Abstract: The method for forming an image which comprisesI). providing a mesh fabric substrate, andII). coating said substrate with a light sensitive screen printing composition which comprises in admixtureA). at least one substantially water soluble binder resin component comprising an admixture of polyvinyl alcohol and polyvinyl acetate in an amount of from about 33% to about 90% polyvinyl alcohol and from about 10% to about 67% polyvinyl acetate based on the weight of the resin component, in sufficient amount to bind the composition components in a substantially uniform film when the composition is coated on a substrate and dried; andB). a photosensitive component in sufficient amount to substantially, uniformly photosensitize the composition,C).

Abstract: A process for preparing a positive resist composition, which process includes the steps of condensation reacting a quinone diazide sulfonyl halogenide with a phenol compound, mixing a condensation reaction mixture with a solution of an alkali-soluble resin in a resist solvent and removing impurities from the mixture, whereby the overall processing time can be shortened.

Abstract: A process for the formation of an image comprises(i) electrodepositing on a conductive surface a photosensitive film from an aqueous composition which is a solution or dispersion comprising a mixture of (A) a photosensitive o-quinone diazide such as an o-naphthoquinone diazide sulfonyl ester of a phenol, and (B) an electrodepositable film-forming resin such as a reaction product of a novolak resin, formaldehyde and diethanolamine in (C) an aqueous medium, the composition being substantially free from a resin having both a quinone diazide residue and a carboxyl, phosphonic or sulfonic acid group or amino group in the same molecule,(ii) subjecting the electrodeposited film to radiation in a predetermined pattern, such that exposed areas of the film become more soluble in aqueous base than unexposed areas, and(iii) removing the exposed areas by treatment with an aqueous base.The process is useful in the production of printing plates and printed circuits.

Abstract: The invention relates to desensitized quinone diazide compounds for use as photoactive components in radiation-sensitive compositions, such as, especially, photoresists, which compounds contain microcrystalline cellulose as desensitizing agent.

Abstract: The process of developing an image-wise exposed positive-working photoresist-coated substrate comprising the steps of:(1) coating said substrate with a radiation-sensitive composition useful as a photoresist; said composition comprising an admixture of:(a) at least one alkali-soluble binder resin;(b) at least one photoactive compound; and(c) a sufficient amount of at least one solvent to dissolve (a) and (b); subject to the proviso that said photoactive compound (b) is a mixture of fully and partially esterified o-naphthoquinone diazide esters of a polyhydroxyaromatic compound having at least four hydroxyl groups capable of being esterified by said diazide groups.

Abstract: The invention provides a method for producing a positive working photosensitive element with increased photospeed which comprises coating a formulation containing at least one novolak or polyvinyl phenol resin, at least one o-quinone diazide and a propylene glycol alkyl ether acetate on a substrate, drying, exposing to imaging energy and developing.

Abstract: The invention provides an aqueous electrodeposition coating composition for a positive working resist and an image-forming method using the same. The coating composition is very stable under storage conditions and is capable of resulting in a positive working resist which is specifically useful in the preparation of a printed circuit board with mini-via-holes.

Abstract: This invention discloses a photo- and heat-sensitive recording material excellent in fixability comprising a support having on one side of which at least one photo- and heat-sensitive layer having a haze % of less than 60 and containing a diazo compound and a coupler, wherein either the diazo compound or the coupler is enclosed in a microcapsule and a process to manufacture it.

Abstract: A photosensitive alkali-soluble, thermally-stable fluorinated hydroxy-resinous polyamide or polyimide composition comprising a resin-bound diazo sensitizer incorporated by the reaction of an o-quinone diazide sulfonyl chloride sensitizer compound with a predetermined percentage of the hydroxy groups of the hydroxy-resin binder material. The present compositions are self-sensitized, have adjustable alkali-solubility and provide high speed photoresist compositions for producing relief patterns having good edge definition and high thermal stability.

