Organosilicon Containing Coating Patents (Class 427/489)
  • Patent number: 10377870
    Abstract: The present invention is a long gas barrier laminate including a base, a functional layer, a smoothing layer, and a gas barrier layer, the functional layer being stacked on one side of the base, the smoothing layer and the gas barrier layer being sequentially stacked on the other side of the base, and a coefficient of static friction between a surface of the functional layer that is situated opposite to the base and a surface of the gas barrier layer that is situated opposite to the base being 0.35 to 0.80; and a method for producing the long gas barrier laminate.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: August 13, 2019
    Assignee: LINTEC CORPORATION
    Inventors: Wataru Iwaya, Koichi Nagamoto, Satoshi Naganawa, Yuuta Suzuki, Takeshi Kondo
  • Patent number: 10336876
    Abstract: The present invention is a long gas barrier laminate including a base, a functional layer, a smoothing layer, and a gas barrier layer, the functional layer being stacked on one side of the base, the smoothing layer and the gas barrier layer being sequentially stacked on the other side of the base, and a coefficient of static friction between a surface of the functional layer that is situated opposite to the base and a surface of the gas barrier layer that is situated opposite to the base being 0.35 to 0.80; and a method for producing the long gas barrier laminate.
    Type: Grant
    Filed: March 27, 2015
    Date of Patent: July 2, 2019
    Assignee: LINTEC CORPORATION
    Inventors: Wataru Iwaya, Koichi Nagamoto, Satoshi Naganawa, Yuuta Suzuki, Takeshi Kondo
  • Patent number: 10329662
    Abstract: An apparatus and method for protecting an interior of a hollow body, where an inlet and exhaust manifold include a port assembly attachable to an opening of the hollow body is provided. The interior of the hollow body is exposed to sequential self-saturating surface reactions by sequential inlet of reactive gases via the port assembly and the opening into the interior of the hollow body, and excess gases is pumped via the opening and the port assembly out from the hollow body.
    Type: Grant
    Filed: March 3, 2014
    Date of Patent: June 25, 2019
    Assignee: PICOSUN OY
    Inventors: Juhana Kostamo, Timo Malinen, Väino Sammelselg, Jaan Aarik, Lauri Aarik
  • Patent number: 10131842
    Abstract: A liquid crystal alignment agent allowing formation of an LCD element having good reliability and less residual image, a liquid crystal alignment film, and an LCD element having the liquid crystal alignment film are shown. The liquid crystal alignment agent includes a polymer (A), a photosensitive polysiloxane (B), and a solvent (C). The polymer (A) is obtained by reacting a mixture that includes a tetracarboxylic dianhydride component (a-1) and a diamine component (a-2). The photosensitive polysiloxane (B) is obtained by reacting a polysiloxane (b-1) having an epoxy group with a cinnamic acid derivative (b-2) and an aromatic heterocyclic derivative (b-3) containing nitride, oxide or sulfide.
    Type: Grant
    Filed: November 24, 2016
    Date of Patent: November 20, 2018
    Assignee: Chi Mei Corporation
    Inventor: Shin-Rong Chiou
  • Patent number: 10117974
    Abstract: A method for preparing and resulting articles of manufacture comprising a substrate having a surface, a bulk beneath the surface, and a grafted polymer layer on the substrate surface, the substrate surface and the grafted polymer layer, in combination, constituting a modified surface having a fibrinogen adsorption of less than about 125 ng/cm2 in a fibrinogen binding assay in which the modified surface is incubated for 60 minutes at 37° C. in 70 ?g/mL fibrinogen derived from human plasma containing 1.4 ?g/mL I-125 radiolabeled fibrinogen.
    Type: Grant
    Filed: November 3, 2014
    Date of Patent: November 6, 2018
    Assignee: ARROW INTERNATIONAL, INC.
    Inventors: Jun Li, Zheng Zhang, Chad C. Huval, Michael A. Bouchard, Christopher R. Loose, Arthur J. Coury
  • Patent number: 9999901
    Abstract: The invention is directed to a method for manufacturing a hydrophobic or superhydrophobic surface comprising the steps of: (a) providing a substrate with a surface roughness Ra between 0.1 and 1.0 ?m and (b) exposing the substrate to a filamentary atmospheric pressure dielectric barrier discharge plasma which is fed by a reaction gas and siloxane-forming material in order to form a superhydrophobic siloxane layer over at least a portion of the surface of the substrate. Step (b) is operated with an electrical excitation frequency of 15,000 Hz to 35,000 Hz and a power density between 0.5 to 10 W·cm?2. The siloxane layer produced in step (b) shows thereby a micro-structure and a nano-structure with droplet “sticking” properties (high water sliding angle).
