Abstract: A method for filling a trench within a silicon substrate. There is first provided a silicon substrate having a trench formed therein. There is then formed upon the substrate and within the trench a gap filling silicon oxide trench fill layer employing an ozone assisted thermal chemical vapor deposition (SACVD) method. There is then carried out a densification of the gap filling silicon oxide trench fill layer by annealing in an oxidizing atmosphere at an elevated temperature. Finally, the gap filling silicon oxide trench fill layer is planarized by chemical mechanical polish (CMP) planarization to form the silicon oxide trench filling layer with attenuated surface sensitivity and with an enhanced bulk quality and reduced trench recess at corners.

Abstract: A multi-layer ferroelectric thin film includes a nucleation layer, a bulk layer, and an optional cap layer. A thin nucleation layer of a specific composition is implemented on a bottom electrode to optimize ferroelectric crystal orientation and is markedly different from the composition required in the bulk of a ferroelectric film. The bulk film utilizes the established nucleation layer as a foundation for its crystalline growth. A multi-step deposition process is implemented to achieve a desired composition profile. This method also allows for an optional third composition adjustment near the upper surface of the film to ensure compatibility with an upper electrode interface and to compensate for interactions resulting from subsequent processing.

Abstract: A ceramic color composition which comprises from 5 to 40 wt % of a heat-resistant color pigment powder, from 50 to 94.5 wt % of a glass powder, from 0 to 25 wt % of a refractory filler, and from 0.1 to 40 wt % of at least one whisker-like refractory filler selected from the group consisting of aluminum borate whiskers, &agr;-alumina whiskers, potassium titanate whiskers, zinc oxide whiskers, Na2Ca2P2O18 whiskers, magnesium oxide whiskers, magnesium borate whiskers, basic magnesium sulfate (MgSO4.5MgO.8H2O) whiskers and titanium diboride whiskers.

Abstract: A greensheet comprising an inorganic pigment and an inorganic matrix component is applied to a surface of a glass substrate and fired for fixing. The formed shading film has a portion whose thickness is 90% or more of the maximum thickness of the shading film within the range of 0.5 mm from an edge of the shading film. Thus, a shading film that has distinct end faces and has an excellent thickness uniformity can be formed with a good positional accuracy. Therefore, a lamp having a highly precise light distribution property can be obtained. In addition, a lamp having such a property can be obtained with a few steps and at a low cost.

Abstract: In a method for manufacturing a member for use in a molten metal bath, a sealing solution is applied on a coating formed of oxide system ceramics formed on an outermost surface of a substrate. The sealing solution includes an inorganic colloid compound solution containing an inorganic colloid having a grain diameter in a range of 5-50 nanometers in an amount of 5-50 weight percent, and an inorganic binder. The inorganic binder is mixed at a weight ratio of 0.3-3.0 with respect to a weight of 1.0 of the inorganic colloid. The oxide system ceramic formed on the outermost surface of the substrate is an oxide containing 5% or more of a composite oxide comprising (a) at least one of Al, Ti, V, Cr, Fe, Co, Rh, In and rare earths, which are trivalent metal elements, and (b) at least one rare earth different from that used in (a). The sealing solution on the coating after permeation is then baked.

Abstract: A porous ceramic film having micropores of uniform diameter is formed on a substrate by depositing on the substrate a layer of a ceramic sol containing polyethylene glycol or polyethylene oxide and then heating the substrate. This porous ceramic film is used as a catalyst or catalyst support. When the ceramic of this film is titanium oxide, the film is particularly useful as a photocatalyst for the decomposition of harmful and malodorous substances.

Abstract: A conventional black oxide colorant used for the shielding coat membrane of the D2R type discharge lamps for automobiles has a problem that its wettablity with the granulated glass is not good so that a strong membrane is difficult to be obtained. A paint for the shielding coat membrane comprises polycrystalline silica and Mn-doped ferric oxide as a black colorant, which has a good wettability with the granulated glass and a shielding characteristics so as to improve the membrane strength, thereby providing a lamp with the shielding coat membrane that passes all evaluation test in the view point of the membrane strength, the light transmissivity, the discoloration, the suppression of pealing-off and cracking.

Abstract: The ferroelectric thin film is formed from a liquid composition by the sol-gel processing which has a large amount of polarization, remarkably improved retention and imprint characteristics as compared with a PZT, minute grains and fine film quality, homogeneous electrical properties, and low leakage currents and which is suited for nonvolatile memories. The ferroelectric thin film of the present invention comprising a metal oxide represented by the general formula: (PbV CaW SrX LaY)(ZrZ Ti1−Z)O3, wherein 0.9≦V≦1.3, 0≦W≦0.1, 0≦X≦0.1, 0<Y≦0.1, 0<Z≦0.

