Nonsilver Image Patents (Class 430/17)
  • Patent number: 9718966
    Abstract: This invention is directed to a polymer thick film conductor composition that provides a better conductor when dried at 80° C. than when dried at 130° C., in contrast to typical PTF conductors. More specifically, the polymer thick film conductor may be used in applications where low temperature curing is required.
    Type: Grant
    Filed: June 11, 2015
    Date of Patent: August 1, 2017
    Assignee: E I DU PONT DE NEMOURS AND COMPANY
    Inventor: Jay Robert Dorfman
  • Patent number: 9653694
    Abstract: A precursor dielectric composition comprises: (1) a photocurable or thermally curable thiosulfate-containing polymer that has a Tg of at least 50° C. and comprises: an organic polymer backbone comprising (a) recurring units comprising pendant thiosulfate groups; and organic charge balancing cations, (2) optionally, an electron-accepting photosensitizer component, and (3) one or more organic solvents in which the photocurable or thermally curable thiosulfate-containing polymer is dissolved or dispersed. These precursor dielectric compositions can be applied to various substrates and eventually cured to form dielectric compositions or layers for various types of electronic devices.
    Type: Grant
    Filed: June 11, 2014
    Date of Patent: May 16, 2017
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Deepak Shukla, Kevin M. Donovan, Mark R. Mis
  • Patent number: 9362512
    Abstract: Insulating layer material comprising: polymer compound of a repeating unit containing a cyclic ether structure and a repeating unit of the formula: wherein R5 represents a hydrogen atom or a methyl group; Rb b represents a linking moiety which links the main chain of the polymer compound with a side chain of the polymer compound and optionally has a fluorine atom; R represents an organic group capable of being detached by an acid; R? represents a hydrogen atom or a monovalent organic group having from 1 to 20 carbon atoms and optionally having a fluorine atom; the suffix b represents an integer of 0 or 1, and the suffix n represents an integer of from 1 to 5; when there are two or more Rs, they may be the same or different; and when there are two or more R's, they may be the same or different; and tungsten (V) alkoxide.
    Type: Grant
    Filed: December 12, 2012
    Date of Patent: June 7, 2016
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Isao Yahagi
  • Patent number: 9329481
    Abstract: A conductive metal pattern is formed using a reactive polymer that can provide pendant sulfonic acid groups upon exposure to radiation, and (2) pendant groups that are capable of providing crosslinking. The polymeric layer is patternwise exposed to radiation to provide first exposed regions that are then contacted with electroless seed metal ions to form a pattern of electroless seed metal ions, followed by contact with a halide. At least some of the electroless seed metal halide can be exposed to form second exposed regions. The polymeric layer can be contacted with a reducing agent either: (i) to develop the electroless seed metal image in the second exposed regions, or (ii) to develop all of the electroless seed metal halide in the first exposed regions, and optionally contacted with a fixing agent. The electroless seed metal nuclei in the first exposed regions can be electrolessly plated with a conductive metal.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: May 3, 2016
    Assignee: EASTMAN KODAK COMPANY
    Inventor: Mark Edward Irving
  • Patent number: 9235128
    Abstract: Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a ?max of at least 150 nm and up to and including 450 nm. The -A- recurring units are present in the reactive polymer in an amount of up to and including 98 mol % based on total reactive polymer recurring units. The -B- recurring units comprise pendant groups that provide crosslinking upon generation of the aromatic sulfonic acid groups in the -A- recurring units. The -B- recurring units are present in an amount of at least 2 mol %, based on total reactive polymer recurring units.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: January 12, 2016
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Allan Wexler, Grace Ann Bennett, Kimberly S. Lindner
  • Publication number: 20150140481
    Abstract: Various patterning methods utilize certain crosslinkable reactive polymers comprise -A- and -B- recurring units, arranged randomly along a backbone. The -A- recurring units comprise pendant aromatic sulfonic acid oxime ester groups that are capable of providing pendant aromatic sulfonic acid groups upon irradiation with radiation having a ?max of at least 150 nm and up to and including 450 nm. The -A- recurring units are present in the reactive polymer in an amount of up to and including 98 mol % based on total reactive polymer recurring units. The -B- recurring units comprise pendant groups that provide crosslinking upon generation of the aromatic sulfonic acid groups in the -A- recurring units. The -B- recurring units are present in an amount of at least 2 mol %, based on total reactive polymer recurring units.
