Abstract: Plasma processing treatment characteristics of an object are determined nondestructively, prior to plasma processing the object, by placing an indicator layer over at least a portion of the plasma processing surface of the object, so as to generally conform to the shape of the surface. An electrically conductive grid is placed over the indicator layer, and made electrically common with the object. The indicator layer is implanted through the conductive grid, and changes properties responsive to the plasma processing treatment. The implanted indicator layer is thereafter analyzed to determine the treatment characteristics of the indicator layer. Plasma processing spatial distribution and total dosage are determined nondestructively from this information and used to establish the plasma processing program for the object and adjust the plasma processing apparatus as needed.

Abstract: A process for coating a substrate surface with a diamond-like carbon film, in which a starting material gas comprising a hydrocarbon compound is introduced into a Hall accelerator ion source with an inner pressure thereof reduced to 1.times.10.sup.-5 to 1.times.10.sup.-1 Torr, an ion beam in which 80% or more of the ion beams formed have an impinging energy in the range of 100 to 1500 eV is formed in the ion source, and irradiated onto a substrate comprising various kinds of materials in a vacuum chamber, to thereby coat the substrate surface with a diamond-like carbon film with a strong adhesion to an extent such that is can with stand practical application.

Abstract: A hard film 2 is applied to cover an outer circumferential surface of a piston ring 1 by an ion plating process. Either 3 percent to 20 percent by weight of oxygen, or 2 percent to 11 percent by weight of carbon is included in a solid solution state in a crystal structure of CrN in the hard film 2. The Vickers hardness of the hard film 2 is in a range of 1600 to 2200.

Abstract: A method and article of manufacture of a coated iron based alloy. The method includes providing an iron based alloy substrate, depositing a silicon containing layer on the alloy surface while maintaining the alloy at a temperature of about 700.degree. C.-1200.degree. C. to diffuse silicon into the alloy surface and exposing the alloy surface to an ammonia atmosphere to form a silicon/oxygen/nitrogen containing protective layer on the iron based alloy.

Abstract: A solar cell has a semiconductor layer sandwiched between first and second electrodes, wherein a zinc oxide layer containing carbon atoms, nitrogen atoms, or carbon and nitrogen atoms is located between the semiconductor layer and at least one of the first and second electrodes. The density of carbon atoms, nitrogen atoms, or carbon and nitrogen atoms in the zinc oxide layer is constant or continuously changed within the range of 5 atm % or less.

Abstract: A method of forming an oxide film of a high quality 400.degree. C. or below. Ions of an inert gas, whose kinetic energy is 90 or below eV, are applied on the surface of a material of a semiconductor, metal or alloy, and oxygen gas molecules are fed. Thereby, a thin oxide film of the material is formed on the surface of the material.

Abstract: A magnetic storage medium is composed of a non-wettable substrate upon which a transient liquid metal layer is deposited and maintained as a distribution of discontinuous liquid features. An intermediate metal layer is subsequently deposited in-situ in an atmosphere comprising oxygen and at least one inert gas. A magnetic layer is then deposited on the intermediate metal layer. The surface topology and magnetic characteristics of the medium are controlled by adjusting the thickness of the TLM layer and the conditions under which the TLM layer, intermediate metal layer, and magnetic layer are deposited.

Abstract: An improved method for inhibiting tin whisker growth involving the implantation in a tin coating of an ion or ions selected from the group Pb, Bi, Sb, Tl, Cu, Ag, Au, Cd, Mo, Cr, W, Ar, He, Ne and Kr.

Abstract: A light absorbing, low reflectance coating and method of fabricating the coating provided by electron beam evaporation of aluminum onto substrates bombarded with nitrogen ions to produce a randomly textured coating which traps light in a labyrinth. The coating is electrically insulating except for the first few tens of atoms which remain metallic. Absorptance exceeds 90% in the 0.4 to 16 .mu.m region. The coating is flexible and can be deposited on a polymer base.

Abstract: Process for forming diamond-like carbon coatings on metal surfaces to produce increased resistance to penetration, abrasion, and corrosion. A Ni/P coating is formed on an uncoated metal workpiece by-electroless deposition. While the workpiece is heated to harden the Ni/P coating, a vaporized stream of silicon is directed onto the Ni/P coating and the stream of silicon over the Ni/P coating is bombarded with an ion beam such that a NiSi.sub.2 layer is formed at the interface of the Ni/P coating and silicon and a silicon overlayer is formed over the NiSi.sub.2 layer. A vaporized stream of carbon-containing precursor molecules is directed onto the silicon overlayer such that a film of the precursor molecules condenses on the silicon overlayer. The film of precursor molecules is bombarded with an ion beam sufficiently to form a layer of diamond-like carbon on the silicon overlayer. A Ni/B solution or Ni/SiC solution can be used instead of the Ni/P solution, and germanium can be used instead of silicon.

