Imaged Product Patents (Class 430/9)
  • Patent number: 9411230
    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent.
    Type: Grant
    Filed: March 27, 2014
    Date of Patent: August 9, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Kaoru Iwato, Hideaki Tsubaki
  • Patent number: 9405196
    Abstract: Electrically-conductive articles are prepared to have electrically-conductive silver metal electrode grids on one or both supporting sides of a transparent substrate. Such articles are prepared by imagewise exposing conductive film element precursors having photosensitive silver halide layers, followed by development, fixing, and conductivity enhancement. The resulting silver image(s) can be treated with a stabilizing solution containing 0.5-50 mmol/l of specific stabilizing agents.
    Type: Grant
    Filed: June 25, 2015
    Date of Patent: August 2, 2016
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Michael Phillip Youngblood, Kenneth James Lushington
  • Patent number: 8999626
    Abstract: The present invention relates to a polymer compound including a dye, and a curable resin composition including the same. The polymer compound including the dye according to the present invention may exhibit characteristics such as excellent heat resistance, solubility, coating uniformity, chemical resistance and the like by introducing a single molecule type dye into a side chain of a polymer binder to be modified into a polymer form and applying the modified polymer to a curable composition.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: April 7, 2015
    Assignee: LG Chem, Ltd.
    Inventors: Jiyoung Park, Sunhwa Kim, Janghyun Ryu
  • Publication number: 20150056542
    Abstract: Organometallic solutions have been found to provide high resolution radiation based patterning using thin coatings. The patterning can involve irradiation of the coated surface with a selected pattern and developing the pattern with a developing agent to form the developed image. The patternable coatings may be susceptible to positive-tone patterning or negative-tone patterning based on the use of an organic developing agent or an aqueous acid or base developing agent. The radiation sensitive coatings can comprise a metal oxo/hydroxo network with organic ligands. A precursor solution can comprise an organic liquid and metal polynuclear oxo-hydroxo cations with organic ligands having metal carbon bonds and/or metal carboxylate bonds.
    Type: Application
    Filed: August 22, 2013
    Publication date: February 26, 2015
    Inventors: Stephen T. Meyers, Douglas A. Keszler, Kai Jiang, Jeremy Anderson, Andrew Grenville
  • Publication number: 20150056543
    Abstract: [Problem] To provide a sublimation transfer dyeing method capable of highly efficient dyeing of a product to be dyed by an electrophotographic process using a toner, and a dyed product dyed highly efficiently by the dyeing method. [Solution] A sublimation transfer dyeing method attaches a toner to an intermediate recording medium using an electrophotographic process and sublimation-transfers to a dyed product a dye contained in the toner attached to the intermediate recording medium. A dyed product dyed with high efficiency could be provided by a sublimation transfer dyeing method in which the intermediate recording medium has a density of greater than 1.00 g/cm3.
    Type: Application
    Filed: March 13, 2013
    Publication date: February 26, 2015
    Inventors: Yuji Suzuki, Makoto Teranishi, Hirokazu Kitayama, Yoshihiro Takai, Kousuke Takai
  • Publication number: 20150056544
    Abstract: Provided is a method for manufacturing a liquid crystal display device that includes a photoalignment film. The photoalignment film is formed from a liquid crystal alignment agent, and aligns liquid crystal molecules horizontally to the main face of the at least one of the substrates. The liquid crystal alignment agent contains a solvent and at least two kinds of polyamic acids or their derivatives obtained by reacting diamine and tetracarboxylic dianhydride. At least two of the diamines and at least one of the tetracarboxylic dianhydrides are compounds represented by predetermined formulas. The method includes the steps of: (1) forming the film of the liquid crystal alignment agent; (2) pre-baking the film; (3) irradiating the pre-baked film with light; and (4) post-baking the irradiated film, the step (4) including an operation of post-baking the film multiple times at temperatures ranging from low to high temperatures.