    Type: Application
    Filed: November 20, 2013
    Publication date: May 21, 2015
    Inventors: Allan Wexler, Grace Ann Bennett, Kimberly S. Lindner
  • Patent number: 8865379
    Abstract: Generally, polymeric members and laser marking methods for producing visible marks on polymeric members, such as on thin and/or curved surfaces. The laser marking methods can include methods of laser marking straws with the step of matching laser source properties to the properties of straws being marked or with the step of laser marking straws having photochromic dyes.
    Type: Grant
    Filed: April 17, 2012
    Date of Patent: October 21, 2014
    Assignee: Inguran, LLC
    Inventors: Johnathan Charles Sharpe, Thomas B. Gilligan, Richard W. Lenz, Juan Moreno
  • Publication number: 20140287349
    Abstract: A thiosulfate polymer composition includes an electron-accepting photosensitizer component, either as a separate compound or as an attachment to the thiosulfate polymer. The thiosulfate polymer composition can be applied to various articles, or used to form a predetermined polymeric pattern after photothermal reaction to form crosslinked disulfide bonds, removing non-crosslinked polymer, and reaction with a disulfide-reactive material. Such thiosulfate polymer compositions can also be used to sequester metals in nanoparticulate form, and as a way for shaping human hair in hairdressing operations.
    Type: Application
    Filed: January 20, 2014
    Publication date: September 25, 2014
    Inventors: Deepak Shukla, Mark R. Mis, Dianne Marie Meyer
  • Publication number: 20140147392
    Abstract: Water soluble marking compounds comprising a transition metal oxyanion and at least one ammonium cation, comprising a nitrogen atom at least one further group selected from the group consisting of OH, COOH, NH2, NHC1-5 alkyl, and N(C1-5 alkyl)2, wherein the two C1-5 alkyl may be the same type of alkyl or different alkyls, may be used to obtain clear imageable coatings.
    Type: Application
    Filed: August 12, 2011
    Publication date: May 29, 2014
    Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.
    Inventors: Adam O'Rourke, Martin Walker, Richard Cook, Anthony Jarvis
  • Publication number: 20140147775
    Abstract: The disclosed invention relates to the use of molybdenum (VI) peroxo complex containing an amino acid, such as MoO(O2)2(GLY)(H2O), in marking applications, as well as to ink formulations comprising such complexes.
    Type: Application
    Filed: August 12, 2011
    Publication date: May 29, 2014
    Applicant: TETRA LAVAL HOLDINGS & FINANCE S.A.
    Inventors: Anthony Jarvis, Martin Walker, Adam O'Rourke, Richard Cook
  • Patent number: 8197943
    Abstract: A photocrosslinkable composition has polyorganosiloxane P having a viscosity of at least 10 000 mPa·s at 25° C., wherein the polyorganosiloxane P has an acrylated silicone oil as a crosslinking agent, and a photoinitiator, the chemical structure of which comprises a diaryl ketone group.
    Type: Grant
    Filed: December 30, 2008
    Date of Patent: June 12, 2012
    Assignee: Nexans
    Inventors: Olivier Pinto, Jérôme Alric, Maud Thivillon
  • Patent number: 8168372
    Abstract: Novel, developer-soluble, hard mask compositions and methods of using those compositions to form microelectronic structures are provided. The composition comprises the compound a compound for controlling development rate, and a crosslinking agent in a solvent system. The methods involve applying the composition to a substrate and curing the composition. An imaging layer is applied to the composition, followed by light exposure and developing, during which the light-exposed portions of the imaging layer are removed, along with portions of the hard mask composition adjacent said light-exposed portions. The size of the hard mask composition structures are controlled by the development rate, and they yield feature sizes that are a fraction of the imaging layer feature sizes, to give a pattern that can ultimately be transferred to the substrate.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: May 1, 2012
    Assignee: Brewer Science Inc.
