Abstract: A method of forming a thin film strip. The method comprises coating a liner substrate with a wet slurry of film forming ingredients and drying the wet slurry in a drying oven to form a film. A moisture content of the film is measured as the film exits the drying oven and the film is rewound on itself. The rewound film is then stored in a minimal moisture loss environment during a curing process.

Abstract: A process for preparing compacted pigment granules, a process for preparing encapsulated pigment granules, and a process for dyeing landscaping and/or construction materials using the same.

Abstract: Disclosed is a tungsten film coating method using tungsten oxide powders including the steps of contacting the tungsten oxide powders with a metal substrate and carrying out thermal reduction treatment thereon at a temperature of at least 650° C. under a hydrogen atmosphere just to coat the tungsten film on the metal substrate. Accordingly, the present invention enables to provide a simple method of coating a tungsten thin film on a metal substrate using the phenomenon of tungsten migration through vapor phase when thermal reduction treatment is carried out on tungsten oxide powders without using previous chemical or physical vapor depositions requiring expensive precision equipments or causing environmental pollution.

Abstract: A process of coating a refractory turbine part with a protective coating which is ultimately diffusion bonded to the part. A slurry coating material is prepared from a mixture of a silicon alkyd paint and suspended particles of an aluminum or aluminum alloy powder. Parts may be dipped in the slurry and subsequently be heat treated in selected atmospheres and temperatures to diffuse the coating into the surface of the part.

Abstract: To improve the liquid barrier properties of a carpet, a repellency compound, such as a fluorochemical, is applied to the backstitch side or underside of the primary backing layer of a carpet.

Abstract: A metal compound solution in the atomized state is introduced directly into a film-forming chamber of which the pressure is maintained at about 100 Torr or lower by mean of a two-fluid nozzle to form a complex oxide thin-film. For use in the two-fluid nozzle, gases including an oxidative gas are used. To dissolve the metal compound, a solvent having a boiling point under ordinary pressure of about 100° C. or higher is used.

Abstract: A pressure container is filled with a base material having at least part of the surface coated with an organic matrix including at least one member selected from the specific functional groups, and a material solution containing a carbonate material as a material for carbonate film and an organic polymer including at least one member selected from the specific groups. In succession, by supplying CO2 into the pressure container at 2 atm or higher, a carbonate film is deposited on the surface of the organic matrix.

Abstract: A method for forming an elevated temperature durable coating on a surface of a substrate includes applying an aqueous slurry comprising lithium silicate, sodium silicate, potassium silicate, zirconia powder, a fibrous agent, and a magnetic powder to a surface of a substrate in one or more layers of substantially uniform thickness to form a coating. A substantially controlled humidity environment is maintained during application of the aqueous slurry and the coating is ambient dried for a period. A drying agent is applied to the coating and formation of a dry crust is prevented on the coating during ambient drying. After the period, the coating is heat cured.

Abstract: The present invention relates to a method for treating a surface with a gel, as well as to a treatment gel.

Abstract: The present invention involves the hydrothermal treatment of nanostructured films to form high k PMOD™ films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMOD™ precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMOD™ film. A post hydrothermal treatment bake is then performed to remove adsorped water.

Abstract: A C/Si/O composite material having improved oxidation resistance is prepared by impregnating graphite with a crosslinkable silane or siloxane, causing the silane or siloxane to crosslink within the graphite, and heating at 300-1,200° C. in a non-oxidizing gas. The C/Si/O composite material can be efficiently prepared through simple steps, on an industrial scale and at a low cost and will find use as a high-temperature structural material by virtue of oxidation resistance.

Abstract: Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).

Abstract: The sheet resistance of titanium oxide film can be controlled in 109 to 1013 &OHgr;/□ by coating a titanium oxide film on a substrate by sputtering a target containing metallic titanium under an atmosphere at reduced pressure and then subjecting the film to heat treatment under and oxidizing, inert or reducing atmosphere, depending on the oxygen-deficient state of the film. It is possible that a small amount of niobium oxide is contained in the titanium oxide, or a niobium oxide film is provided as an underlying film.

Abstract: Prior to transfer of an wafer W, a mixed gas is being generated and exhausted, thereby fluctuation of concentration and temperature of a solvent component at the beginning of gas introduction into a chamber 3 is suppressed. A step of gelling after the wafer W is carried into an aging unit is divided into several steps. Until a temperature of the wafer W reaches a predetermined treatment temperature, an average concentration of the solvent component in a mixed gas is gradually raised relative to the temperature of the wafer W. Thereby, immediately after the wafer W is transferred into a sealed chamber, the gas of the solvent component is prevented from condensing.