Abstract: Printing plates having a photosensitive layer coated on a support wherein said photosensitive layer contains a powdered solid adhered to the surface of said plate by means of powdering followed by the application of heat or solvent before exposure. Said powders are capable of being removed from said surface during the developing process.

Abstract: A radiation sensitive plate is provided with a discontinuous covering layer to improve vacuum drawdown. The covering layer is produced by dissolving the material which is to form the covering layer in a solvent so as to form a solution having a conductivity of from 10.sup.3 to 10.sup.9 pSm.sup.-1. The solution is then directed towards the plate while providing a potential of at least 5 kV between the solution and the plate. The potential is the sole disruptive force in the liquid and draws the liquid into ligaments and disrupts the ligaments to form drops of substantially equal size which are then deposited on the plate.

Abstract: A positive-type photosensitive electrodeposition coating composition comprising as a main component a water-soluble or water-dispersible resin containing modified quinonediazidesulfone units represented by the following formula (I) ##STR1## wherein R.sub.1 represents ##STR2## or ##STR3## R.sub.2 represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkyl ether group, andR.sub.3 represents an alkylene group, a cycloalkylene group or an alkylene ether group, in the molecule.

Abstract: The invention provides a photosensitive resin composition specifically useful for microfabrication resist films and photosensitive materials for use in lithographic plates because of excellent flexibility and adhesion, and moreover, when developed, non-exposed parts being of extremely less swelling nature.

Abstract: A process for forming a photoresist pattern comprises the steps of forming a photoresist layer on an underlying layer, forming a contrast enhancement layer for enhancing the contrast of light entering the photoresist layer on the photoresist layer, selectively exposing the photoresist layer through the contrast enhancement layer to light, and developing the photoresist layer to form a photoresist pattern. The contrast enhancement layer is formed as a layer containing a photobleachable agent and a material soluble in both of a nonpolar organic solvent and an aqueous alkali solution. The material is selected from the group of abietic acid, a derivative thereof, a rosin containing abietic acid as the main component, and a derivative thereof. The contrast enhancement layer is treated and removed simultaneously with development for the photoresist. The stability of a coating solution for the contrast enhancement layer is remarkably high.

Abstract: A process for removing unwanted photoresist material from the peripheral areas of a photoresist substrate comprising the steps of:(a) spin coating a photoresist solution onto a surface of a substrate, thereby applying a photoresist coating which comprises a uniform film over substantially all of said substrate surface except for unwanted photoresist material deposits at the peripheral areas of said surface;(b) contacting said peripheral area of the coated substrate with a sufficient amount of a solvent mixture comprising a mixture of ethyl lactate and methyl ethyl ketone present in a volume ratio of about 65:35 to about 25:75, respectively, to selectively dissolve said unwanted deposits without adversely affecting said uniform film; and(c) separating said dissolved deposits from said coated substrate.

Abstract: A process for the production of a heat-sensitive recording material in which a color former causing a color formation reaction and a developer forming color on reaction with the color former are incorporated in a heat-sensitive recording layer, and at least one of the color former and the developer is contained in microcapsules having walls which are impermeable to both the color former and the developer at ordinary temperature but which becomes permeable to at least one of the color former and the developer on heating, where the heat-sensitive recording layer is coated on a support which is then subjected to surface treatment by passing it through a pressure applying apparatus comprising a metallic roll and an elastic roll in such a manner that the heat-sensitive recording layer is in contact with the metallic roll.

Abstract: Disclosed is a radiation-sensitive recording material comprising a support, a radiation-sensitive recording layer and a rough covering layer which is applied by spraying and drying a solution which has substantially the same composition as the recording layer. Due to its rough surface, the material provides for accelerated vacuum contact in the copying process. Also disclosed is a process for producing the radiation-sensitive recording material described above.