Abstract: A method of fabricating an improved spacer comprising the steps of providing a semiconductor substrate that has a gate already formed thereon. A PNO spacer is formed on a sidewall of the gate. The method of forming the PNO spacer comprises first forming a PNO layer on the conductive layer and the semiconductor, and performing an anisotropic etching step on the PNO layer to form the PNO spacer. The step of forming the PNO layer includes chemical vapor deposition (CVD) using PH3, O2, NH3 and N2 as reagents. The step of etching the PNO layer includes plasma etching using CFX+O2 as plasma source. The material of the PNO spacer is a chemical compound PXNYOZ containing phosphorous (P), nitrogen (N) and oxygen (O) and does not contain silicon. Therefore, the PNO spacer can avoid erosion during etching and does not react with Ti during the Salicide process.

Abstract: A method of partially forming oxide layers on a surface of a glass substrate by forming an oxide layer on the surface of the substrate, partially contacting the surface of the oxide layer formed on the substrate with a paste comprising an inorganic compound different from the oxide, organic solvents and silicon powder to partially dissolving the oxide layer with the paste, and removing the dissolved components of the layer together with the paste, by which the oxide layers are partially formed on the surface of the substrate efficiently and surely.

Abstract: Methods and apparatuses for efficiently forming a homogeneous glass layer having uniform thickness and a homogeneous metal layer having uniform thickness are provided. A workpiece is accommodated in a screened container which is rotatable in a predetermined direction. The workpiece in the container is sprayed with an atomized glass slurry or an atomized metal slurry while the container is rotated in order to form a green glass layer or a green metal layer on the workpiece. Simultaneously, hot air is supplied to the workpiece so as to dry the green glass layer or the green metal layer. Thus, the workpiece, typically a ferrite core, can be provided with a homogeneous layer having a uniform thickness. A method for manufacturing an electronic component using the above-described methods and apparatuses is also provided.

Abstract: Silicon carbide fibers having an excellent mechanical strength and a superior heat resistance can be produced by the process in which activated carbon fibers having a thickness of 1 to 30 &mgr;m and a BET specific surface area of 700 to 1500 m2/g are reacted with a silicon and/or silicon oxide gas at 1200 to 1500° C. under a reduced pressure or in an inert gas atmosphere; and the resultant SiC fibers are heat treated in the presence of a boron-containing substance and optionally a carbon-containing substance at 1700 to 2300° C. in an inert gas atmosphere, wherein the fibers may be in the form of a shaped article, for example, a sheet or honeycomb structure.

Abstract: Disclosed is a method of coating a catalyst to a support for use in acrolein oxidation reaction. Metallic salt components of the catalyst including molybdate, vanadate and tungstate are dissolved in a liquid to form a suspension of particles of the catalyst. The precipitation of the catalyst particles is controlled by homogenizing the catalyst particles suspended in the liquid. The phase separation between the catalyst particles and the liquid can be substantially slowed down by the homogenization. Then the catalyst is coated on an inert support by applying the suspension of the catalyst particles to the support. In the suspension, the total weight of water is about 0.8 to about 5 times of the total weight of the metallic salts in the catalyst. This method of preparing suspension minimizes the amount of the liquid required to dissolve the metallic salts, which reduces the amount of time and energy to be used in evaporating the liquid from the suspension.

Abstract: A method of forming a tungsten plug in a semiconductor device includes forming a contact hole in an insulating layer, forming a contiguous titanium layer in the contact hole and on the insulating layer, forming a titanium nitride layer on the titanium layer. forming a thin tungsten layer of about 50 angstroms or less on the titanium nitride layer by CVD (chemical vapor deposition), annealing the structure once the thin tungsten layer has been formed, and depositing additional tungsten by CVD to completely fill the contact hole. The titanium nitride layer can be formed by a discrete CVD process or as a result of the annealing process. Forming a thin tungsten layer by CVD before the contact hole is completely filled in with tungsten is used to stabilize the titanium layer. For instance, a small amount of fluorine from the source gas of the thin tungsten layer diffuses into the titanium layer.

Abstract: A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.

Abstract: A method and apparatus for depositing a low dielectric constant film includes depositing a silicon oxide based film, preferably by reaction of an organosilicon compound and an oxidizing gas at a low RF power level from about 10 W to about 500 W, exposing the silicon oxide based film to water or a hydrophobic-imparting surfactant such as hexamethyldisilazane, and curing the silicon oxide based film at an elevated temperature. Dissociation of the oxidizing gas can be increased in a separate microwave chamber to assist in controlling the carbon content of the deposited film. The moisture resistance of the silicon oxide based films is enhanced.