Abstract: A method for sealing a fine groove with a siliceous material, characterized as comprising applying a solution of a perhydropolysilazane having a weight average molecular weight in the range of 3,000 to 20,000 in terms of polystyrene to a substrate having at least one groove having a width of 0.2 &mgr;m or less at its deepest portion and having a ratio of the corresponding depth to the width of 2 or more, to thereby fill and seal the groove with the perhydropolysilazane, and then heating the perhydropolysilazane in an atmosphere containing water vapor to thereby convert the perhydropolysilazane to a siliceous material.

Abstract: A flexible and self-adhesive repositionable dry erasable markerboard is disclosed, together with a method for making such repositionable dry erasable markerboard. The repositionable dry erasable markerboard is made of a second layer, comprising a paper layer, with a first layer, comprising a dry erasable layer applied to the upper surface of the second layer, and a third layer, comprising a pressure sensitive adhesive layer, applied to the lower surface of the second layer. The dry erasable first layer may be either a coating cured under the presence of a nitrogen blanket or a film. The pressure sensitive adhesive of the third layer may be applied to the entire surface of the second layer or selectively zone-coated. The pressure sensitive adhesive of the third layer may be covered with a fourth layer, comprising a removable liner. The paper second layer may be coated and/or printed. The repositionable dry erasable markerboard is flexible and may be rolled into a tube.

Abstract: According to the present invention, the previously known functional material having a self-assembled monolayer on a substrate has a plurality of assembly molecules each with an assembly atom with a plurality of bonding sites (four sites when silicon is the assembly molecule) wherein a bonding fraction (or fraction) of fully bonded assembly atoms (the plurality of bonding sites bonded to an oxygen atom) has a maximum when made by liquid solution deposition, for example a maximum of 40% when silicon is the assembly molecule, and maximum surface density of assembly molecules was 5 silanes per square nanometer. Note that bonding fraction and surface population are independent parameters. The method of the present invention is an improvement to the known method for making a siloxane layer on a substrate, wherein instead of a liquid phase solution chemistry, the improvement is a supercritical phase chemistry.

Abstract: A method for forming a continuous film on a substrate surface that involves depositing particles onto a substrate surface and contacting the particle-deposited substrate surface with a supercritical fluid under conditions sufficient for forming a continuous film from the deposited particles. The particles may have a mean particle size of less 1 micron. The method may be performed by providing a pressure vessel that can contain a compressible fluid. A particle-deposited substrate is provided in the pressure vessel and the compressible fluid is maintained at a supercritical or sub-critical state sufficient for forming a film from the deposited particles. The Tg of particles may be reduced by subjecting the particles to the methods detailed in the present disclosure.

Abstract: An economical process for creating decorative and/or functional finishes on chrome, involves formation of a polyurethane film on the chrome substrate, wherein a strong and durable adhesion between the polyurethane film and the metal substrate is achieved by employing a silane adhesion promoter. Specific embodiments involve the use of an aromatic amine functional silane-coupling agent and/or an epoxy functional silane-coupling agent to achieve excellent adhesion between the polyurethane film and a chrome surface.

Abstract: A method of making an electret includes condensing vapor from the atmosphere of a controlled environment onto a dielectric article and then drying the article to remove the condensate. The dielectric article may be a nonconductive polymeric material, and the condensate may include a polar liquid. The method is particularly useful for forming an electret from a porous material such as a nonwoven fibrous web. The method can enable individual fibers in the web to exhibit at least quasi-permanent electrical charge.

Abstract: A method of forming a coating for an implantable medical device, such as a stent, is provided which includes applying a composition to the device in an environment having a selected pressure. An apparatus is also provided for coating the devices. The apparatus comprises a chamber for housing the device wherein the pressure of the chamber can be adjusted during the coating process.

Abstract: A method of preparing a treated textile, having steps of: (1) preparing a treatment liquid comprising a water- and oil-repellent agent, (2) adjusting pH of the treatment liquid to at most 7, (3) applying the treatment liquid to a textile, (4) treating the textile with steam, and (5) washing the textile with water and dehydrating the textile, wherein the water- and oil-repellent agent contains (A) a fluorine-containing compound which is a fluorine-containing polymer, and (B) a urethane compound and/or (C) a silicon-containing compound, can give a textile which is excellent in water repellency, oil repellency and soil releasability, when the textile is treated with the treatment liquid by an Exhaust process.

