Nonsilver Image Patents (Class 430/17)
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Patent number: 6706455Abstract: A method of creating an optical structure within a photosensitive light transmissive material comprising the steps of: (a) exposing a selected region of the material to radiation at a wavelength selected to effect a refractive index change in the material; (b) terminating the exposure to the radiation at a selected fluence; and afterwards (c) exposing at least one portion of the selected region to UV radiation at a level sufficient to vary the refractive index of the material within the selected region to form the optical structure; wherein the fluence is selected such that the optical structure is substantially thermally stable without a requirement for post-processing annealing.Type: GrantFiled: January 3, 2002Date of Patent: March 16, 2004Assignee: The University of SydneyInventors: John Canning, Mattias Lennart Aslund
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Publication number: 20040048186Abstract: Disclosed is a thermally sensitive imagable article and compositions therefor. The imagable article comprises a coating on a substrate, the coating comprising an amino acid or amide, and a compound capable of generating an acid upon heating. The coating optionally comprises a radiation absorbing compound. When imagewise exposed the coating has the property that exposed regions become relatively insoluble in a developer liquid whereas regions that have not been exposed remain relatively soluble in the developer and dissolve in the developer, leaving the exposed substrate in those regions.Type: ApplicationFiled: December 10, 2001Publication date: March 11, 2004Applicant: Kodak Polychrome Graphics LLC.Inventors: Gregory Turner, Denise Howard
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Patent number: 6692879Abstract: There is provided a thermal transfer image-receiving sheet which has dyeability high enough to realize high-speed printing and low-energy printing, permits a protective layer to be thermally transferred onto an image formed on the thermal transfer image-receiving sheet, is free from heat fusing to a thermal transfer sheet at the time of image formation on the thermal transfer image-receiving sheet, and has satisfactory separability from the thermal transfer sheet.Type: GrantFiled: October 21, 2002Date of Patent: February 17, 2004Assignee: Dai Nippon Printing Co., Ltd.Inventors: Shino Suzuki, Masahiro Yuki, Takenori Omata, Munenori Ieshige, Hidemasa Kaida
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Patent number: 6689542Abstract: A process for marking which enables a colored pattern formed by at least two different and contrasting colors to be created on a dark or black surface of a rubber article, which process includes preparing a light-colored rubber composition having at least one elastomer and at least two coloring agents of different light colors, giving the said composition its initial color, and then incorporating a dark or black masking agent into this colored composition in a limited proportion to darken or mask the initial color of the rubber composition. The process further includes causing a first laser beam of appropriate characteristics to interact in a first stage in order to reveal a first colored pattern part, followed in a second stage by a second laser beam of appropriate characteristics in order to reveal a second colored pattern part.Type: GrantFiled: July 19, 2001Date of Patent: February 10, 2004Assignee: Michelin Recherche et Technique S.A.Inventor: Monique Boissonnet
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Publication number: 20040023135Abstract: The invention relates to a photographic article comprising a base material carrying at least one layer comprising a photographic image formed by combination of dyes formed from couplers wherein areas of said photo image are colored without dyes formed by couplers.Type: ApplicationFiled: June 20, 2003Publication date: February 5, 2004Inventors: William T. Rochford, Robert P. Bourdelais, Mridula Nair
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Publication number: 20040023133Abstract: A photoresist pattern with a reinforcing section, provided with a line section 2 and a reinforcing section 3 that continues to the line section and that has a greater width than a line width of the line section is formed by forming on a substrate a photoresist film, exposing the photoresist film and then developing. As a result, fine line shaped photoresist patterns are prevented from collapsing and being washed away.Type: ApplicationFiled: July 29, 2003Publication date: February 5, 2004Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiroshi Shimbori, Takako Hirosaki
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Publication number: 20040005506Abstract: A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer.Type: ApplicationFiled: April 1, 2003Publication date: January 8, 2004Inventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Kenji Yamada