Abstract: A dense or porous coating of material is deposited onto a substrate by forcing a colloidal suspension through an ultrasonic nebulizer and spraying a fine mist of particles in a carrier medium onto a sufficiently heated substrate. The spraying rate is essentially matched to the evaporation rate of the carrier liquid from the substrate to produce a coating that is uniformly distributed over the surface of the substrate. Following deposition to a sufficient coating thickness, a single sintering step may be used to produce a dense ceramic coating. Using this method, coatings ranging in thickness from about one to several hundred microns can be obtained. By using a plurality of compounds in the colloidal suspension, coatings of mixed composition can be obtained. By using a plurality of solutions and separate pumps and a single or multiple ultrasonic nebulizer(s), and varying the individual pumping rates and/or the concentrations of the solutions, a coating of mixed and discontinuously graded (e.g.

Abstract: A thin glaze layer 2 is formed on a relief surface 1R to a thickness which leaves recesses on the relief surface 1R. A glaze-repellent layer 4 capable of repelling the glaze slurry is then formed on the surface of the thin glaze layer 2 to form a coated substrate. The glaze slurry is affixed to the coated substrate for forming a glaze slurry layer 5 for completing the glazing.

Abstract: A method of forming a zinc or indium oxide layer at the surface of phosphors deposited by serigraphy on a substrate, including the steps of adding the grains to a solution of a serigraphy binder in water, dissolving in the solution a zinc or indium nitrate, performing the serigraphy deposition, and annealing.

Abstract: An integrated circuit is formed containing a metal-oxide ferroelectric thin film. An inert-gas recovery anneal is conducted to reverse the degradation of ferroelectric properties caused by hydrogen. The inert-gas recovery anneal is conducted in an unreactive gas atmosphere at a temperature range from 300° to 1000° C. for a time period from one minute to two hours. Preferably, the metal-oxide thin film comprises layered superlattice material. Preferably, the layered superlattice material comprises strontium bismuth tantalate or strontium bismuth tantalum niobate. If the integrated circuit manufacture includes a forming-gas anneal, then the inert-gas recovery anneal is performed after the forming-gas anneal, preferably at or near the same temperature and for the same time duration as the forming-gas anneal.

Abstract: A hydrophilic treatment by the use of a surface active agent and the like is not required for a base even the surface of which is water-repellent or thermoplastic when a viscous amorphous type titanium peroxide is used for fixing a base as a binder. In addition, a thin layer of a photocatalyst semiconductor, a dielectrical ceramics or an electrical ceraincs can be easily formed by adhering particles of a photocatalyst semiconductor, a dielectrical ceramics or an electrical ceramics to the layer of a viscous amorphous type titanium peroxide, which is a layer as a binder, in a homogeneously floating state gas. Furthermore, a layer of a titanium oxide having a photocatalyst function can be formed when a base is fixed with a viscous amorphous type titanium peroxide.

Abstract: A metal article, in particular a component for a thermal cracking furnace, and a method of protecting the metal from exposure to carbon, the article having a protective coating that has a glass-ceramic surface and an interior having a CTE between that of the glass-ceramic and the metal.

Abstract: The invention aims at providing highly reliable zinc oxide varistors through simple production steps. The varistor is produced by dispersing a powdery raw material comprising 1-40 solar % (in terms of Fe2O3) iron, 0-20 molar % (in terms of Bi2O3) bismuth, and the balance consisting of SiO2 in a solution of a water-soluble binder such as polyvinyl alcohol, and applying the formed dispersion to a molded or calcined zinc oxide varistor to form on the lateral face thereof a lateral high-resistance layer (2) containing Zn2SiO4 as the principal ingredient and a solid solution of iron in Zn7Sb2O12 as the auxiliary ingredient.

Abstract: A neodymium/iron/boron permanent magnet is provided with high corrosion resistance by forming a coating layer of a vitrified sodium silicate on the surface. The vitreous coating layer of sodium silicate is formed by coating the surface of the permanent magnet with an aqueous coating solution of water glass followed by drying of the coating layer and vitrification of the dried coating layer by a heat treatment under specified conditions. Characteristically, the thus formed vitreous coating layer of sodium silicate is subjected to a leaching treatment with water at a specified temperature for a specified length of time in order to remove away residual sodium content leachable in water so that the troubles due to absorption of moisture by the alkali constituent in the sodium silicate coating layer can be largely dissolved.