    Type: Application
    Filed: August 21, 2014
    Publication date: February 26, 2015
    Inventors: Isamu MIYAKE, Hiroaki ASAGI, Toshihiro MATSUMOTO, Koichi MIYACHI, Youichiro OOKI, Fumitaka KONDO
  • Publication number: 20150017576
    Abstract: There is provided a pattern forming method comprising, in order: (i) a step of forming a film by using an extreme ultraviolet-sensitive resin composition containing (A) a resin having an acid-decomposable group; (ii) a step of exposing the film by using an extreme ultraviolet ray; (iii) a step of heating the film; and (iv) a step of developing the film to form a pattern, wherein in the step (ii), an optical image formed by exposure on the surface of the film is an optical image having a line part with a line width of 20 nm or less as an exposed area or an unexposed area, and, the heating temperature TPEB(° C.) in the step (iii) satisfies the specific formula.
    Type: Application
    Filed: September 29, 2014
    Publication date: January 15, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Naoki INOUE, Hiroo TAKIZAWA, Hideaki TSUBAKI
  • Publication number: 20150010855
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive composition containing (?) a compound represented by the formula (?I) capable of generating an acid having a size of 200 ?3 or more in volume and (?) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and the formula (?I) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive composition, a resist-coated mask blanks coated with the resist film, a resist pattern forming method comprising exposing the resist film and developing the exposed film, a photomask obtained by exposing and developing the resist-coated mask blanks, a method for manufacturing an electronic device, comprising the resist pattern forming method and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Application
    Filed: September 26, 2014
    Publication date: January 8, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomotaka TSUCHIMURA, Takuya TSURUTA, Takeshi INASAKI, Koutarou TAKAHASHI
  • Publication number: 20150004531
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Application
    Filed: April 28, 2014
    Publication date: January 1, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Go-Un KIM, Young-Min KIM, Hea-Jung KIM, Joon-Young MOON, Yo-Choul PARK, Yu-Shin PARK, You-Jung PARK, Hyun-Ji SONG, Seung-Wook SHIN, Yong-Woon YOON, Chung-Heon LEE, Seung-Hee HONG
  • Publication number: 20140370247
    Abstract: Various laser marking compositions and related methods are described. The laser marking compositions include a molybdenum metal complex, a tungsten metal complex, or combinations thereof. Marks or other indicia formed on a substrate using the compositions and methods exhibit increased contrast and improved substrate bonding.
    Type: Application
    Filed: March 1, 2013
    Publication date: December 18, 2014
    Applicant: Ferro Corporation
    Inventors: Terry J. Detrie, George E. Sakoske, Stephen Rozwood, Joseph E. Sarver
  • Publication number: 20140349221
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the formula (Z1), and the formula (Z1) is defined as herein, and a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method comprising a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, a step of exposing the film, and a step of developing the exposed film, a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the method for manufacturing an electronic device.
    Type: Application
    Filed: August 13, 2014
    Publication date: November 27, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Hiroo TAKIZAWA, Tomotaka TSUCHIMURA
  • Publication number: 20140335447
    Abstract: A composition for a hardmask including copolymer including repeating units represented by Chemical Formulae 1 and 2 and a solvent, a method of forming a pattern using the same, and a semiconductor integrated circuit device including a pattern formed using the method are provided.
    Type: Application
    Filed: November 23, 2012
    Publication date: November 13, 2014
    Inventors: Sung-Jae Lee, Joon-Young Moon, Youn-Jin Cho, Young-Min Kim, Yong-Woon Yoon
  • Publication number: 20140295331
    Abstract: A nanoporous film patterned by direct photolithography and a method for preparing the same are provided. Since a precursor of the material is the mixture of a nano template material and a photoresist and the mixture still has the basic physical properties of the photoresist, a film is formed on a substrate by a standard photolithography process and a micro-sized patterned structure is realized. The mixture with the patterned structure is chemically etched to remove the template material to form a porous polymer film, or the mixture with the patterned structure is carbonized at a high temperature and then the template material is removed to form a porous carbon film. The nanoporous film patterned by direct photolithography and the method for preparing the same have the advantages of simple operation, low cost and good integration with other micro electric mechanical systems.