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Publication number: 20030211407Abstract: A positive type resist composition having an alkali-soluble siloxane polymer expressed by the following Formula (1), a photosensitive compound, and a 1 &mgr;m thick resist film formed of the positive type resist composition which has 5% to 60% of transmittance to i-line radiation; 1Type: ApplicationFiled: December 27, 2002Publication date: November 13, 2003Inventors: Keiji Watanabe, Miwa Kozawa, Shoichi Suda, Fumi Yamaguchi, Isao Yahagi, Michitaka Morikawa
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Patent number: 6638669Abstract: A thermal transfer film or a thermal transfer ribbon includes a substrate layer and a donor layer applied thereto. The substrate layer consists of at least one polymer composition which has mechanical stability at a temperature >150° C. and transmission >70% for light having a wavelength of from 700 to 1600 nm. The donor layer comprises at least the following components: a substance which is able to convert the radiation energy of the incident laser light into heat energy, a polymer which contains acidic groups and/or unsubstituted or substituted amide groups thereof, and optionally a wetting aid. The polymer composition also includes a reactive polymer.Type: GrantFiled: September 13, 2001Date of Patent: October 28, 2003Assignee: MAN Roland Druckmaschinen AGInventors: Josef Schneider, Andrea Fuchs, Thomas Hartmann
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Patent number: 6630287Abstract: A method for forming a thick film pattern is provided which can easily perform pattern formation even when a photosensitive paste containing a powdered conductor at a high content and having a low optical transmittance is used and which can form a thick film pattern having a rectangular cross-section and superior high-frequency transmission characteristics. In addition, a photosensitive paste used therefor is also provided. The thick film pattern having a predetermined shape can be formed by the steps of determining the photocurable depth d of a photosensitive paste; coating with the photosensitive paste in consideration of the photocurable depth d so as to form a photosensitive paste film having a predetermined thickness t; exposing the photosensitive paste film; and developing the exposed photosensitive paste film.Type: GrantFiled: July 2, 2001Date of Patent: October 7, 2003Assignee: Murata Manufacturing Co., Ltd.Inventor: Shuichi Towata
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Patent number: 6617086Abstract: A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.Type: GrantFiled: March 2, 2001Date of Patent: September 9, 2003Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina E. Babich, James J. Bucchignano, Karen E. Petrillo, Steven A. Rishton
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Patent number: 6617097Abstract: The present invention aims at reducing the number of scanning exposure and at enhancing throughput. the above-mentioned objective is achieved by allowing a substrate 14 to be placed in sideways with respect to a substrate holder 15a (placing the longer sides of the substrate in parallel to the shorter sides of the substrate holder) depending on the size of the apparatus and the size of the substrate 14. It is acceptable even when areas other than an effective exposure area of the substrate 14 should project out from the substrate holder.Type: GrantFiled: December 22, 2000Date of Patent: September 9, 2003Assignee: Sharp Kabushiki KaishaInventors: Yasunori Nishimura, Taimi Oketani, Tsuyoshi Naraki
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Patent number: 6593042Abstract: The invention relates to a photographic article comprising abase material carrying at least one layer comprising a photographic image formed by combination of dyes formed from couplers wherein areas of said photo image are colored without dyes formed by couplers.Type: GrantFiled: December 21, 2001Date of Patent: July 15, 2003Assignee: Eastman Kodak CompanyInventors: William T. Rochford, Robert P. Bourdelais, Mridula Nair
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Patent number: 6562526Abstract: Spherical beads of critical dimensions and optical properties are combined with polarizing and photosensitive materials to produce a photographic film which unexpectedly collects apparent three dimensional information in the light carrying images into said film.Type: GrantFiled: March 16, 2000Date of Patent: May 13, 2003Inventor: Douglas Burke
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Publication number: 20030064302Abstract: Improved processes and products for laser thermal imaging are described. These improved processes and products utlilize an image rigidification element and significantly reduce halftone dot movement, swath boundary cracking and banding.Type: ApplicationFiled: July 3, 2002Publication date: April 3, 2003Inventors: Jonathan V. Caspar, Harvey Walter Taylor, Gregory C. Weed, Rolf S. Gabrielsen