Abstract: Herein is disclosed a resin solution, comprising (a) about 0.1 solids wt % to about 50 solids wt % of an organosiloxane resin comprising the formula (RSiO3/2)x(R′SiO3/2)y, wherein R is selected from the group consisting of C4-C24 alkyl, C4-C24 alkenyl, C4-C24 alkoxy, C8-C24 alkenoxy, and C4-C24 substituted hydrocarbon; R′ is selected from the group consisting of —H, C1-C4 unsubstituted hydrocarbon, and C1-C4 substituted hydrocarbon; x is from about 5 mole % to about 75 mole %; y is from about 10 mole % to about 95 mole %; and x+y is at least about 40 mole %; and (b) about 50 solids wt % to about 99.9 solids wt % of a resin comprising at least about 90 mole % of the formula HSiO3/2.

Abstract: The invention provides a method of depositing a soluble material on a substrate comprising the steps of: loading the soluble material into an ink-jet print head; providing a flow of gas between the ink-jet print head and the substrate or adjacent thereto; and ejecting the material from the print head so as to deposit it on the substrate. Also provided is an apparatus for depositing a soluble material on a substrate, comprising an ink-jet print head and gas flow means for providing a flow of gas between the ink-jet print head and the substrate or adjacent thereto. In a preferred arrangement, heating of the substrate during deposition is also provided. In a most preferred arrangement, the deposition is additionally conducted on the basis of continuous formation of a sequence of partially overlapping dots.

Abstract: This invention comprises methods for making nanostructured and nanoporous thin film structures of various compositions. These films can be directly patterned. In these methods, precursor films are deposited on a surface and different components of the precursor film are reacted under selected conditions, forming a nanostructured or nanoporous film. Such films can be used in a variety of applications, for example, low k dielectrics, sensors, catalysts, conductors or magnetic films. Nanostructured films can be created: (1) using one precursor component and two reactions, (2) using two or more components based on differential rates of photochemical conversion, (3) using two precursors based on the thermal sensitivity of one precursor and the photochemical sensitivity of the other, and (4) by photochemical reaction of a precursor film and selected removal of a largely unreacted component from the film.

Abstract: A titanium target assembly includes a titanium sputtering target, a copper or copper alloy backing plate and serving as a support member for the target and a silver or silver alloy coating film and formed between the target and backing plate. The coating film is formed on a surface subjected to cleaning treatment on the bonding side or sides of the target and backing plate by physical vapor deposition. The titanium target and backing plate are solid phase diffusion bonded. The face(s) serve as the bonding plane. The assembly can be manufactured by cleaning the surface(s) of the target and/or backing plate on bonding side(s), forming a coating film on the cleaned surface(s) on bonding side(s) and solid phase diffusion-bonding the target and backing plate, while using surface(s) provided with coated film as the bonding plane. The target assembly possesses high bonding strength and excellent bonding stability and reliability.

Abstract: There is provided a method of forming a silicon dioxide film, which comprises repeating a step of depositing a silicon layer on a silicon substrate to forma silicon dioxide film of a predetermined thickness, and which makes it possible to suitably select the surface roughness of the silicon dioxide film that is formed and the rate of growth of the silicon film that is deposited. According to the method of forming the silicon dioxide film that is proposed above, it comprises a step of depositing any one of polysilicon, epitaxial silicon or amorphous silicon on the silicon substrate or on the silicon dioxide film formed on the silicon substrate by the thermal oxidation treatment to form a silicon film, and a step of thermally oxidizing the silicon film to convert it into a silicon dioxide film, the step of deposition and the step of thermal oxidation being repeated a plural number of times.

Abstract: The present invention relates to a method for preparing a thin film of metal oxide containing one or more metal elements on a substrate. The method includes the steps of applying a sol-gel solution containing the one or more metal elements to a surface of the substrate, drying the sol-gel solution to prepare a dried gel film on the substrate, soaking the dried gel film on the substrate in an alkaline aqueous solution containing at least one kind of metal element among the one or more metal elements in a container, sealing the container, and performing hydrothermal treatment for the dried gel film on the substrate in the sealed container to prepare a thin film of metal oxide on the substrate.

Abstract: The resist application method comprises the steps of: thermal processing for evaporating water from the surface of a wafer 10; making the surface of the wafer 10 hydrophobic with a hydrophobic processing material; and applying a resist onto the wafer 10, and the step of thermal processing to the step of making the surface of the wafer 10 hydrophobic are performed in a dehumidified atmosphere.