    Inventor: Sam X. Sun
  • Publication number: 20120094222
    Abstract: A photocurable composition includes: (A) an epoxy group-containing polymer compound having repeating units represented by the following formula (1), where R1 to R4 are each a hydrocarbon group, m is an integer of 1 to 100, a, b, c and d are each 0 or a positive number, such that 0<(c+d)/(a+b+c+d)?1.0, and X and Y are each the formula (2) or (3), provided that at least one group of the formula (3) is present, (B) a photoacid generator represented by the formula (8) and (C) a solvent.
    Type: Application
    Filed: October 12, 2011
    Publication date: April 19, 2012
    Inventors: Kyoko SOGA, Takanobu Takeda, Hideto Kato
  • Patent number: 8021690
    Abstract: The present invention provides solid preparations having two or more colors or a pattern of two or more different colors which can solve the problems of the prior art including the complexity of production processes and the low strength of solid preparations. Specifically, an object of the present invention is to provide solid preparations coated with a continuous film coating layer having two or more different colors or a pattern of two or more different colors which preparations are obtained by irradiating a part of the film coating layer containing one or more colorants with light, a process for the preparation of such solid preparations, and a film coating agent therefor.
    Type: Grant
    Filed: April 26, 2001
    Date of Patent: September 20, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroyasu Kokubo, Sakae Obara
  • Patent number: 7452638
    Abstract: A radiating-sensitive composition and negative-working imageable element includes a free radically polymerizable component, an initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation, a radiation absorbing compound, and particles of a poly(urethane-acrylic) hybrid that are distributed throughout the composition forming an imageable layer in the element. Imaging can be accomplished at a wide range of wavelengths from about 150 to about 1500 nm, and development can be accomplished using an organic solvent-based developer, warm water, plate cleaner, or on-press using a combination of a lithographic printing ink and a fountain solution.
    Type: Grant
    Filed: September 18, 2006
    Date of Patent: November 18, 2008
    Assignee: Eastman Kodak Company
    Inventors: Jianfei Yu, Kevin B. Ray, Shashikant Saraiya, Thomas R. Jordan, Paul R. West
  • Patent number: 7435515
    Abstract: A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body.
    Type: Grant
    Filed: December 3, 2004
    Date of Patent: October 14, 2008
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Hironori Kobayashi, Masato Okabe, Manabu Yamamoto
  • Patent number: 7332253
    Abstract: A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to provide lithographic printing plates. The polymeric binder can be prepared with a precursor polymer having pendant carboxy groups that are converted to allyl ester groups using an allyl-containing halide in the presence of a base in order to avoid gelation.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: February 19, 2008
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Scott A. Beckley
  • Patent number: 7285372
    Abstract: Radiation-sensitive element comprising (a) a substrate with at least one hydrophilic surface and (b) a radiation-sensitive coating on at least one hydrophilic surface of the substrate, wherein the coating comprises: (i) at least one free-radical polymerizable monomer and/or oligomer and/or polymer with at least one ethylenically unsaturated group each, (ii) at least one absorber selected from photoinitiators and sensitizers, which is capable of absorbing radiation of a wavelength in the range of 250 to 1,200 nm and (iii) at least one stabilizer comprising in its molecule at least one group capable of inhibiting free-radical polymerization, and at least one other group capable of sorption at the hydrophilic surface of the substrate.