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Publication number: 20030008224Abstract: A method of producing an organic LED display panel, which includes: a step of preparing a donor film by forming a transfer film on a base film comprising at least a foundation film and a light-to-heat conversion layer and a step of combining the donor film with a substrate and irradiating the donor film with one of a light beam and a heat radiation beam to pattern-transfer the transfer film from the donor film onto the substrate, wherein surfaces of the base film and the substrate which are to be brought into contact with the transfer film are hydrophilic or hydrophobic, and have water contact angles &thgr;1 and &thgr;2, respectively, which satisfy the following expression (I):Type: ApplicationFiled: May 16, 2002Publication date: January 9, 2003Inventors: Yoshimasa Fujita, Kimitaka Ohhata
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Patent number: 6479198Abstract: A silver halide light-sensitive material comprises a support and a silver halide gelatin emulsion layer. The silver halide gelatin emulsion layer or an optionally provided hydrophilic layer contains a tanning developing agent. According to the first embodiment of the present invention, the tanning developing agent has a molecular structure in which two to six benzenediol or benzenetriol rings are connected with a linking group. According to the second embodiment of the invention, the tanning developing agent consists of a polymer having side chains containing benzenediol or benzenetriol rings. According to the third embodiment of the invention, the tanning developing agent consists of a benzenediol or benzenetriol ring having an aliphatic substituent group having 5 to 40 carbon atoms or an aromatic substituent group having 7 to 40 carbon atoms. A tanning developing solution and a lithographic printing plate are also disclosed.Type: GrantFiled: February 1, 2001Date of Patent: November 12, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Naonori Makino, Kaku Sakata
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Publication number: 20020115002Abstract: Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the body. The body may be of a material that is substantially transparent to activating light. At least a portion of the plurality of recesses may define features having a feature size less than about 250 nm. A template may be formed by obtaining a material that is substantially transparent to activating light and forming a plurality or recesses on a surface of the template. In some embodiments, a template may further include at least one alignment mark. In some embodiments, a template may further include a gap sensing area. An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder.Type: ApplicationFiled: October 12, 2001Publication date: August 22, 2002Inventors: Todd Bailey, Byung J. Choi, Matthew Colburn, S.V. Sreenivasan, C. Grant Willson, John Ekerdt
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Patent number: 6423456Abstract: A composition used as a resist in the manufacture of electronic parts, for example printed circuits, and which is rendered soluble in a developer by patternwise delivery of heat, comprises a polymer of general formula (I), wherein R1 represents a hydrogen atom or alkyl group, R2 represents a hydrogen atom or alkyl group, R3 represents a hydrogen atom or alkyl group, and R4 represents hydroxyalkyl group, and wherein the ratio n/m is in the range 10/1 to 1/10.Type: GrantFiled: April 9, 2001Date of Patent: July 23, 2002Assignee: Kodak Polychrome Graphics LLCInventors: Anthony Paul Kitson, Peter Andrew Reath Bennett, Kevin Barry Ray
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Patent number: 6399258Abstract: Patterned articles, such as RFID antenna, are made by subablation, a process comprising the steps of: A. providing a substrate having a coating, such as a metal or metal oxide, and an interface comprising the thin region where the coating and the substrate are closest to each other; B. exposing at least one part of the total area of the coating to a flux of electromagnetic energy, Such as a focused excimer laser beam, sufficient to disrupt the interface but insufficient to ablate the coating, and C. removing the parts of the coating in registry with the portion of the interface area that was disrupted, by means such as ultrasonic agitation. The process has advantages over photo-resist processes in that there is no residual chemical resist left on the product and no undercutting of the pattern or image. It has advantages over laser ablation processes in that higher throughput is possible at the same energy level and there is no microscopic debris left on the product surface.Type: GrantFiled: January 12, 2001Date of Patent: June 4, 2002Assignee: 3M Innovative Properties CompanyInventors: Dennis P. O'Brien, Jeffrey M. Florczak, Robert L. W. Smithson
