Abstract: Disclosed is a process for cleaning silicon surfaces of native oxide films. The process utilizes fluorine containing cleaning materials such as anhydrous hydrofluoric acid to clean the oxide from the surface. A fluorine containing particulate matter which forms on the surface as a result of the fluorine containing cleaning materials is then removed by heating the surface to a high temperature. The process is conducted in a non-oxidizing ambient and is preferably conducted in a cluster tool so that the heating step can take place in the same chamber of the cluster tool as later metal deposition step.

Abstract: The present invention relates to a method of improving the durability of water-repellent films deposited on the surface of a substrate and to a coated article having a water-repellent film of improved durability deposited on the substrate surface. The method includes the steps of simultaneously abrasively and chemically preparing the surface to expose an increased number of bonding sites on the substrate surface by applying a dispersion including an acid solution and an abrasive material to the surface. The dispersion is then removed and the water-repellent film is formed over the prepared surface. The bonding sites react with the water-repellent film to more effectively bond the film to the substrate and thereby improve the durability of the water-repellent film.

Abstract: A method for forming a metal gate (20) structure begins by providing a semiconductor substrate (12). The semiconductor substrate (12) is cleaned to reduce trap sites. A nitrided layer (14) having a thickness of less than approximately 20 Angstroms is formed over the substrate (12). This nitrided layer prevents the formation of an oxide at the substrate interface and has a dielectric constant greater than 3.9. After the formation of the nitrided layer(14), a metal oxide layer (16) having a permittivity value of greater than roughly 8.0 is formed over the nitrided layer (14). A metal gate (20) is formed over the nitrided layer whereby the remaining composite gate dielectric (14 and 16) has a larger physical thickness but a high-performance equivalent oxide thickness (EOT).

Abstract: A method is described for the nucleation controlled deposition of ferroelectric thin films by chemical vapor deposition in a novel processing sequence wherein a higher density of bismuth nucleation sites is achieved either by the use of a substrate member which has been treated in a manner to yield a controllably and reproducible rough surface on which SBT films with excellent properties may be produced or by using a chemically modified substrate surface upon which surface chemical properties are modified. Typical techniques for achieving surface roughening include reactive ion etching, inert ion milling and chemical mechanical polishing, each of which may be used to delineate patterned bottom electrodes. The chemical properties of the substrate may be modified by alloy deposition, deposition of seed layers which are then partially or completely in-diffused ion implantation with or without heat treatment and changing the chemistry of the surface by a pre-exposure to chemical agents prior to deposition.

Abstract: The leading edge of a lower pole is constituted by a protruded central parallel portion, opposite end parallel portions, and slanted portions coupling the central parallel portion and the opposite end parallel portions. The width T.sub.wc of the central parallel portion is set to 10 to 25% of the total width T.sub.wa of the lower pole. The thickness P1' of the opposite end portion is set in the range from 1/3 or thicker to 2/3 or thinner than the thickness P19 of the central parallel portion.

Abstract: The process for preparing ceramic powder having a core-shell structure by dissolving a crystalline ceramic powder in water so as to leave a core portion of the ceramic powder while heating; depositing a component of the ceramic powder dissolved in the water on and around surfaces of the core portion thereof as a deposited material from the water by gradually cooling the ceramic powder and the water obtained in the step of dissolving; and firing a mixture of the ceramic powder obtained in the step of depositing with an additive at a high temperature to subject the deposited material and the additive to solid phase reaction to form a shell portion on and around the core portion of the ceramic powder. The process can produce the ceramic powder having a core-shell structure from a crystalline ceramic powder, thereby achieving high electrical and mechanical features when formed into ceramic electronic parts.

Abstract: A metallic composite solid, containing alloys and/or intermetallics, is formed by compacting at moderate pressure a mixture of powder particles, foils or sheets at a temperature close to room temperature, well below the melting temperature of the constituent components and without the addition of low melting metals such as mercury, indium or gallium acting as a sintering agent. This low temperature consolidation of the powder mixture is enhanced by having the surface oxide of the powder particles removed, prior to consolidation, and/or by coating the particles with an oxide-replacing metal such as silver or gold. The coating process may be replacement reactions, autocatalytic reduction or electrolytic reduction. The composite formation is assisted by the addition of a liquid acid such as fluoroboric acid, sulfuric acid, fluoric acid, adipic acid, ascorbic acid, or nitric acid.

