Abstract: A method of removing a ceramic coating (18), and particularly zirconia-containing thermal barrier coating (TBC) materials such as yttria-stabilized zirconia (YSZ), that has been either intentionally or unintentionally deposited on the surface of a component (10). The method entails subjecting the ceramic coating (18) to an aqueous solution containing an acid fluoride salt, such as ammonium bifluoride (NH4HF2) or sodium bifluoride (NaHF2), and a corrosion inhibitor. The method is capable of completely removing the ceramic coating (18) without removing or damaging the underlying substrate material, which may include a metallic bond coat (16).

Abstract: A method for providing a waterborne, inorganic barrier coating to a polyolefin substrate is described. The method involves applying a primer composition containing a vinyl polymer, wherein at least 75% of the polymer repeat units contain side groups having hydroxyl moieties, to the substrate. This primer coating facilitates the application and binding of the subsequently applied barrier coating composition to the substrate.

Abstract: Surface and thereafter applying a priming coating comprising a polytetrafluoroethylene solution containing a dispersed ceramic filler, wherein the priming coating is dried in two steps by first air-drying the coating, followed by force drying at elevated temperatures, wherein a second polytetrafluoroethylene coating is applied on the dried primer coating, and a third polytetrafluoroethylene coating is applied on the second coating while the second coating has not dried. The coated bond tool is baked to cure the second and third coatings. Prior to application of the priming coating, the metallic tool can be subjected to pretreatment such as pre-baking and grit blasting.

Abstract: A process for spin-on coating with an organic material having a low dielectric constant, which is suitable for a substrate. A dielectric base layer capable of protecting metal is formed on the substrate, an adhesive promoter layer is formed on the dielectric base layer, and the adhesive promoter layer is baked. A solvent is then used to clean the substrate and simultaneously to dissolve a part of the adhesive promoter layer in order to flatten the adhesive promoter layer. Afterwards, a layer of an organic material with a low dielectric constant is spin-on coated on the adhesive promoter layer, and the layer of an organic material with a low dielectric constant is baked and cured.

Abstract: A process for preparing an old porcelain or ceramic substrate and refinishing with an epoxy coating top coat, where the old substrate is treated with an aqueous solution of citric acid prior to the step of coating with epoxy. In preferred aspects, the old substrate is treated with aqueous calcium carbonate solution prior to treating with the citric acid solution.

Abstract: Method for removing a portion of the binder phase from the surface of a substrate that is composed of particles of at least a first phase joined together by the binder phase, and wherein the surface is etched by contacting it with a gas flow of an etchant gas and a second gas. The second gas is one or more gases that will not react with the substrate or the removed binder phase and will not alter the oxidation state of the substrate during etching.

Abstract: A process for producing a coating on components having peripheries to be placed in direct contact with vaporous media. Such peripheries are wetted over part or all of their surface with a film of liquid when the vaporous media are changed from the vapor state into the liquid state by phase transition. Such films of liquid increase the thermal resistance, for example, of the components. In order to avoid such wetting, the peripheries of each component are roughened. A coat of a non-wettable, amorphous carbon is then applied to the peripheries, at least in regions thereof.

Abstract: A process for remanufacturing a charging member having at least two layers on a conductive support is described. The process involves carrying out mechanical abrasion to remove at least a surface layer of the charging member, followed by forming a layer thereon. Also, a charging member remanufactured by the process and a process cartridge having the hanging member are described.

Abstract: A ferrite magnetic film structure exhibiting a magnetic anisotropy, the ferrite magnetic film structure comprising, a substrate provided on one main surface thereof with a groove-like recessed portion and with a ridge-like projected portion located neighboring to the groove-like recessed portion, and a ferrite magnetic film constituted by a continuous film having a substantially flat upper surface and formed on one main surface of the substrate, wherein the ferrite magnetic film structure meets the following conditions: (a/(a+b))(h/(t−h))≧0.047 1≧(a+b) where “a” is a width of the ridge-like projected portion, b is a width of the groove-like recessed portion, h is a height of step between the groove-like recessed portion and the ridge-like projected portion, t is a thickness of the ferrite magnetic film at the recessed portion, and l is a length of the recessed portion and of the projected portion.