    Type: Grant
    Filed: October 2, 2013
    Date of Patent: June 19, 2018
    Assignee: Luxembourg Institute of Science And Technology (LIST)
    Inventors: Nicolas Boscher, David Duday, Patrick Choquet, Stephane Verdier
  • Patent number: 9771654
    Abstract: A multilayer structure including a substrate and a first stack of a layer of SiO2 and a layer of material of the SiOxNyHz type positioned between the substrate and the layer of SiO2, in which the layer of SiO2 and the layer of material of the SiOxNyHz type have thicknesses (eB, eA) such that the thickness of the layer of SiO2 is less than or equal to 60 nm, the thickness of the layer of material of the SiOxNyHz type (eB) is more than twice the thickness (eA) of the layer of SiO2, and the sum of the thicknesses of the layer of SiO2 and of the layer of material of the SiOxNyHz type is between 100 nm and 500 nm, and in which z is strictly less than the ratio (x+y)/5, and advantageously z is strictly less than the ratio (x+y)/10.
    Type: Grant
    Filed: September 24, 2012
    Date of Patent: September 26, 2017
    Assignee: Commissariat a l'energie atomique et aux energies alternatives
    Inventors: Stephane Cros, Nicole Alberola, Jean-Paul Garandet, Arnaud Morlier
  • Patent number: 9655926
    Abstract: A process to increase hair growth and hair caliber which uses stem cells derived from acellular extracellular matrix, e.g., from urinary bladder and is combined with a nutrient rich medium of autologously harvested platelet rich plasma has been developed. Preferably, a microneedling device is used to induce “micro wounds” aids in the healing process of the hair bearing skin by converting the stem cells in the matrix to progenitor cells.
    Type: Grant
    Filed: August 21, 2014
    Date of Patent: May 23, 2017
    Inventor: Amiya Prasad
  • Patent number: 9512334
    Abstract: Provided are a modified polysilazane film that is preferable as an intermediate material for forming a predetermined gas barrier film, and a method for producing a gas barrier film having excellent gas barrier properties using such modified polysilazane film as an intermediate material. A modified polysilazane film comprising a substrate and a modified polysilazane layer formed thereon, and a method for producing a gas barrier film obtained through such intermediate material, wherein the modified polysilazane layer has a thickness of a value in the range of 10 to 500 nm, and the modified polysilazane layer has a refractive index of a value in the range of 1.48 to 1.63.
    Type: Grant
    Filed: July 12, 2012
    Date of Patent: December 6, 2016
    Assignee: LINTEC CORPORATION
    Inventors: Satoshi Naganawa, Yuta Suzuki
  • Patent number: 9441133
    Abstract: An organic resin laminate comprising an organic resin substrate and a multilayer coating system thereon has weather resistance and mar resistance. The multilayer coating system includes an outermost layer (I) which is a hard film resulting from plasma polymerization of an organosilicon compound and an intermediate layer (II) which is a cured film of a composite coating composition (2) comprising inorganic oxide nanoparticle and vinyl copolymer.
    Type: Grant
    Filed: August 26, 2011
    Date of Patent: September 13, 2016
    Assignees: EXATEC, LLC, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Mary Gilliam, Koichi Higuchi
  • Patent number: 9435268
    Abstract: A method of controlling volatilization of silicon based components in a gas turbine engine includes measuring, estimating and/or predicting a variable related to operation of the gas turbine engine; correlating the variable to determine an amount of silicon to control volatilization of the silicon based components in the gas turbine engine; and injecting silicon into the gas turbine engine to control volatilization of the silicon based components. A gas turbine with a compressor, combustion system, turbine section and silicon injection system may be controlled by a controller that implements the control method.
    Type: Grant
    Filed: March 24, 2014
    Date of Patent: September 6, 2016
    Assignee: General Electric Company
    Inventors: Andres Jose Garcia-Crespo, John Delvaux, Noemie Dion Ouellet
  • Publication number: 20150132590
    Abstract: The present invention is related to a method for protecting a metal substrate against corrosion comprising the step of: —generating a plasma in a gaseous medium by means of a plasma device; —placing the substrate in contact with the plasma, or in a post-plasma area of said plasma; —introducing in said plasma or in said post-plasma area a corrosion inhibitor along with an organic precursor, thereby depositing a barrier layer comprising the corrosion inhibitor, the deposited layer protecting the metal substrate against corrosion.
    Type: Application
    Filed: May 7, 2013
    Publication date: May 14, 2015
    Inventors: Iris De Graeve, Herman Terryn, François Reniers, Caroline De Vos, Alexandros Kakaroglou, Bernard Nisol, Bruno Van Mele, Guy Van Assche, Gill Scheltjens
  • Patent number: 8945684
    Abstract: The invention relates to a process for depositing an anti-fouling top coat onto the outermost coating layer of a coated optical article, comprising the following steps: a) providing an optical article having two main faces, at least one of which being coated with an outermost layer; b) treating said outermost layer with energetic species resulting in surface physical attack and/or chemical modification; and c) vacuum evaporating a liquid coating material for an anti-fouling top coat by means of an evaporation device, resulting in the deposition of the evaporated coating material onto the treated outermost layer of the optical article, wherein prior to the vacuum evaporation step of the liquid coating material, said liquid coating material has been treated with energetic species.