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Patent number: 6399265Abstract: A transparent film for forming a toner image is disclosed. The transparent film has a transparent base material and a resin layer provided on the surface thereof, and the resin layer has a release oil. This transparent film does not cause sticking to an image fixing roller. Also, disclosed is a process for forming a transparent color image by using the transparent film. This process forms a transparent color image which is able to exhibit color reproductivity of middle tone and excellent coloring property when projected by an over-head projector (OHP) and does not interfere with a fixing roller.Type: GrantFiled: July 7, 1999Date of Patent: June 4, 2002Assignee: Canon Kabushiki KaishaInventor: Motohiro Ogura
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Publication number: 20020064717Abstract: A thermal transfer film or a thermal transfer ribbon includes a substrate layer and a donor layer applied thereto. The substrate layer consists of at least one polymer composition which has mechanical stability at a temperature >150° C. and transmission >70% for light having a wavelength of from 700 to 1600 nm. The donor layer comprises at least the following components: a substance which is able to convert the radiation energy of the incident laser light into heat energy, a polymer which contains acidic groups and/or unsubstituted or substituted amide groups thereof, and optionally a wetting aid. The polymer composition also includes a reactive polymer.Type: ApplicationFiled: September 13, 2001Publication date: May 30, 2002Applicant: MAN Roland Druckmaschinen AGInventors: Josef Schneider, Andrea Fuchs, Thomas Hartmann
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Patent number: 6365331Abstract: A thermal film structure includes at least first and second imaging layers which have different processing characteristics. That is, the first imaging layer is processable at a first temperature while the second imaging layer is processable at a second temperature which is higher than the first temperature. The first and second imaging layers can be coated on or integrated into the film structure. This permits the addition of metadata on the low temperature layer which can be obtained without effecting the development of images on the high temperature layer. Also disclosed is a method for processing the thermal film.Type: GrantFiled: June 13, 2000Date of Patent: April 2, 2002Assignee: Eastman Kodak CompanyInventors: Gary L. House, David H. Levy
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Publication number: 20020028397Abstract: Patterned photoresist layers formed on substrates have features with high aspect ratios. The photoresist layers can be formed as single layers with aspect ratios as high as about 4:1. In addition, the features in the photoresist layers can have a wide range of aspect ratios in a given single layer. The photoresist layers can be used in ink jet print heads and other devices to provide controlled fluid flow. The photoresist layers are formed using a contrast enhancement material that enables features having substantially vertical side walls and high aspect ratios to be formed.Type: ApplicationFiled: August 2, 2001Publication date: March 7, 2002Applicant: Xerox CorporationInventors: Mildred Calistri-Yeh, Cathie J. Burke, Diane Atkinson
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Patent number: 6342322Abstract: Disclosed are a photosensitive composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photosensitive composition. The photosensitive composition comprises (A) a carboxyl group-containing photosensitive polymer obtained by the reaction of a copolymer of (a) a compound containing an unsaturated double bond and a carboxyl group and (b) an unsaturated double bond-containing compound with (c) a compound containing an unsaturated double bond and an epoxy group, (B) a diluent, (C) a photopolymerization initiator, (D) an inorganic powder, and (E) a stabilizer. The composition may be in the form of paste or in the form of a dry film. When the photosensitive composition is in the form of paste, the paste is applied to a substrate and then dried to form a film. When the photosensitive composition is in the form of a dry film, the film is laminated on the substrate.Type: GrantFiled: February 25, 1999Date of Patent: January 29, 2002Assignee: Taiyo Ink Manufacturing Co., Ltd.Inventors: Masahisa Kakinuma, Hideaki Kojima, Nobuyuki Yanagida
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Patent number: 6340556Abstract: A process for decreasing the linewidth of photoresist images which are suitable for use in the production of microelectronic devices such as integrated circuits. A photosensitive composition is coated onto a substrate, exposed to activating energy to decompose the polymer in the imagewise exposed areas; and developed to remove the exposed nonimage areas thus producing a pattern of lines having a linewidth of from about 100 nm to about 200 nm. Then the image areas are controllably irradiated to sufficient electron beam radiation to thereby reduce the linewidth by an amount of from about 5% to about 50%.Type: GrantFiled: June 8, 2000Date of Patent: January 22, 2002Assignee: Electron Vision CorporationInventor: Selmer Wong
