Abstract: An article and a method of making surface modified synthetic diamond substes at temperatures below 500.degree. C. for electronic packaging applications are described. The article consists of a synthetic diamond substrate, the surface of which has been modified by providing an adherent thin coating of a ceramic (alumina) material so as to enable metallization of synthetic diamond by current industrial methods. The method of surface modification comprises deposition of a thin transition metal layer on the synthetic diamond substrate prior to low temperature reactive vapor deposition of aluminum followed by annealing in an oxygen atmosphere.

Abstract: Prior to applying an impregnation composition constituted by a solution of at least one phosphate, a part made of composite material is treated in depth by means of an aqueous solution that penetrates into the open internal pores of the composite material, and is then dried. The aqueous solution contains an additive which, after drying, imparts to the composite material, increased wettability by the impregnation composition. The additive contained in the aqueous solution is preferably constituted by at least one wetting agent that is soluble in water and non-ionic, such as an oxyethylenated fatty acid, an oxyethylenated fatty alcohol, an oxyethylenated alkyl-phenol or an ester of a high polyol.

Abstract: A method and an apparatus for a CVD comprising feeding a first gas flow, including a reactive gas, in a laminar flowing state and in a sheet state parallel to the surface of a substrate and feeding a second gas flow, including a non-reactive gas, in a direction perpendicular to that of said first gas flow, externally controlling the flow rates of the first and second gases so as to retain the laminar flowing state of said first gas flow and concentrate said first gas flow in the vicinity of said substrate and externally controlling the flow rate of said second gas flow to provide control and uniformity in the thickness of the layer to be formed.

Abstract: An improved process for the preparation of metallized ceramic substrates having a metal layer ranging from ten to two hundred microns in thickness, and having enhanced adhesion strength is provided. The process involves, in combination, a novel method for conditioning the ceramic substrate and the application of a thin intermediate layer of electrolessly and optionally, electrolytically, deposited metal prior to electrolytic metal deposition of an outer metallized layer.

Abstract: A process for the production of a carrier for surface plasmon resonance analysis comprising:A) depositing a preparatory layer on a surface, said preparatory layer comprising a metal selected from the group consisting of: nickel, titanium and chromium, wherein said preparatory layer is substantially uniform and has a thickness of 20-40 Angstroms,B) depositing a silver layer on said preparatory layer wherein said silver layer is substantially uniform and has a thickness of 500-600 Angstroms, andC) said carrier is suitable for surface plasmon resonance analysis.

Abstract: An article having a multiphase composite lubricant coating of a hard refractory matrix phase of titanium nitride dispersed with particles of a solid lubricating phase of molybdenum disulfide is prepared by heating the article to temperatures between 350.degree. and 850.degree. C. in a reaction vessel at a reduced pressure and passing a gaseous mixture of Ti((CH.sub.3).sub.2 N).sub.4, MoF.sub.6, H.sub.2 S and NH.sub.3 over the heated article forming a multiphase composite lubricant coating on the article.

Abstract: In a method of depositing a metal sulfide film on a substrate a solution containing at least one metal compound precursor comprising at least one thiocarboxylate ligand SECR, wherein E is selected from the group consisting of O and S and wherein R is selected from the group consisting of alkyl, aryl, substituted alkyl, substituted aryl, halogenated alkyl, and halogenated aryl is prepared. The substrate is heated to a reaction temperature. The solution is evaporated to form vapors of the metal compound precursor. The vapors and the substrate heated to the reaction temperature are contacted. The reaction temperature is sufficient to decompose the metal compound precursor to form a metal sulfide film of at least one metal on the substrate.

Abstract: The substrate of a magnetic recording medium is laser textured employing a dual fiber-optic laser delivery system which enables separate control of nucleation and crystallization. An embodiment of the invention includes laser texturing glass, ceramic and glass-ceramic substrates without microcracking to form a texture comprising uniform protrusions.

Abstract: The present disclosure is directed to a process of depositing a layer of a material on a wafer, which comprises depositing a layer of the same material to be deposited on the wafer on the back surface of a susceptor.