    Type: Grant
    Filed: November 4, 2005
    Date of Patent: February 3, 2015
    Assignee: Essilor International (Compagnie Generale d'Optique)
    Inventor: Gérald Fournand
  • Patent number: 8906492
    Abstract: A formed article includes a gas barrier layer that is formed of a material including at least an oxygen atom and a silicon atom, a surface area of the gas barrier layer having an oxygen atom content rate of 60 to 75%, a nitrogen atom content rate of 0 to 10%, and a silicon atom content rate of 25 to 35%, based on the total content of oxygen atoms, nitrogen atoms, and silicon atoms, and having a film density of 2.4 to 4.0 g/cm3. A method of producing a formed article includes implanting ions into a surface layer part of a polysilazane compound-containing layer of a formed body that includes the polysilazane compound-containing layer in its surface layer part. An electronic device member includes the formed article. An electronic device includes the electronic device member. The formed article exhibits an excellent gas barrier capability, excellent folding resistance, and excellent transparency.
    Type: Grant
    Filed: March 16, 2010
    Date of Patent: December 9, 2014
    Assignee: LÌNTEC Corporation
    Inventors: Yuta Suzuki, Takeshi Kondo, Shinichi Hoshi
  • Patent number: 8883257
    Abstract: Disclosed herein is a method for producing a plastic container coated with a thin film that is excellent in gas barrier properties, film coloration and film adhesiveness without using an external electrode having a special shape while suppressing deposition of foreign matters such as carbon powders.
    Type: Grant
    Filed: June 25, 2009
    Date of Patent: November 11, 2014
    Assignee: Kirin Beer Kabushiki Kaisha
    Inventors: Masaki Nakaya, Mari Shimizu
  • Patent number: 8846200
    Abstract: The present invention provides a gas barrier film including a base layer, and a gas barrier layer that is provided on at least one side of the base layer, the base layer including a resin having a glass transition temperature (Tg) of more than 130° C., the gas barrier layer being formed of a material that includes at least an oxygen atom and a silicon atom, a surface layer part of the gas barrier layer having an oxygen atom content rate of 60 to 75%, a nitrogen atom content rate of 0 to 10%, and a silicon atom content rate of 25 to 35%, based on a total content rate of oxygen atoms, nitrogen atoms, and silicon atoms, and the surface layer part of the gas barrier layer having a film density of 2.4 to 4.0 g/cm3. Also provided are a process for producing the same, an electronic device member that includes the gas barrier film, and an electronic device that includes the electronic device member.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: September 30, 2014
    Assignee: Lintec Corporation
    Inventors: Masaharu Ito, Takeshi Kondo, Yuta Suzuki
  • Publication number: 20140242364
    Abstract: The invention relates to blends of special copolycarbonates and special polyetherimides or special polyarylsulfones which have good metallizability and to compositions of said copolycarbonate blends optionally containing additives which are selected from the group of thermo stabilizers and release agents, to the use thereof for producing molded parts and to molded parts produced therefrom. The invention further relates to multilayer products comprising a substrate which contains the compositions according to the invention, said products comprising at least one further layer, preferably a metal layer, on at least one side, and to methods for producing said products.
    Type: Application
    Filed: October 5, 2012
    Publication date: August 28, 2014
    Inventors: Alexander Meyer, Rafael Oser
  • Patent number: 8771834
    Abstract: The present invention is a formed article sequentially comprising a base layer, a primer layer that includes a hydroxyl group-containing polymer, and a gas barrier layer, the gas barrier layer being formed of a material that includes at least an oxygen atom and a silicon atom, a surface layer part of the gas barrier layer having an oxygen atom content rate of 60 to 75%, a nitrogen atom content rate of 0 to 10%, and a silicon atom content rate of 25 to 35%, based on a total content rate of oxygen atoms, nitrogen atoms, and silicon atoms, and the surface layer part of the gas barrier layer having a film density of 2.4 to 4.0 g/cm3. According to the present invention, provided is a formed article, a method for producing the same, an electronic device member including the formed article, and an electronic device including the electronic device member, with an excellent gas barrier capability and excellent transparency.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 8, 2014
    Assignee: Lintec Corporation
    Inventors: Kazue Uemura, Takeshi Kondo, Yuta Suzuki
  • Publication number: 20140170400
    Abstract: An organic resin laminate comprising an organic resin substrate and a multilayer coating system thereon has weather resistance and mar resistance. The multilayer coating system includes an outermost layer (I) which is a hard film resulting from plasma polymerization of an organosilicon compound and an intermediate layer (II) which is a cured film of a composite coating composition (2) comprising inorganic oxide nanoparticle and vinyl copolymer.