Abstract: The present invention aims to offer thermoplastic resin coated aluminum alloy sheet having excellent adhesion after forming, wherein the laminated thermoplastic resin layer will not peel off even when subjected to such severe forming as drawing, followed by stretch-forming, further followed by ironing. In order to achieve this, aluminum alloy sheet is treated with alkali solution by dipping into or spraying alkali solution, rinsed, treated with acid solution by dipping into or spraying acid solution so as to obtain a specific surface condition, and further laminated with thermoplastic resin with or without adhesive on both sides of the aluminum alloy sheet.

Abstract: A process for reclaiming aluminum alloy donor from a vapor phase deposition process used to form a diffusion aluminide coating on a component, such as the high-temperature superalloy components of gas turbine engines. The process generally entails recycling a particulate aluminum alloy donor material that, as a result of having been used as the donor material for depositing a diffusion aluminide coating on an article by vapor phase deposition, particles of the donor material comprise an aluminum alloy core encased in an aluminum-depleted shell. The process generally entails tumbling the donor material in a manner that removes the aluminum-depleted shell, followed by sieving the donor material to remove shell fragments and undersized particles.

Abstract: Substrate, at least part of at least one of the faces of which has a geometry which is optionally obtained by means of a coating and which differs from that of an ideal uniform, perfectly plane or even slightly curved, sheet, in that it has a bumps-and-hollows relief which can be defined by submicron sizes which, almost in their entirety, fall into at least two different classes, the respective representative values of which vary by a factor of at least 5 or of at most 1/5; applications of this substrate to anti-stain and anti-mist or anti-rain glazing; processes for preparing the substrate.

Abstract: To provide an aluminum alloy member having a high machinability while keeping a sufficient mechanical strength and a sufficient wear resistance, and a method of producing the aluminum alloy member. In an aluminum alloy member formed from an aluminum-silicon alloy by casting, eutectic silicon grains are exposed from at least part of an exposed plane of the aluminum alloy member. A coating layer having a thickness nearly equal to or thinner than a diameter of each of the eutectic silicon grains is formed on the exposed plane from which the eutectic silicon grains are exposed.

Abstract: A process used during manufacture of printed circuit boards comprises protecting metal pads and/or through-holes to provide a tarnish-resistant and solderable coating. In the method, the pads and/or through-holes are bright-etched, metal plated, preferably by an immersion process, and treated with a tarnish inhibitor. The tarnish inhibitor may be incorporated into the immersion plating bath. The metal plating is usually with silver or bismuth and the pads and/or through-holes comprise copper.

Abstract: This invention relates to a method of forming a substrate with preparing a surface capable of making a cocontinuous bond comprising the steps of 1) obtaining a copper or copper alloy substrate and 2) applying an etching composition which comprises (a) an acid, (b) an oxidizing agent, (c) a copper complexing agent, and (d) a copper complex, wherein the copper complex is present in an amount which precipitates when applied to the copper or copper alloy substrate. The method also includes the step of 3) treating the substrate with a coating composition and/or 4) applying a stripping composition to the substrate. The invention also relates to copper articles, having surface porosity, including multilayer articles such as printed circuit boards and compositions used in the method. The present invention provides microporous copper or copper alloy substrates which have improved adhesion properties to organic material.

Abstract: A method of depositing material on a substrate using a shadow mask. The mask includes a plurality of etched features which correspond to a plurality of features in the substrate. Spheres are provided in the features of the mask or substrate so that the mask and substrate are aligned when each of the spheres occupy both of the corresponding features in the mask and substrate.

Abstract: A process for coating a tungsten carbide base material substrate with CVD diamond film includes carburization and gas-assisted vaporization of cobalt from the surface with simultaneous recrystallization of surface grains of tungsten carbide to change their stoichiometry for improved adherence. Also disclosed is a WC—Co cutting tool having a relatively fine WC grain size and being coated with adherent CVD diamond.