Abstract: A method for improving the characteristics of deposited thin films by improved control and stabilization of wafer surface temperatures. Further, the invention provides the ability to rapidly change the temperature of the wafer surface without the need to change the temperature of the chamber. The wafer is heated to an operating temperature by conventional means. A gas with high thermal conductivity, such as helium or hydrogen, is passed over the wafer to cool its surface to a desired temperature for the process to be performed. The flow rate is then adjusted to stabilize the temperature of the wafer and reduce surface temperature variations. Processing gases are then introduced into the chamber, and deposition onto the wafer commences. The maintenance of correct wafer surface temperature results in improved step coverage and conformality of the deposited film.

Abstract: A method of depositing a tin oxide film onto a heated substrate is provided, by chemical vapor deposition using a tetraalkyoxy tin compound. Further provided is a method for doping the film with platinum or palladium using a .beta.-diketonate precursor thereof.

Abstract: A method for applying a coating composition to a substrate is disclosed. A rapid curing process is used to apply the coating composition. The method comprises the steps of forming a coating composition by combining, i) a base paint comprising nonvolatile constituents and a coalescing solvent, and ii) a carrier solvent, b) heating the substrate at a sufficient temperature to promote flashing of the carrier solvent; and c) applying the coating composition to the heated substrate, wherein the carrier solvent is flashed, resulting in a paint film relatively free of carrier solvent, whereby the paint film forms a cured coating on the substrate. The carrier solvent preferably is acetone.

Abstract: A method of producing a cathode ray tube comprising forming a phosphor layer on the inner surface of a panel of a glass bulb, forming an lacquer intermediate film on the phosphor layer, removing the lacquer intermediate film formed on the inner surface of the funnel of the glass bulb by a liquid in a state with the temperature of the glass bulb higher than the temperature of the liquid.

Abstract: A conduit liner which is made by cladding the inner surface thereof with hot melt fluidized deposition thereon while the conduit is heated. Preferably, the fluidized deposition is of polymeric material which may include a low friction additive is deposited with varying thickness along the longitudinal axis of the conduit.

Abstract: A method of pyrolytically forming a silica-containing coating on a glass substrate at an elevated temperature. Silane, oxygen, a radical scavenger gas and a carrier gas are combined as a precursor mixture, and the precursor is directed toward and along the surface of the heated glass substrate. The presence of the radical scavenger allows the silane, which is pyrophoric, to be premixed with the oxygen without undergoing ignition and premature reaction at the operating temperatures. The radical scavenger further provides control of and permits optimization of the kinetics of the chemical vapor deposition (CVD) reaction on the glass. A preferred combination of precursor materials includes monosilane and oxygen, with ethylene as the radical scavenger, and including nitrogen as a carrier gas.

Abstract: The present invention relates to a novel method for the plasma assisted high vacuum vapor coating of parts with wear resistant coatings where the method comprises at least the process steps heating and conditioning and where the process step conditioning comprises heating. A protective gas is used for the heating. It is circulated at a pressure of at least 0.01 bar. Significant advantages are realized over state of the art methods using radiation heating. The method is preferentially carried out in an apparatus conceived for it, which comprises a blower (3), protective shields (8) and gas flow management sheets(9).

Abstract: A process is disclosed for preparing an aramid surface to be metal plated by nonaqueous treatment with a strong base followed by water washing--all in the absence of metal cations.

Abstract: The present invention is directed to an insulating coating for refractory articles, adapted to be applied by spraying or gunning, which is easy to apply, cost effective, eliminates the potential health hazards associated with ceramic fiber paper, and which imparts sufficient insulating properties to the refractory article in high temperature environments. More particularly, the present invention is directed to an insulating coating and a method of preparing the insulating coating wherein the coating composition is comprised of about 25% to about 75% by weight of lightweight aggregate, up to about 25% to about 75% by weight of binder, up to 0.5% by weight of organic fiber, up to about 15% by weight of an additive to improve green strength, and up to about 5% by weight of a foaming agent.