    Type: Application
    Filed: August 26, 2011
    Publication date: June 19, 2014
    Applicants: SHIN-ETSU CHEMICAL CO., LTD., EXATEC, LLC
    Inventors: Mary Gilliam, Koichi Higuchi
  • Publication number: 20140162054
    Abstract: An embodiment of the present disclosure provides a laminate structure, including a substrate having a surface; a poly(p-xylylene) film over the surface of the substrate; and an interposer layer between the substrate and the poly(p-xylylene) film. The interposer layer is bonded to both the substrate and the poly(p-xylylene) film in a covalent manner, and a ratio of Si—C bonds and Si—X bonds in the interposer layer is in a range from about 0.3 to about 0.8, wherein X is O or N.
    Type: Application
    Filed: December 10, 2013
    Publication date: June 12, 2014
    Applicant: Industrial Technology Research Institute
    Inventors: Tai-Hung Chen, Chun-Hao Chang, Li-Wen Lai, Kun-Wei Lin
  • Publication number: 20140106141
    Abstract: One or more aspects of the disclosure pertain to an article including a film disposed on a glass substrate, which may be strengthened, where the interface between the film and the glass substrate is modified, such that the article has an improved average flexural strength, and the film retains key functional properties for its application. Some key functional properties of the film include optical, electrical and/or mechanical properties. In one or more embodiments, interface exhibits the effective adhesion energy is about less than about 4 J/m2. In some embodiments, the interface is modified by the inclusion of a crack mitigating layer between the glass substrate and the film.
    Type: Application
    Filed: October 14, 2013
    Publication date: April 17, 2014
    Applicant: CORNING INCORPORATED
    Inventors: Robert Alan Bellman, Shandon Dee Hart, Robert George Manley, Prantik Mazumder, Charles Andrew Paulson, Chandan Kumar Saha
  • Patent number: 8623466
    Abstract: Provided a method for producing an oriented-porosity dielectric material on a substrate. The method includes depositing a composite layer on a substrate by vapor deposition comprising a material forming a matrix and a compound comprising chemical groups capable of being oriented under the effect of an electromagnetic field and/or photonic radiation; treating the composite layer to obtain the cross-linking of the material forming a matrix; and subjecting the substrate coated with the composite layer to an electromagnetic field and a photonic radiation.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: January 7, 2014
    Assignee: Commissariat a l'Energie Atomique
    Inventor: Aziz Zenasni
  • Patent number: 8557712
    Abstract: New methods of filling gaps with dielectric material are provided. The methods involve plasma-enhanced chemical vapor deposition (PECVD) of a flowable polymerized film in a gap, followed by an in-situ treatment to convert the film to a dielectric material. According to various embodiments, the in-situ treatment may be a purely thermal or plasma treatment process. Unlike conventional PECVD processes of solid material, which deposit film in a conformal process, the deposition results in bottom-up fill of the gap. In certain embodiments, a deposition-in situ treatment-deposition-in situ treatment process is performed to form dielectric layers in the gap. The sequence is repeated as necessary for bottom up fill of the gap. Also in certain embodiments, an ex-situ post-treatment process is performed after gap fill is completed. The processes are applicable to frontend and backend gapfill.
    Type: Grant
    Filed: December 15, 2008
    Date of Patent: October 15, 2013
    Assignee: Novellus Systems, Inc.
    Inventors: George Andrew Antonelli, Bart Van Schravendijk
  • Patent number: 8455104
    Abstract: The present invention concerns items that contain or consist of a plasma polymer product, consisting of carbon, silicon, oxygen and hydrogen, wherein the ESCA spectrum of the plasma polymer product, with calibration to the aliphatic portion of the C 1s peak at 285.00 eV, in comparison with a trimethylsiloxy-terminated polydimethylsiloxane (PDMS) with a kinematic viscosity of 350 mm2/s at 25° C. and a density of 0.97 g/ml at 25° C., the Si 2p peak has a bond energy that is shifted by 0.44 eV, at most, to higher or lower bond energies, and the O 1s peak has a bond energy that is shifted by 0.50 eV, at most, to higher or lower bond energies.
    Type: Grant
    Filed: April 19, 2007
    Date of Patent: June 4, 2013
    Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung e.V.