Abstract: The present invention discloses a method of sintering of cemented carbide or cermet bodies lying on graphite trays. By using graphite trays coated with a covering layer of Y.sub.2 O.sub.3 containing .ltoreq.20 wt-% ZrO.sub.2, or corresponding volumetric amount of other refractory oxides, e.g., Al.sub.2 O.sub.3 or combinations thereof, with an average thickness of .gtoreq.10 .mu.m, the life of the trays between regrindings and recoatings can be largely extended.

Abstract: A titanium/titanium nitride film stack can be formed with reduced amounts of impurity by depositing onto a substrate a film of titanium using plasma-enhanced chemical vapor deposition of titanium tetrachloride and hydrogen. This film is then subjected to a hydrogen/argon plasma which significantly reduces the chlorine content of the titanium film. The titanium film can then be subjected to an ammonia plasma which will form a thin layer of titanium nitride which is then coated with a thick layer of titanium nitride using plasma-enhanced chemical vapor deposition of titanium tetrachloride and ammonia. The hydrogen/argon anneal significantly reduces the chlorine content of the titanium film and thus the chlorine content at the titanium substrate interface, particularly when the substrate contains aluminum. This enhances the overall reliability of the formed product.

Abstract: Methods of treating wafers for analyzing defects present therein comprise providing wafers having front side surfaces comprising defective portions and a back side surfaces opposite thereto; and decorating the defective portion of the front side of the wafer with copper.

Abstract: The present invention relates to improving the durability of water repellent films and a method for providing the film on a substrate. The water repellent film is preferably formed over the substrate by applying a water repellent composition Over the substrate which will form the water repellent film. The durability of the water repellency of the film is improved by activating the substrate with an acid prior to forming the water repellent film over the substrate.

Abstract: A method of manufacturing a semiconductor device is provided superior in planarization, crack resistance, and moisture resistance, and with no corrosion in wiring while the manufacturing cost is suppressed without increasing the number of manufacturing steps in forming an interlayer film therein. This method includes the step of forming a silicon oxide film on a substrate so as to cover a first wiring formed with a silicon oxide film therebetween. A thick-film inorganic SOG film is coated on the silicon oxide film, and then a thermal treatment is applied. Next, a silicon oxide film is formed, and a via hole is formed according to a predetermined mask. By carrying out a thermal treatment at the temperature of 150.about.550.degree. C. and at the pressure of not more than 10.sup.-3 Torr with a portion of the thick-film inorganic SOG film exposed at a side surface of the via hole, residual gas such as CO.sub.2, and H.sub.2 O adsorbed to the side surface of the via hole is released.

Abstract: To promote the characteristic of an interface between a gate insulating film and a semiconductor and control the threshold voltage, in forming the insulating film, a surface on which the insulating film is to be formed is previously exposed to activated oxygen and thereafter, the insulating film is formed on the surface, or in steps of manufacturing a thin film transistor, the insulating film is formed with monosilane, dinitrogen monoxide and oxygen as raw materials.

Abstract: In general terms, the method of the present invention is one for providing an anodic coating to a member having a metal surface being subject to oxidation. In broadest terms, the method comprises the steps of: (a) obtaining a member having a ferrous metal surface (i.e. the term "ferrous" intended as meaning containing iron without regard to oxidation state), the metal surface having one or more layer(s) of oxidized metal; (b) removing the layer(s) of oxidized metal from the ferrous metal surface; and (c) depositing one or more layer(s) of an emeraldine base polyaniline polymer onto the ferrous metal surface.