Abstract: This invention is directed to the creation of crystalline mullite coatings having uniform microstructure by chemical vapor deposition (CVD). The process comprises the steps of establishing a flow of reactants which will yield mullite in a CVD reactor, and depositing a crystalline coating from the reactant flow. The process will yield crystalline coatings which are dense and of uniform thickness.

Abstract: The present invention is a process for very low temperature chemical vapor deposition of silicon dioxide, comprising the steps ofa) heating a substrate upon which silicon dioxide is to be deposited to a temperature in the range of approximately 150 to 500.degree. C. in a vacuum maintained at a pressure in the range of approximately 50 to 750 mTorr;b) introducing into said vacuum an organosilane containing feed and an oxygen containing feed, said organosilane containing feed consisting essentially of one or more compounds having the general formula: ##STR1## wherein R.sup.1 and R.sup.2 are independently alkyl, alkenyl, alkynyl, or aryl, having C.sub.1 to C.sub.6, or R.sup.1 and R.sup.2 are combined to form an alkyl chain C.sub.x (R.sup.3).sub.2, where R.sup.3 is independently H, C.sub.x H.sub.2x+1, and x=1-6, and R.sup.4 is independently H, C.sub.y H.sub.2y+1 where y=1-6; andc) maintaining said temperature and vacuum thereby causing a thin film of silicon dioxide to deposit on the substrate.

Abstract: A method for forming a solid state humidity sensor is disclosed which comprises the steps of: (a) dissolving a tungstate salt into an aqueous solution; (b) adjusting the pH of the aqueous tungstate salt solution to below 8.5; (c) forming one or a pair of electrodes on an insulating substrate; (d) placing the substrate into the pH-adjusted aqueous tungstate salt solution and heating the aqueous solution containing the substrate at temperatures above 70.degree. C. to thereby form a pyrochlore-type crystalline tungsten trioxide film over the electrode or pair of electrodes; and (e) forming another electrode over the pyrochlore-type crystalline tungsten trioxide film if only one electrode is formed during step (c).

Abstract: A method of forming a layer of oxide on a surface of a wafer is disclosed, in which the wafer surface is heated at a first temperature and a first pressure during a first period of time in a first ambient gas comprising nitrogen and oxygen species at a first concentration, and the wafer surface is heated at a second temperature and a second pressure during a second period of time in a second ambient gas comprising ozone and oxygen at a second concentration. The oxide structure formed thereby is also disclosed.

Abstract: In order to produce a ceramic heater for an oxygen sensor, a method is used, which comprises the steps of: (a) molding a green cylindrical object from a ceramic material which contains a binder; (b) provisionally baking the green cylindrical object at a relatively lower temperature thereby to produce an insufficiently baked cylindrical object, the lower temperature being sufficient for removing the binder from the cylindrical object; (c) printing a heater pattern on a cylindrical surface of the insufficiently baked cylindrical object, the heater pattern being constructed of an electrically conductive material; (d) coating the printed cylindrical surface of the insufficiently baked cylindrical object with a green protection layer thereby to produce a layer-coated cylindrical object; and (e) baking said layer-coated cylindrical object at a relatively higher temperature sufficient for baking the insufficiently baked cylindrical object, the heater pattern and the green protection layer.

Abstract: A method of manufacturing a metal oxide coated glass which is a glass substrate bearing a pyrolytically formed coating composed of at least two metal oxides and which has a corrosion resistance at least equal to 5 as determined by Applicants' defined transmission test, the method including contacting a hot glass substrate with a coating precursor material composed of a tin-containing material and a titanium-containing material in the presence of oxygen to form a metal oxide coating composed of at least two metal oxides including tin oxide and titanium oxide on the hot glass substrate by pyrolyzing the coating precursor material as it contacts the hot glass substrate, wherein the titanium-containing material comprises a titanium chelate which is a reaction product of octyleneglycol titanate and acetylacetone.