Abstract: Substrate that is vapor-deposited with dopant-added ZnO thin film is loaded into a heat-treating chamber, and heat-treated quickly under gas atmosphere to activate the dopant. A thin film phosphor having new luminescence peak can be fabricated by quick-heat-treatment of zinc compound semiconductor under hydrogen atmosphere. This thin film phosphor can replace the conventional blue luminescence using alloy-type ZnO and furthermore can be utilized as blue light emitting material for flat plate display elements such as FED and PDP.

Abstract: A method for coating an article includes preparing a coating precursor paint including aluminum-containing pigment particles, a temporary organic binder comprising an acrylic, and a solvent for the temporary organic binder. The coating precursor paint is applied to a surface of the article and thereafter heated to a temperature of from about 1200° F. to about 2100° F. in a non-oxidizing environment.

Abstract: A process is described for formation of oxide films independent of thickness from precursor films comprising metals, metal oxides, and metal fluorides with properties and structures similar to those previously only obtained in thin films, for example less than about 0.4 microns.

Abstract: A method of independently producing a negative electrode for a lithium secondary cell having thin films of lithium and a sulfide-based inorganic solid electrolyte begins with a negative electrode base material and an inorganic solid electrolyte source material being removed from closed containers in a chamber space, which is substantially inactive to lithium and insulated from air. The materials are transferred into an adjacent thin film deposition system without being exposed to the air. In the system, the source material is used to form a thin film of an inorganic solid electrolyte on the base material, to make the electrode. The electrode is transferred, without being exposed to the air, into a chamber space, which is substantially inactive to lithium, where the electrode is placed into a closed container. Thus, a negative electrode can be produced without being degraded by air.

Abstract: A process for producing a donor sheet for a thin-film formation comprising: while transporting a sheet on which a light-to-heat conversion layer has already been formed, forming a transfer layer on the light-to-heat conversion layer and drying the transfer layer.

Abstract: The present invention relates to oxides on suitable substrates, as converted from nitride precursors.

Abstract: To improve the liquid barrier properties of a carpet, a repellency compound, such as a fluorochemical, is applied to the backstitch side or underside of the primary backing layer of a carpet.

Abstract: Methods for fabricating a layer of oxide on a silicon carbide layer are provided by forming the oxide layer on the silicon carbide layer and then annealing the oxide layer in an N2O environment at a predetermined temperature profile and at a predetermined flow rate profile of N2O. The predetermined temperature profile and the predetermined flow rate profile are selected so as to reduce interface states of the oxide/silicon carbide interface with energies near the conduction band of SiC.

Abstract: Disclosed is a reaction vessel used for oxidizing and decomposing equipment suitable for processing with supercritical water, and methods of manufacturing the reaction vessel. The reaction vessel comprises an oxide film containing a platinum group metal oxide, for example having a fine crystalline structure, and a high corrosion resistance in both oxidizing and reducing atmosphere. The film is formed on a surface of the vessel by performing a pyrolysis reaction in an atmosphere containing water vapor. The oxide film is comprised of at least one platinum group metal oxide selected from Ir, Ru or Rh oxide, and a platinum group metal selected from Ti and Ta.

Abstract: A process for producing a coating on a refractory structural member, in which a noble metal alloy is applied as a coating material to the refractory structural member. The noble metal alloy contains, among other constituents, an oxidizable substance, which includes boron and/or phosphorus and/or antimony and/or arsenic. The refractory structural member and the coating are heated at least once in an oxygen-containing atmosphere to a temperature T that is greater than or equal to the liquidus temperature TL of the noble metal alloy. The oxidizable substance is oxidized during this heating process, and the oxide that has formed is at least partially vaporized. The temperature T is maintained until the proportion of oxidizable substance in the coating is <0.1 atomic percent, and the coated refractory structural member is then cooled.

Abstract: A Mg-doped high-temperature superconductor having low superconducting anisotropy includes a two-dimensional layered structure constituted by a charge reservoir layer and a superconducting layer, wherein some or all atoms constituting the charge reservoir layer are Cu and O atoms, metallizing or rendering the charge reservoir layer superconducting, a portion of the Ca of the CunCan+1O2n constituting the superconducting layer is replaced by Mg, increasing superconductive coupling between CuO2 layers, a thickness of the superconducting layer is increased, and therefore coherence length in a thickness direction is increased based on the uncertainty principle, lowering superconducting anisotropy.

Abstract: Disclosed is an organometallic precursor for forming a metal pattern, having a structure defined by the following Formula 1, and a method of forming the metal pattern using the same, in which the conductive metal pattern is readily formed through an exposing step without using a photo-resist.

