Abstract: The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.

Abstract: Disclosed is a heat-sensitive recording material containing an ultraviolet light absorber precursor which forms an ultraviolet light absorber by being irradiated with light, and a hydrogen donor.

Abstract: The present invention provides a thermal recording material comprising a support and at least a thermal recording layer disposed on the support, wherein at least one of the thermal recording layer includes, together with an electron donating colorless dye, at least an electron accepting compound represented by the following general formula (1). R1 and R2 each independently represents a hydrogen atom, an alkyl group or an aryl group; and Ar is represented by the following general formula (2). In the general formula(2), R11 to R14 each independently represents a hydrogen atom, an alkyl group with 1 to 4 carbon atoms or an aryl group.

Abstract: A recording material includes a support having disposed thereon a recording layer including at least: a diazo compound having no diazonio group; a coupler compound that colors by reacting with the diazo compound; and a polymerizable compound.

Abstract: There is provided a negative planographic printing plate which can be directly recorded based on digital data from computers and the like, excellent in storage stability, shows no reduction in sensitivity with the lapse of time, and has excellent face flatness. It comprises a substrate having disposed thereon a photosensitive layer which is obtained by applying a photosensitive layer application solution containing an infrared absorber, a compound which generates a radical or acid due to heat, a polymerizable compound or a crosslinking compound, and a silicon-based surfactant such as a siloxane/oxyethylene copolymer and the like, onto the substrate and drying the solution, and which is hardened by exposure to an infrared laser ray.

Abstract: A positive photoresist composition for exposure to a far ultraviolet ray which comprises (A) a compound which generates an acid upon irradiation with an actinic ray or radiation, (B) a resin which contains a repeating unit corresponding to hydroxystyrene and solubility of which increases in an alkaline developing solution by the action of an acid, and (C) (1) at least one solvent selected from the group consisting of propylene glycol monomethyl ether acetate and propylene glycol monomethyl ether propionate, and (2) at least one solvent selected from the group consisting of propylene glycol monomethyl ether and ethoxyethyl propionate. The positive photoresist composition of the present invention is suitable for exposure to a far ultraviolet ray, particularly a KrF excimer laser beam, is improved in line edge roughness and micro grain, is excellent in uniformity of carting on a substrate and has less particles in its resist solution.

Abstract: A light-sensitive and heat-sensitive recording material containing a diazo compound and a coupling component or a coupler, in which a density of a recorded image and a whiteness of a base portion are both improved. The recording material includes a recording layer disposed on a substrate. The recording layer preferably contains the diazo compound in the form of a diazonium salt and enclosed in micro-capsules together with an acylphosphine oxide compound, wherein the diazonium salt is reactive with the coupler.

Abstract: A novel photo-curable resin composition. The resin composition capable of providing a cured product having excellent mechanical strength, high dimensional accuracy, and excellent toughness. The resin composition is capable of providing a cured product which experiences little change in mechanical strength over time. The resin composition is capable of forming, by photo-fabricating, a three-dimensional object which can be used for a long period of time in a humid atmosphere. The composition comprises, (A) an epoxy compound having a cyclohexene oxide, (B) a cationic photo-initiator, (C) an ethylenically unsaturated monomer, (D) a radical photo-initiator, and (E) a polyol.

Abstract: A heat development type duplicating material having a recording layer which is formed on a support. The recording layer comprises a photosensitive diazo compound and a coupler that reacts with the diazo compound to develop color. Furthermore, the duplicating material contains an ascorbic acid derivative. The heat development type duplicating material generates little stain in background areas, exhibits satisfactory storage stability, and provides a high image density.

Abstract: A photosensitive resin composition comprising (a) a polymer having carboxyl groups (b) a photoacid generator which generates an acid when irradiated with light, and (c) an aliphatic amine is capable of development with ease by use of a wide variety of aqueous solvents.

Abstract: Positive-tone and negative-tone chemically amplified resist compositions comprising: (a-1) a blocked resin, (a-2) a combination of an alkali-soluble resin and a dissolution controlling agents, or (a-3) a combination of an alkali-soluble resin and a crosslinking agent, (b) a photoacid generator, and (c) specific kinds of solvents. The both positive-tone and negative-tone resist compositions exhibits superior sensitivity, high resolution capability, and excellent storage stability, and can be excellently applied especially to large sized substrates by spincoating for producing excellently shaped patterns by irradiation. The compositions can be used with advantage as a chemically amplified resist for the manufacture of semiconductor devices or integrated circuits (ICs).