Abstract: An electrodepositable photosensitive resin which is a phenolic novolak resin having(i) at least part of the phenolic hydroxyl groups thereof replaced by a quinone diazide sulphonyloxy group, and(ii) at least part of the aromatic rings thereof substituted in a position ortho and/or para to a phenolic hydroxyl group or quinone diazide sulphonyloxy group by a group of formula --CH(R.sup.1)R.sup.2 whereR.sup.1 represents a hydrogen atom, or an alkyl, aryl or carboxylic acid group, andR.sup.2 represents a sulphonic acid group --SO.sub.3 H or a group of formula --A--R.sup.3 --X,R.sup.3 represents an aliphatic, aromatic or araliphatic divalent group which may be substituted by a carboxlic, sulphonic or phosphonic acid group,A represents a sulphur atom or a group of formula --N(R.sup.4)--, where R.sup.4 represents a hydrogen atom or an alkyl group which may be substituted by a carboxylic acid group or by an optionally etherified hydroxyl group, or R.sup.3 and R.sup.

Abstract: A process for preparing a positive-acting photosensitive lithographic printing plate precursor is described, comprising a combination of the steps of (a) electrolytically graining an aluminum plate in a nitric acid-based electrolyte, (b) etching the grained plate with an alkali, (c) anodizing the etched plate, and (d) forming a photosensitive layer containing an o-quinonediazide on the anodized plate.

Abstract: Erasable diazotype second originals on a translucent base have become very popular because they permit correcting, deletions and additions of new information to drawings without the need to redo an entire drawing. A new barrier film composition that acts simultaneously as matrix for the diazotype coating components and controls the ease of mechanical erasure is disclosed. The second originals exhibit almost film like reprographic continuity.

Abstract: A process for preparing a lithographic support, and the printing plate made therefrom, are described, wherein the process comprises the steps of (a) liquid-honing a surface of an aluminum sheet, and (b) electrochemically graining the surface of the aluminum sheet in an electrolyte comprises hydrochloric acid, nitric acid, or a mixture thereof.

Abstract: The specification discloses photosensitizers comprising esters of 1-oxo-2-diazo-naphthalene sulfonic acid and 4-benzyl-1,2,3-trihydroxybenzene, photo resists based thereon and methods for making the necessary intermediates and final products.

Abstract: The invention features a lithographic composition fabricated from a process wherein an acidic novolak resin is neutralized in solution. The solution comprises a common compatible solvent with the other ingredients of the coating composition, such as a positive sensitizer, a color changing dye, and a light activated, acid-releasing compound.

Abstract: A positive photoresist is electrodeposited onto a substrate, exposed to actinic radiation in a predetermined pattern, and then exposed areas are removed by contact with a developer.When the substrate is a metal-faced laminate, the exposed metal surface may be etched and the residual electrodeposited layer removed by contact with a suitable solvent, optionally after a second, general, exposure to actinic radiation.Suitable electrodepositable positive photoresists include o-nitrocarbinol esters and o-nitrophenyl acetals, their polyesters and end-capped derivatives and quinone diazide sulphonyl esters of phenolic novolaks, having salt-forming groups in the molecule, especially carboxylic acid and amine groups.The process is suitable for the production of printing plates and printed circuits, especially circuits on both sides of a liminate sheet linked conductively through metal-lined holes in the sheet.

Abstract: Novel diazonium salts which possess excellent photo speed, good thermal stability, exceptional resistance to discoloration in the D.sub.min areas, rapid development, and allow a wide range of azo dye colors are provided. The diazonium salts are of the following formula: ##STR1## wherein R.sub.1 is tertiary butyl or tertiary amyl; Y is hydrogen, alkyl, hydroxyalkyl, cyanoalkyl, cycloalkyl, aralkyl, alkoxy, aryloxy, aralkoxy, aralkylthio, arylthio, alkylthio, halogen, allyl, allyloxy, allylthio, cyanoalkoxy, hydroxyalkoxy, methoxyalkoxy, trifluoroalkyl, alkylacetylamino, morpholino, or dialkyl carbonamido;R.sub.2 and R.sub.3 are the same or different, and are alkyl, aralkyl, allyl, cyanoalkyl, hydroxyalkyl, hydrogen, acyl, cycloalkyl, beta-chloroalkyl, branched alkyl, or a structure wherein R.sub.2 and R.sub.3 may be linked together to form a heterocyclic structure; andX is an anion.