Abstract: A combustion chamber component for an internal combustion engine has a water and oil repellent coating which has good adhesive power and in which the effect of suppressing the accumulation of deposits is well maintained. The coating is formed from an organosilicon compound represented by the formula Rf—R1—Si(NH)3/2 wherein Rf denotes a perfluoroalkyl group having 1 to 10 carbon atoms and R1 denotes a divalent hydrocarbon group having 2 to 10 carbon atoms.

Abstract: A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.

Abstract: The invention concerns a composite body consisting of a hard metal, cermet or ceramic substrate body and at least one layer of a mechanically resistant material, a ceramic substance, a diamond-like layer, amorphous carbon and/or hexagonal boron nitride. The invention also concerns a method of producing this composite body, wherein, when the green compact has been dewaxed, with its pores still open and whilst it continues to be heated as from a temperature of between 600° C. and 1100° C., it is acted upon by sublimable solids and/or reaction gases which are necessary for coating purposes. The temperature of the green compact is then further increased and the latter is fully compressed by sintering, before one or more layers of the above-mentioned type is/are applied.

Abstract: The invention relates to a method for corrosion-resistant coating of metal substrates by means of plasma polymerization, wherein the substrate is subjected to mechanical, chemical and/or electrochemical smoothing in a pre-treatment step and is subsequently exposed to a plasma at a temperature of less than 200° C. and at a pressure of 10−5 bis 100 mbars, whereby in a first step the surface is activated in a reducing plasma and in a second step the polymer is separated from a plasma containing at least one hydrocarbon or silico-organic compound which can be vaporized in plasma conditions, optionally contains oxygen, nitrogen or sulphur and can contain fluorine.

Abstract: A cured coated article and a process for making same includes coating a substrate, such as wood, plastic, high pressure laminates, ceramic or metal with a radiation curable top coat having UV protectable additives therein. The radiation curable top coat is subjected to a curing step which includes curing with either an electron beam, ultraviolet radiation or a combination thereof. A sublimatable ink may be transferred into the top coat.

Abstract: A method of removing a ceramic coating, such as a thermal barrier coating (TBC) of yttria-stabilized zirconia (YSZ), from the surface of a component, such as a gas turbine engine component. The method generally entails subjecting the ceramic coating to an aqueous solution of ammonium bifluoride, optionally containing a wetting agent, such as by immersing the component in the solution while maintained at an elevated temperature. Using the method of the invention, a ceramic coating can be completely removed from the component and any cooling holes, with essentially no degradation of the bond coat.

Abstract: Improved autodeposited coatings on metallic surfaces are formed by contacting the metallic surfaces with an autodepositing composition comprising an acidic aqueous coating solution containing dispersed solid resin particles or either an internally stabilized or externally stabilized vinylidene chloride polymer, an exemplary internally stabilized polymer being prepared from vinylidene chloride and a monomeric surfactant which includes an inorganic ionizable group, and an exemplary externally stabilized polymer being prepared from vinylidene chloride and a reactive comonomer, the resulting resin particles having surfactant adsorbed thereon, said autodeposited coatings having extremely good corrosion resistant properties without treatment with a reaction rinse such as a chromium rinse.

Abstract: Method for removing a portion of the binder phase from the surface of a substrate that is composed of particles of at least a first phase joined together by the binder phase, and wherein the surface is etched by contacting it with a gas flow of an etchant gas and a second gas. The second gas is one or more gases that will not react with the substrate or the removed binder phase and will not alter the oxidation state of the substrate during etching.

Abstract: A method is provided for depositing an amorphous silicon thin film on a substrate. The method is carried out in a reactor chamber and can be a LPCVD, PECVD or RTCVD process. The method comprises introducing a gas species into the reactor chamber for a time sufficient to dehydrate the substrate and to form a thin layer of silicon on the substrate. Following formation of the thin layer of silicon, a dopant gas is introduced into the reactor chamber to form the doped silicon thin film. The temperature and pressure within the chamber is set to minimize formation of surface irregularities or pits within the thin amorphous silicon layer.

