Solvent Vapor Treatment Of Coating Patents (Class 427/335)
-
Patent number: 7910154Abstract: A light emitting device may include an n-clad layer formed on a crystalline wafer; a porous layer formed by processing the n-clad layer in a mixed gas atmosphere of HCl and NH3. The light emitting device may further include an active layer and a p-clad layer formed on the porous layer.Type: GrantFiled: August 17, 2006Date of Patent: March 22, 2011Assignee: Samsung Corning Precision Materials Co., Ltd.Inventor: Sung-soo Park
-
Patent number: 7838074Abstract: The invention concerns a method for preparing a substrate one surface of which consists of a polymer, said polymer surface being oriented and nanostructured, said method including the following successive steps: a) brushing the polymer surface in an amorphous state of the substrate; b) contacting with a vapor of a solvent, the oriented polymer surface obtained at the end of step a), said solvent being selected such that: |?poly??sol|/[(?poly+?sol)/2]<0.3, ?poly and ?sol representing respectively the solubility parameters of the polymer and of the solvent, and ?sol<?poly, ?sol et ?poly representing respectively the free surface energies of the solvent and the polymer. The invention concerns a substrate one polymer surface of which at least is oriented and nanostructured, and the various uses of said substrate.Type: GrantFiled: September 28, 2006Date of Patent: November 23, 2010Assignee: Centre National de la Recherche Scientifique (CNRS)Inventors: Martin Brinkmann, Jean-Claude Wittmann
-
Patent number: 7829143Abstract: Organic films can be annealed by exposure to a solvent vapor. The solvent vapor annealing renders the organic film insoluble even in a solvent of a solution from which it was deposited. This enables deposition of two or more organic films in sequence without having one deposition alter an underlying organic film. Devices can be easily fabricated with organic films annealed in this manner when no other solution processing method is possible.Type: GrantFiled: November 21, 2003Date of Patent: November 9, 2010Assignee: Nanosolar, Inc.Inventors: Brent J. Bollman, Matthew R. Robinson
-
Publication number: 20100247776Abstract: A method of drying polymeric film, the polymeric film being formed by applying on a support a coating solution containing a polymeric compound having water vapor barrier properties, at least one organic solvent and a compound having a hydrophilic functional group which has a water solubility of 0.3 to 7 g/100 mL at 25° C., the method including: a hot air drying step in which the polymeric film is dried to the dry point by hot air, and a steam drying step in which drying is performed with steam.Type: ApplicationFiled: March 31, 2010Publication date: September 30, 2010Applicant: FUJIFILM CorporationInventors: Keio OKANO, Takao TAGUCHI
-
Patent number: 7799378Abstract: A solution having a polymer dissolved in a hydrophobic organic solvent is cast on a substrate, said organic solvent is evaporated in a moist atmosphere to condense moisture contained in an atmosphere prevailing on a surface of said cast solution into micro-droplets, said micro-droplets are dispersed on the surface of said cast solution or in said cast solution into a close-packed structure, said micro-droplets, condensed and dispersed on the surface of said cast solution or in said cast solution, are evaporated to obtain a porous honeycomb structure with said droplets used as casts, and said porous honeycomb structure is at least bisected by peeling in a thickness direction, thereby obtaining honeycomb structures wherein micro-pillars or anisotropic micro-pillars are regularly formed and arranged by said bisection on the peeled sections.Type: GrantFiled: November 27, 2003Date of Patent: September 21, 2010Assignee: Japan Science and Technology AgencyInventors: Masaru Tanaka, Masatsugu Shimomura, Masafumi Takebayashi, Hiroshi Yabu
-
Patent number: 7794780Abstract: A method of making an optical construction that is static-dissipative and includes a static-dissipative layer buried within optical material.Type: GrantFiled: April 10, 2006Date of Patent: September 14, 2010Assignee: 3M Innovative Properties CompanyInventors: William L. Kausch, James E. Lockridge, Wade D. Kretman
-
Patent number: 7781020Abstract: A structured material characterized in having, on a substrate, a layer having tubular pores positioned uniaxially parallel to the interface of the substrate and the layer and supporting a conductive polymer material having a function of a surfactant therein. A method for producing the above structure material characterized by the steps of providing a substrate having the anisotropy on a surface, applying a solution containing a surfactant having a functional group for polymerization in the molecular structure, a solvent therefor, and a solute different from the surfactant to the substrate, and a step of standing for a predetermined time for causing the surfactant to assemble in a predetermined direction based on the anisotropy of the substrate.Type: GrantFiled: July 23, 2004Date of Patent: August 24, 2010Assignee: Canon Kabushiki KaishaInventors: Hirokatsu Miyata, Shinichi Nakamura, Akira Kuriyama, Miki Ogawa, Yasuhiro Kawashima