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Publication number: 20020004570Abstract: Disclosed are polymers containing polymerized units one or more cyclic olefin monomers having one or more pendant cyclic electron withdrawing groups, methods of preparing such polymers, photoresist compositions including such polymers as resin binders and methods of forming relief images using photoresist compositions.Type: ApplicationFiled: February 23, 2001Publication date: January 10, 2002Applicant: Shipley Company, L.L.C.Inventors: Anthony Zampini, George G. Barclay
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Patent number: 6337162Abstract: A method of exposure projecting and exposing a pattern formed on a mask on to a photosensitive substrate through a projection optical system, comprising the steps of measuring a position of an image projected by said projection optical system; and projecting and exposing said pattern of the mask in a state with imaging characteristics corrected to reduce an amount of offset of a position of said projected image from an ideal position.Type: GrantFiled: September 13, 2000Date of Patent: January 8, 2002Assignee: Nikon CorporationInventor: Nobuyuki Irie
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Publication number: 20010053488Abstract: A system and method is disclosed that provides an automated, flow-through, dual side, laser direct imaging process and apparatus. This provides the capability to simultaneously register and image both sides of a substrate in a continuous flow-through process. The present invention provides efficiency improvements over the prior art on several levels. First, the prior art is batch process in which substrates are imaged one (or a batch) at a time in contrast with the present invention is a continuous, flow through, sequential process whereby a first substrate is followed into the apparatus by a second substrate which is, in turn followed by a third and so forth and the second substrate begins the process through the apparatus before the first substrate completes the process through the apparatus. Second, the process time per substrate is reduced as compared to the prior art.Type: ApplicationFiled: July 19, 2001Publication date: December 20, 2001Inventor: Marc Vernackt
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Publication number: 20010053487Abstract: A system and method is disclosed that provides an automated, flow-through, dual side, laser direct imaging process and apparatus. This provides the capability to simultaneously register and image both sides of a substrate in a continuous flow-through process. The present invention provides efficiency improvements over the prior art on several levels. First, the prior art is batch process in which substrates are imaged one (or a batch) at a time in contrast with the present invention is a continuous, flow through, sequential process whereby a first substrate is followed into the apparatus by a second substrate which is, in turn followed by a third and so forth and the second substrate begins the process through the apparatus before the first substrate completes the process through the apparatus. Second, the process time per substrate is reduced as compared to the prior art.Type: ApplicationFiled: July 19, 2001Publication date: December 20, 2001Inventor: Marc Vernackt
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Patent number: 6331368Abstract: Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a test object having circular phase structure (22) on a photoresist (PR), developing the resis and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each of several possible aberrations, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other.Type: GrantFiled: April 27, 2001Date of Patent: December 18, 2001Assignee: U.S. Philips CorporationInventors: Peter Dirksen, Casparus A. H. Juffermans
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Patent number: 6312858Abstract: The present invention relates to imaging elements, including photographic elements and ink-jet recording media, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the protective overcoat comprises a polycarbonate-containing polyurethane polymer having a Tg of 0 to 70° C. and a molecular weight of 15,000 to 200,000, wherein the amount of polycarbonate, based on the total weight of the polymer, is at least 20 percent.Type: GrantFiled: December 22, 2000Date of Patent: November 6, 2001Assignee: Eastman Kodak CompanyInventors: Paul D. Yacobucci, Hwei-Ling Yau, Catherine A. Falkner, Wendy S. Krzemien