Abstract: A method is disclosed for ion beam coating orthopaedic parts by ion implanting the parts with zirconium ions while the parts are immersed in an oxygen-containing background gas. A highly adherent surface layer of zirconium oxide is formed which provides a low friction, low wear graded interface for the articulating surface. The graded interface is characterized by a blackish color and a transition between pure zirconia and pure substrate material that extends over a thickness of hundreds of Angstroms. In an alternative embodiment, the thickness of the zirconia coating may be increased by also adding a simultaneous evaporation of zirconium metal on the parts.

Abstract: An ion beam deposition process for selective area deposition on a polarized substrate uses a potential applied to the substrate which allows the ionized particles to reach into selected areas for film deposition. Areas of the substrate to be left uncoated are held at a potential that repells the ionized particles.

Abstract: A material growing by deposition is exposed to a low energy beam of ionized dopant. The ion beam energy is sufficient to implant the dopant in the growing surface of the material. This doping method will work well for any dopant that is substantially immobile in the material at the temperature necessary for deposition growth.

Abstract: The object of the present invention is a deposition process of a coating of the ceramic type based on carbides, nitrides, or carbonitrides of metallic elements such as Cr, V, Zr, W, Mo, Co, Mn, Ni, Hf, Ta, Ti, Nb and Fe in which the coating of the ceramic type is deposited at low temperature in the vapour phase on a metallic substrate from organo-metallic precursors wherein, prior to this deposition in the vapour phase and without subsequent placing in contact with an oxidizing and/or polluting atmosphere, a reactive ionic pickling is carried out in a reducing atmosphere.

Abstract: The first invention provides a substrate for a magnetic recording medium, which is prepared by forming a macro-concavo-convex pattern for improving CSS properties and a micro-concavo-convex pattern for improving magnetic properties on the surface, thereby preventing the degradation of the CSS properties brought by the enhancement in friction coefficient and the increase in the area of a protective layer of the medium in contact with a magnetic head, caused by the wearing of the protective layer of the medium.The second invention provides a process of producing a substrate for a magnetic recording medium, which forms the above macro-concavo-convex pattern and micro-concavo-convex pattern in a uniform distribution at the same time.

Abstract: A method for stabilizing and lubricating elastomeric material includes depositing a first material film layer of carbide forming material by high energy level vacuum plating onto the elastomeric material to thereby stabilize free carbon atoms present in the elastomeric material. A second material film layer is deposited by high energy vacuum plating onto the first material film layer to thereby lubricate the elastomeric material.

Abstract: A composite substrate comprises a metal substrate, an electrically insulating ceramic layer formed on the metal substrate, a metal layer formed on the ceramic layer, a first mixed layer formed in an area near the interface between the metal substrate and the ceramic layer, and a second mixed layer formed in an area near the interface between the ceramic layer and the metal layer, each of the mixed layers being composed of the materials of the layers situated on both sides thereof. The composite substrate may comprise a plurality of electrically insulating dissimilar ceramic layers between the metal substrate and the metal layer, and a mixed layer formed in an area near the interface between any two of the adjacent ceramic layers.

Abstract: There is provided a process for improving the resistance to corrosion of stainless steel by ion plating process, the process comprising coating a component-adjusted stainless steel having an Mn/S ratio of less than 100 as substrate with a Ti-layer for surface preparation, coating directly the resulting Ti-layer or indirectly a TiC-layer, which has been coated onto the Ti-layer in advance as intermediate, with a TiN-layer in a total thickness of 1 to 3 .mu.m.The TiN-coated stainless steel according to the present invention may be widely used as corrosion-resistant metallic materials for preparing articles which can be employed under wet conditions such as tableware.

Abstract: A method for ion implantation of relatively high concentrations of alloying elements into a metal target without sputtering the target, in which the target is precoated with a layer of preselected thickness of a light, low sputtering yield element such as carbon, which is ablated during the ion implantation process.

Abstract: A method of applying a compound of a metal and a reactive gas onto a surface by depositing a metal from a liquid metal cluster ion source onto said surface in the presence of a gas on the surface to combine with the deposited metal while isolating the gas from the source of the metal cluster ions.