-
Patent number: 7740908Abstract: It is an object of the present invention to provide a method for producing a solid substrate used for sensors having a film with a small film thickness distribution, and a solid surface used for sensors having a film with a small film thickness distribution. The present invention provides a method for producing a solid substrate for sensors that has a coating on the surface using spin coating, wherein a substrate to be coated is rotated in an atmosphere in which the vapor pressure of coating solvent is 50% to 100% with respect to the saturation vapor pressure so as to form a thin film of a coating solution on said substrate to be coated.Type: GrantFiled: February 28, 2006Date of Patent: June 22, 2010Assignee: FUJIFILM CorporationInventors: Yukou Saito, Masashi Hakamata
-
Publication number: 20100112225Abstract: A coater (1) includes: a droplet jet part (4) which ejects droplets of a first solution toward an object to be coated (2) to apply the droplets to the object to be coated (2); and a remoisturizing-drying part (6) which gives a residue of the first solution applied on the object to be coated (2) a solvent capable of dissolving the residue to form an applied body with a second solution containing the residue as a solute, and which dries the formed applied body with the second solution.Type: ApplicationFiled: February 27, 2008Publication date: May 6, 2010Applicants: Kabushiki Kaisha Toshiba, Canon Kabushiki KaishaInventors: Tsuyoshi Sato, Hiroyasu Kondo, Naoaki Sakurai, Junsei Yamabe, Katsuyuki Soeda, Hiroshi Koizumi, Shuichi Kimura, Shizuo Kinoshita
-
Patent number: 7704649Abstract: A method of manufacturing a color filter forming a black matrix on a substrate, the black matrix defining a plurality of pixels, forming liquid ink layers within the pixels and drying the liquid ink layers, penetrating solvent vapor into surfaces of the dried liquid ink layers to form ink layers have mobile surfaces, and drying the ink layers having the mobile surfaces.Type: GrantFiled: June 15, 2006Date of Patent: April 27, 2010Assignee: Samsung Electronics Co., LtdInventors: Sung-woong Kim, Seung-joo Shin, Seong-jin Kim, Kye-si Kwon, Sang-il Kim
-
Patent number: 7691448Abstract: The invention relates to a method for applying a film to a planar, especially air-impermeable substrate, comprising the steps: (a) feeding the planar substrate in a direction of feed towards an application device, (b) applying a film output by the application device to the planar substrate, and (c) sharply deflecting the planar substrate together with the film that is in contact therewith to a deflection area in a discharge direction different from the direction of feed. The invention also relates to a deflecting element for deflecting a planar substrate. Said element comprises at least one guiding surface adapted to guide a planar substrate and an additional guiding surface, forming an edge for sharply deflecting a planar substrate with the first guiding surface.Type: GrantFiled: April 1, 2005Date of Patent: April 6, 2010Assignee: Nordson CorporationInventors: Jurgen Steckelberg, Gerd Brockmann
-
Patent number: 7669780Abstract: A fluid supply nozzle includes a fluid flow-in section into which a fluid flows in, a reservoir section for storing the fluid, a flow velocity control wall provided between the fluid flow-in section and the reservoir section and including an orifice for making the fluid flow in the reservoir section while reducing a flow velocity, and a discharging section including a slit for discharging the fluid with pressure of the fluid applied to the reservoir section. A substrate processing apparatus is formed so as to include the fluid supply nozzle. Moreover, a substrate processing method includes the step of discharging a fluid in a single-layered, continuous film to supply the fluid onto a substrate. Thus, the substrate is processed. To perform this method, the fluid supply nozzle of the present invention can be used.Type: GrantFiled: January 31, 2008Date of Patent: March 2, 2010Assignee: Panasonic CorporationInventors: Kou Sugano, Hiroshi Yoshioka
-
Publication number: 20100021722Abstract: In order to provide an economical process for applying a coating to at least one side, optionally to both sides, of a leather, in which gentle processing of the leather is ensured and hardening thereof is avoided, an aqueous plastic dispersion having compact particles containing a blowing agent being applied to this side or these sides and being allowed to solidify, and hollow microspheres being formed from the thermoplastic compact particles by supplying heat, the invention proposes that, after solidification, the plastic dispersion containing the compact particles is subjected to the action of expanded superheated steam at a temperature between 80° C. and 100° C. (FIG. 2).Type: ApplicationFiled: March 14, 2006Publication date: January 28, 2010Applicant: LANXESS DEUTSCHLAND GMBHInventor: Philipp Schäfer