    Type: Grant
    Filed: November 28, 2003
    Date of Patent: October 23, 2007
    Assignee: Kodak Graphic Communications GmbH
    Inventors: Harald Baumann, Michael Flugel, Udo Dwars, Eduard Kottmair
  • Patent number: 7279255
    Abstract: A radiation-sensitive composition includes a radically polymerizable component and a borate initiator composition capable of generating radicals sufficient to initiate polymerization of the radically polymerizable component upon exposure to imaging radiation. This composition also includes a radiation absorbing compound (such as an IR-sensitive dye), a polymeric binder comprising a polymer backbone to which is directly or indirectly linked a pendant group comprising a reactive vinyl group, and a primary additive that is a poly(alkylene glycol) or an ether or ester thereof that has a number average molecular weight of from about 200 and up to 4000 and comprises from about 2 to about 50 weight % based on the total composition solids content. This composition can be used to prepare a negative-working imageable element that can be imaged at relatively low energy and developed without a preheat step.
    Type: Grant
    Filed: February 7, 2006
    Date of Patent: October 9, 2007
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Scott A. Beckley
  • Patent number: 7276278
    Abstract: The laminate film for covering of an image carried by a support has a construction comprising a transparent base material and a transparent adhesive layer formed on one side of the base material, wherein the adhesive layer is composed of a pressure-sensitive adhesive and has a surface with a fine uneven structure.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: October 2, 2007
    Assignee: 3M Innovative Properties Company
    Inventors: Koji Kamiyama, Haruyuki Mikami, Shigeaki Dohgoshi, Joseph C. Carls
  • Patent number: 7270919
    Abstract: A process for forming an image on a substrate, which comprises coating the substrate with an amine of molybdenum, tungsten or vanadium that changes colour on heating or irradiation as an aqueous dispersion or suspension or as a solution in an organic solvent. Also described is a coated substrate, wherein the coating is a substantially visible light-transparent layer comprising an amine compound of molybdenum, tungsten or vanadium, and a solution of said amine compound and a thermoplastic polymer or a photo-polymerisable monomer.
    Type: Grant
    Filed: November 12, 2003
    Date of Patent: September 18, 2007
    Assignee: Datalase Ltd.
    Inventor: Brian Stubbs
  • Patent number: 7252912
    Abstract: A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer composite is used in a state exposed to water or a water-based solvent. The polymer membrane is a resin film formed by photo-crosslinking a photosensitive resin composition consisting essentially of a water-soluble polymer, and during crosslinking of the photosensitive resin composition, some of photosensitive groups of the photosensitive resin composition are bound to amino groups fixed to the surface of the base material, whereby the resin film is fixed to the base material.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: August 7, 2007
    Assignees: Toyo Gosei Co., Ltd.
    Inventors: Kazunori Kataoka, Akihiro Hirano, Takeshi Ikeya, Toru Shibuya
  • Patent number: 7220535
    Abstract: Disclosed herein are methods and apparatus for providing markings upon objects, including the read side of an optical information media, where the markings do not substantially interfere with object, including the use of the optical information media. This invention discloses use of a coating, marking schemes, printing of markings with UV light, as well as methods and apparatus for reading and deciphering said marking. Included is an authentication scheme, where the marking may be used as a lock to limit access to information contained in an optical information media.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: May 22, 2007
    Assignee: Spectra Systems Corporation
    Inventors: Nabil M. Lawandy, Jeffrey L. Conroy, Robert S. Afzal, Allison Berube, Charles M. Zepp, Andrei Smuk
  • Patent number: 7186482
    Abstract: Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in polymerized form from about 5 mol % to about 30 mol % of recurring units derived from an ethylenically unsaturated polymerizable monomer having a carboxy group; from about 20 mol % to about 75 mol % of recurring units derived from N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; and from about 3 mol % to about 50 mol % of recurring units derived from a compound represented by the formula: CH2?C(R2)—C(O)—NH—CH2—OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is hydrogen or methyl. Other materials, such as a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, may be present in the underlayer.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: March 6, 2007
    Assignee: Eastman Kodak Company
    Inventors: Anthony P. Kitson, Kevin B. Ray, Socrates P. Pappas, Celin Savariar-Hauck
  • Patent number: 7175949
    Abstract: A negative-working radiation-sensitive composition includes a polymeric binder comprising a polymer backbone and having attached thereto a carbazole derivative represented by the following Structure (I): wherein Y is a direct bond or a linking group, and R1 to R8 are independently hydrogen, or an alkyl, alkenyl, aryl, halo, cyano, alkoxy, acyl, acyloxy, or carboxylate groups, or any adjacent R1 through R8 groups can together form a carbocyclic or heterocyclic group or a fused aromatic ring. The composition can be sensitive to radiation having a maximum wavelength of from about 150 to about 1500 nm, and can be used to prepare negative-working imageable elements that be imaged and developed as lithographic printing plates.