Abstract: A liquid coating device and method for coating a coatable composition on a workpiece to form a coating, wherein a parameter indicative of barometric pressure is measured and at least one thickness-affecting process parameter is adjusted in order to compensate for the effects of variations in barometric pressure on coating thickness uniformity.

Abstract: An electronic device substrate, such as a semiconductor silicon wafer or a liquid crystal glass substrate, with a surface which has just undergone cleaning treatment and which is covered with a clean oxide or nitride film which will readily adsorb organic contaminants is treated with an aqueous solution containing choline, or alternatively a similar substrate which has not been cleaned is treated with a treatment solution comprising a SC-1 solution to which choline has been added. Following drying, a surface concentration of choline of between 5×1010 molecules˜7×1012 molecules/cm2 is adsorbed onto the substrate surface. This treatment suppresses organic contamination of the substrate from the atmosphere. As a result, the surface carbon concentration of an electronic device substrate can be suppressed to a value of no more than approximately 3×1013 atoms/cm2, even for manufacturing processes carried out in typical clean rooms with no chemical filters installed.

Abstract: Coated abrasive particle for use in vitreous bond matrices, which particle is coated with between 1 and about 50 coating layers. Each coating layer ranges in thickness from between about 0.1 and 50 microns. Each layer has the composition, MCxNyBzOw, where, M represents one or more of Ti, Si, V, Cr, Zr, Nb, Mo, Hf, Ta, W, Re or a rare earth metal, and w, x, y, and z, each range from between 0 and 3. The outermost coating layer has a concentration of oxygen that is higher by a factor of at least about 2 than the layer in direct contact with the abrasive particle.

Abstract: The present invention provides a method of removing a Cu-contamination from a wafer surface having a Cu-based metal region, comprising the step of: carrying out a cleaning process by use of a cleaning solution free of HF and capable of oxidation to the wafer surface for not only removing the Cu-contamination from the wafer surface but also oxidizing the wafer surface to cause the wafer surface to have a hydrophilicity.

Abstract: A thermal barrier coating for nickel based superalloy articles such as turbine engine vanes and blades that are exposed to high temperature gas is disclosed. The coating includes a columnar grained ceramic layer applied to a platinum modified Ni3Al gamma prime phase bond coat having a high purity alumina scale. The preferred composition of the bond coat is 5 to 16% by weight of aluminum, 5 to 25% by weight of platinum with the balance, at least 50% by weight, nickel. A method for making the bond coat is also disclosed.

Abstract: A method for creating a pattern by applying varying concentrations of pigment in water to a synthetic fabric and allowing the pigment to bleed and preferably to reverse bleed. A pleated window shade having an Aurora Borealis like pattern is also provided. The preferred method comprises the steps of stretching a pleated synthetic fabric window shade vertically, applying pigment in water to the surface of the fabric and allowing the pigment to bleed, then inverting the fabric so that the pigment in solvent bleeds in the opposite direction. Optionally, the method further includes at least one of the steps of applying the solvent, such as for example water, to the pigmented surface before inverting or after inverting thereby inducing additional bleeding, blending, and dilution of the pigment in the wetted area.

Abstract: A turbomachine component includes a silicon nitride substrate and a multi-layer coating bonded to the substrate. The coating includes an interlayer of porous fibrous silicon nitride having a density of between 85-98%. The coating also includes an outer layer formed of an oxide compound, preferably tantalum oxide, that is applied by Electron Beam-Physical Vapor Deposition. The combination of the silicon nitride interlayer and tantalum oxide outer layer serves to protect the substrate from the adverse affects of oxidation, impact by foreign objects and extreme operating temperatures.

Abstract: Processes for constructing textile articles using curable hot melt adhesives is disclosed. In the process, a molten curable hot melt adhesive is applied to a fabric surface along a simulated sewing path and contacted to another fabric surface so that the adhesive is disposed between the fabric surfaces. The adhesive bonds the fabric surfaces so that the article can withstand subsequent fabric processing. The adhesive cures over time, causing an irreversible increase in the initial softening point of the adhesive. The resultant textile articles exhibit good seam strengths, durability and desirable aesthetics.

Abstract: The wafer coated with the resist is deliberately placed in the vapor before being transferred to an aligner that exposes the resist on the wafer, the vapor, for example, the moisture, uniformly adheres onto the resist on the wafer. As a result, the substrate can uniformly be exposed in the following exposing process, and the uniformity of the line width and the like can be improved.