-
Publication number: 20090305063Abstract: The present invention provides a siliceous film-forming composition having such a small thickness shrinkage ratio that a highly homogeneous siliceous film can be obtained. The invention also provides a trench isolation structure-fabrication process. According to this process, trenches even having very small widths can be homogeneously filled in. The composition contains a solvent and a polysilazane compound obtained by co-ammonolysis of one or a combination of two or more halosilane compounds. The process comprises the steps of coating a surface of a silicon substrate with the above composition, and subjecting the coated substrate to heat-treatment at less than 1000° C. under an oxygen atmosphere or an oxidizing atmosphere containing water vapor, so that the composition is converted into silicon dioxide in the form of a film.Type: ApplicationFiled: September 5, 2007Publication date: December 10, 2009Inventor: Masanobu Hayashi
-
Patent number: 7622145Abstract: Processes for coating implantable medical devices that improve the stability of therapeutic agents contained within the coating.Type: GrantFiled: July 26, 2005Date of Patent: November 24, 2009Assignee: Cordis CorporationInventors: Eugena A. Akerman, Dirk Cleeren, Gerard Llanos, Cynthia A. Maryanoff, Georgios Papandreou, William Rion, Karel Six, Thomas L. Todd
-
Patent number: 7595146Abstract: A method of creating a graded anti-reflective coating (ARC) layer on a thin film is described. The method includes forming the thin film on a substrate, forming an ARC layer on the thin film, and applying a solvent to the ARC layer causing it to swell. A photo-resist layer is formed on the swollen ARC layer. A mixing layer is formed by the diffusion of components from the swollen ARC layer to the photo-resist layer and vice versa. The mixing layer has optical qualities that are distinct from those of either of the ARC layer or the photo-resist layer. The mixing layer forms the graded ARC layer.Type: GrantFiled: March 31, 2008Date of Patent: September 29, 2009Assignee: Tokyo Electron LimitedInventor: Mark H. Somervell
-
Publication number: 20090226598Abstract: An apparatus for depositing coating onto a substrate including a housing having a nozzle including a nozzle orifice, a fluid source configured to deliver coating fluid to the nozzle, and a solvent vapor emitter. The solvent vapor emitter can be located proximate to the nozzle, for example, such as behind the nozzle orifice and/or in a direction substantially parallel to a central axis of the housing. During coating, coating fluid may exit the nozzle and is deposited onto the substrate while the solvent vapor emitter emits solvent vapor proximate to the nozzle orifice.Type: ApplicationFiled: February 2, 2009Publication date: September 10, 2009Applicant: BOSTON SCIENTIFIC SCIMED, INC.Inventors: James Feng, Frank Genovese, James Lee Shippy
-
Patent number: 7563481Abstract: A method of processing a polysilazane film includes a first heat process and a subsequent second heat process performed on a target substrate with a polysilazane coating film formed thereon. The first heat process is performed by supplying water vapor into a process area within a reaction container, which accommodates the target substrate, while setting the process area at a first temperature of from 390° C. to 410° C. The second heat process is performed by supplying water vapor into the process area, while setting the process area at a second temperature of from 600° C. to 800° C.Type: GrantFiled: October 4, 2004Date of Patent: July 21, 2009Assignee: Tokyo Electron LimitedInventors: Shingo Hishiya, Kimiya Aoki, Masahisa Watanabe
-
Publication number: 20090074974Abstract: A method for manufacturing an organic functional layer includes the steps of: forming a coated film of an organic functional material by applying a coating liquid to a substrate by a printing method, the coating liquid including an organic functional material dissolved or dispersed in a first organic solvent; and bringing the coated film into contact with vapor or liquid of a second organic solvent, the second organic solvent having the following properties: chemically non-active; the second organic solvent can be mixed with the first solvent; the second organic solvent can not substantially dissolve the organic functional material; and a vapor pressure of the second organic solvent is higher than that of the first organic solvent at a room temperature.Type: ApplicationFiled: September 16, 2008Publication date: March 19, 2009Applicant: Toppan Printing Co.Inventors: Hajime Yokoi, Yuko Abe, Ryo Shoda, Eiichi Katazume
-