    Type: Grant
    Filed: February 17, 2006
    Date of Patent: February 13, 2007
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Paul R. West, Scott A. Beckley, Nicki R. Miller
  • Patent number: 7063925
    Abstract: The invention relates to a photographic article comprising a base material carrying at least one layer comprising a photographic image formed by combination of dyes formed from couplers wherein areas of said photo image are colored without dyes formed by couplers.
    Type: Grant
    Filed: June 20, 2003
    Date of Patent: June 20, 2006
    Assignee: Eastman Kodak Company
    Inventors: William T. Rochford, Robert P. Bourdelais, Mridula Nair
  • Patent number: 7049036
    Abstract: Disclosed are a photosensitive resin composition comprising a photosensitive resin (A), a photopolymerization initiator (B), and a flame retardant (C), in which a content of halogen atoms or antimony atoms in the flame retardant is 5% or less by weight; a photosensitive element using this; a method of manufacturing a resist pattern; a resist pattern; and a resist pattern laminated substrate.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: May 23, 2006
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Kuniaki Satou, Takahiko Kutsuna, Toshizumi Yoshino, Takao Hirayama, Mikio Uzawa
  • Patent number: 7022441
    Abstract: Silver-free, aqueous-based direct thermographic materials are designed to have image tone with near neutral density. Without the use of organic silver salts containing reducible silver ions, the image is formed using a color developing agent precursor that releases a color developing agent when heated to a temperature of at least 80° C., a combination of cyan, yellow and magenta dye-forming color couplers that provide cyan, yellow, and magenta dyes, and a substituted or unsubstituted benzoquinone as an oxidizing agent. No silver metal or silver ions are purposely added to these materials. This combination of components provides a means for controlling image tone without reliance upon conventional toning agents.
    Type: Grant
    Filed: February 25, 2004
    Date of Patent: April 4, 2006
    Assignee: Eastman Kodak Company
    Inventors: Joe E. Maskasky, Victor P. Scaccia
  • Patent number: 7022442
    Abstract: An article has transferred onto its surface a region-wise optically modified cholesteric liquid crystalline layer. The layer includes at least one single-film layer including a number of regions having cholesterically ordered material which differ from one another in pitch. The layer can include a holographic image.
    Type: Grant
    Filed: February 13, 2004
    Date of Patent: April 4, 2006
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Peter Van De Witte, Johan Lub
  • Patent number: 6989220
    Abstract: Laser imageable flexographic printing elements, including printing plates and printing sleeves and methods of making the laser imageable flexographic printing elements using a collapsible cross-linkable material comprising a curable elastomer, a material that absorbs laser radiation at a selected wavelength, and microspheres are disclosed. A laser is used to collapse and melt the collapsible cross-linkable material to form a relief image on the printing element. The printing element is thereafter cured by face exposure to crosslink and cure the formed relief image. The invention addresses a market need for eliminating chemical processing of printing elements, thus going from printing element to press much more quickly and using an environmentally friendly process.
    Type: Grant
    Filed: January 30, 2004
    Date of Patent: January 24, 2006
    Assignee: MacDermid Printing Solutions, LLC
    Inventor: Rustom Sam Kanga
  • Patent number: 6969570
    Abstract: Thermally imageable elements useful as lithographic printing plate precursors are disclosed. The elements comprise a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises a co-polymer that comprises, in polymerized form, norbornene or a norbornene derivative. The resulting lithographic printing plates have good resistance to pressroom chemicals.