    Type: Application
    Filed: April 27, 2013
    Publication date: October 2, 2014
    Applicant: Tsinghua University
    Inventors: Xiaohong Wang, Caiwei Shen
  • Publication number: 20140255069
    Abstract: An apparatus for producing a detachable information sheet includes an image forming device, an applying and curing unit, and a heating and pressing unit. The image forming device includes an image bearing body, an electrostatic latent image forming unit to form an electrostatic latent image on the image bearing body, a development unit to develop the latent image with a toner to form a visible toner image, a transfer unit to transfer the toner image from the image bearing body onto a recording medium, and a fixing unit to fix the toner image on the recording medium. The applying and curing unit applies an energy-ray curable composition precursor onto the recording medium having the toner image fixed thereon, and cures the precursor to form an energy-ray curable composition to coat the recording medium. The heating and pressing unit heats and presses the recording medium coated with the energy-ray curable composition.
    Type: Application
    Filed: February 27, 2014
    Publication date: September 11, 2014
    Inventors: Masato Iio, Toshiyuki Kabata
  • Publication number: 20140234760
    Abstract: A producing method for a translucent electromagnetic shield film comprising exposing a photosensitive material having an emulsion layer containing a silver salt and a dye on a substrate, then executing a development process to form a metallic silver portion and a light transmitting portion respectively in an exposed area and an unexposed area, and applying a physical development and/or a plating process to the metallic silver portion thereby causing the metallic silver portion to carry a conductive metal. The producing method allows to inexpensively mass produce a translucent electromagnetic shield film without a moiré pattern, having a high EMI shield property and a high transparency at the same time.
    Type: Application
    Filed: April 23, 2014
    Publication date: August 21, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Hirotomo SASAKI, Ryou NISHIZAKURA
  • Publication number: 20140234759
    Abstract: According to one embodiment, there is provided an actinic ray- or radiation-sensitive resin composition containing (A) a resin containing a repeating unit represented by general formula (1) below and a repeating unit that is decomposed by an action of an acid to generate an alkali-soluble group, and (B) a compound that generates the acid when exposed to actinic rays or radiation, where L represents a bivalent connecting group, R1 represents a hydrogen atom or an alkyl group, and Z represents a cyclic acid anhydride structure.
    Type: Application
    Filed: March 28, 2014
    Publication date: August 21, 2014
    Applicant: FUJIFILM Corporation
    Inventors: Shohei KATAOKA, Akinori SHIBUYA, Junichi ITO, Tomoki MATSUDA, Toshiaki FUKUHARA, Naohiro TANGO, Kaoru IWATO, Masahiro YOSHIDOME, Shinichi SUGIYAMA, Yoko TOKUGAWA
  • Publication number: 20140227636
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (Aa) containing at least one repeating unit (Aa1) derived from monomers of general formula (aa1-1) below and at least one repeating unit (Aa2) derived from monomers of general formula (aa2-1) below and comprising a resin (Ab) that when acted on by an acid, changes its alkali solubility.
    Type: Application
    Filed: March 28, 2014
    Publication date: August 14, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Shuji HIRANO, Hiroo TAKIZAWA, Hideaki TSUBAKI
  • Publication number: 20140212797
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (P) a resin that contains (A) a repeating unit capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid in a side chain of the resin (P) and (C) a repeating unit represented by the following formula (I) as defined in the specification, wherein a polydispersity of the resin (P) is 1.20 or less.
    Type: Application
    Filed: March 28, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeshi KAWABATA, Hideaki TSUBAKI
  • Publication number: 20140212796
    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent.
    Type: Application
    Filed: March 27, 2014
    Publication date: July 31, 2014
    Applicant: FUJIFILM CORPORATION
    Inventors: Hiroo TAKIZAWA, Kaoru IWATO, Hideaki TSUBAKI
  • Patent number: 8790861
    Abstract: A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
    Type: Grant
    Filed: December 21, 2012
    Date of Patent: July 29, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Cong Liu, Mingqi Li, Cheng-Bai Xu
  • Patent number: 8778593
    Abstract: A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity is 1.2 or less, (b) the weight average molecular weight is from 2,000 to 6,500, and (c) the glass transition temperature (Tg) is 140° C. or more.