Patent number: 7485343Abstract: A method for preparing a hydrophobic coating by preparing a precursor sol comprising a metal alkoxide, a solvent, a basic catalyst, a fluoroalkyl compound and water, depositing the precursor sol as a film onto a surface, such as a substrate or a pipe, heating, the film and exposing the film to a hydrophobic silane compound to form a hydrophobic coating with a contact angle greater than approximately 150°. The contact angle of the film can be controlled by exposure to ultraviolet radiation to reduce the contact angle and subsequent exposure to a hydrophobic silane compound to increase the contact angle.Type: GrantFiled: April 13, 2005Date of Patent: February 3, 2009Assignee: Sandia CorporationInventors: Eric D. Branson, Pratik B. Shah, Seema Singh, C. Jeffrey Brinker
-
Patent number: 7470448Abstract: System and method for applying glue to a moving web. The system includes a glue nozzle coupled to glue reservoir. The glue nozzle has an outlet opening arranged to apply glue to the moving web while the moving web moves along a direction. A device delivers a substance to a region of the outlet opening. The device delivers the substance behind the outlet opening relative to the direction. The method includes applying the glue onto the moving web while the moving web moves along a direction and feeding the substance behind the outlet opening relative to the direction. This Abstract is not intended to define the invention disclosed in the specification, nor intended to limit the scope of the invention in any way.Type: GrantFiled: January 30, 2004Date of Patent: December 30, 2008Assignee: Hauni Maschinenbau AGInventors: Dietmar Janz, Mathias Blau, Andreas Herburg
-
Patent number: 7455886Abstract: A method of fabricating a nanocomposite material includes generating nanoparticles in-situ with a polymer. A nanocomposite material includes a polymer having nanoparticles characterized by a dimension of not more than 50 nm.Type: GrantFiled: August 22, 2005Date of Patent: November 25, 2008Assignee: Eastman Kodak CompanyInventors: YuanQiao Rao, Samuel Chen, Charles W. Lander, Tomohiro Ishikawa, Theodore R. Vandam
-
Publication number: 20080268059Abstract: A method for immobilizing micro-particles, nano-particles or combinations thereof onto a surface is disclosed. The method includes distributing the micro-particles, nano-particles or combinations thereof onto the surface. The surface and the particles are exposed to thermal treatment, vapor treatment or combinations thereof, thereby adhering at least some of the micro-particles, nano-particles or combinations thereof to the surface. Materials including such immobilized micro-particles, nano-particles or combinations thereof are also disclosed herein.Type: ApplicationFiled: February 27, 2008Publication date: October 30, 2008Inventors: Peter X. Ma, Guobao Wei
-
Patent number: 7435446Abstract: A method of producing a gas barrier laminate is disclosed that comprises: preparing a laminate comprising a plastic substrate, a gas barrier layer formed from a gas barrier layer-forming coating material comprising a polyvinyl alcohol and an ethylene-maleic acid copolymer, and a polymer layer comprising a metal compound of a bivalent or higher metal, wherein the polymer layer is laminated to at least one surface of the gas barrier layer; and heat treating the obtained laminate in the presence of water. In addition, another method of producing a gas barrier laminate is disclosed that comprises: applying a gas barrier layer-forming coating material comprising a polyvinyl alcohol and an ethylene-maleic acid copolymer, either directly onto a plastic substrate, or onto a plastic substrate with an undercoat layer disposed therebetween, and then conducting a heat treatment; and heat treating the obtained laminate in the presence of water comprising a metal compound of a bivalent or higher metal.Type: GrantFiled: April 9, 2004Date of Patent: October 14, 2008Assignee: Toyo Ink Mfg. Co., Ltd.Inventor: Miyuki Kamoshita
-
Patent number: 7335391Abstract: A method of forming a coating for an implantable medical device, such as a stent, is provided which includes applying a composition to the device in an environment having a selected pressure.Type: GrantFiled: December 5, 2003Date of Patent: February 26, 2008Assignee: Advanced Cardiovascular Systems, Inc.Inventor: Stephen D. Pacetti
-
Patent number: 7326437Abstract: A method and apparatus of coating a polymer solution on a substrate such as a semiconductor wafer. The apparatus includes a coating chamber having a rotatable chuck to support a substrate to be coated with a polymer solution. A dispenser to dispense the polymer solution over the substrate extends into the coating chamber. A vapor distributor having a solvent vapor generator communicable with the coating chamber is included to cause a solvent to be transformed into a solvent vapor. A carrier gas is mixed with the solvent vapor to form a carrier-solvent vapor mixture. The carrier-solvent vapor mixture is flown into the coating chamber to saturate the coating chamber. A solvent remover communicable with the coating chamber is included to remove excess solvent that does not get transformed into the solvent vapor to prevent the excess solvent from dropping on the substrate.Type: GrantFiled: December 29, 2003Date of Patent: February 5, 2008Assignee: ASML Holding N.V.Inventor: Andrew Nguyen