Abstract: This invention pertains to a method for producing thermally stable multi-layer coatings and the coatings produced therefrom. The multi-layer coating is comprised of a first coating produced from hydrogen silsesquioxane having a thickness of 1.25 to 2.25 &mgr;m and a second coating comprising silicon dioxide having a thickness of at least 100 nm. The method for producing the first coating comprises applying a fillerless hydrogen silsesquioxane resin composition onto a substrate and thereafter heating the hydrogen silsesquioxane resin at a temperature of 150° C. to 500° C. for a sufficient period of time to produce a crack-free coating having a thickness of 1.25 &mgr;m to 2.25 &mgr;m. The second coating is produced by depositing, preferably by PECVD, silicon dioxide over the first coating at a thickness of at least 100 nm.

Abstract: A method of forming a film having enhanced reflow characteristics at low thermal budget is disclosed, in which a surface layer of material is formed above a base layer of material, the surface layer having a lower melting point than the base layer. In this way, a composite film having two layers is created. After reflow, the surface layer can be removed using conventional methods.

Abstract: Silica-based refractories are impregnated with protective material that is more resistant towards attack by corrosive species. The protective material coats the surface of the refractory matrix and fills some of the cavity volume of its pores, crevices, surfaces imperfections and irregularities. The protective material is positioned by impregnating the refractory with a precursor which, under the input of energy, is converted into the corrosion resistant protective material.

Abstract: An apatite glass ceramic is described which is characterized by good chemical stability, a low expansion coefficient and high translucence, and is particularly suitable, by itself or together with glasses or other glass ceramics, as a veneering material for ceramic dental restorations.

Abstract: Densely sintered piece of cutlery, which is produced of a high performance ceramic oxide in an injection molding process and which exhibits a decoration based upon metal oxide, which is fired in at a temperature of between 600° C. and 1,700° C., as well as process for production thereof. This type of cutlery possesses high value appearance which visually distinguishes them from conventional cutlery pieces.

Abstract: A process for the production of insulator-coated black particles, which comprises the steps of (1-a) dispersing particles of silica or a metal oxide in an alcohol-based solvent consisting mainly of an intermediate alcohol to obtain a dispersion of the above particles, (1-c) forming a titanium oxide coating of TiO2 on the surface of each of the particles whose surfaces have been activated in the above step, to obtain titanium oxide-coated particles, (1-d) calcining the titanium oxide-coated particles obtained in the above step in a reducing and/or nitriding atmosphere and thereby blackening the above titanium oxide coatings to obtain black particles, and (1-e) forming an electrical insulator coating on a surface of each of the black particles obtained in the above step, to obtain insulator-coated black particles; characerized in that the process includes a step of (1-b) adding an alkaline aqueous solution to the dispersion obtained instep (1-a) to activate a surface of each of the particles of a metal oxi

Abstract: The surface of a Si substrate is coated with a lower electrode of precious metal (Pt), then a buffer layer comprising an oxide thin film containing Bi is deposited. On the surface of the buffer layer, a thin film of a Bi layer structured ferroelectric substance is formed. Thus, reaction of the Bi layer structured ferroelectric substance with the precious metal coating the Si substrate is avoided during crystallization carried out at a low temperature. Therefore, deviation in composition of the thin film thus formed is suppressed to provide the thin film with a high density. When the thickness of the buffer layer is not greater than five percent of that of the Bi layer structured ferroelectric thin film, electrical characteristics of a capacitor are not deteriorated. When electrical connection is conducted by polycrystalline Si, production of oxide can be avoided by deposition at 650° C.

Abstract: Mixtures of synthesis mixtures of different alkalinity's produce small MFI crystals that are not spherical.

Abstract: A process for coating substrates with a silicon-containing protective layer by chemical vapor deposition with a silicon-containing compound of the structural formula (1): in which R1 is an alkyl group having 1 to 4 carbon atoms, and R2 is hydrogen or an alkyl group having 1 to 4 carbon atoms.

Abstract: A method for producing a lithiated vanadium oxide-coated substrate that includes: (a) preparing a solution that includes (i) a solvent, (ii) a soluble lithium source, and (iii) a soluble vanadium source; (b) applying the solution to a substrate to form a coated substrate; and (c) heating the coated substrate to form an optical quality coating that includes lithiated vanadium oxide.

Abstract: A porcelain enamel coating suitable for use on high-carbon content, heat-rolled sheet steel is provided. The coating includes a ground coat layer for coating directly onto the steel and a cover coat layer. The ground coat layer includes a soft ground coat frit having nickelous oxide dispersed substantially uniformly throughout. The resulting porcelain enamel coating provides good resistance to boiling defects, such as pinholes.