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Patent number: 6300023Abstract: Microlithographic pattern transfer-exposure methods are disclosed by which a pattern for a semiconductor device or the like on the scale of a 16-gigabit DRAM on a 12-inch-diameter substrate can be formed, including such patterns comprising complementary features. The reticle is mounted on a moveable reticle stage and the substrate is mounted on a moveable substrate stage. The reticle pattern is segmented into pattern portions that are transferred onto individual corresponding regions on the substrate. The reticle stage and/or substrate stage can be moved in a step-and-repeat manner and in a continuous-scanning manner during pattern transfer.Type: GrantFiled: July 1, 1999Date of Patent: October 9, 2001Assignee: Nikon CorporationInventor: Mamoru Nakasuji
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Publication number: 20010024759Abstract: A photo-curable composition comprising (a) an elastomeric component containing one or more unsaturated, high molecular weight, endgroup-modified polymers; (b) a photopolymerization initiating system; optionally (c) one or more cross-linking agents; and optionally (d) other additives. Photo-curable compositions of the present invention exhibit faster cross-linking (i.e., curing) rates (i.e., lower minimum exposure times) than similar compositions containing no endgroup-modified polymers. Cured compositions of the present invention exhibit lower solvent swell, and similar or increased softness (i.e., lower hardness as measured by Shore A hardness) when compared to cured compositions containing no unsaturated, high molecular weight, endgroup-modified polymers.Type: ApplicationFiled: May 4, 2001Publication date: September 27, 2001Inventors: Andre J. Uzee, Michael O. Myers, Calvin P. Esneault
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Publication number: 20010023042Abstract: Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure (22) on a photoresist (PR), developing the resist and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each of several possible aberrations, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other.Type: ApplicationFiled: April 27, 2001Publication date: September 20, 2001Applicant: U. S. PHILIPS CORPORATIONInventors: Peter Dirksen, Casparus A.H. Juffermans
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Patent number: 6265117Abstract: A color imaging element comprising a dye formed upon a reaction of an oxidation product of a compound represented by formula (I) shown below together with at least one water-soluble compound represented by formula (II) shown below on a support: wherein Z represents a carbamoyl group, an acyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, a sulfonyl group or a sulfamoyl group; and Q represents an atomic group necessary for forming an unsaturated ring together with the carbon atom; wherein X represents a hydrogen atom, a hydroxy group, an aliphatic group, an acyl group, an aliphatic oxy group, an aliphatic oxycarbonyl group or an aryloxycarbonyl group; Y1 and Y2, which may be the same or different, each represents a hydrogen atom or a substituent, or Y1 and Y2 may be combined with each other to form a 5-membered or 6-membered ring; Z1 represents a simple bond, a methylene group which may be substituted or an ethylene group which may be substituted; Z2 represents aType: GrantFiled: September 20, 1999Date of Patent: July 24, 2001Assignee: Fuji Photo Film Co., Ltd.Inventor: Keiichi Taguchi
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Patent number: 6265118Abstract: There is disclosed an image element wherein a dye, formed or released by reaction with an oxidized product of specific a compound, and specific a fixed compound, coexist in a binder on a support. The image element can have high color density in image, and it can be excellent in light fastness. Furthermore, there is also disclosed an image formation method to provide the image element.Type: GrantFiled: January 28, 2000Date of Patent: July 24, 2001Assignee: Fuji Photo Film Co., Ltd.Inventor: Keiichi Taguchi
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Publication number: 20010006766Abstract: Patterned articles, such as RFID antenna, are made by subablation, a process comprising the steps of:Type: ApplicationFiled: January 12, 2001Publication date: July 5, 2001Applicant: 3M Innovative Properties CompanyInventors: Dennis P. O'Brien, Jeffrey M. Florczak, Robert L. W. Smithson
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Patent number: 6238828Abstract: A printing method directed to a plurality of pieces of slip paper which have been bound into a book and to the outer surface, of which ink containing an initiator and either one of coloring matter and a precursor of coloring matter is applied are placed. A printing plate has a through portion through which radiation penetrates and whose shape corresponds to a pattern to be printed. The printing plate is placed ont he stacked slip paper and X-rays are irradiated upon the printing plate fro the above direction so as to print the pattern of a character on each pieces of the slip paper at a desired are thereof.Type: GrantFiled: September 8, 2000Date of Patent: May 29, 2001Assignee: Kokuyo Co., Ltd.Inventors: Keiji Kai, Takaaki Kiyose