-
Publication number: 20080003365Abstract: A substrate processing method which is capable of easily removing residue caused by hydrofluoric acid. By the substrate processing method, a substrate is processed which has a thermal oxide film formed by a thermal oxidation process and a BPSG film containing impurities. In an HF gas feeding step, an HF gas is fed toward the substrate, and in a cleaning gas feeding step, a cleaning gas containing at least NH3 gas is fed toward the substrate fed with the HF gas.Type: ApplicationFiled: June 28, 2007Publication date: January 3, 2008Applicant: TOKYO ELECTRON LIMITEDInventor: Eiichi NISHIMURA
-
Publication number: 20070184362Abstract: A method of manufacturing a color filter forming a black matrix on a substrate, the black matrix defining a plurality of pixels, forming liquid ink layers within the pixels and drying the liquid ink layers, penetrating solvent vapor into surfaces of the dried liquid ink layers to form ink layers have mobile surfaces, and drying the ink layers having the mobile surfaces.Type: ApplicationFiled: June 15, 2006Publication date: August 9, 2007Applicant: SAMSUNG Electronics Co., Ltd.Inventors: Sung-woong Kim, Seung-joo Shin, Seong-jin Kim, Kye-si Kwon, Sang-il Kim
-
Patent number: 7208194Abstract: A film sheet which has a polymer layer formed of a coating solution is drawn from a balk roll and transported toward a rubbing apparatus. Thereby, first and second blowers sequentially disposed respectively apply to the polymer layer an air of temperature 45±2° C. and humidity 50%–60%, and an air of temperature 25±1° C. and humidity 30%–35%. Thus, damages which occurred in transporting and rolling the film sheet are removed. Thereafter, a rubbing action is performed to the film sheet such that the polymer layer has alignment. Then a liquid crystal layer is formed on the polymer layer, to obtain an optical compensation film.Type: GrantFiled: May 9, 2003Date of Patent: April 24, 2007Assignee: Fuji Photo Film Co., Ltd.Inventor: Hidetomo Itoh
-
Patent number: 7205024Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.Type: GrantFiled: February 5, 2004Date of Patent: April 17, 2007Assignee: Tokyo Electron LimitedInventors: Kazuhiro Takeshita, Shinji Nagashima, Makoto Muramatsu, Yoji Mizutani, Kazutoshi Yano, Kyoshige Katayama
-
Patent number: 7115673Abstract: The present photosensitive resin composition 2 comprises a polyamic acid resin 4, a photosensitive agent, a dispersible compound 3 dispersible in the polyamic acid resin 4, and a solvent. The porous resin is obtained by removing the solvent from the photosensitive resin composition 2 to form a composition in which the dispersible compound 3 is dispersed in the polyamic acid resin 4, removing the dispersible compound to make the composition porous, and curing the porous photosensitive resin composition. The porous resin enables forming a fine circuit pattern and has a low dielectric constant and, when used as an insulating layer of a circuit board, brings about improved high frequency characteristics.Type: GrantFiled: December 17, 2003Date of Patent: October 3, 2006Assignee: Nitto Denko CorporationInventors: Amane Mochizuki, Takahiro Fukuoka, Mitsuhiro Kanada, Takayuki Yamamoto, Tomohiro Taruno
-
Patent number: 7090890Abstract: The methods of this invention involve modification of the properties of an organic film after it has been deposited by either adding new components into it from its top or bottom surface, or by causing components to leave the film from its top or bottom surface. In the examples of these methods, the emitting color of light-emitting diodes are modified based on doped polymers by locally introducing dopants causing different color emission into the film by local application of a solution containing the desired dopant to the film surface (by ink jet printing, screen printing, local droplet application, etc.). This overcomes difficulties encountered with the direct patterning of three separately formed organic layers (each which uniformly coats an entire surface when formed) into regions for separate R, G, and B devices due to the sensitivities of the organic materials to chemicals typically used with conventional patterning technologies.Type: GrantFiled: April 12, 1999Date of Patent: August 15, 2006Assignee: The Trustees of Princeton UniversityInventors: James C. Sturm, Thomas R. Hebner, Florian Pschenitzka
-
