8728575
    Abstract: A method for synthesizing a thin film, the method containing the steps of: (a) providing a substrate support assembly containing at least two selectively interdigitable substrate support fixtures; (b) loading a substrate for thin film synthesis onto said at least two fixtures; (c) interdigitating said at least two fixtures; (d) positioning said at least two fixtures in a reaction chamber and forming a thin film on a surface of the substrate; and (e) unloading the substrate from said at least two fixtures.
    Type: Grant
    Filed: May 18, 2012
    Date of Patent: May 20, 2014
    Inventors: Xuesong Li, Yu-Ming Lin, Chun-Yung Sung
  • Publication number: 20140134332
    Abstract: A method and apparatus to evenly distribute gas over a wafer in batch processing. Several techniques are disclosed, such as, but not limited to, angling an injector to distribute gas towards a proximate edge of the wafer, and/or reducing the amount of overlap in the center of the wafer of gas from subsequent gas injections.
    Type: Application
    Filed: November 15, 2012
    Publication date: May 15, 2014
    Applicant: Spansion LLC
    Inventor: Rinji SUGINO
  • Patent number: 8709539
    Abstract: A process and an apparatus for producing a composite material utilize a rotatable hollow body that is inclined with an upstream side being higher than a downstream side. A reaction zone is defined within an elongated chamber in the hollow body. Protrusions inwardly extend from an inner peripheral wall of the hollow body adjacent to the reaction zone. Base material is input into the chamber via a base material introduction port and a carbon source vapor is input into the chamber via a carbon source supply port. A heater heats the reaction zone to a temperature at which carbon nanotubes form on the base material from the carbon source vapor. The protrusions catch base material disposed on the inner peripheral wall of the hollow body when the hollow body rotates and then drop the base material through the reaction zone so that the base material contacts the carbon source vapor.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: April 29, 2014
    Assignees: Meijo University, Meijo Nano Carbon Co., Ltd., Masuoka Ceramic Materials Co., Ltd.
    Inventors: Yoshinori Ando, Mukul Kumar, Takeshi Hashimoto, Norio Kurauchi, Hirotaka Masuoka, Akira Kagohashi
  • Patent number: 8697175
    Abstract: The present invention consists of an implantable structural element for in vivo delivery of bioactive active agents to a situs in a body. The implantable structural element may be configured as an implantable prosthesis, such as an endoluminal stent, cardiac valve, osteal implant or the like, which serves a dual function of being prosthetic and a carrier for a bioactive agent. Alternatively, the implantable structural element may simply be an implantable article that serves the single function of acting as a time-release carrier for the bioactive agent.
    Type: Grant
    Filed: March 5, 2012
    Date of Patent: April 15, 2014
    Assignee: Advanced Bio Prosthetic Surfaces, Ltd., a wholly owned subsidiary of Palmaz Scientific, Inc.
    Inventor: Christopher T. Boyle
  • Patent number: 8691339
    Abstract: A method of forming a film on a substrate includes depositing first and second evaporating source materials respective from first and second evaporating sources onto the substrate while moving the evaporating sources together with respect to the substrate, the first and second evaporating source materials being different from each other and positioned to provide a non-overlapping deposition region of the first evaporating source material, an overlapping deposition region of the first and second evaporating source materials and a non-overlapping deposition region of the second source material such that when the evaporating sources are moved, a film is formed to include a first layer that is a deposition of only the first evaporating source material, a second layer that is a deposition of a mixture of the first evaporating source material and the second evaporating source material and a third layer that is a deposition of only the second source material.
    Type: Grant
    Filed: September 17, 2013
    Date of Patent: April 8, 2014
    Assignee: Samsung Display Co., Ltd.
    Inventors: Ji-Hwan Yoon, Kwan-Hee Lee, Jae-Hyun Kwak, Dong-Hun Kim, Min-Seung Chun, Jung-Ha Son
  • Patent number: 8673396
    Abstract: A method of continuously forming a thin film includes the step of: moving a glass substrate with a thin strip shape having a constant db/2(d+b), where d is a thickness thereof and b is a width thereof in a cross section thereof, within a range from 0.015 to 0.15 through a film depositing region in which a reaction gas is supplied and a temperature is controlled to be high so that the glass substrate is rapidly heated; and moving continuously the glass substrate, immediately after the film depositing region, to pass through a cooling region in which a temperature is lower than that of the film depositing region, so that the glass substrate is rapidly cooled and the thin film formed of a component of the reaction gas is formed on the glass substrate.
    Type: Grant
    Filed: September 11, 2008
    Date of Patent: March 18, 2014
    Assignee: Furukawa Electric Co., Ltd.
    Inventors: Toshihiro Nakamura, Sadayuki Toda, Hisashi Koaizawa
  • Publication number: 20140072711
    Abstract: A system for reel-to-reel deposition of material onto flexible materials includes a reaction chamber, a feed reel arranged in the reaction chamber, the feed reel configured to support at least one continuous length of flexible material, a receiving reel arranged in the reaction chamber separate from the feed reel, the receiving reel configured to receive the flexible material, and at least one deposition target arranged in the reaction chamber, the deposition target configured to release vaporized target material for deposition onto surfaces of the flexible material.