    Type: Grant
    Filed: June 29, 2012
    Date of Patent: July 15, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Tomotaka Tsuchimura, Tadateru Yatsuo
  • Patent number: 8697332
    Abstract: An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: April 15, 2014
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Mami Katayama, Shunji Fukuda, Katsuya Sakayori, Kouji Kawaguchi
  • Patent number: 8685599
    Abstract: A method of pulsed laser intrinsic marking can provide a unique identifier to detect tampering or counterfeiting.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: April 1, 2014
    Assignee: Sandia Corporation
    Inventors: David P. Adams, Joel Patrick McDonald, Bradley Howell Jared, V. Carter Hodges, Deidre Hirschfeld, Dianna S. Blair
  • Patent number: 8647796
    Abstract: A system and method for forming photoresists over semiconductor substrates is provided. An embodiment comprises a photoresist with a concentration gradient. The concentration gradient may be formed by using a series of dry film photoresists, wherein each separate dry film photoresist has a different concentration. The separate dry film photoresists may be formed separately and then placed onto the semiconductor substrate before being patterned. Once patterned, openings through the photoresist may have a tapered sidewall, allowing for a better coverage of the seed layer and a more uniform process to form conductive materials through the photoresist.
    Type: Grant
    Filed: July 27, 2011
    Date of Patent: February 11, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Hua Yu, Chung-Shi Liu, Hung-Jui Kuo
  • Publication number: 20140038092
    Abstract: A colored composition including at least one selected from the group consisting of a compound represented by the following formula (I) and a tautomer thereof. In formula (I), R2 to R5 each independently represent a hydrogen atom or a monovalent substituent, R7 represents a hydrogen atom, a halogen atom, an alkyl group, or the like, Ma represents a metal or a metal compound, X3 and X4 each independently represent NR, a nitrogen atom, an oxygen atom, or a sulfur atom, R represents a hydrogen atom, an alkyl group, or the like, Y1 and Y2 each independently represent NRc, a nitrogen atom, or a carbon atom, Rc represents a hydrogen atom, an alkyl group, or the like, and R8 and R9 each independently represent an alkyl group, an alkenyl group, or the like. Z represents an atomic group that forms a nitrogen-containing ring having a specific structure.
    Type: Application
    Filed: October 1, 2013
    Publication date: February 6, 2014
    Applicant: FUJIFILM CORPORATION
    Inventor: Daisuke SASAKI
  • Patent number: 8552538
    Abstract: A stabilizing solution for treating photoresist patterns and methods of preventing profile abnormalities, toppling and resist footing are disclosed. The stabilizing solution comprises a non-volatile component, such as non-volatile particles or polymers, which is applied after the photoresist material has been developed. By treating the photoresist with the solution containing a non-volatile component after developing but before drying, the non-volatile component fills the space between adjacent resist patterns and remains on the substrate during drying. The non-volatile component provides structural and mechanical support for the resist to prevent deformation or collapse by liquid surface tension forces.
    Type: Grant
    Filed: February 16, 2010
    Date of Patent: October 8, 2013
    Assignee: Micron Technology, Inc.
    Inventors: Jon Daley, Yoshiki Hishiro
  • Patent number: 8278030
    Abstract: An object of the present invention is to provide a sulfonium salt that has sufficient photosensitivity by active energy rays, such as visible light, ultraviolet rays, electron beams, and X-rays. The present invention is a sulfonium salt represented by formula (1). It is noted that R1 is a group represented by formula (2); R2 and R3 each represent an aryl group having 6 to 30 carbon atoms, a heterocyclic hydrocarbon group having 4 to 30 carbon atoms, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, or an alkynyl group having 2 to 30 carbon atoms; X? represents a monovalent polyatomic anion; R4 to R6 each represent an alkyl group, or the like; k represents an integer of 0 to 4; m represents an integer of 0 to 3; n represents an integer of 0 to 4; and A represents a group represented by —S—, —O—, —SO—, —SO2—, or —CO—.
    Type: Grant
    Filed: April 27, 2009
    Date of Patent: October 2, 2012
    Assignee: San-Apro Limited
    Inventors: Issei Suzuki, Hideki Kimura
  • Patent number: 8211620
    Abstract: The present invention relates to thermoplastic material comprising polymer and at least one polychromic substance, wherein the polychromic substance is a functionalised diacetylene having the formula which has the general structure: X—C?C—C?C—Y—(CO)n-QZ wherein X is H or alkyl, Y is a divalent alkylene group, Q is O, S or NR, R is H or alkyl, and Z is alkyl, and n is 0 or 1. The present invention further relates to a method of processing thermoplastic material to form a plastic article, wherein the method comprises the step of processing the thermoplastic material at a temperature greater than the melt temperature of the thermoplastic, wherein the thermoplastic material comprises polymer and at least one polychromic substance as defined above; and further comprising the step of irradiating the plastic article to color at least a region of the plastic article.