Abstract: The invention relates to a method for aluminum nitride coating of cylinder contact surfaces (ZL) of a crankcase (KG) made of an aluminum basic alloy where the aluminum nitride coating is performed by surface nitriding of the aluminum basic alloy, and the activated nitrogen is generated by a high-pressure plasma process.

Abstract: A plated product and apparatus for forming recesses or grooves on material to be plated to produce such a product. The product includes material having a surface having many recesses, each having an opening of size d, where d is in the range 5-100 microns, a depth in the range from 0.2 d to d, or many grooves. In preferred embodiments, each groove or recess has an anchor portion. In some embodiments, each groove has a ridge portion at each of both edges of its opening. The angle of each groove to the surface of the material and each groove's depth and opening width are preferably in specified ranges. When the material is plated, part of the thin metal film enters the anchor portions of its grooves or recesses, so that the plated metal has superior capacity to resist peeling off of the plated metal.

Abstract: The invention includes methods of treating sodalime glass surfaces for deposition of silicon nitride and methods of forming field emission display devices. In one aspect, the invention includes a method of treating a sodalime glass surface for deposition of silicon nitride comprising: a) cleaning a surface of the glass with detergent; and b) contacting the cleaned surface with a solution comprising a strong oxidant to remove non-silicon-dioxide materials from the surface and from a zone underlying and proximate the surface.

Abstract: A projection having a micro-aperture is formed by formiNg a dent having a pointed front end on a substrate, then depositing a light blocking material on the substrate except the front end of the dent, and peeling off the light blocking material from the substrate. The projection is suited as an optical probe of scanning near-field optical microscope (SNOM) for detecting or emitting light through the micro-aperture. For this purpose, the projection is formed on the end of a cantilever or on the end of an optical fiber. The dent having a pointed front end can be formed typically by patterned crystal-axis-anisotropic etching of a silicon substrate and subsequent thermal oxidation of the silicon surface.

Abstract: A process of applying an inorganic coating to an electrically conducting body, in particular a metallic workpiece, is characterized with respect to a precisely controllable temperature variation with short temperature changes in an economical and energy-saving operation in that the body first undergoes a preparation. Thereafter, if need be, the body is degreased and/or chemically pretreated and/or blasted. Subsequently, a coating medium is applied to at least the surface region of the body being coated. Then, at least the surface region of the body being coated is heated by induction to a reaction temperature before and/or while and/or after applying the coating medium. Finally, the coating medium is fully reacted to a coating, whereupon the body undergoes a cooling.

Abstract: The invention provides a nanotechnology process for implant surface treatment for producing an implant article. The nanotechnology process comprises subjecting a non-porous material to a mechanical or chemical surface treatment until a surface roughness with an average peak distance (Ra value) between 10 and 1,000 nm is obtained. The roughened surface can subsequently be subjected to precipitation of calcium phosphate from a solution containing calcium and phosphate ions.

Abstract: A metal substrate is treated with a plurality of rotating brushes and a slurry of particulate material such that the treated surface is capable of absorbing incident infrared laser radiation. The substrate is itself capable of being visibly imaged by selective writing with an infrared laser. The substrate is coated with an ablatable coating which is transparent to the imaging infrared laser radiation. Selective exposure to infrared laser radiation ablates this coating in the laser exposed areas as a result of the absorption of infrared radiation by the substrate. The substrate can be anodized after rotary brush graining and still retain its ability to be imaged and ablate a coating. The coated article can be imaged in a computer-to-plate infrared laser imaging device. Depending on the specific coating and substrate selection, the imaged article can be used in a conventional lithographic printing process or in a dryographic printing process.