Abstract: A rf plasma enhanced chemical vapor deposition process is presented, wherein a precursor gas stream having a high helium content produces hard, wear resistant, hermetically sealing, high refractive index Diamond-Like-Carbon (DLC) coatings on numerous substrates at deposition rates of at least 0.4 .mu.m/hr. Internal pressures of 1 to 10 Torr and radio frequencies no higher than 100 kHz are employed. The process may be applied to both batch and linear production methods. Linear products such as optical fibers, capillary tubing, wires, and sheets can be coated in-line while minimizing the introduction of flaws on their surfaces and minimizing exacerbation of any pre-existing flaws. The effects of surface flaws can be minimized further by introducing a helium etch of the substrate surface prior to exposure to the DLC coating precursor gas mixture.

Abstract: The substrate of a magnetic recording medium is laser textured with uniformity and precision employing a fiber optic laser delivery system to form a laser textured landing zone and a laser textured decoupled data zone. A continuous wave laser light beam is split into first and second continuous wave laser light sub-beams. The first continuous laser light sub-beam is impinged on a rotating substrate surface through a microfocusing lens system to laser texture a data zone. The second continuous wave laser light sub-beam is converted into a pulsed laser light beam and passed through a microfocusing lens to impinge on the substrate surface to laser texture a data zone.

Abstract: There is now provided a body coated with at least one diamond layer on a substrate of cemented carbide or cermets. The substrate is before the diamond coating process provided with spotwise occurring particles containing an element either being any of W, Ta, Ti, Mo Cr, V, Nb, Mg, Ca, Na, K or, preferably, any of B, Si, S, Al or P. These particles are dispersed at a density giving an average distance between two particles of 20 .mu.m or less, preferably 5 .mu.m or less.

Abstract: A method for the manufacture of a microstructure having a top face and a bottom face, at least one hole or cavity therein extending from the top face to the bottom face, and a polymer membrane which extends over a bottom opening of said hole or cavity, which method comprises the steps of: providing a substrate body having said top and bottom faces, optionally forming at least part of said at least one hole or cavity in the substrate body, providing a membrane support at the bottom face opening of said at least one hole or cavity, depositing a layer of polymer material onto the bottom face of said substrate body against said membrane support, if required, completing the formation of the at least one hole or cavity, and, if not done in this step, selectively removing said membrane support to bare said polymer membrane over the bottom opening of the at least one hole or cavity.

Abstract: A method is provided for forming an oxide film on a III-V substrate. The method includes steps of (a) preparing an acidic solution containing a IIIA-ion, (b) adding an basic solution into the acidic solution to provide a growth solution of a specific pH value, and (c) placing the III-V substrate into the growth solution to form the oxide film on the III-V substrate.

Abstract: Disclosed herein is a cleaning processing method in which an object to be processed is mounted on a susceptor in a process chamber of a CVD apparatus, a TiCl.sub.4 gas, a H.sub.2 gas, and a Ar gas are introduced, a Ti film is formed on a surface of the object to be processed in a region of a plasma generated, the object to be processed is conveyed out of the process chamber, supply of the H.sub.2 gas and the Ar gas is thereafter stopped without generating a plasma, and the TiCl.sub.4 gas is introduced by means of a carrier gas, to remove unnecessary Ti films sticking to the inside of the film forming apparatus.

Abstract: Processes for producing improved environmental protection, corrosion resistance and improved paint adhesion for metals; e.g., ferrous, aluminum, or magnesium alloys; and other surfaces upon contact is disclosed. The processes comprise use of one or more Group IV-A metals such as zirconium in an acidic solution with one or more oxyanions or other non-fluoanions to stabilize and solubilize the metal while fluorides are specifically excluded from the processes and compositions. The processes optionally contain pretreatment stages that serve to activate a surface and/or promote formation of a Group IV-A metal oxide matrices through use of an oxygen donor. The compositions are at a pH below about 5.0 and is preferably in a range between about 1.0 and about 4.0. The coatings may contain surfactants, sequestering agents, or organic additives for improved corrosion protection and paint adhesion. The substrate may be treated by immersion, spray, fogging or rollcoat.