Abstract: A thermal development diazo copying material is composed of a support, a diazo layer which contains a diazo compound, and a coupler layer which contains a coupling component, an alkali-soluble resin and a thermofusible material, which are overlaid on the support.

Abstract: A photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a crosslinking agent. The crosslinking agent comprises a water soluble sugar. The present invention also provides a method of making microelectronic structures.

Abstract: A photosensitive composition including a water-soluble aromatic diazo compound having at least two diazo groups and lactic acid, hydroxyacetic acid or, a mixture thereof in an amount of at least one third by weight of the diazo compound. The photosensitive composition is in the form of a liquid or paste, is thus easy to handle, is suitable for use in the production of photosensitive printing plates, and has good storage stability.

Abstract: A recording material which comprises a support having provided thereon capsules containing a photosensitive diazonium salt, and a polymerizable coupler. The recording material can give a predetermined hue when light, pressure, heat and the like are applied alone or in combination. The main advantages of the recording material are that a specific hue can be selected safely, mixing of colors can be avoided, desensitization problem does not occur and a fixed image can be obtained.

Abstract: A diazo-type recording material comprising a support having thereon a recording layer comprising a photosensitive diazo compound enclosed in microcapsules, a coupling component which reacts with said diazo compound by heating at a basic pH to develop a color, and a 1-phenyl-3-pyrazolidone compound represented by the formula: ##STR1## wherein the substituents X, and R.sub.1 -R.sub.4 are defined in the specification.

Abstract: A negative working resist composition comprising (a) an alkali-soluble resin, (b) an aromatic compound having at least two groups of the formula: --OCH.sub.2 OR.sup.1 wherein R.sup.1 is alkyl or aralkyl, (c) a photoacid generator, and (d) a solvent, can form fine patterns with high resolution when exposed to deep UV, KrF excimer laser light, etc. due to high light transmittance and high sensitivity.

Abstract: The present invention relates to a process for producing a negative-working photosensitive lithographic printing form, in which a negative-working photosensitive mixture which is dissolved in a solvent mixture and which contains a negative-working photosensitive compound and a polymeric binder which is insoluble in water but soluble in aqueous alkaline solution is applied to a base and the layer obtained is subsequently dried, which process comprises using a mixture of more than 2% by weight of at least one monoether of diethylene glycol with one or more organic solvent(s) having a boiling point below 200.degree. C. as the solvent mixture.

Abstract: A diazo type recording material, which has a substantially unstained background, a superior preservability, and is capable of producing images of high density, wherein the diazo recording material comprises a support having thereon a recording layer comprising a photosensitive diazo compound, a hydroxyphenylsulfone derivative and a coupling component which forms a color by reacting with the diazo compound, with the diazo compound being enclosed in microcapsules.

Abstract: A light-sensitive composition comprising (a) a diazonium compound, (b) a polyurethane resin having a substituent group with an acidic hydrogen atom, and (c) a compound of the following general formula: ##STR1## wherein X is a single bond, --O--, --CH.sub.2 --, or --CH.sub.2 O--; Y is an alkyl group, a hydroxy group, an alkoxy group, a nitro group or a halogen atom; n is an interger of from 0 to 5; R is a hydrogen atom, an alkyl group, a phenyl group or a substituted phenyl group; and wherein, when n.gtoreq.2, Y may be the same or different.Also disclosed is a photosensitive lithographic printing plate having a support and a light-sensitive layer deposited thereon. The light-sensitive layer comprises the above novel light-sensitive composition.

Abstract: A light-sensitive mixture is described which contains a diazonium salt polycondensation product, a free-radical polymerizable compound having at least one terminal ethylenically unsaturated group and a boiling point at atmospheric pressure above 100.degree. C., a polymerization initiator which forms free radicals under the action of actinic radiation, and, as a first binder, a water-insoluble reaction product which is soluble in organic solvents and in aqueous alkaline solutions, which is a reaction product of an intramolecular anhydride of an organic polycarboxylic acid with a hydroxyl-containing synthetic polymer, and which has no further functional groups capable of reacting with acid anhydrides, and, as a further binder, an acid organic polymer having an acid number above 70, preferably a (meth)acrylic acid copolymer. The mixture is useful for producing planographic printing plates which give long print runs, and is notable for a long shelf life at elevated temperature.