    Type: Grant
    Filed: October 26, 2004
    Date of Patent: November 29, 2005
    Assignee: Kodak Polychrome Graphics, LLC
    Inventor: Paul Kitson
  • Patent number: 6962763
    Abstract: Silver-free, aqueous-based direct thermographic materials are designed to have image tone with near neutral density. Without the use of organic silver salts containing reducible silver ions, the image is formed using a color developing agent precursor that releases a color developing agent when heated to a temperature of at least 80° C., a combination of cyan, yellow and magenta dye-forming color couplers that provide cyan, yellow, and magenta dyes, and a hindered-amine N-oxyl as an oxidizing agent. No silver metal or silver ions are purposely added to these materials. This combination of components provides a means for controlling image tone without reliance upon conventional toning agents.
    Type: Grant
    Filed: February 25, 2004
    Date of Patent: November 8, 2005
    Assignee: Eastman Kodak Company
    Inventors: Joe E. Maskasky, Victor P. Scaccia
  • Patent number: 6936384
    Abstract: The present invention provides an initiator system including an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. Upon exposure to infrared radiation, the initiator system is capable of producing radicals sufficient to initiate a photopolymerization reaction. Suitable infrared-absorbing compounds include indocyanine dyes, for example. Trihalomethyl triazine compounds and onium compounds are suitable initiators. Suitable metallocene compounds include ferrocenes and titanocenes. The present invention also provides an infrared-sensitive composition including an ethylenically unsaturated polymerizable component, an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. The infrared-sensitive composition provides improved photospeed and sensitivity in some embodiments.
    Type: Grant
    Filed: August 1, 2002
    Date of Patent: August 30, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Heidi M. Munnelly, Jianbing Huang
  • Patent number: 6916583
    Abstract: A method for printing an image on a surface of a substrate having a surface finish defined by a gloss, the method comprising: printing an image on the surface of the substrate, such that image areas thereof have a thickness, when fixed to the substrate and dry, of less than about 6 micrometers of a thermoplastic material; and smoothing the surface of at least a portion of the thermoplastic material.
    Type: Grant
    Filed: February 6, 2000
    Date of Patent: July 12, 2005
    Assignee: Hewlett-Packard Indigo N.V.
    Inventors: Benzion Landa, Ishaiau Lior, Itzhak Ashkenazi, Avner Schneider
  • Patent number: 6824936
    Abstract: The present invention relates to an imaged element comprising at least one imaged layer comprising at least one yellow dye and a support, wherein said support comprises at least one face side resin layer comprising a material capable of improving the yellow dark stability of said imaged element, wherein said materials has the formula:
    Type: Grant
    Filed: August 5, 2003
    Date of Patent: November 30, 2004
    Assignee: Eastman Kodak Company
    Inventors: Thomas A. Rosiek, Elizabeth K. Priebe
  • Patent number: 6821692
    Abstract: The present invention relates to novel thin layers for microsystem techniques and microstructuring. It is an object of the invention to provide thin layers which can be manufactured under less problems and more economically than the previous conventional layers, and which permit the use of existing technologies for microstructuring. The object is realized in that the thin layer is formed of an enzymatically degradable biopolymer in a range of layer thicknesses of from 30 nm to 3 &mgr;m. Biopolymeric thin layers manufactured according to the invention permit their application, after a respective structurizing, as test assays or in setting up substance libraries.