Abstract: A method of manufacturing an electric heating film of semiconductor including steps of fusing together halides of indium or tin or their organic compound and adding 1-10% of impurities of halides of antimony or iron, hydrogen fluoric acid, or ammonium fluoride in weight, mixing and stirring well the materials with a medium material at a proportion of 20-60% in weight, and cleaning a base material with clean soft water and drying the surface thereof, and disposing the base material into a heating furnace for activating its surface, mixing the liquid material with air and spraying it into the heating furnace thereby atomizing and dissolving the liquid material into ions, and letting the ions be accumulated and evenly coated on the surface of the base material or directly spraying the liquid material on the activated surface of the base material thereby forming an electric heating film of semiconductor on the base material.

Abstract: Liquid methyltin halide compositions and their use as intermediates in chemical synthesis and as precursors for forming tin oxide coatings on substrates are disclosed.

Abstract: Components of aluminium production cells made of composite materials comprising ordered aluminide compounds of at least one of nickel, iron and titanium, for use in particular as anodes and cathodes and cell linings in aluminium production cells containing a fluoride-based molten electrolyte containing dissolved alumina and cerium species, are produced by micropyretic reaction of a reaction mixture comprising compacted particulate reactants which react to produce the composite material. The reaction mixture is mixed with a cerium-based colloidal carrier, dried and compacted into a reaction body bonded by the cerium-based colloidal carrier, and the colloid-bonded reaction body is ignited to initiate the micropyretic reaction.

Abstract: A method for producing a ferroelectric thin film according to the present invention includes the steps of: forming a PbTiO.sub.3 film on an electrode provided on a substrate; and forming a PZT film on the PbTiO.sub.3 film by a CVD method.

Abstract: A method of forming a polymer backing on a glass substrate through the use of a pre-polymer powder applied onto the surface of the substrate. The backing is applied on-line in an existing substrate manufacturing or fabricating process while the substrate is at a high enough temperature to polymerize the powder. The resulting backed substrate is durable and abrasion resistant and exhibits excellent opacification and adhesion properties.

Abstract: The height of protrusions formed during laser texturing a glass or glass-ceramic substrate is controlled by controlling the quench rate of the protrusions during resolidification. In an embodiment, the quench rate is controlled by heating the substrate during laser texturing. Heating can be initiated prior or subsequent to, or simultaneously with, initial exposure of the substrate surface to a pulsed, focused CO.sub.2 laser beam for texturing.

Abstract: A method of producing a cutting tool, comprising a substrate which has a roughened surface that presents a surface roughness of between 15 microinches R.sub.a and 125 microinches R.sub.a. A coating is applied to the roughened surface of the substrate by physical vapor deposition. A coated cutting tool having a low cobalt substrate and experiencing long tool life is also discussed.

Abstract: A method of producing doped and undoped silicon layers on a substrate by chemical vapor deposition at elevated pressures of from about 10 to about 350 Torr whereby deposition occurs at practicable rates. A substrate is loaded in a vacuum chamber, the temperature adjusted to obtain a silicon deposit of predetermined crystallinity, and the silicon precursor gases fed to the chamber to a preselected high pressure. Both undoped and doped silicon can be deposited at high rates up to about 3000 angstroms per minute.

Abstract: A method is provided for depositing ultra high purity of greater than 99.998% titanium films which comprises generating gaseous TiI.sub.4 in situ by reacting titanium metal starting material with gaseous iodide in a reaction chamber, purifying the TiI.sub.4 by a double distillation process at reduced pressure to produce ultra high purity of greater than 99.998% TiI.sub.4, transferring the ultra high purity TiI.sub.4 in liquid form to a deposition chamber to vaporize the liquid TiI.sub.4 and contacting a heated titanium substrate with the TiI.sub.4 vapor, thereby depositing the ultra high purity Ti films on the substrate.