Abstract: A light-sensitive composition which comprises, (a) an ethylenically unsaturated addition polymerizable compound, (b) an alkaline water-soluble or swellable, and film-forming polymer, (c) a photopolymerization initiator, (d) a negative working diazo resin, and (e) at least one compound selected from the group consisting of a higher fatty acid and a higher fatty acid amide which are solid at ordinary temperatures.The light-sensitive composition is hardly influenced by oxygen and is suitable for a presensitized plate from which a printing plate is to be prepared.

Abstract: A positive radiation-sensitive mixture is disclosed containing a compound which forms an acid under the influence of actinic radiation, and an acid-cleavable compound, wherein the acid-cleavable compound is monomeric and contains an acetal group whose aldehyde or ketone component has a developer solubility of about 0.1 to 100 g/l and a boiling point above about 150.degree. C. The mixture does not exhibit different development properties, even at different "holding times", and therefore exhibits a wide processing latitude and makes possible a high structural resolution.

Abstract: A photosensitive composition, comprising a photosensitive diazo compound and a polymeric binder, wherein the diazo compound has a polymerizable unsaturated bond in the molecule.

Abstract: A photosensitive composition is described, comprising a diazonium compound and a polyurethane resin having a carboxyl group in its main chain. The composition can be developed with an aqueous alkali developer to provide a lithographic printing plate having a long press life.

Abstract: Presensitized imaging element comprising a support and a light-sensitive hyrophilic layer thereon, said light-sensitive hydrophilic layer containing in homogeneously distributed state throughout the entire layer a hydrophilic (co)polymer or (co)polymer mixture, a tetraalkyl orthosilicate crosslinking agent in an amount of at least 0.2 parts by weight per part by weight of hydrophilic (co)polymer or (co)polymer mixture and a low-molecular weight diazonium salt and preferably also (a) substance(s) that increase(s) the mechanical strength and the porosity of the layer, by means of which a lithographic printing plate can be produced by imagewise exposing said imaging element to an ultraviolet radiation source, subsequently bringing it in the presence of an aqueous liquid in contact with a receptor element comprising a receiving layer containing a polyionic mordant for the diazonium salt and separating it from the receiving layer to leave the residual non-exposed diazonium salt on the receiving layer.

Abstract: The invention is a modified organic photoresist which is resistant to etching in oxygen-containing plasmas and therefore particularly useful for masking and etching organic polymer materials in VLSI and advanced packaging applications. The invention comprises adding a phosphorous-containing compound to a conventional photoresist. The phosphorous-containing compound is of a type and in an amount effective to substantially prevent etching of the modified photoresist in an oxygen-containing plasma without substantially adversely affecting the photosensitivity of the photoresist or the elasticity or the adhesion of the etch resistant film formed during oxygen-containing plasma exposure to an underlying material to be patterned and etched.

Abstract: A heat-sensitive recording material comprising a base and, on top of the said base, a heat-sensitive layer containing a cyclic diazo component and a coupling component, the cyclic diazo component being a benzotriazine compound of the formula ##STR1## wherein Q is --CH.sub.2 --, --CO-- or --SO.sub.2 --, R is hydrogen, hydroxyl, or aryl or alkenyl, each unsubstituted or substituted by halogen, hydroxyl, cyano, lower alkoxy, lower alkylthio, acyloxy, lower alkoxycarbonyl or lower alkylsulfonyl, or is acyl, acyloxy or acylamino, cycloalkyl, or is aryl or aralkyl such as phenyl, phenylalkyl or naphthyl each unsubstituted or substituted on the ring by cyano, halogen, nitro, trifluoromethyl, lower alkyl, lower alkylthio, lower alkoxy, lower alkylcarbonyl or lower alkoxycarbonyl, or is a heterocyclic radical, and the benzene ring A is unsubstituted or substituted by halogen, cyano, nitro, lower alkyl, lower alkoxy, lower alkylthio, lower alkylcarbonyl or lower alkoxycarbonyl.

Abstract: A positive radiation-sensitive mixture is disclosed comprising a compound which forms an acid under the action of actinic radiation, and an acid-cleavable compound, the acid-cleavable compound producing, as cleavage product, an aromatically-substituted alcohol of the general formula I. The radiation-sensitive mixture according to the inventionexhibits a wide processing latitude since different holding times do not cause any changes with respect to the development times.

Abstract: A process is described for producing a presensitized lithographic printing plate by coating onto a surface-roughened aluminum plate a solution having dissolved in a solvent containing at least 10 wt % 1-methoxy-2-propanol a negative-working, light-sensitive composition which contains a light-sensitive diazo resin and a high-molecular weight compound and which is developable with an aqueous alkali developer, and drying the coated solution.