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Patent number: 6228543Abstract: A plasticizer-containing layer can be used in a thermal transfer element to facilitate transfer to a receptor for the formation of a variety of articles. In one method, a receptor is brought into contact with a thermal transfer element that includes a transfer unit having at least one layer with a binder composition and a plasticizer. A portion of the transfer unit is thermally transferred to the receptor. This thermal transfer can be accomplished using, for example, a thermal print head or radiative (e.g., light or laser) thermal transfer. After transfer, the binder composition and the plasticizer (in the portion of the transfer unit that is transferred to the receptor) are reactively coupled.Type: GrantFiled: September 9, 1999Date of Patent: May 8, 2001Assignee: 3M Innovative Properties CompanyInventors: Kazuhiko Mizuno, John S. Staral, Richard J. Pokorny
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Patent number: 6214527Abstract: There is provided a photosensitive conductor paste comprising at least a polymer, a monomer, a photopolymerization initiator, a conductive powder, a glass frit, and a solvent, the total content of the polymer, the monomer, and the photopolymerization initiator occupying 9 to 30% by weight on a solid basis of the photosensitive conductor paste, the conductive powder occupying 60 to 90% by weight on a solid basis of the photosensitive conductor paste, the glass frit occupying 1 to 10% by weight on a solid basis of the photosensitive conductor paste, the polymer having an alcoholic hydroxyl group and a carboxyl group.Type: GrantFiled: December 28, 1998Date of Patent: April 10, 2001Assignee: Dai Nippon Printing Co., Ltd.Inventors: Yozo Kosaka, Katsuhiko Mizuno, Nobuaki Kimura, Toshihiko Takeda, Toshikazu Kakumu
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Patent number: 6210844Abstract: Element for laminating on color proofs, comprising a strippable support film A and a transparent, photoinsensitive protective layer B, containing at least one polymer having a melting point Tm of ≧50° C. and a glass transition temperature Tg of ≦0° C.Type: GrantFiled: June 16, 1999Date of Patent: April 3, 2001Assignee: E. I. du Pont de Nemours and CompanyInventor: Manfred Adelhard Josef Sondergeld
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Patent number: 6207330Abstract: Exposure masks and inspection masks for use in the electronics field may be made using laser beams wherein the mask comprises a substrate which is substantially unaffected by exposure to the laser beam and an opaque pattern forming layer on the substrate, which pattern forming layer absorbs the laser beam and is selectively etched when exposed to the laser beam. A preferred mask has an overcoat transparent layer. A cavity inspection mask is provided having a series of openings in the form of lines formed in the opaque pattern forming layer, the lines bounding the cavity walls, is the mask being used for determining if the cavity is centrally positioned on the substrate and/or that the cavity is of the desired size. Substrates containing identifying masks thereon which cannot be seen by the unaided eye for theft deterrence are also provided.Type: GrantFiled: March 30, 1999Date of Patent: March 27, 2001Assignee: International Business Machines CorporationInventors: James Gregory Balz, Mark William Kapfhammer, Mark Joseph LaPlante, David C. Long
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Patent number: 6203952Abstract: Patterned articles, such as RFID antenna, are made by subablation, a process comprising the steps of: A. providing a substrate having a coating, such as a metal or metal oxide, and an interface comprising the thin region where the coating and the substrate are closest to each other; B. exposing at least one part of the total area of the coating to a flux of electromagnetic energy, such as a focused excimer laser beam, sufficient to disrupt the interface but insufficient to ablate the coating; and C. removing the parts of the coating in registry with the portion of the interface area that was disrupted, by means such as ultrasonic agitation. The process has advantages over photo-resist processes in that there is no residual chemical resist left on the product and no undercutting of the pattern or image. It has advantages over laser ablation processes in that higher throughput is possible at the same energy level and there is no microscopic debris left on the product surface.Type: GrantFiled: January 14, 1999Date of Patent: March 20, 2001Assignee: 3M Innovative Properties CompanyInventors: Dennis P. O'Brien, Jeffrey M. Florczak, Robert L. W. Smithson