    Type: Grant
    Filed: January 14, 2011
    Date of Patent: July 3, 2012
    Assignee: The Procter & Gamble Company
    Inventors: Neil John Rogers, Christopher Lamb, Anthony Nicholas Jarvis
  • Patent number: 8168355
    Abstract: A method of producing an image in the crystalline colloidal array is disclosed. The method includes providing an ordered array of particles received within a curable matrix composition; curing a first portion of the matrix composition, wherein the first cured portion diffracts radiation at a first wavelength; curing another portion of the matrix composition, wherein the other cured portion diffracts radiation at another wavelength; and exposing the array to radiation to exhibit an image.
    Type: Grant
    Filed: December 18, 2007
    Date of Patent: May 1, 2012
    Assignee: PPG Industries Ohio, Inc
    Inventors: Sean Purdy, Eldon L. Decker, Calum H. Munro, Noel R. Vanier
  • Patent number: 8168372
    Abstract: Novel, developer-soluble, hard mask compositions and methods of using those compositions to form microelectronic structures are provided. The composition comprises the compound a compound for controlling development rate, and a crosslinking agent in a solvent system. The methods involve applying the composition to a substrate and curing the composition. An imaging layer is applied to the composition, followed by light exposure and developing, during which the light-exposed portions of the imaging layer are removed, along with portions of the hard mask composition adjacent said light-exposed portions. The size of the hard mask composition structures are controlled by the development rate, and they yield feature sizes that are a fraction of the imaging layer feature sizes, to give a pattern that can ultimately be transferred to the substrate.
    Type: Grant
    Filed: September 20, 2007
    Date of Patent: May 1, 2012
    Assignee: Brewer Science Inc.
    Inventor: Sam X. Sun
  • Patent number: 8163463
    Abstract: A photoresist composition including an oxetane-containing compound represented by Formula 1 or 2, an oxirane-containing compound represented by Formula 3 or 4, a photoinitiator, and a solvent, a method of forming a pattern using the photoresist composition, and an inkjet print head including a polymerization product of the photoresist composition. The photoresist composition provides a polymerization product which resists formation of cracks due to an inner stress, and has excellent heat tolerance, excellent chemical resistance, excellent adhesiveness, and excellent durability.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: April 24, 2012
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jin-baek Kim, Byung-ha Park, Kyu-sik Kim, Young-ung Ha, Su-min Kim
  • Patent number: 7993820
    Abstract: A liquid film applicator means can apply a photosensitive lyophobic film 18 to a substrate 16. An exposure unit 10 is placed on the back side of the substrate and forms the lyophobic film applied on the substrate into a pattern in alignment with gate electrodes 13. A dropping unit 55 drops a test liquid to a surface of the substrate having a pattern of the lyophobic film formed by the exposure means. A measuring means 58 detects the droplet dropped by the dropping unit. A determining means determines whether the pattern of the lyophobic film formed by the exposure means is proper or not based on the droplet detected by the detecting means.
    Type: Grant
    Filed: July 11, 2007
    Date of Patent: August 9, 2011
    Assignee: Hitachi, Ltd.
    Inventors: Tomohiro Inoue, Masahiko Ando, Shuji Imazeki
  • Patent number: 7935463
    Abstract: A reusable image forming medium, including a substrate; an imaging layer coated on or impregnated into the substrate, wherein an irradiation of the imaging layer produces an image; and a signature material coated on or impregnated into the substrate or the imaging layer, the signature material being detectable by a sensor.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: May 3, 2011
    Assignees: Xerox Corporation, Palo Alto Research Center Incorporated
    Inventors: Peter M. Kazmaier, Sophie V. Vandebroek, Eric J. Shrader, Gabriel Iftime, Chuck Sperling, Lauren Barclay
  • Patent number: 7897320
    Abstract: The present invention relates to thermoplastic material comprising polymer and at least one polychromic substance, wherein the polychromic substance is a functionalised diacetylene having the formula which has the general structure: X—C?C—C?C—Y—(CO)n-QZ wherein X is H or alkyl, Y is a divalent alkylene group, Q is O, S or NR, R is H or alkyl, and Z is alkyl, and n is 0 or 1. The present invention further relates to a method of processing thermoplastic material to form a plastic article, wherein the method comprises the step of processing the thermoplastic material at a temperature greater than the melt temperature of the thermoplastic, wherein the thermoplastic material comprises polymer and at least one polychromic substance as defined above; and further comprising the step of irradiating the plastic article to colour at least a region of the plastic article.