Patent number: 6989172Abstract: A method of coating a substrate comprises the steps of: (a) providing a substrate in an enclosed vessel, the substrate having a surface portion; (b) at least partially filling the enclosed vessel with a first supercritical fluid so that said first supercritical fluid contacts the surface portion, with the first supercritical fluid carrying or containing a coating component; then (c) adding a separate compressed gas atmosphere to the reaction vessel so that a boundary is formed between the first supercritical fluid and the separate compressed gas atmosphere, said separate compressed gas atmosphere having a density less than said first supercritical fluid; and then (d) displacing said first supercritical fluid from said vessel by continuing adding said separate compressed gas atmosphere to said vessel so that said boundary moves across said surface portion and a thin film of coating component is deposited on said microelectronic substrate.Type: GrantFiled: October 8, 2003Date of Patent: January 24, 2006Assignee: Micell Technologies, Inc.Inventors: James P. DeYoung, James B. McClain, Stephen M. Gross, Doug Taylor, Mark I. Wagner, David Brainard
-
Patent number: 6977098Abstract: A method of and an apparatus for coating a substrate with a polymer solution to produce a film of uniform thickness, includes mounting the substrate inside an enclosed housing and passing a control gas, which may be a solvent vapor-bearing gas into the housing through an inlet. The polymer solution is deposited onto the surface of the substrate in the housing and the substrate is then spun. The control gas and any solvent vapor and particulate contaminants suspended in the control gas are exhausted from the housing through an outlet and the solvent vapor concentration is controlled by controlling the temperature of the housing and the solvent from which the solvent vapor-bearing gas is produced. Instead the concentration can be controlled by mixing gases having different solvent concentrations. The humidity of the gas may also be controlled.Type: GrantFiled: February 28, 2001Date of Patent: December 20, 2005Assignee: ASML Holding N.V.Inventors: Emir Gurer, Tom Zhong, John Lewellen, Ed Lee, Robert P. Mandal, James C. Grambow, Ted C. Bettes, Donald R. Sauer, Edmond R. Ward
-
Patent number: 6915101Abstract: In a vapor fixing device for an electrographic printer or copier, the heated vapor housing is provided such that vapor does not condense at the interior housing walls. A directed stream containing solvent vapor is produced which is directed at a section of the support material.Type: GrantFiled: July 31, 2001Date of Patent: July 5, 2005Assignee: OcéPrinting Systems GmbHInventors: Gerd Goldman, Frank Keidel, Peter Segerer, Günter Rosenstock
-
Patent number: 6905725Abstract: This invention relates to methods of writing and reading information hidden from visual observation and may be used for visualizing hidden images (marks) identifying an object, which provide protection from unauthorized reproduction (forgery). The method of creation and visualization of an optically invisible mark consists in the following. On the surface of the object in question an optically invisible marking image is formed by means of modification of, at least one part of said surface, after which visualization of said image is established. Prior to formation of the optically invisible marking image the surface of the object in question (carrying the applied image) is made into a mirror. Modification is achieved by changing the surface energy of the parts being modified.Type: GrantFiled: April 26, 2001Date of Patent: June 14, 2005Assignee: Valinmark Inc.Inventors: Alexander M. Dykhne, Yuri K. Nizienko
-
Patent number: 6869639Abstract: An improved film coater which utilizes one or more coater or applicators to transfer coating to the outer surfaces of at least one more rolls, which in turn transfers the coating from the roll surface to one or more sides of the web for coating paper is disclosed. The coater or applicator includes a smoothing doctor on the web and downstream of the one or more rolls, and may also utilize humidity from one of steam showers or a humidity enclosure to assist smoothing. The web may run in any direction, but preferably runs upwardly from the roll toward the doctor to reduce “film split” droplets effect. The present invention also reduces the fiber rise and arrange peel pattern on the coated web, resulting in a smooth uniform coated paper.Type: GrantFiled: September 30, 2002Date of Patent: March 22, 2005Assignee: Stora Enso North America Corp.Inventors: Wayne A. Damrau, John F. Bergin
-
Publication number: 20040265493Abstract: Film coating unit has a substrate holder for holding a wafer, a coating solution discharge nozzle, and anti-drying boards opposed to a surface of the wafer. The coating solution is applied to the surface of the wafer in a direction from a front end toward a rear end of the wafer while relatively moving the substrate holder with respect to the coating solution discharge nozzle. During that time, the anti-drying boards are disposed at height of maximum 2 mm from the surface of the wafer so as to form dense atmosphere of a solvent between the surface of the wafer and the anti-drying board. Thereby the coating solution on or over the surface of the wafer is restrained from being dried and a coating film is formed with even thickness on or over the surface of the wafer.Type: ApplicationFiled: June 23, 2004Publication date: December 30, 2004Inventors: Tsuyoshi Mizuno, Yuuichi Mikata, Kimihide Saito