Abstract: A process and apparatus for the preparation and coating of the surface of a substrate by thermal projection, in which the surface of the substrate is progressively subjected to laser irradiation thereby at least partially to eliminate a superficial contaminating film on the surface of the substrate, and then there is projected by a thermal projection device a deposit material on the surface thus prepared immediately after the preparation. The surface of the substrate is subjected to successive laser and thermal projection treatments thereby to lay down on the surface a plurality of layers of deposit material. The substrate can be cylindrical, and can be rotated about its axis while continuously applying laser radiation and thermal projection thereto, with the substrate rotating in a direction such that the surface of the substrate is subjected first to laser radiation and subsequently to thermal projection. The laser is a pulsed laser.

Abstract: A method for fabrication of polymer composite layers in a vacuum is disclosed. More specifically, the method of dissolving salts in a monomer solution, vacuum flash evaporating the solution, condensing the flash evaporated solution as a liquid film, and forming the condensed liquid film into a polymer composite layer on a substrate is disclosed.

Abstract: Niobium and tantalum compounds suitable for use as chemical vapor deposition source reagents, and a process for depositing niobium- or tantalum-containing coatings using the compounds. The compounds have formulaM(OR.sup.1).sub.x (R.sup.2 --C(GH)--C--C(G)--R.sup.3).sub.ywherein M is tantalum or niobium; G is oxygen or sulfur; and R.sup.1, R.sup.2, and R.sup.

Abstract: A process for fabricating ceramic-metal composites having continuous ceramic and metallic phases. The process includes the steps of contacting a porous ceramic matrix material having the general shape of an article of manufacture with molten metal whereby capillary action pulls the metal into the open porosity of the ceramic matrix to substantially fill the open void space. The present invention also provides a ceramic-metal composite having continuous metal and ceramic phases.

Abstract: A thin film magnet and a cylindrical ferromagnetic thin film having a high maximum energy product (greater than 120 kJ/m.sup.3) and thus suitable for use in miniature high performance devices are provided. The thin film magnet is produced by means of physical vapor deposition. The thin film magnet is an (Nd.sub.1-x R.sub.x).sub.y M.sub.1-y-z B.sub.z alloy having a ferromagnetic compound of the Nd.sub.2 Fe.sub.14 B type as its main phase, wherein R is Tb, Ho, and Dy and M is Fe metal or an Fe-based alloy including at least one of Co and Ni, 0.04.ltoreq.x.ltoreq.0.10,0.11.ltoreq.y.ltoreq.0.15, and 0.08.ltoreq.z.ltoreq.0.15. A perpendicular magnetization film having such a composition is deposited on the side wall of a substrate in the columnar (or cylindrical) form thereby obtaining a cylindrical ferromagnetic thin film having radial anisotropy.

Abstract: This invention is directed to the creation of diamond coatings with enhanced adherence, nucleation density and uniformity on substrates. The method of this invention includes the formation of a carbide layer on a substrate surface prior to diamond coating deposition via a pretreatment stage using an unmodified oxy-acetylene combustion flame. The carbide layer may be formed at a temperature outside of the normal deposition temperature range and is treated as a separate step in the diamond growth process. The carbide layer serves to improve nucleation density, uniformity and adherence of the subsequent diamond coating. Many different types of substrates may benefit from the advantages of this invention.

Abstract: This invention relates to a method of sealing the porous surfaces that can be generated during the manufacturing and processing of molded plastic parts. Liquid thermoset coatings are applied to preheated parts and cured to create a barrier on the surface to gasses generated during heat curing of subsequently applied surface coatings. The liquid coating may be comprised of polyurethane forming components; those components in combination with unsaturated polyester resins; vinyl ester resin compositions; coatings derived from hydroxyl or carboxyl containing oligomers reacted with alkylated urea-formaldehyde, melamine-formaldehyde, and/or benzoquanamine-formaldehyde resins; and oligomers containing carboxyls reacted with triglycidyl isocyanurate.