Abstract: A developer is provided for lithographic plates or the like having a layer including a diazonium material, which developer enhances the effectiveness of the photolysis to which the plate had been subjected, with the result that the exposure time needed for the plate is substantially reduced. The developer, which thus enhances the apparent photospeed of the plate, includes an insolubilizing reactant that reacts with diazonium groups of diazonium materials on the plate that were not removed by photolysis during exposure in order to decrease the solubility of the diazonium material.

Abstract: A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. One method of pretreatment involves preheating the diazo compound to a temperature above about 35.degree. C. up to about 120.degree. C. The improved lithographic plate and the process of preparing plate are claimed.

Abstract: A water developable printing plate is provided with a photopolymerizable system as a latex comprising a water soluble diazopolymer reaction product of a diazoaryl amine and an aldehyde and an aqueous cationic or nonionic dispersion of a water insoluble polymer. The inclusion of a water miscible organic solvent improves the shelf-life of the photopolymerizable system and the printing plate especially under high humidity conditions.

Abstract: A light-sensitive mixture comprising a water-insoluble binder soluble in aqueous alkaline solutions, and the reaction product of a naphthoquinonediazidesulfonyl halide with a mixture composed of a low molecular weight compound having a definite structure and molecular size containing at least one phenolic hydroxyl group, and of a polymeric compound having recurring units, each of which contains at least one phenolic hydroxyl group. The mixture is useful in producing printing plates and photoresists and has the advantage that the naphthoquinonediazidesulfonic acid ester contained therein is non-explosive.

Abstract: A process for the rapid curing of polyurethanes comprising the steps of (a) mixing together a diisocyanate compound, a diol, a polyol, and a diazonium salt and thereafter (b) exposing the resulting mixture to ultraviolet light in the wavelength range of about 2000 to about 4000 Angstroms for a period of about 0.1 second to about 20 minutes at a temperature in the range of about 0.degree. F. to about 180.degree. F.

Abstract: A novel photosensitive film structure comprises a generally continuous minor phase material and a generally discontinuous major phase material. The minor phase includes a photosensitive compound whose solubility relative to a selected solvent changes upon exposure to electrromagnetic radiation, while the major phase is not photosensitive nor soluble in the solvent. The two phases are uniformly interdispersed throughout the film structure. Imagewise exposure to electromagnetic radiation renders the film structure selectively permeable to the selected solvent, and, after development, the film structure exhibits the chemical and physical properties of the major phase material. The film structure finds varied application in the manufacture of graphic arts articles such as lithographi printing plates and photoresists.

Abstract: Photo-fixing heat-sensitive recording media which comprise diazonium salts, couplers and/or basic materials, all of these components being insoluble or sparingly soluble in water. At least one of these components is present in the media in the form of a fine powder. The coupler may be a coupler which has a basic group therein and serves as both a coupler and a basic material.

Abstract: An improved diazotype photoprinting material of high printing speed and its method of preparation are disclosed. The improvement is achieved by distributing through the film coating a substantially uniform distribution of sites having a refractive index substantially different from that of the remainder of the coating. The sites consist of either voids or finely divided solids. Voids are created by contacting the film coating with an aqueous fluid at elevated temperature or an organic solvent for a sufficient period of time to cause a measurable haze to appear on the film. The sites operate to reflect or refract incident light rays during imagewise exposure, and thus increase the optical path length through a given thickness of film.

Abstract: A photopolymerizable coating over a diazo resin provides a high-speed lithographic plate or photoresist while improving the printing life of the plate while making its development simpler than that of most other photopolymer plates. The photopolymer is a cinnamoylated resin which is placed over a diazo based material.