    Type: Grant
    Filed: January 22, 2009
    Date of Patent: March 1, 2011
    Assignee: The Procter & Gamble Company
    Inventors: Neil John Rogers, Christopher Lamb, Anthony Nicholas Jarvis
  • Patent number: 7892710
    Abstract: A method and article of manufacture for three-dimensional structures having micron dimensions includes coating a substrate with layers of photo resist. Each layer of photo resist is exposed with its own two-dimensional mask defining one slice of an object. Subsequent layers of photo resist are exposed with different patterns. Once all layers have been fabricated and exposed to identify two-dimensional features for the layer, the multiple layers are developed to removed photo resist which has not been exposed. The layered structure represents a three-dimensional object where the depth dimension is defined by the photo resist layer thickness. By decreasing the wavelength of the light exposure, it is possible to confine exposure to a single layer of photo resist.
    Type: Grant
    Filed: May 26, 2005
    Date of Patent: February 22, 2011
    Assignee: University of Delaware
    Inventors: Peng Yao, Dennis W. Prather
  • Patent number: 7892720
    Abstract: To provide a negative photosensitive fluorinated aromatic resin composition having a low relative permittivity, low water absorptivity, high heat resistance and high productivity. A negative photosensitive fluorinated aromatic resin composition comprising the following fluorinated aromatic prepolymer, a photosensitizer and a solvent.
    Type: Grant
    Filed: September 15, 2008
    Date of Patent: February 22, 2011
    Assignee: Asahi Glass Company, Limited
    Inventors: Takeshi Eriguchi, Hiromasa Yamamoto, Kaori Tsuruoka
  • Patent number: 7867687
    Abstract: Embodiments of the invention provide a non-chemically amplified photoresist, which results in reduced line wide roughness (LWR). In accordance with one embodiment the photoresist includes a developer-soluble resin (DSR) and a photoactive compound (PAC). For one embodiment of the invention, the even distribution of the PAC within the DSR results in reduced acid diffusion thus reducing LWR. Prior to exposure to the light source, the PAC inhibits solubility of the DSR in the developer. Upon exposure the PAC converts to acid to promote solubility of the DSR. The even distribution of the PAC within the photoresist results in reduced LWR and a reduction in defects. For one embodiment the photoresist is applied in the EUV technology (e.g., wavelength is 13.4 nm). For such an embodiment the LWR may be reduced to less than 1.5 nm allowing for effective fabrication of devices having feature sizes of approximately 15 nm.
    Type: Grant
    Filed: October 15, 2003
    Date of Patent: January 11, 2011
    Assignee: Intel Corporation
    Inventors: Wang Yueh, Huey-Chiang Liou, Hai Deng, Hok-Kin Choi
  • Patent number: 7851125
    Abstract: Provided are a mask pattern including a silicon-containing self-assembled molecular layer, a method of forming the same, and a method of fabricating a semiconductor device. The mask pattern includes a resist pattern formed on a semiconductor substrate and the self-assembled molecular layer formed on the resist pattern. The self-assembled molecular layer has a silica network formed by a sol-gel reaction. To form the mask pattern, first, the resist pattern is formed with openings on an underlayer covering the substrate to expose the underlayer to a first width. Then, the self-assembled molecular layer is selectively formed only on a surface of the resist pattern to expose the underlayer to a second width smaller than the first width. The underlayer is etched by using the resist pattern and the self-assembled molecular layer as an etching mask to obtain a fine pattern.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: December 14, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jung-Hwan Hah, Jin Hong, Hyun-Woo Kim, Hata Mitsuhiro, Kolake Mayya Subramanya, Sang-Gyun Woo
  • Patent number: 7846623
    Abstract: A reflow stabilizing solution for treating photoresist patterns and a reflow technology are disclosed. The reflow stabilizing solution comprises a polymer and is applied after the photoresist material has been developed and patterned. By treating the photoresist with the reflow stabilizing solution after resist patterning and further subjecting the reflow stabilizing solution to a heat treatment, the non-volatile polymer remains in between adjacent resist patterns and acts as a stopper to the reflowed photoresist. In this manner, the non-volatile polymer provides structural and mechanical support for the reflowed resist, preventing resist collapse at high temperatures and allowing the formation of reflowed resist structures having line width dimensions in the submicron range.