Abstract: Glass substrates suitable for thin film processing can be batch heated to processing temperatures and batch cooled after processing by radiant heating and cooling in a vacuum chamber. The heating and/or cooling chamber is fitted with a cassette including heat conductive shelves that can be heated or cooled, interleaved by the glass substrates mounted on supports so that a gap exists between the shelves and the substrates. As the shelves provide heating or cooling, the glass substrates are radiantly heated or cooled by the shelves, thereby providing uniform heating or cooling of the glass substrates so as to avoid damage or warpage of the substrates. A vacuum system for processing the substrates includes batch-type heating and cooling of the substrates using the chambers of the invention in combination with one-at-a-time film processing chambers that can deposit one or more thin films on the substrates.

Abstract: A conjugated poly(p-phenylene vinylene) is manufactured by means of CVD and using simple monomers. Such a polymer is particularly adaptable for use as an active layer in electroluminescent devices, such as a light-emitting diode.

Abstract: A conduit liner which is made by cladding the inner surface thereof with hot melt fluidized deposition thereon while the conduit is heated. Preferably, the fluidized deposition is of polymeric material which may include a low friction additive.

Abstract: Chemical vapor deposition of titanium metal is accomplished by forming a liquid solution of titanium tetrabromide in bromine, vaporizing the solution and contacting the vapor mixture with a plasma in the vicinity of a substrate. These titanium films show good conformality, low electrical resistance and are suitable as contact and adhesion layers in semiconductor microelectronics. By mixing ammonia gas with the mixed vapors of titanium tetrabromide and bromine, films containing titanium nitride are deposited at about 400.degree. C. These titanium nitride films are suitable as diffusion barriers and adhesion layers in semiconductor devices.

Abstract: The present invention is directed to a plasma treating apparatus, for generating plasma in a dielectric container and for treating the surface of a substrate with the plasma generated, which includes a hot air heating system for heating the dielectric container by blowing hot air to a central location on the outside surface of the dielectric container.The present invention is further directed to a plasma treating method for generating plasma in a dielectric container and for,treating the surface of a substrate with the plasma generated which includes hot air heating for heating the dielectric container by blowing hot air to the outside surface of the dielectric container to a temperature at which a thin film does not deposit on the inside surface of the dielectric container.

Abstract: A process for coating a substrate with a metal giving a polished effect, the substrate being of a material that is dimensionally stable at temperatures up to at least 120.degree. C. The process includes the steps of cleaning the substrate or forming a top coating on the substrate by burning on a powdered lacquer, coating the cleaned or coated substrate with a metal giving a polished effect by plasma deposition within a vacuum chamber, and applying a top coating by burning on a powdered lacquer.

Abstract: The present invention relates to an insulating composition for electrical cable comprising a mixture of an ethylene-alkyl acrylate or ethylene-vinyl acetate copolymer and of a polymeric compound, said polymeric compound being an ethylene-alkyl acrylate-maleic anhydride terpolymer or an ethylene-vinyl acetate-maleic anhydride terpolymer, and usual additives such as, for example, a crosslinking agent, its use for the preparation of an insulation sheath of electrical cables and the insulation sheath obtained.

Abstract: A diamond-coated tool and a process for making them. The process includes a sintering step. In that step, a substrate is sintered in an atmosphere and for a time and at a temperature so that superficial, exaggerated grain growth is promoted that imparts a surface roughness which may serve as anchoring sites during a subsequent diamond coating step which is performed by a vapor deposition technique. The diamond-coated tool or wear part includes a large grain substrate surface, and a high bond strength between the diamond coating and the substrate surface.

Abstract: A method of and apparatus for depositing a silicon oxide layer onto a wafer or substrate is provided. The present method includes introducing into a processing chamber a process gas including silicon, oxygen, boron, phosphorus and germanium to form a germanium doped BPSG oxide layer having a reflow temperature of less than 800.degree. C. Preferred embodiments of the present method are performed in either a subatmospheric CVD or a plasma enhanced CVD processing apparatus.

Abstract: Chemical Vapor Deposition of copper films is enhanced by simultaneously introducing in the reactor vapor of an organometalic copper precursor and .?.copper complex.!. vapor of a volatile ligand or the hydrate of the ligand.