Abstract: A process for producing a photosensitive lithographic plate comprises coating onto a substrate having a hydrophilic surface a solution of a negative working photosensitive composition containing a photosensitive diazo resin and a linear organic polymer dissolved in a solvent mixture comprising:(a) at least 10 wt. % of 1-methoxy-2-propanol,(b) an amino group-free polar solvent having a boiling point under 1 atm of 50.degree. to 100.degree. C. and a dielectric constant at 20.degree. C. of at least 5.5, and(c) 2 to 50 wt. % of methyl lactate,and drying the coated solution.

Abstract: A photosensitive composition principally comprised of a photosensitive diazo resin and a lipophilic high molecular compound, wherein said photosensitive composition further contains a metal complex dye soluble in an organic solvent. Also disclosed is a photosensitive lithographic printing plate employing such a photosensitive composition.

Abstract: A heat-sensitive recording material is disclosed. The material comprises a support having provided thereon a recording layer containing one or more diazo compound, a coupling component, and at least one thiohydroquinone derivative as a sensitizing agent.

Abstract: A light-sensitive composition which contains a polyurethane resin having a carbon-carbon unsaturated bond and a carboxyl group. A presensitized plate using the above light-sensitive composition can be developed with an aqueous alkaline developing solution and provides a lithographic printing plate having excellent printing durability.

Abstract: This invention relates to a radiation polymerizable composition for use in a photographic element such as a lithographic printing plate comprising in admixturea) a polymeric binder;b) a photoinitiator;c) a diazonium salt; andd) a photopolymerizable mixture ofi) a polyfunctional acrylic monomer having from 3 to 6 unsaturated groups; andii) a monofunctional acrylic monomer having 1 unsaturated group.

Abstract: Light sensitive compositions are disclosed which comprise 2-halomethyl-1,3,4,-oxadiazole compounds having a heterocyclic radical in the fifth position containing at least one element selected from the group consisting of oxygen, nitrogen, sulphur, and selenium directly or through a vinyl radical.

Abstract: A light-sensitive mixture that contains a diazonium salt polycondensation product, a polymeric binder and an organic peroxide which has a scorch temperature of at least 100.degree. C. and, above this temperaure, is capable of forming free radicals is especially useful for the preparation of planographic printing plates, the print run of which can be extended by burning-in the exposed and developed plate. The light-sensitive mixture has a long storage life in the dark.

Abstract: Disclosed is a two-color heat-sensitive recording material which comprises a base sheet and a recording layer of single-layer or multi-layer structure formed on the base sheet, the recording layer comrising:(a) a diazonium salt,(b) a basic leuco dye,(c) a 2-hydroxy-3-naphthoic acid derivative which acts as a coupler compound for causing the diazonium salt to develop color when heated and which also acts as a color developing material for causing the basic leuco dye to develop color when heated, and(d) a basic substance, wherein the diazonium salt and the basic leuco dye each form a color upon application of heat, thereby giving the first image of a mixed color, and, then, after irradiation of an active ray to decompose the diazonium salt, the basic leuco dye alone forms its own color upon application of heat, thereby giving the second image whose color is different from the mixed color of the first image.

Abstract: This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied to a substrate. The photoresist layer contains a contrast-enhancing layer including at least one light-sensitive compound capable of producing acidic photoproducts upon exposure to actinic radiation, at least one indicator dye that changes color on exposure to acidic conditions and at least one polymeric binder soluble in water or weakly alkaline aqueous solutions. The photographic element is exposed to active radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer. The photographic element is exposed to actinic radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer.

Abstract: A photosolubilizable composition contains both a compound capable of producing an acid by irradiation with actinic rays and a compound which has at least one silyl ether or silyl ester group capable of being decomposed by an acid; optionally, a compound having at least one silyl ether group has at least one hydrophilic group, providing for increased solubility in a developing solution under the action of an acid, thus enhancing the photosensitivity and the development latitude of the composition.

Abstract: A method of forming an image on a substrate is described which comprises blending a desired coloring pigment, adding the coloring pigment to a water soluble photoresist, coating the substrate with the pigmented photoresist, exposing the photoresist to actinic radiation to harden the parts of the photoresist occupying the desired image area, and removing with a water based solvent the unexposed photoresist.