-
Patent number: 6833162Abstract: A process for generating colored nanolithography patterns of parallel lines or cross pattern lines on a glass or plastic substrate, said process consisting the steps of pressing a polycarbonate or aluminium mold obtained from a compact disk on a glass or plastic surface inked with a permanent marker ink for one or more times to create lithographic patterns of parallel colored lines or cross pattern lines. Also, the present invention provides a method for generating colored nanolithography patterns of parallel lines or cross pattern lines on a glass or plastic substrate having dried ink, said process consisting keeping the plastic or glass substrate having the dried ink in a chamber containg ethanol or toluene for about 10 seconds followed by pressing the polycarbonate or aluminium mold obtained from a compact disk on the glass or plastic surface to generate the pattern.Type: GrantFiled: November 26, 2002Date of Patent: December 21, 2004Assignee: Council of Scientific and Industrial ResearchInventors: Arun Chattopadhyay, Anumita Paul, Devasish Chowdhury
-
Patent number: 6812308Abstract: Initiator systems of the present invention include both a complexed initiator and a carboxylic acid decomplexer. For example, dicarboxylic acid decomplexer, carboxylic acid ester decomplexers, and monocarboxylic acid decomplexers (preferably those comprising an alkyl group having at least nine carbon atoms for low odor compositions) are useful in the present invention.Type: GrantFiled: January 21, 2003Date of Patent: November 2, 2004Assignee: 3M Innovative Properties CompanyInventors: Edward J. Deviny, Dean M. Moren
-
Patent number: 6808749Abstract: The present invention provides a method that is capable of crystallizing a very small amount of solution arranged on a substrate at a predetermined position. By ejecting a solution prepared by dissolving a thin film forming material in a solvent using an ink jet method, droplets of the solution are arranged on the substrate. Crystalline nuclei are created in the solution by controlling a partial pressure of a gas made up of the same components as those of the solvent in the vicinity of the droplets immediately after being arranged to, e.g., a value equal to or substantially equal to the saturation vapor pressure. After creation of the crystalline nuclei, the partial pressure of the gas in the vicinity of the droplets is reduced.Type: GrantFiled: October 10, 2002Date of Patent: October 26, 2004Assignee: Seiko Epson CorporationInventors: Katsuyuki Morii, Takashi Masuda
-
Patent number: 6787193Abstract: A method for the formation of a silica film which comprises treating a film in a supercritical medium, the film comprising (A) a siloxane compound and (B) at least one member selected from the group consisting of (B-1) a compound compatible with or dispersible in ingredient (A) and having a boiling or decomposition temperature of from 150 to 500° C. and (B-2) a surfactant. The silica film has excellent mechanical strength showing a dielectric constant of generally 2.2 or lower, and hence is useful as a dielectric film in semiconductor devices and the like.Type: GrantFiled: June 10, 2002Date of Patent: September 7, 2004Assignee: JSR CorporationInventors: Eiji Hayashi, Atsushi Shiota, Michinori Nishikawa, Kinji Yamada
-
Patent number: 6774157Abstract: A system for improving the biocompatibility of medical devices present within a patient's body. In one embodiment, the present subject matter reduces the thrombogenicity of polyurethane materials in contact with the blood of a patient. In one embodiment, the medical device has a polymeric wall and a coating of polyurethane, said coating of polyurethane having the same chemical composition throughout the thickness and displaying an antithrombogenic effect when inserted into a patient's body in contact with blood for a period of at least twenty-four hours. The present subject matter relates to the manufacture and treatment of polymeric materials that may be inserted as medical devices, accessories, implants or replacements into animal bodies, such as the human body.Type: GrantFiled: September 25, 2001Date of Patent: August 10, 2004Assignee: Transoma Medical, Inc.Inventor: Gregory Jay DelMain
-