    Type: Grant
    Filed: February 4, 1999
    Date of Patent: November 23, 2004
    Assignee: Clondiag Chip Technologies GmbH
    Inventors: Eugen Ermantraut, Johann Michael Köhler, Torsten Schulz, Klaus Wohlfart, Stefan Wölfl
  • Publication number: 20040142280
    Abstract: A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein:
    Type: Application
    Filed: November 18, 2003
    Publication date: July 22, 2004
    Inventors: Shin-ichiro Iwanaga, Satoshi Iwamoto, Tooru Kimura, Hiroko Nishimura, Koji Nishikawa
  • Publication number: 20040126677
    Abstract: This invention relates to laserable assemblages for use in laser-induced thermal transfer imaging which result in improvements in resolution and toughness in the transferred image when two binders differing in glass transition temperature are incorporated into the transfer layer.
    Type: Application
    Filed: October 16, 2003
    Publication date: July 1, 2004
    Inventors: Gerald Donald Andrews, Graciela Beatriz Blanchet-Fincher
  • Patent number: 6739931
    Abstract: In an EL element having an anode, an insulating film (bump) formed on the anode, and an EL film and a cathode formed on the insulating film, each of a bottom end portion and a top end portion of the insulating film is formed so as to have a curved surface. The taper angle of a central portion of the insulating film is set within the range from 35° to 70°, thereby preventing the gradient of the film forming surface on which the EL film and the cathode are to be formed from being abruptly changed. On the thus-formed film forming surface, the EL film and the cathode can be formed so as to be uniform in thickness, so that occurrence of discontinuity in each of EL film and the cathode is prevented.
    Type: Grant
    Filed: September 17, 2001
    Date of Patent: May 25, 2004
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Shunpei Yamazaki, Hideomi Suzawa, Ichiro Uehara
  • Patent number: 6706353
    Abstract: An image-forming substrate has a sheet of paper, and a layer of microcapsules coated over the paper sheet. The microcapsule layer contains at least one type of microcapsules filled with a liquid dye, and a shell wall of each of the microcapsules is composed of resin that exhibits a temperature/pressure characteristic such that, when each of the microcapsules is squashed under a predetermined pressure at a predetermined temperature, the liquid dye seeps from the squashed microcapsule.
    Type: Grant
    Filed: August 27, 1998
    Date of Patent: March 16, 2004
    Assignee: Pentax Corporation
    Inventor: Minoru Suzuki
  • Patent number: 6706455
    Abstract: A method of creating an optical structure within a photosensitive light transmissive material comprising the steps of: (a) exposing a selected region of the material to radiation at a wavelength selected to effect a refractive index change in the material; (b) terminating the exposure to the radiation at a selected fluence; and afterwards (c) exposing at least one portion of the selected region to UV radiation at a level sufficient to vary the refractive index of the material within the selected region to form the optical structure; wherein the fluence is selected such that the optical structure is substantially thermally stable without a requirement for post-processing annealing.
    Type: Grant
    Filed: January 3, 2002
    Date of Patent: March 16, 2004
    Assignee: The University of Sydney
    Inventors: John Canning, Mattias Lennart Aslund
  • Publication number: 20040048186
    Abstract: Disclosed is a thermally sensitive imagable article and compositions therefor. The imagable article comprises a coating on a substrate, the coating comprising an amino acid or amide, and a compound capable of generating an acid upon heating. The coating optionally comprises a radiation absorbing compound. When imagewise exposed the coating has the property that exposed regions become relatively insoluble in a developer liquid whereas regions that have not been exposed remain relatively soluble in the developer and dissolve in the developer, leaving the exposed substrate in those regions.
    Type: Application
    Filed: December 10, 2001
    Publication date: March 11, 2004
    Applicant: Kodak Polychrome Graphics LLC.
    Inventors: Gregory Turner, Denise Howard
  • Patent number: 6692879
    Abstract: There is provided a thermal transfer image-receiving sheet which has dyeability high enough to realize high-speed printing and low-energy printing, permits a protective layer to be thermally transferred onto an image formed on the thermal transfer image-receiving sheet, is free from heat fusing to a thermal transfer sheet at the time of image formation on the thermal transfer image-receiving sheet, and has satisfactory separability from the thermal transfer sheet.