    Type: Grant
    Filed: April 10, 2008
    Date of Patent: December 7, 2010
    Assignee: Micron Technology, Inc.
    Inventor: Yoshiki Hishiro
  • Patent number: 7705963
    Abstract: A pattern generator may include an electromagnetic radiation source and an optical system. The electromagnetic radiation source may emit electromagnetic radiation to create a pattern on a workpiece. The optical system may include an optical path for the electromagnetic radiation emitted from the electromagnetic radiation source and may be configured such that an apodization of the electromagnetic radiation is sufficient to optimize a critical dimension linearity for the created pattern.
    Type: Grant
    Filed: August 23, 2005
    Date of Patent: April 27, 2010
    Assignee: Micronic Laser Systems AB
    Inventors: Torbjorn Sandstrom, Igor Ivonin
  • Patent number: 7695887
    Abstract: A method of producing a pattern-forming body with high accuracy with no need for a post-exposure treatment and without allowing any photocatalyst to remain in the resultant pattern-forming body and whereby any problematic effect of the photocatalyst in the pattern-forming body is eliminated. The method includes providing a photocatalyst-containing layer-sided substrate and a pattern-forming body substrate having a characteristic-changeable layer, which is changed by the effect of the photocatalyst in the photocatalyst-containing layer, and a light-shading part formed as a pattern in such a manner that the photocatalyst-containing layer and the characteristic-changeable layer are brought into contact with each other, followed by exposure on the side of the pattern-forming body substrate to change the characteristics of the characteristic-changeable layer of the exposed part, followed by removing the photocatalyst-containing layer-sided substrate.
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: April 13, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventor: Hironori Kobayashi
  • Patent number: 7678296
    Abstract: This invention is directed to black conductive compositions, black electrodes made from such compositions and methods of forming such electrodes. In particular, the invention is directed to a single layer bus electrode.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: March 16, 2010
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Ji-Yeon Lee, Michael F. Barker, Keiichiro Hayakawa, Hisashi Matsumo, Hiroaki Noda, Jerome David Smith
  • Patent number: 7655365
    Abstract: It is a main object of the present invention to provide a wettability variable substrate provided with a wettability variable layer which is free from any cloud and is superior in adhesion to a substrate, transparency and liquid repellency.
    Type: Grant
    Filed: June 30, 2003
    Date of Patent: February 2, 2010
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Kaori Yamashita, Hironori Kobayashi
  • Patent number: 7648074
    Abstract: A value or security document (2) contains a security feature (4) in the form of a film laser with an emitter layer (12) and preferably a protective layer (14). A spatial, periodic modulation (8), preferably of the surface of a substrate, permits fine adjustment of a laser wavelength within a range of possible wavelengths. This permits a coding of the security feature by different portions of different wavelengths.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: January 19, 2010
    Assignee: Giesecke & Devrient GmbH
    Inventors: Thomas Attenberger, Wolfgang Deckenbach, Rainer Hoppe
  • Patent number: 7648842
    Abstract: The present invention relates to a unique dual color security paper authentication system. The authenticating system comprises the combination of a security paper together with a coordinated applicator. The paper contains a starch, an iodide salt and an acidic developer resin. The applicator of the system comprises two authenticating solutions. The first authenticating solution comprises one or more of a sulfonamide and a copper salt dispersed in a solvent. The second authenticating solution comprises one or more of a leuco and fluoran dye precursor dispersed in a solvent. On applying the authenticating solutions to authentic security paper, a first color of a starch iodine is expressed and a second color of a leuco or fluoran dye is expressed.
    Type: Grant
    Filed: April 4, 2007
    Date of Patent: January 19, 2010
    Assignee: Appleton Papers Inc.