    Inventors: Klaus-Dieter Vissing, Gabriele Neese, Matthias Ott
  • Publication number: 20130109263
    Abstract: As described herein, an abrasion resistant nonwoven fabric includes fibers having an external surface covered with a treatment selected from the group consisting of organosilicone compounds applied by plasma treatment in inert gas without the presence of oxygen and acrylic monomers having a Tg greater than or equal to 20 degrees C. applied onto the nonwoven fabric and subsequently surface grafted and crosslinked via exposure to plasma glow discharge or e-beam without the presence of oxygen. The treated fabrics demonstrate improved abrasion resistance over untreated fabrics.
    Type: Application
    Filed: October 31, 2011
    Publication date: May 2, 2013
    Inventors: Ali Yahiaoui, Anthony S. Spencer
  • Patent number: 8414980
    Abstract: A method of fabricating hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas including (a) moving a substrate into an atmospheric plasma area, generating an atmospheric filamentary discharge plasma with a first plasma working gas to obtain a first rough surface of said substrate, (b) exposing plasma treated substrate to air to obtain highly active peroxide on said first rough surface of said substrate, (c) immersing said substrate in a solution of fluorocarbon compound and processing a first stage of graft of a fluorocarbon monomer or oligomer on said substrate to obtain a grafted fluorocarbon monomer or oligomer layer on said first rough surface of said substrate, (d) processing a second stage of graft a fluorocarbon functional group to said grafted fluorocarbon monomer or oligomer layer by generating a carbon tetrafluoride plasma from a second plasma working gas and irradiating said carbon tetrafluoride plasma on said grafted fluorocarbon monomer or oligomer
    Type: Grant
    Filed: August 21, 2009
    Date of Patent: April 9, 2013
    Assignee: Atomic Energy Council-Institute of Nuclear Energy Research
    Inventors: Tien-Hsiang Hsueh, Mien-Win Wu, Chi-Fong Ai
  • Patent number: 8414987
    Abstract: A method for improving an adhesion of an adhesive to a cured silicon-containing surface is provided. The method comprises applying a primer composition to the surface before applying the adhesive; and subjecting the surface to a plasma treatment before or after the composition is applied thereto; wherein the primer composition comprises a polar organic solvent, an acrylic monomer, and an amino-containing silane.
    Type: Grant
    Filed: February 6, 2012
    Date of Patent: April 9, 2013
    Assignee: Great Eastern Resins Industrial Co., Ltd.
    Inventors: Shang-Hsin Guo, Wen-Ching Tsay, Bor-Kai Hsiung
  • Publication number: 20130059105
    Abstract: Methods for producing an at least partially cured layer by applying a layer including a (meth)acrylate-functional siloxane to a surface of a substrate, and irradiating the layer in a substantially inert atmosphere with a short wavelength polychromatic ultraviolet light source having a peak intensity at a wavelength of from about 160 nanometers to about 240 nanometers to at least partially cure the layer. Optionally, the layer is at a curing temperature greater than 25° C. In some embodiments, the layer has a thickness of about 0.1 micrometers to about 1 micrometer. In certain embodiments, the layer is substantially free of a photoinitiator and/or an organic solvent. In some particular embodiments, irradiating the layer with a short wavelength polychromatic ultraviolet light source takes place in an inert atmosphere including no greater than 50 ppm oxygen. The substantially cured layer may be a release layer or a low adhesion backsize (LAB).
    Type: Application
    Filed: August 21, 2012
    Publication date: March 7, 2013
    Inventors: Robin E. Wright, Margaux B. Mitera, Richard L. Walter, Jayshree Seth, Janet A. Venne
  • Publication number: 20130033825
    Abstract: An electrical or electro-optical assembly comprising a substrate comprising an insulating material, at least one conductive track present on at least one surface of the substrate, at least one electrical or electro-optical component connected to at least one of the at least one conductive track, and a continuous coating comprising one or more plasma-polymerized polymers completely covering the at least one surface of the substrate, the at least one conductive track and the at least one electrical or electro-optical component.
    Type: Application
    Filed: June 19, 2012
    Publication date: February 7, 2013
    Applicant: Semblant Limited
    Inventors: Andrew Simon Hall Brooks, Timothy Allan Von Werne
  • Publication number: 20130017341
    Abstract: The present disclosure provides a method for forming a porous colorimetric gas sensing layer. In various embodiments, the method comprises providing a mixture of an organic solvent, a polymer forming material and a gas sensing compound or gas sensing particles. The method additionally comprises depositing the mixture (sprayed or vaporized) on at least a surface portion of a substrate. Thereafter, an atmospheric pressure plasma is applied to the surface portion to form a polymer layer comprising the gas sensing compound or particles. The steps of depositing the mixture and applying the plasma can be repeated multiple times to form a plurality of stacked or superposed polymer layers comprising the gas sensing compound or particles.