Abstract: A method of coating a golf club head under vacuum conditions with an open hanger type shot blasting machine includes the steps of forming a blank of golf club head; grinding the blank to form large pores on the surface of the blank; polishing the blank to form a refined blank containing fine pores on the surface thereof; hanging multiple refined blanks on hangers in an opening hanger type shot blasting machine to rotate and move the blanks into a vacuum rear portion of the machine. Meanwhile, shot blasting material containing mixed shot grit and powdered metal coating material is centrifugally thrown with mechanical throwing arms, so that shot grit strikes and forms numerous deeply depressed pores on the refined blanks. The shot grit quickly leaves the surfaces of the refined blanks due to a reactive force produced during impact of the shot grit on the blanks.

Abstract: A method and apparatus for texturing a landing zone on a substrate of a magnetic disk to reduce stiction between a magnetic transducer head and the disk is provided. The method includes projecting discrete pressurized fluid droplets to impact a substrate surface of the substrate with sufficient momentum to form cavities in a selected annular area of the substrate surface, the selected annular area with cavities therein being of sufficient width to provide a textured landing zone for the magnetic transducer head. A magnetic disk for storing data readable by a transducer head is also provided. The disk includes a rigid substrate. A textured landing zone is provided on the disk for engaging the transducer head. The textured landing zone is formed by the steps of directing a stream of discrete pressurized fluid droplets against the substrate to create roughness therein and moving the substrate and stream of droplets relative to one another in order to create an annular area of roughness.

Abstract: The mirror-finished silicon surface is brought for pre-processing into contact with the hydrofluoric acid solution, it is NH cleansed, and then it is filmed by oxidation. Otherwise, the silicon surface not mirror-finished is brought for pre-processing into contact with the hydrofluoric acid solution, it is subject to an alkali etching {by a solution of KOH:H.sub.2 O base, NaOH:H.sub.2 O base, NH.sub.4 OH:H.sub.2 O base, or ?NH.sub.2 (CH.sub.2).sub.2 NH.sub.2 !:H.sub.2 O:?C.sub.6 H.sub.4 (OH).sub.2 !base}, it is NH cleansed by the solution of (NH.sub.4 OH:H.sub.2 O.sub.2 base or NH.sub.4 OH:H.sub.2 O.sub.2 :H.sub.2 O base), and then it is filmed by oxidation. In such manufacturing methods the ornamental silicon articles may be processed to their final shape thereafter effecting an oxidation filming. Thus, without using a coloring agent the silicon surface is colored to provide ornamental silicon articles having excellent ornamental properties.

Abstract: At least the surface region of a cutting tool substrate made of tungsten carbide in a cobalt matrix is carburized to chemically passivate the cobalt prior to deposition of diamond film on it. The passivation improves adhesion by preventing reaction of the cobalt with the diamond in the course of the deposition process.

Abstract: A process for chemical vapor deposition of blanket tungsten thin films on titanium nitride proceeds by hydrogen reduction of tungsten hexafluoride at temperatures of 200 to 500.degree. C. Tungsten film nucleation is preferably facilitated by partial removal of the oxidized surface of titanium nitride or titanium nitride coated substrates by a sputter cleaning process prior to the tungsten CVD. The process differs in part from other processes in that deposition proceeds rapidly on titanium nitride without a significant nucleation period without the addition of other chemical compounds such as silane. The sputter cleaning process preferably takes place in an inert vacuum environment that protects the substrate from atmosphere and oxygen until the tungsten CVD step occurs.

Abstract: In order to improve the wear resistancy--including adherence behaviour, ductility and shearing strength--at a diamond coated multiphase body, an element enrichment is applied in controlled manner in the interphase of base body and diamond layer.

Abstract: A process for coating a tungsten carbide base material substrate with CVD diamond film includes carburization and gas-assisted vaporization of cobalt from the surface with simultaneous recrystallization of surface grains of tungsten carbide to change their stoichiometry for improved adherence.Also disclosed is a WC-Co cutting tool having a relatively fine WC grain size and coated with adherent CVD diamond.

Abstract: A wear-resistant hardfacing and a method for applying such a hardfacing is taught herein. A finely powdered, wear-resistant alloy and a polyvinyl alcohol (PVA) solution slurry is coated onto the metal surface of a tool, implement, or similar item to be hardfaced. Alternatively, a binding coating of PVA solution may be applied to the metal surface followed by application of a layer of a powdered alloy. After the slurry or PVA binding coating has dried, leaving a dry coat of alloy in a PVA matrix, the metal surface is heated to the fusion temperature of the alloy in vacuum, in an inert gas atmosphere, or in hydrogen atmosphere. The metal item with the fused coating is heat treated to impart desired mechanical properties to the part substrate material. The method of the present invention gives a smooth, dense coating of the wear-resistant hardfacing without nonmetallic inclusions.