Abstract: A process for the production of a thermo-developable type diazo copying material which comprises the steps of adding a heat fusible color assistant having a melting point of 50.degree. to 150.degree. C. to at least one selected from the group consisting of (a) an aqueous dispersion A containing a diazonium salt and fine particles of a hydrophobic resin consisting of a polymer of vinyl chloride, vinylidene chloride, styrene, acrylic ester, mechacrylic ester or olefin or a copolymer containing at least one member of aforesaid monomers as the constitution unit or a mixture of said polymer with said copolymer and (b) an aqueous solution or dispersion B containing coupler; then applying these aqueous dispersion A and aqueous solution or dispersion B onto a substrate in the order named; and drying same.

Abstract: Presensitized lithographic printing plates, having extended press run life, are provided by electrolytically passing a current through the light-sensitive material in the prefabricated plate. Press runs of up to sixty percent longer than expected are possible with plates which are so treated.

Abstract: This invention relates to novel condensation products, novel light-sensitive condensation products of aromatic diazonium salts, processes for preparation thereof, and to light-sensitive reproduction materials, which latter comprise a support having a reproduction layer containing at least one of the novel light-sensitive products. The light-sensitive condensation products are prepared by first homo-condensing non-diazo containing monomers of the structure R--M--R to form an oligomer. The oligomer is next condensed with an aromatic diazonium salt form the desired novel light-sensitive condensation product. R is a reactive substituent capable of undergoing condensation reactions in acid medium. M is selected from the group consisting of aromatic hydrocarbons, diaryl ethers, diaryl sulfides, diaryl amines, diaryl sulfones, diaryl ketones and diaryl diketones. The resulting novel light-sensitive condensation products have approximately four times the speed of prior art compounds.

Abstract: Light sensitive compounds are deposited onto a hydrophilized metal substrate, which is preferably aluminum, by means of a direct current electromotive force. The light sensitive component is dissolved in a current carrying solvent. Cathodic, hydrophilized, aluminum is passed through the solution and the EMF applied. The result is a light sensitive coating on the hydrophilized substrate surface.

Abstract: A method for preparing a substantially uniformily dyed photosensitive composition useful in the reprographic arts, and compositions useful therefor. A water soluble basic dye is reacted with an organic acid, or an ammonium or alkali metal salt thereof which is preferably monofunctional and the reaction product is substantially uniformly dissolved in a photosensitive diazo composition to impart the desired dye color thereto. The resultant dye colored photosensitive composition may then be coated upon a suitable support, for example, a film or metal sheet, to provide a photosensitized product useful in the reprographic arts, which possesses substantially uniform color characteristics and extended shelf life.

Abstract: When a low molecular weight dihydric or trihydric alcohol is added to a photoresist composition comprising a water-soluble polymer substance and a diazide photo-crosslinking agent, the fluidity of the composition is improved and the drying speed is moderately retarded and it enables the formation of a photoresist layer having a uniform film thickness and uniform drying degree. The said alcohol is exemplified by ethylene glycol, glycerol, etc. and is preferably added in an amount of 5-300 parts by weight per 100 parts by weight of the water-soluble polymer substance.

Abstract: Process for the production of vesicular recording materials. The photographic characteristics such as speed and contrast of vesicular recording materials are improved by treating the light-sensitive vesicular recording layer with an aqueous medium at 5.degree. to 30.degree. C. for at least 45 minutes. The treatment may be effected by spraying with cold water and winding the wet material into a roll. Water marking in the wound roll can be avoided by coating the recording layer prior to water treatment with an antimarking composition such as a solution of nitrocellulose.

Abstract: Presensitized lithographic plates having a diazo layer are prepared such that they exhibit a photospeed rendering them suitable for ultra high speed operations including use within laser platemaking systems. These ultra high speed plates have a diazo layer that is exceedingly thin while still being generally uniformly distributed throughout the plate area. The process includes extracting a significant quantity of diazonium compound or diazonium resin from a diazo layer on a presensitized plate substrate. Plates thus formed are useful in laser exposures for facsimile transmissions, as projection plates, as camera back plates, for step and repeat plate work, and where low intensity light sources are used in conjunction with very large plates.