    Inventor: Tianyan Xie Hartlep
  • Publication number: 20090311614
    Abstract: A charge director material for charging a liquid toner, the charge director material comprising (a) nanoparticles of a simple salt and (b) a sulfosuccinate salt of the general formula MAn, wherein M is a metal, n is the valence of M, and A is an ion of the general formula (I) [R1—O—C(O)CH2CH(SO3?)C(O)—O—R2],??(I) wherein each of R1 and R2 is an alkyl group; said charge director material being substantially free of acids of the general formula (I), wherein one or both of R1 and R2 is hydrogen, and if only one of them is hydrogen, the other is an alkyl group,
    Type: Application
    Filed: May 10, 2006
    Publication date: December 17, 2009
    Applicant: Hewlett-Packard Development Company, L.P.
    Inventors: Yaacov Almog, Avi Koller, Elliad Silcoff, Albert Teishev, Yaffa Israeli, Gary Larson, Lufei Lin
  • Patent number: 7582404
    Abstract: A photosensitive paste composition is provided. The photosensitive paste composition contains conductive powder, an inorganic binder, and an organic vehicle, wherein, assuming that 10% by weight of the particles consisting the conductive powder have a diameter less than D10 and 90% by weight of the particles have a diameter greater than D90, a difference between D10 and D90 is about 2.0 ?m or less. The photosensitive paste composition solves problems arising with use of conductive powder having a broad particle diameter distribution and satisfy requirements for an electrode's main characteristics, such as resistance, the anti-sanding property of terminal portions, and withstanding voltage characteristic. In addition, a PDP electrode using the photosensitive paste composition and a PDP including the PDP electrode can be manufactured.
    Type: Grant
    Filed: June 22, 2005
    Date of Patent: September 1, 2009
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Beom-Wook Lee, Dong-Hee Han, Sang-Wook Sin, Jin-Hwan Jeon
  • Publication number: 20090208854
    Abstract: Disclosed is a photosensitive resin composition used to form spacers of a liquid crystal display device. The photosensitive resin composition comprises [A] an alkali-soluble resin, [B] a reactive unsaturated compound, [C] a photopolymerization initiator and [D] a solvent wherein the alkali-soluble resin [A] is a copolymer including structural units represented by Formulae 1 to 3, which are described in the specification. Column spacers formed using the photosensitive resin composition exhibit high compressive displacement, elastic recovery and residual film ratio.
    Type: Application
    Filed: April 27, 2009
    Publication date: August 20, 2009
    Applicant: Cheil Industries Inc.
    Inventors: Jung Sik CHOI, Jae Sun HAN, Jeong Min HONG, Kil Sung LEE
  • Patent number: 7544448
    Abstract: A method for laser marking a substrate which method comprises exposing a composition comprising a tetrabenzodiazadiketoperylene pigment to laser radiation to produce a fluorescent marking readily apparent under UV light is disclosed. Many of the tetrabenzodiazadiketoperylenes herein are novel. This method can yield fluorescent markings which are not readily apparent under ambient light. A method for producing non-fluorescent laser marked substrates containing tetrabenzodiazadiketoperylene dyes is also disclosed.
    Type: Grant
    Filed: October 30, 2006
    Date of Patent: June 9, 2009
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Damien Thurber Cole, Joseph E. Sarver, Colin Dennis Campbell
  • Patent number: 7523603
    Abstract: A thermally diluted exothermic reactor system is comprised of numerous orifices distributed within a combustor by distributed perforated contactor tubes or ducts. The perforated contactors deliver and mix diluent fluid and one or more reactant fluids with an oxidant fluid. Numerous micro-jets about the perforated tubes deliver, mix and control the composition of reactant fluid, oxidant fluid and diluent fluid. The reactor controls one or more of composition profiles, composition ratio profiles and temperature profiles in one or more of the axial direction and one or two transverse directions, reduces temperature gradients and improves power, efficiency and emissions.
    Type: Grant
    Filed: January 22, 2004
    Date of Patent: April 28, 2009
    Assignee: Vast Power Portfolio, LLC
    Inventors: David L. Hagen, Gary Ginter, Bill Goheen, Allan McGuire, Janet Rankin