Abstract: A surface treatment, especially for titanium and aluminum alloys, forms a sol-gel film covalently bonded on the metal surface to produce strong, durable adhesive bonds between the metal and an organic adhesive without using toxic chemicals and while significantly reducing or eliminating rinse water requirements of traditional anodizing or etching processes. An aqueous sol containing an zirconium and an organosilane with an organic acid catalyst and alkoxyzirconium stabilizer is applied to etched or grit blasted substrates by dipping, spraying, or drenching, to produce bonds in a single application comparable in strength and performance to standard anodize controls. Parameters affecting performance include the sol composition, the Si/Zr ratio, the ratio of sol ingredients, the concentration of the sol, the carrier solvent, solution age, catalysts, surface pretreatment, application method, curing process, and primer used.

Abstract: A workpiece is processed by abrading a surface of its amorphous coat layer (12) over a substrate (10) such that Ni particles (13) and crystallized compounds (14) of Ni and P are produced locally and only on the surface of the coat layer (12) and along grooves (17) formed by abrading. Mechanical strength and anti-corrosive property of the coat layer can thus be maintained, and ferromagnetic materials can be affixed thereon and can be magnetized in a desired direction.

Abstract: A method for regenerating an extrusion die for ceramic honeycomb structural bodies. The extrusion die includes a base metal and a titanium-based hard coating of an abrasion-resistant material which is formed on a surface of the base metal. The extrusion die is immersed in a solution of nitric acid when it has worn, so as to remove a residue of the hard coating from the surface of the base metal. Subsequently, a titanium-based fresh hard coating is formed on the surface of the base metal, and a pattern adjustment of the die is then performed wherein the surface of the fresh hard coating is locally ground so that the sliding resistance of the raw ceramic material becomes substantially uniform over the entire region of the die.

Abstract: A method for providing a diamond film on a scribing wheel useful for scribing glassy materials in order to increase its wear resistance. The method comprises sequential steps which include pre-treating the surface of the scribing wheel and thereafter depositing the diamond film on the pretreated scribing wheel by a chemical vapor deposition process.

Abstract: A method of making a cast concrete stepping stone whose exposed upper surface has the appearance of two or more grouted attractive natural stepping stones. A liquid release agent is applied to the mold which is then placed on a vibrator table and filled with wet concrete. The mold is vibrated for about 30 seconds and the surface of the concrete troweled smooth. Dry body color is sprinkled over the concrete surface and troweled to completely cover the concrete. A dry release agent containing powdered color having a darker shade than the body color is sprinkled over the dry body color covering the concrete. The desired pattern is then pressed into the surface of the concrete and after a six hour drying time, the cast stepping stone is removed from the mold. Excess body color and release agent are washed away and the washed surfaces totally dried. Finally a clear concrete sealer is applied to the exposed upper surface of the concrete stepping stone.

Abstract: An article and a method of making surface modified synthetic diamond substes at temperatures below 500.degree. C. for electronic packaging applications are described. The article consists of a synthetic diamond substrate, the surface of which has been modified by providing an adherent thin coating of a ceramic (alumina) material so as to enable metallization of synthetic diamond by current industrial methods. The method of surface modification comprises deposition of a thin transition metal layer on the synthetic diamond substrate prior to low temperature reactive vapor deposition of aluminum followed by annealing in an oxygen atmosphere.

Abstract: An optimized electroless copper plating technique suitable for plating electroless copper upon ceramics.

Abstract: An improved process for the preparation of metallized ceramic substrates having a metal layer ranging from ten to two hundred microns in thickness, and having enhanced adhesion strength is provided. The process involves, in combination, a novel method for conditioning the ceramic substrate and the application of a thin intermediate layer of electrolessly and optionally, electrolytically, deposited metal prior to electrolytic metal deposition of an outer metallized layer.