Abstract: An improved process is provided for attaching layers of hydrophilic, photosensitive materials onto hydrophobic plastic substrates, which comprises forming a layer of a polycrystalline, optically transparent, moisture barrier material on the substrate, followed by depositing thereon a layer of a hydrophilic, polar material, prior to depositing the photosensitive layer thereon. The process is especially suitable for the fabrication of pre-holographic elements and holograms. Holograms are fabricated by exposing and developing latent images in the photosensitive layer of pre-holographic elements and attaching to the photosensitive layer by an optical adhesive a protective cover layer comprising a plastic substrate coated with the moisture barrier material and the hydrophilic material. Additional moisture barrier protection may optionally be provided by forming a combination of moisture barrier layers and hydrophilic layers on the outer surfaces of the plastic substrates.

Abstract: A photopolymerizable coating over a diazo resin provides a high-speed lithographic plate or photoresist while improving the printing life of the plate while making its development simpler than that of most other photopolymer plates. The photopolymer is a cinnamoylated polyvinyl alcohol resin which is placed over a diazo based material.

Abstract: This invention relates to a recording material containing diazo compounds, in particular a microfilm, comprising a film base which is at least partially pervious to visible radiation, a light-sensitive layer and, on the reverse side of the film base, a filter layer which absorbs light in the long-wave ultraviolet spectral range and in the short-wave visible spectral range, wherein the filter layer is composed of a polymer which is insoluble or has been rendered insoluble by cross-linking, and of at least one yellow to orange-colored dye which is compatible with the constituents of the polymer and absorbs light in the range between about 360 nm and about 500 nm. The invention also relates to a process for the manufacture of a recording material.

Abstract: A diazo microfilm which is resistant to fading upon exposure to strong light for extended periods of time is provided. The fade-resistant diazo microfilm is produced by saponifying a cellulose alkanoate film to an extent defined by certain infrared absorption parameters.

Abstract: This invention relates to a light-sensitive copying material comprising a coating support and an optically homogeneous light-hardenable coating which contains a condensation product of an aromatic diazonium salt and a water-insoluble macromolecular polymer, wherein the coating is applied from a stable dispersion of the water-insoluble polymer under conditions such that after drying an optically homogeneous coating is formed. The invention also relates to a process for the manufacture of a light-sensitive copying material containing the optically homogeneous light-hardenable coating.

Abstract: A method of making a presensitized lithographic plate is disclosed wherein a steel support having a tin-plated layer is depassivated and coated with a photosensitive product. Depassivation is accomplished by immersion of the support in an electrolytic bath of sodium carbonate. The electrolysis is performed with the support as a cathode and reversed so that the support is an anode of the bath. Preferably, the bath is an aqueous solution of 50 grams per liter of sodium carbonate at a temperature of 65.degree. C. with a current density of the bath being approximately 2.5 amperes per dm.sup.2. It is also contemplated that the depassivated tin-plated layer may be coated with copper before application of the photosensitive product. This can be accomplished by immersion in an electrolytic bath of copper cyanide. Preferably, the copper cyanide bath is at a temperature of 65.degree. C. with immersion occurring for approximately 3 minutes with the support in the cathode position and having a current density of 2.

Abstract: Diazonium compounds particularly useful for the preparation of lithographic printing plates, a process for the preparation of this compound and printing plate, and for the use of the plate; and a lithographic plate presensitized with this compound, are described.

Abstract: A base plate adapted to be coated with a light-sensitive diazo resin, and a lithographic plate which may be prepared therefrom. The base plate includes a substrate comprising a metal support and having a water-wettable, hydrophilic surface. Over the substrate and in direct contact with the surface is a layer comprising an oleophilic ink-receptive organic resin adapted to receive a light-sensitive coating comprising a diazo resin sensitizer. The oleophilic resin layer is permeable to the sensitizer so that it may penetrate substantially through the resin layer to establish sufficient contiguity between the diazo resin and the substrate so that both the light-sensitive coating and the organic resin layer become anchored to the substrate in the areas of exposure when the light-sensitive coating is exposed to light. Methods of preparing the base plate and lithographic plate are also disclosed.