Patent number: 6749895Abstract: The present invention provides a polymer in which coumarin, a photo-reactive molecule, is grafted onto a polyimide for preparing liquid crystal alignment layer which has a superior alignment property and an excellent thermal stability in photo-alignment, a process for preparing the said grafted polymer, a process for preparing liquid crystal alignment layer by employing the said grafted polymer, and a liquid crystal alignment layer prepared by the process. The polymer of the invention is prepared by mixing a coumarin compound with a polyimide, dissolving the mixture in an organic solvent, adding a catalyst, and stirring under an environment of N2 gas. The polymer of the invention is superior in terms of the thermal stability, which makes possible its universal application for the development of a novel liquid crystal display(LCD).Type: GrantFiled: March 8, 2002Date of Patent: June 15, 2004Assignee: Korea Advanced Institute of Science and TechnologyInventors: Jung-Ki Park, Shi-joon Sung, Jong-Woo Lee
-
Patent number: 6743462Abstract: A method of forming a coating for an implantable medical device, such as a stent, is provided which includes applying a composition to the device in an environment having a selected pressure. An apparatus is also provided for coating the devices. The apparatus comprises a chamber for housing the device wherein the pressure of the chamber can be adjusted during the coating process.Type: GrantFiled: May 31, 2001Date of Patent: June 1, 2004Assignee: Advanced Cardiovascular Systems, Inc.Inventor: Stephen D. Pacetti
-
Publication number: 20030190427Abstract: Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).Type: ApplicationFiled: March 1, 2001Publication date: October 9, 2003Inventors: Emir Gurer, Ed C. Lee, Tom Zhong, Kevin Golden, John Lewellen, Scott Wackerman, Reese Reynolds
-
Publication number: 20030185607Abstract: A device and method for fixing a tone image on a support material (22) uses solvent vapour. A directed stream (34) containing solvent vapour is produced, this stream being directed at a section of the support material (22) using a nozzle device (36).Type: ApplicationFiled: May 27, 2003Publication date: October 2, 2003Inventors: Gerd Goldman, Frank Keidel, Peter Segerer, G?uuml;nter Rosenstock
-
Patent number: 6623686Abstract: The present invention is related to systems and methods for modifying various non-equidimensional substrates with modifying agents. The system comprises a processing chamber configured for passing the non-equidimensional substrate therethrough, wherein the processing chamber is further configured to accept a treatment mixture into the chamber during movement of the non-equidimensional substrate through the processing chamber. The treatment mixture can comprise of the modifying agent in a carrier medium, wherein the carrier medium is selected from the group consisting of a supercritical fluid, a near-critical fluid, a superheated fluid, a superheated liquid, and a liquefied gas. Thus, the modifying agent can be applied to the non-equidimensional substrate upon contact between the treatment mixture and the non-equidimensional substrate.Type: GrantFiled: September 28, 2000Date of Patent: September 23, 2003Assignee: Bechtel BWXT Idaho, LLCInventors: Stuart K. Janikowski, William J. Toth, Daniel M. Ginosar, Charles A. Allen, Mark D. Argyle, Robert V. Fox, W. Alan Propp, David L. Miller
-
Publication number: 20030157253Abstract: A multicomponent film on a substrate can be annealed at higher temperatures in oxygen by using a specifically designed annealing vessel. The vessel is formed of a multicomponent material which has at least all of the components of the first multicomponent material of the film or, in the case where there are nonvolatile components, then the vessel is formed of a second multicomponent material which has at least the same composition of relatively volatile components as the first multicomponent film. As the multicomponent film is annealed for a sufficient time within the vessel the multicomponent film remains in contact with a vapor of the first multicomponent material and the vessel material. This process called bomb annealing prevents loss of volatile components from the film and roughening of the film surface and leads to films with lower dielectric loss. Preferred thin film materials are ferroelectric materials although any material could be used.Type: ApplicationFiled: August 15, 2002Publication date: August 21, 2003Inventors: James Horwitz, Douglas B. Chrisey, Adrian Carter, Manfred Kahn
-
Patent number: 6582891Abstract: A process for reducing roughness from a surface of a patterned photoresist. The process includes exposing a substrate having the patterned photoresist thereon to a vapor, wherein the vapor penetrates into and/or reacts with the surface of the photoresist. The substrate having the patterned photoresist thereon is then heated to a temperature and for a time sufficient to cause the surface of the photoresist to flow and/or react with the vapor wherein the surface roughness decreases. Optionally, the substrate is exposed to radiation during the process to increase the etch resistance of the photoresist and/or facilitate the reaction of the vapor with the surface of the photoresist.Type: GrantFiled: November 14, 2000Date of Patent: June 24, 2003Assignee: Axcelis Technologies, Inc.Inventors: John S. Hallock, Robert D. Mohondro