Abstract: A process for forming a refractory metal thin film on a substrate by subjecting a gaseous mixture containing a halide of a refractory metal and the hydrogen gas to a plasma chemical vapor deposition, comprising the step of adjusting a mixing ratio of the halide of the refractory metal to the hydrogen gas to a relatively small value at an initial stage of the process and, subsequent to the initial stage of the process, adjusting the mixing ratio of the halide of the refractory metal to the hydrogen gas to a relatively large value.

Abstract: The invention provides an implantable device coated with a layer of calcium phosphate and optionally one or more biologically active substances such as growth factors, lipis, (lipo)polysaccharides, hormones, proteins, antibiotics or cytostatics. The device can be obtained by a nanotechnology process comprising subjecting a substrate to a surface treatment until a surface roughness with an average peak distance (Ra value) between 10 and 1,000 nm and subjecting the roughened surface to precipitation of calcium phosphate from a solution containing calcium and phosphate ions with optional coprepitation of the biologically active substance.

Abstract: A method for modifying a substrate surface, including the step of applying a high density plasma to the substrate surface in the presence of a hydrofluorocarbon gas and a carrier gas to form an antiwetting layer on the substrate surface. Optionally, the method including a cleaning step of contacting the slider surface with a carrier gas for a period of time effective to clean the surface.

Abstract: An intermetallic bond between a ferrous metal and a non-ferrous metal wherein an intermetallic bond layer that is substantially free of graphic inclusions joins the two. The graphite is effectively eliminated from the bond layer by either removing it from the ferrous metal or by sealing it off from the bond layer. Graphite removal may be accomplished in a variety of ways, including electrochemical cleaning and laser surface treatment. Alternatively, the graphite may be prevented from incursing into the bond region by sealing it off with a layer of metal, such as a chromium plating, that prevents it from penetrating through the bond layer and into the non-ferrous metal.

Abstract: A method is described for the selective deposition of bismuth based ferroelectric films by selective chemical vapor deposition on a substrate. Selectivity in the deposition process is attained by selection of substrate-precursor combinations which assure high bismuth deposition efficiency in certain areas and low bismuth deposition efficiency in other areas in combination with specific process parameters.

Abstract: A method of fabricating a micromachine includes the step of constructing a low surface energy film on the micromachine. The micromachine is then rinsed with a rinse liquid that has a high surface energy, relative to the low surface energy film, to produce a contact angle of greater than 90.degree. between the low surface energy film and the rinse liquid. This relatively large contact angle causes any rinse liquid on the micromachine to be displaced from the micromachine when the micromachine is removed from the rinse liquid. In other words, the micromachine is dried by dewetting from a liquid-based process. Thus, a separate evaporative drying step is not required, as the micromachine is removed from the liquid-based process in a dry state. The relatively large contact angle also operates to prevent attractive capillary forces between micromachine components, thereby preventing contact and adhesion between adjacent microstructure surfaces.

Abstract: The present invention provides a method of manufacturing a superhard article with diamond coat having an excellent resistance against breakaway or peeling off of its coat, in particular, a cutting tool. A carbide base material formed to a desired shape containing tungsten carbide (WC) as a main component is soaked in a solution of alkali chloride and undergoes electrolytic etching on the surface of the base material at a maximum removal speed of 0.2 to 1.5 .mu.m/min for 3 to 30 minutes and, after the surface of the base material is washed, a diamond coat is developed on the surface of the base material by vapor deposition.

Abstract: A method for coating a sintered metal carbide substrate with a diamond film is disclosed, which comprises subjecting the substrate to a selective tungsten carbide etching step; subjecting the substrate to a selective Co etching step; and subsequently coating a desired section of the substrate with the diamond film, and where after completion of the selective tungsten carbide etching step and prior to diamond coating the substrate is nucleated with diamond powder through friction contact.