Abstract: A method for forming an in-situ doped amorphous or polycrystalline silicon thin film on a substrate is provided. The method includes placing the substrate in a reaction chamber of a CVD reactor and introducing a silicon gas species into the reaction chamber. The flow of the silicon gas species is continued for a time period sufficient to dehydrate the substrate and form a thin layer of silicon. Following formation of the thin layer of silicon, a dopant gas species is introduced into the reaction chamber and continued with the flow of the silicon gas species to form the doped silicon thin film. In an illustrative embodiment a phosphorus doped amorphous silicon thin film for a cell plate of a semiconductor capacitor is formed in a LPCVD reactor.

Abstract: A surface treatment, especially for titanium and aluminum alloys, forms a sol-gel film covalently bonded on the metal surface to produce strong, durable adhesive bonds between the metal and an organic adhesive without using toxic chemicals and while significantly reducing or eliminating rinse water requirements of traditional anodizing or etching processes. An aqueous sol containing an zirconium and an organosilane with an organic acid catalyst and alkoxyzirconium stabilizer is applied to etched or grit blasted substrates by dipping, spraying, or drenching, to produce bonds in a single application comparable in strength and performance to standard anodize controls. Parameters affecting performance include the sol composition, the Si/Zr ratio, the ratio of sol ingredients, the concentration of the sol, the carrier solvent, solution age, catalysts, surface pretreatment, application method, curing process, and primer used.

Abstract: A method of preparing faces of a laser based on III-IV compounds, the method comprising the following operations:1) the faces of the laser are opened;2) said faces of the laser are placed in an enclosure in which there obtains a pressure of about 10.sup.-7 mbar to about 10.sup.-8 mbar, and they are subjected to a step of cleaning by irradiation with a pulsed laser; and3) the same pulsed laser is used to ablate a target so as to subject said faces to a passivation operation whereby silicon Si or gallium nitride GaN is deposited thereon by the pulsed laser deposition method until a thickness is obtained lying in the range 2 .ANG. to 20 .ANG..

Abstract: Methods for preparing a cutting tool substrate material for diamond coating include providing a grooved pattern on selected portions of at least the top surface and preferably also the sides of the substrate material. The pattern may be a cross-hatching, a diamond-hatching, or another design. The pattern is preferably applied to the tool substrate by scribing with a laser ablation tool. The pattern is designed to optimize adhesion of CVD diamond on the portions of the tool substrate which are expected to be most challenged during a cutting process. The dimensions of the pattern (e.g. the depth and spacing of scribe lines) are selected to provide the optimum combination of mechanical bonding and diamond nucleation during the CVD coating of the tool substrate. According to preferred aspects of the invention, the pattern is applied only to the portions of the surface not immediately adjacent to the cutting edge of the tool substrate, thereby sparing the geometry of the cutting edge itself.

Abstract: A coated article comprising a stainless steel base having an etched surface and having on the etched surface a coated layer. The coating layer may comprise a fluororesin and can be provided: after sensitizing the stainless steel base through heating, treating with an acid, subjecting to etching, and subjecting to a solution treatment; after immersing in an aqueous acid solution or an aqueous ferric chloride solution to cause the base to be dissolved to such an extent that the gloss of the surface disappears; after uniformly abrading the surface of the base through buffing or blasting to the weight corresponding to a thickness of 1.0 .mu.m or more of the base, immersing in an aqueous acid solution or an aqueous ferric chloride solution to cause the base to be dissolved to such an extent that the gloss of the surface disappears, and subjecting to etching; or after subjecting to electrolytic etching at 15.degree. C. or less.

Abstract: A structure of a microporous resin bonded to metal is prepared by a method, comprising, molding a resin composition comprising a polymer alloy consisting of polyether imide and polyphenylene ether and particles of aluminum borate or amorphous silica filler, wherein the particles of aluminum borate and amorphous silica have an aspect ratio of 10 or less and an average diameter of 0.01-100 .mu.m, the aluminum borate having the formula: nAl.sub.2 O.sub.3.mB.sub.2 O.sub.3, wherein n and m individually represent an integer of 1-100, and the amorphous silica having the formula: SiO.sub.2, into a shaped object, treating the molded resin composition with an aqueous alkaline solution to remove the filler, thereby creating micropores within the resin object, and depositing a metal film on a surface of the treated resin object.