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Patent number: 6180318Abstract: A method of imaging an article comprising a metal/metal oxide imageable layer with a laser beam. In particular, the present invention relates to a method for imparting a color image on the article. The method includes: a) providing an article including a substrate and an imageable layer, the imageable layer comprising a metal/metal oxide layer; b) imagewise applying a laser beam to the article; and c) in the portion of the article having the laser applied thereto, imparting a color to the metal/metal oxide layer different from the color in the non-imaged portion. Preferably, the imageable layer comprises aluminum/aluminum oxide. Also presented are imageable articles, and the resulting imaged articles.Type: GrantFiled: May 19, 1999Date of Patent: January 30, 2001Assignee: 3M Innovative Properties CompanyInventors: Robert C. Fitzer, Haitao Huang, Pierre H. LePere, Theresa A. McCarthy-Pohl, Robert D. Waid
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Patent number: 6165653Abstract: An overcoat composition comprising a water insoluble polymer having a Tg equal to or less than 30.degree. C. and comprising 75 to 100 weight percent of the monomer having the following formula: ##STR1## wherein: X is selected from the group consisting of Cl, F or CN, and Y is each independently selected from the group consisting of H, Cl, F, CN, CF.sub.3, CH.sub.3, C.sub.2 H.sub.5, n-C.sub.3 H.sub.7, iso-C.sub.3 H.sub.7, n-C.sub.4 H.sub.9, n-C.sub.5 H.sub.11, n-C.sub.6 H.sub.13, OCH.sub.3, OC.sub.2 H.sub.5, phenyl, C.sub.6 F.sub.5, C.sub.6 Cl.sub.5, CH.sub.2 Cl, CH.sub.2 F, C.sub.2 F.sub.5, n-C.sub.3 F.sub.7, iso-C.sub.3 F.sub.7, OCF.sub.3, OC.sub.2 F.sub.5, OC.sub.3 F.sub.7, C(CF.sub.3).sub.3, CH.sub.2 (CF.sub.3), CH(CF.sub.3).sub.2, COCF.sub.3, COC.sub.2 F.sub.5, COCH.sub.3, COC.sub.2 H.sub.Type: GrantFiled: July 15, 1999Date of Patent: December 26, 2000Assignee: Eastman Kodak CompanyInventors: Hwei-ling Yau, Brian Thomas
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Patent number: 6146809Abstract: Composition comprising a solid organic support material to which either directly or via a bridging group, are covalently linked fluorescent host chromophores and fluorescent guest chromophores, wherein the fluorescence emission spectrum of the host chromophore overlaps with the absorption spectrum of the guest chromophore, wherein the host chromophore is selected from the group consisting of benzo[4,5]imidazo[2,11-a]isoindol-11-ones.Type: GrantFiled: February 3, 1998Date of Patent: November 14, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Brian Gerrard Devlin, Junji Otani, Kazuhiko Kunimoto, Abul Iqbal, Sameer Hosam Eldin
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Patent number: 6124074Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation and are developable to form photoresist structures of high resolution and high etch resistance are enabled by the use of a combination of cyclic olefin polymer, photosensitive acid generator and a hydrophobic non-steroidal multi-alicyclic component containing plural acid labile linking groups. The cyclic olefin polymers preferably contain i) cyclic olefin units having polar functional moieties, ii) cyclic olefin units having acid labile moieties that inhibit solubility in aqueous alkaline solutions.Type: GrantFiled: March 11, 1999Date of Patent: September 26, 2000Assignee: International Business Machines CorporationInventors: Pushkara Rao Varanasi, Joseph F. Maniscalco
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Patent number: 6120944Abstract: The invention relates to a color-pigmented high molecular weight organic material structured from a radiation-sensitive precursor by irradiation, the pigmentation of which material consists of extremely fine particles, at least 80 mol % of the pigmentation consisting of a pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, disazo condensation yellow or benzimidazolonazo, each containing at least one --NHCO-- group, and, where appropriate, a second pigment of the class diketopyrrolopyrrole, dioxazine, isoindoline, isoindolinone, benzimidazolonazo, disazo or phthalocyanine, and, when the structure of the main pigment is point-symmetrical, the two pigments being present in a balanced molar ratio of from 1:1 to 7:3. Those materials are used preferably in the form of thin layers which are built up in patterns in one or more layers on a transparent substrate and can be used, for example, as optical color filters.Type: GrantFiled: April 8, 1998Date of Patent: September 19, 2000Assignee: Ciba Specialty Chemicals CorporationInventors: Ulrich Schadeli, Eric Tinguely, Veronique Hall-Goulle, Heinz Wolleb, Zhimin Hao, Abul Iqbal
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Patent number: 6106983Abstract: Spherical beads of critical dimensions and optical properties are combined with polarizing and photosensitive materials to produce a photographic film which unexpectedly collects apparent three dimensional information in the light carrying images into said film.Type: GrantFiled: May 28, 1999Date of Patent: August 22, 2000Inventor: Douglas Burke