    Type: Grant
    Filed: October 21, 2002
    Date of Patent: February 17, 2004
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Shino Suzuki, Masahiro Yuki, Takenori Omata, Munenori Ieshige, Hidemasa Kaida
  • Patent number: 6689542
    Abstract: A process for marking which enables a colored pattern formed by at least two different and contrasting colors to be created on a dark or black surface of a rubber article, which process includes preparing a light-colored rubber composition having at least one elastomer and at least two coloring agents of different light colors, giving the said composition its initial color, and then incorporating a dark or black masking agent into this colored composition in a limited proportion to darken or mask the initial color of the rubber composition. The process further includes causing a first laser beam of appropriate characteristics to interact in a first stage in order to reveal a first colored pattern part, followed in a second stage by a second laser beam of appropriate characteristics in order to reveal a second colored pattern part.
    Type: Grant
    Filed: July 19, 2001
    Date of Patent: February 10, 2004
    Assignee: Michelin Recherche et Technique S.A.
    Inventor: Monique Boissonnet
  • Publication number: 20040023133
    Abstract: A photoresist pattern with a reinforcing section, provided with a line section 2 and a reinforcing section 3 that continues to the line section and that has a greater width than a line width of the line section is formed by forming on a substrate a photoresist film, exposing the photoresist film and then developing. As a result, fine line shaped photoresist patterns are prevented from collapsing and being washed away.
    Type: Application
    Filed: July 29, 2003
    Publication date: February 5, 2004
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hiroshi Shimbori, Takako Hirosaki
  • Publication number: 20040023135
    Abstract: The invention relates to a photographic article comprising a base material carrying at least one layer comprising a photographic image formed by combination of dyes formed from couplers wherein areas of said photo image are colored without dyes formed by couplers.
    Type: Application
    Filed: June 20, 2003
    Publication date: February 5, 2004
    Inventors: William T. Rochford, Robert P. Bourdelais, Mridula Nair
  • Publication number: 20040005506
    Abstract: A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer.
    Type: Application
    Filed: April 1, 2003
    Publication date: January 8, 2004
    Inventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada
  • Publication number: 20030211407
    Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 &mgr;m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; 1
    Type: Application
    Filed: December 27, 2002
    Publication date: November 13, 2003
    Inventors: Keiji Watanabe, Miwa Kozawa, Shoichi Suda, Fumi Yamaguchi, Isao Yahagi, Michitaka Morikawa
  • Patent number: 6638669
    Abstract: A thermal transfer film or a thermal transfer ribbon includes a substrate layer and a donor layer applied thereto. The substrate layer consists of at least one polymer composition which has mechanical stability at a temperature >150° C. and transmission >70% for light having a wavelength of from 700 to 1600 nm. The donor layer comprises at least the following components: a substance which is able to convert the radiation energy of the incident laser light into heat energy, a polymer which contains acidic groups and/or unsubstituted or substituted amide groups thereof, and optionally a wetting aid. The polymer composition also includes a reactive polymer.
    Type: Grant
    Filed: September 13, 2001
    Date of Patent: October 28, 2003
    Assignee: MAN Roland Druckmaschinen AG
    Inventors: Josef Schneider, Andrea Fuchs, Thomas Hartmann
  • Patent number: 6630287
    Abstract: A method for forming a thick film pattern is provided which can easily perform pattern formation even when a photosensitive paste containing a powdered conductor at a high content and having a low optical transmittance is used and which can form a thick film pattern having a rectangular cross-section and superior high-frequency transmission characteristics. In addition, a photosensitive paste used therefor is also provided. The thick film pattern having a predetermined shape can be formed by the steps of determining the photocurable depth d of a photosensitive paste; coating with the photosensitive paste in consideration of the photocurable depth d so as to form a photosensitive paste film having a predetermined thickness t; exposing the photosensitive paste film; and developing the exposed photosensitive paste film.
    Type: Grant
    Filed: July 2, 2001
    Date of Patent: October 7, 2003
    Assignee: Murata Manufacturing Co., Ltd.
    Inventor: Shuichi Towata