Abstract: Disclosed is a process for cleaning silicon surfaces of native oxide films. The process utilizes fluorine containing cleaning materials such as anhydrous hydrofluoric acid to clean the oxide from the surface. A fluorine containing particulate matter which forms on the surface as a result of the fluorine containing cleaning materials is then removed by heating the surface to a high temperature. The process is conducted in a non-oxidizing ambient and is preferably conducted in a cluster tool so that the heating step can take place in the same chamber of the cluster tool as later metal deposition step.

Abstract: The invention includes a method for cleaning and passivating a stainless steel surface comprising:1) contacting the surface with 1548 ml/liter of an acid formulation comprising between about 1 and 60% acid component, about 1-15% surfactant, and between about 39 and 98% water;2) maintaining contact to dislodge and remove residue from the surface;3) continuing contact to complex free iron ions liberated from the surface to form an oxide film on the surface; and4) continuing contact to precipitate the complexed ions into the oxide film.

Abstract: A method of applying strengthening coatings to metallic or metal-containing surfaces is provided in which the surface (2) to which a strengthening coating is to be applied is first subjected to activation, then at least one strengthening coating layer (1) is applied to the surface thus prepared. Said layer is treated with a laser beam (3) having a diameter (d) ranging from 0.2 mm to half the diameter (d) of the laser beam (3) entering into focusing element (5), with a power of at least 0.5 kW, with a rate of relative travel (A) of the surface being treated (2) and the laser beam (3) of at least 50 mm/min, the distance (L) between the focal plane (f) of the focusing element (5) to the surface being treated (2) being less than or equal to half the focal distance (F).

Abstract: A silicon nitride layer 12b is thermally grown on the topmost surface of the heat treatment jig 12 composed of silicon or silicon carbide in a nitrogen ambience. The silicon nitride layer 12b is thermally grown in a nitrogen ambience in the temperature range of 1,100.degree. C.-1,300.degree. C. It is desirable to remove slightly the surface of the jig by, for example, hydrogen etching before thermally growing the silicon nitride layer 12b. After the etching, a silicon oxide layer can be thermally grown on the jig surface in an oxygen ambience before thermally growing the silicon nitride layer 12b.

Abstract: Wear-resistant coatings composed of laser ablated hard carbon films, are deposited by pulsed laser ablation using visible light, on instruments such as microscope tips and micro-surgical tools. Hard carbon, known as diamond-like carbon (DLC), films produced by pulsed laser ablation using visible light enhances the abrasion resistance, wear characteristics, and lifetimes of small tools or instruments, such as small, sharp silicon tips used in atomic probe microscopy without significantly affecting the sharpness or size of these devices. For example, a 10-20 nm layer of diamond-like carbon on a standard silicon atomic force microscope (AFM) tip, enables the useful operating life of the tip to be increased by at least twofold. Moreover, the low inherent friction coefficient of the DLC coating leads to higher resolution for AFM tips operating in the contact mode.

Abstract: A method of forming a layer of oxide on a surface of a wafer is disclosed, in which the wafer surface is heated at a first temperature and a first pressure during a first period of time in a first ambient gas comprising nitrogen and oxygen species at a first concentration, and the wafer surface is heated at a second temperature and a second pressure during a second period of time in a second ambient gas comprising ozone and oxygen at a second concentration. The oxide structure formed thereby is also disclosed.

Abstract: A method for plating a graphite aluminum metal matrix composite material with nickel and gold utilizes the steps of: cleaning a surface of the metal matrix composite material so as to substantially remove grease and particulates therefrom; forming a layer of copper upon the surface of the metal matrix composite material; heating the copper layer to drive out entrapped fluids; applying acid to the copper layer to remove oxidation therefrom; forming a layer of nickel upon at least a portion of the layer of copper; heating the nickel layer to relieve stress therein; and electrolytically forming a layer of gold upon at least a portion of the layer of nickel.