    Type: Application
    Filed: July 6, 2012
    Publication date: January 17, 2013
    Applicant: CENTRE DE RECHERCHE PUBLIC - GABRIEL LIPPMANN
    Inventors: Nicolas Boscher, Patrick Choquet, David Duday
  • Patent number: 8304031
    Abstract: The present invention relates to a liquid crystal aligning agent containing a radiation sensitive polyorganosiloxane which is obtained by reacting at least one selected from the group consisting of a polyorganosiloxane having a recurring unit represented by the following formula (1), a hydrolysate thereof and a condensate of the hydrolysis with a cinnamic acid derivative having at least one group selected from the group consisting of a carboxyl group, a hydroxyl group, —SH, —NCO, —NHR (R is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), —CH?CH2 and —SO2Cl: (in the formula (1), X1 is a monovalent organic group having an epoxy group, and Y1 is a hydroxyl group, an alkoxyl group having 1 to 10 carbon atoms, an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms).
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: November 6, 2012
    Assignee: JSR Corporation
    Inventors: Toshiyuki Akiike, Tsutomu Kumagai
  • Publication number: 20120114869
    Abstract: Disclosed is a film-forming method wherein a manganese-containing film is formed on a substrate having a surface to which an insulating film and a copper wiring line are exposed. The film-forming method includes forming a manganese-containing film on the copper wiring line by a CVD method which uses a manganese compound.
    Type: Application
    Filed: January 13, 2012
    Publication date: May 10, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Hidenori MIYOSHI, Masamichi Hara
  • Publication number: 20120098889
    Abstract: A method of forming a water repelling film, includes: a thin film forming step of forming, on a base member, a thin film mainly having Si—O bonds and having hydrophobic substituent groups directly bonded to silicon, using a starting material which is a gas at normal temperature and atmospheric pressure; an irradiation step of irradiating the thin film obtained in the thin film forming step with excitation light in such a manner that the hydrophobic substituent groups are left and OH groups are present in the thin film; and an application step of applying a silane coupling agent onto the thin film obtained in the irradiation step.
    Type: Application
    Filed: October 24, 2011
    Publication date: April 26, 2012
    Inventor: Takami ARAKAWA
  • Patent number: 8158266
    Abstract: Provided is a technology capable of improving the reliability of a semiconductor device using a SiOC film as an interlayer film. In the invention, by forming an interlayer film from a SiOC film having a Si—CH3 bond/Si—O bond ratio less than 2.50% or having a strength ratio determined by the FT-IR of a Si—OH bond to a SiO—O bond exceeding 0.0007, a strength ratio of a SiH bond to a SiO—O bond at a wavelength of 2230 cm?1 exceeding 0.0050 and a strength ratio of a Si—H bond to a SiO—O bond at a wavelength of 2170 cm?1 exceeding 0.0067, the interlayer film has a relative dielectric constant of to 3 or less, and owing to suppression of lowering in hardness or elastic modulus, has improved mechanical strength.
    Type: Grant
    Filed: May 17, 2010
    Date of Patent: April 17, 2012
    Assignee: Renesas Electronics Corporation
    Inventors: Masami Takayasu, Katsuhiko Hotta
  • Patent number: 8105661
    Abstract: A method of forming a porous film on a processing target includes: forming fine organic particles by polymerizing an organic compound in a gaseous phase; mixing the fine organic particles with a silicon compound containing a Si—O bond in a gaseous phase, thereby depositing a film containing the fine particles on the processing target; and removing the fine organic particles from the film.
    Type: Grant
    Filed: November 14, 2006
    Date of Patent: January 31, 2012
    Assignees: ASM Japan K.K., Ulvac, Inc., NEC Corporation
    Inventors: Yasuyoshi Hyodo, Kazuo Kohmura, Nobutoshi Fujii, Nobutaka Kunimi, Keizo Kinoshita
  • Publication number: 20120003483
    Abstract: The present invention relates to a method for coating the surface of a light metal substrate, including the following steps: A. preparing the light metal substrate and optionally cleaning the substrate surface to be coated, B.
    Type: Application
    Filed: October 31, 2008
    Publication date: January 5, 2012
    Inventors: Dirk Salz, Klaus-Dieter Vissing
  • Patent number: 8063237
    Abstract: A process for combining a polythiol reactant and an alkenyl silane reactant to form a polysulfide polysilane. The reactants are combined in a thiol-ene addition process driven by UV radiation. The polysulfide polysilane is then hydrolyzed and may be combined with other hydrolyzed compounds. For coatings, the polysulfide polysilane is hydrolyzed and may optionally be combined with nanoparticles. For bulk materials, the polysulfide polysilane is hydrolyzed, concentrated, and heated to form a high refractive index material which can be used to form optical articles such as lenses.