Abstract: Compounds of formula I ##STR1## in conjunction with compounds that donate acid when exposed to actinic radiation, are suitable for use as positive photoresists. In formula I, R.sup.1 and R.sup.2 are hydrogen, alkyl, aryl, cycloalkyl, aralkyl or alkaryl, R.sup.3 to R.sup.8 are hydrogen or lower alkyl, X is --O-- or --NR.sup.9 --, where R.sup.9 is hydrogen or C.sub.1 -C.sub.4 alkyl, n is 0 or 1, m is 2, 3 or 4 and Q is an organic radical of valency m.The photoresists are suitable for making printing forms, printed circuits, integrated circuits or silver-free photographic films.

Abstract: A heat-sensitive recording material is described, comprising a support having provided thereon a recording layer comprising a diazo compound and a coupling component, wherein the improvement comprises including said diazo compound and at least one compound selected from a polymerizable compound containing an ethylenically unsaturated bond therein or at least one compound capable of releasing a free radical upon exposure to light together in microcapsules.

Abstract: A diazotype sheet is developable solely by heat, the sheet comprising in at least one layer a heat-softenable, organic solvent-soluble resin, an acid-stabilized diazonium salt, at least one azo-coupler compound capable of reacting to form a dye, and an acid neutralizing component immobilized either by encapsulation or by coating as a separate layer with or without a binder. The sheet has incorporated therein at least one plasticizer which is either liquid at room temperature (i.e., 20.degree. to 25.degree. C.) or fusible at a temperature between room temperature and the development temperature.

Abstract: Radiation sensitive compositions are image-wise exposed and developed to form an image which is then heated to improve its strength as a lithographic printing image or etch resist. The heating is carried out in the presence of a heat sensitive dye which undergoes a color change at a temperature of at least 180.degree. C. so as to obtain an indication of whether or not the heating has been adequate. The dye may be an integral component of the composition or it may be applied to the image, after development, in combination with a substance capable of forming a shield against contaminating residues produced during the heating step.

Abstract: A heat-sensitive recording material comprising a substrate and a heat-sensitive recording layer thereon, the heat-sensitive recording layer containing a diazonium salt, coupler compound, heat-fusible basic compound and at least one of the compounds represented by the formula [I] below ##STR1## wherein X is --O-- or --CONH--, R.sub.1 and R.sub.2 are each hydrogen, halogen, alkyl having 1 to 8 carbon atoms, cycloalkyl, aryl, aralkyl or alkoxyl and n is an integer of 1 to 10.

Abstract: A photosensitive mixture comprised of(a) a diazonium salt polycondensation product comprising recurring units of the formulas A--N.sub.2 X and B, which units are linked by bivalent intermediate members derived from a carbonyl compound which is capable of condensation, wherein the A--N.sub.2 X units are derived from aromatic diazonium compounds that are capable of condensation with formaldehyde, and the B units are derived from compounds which are free from diazonium groups and are also capable of condensation with formaldehyde in a strongly acidic medium;(b) a compound which can be polymerized by a free-radical process;(c) a photopolymerization initiator; and(d) a polymeric binder that is insoluble in water, but soluble in organic solventscan be used in the production of photosensitive printing plates and photoresists.

Abstract: A heat-sensitive recording material is described, comprising a support having provided thereon a recording layer comprising a binder containing a diazonium compound and a coupling component, said diazonium compound being a diazonium salt represented by formula (I)ArN.sub.2.sup.+ X.sup.- (I)wherein Ar represents a substituted or unsubstituted aromatic moiety; and X.sup.- represents an acid anion containing an alkyl group having three or more fluorine atoms.

Abstract: The lithographic printing plate of the invention comprises a substrate having a hydrophilic surface, a coating on said surface of a light sensitive material (e.g., a water soluble diazo) and a top coating of discrete, oleophilic resin particles (e.g., an emulsion polymer), the resin particle coating being:(a) transparent to actinic light;(b) sufficiently permeable to allow a developer for the light sensitive material to penetrate through to the underlying light sensitive coating;(c) insoluble in said developer;(d) capable of being coalesced in situ after the plate is imaged and developed.

Abstract: A light-sensitive composition for use with lithographic printing plates is described which comprises (1) a light-sensitive, organic solvent soluble and substantially water-insoluble diazo resin which is the reaction product of a water-soluble, light-sensitive condensate of an aromatic diazonium compound and an organic condensing agent with a halogenated Lewis acid or a salt thereof, (2) a substantially water-insoluble, film forming organic high-molecular weight compound having an acid value of from 10 to 200, (3) a polynuclear aromatic sulfonic acid or a salt thereof, and (4) a salt-forming organic dye compound.