Abstract: LPD (Liquid Phase Oxide Deposition) technology is a newly developed approach to deposit SiO.sub.2 on silicon wafers. LPD-SO.sub.2 film was deposited by immersing the wafer in hydrofluosilicic acid (H.sub.2 SiF.sub.6) solution supersaturated with silica gel at low temperature (about 40.degree. C.). LPD-SiO.sub.2, also the deformation of wafers is avoided so the method can be applied to the fabrication of integrated circuits. Moreover, this method has high potential to replace the CVD-SiO.sub.2. However, it is very hard to deposit LPD-SiO.sub.2 on very clean silicon wafer (e.g., without any oxide) because of no nucleation seed. In this study, the LPD-SiO.sub.2 was deposited on silicon wafer with a plasma-enhanced chemical vapor deposition oxide, a thermal oxide, an atmospheric pressure chemical vapor deposition oxide, and a nitric acid pretreatment oxide. The nitric acid pretreatment enhances the LPD-SiO.sub.2 growth rate and reduce the stress in the LPD-SiO.sub.2 film.

Abstract: A silica coated substrate comprises a substrate having a zinc containing surface. A plasma polymerized coating is adhered to the surface. The coating consists essentially of silicon and oxygen and contains minimal amounts of carbon.

Abstract: A method of preparing electrodes is now described, which electrodes have enhanced adhesion of subsequently applied coatings combined with excellent coating service life. In the method, a substrate metal, such as a valve metal as represented by titanium, is provided with a highly desirable rough surface characteristic for subsequent coating application. This can be achieved by various operations including etching to ensure a roughened surface morphology. In subsequent operations, a barrier layer is provided on the surface of enhanced morphology. This may be achieved by operations including heating, as well as including thermal decomposition of a layer precursor. Subsequent coatings provide enhanced lifetime even in the most rugged commercial environments.

Abstract: A wet chemical process is provided for treating an emitter formed on a substrate of a field emission display, the process comprises applying a solution including hydrogen to the emitter. In one embodiment of the invention, the steps of applying a solution comprises applying a solution of hydrofluoric acid to the emitter.

Abstract: In a method and an appratus for a thin film growth on a semiconductor crystal substrate, impurities and contaminants absorbed on the inside wall of the reaction vessel are very harmful because these impurities and contaminants will deteriorate the quality of the thin film. A method and an apparatus by which the quantity of these impurities and contaminants absorbed on the inside wall of the reaction vessel can be restrained and removed easily are disclosed in this invention, wherein a semiconductor crystal substrate is mounted in the reaction vessel, and the wall of the reation vessel is cooled forcibly by a coolant while the substrate is under heating procedure to grow a thin film on the substrate by supplying the raw material gas into the reaction vessel. And the temperature of the wall of the reaction vessel during the procedure except the thin film growth is kept higher temperature than the temprature of the wall of the reaction vessel during the thin film growth procedure.

Abstract: In a method for the manufacture of a coating on a grinding tool, a rough diamond layer (8, 10) is produced as an abrasive layer on the surface (2) of the body (1) of the grinding tool by vapor-phase deposition. This diamond layer is deposited on the grinding tool by the Hot Filament Chemical Vapor Deposition (HF-CVD) process.

Abstract: Method is provided for forming CVD nano diamond films for use as cold cathodes in microelectronic devices. Conditions for forming the film outside the plasma region between the cathode and a grid anode are disclosed. Heating of the grid anode makes possible a combination of glow discharge and hot filament deposition.

Abstract: Weathered reef-building coral is immersed in an aqueous alkali solution under reduced pressure to carry out alkali washing to make the aqueous alkali solution penetrate into the weathered reef-building coral throughout its fine structure inside the porous tissue, which is subsequently washed with water until a washing from the inside of the porous tissue is neutralized.As a result of this washing, various marine algae, various microorganisms including Vibrio bacteria inhabiting the ocean and other various organic substances held in the inner fine structure of weathered reef-building coral can be removed. Thus, a weathered reef-building coral material can be obtained whose safety has been ensured. This weathered reef-building coral material is suitable for food materials, filter mediums for water purifiers and so forth.

Abstract: The invention is concerned with a reduction of the surface roughness of titanium-aluminum-nitride hard material layers produced by the combined cathodic arc discharge vaporization process and the imbalanced magnetron coating process (ABS method) or by the pure cathodic arc discharge vaporization process.