    Type: Grant
    Filed: December 1, 2010
    Date of Patent: November 22, 2011
    Assignee: Essilor International (Compagnie Generale d'Optique)
    Inventors: John Biteau, Herbert Mosse
  • Patent number: 8029870
    Abstract: A method for coating a fuel cell component is provided. The method includes the steps of providing a fuel cell component, and forming a coating on a surface of the fuel cell component with a plasma jet. The step of forming the coating may include applying a coating precursor to a surface of the fuel cell component and then reacting the coating precursor with the plasma jet to form the coating. The step of forming the coating may also include growing the coating on the surface of the fuel cell component by delivering the plasma jet containing the coating precursor.
    Type: Grant
    Filed: March 24, 2008
    Date of Patent: October 4, 2011
    Assignee: GM Global Technology Operations LLC
    Inventors: Gayatri Vyas Dadheech, Youssef M. Mikhail, Mahmoud H. Abd Elhamid, Jeffrey M. Guzda
  • Patent number: 8025816
    Abstract: This invention provides a novel phosphor material that has better brightness than conventional phosphors using dispersed rare earth ions, and that possesses excellent light resistance, temporal stability, and the like, and a light-emitting device with high brightness comprising such phosphor material and an excitation ultraviolet light source corresponding to the properties thereof. A phosphor comprising a silicon-containing solid matrix and semiconductor superfine particles dispersed therein at a concentration of 5×10?4 to 1×10?2 mol/L, said semiconductor superfine particles having a fluorescence quantum yield of 3% or greater and a diameter of 1.5 to 5 nm, and a light-emitting device including said phosphor and a light source for excitation light with an intensity of 3 to 800 W/cm2.
    Type: Grant
    Filed: May 6, 2003
    Date of Patent: September 27, 2011
    Assignee: National Institute of Advanced Industrial Science and Technology
    Inventors: Norio Murase, Masanori Ando
  • Publication number: 20110195243
    Abstract: A waterproof vapor-permeable multilayer article, comprising at least one first layer made of a material that is vapor-permeable and microporous and is at least partially hygroscopic or can assume hygroscopic characteristics over time, and at least one second layer that is waterproof and vapor-permeable.
    Type: Application
    Filed: April 21, 2011
    Publication date: August 11, 2011
    Applicant: GEOX S.p.A.
    Inventors: Mario POLEGATO MORETTI, Antonio FERRARESE, Bruno MATTIONI
  • Publication number: 20110189422
    Abstract: Method for preparing a substrate comprising an anti-adhesive silicone coating obtained from an anti-adhesive silicone composition based on crosslinked silicone oil(s) with adhesion properties that are modified compared with the initial properties thereof, in which provision is made for a substrate at least partly coated with an anti-adhesive silicone coating and the anti-adhesive silicone coating is cold-plasma-treated, approximately at atmospheric pressure, in an optionally doped nitrogen atmosphere or in an optionally doped carbon dioxide atmosphere, substrate at least partially coated with an anti-adhesive silicone composition, silicone-self-adhesive complex and uses.
    Type: Application
    Filed: December 23, 2008
    Publication date: August 4, 2011
    Inventors: Jean-Marc Frances, Sean Duffy
  • Publication number: 20110189493
    Abstract: The present invention relates to the use of a crosslinked, silicon-containing layer containing, substantially consisting of or consisting of silicon, O, C, H, optionally N which can be produced by plasma polymerization and/or crosslinking of organosilicon liquids by a plasma process and/or UV radiation of a wavelength of less than 250 nm, without using metals of an atomic number of more than 14, as a biocompatible surface, for imparting to a surface or providing a surface with a non-genotoxic effect. The invention also relates to correspondingly coated articles and to processes for the production thereof.
    Type: Application
    Filed: July 31, 2009
    Publication date: August 4, 2011
    Inventors: Matthias Ott, Ingo Grunwald, Dirk Salz, Michael Wagener, Klaus-Dieter Vissing, Wolfgang Hielscher, Christopher Dölle
  • Patent number: 7985188
    Abstract: Methods for processing a vessel, for example to provide a gas barrier or lubricity, are disclosed. First and second PECVD or other vessel processing stations or devices and a vessel holder comprising a vessel port are provided. An opening of the vessel can be seated on the vessel port. The interior surface of the seated vessel can be processed via the vessel port by the first and second processing stations or devices. Vessel barrier, lubricity and hydrophobic coatings and coated vessels, for example syringes and medical sample collection tubes are disclosed. A vessel processing system and vessel inspection apparatus and methods are also disclosed.
    Type: Grant
    Filed: May 12, 2010
    Date of Patent: July 26, 2011
    Assignee: CV Holdings LLC
    Inventors: John T. Felts, Thomas E. Fisk, Robert S. Abrams, John Ferguson, Johathan R. Freedman, Robert J. Pangborn, Peter J. Sagona
  • Patent number: 7964442
    Abstract: The present invention generally provides a method for forming a dielectric barrier with lowered dielectric constant, improved etching resistivity and good barrier property. One embodiment provides a method for processing a semiconductor substrate comprising flowing a precursor to a processing chamber, wherein the precursor comprises silicon-carbon bonds and carbon-carbon bonds, and generating a low density plasma of the precursor in the processing chamber to form a dielectric barrier film having carbon-carbon bonds on the semiconductor substrate, wherein the at least a portion of carbon-carbon bonds in the precursor is preserved in the low density plasma and incorporated in the dielectric barrier film.