    Type: Application
    Filed: September 7, 2012
    Publication date: March 13, 2014
    Applicant: Apple Inc.
    Inventors: Ian F. Davison, Mark S. Belluscio, Kurt R. Stiehl
  • Patent number: 8657959
    Abstract: An apparatus for atomic layer deposition of a material on a moving substrate comprises a conveying arrangement for moving a substrate along a predetermined planar or curved path of travel and a coating bar having at least one precursor delivery channel. The precursor delivery channel conducts a fluid containing a material to be deposited on a substrate toward the path of travel. When in use, a substrate movable along the path of travel defines a gap between the outlet end of the precursor delivery channel and the substrate. The gap defines an impedance Zg to a flow of fluid from the precursor delivery channel. A flow restrictor is disposed within the precursor delivery channel that presents a predetermined impedance Zfc to the flow therethrough. The restrictor is sized such that the impedance Zfc is at least five (5) times, and more preferably at least fifteen (15) times, the impedance Zg. The impedance Zfc has a friction factor f.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: February 25, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Geoffrey Nunes, Richard Dale Kinard
  • Publication number: 20140037846
    Abstract: Heating of precursor before exposing the substrate to the precursor for depositing material on the substrate using a deposition method (e.g., ALD, MLD or CVD). A reactor for injecting precursor onto the substrate includes a heater placed in a path between a channel connected to a source of the precursor and a reaction chamber of the reactor. As the precursor passes the heater, the precursor is heated to a temperature conducive to the deposition process. Alternatively or in addition to the heater, the reactor may inject a heated gas that mixes with the precursor to increase the temperature of the precursor before exposing the substrate to the precursor.
    Type: Application
    Filed: July 16, 2013
    Publication date: February 6, 2014
    Inventors: Sang In Lee, Il Song Lee
  • Publication number: 20140030445
    Abstract: Apparatus for atomic layer deposition on a surface of a sheeted substrate, comprising: an injector head comprising a deposition space provided with a precursor supply and a precursor drain; said supply and drain arranged for providing a precursor gas flow from the precursor supply via the deposition space to the precursor drain; the deposition space in use being bounded by the injector head and the substrate surface; a gas bearing comprising a bearing gas injector, arranged for injecting a bearing gas between the injector head and the substrate surface, the bearing gas thus forming a gas-bearing; a conveying system providing relative movement of the substrate and the injector head along a plane of the substrate to form a conveying plane along which the substrate is conveyed.
    Type: Application
    Filed: January 30, 2012
    Publication date: January 30, 2014
    Applicant: NEDERLANDSE ORGANISATIE VOOR TOEGEPAST- NATUURWETENSCHAPPELIJK ONDERZOEK TNO
    Inventors: Adrianus Johannes Petrus Maria Vermeer, Joseph Adrianus Maria De Swart, Robert Coenraad Wit
  • Publication number: 20140030435
    Abstract: Vacuum coating apparatus for coating a web includes a first rotatable coating drum and a second rotatable coating drum disposed parallel to the first drum with a gap formed between the first and the second coating drums for transporting at least one web. A first evaporator has at least one evaporation source for generating a first evaporation beam, wherein the first evaporator is arranged next to the first coating drum. A second evaporator has at least one evaporation source for generating a second evaporation beam, wherein the second evaporator is arranged next to the second coating drum. The first and the second evaporators are inclined relative to each other.
    Type: Application
    Filed: December 1, 2010
    Publication date: January 30, 2014
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Stefan Hein, Gerd Hoffmann
  • Patent number: 8628619
    Abstract: A plasma coating system includes at least one coating station with a first side and a second side defining a pathway with at least one bend. The coating station also includes a first plasma arc that provides a plasma jet directed towards a substrate. The first plasma arc is positioned on either the first side or the second side of the bend.
    Type: Grant
    Filed: December 16, 2009
    Date of Patent: January 14, 2014
    Assignee: Exatec LLC
    Inventor: Steven M. Gasworth
  • Publication number: 20140010958
    Abstract: The device for performing continuous deposition of a solid hydrogen and/or deuterium film includes a cell provided with a control valve for controlling the flowrate of the gas inlet to the cell, a strip, and means for moving the strip in the cell. The device includes a pumping device placing a volume of the cell, through which the strip passes, at a first pressure, and a heat exchanger arranging the strip in said volume at a first temperature. To adjust the pressure, the device further includes a control circuit of the pumping device and of the control valve, adjusting the first pressure so as to condense a solid hydrogen and/or deuterium film on the strip in movement in said volume.
    Type: Application
    Filed: July 5, 2013
    Publication date: January 9, 2014
    Inventor: Jean-Paul PERIN