    Type: Grant
    Filed: October 9, 2007
    Date of Patent: June 21, 2011
    Assignee: Applied Materials, Inc.
    Inventors: Huiwen Xu, Yijun Liu, Li-Qun Xia, Derek R. Witty, Hichem M'Saad
  • Publication number: 20110143126
    Abstract: The present invention relates to compositions containing copolycarbonates comprising bisphenol A and TMC bisphenol building blocks and specific polyolefins or functionalized polyolefins. The invention also relates to mouldings and injection moulded parts and extrudates obtainable from these compositions, and to processes for the production of the mouldings and extrudates. The invention furthermore relates to multilayer products comprising a substrate containing the polycarbonate according to the invention, which has a further layer at least on one side, preferably a metal layer, and processes for the production of such products.
    Type: Application
    Filed: December 10, 2010
    Publication date: June 16, 2011
    Applicant: Bayer MaterialScience AG
    Inventors: Alexander Meyer, Michael Erkelenz, Rafael Oser, Alexander Karbach
  • Patent number: 7947330
    Abstract: A production method of a film of the present invention is a production method of a film, in which after a polymer base is wound off, metal is evaporated, and an oxygen gas is introduced and the inorganic compound layer is formed in an excitation atmosphere of an organic silicon compound containing gas when an inorganic compound layer is formed on the surface of a polymer base. The production method of a film of the present invention can produce a film having a high gas barrier property against an oxygen gas, a water vapor and the like.
    Type: Grant
    Filed: October 13, 2005
    Date of Patent: May 24, 2011
    Assignee: Toray Industries, Inc.
    Inventors: Kusato Hirota, Yasushi Tateishi
  • Publication number: 20110104387
    Abstract: The invention provides a method of a cold plasma surface process for ferrous absorbent including the following steps. Firstly, a substrate is disposed in a vacuum chamber under a room temperature, and electrical energy is transmitted to the substrate; next, organic silicon monomer is added into the vacuum chamber under the room temperature; at last, the organic silicon monomer is deposited on the surface of the substrate by a plasma polymerization process to form a hydrophobic film on the surface of the substrate.
    Type: Application
    Filed: November 4, 2009
    Publication date: May 5, 2011
    Inventors: Meng-Tan Chiang, Cheng-Hsiang Chuang, Jenq-Der Tsou, Ko-Shao Chen, Shu-Ju Chang, Shu-Chuan Liao
  • Patent number: 7923071
    Abstract: The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention. The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
    Type: Grant
    Filed: February 15, 2006
    Date of Patent: April 12, 2011
    Assignee: RPO Pty Limited
    Inventors: Robert Charters, Dax Kukulj
  • Publication number: 20110063732
    Abstract: A method for generating spontaneously aligned surface wrinkles utilizes control of local moduli-mismatch and osmotic pressure. The method includes modifying the surface of an elastomeric layer to form a superlayer that is stiffer and/or less absorbent than the elastomeric layer. The elastomeric layer is then swollen with a polymerizable monomer, which causes buckling of the superlayer. The monomer is then polymerized, dimensionally stabilizing the surface buckling. The buckled surfaces generated by the method are useful in a wide variety of end-use applications, including microlenses, microlens arrays, compound microlenses, diffraction gratings, photonic crystals, smart adhesives, mechanical strain sensors, microfluidic devices, and cell culture surfaces.
    Type: Application
    Filed: November 11, 2010
    Publication date: March 17, 2011
    Inventors: Alfred J. Crosby, Edwin P. Chan
  • Publication number: 20110045200
    Abstract: The present invention fabricates a hydrophobic and oleophobic polymer fabric through two stages of modification using atmospheric plasmas. The modified fabric has a rough surface and a fluorocarbon functional group having the lowest surface free energy. The fabric has a grafted fluorocarbon monomer layer to enhance the graft efficiency of the fluorocarbon functional groups and its wash fastness. The atmospheric plasmas can be mass produced and less expensively. Hence, the present invention can rapidly modify surfaces of polymeric materials with low cost and good environment protection.
    Type: Application
    Filed: August 21, 2009
    Publication date: February 24, 2011
    Applicant: ATOMIC ENERGY COUNCIL-INSTITUTE OF NUCLEAR ENERGY RESEARCH
    Inventors: Tien-Hsiang Hsueh, Mien-Win Wu, Chi-Fong Ai