Diazonium Compound Containing Patents (Class 430/171)
  • Patent number: 10012901
    Abstract: The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2).
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: July 3, 2018
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Patent number: 8771923
    Abstract: A radiation-sensitive composition includes a low-molecular-weight compound, a solvent and a radiation-sensitive acid-generator other than the low-molecular-weight compound. The low-molecular-weight compound has one or more acid-dissociable groups which decompose by an action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule. The low-molecular-weight compound has a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000. The low-molecular-weight compound is not obtained from chain growth polymerization of a monomer with an unsaturated bond. A content of the low-molecular-weight compound is 80 mass % or more of 100 mass % of a total solid component of the radiation-sensitive composition. The low-molecular-weight compound is a compound shown by a following formula (1).
    Type: Grant
    Filed: December 19, 2012
    Date of Patent: July 8, 2014
    Assignee: JSR Corporation
    Inventors: Nobuji Matsumura, Daisuke Shimizu, Toshiyuki Kai
  • Patent number: 7465527
    Abstract: The resist material contains a photo-acid generator having an absorption peak to exposure light having a wavelength of less than 300 nm, and a second photo-acid generator having an absorption peak to exposure light having a wavelength of 300 nm or more. The method for forming a resist pattern comprises a step for selectively exposing which exposes a coating film of the resist material to an exposure light having a wavelength of less than 300 nm, and a step for selectively exposing by using an exposure light having a wavelength of 300 nm or more. The semiconductor device comprises a pattern formed by the resist pattern. The method for forming a semiconductor device comprises a step for forming a resist pattern on an underlying layer by the aforementioned manufacturing method, and a step for patterning the underlying layer by etching using the resist pattern as a mask.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: December 16, 2008
    Assignee: Fujitsu Limited
    Inventors: Junichi Kon, Ei Yano
  • Patent number: 7381516
    Abstract: A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconductor nanoparticle quantum dot that has at least one electronic excited state that is accessible by absorption of two or more photons, and (2) a composition, different from said reactive species, that is capable of interacting with the excited state of the semiconductor nanoparticle quantum dot to form at least one reaction-initiating species.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: June 3, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: David S. Arney, Catherine A. Leatherdale, Manoj Nirmal
  • Patent number: 7351521
    Abstract: The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process for imaging the photoresist composition of the present invention, and to a process of making the polymer in the presence of an organic base.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: April 1, 2008
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Ralph R. Dammel, Raj Sakamuri, Francis M. Houlihan
  • Patent number: 7300738
    Abstract: A recording material having, on a support, a recording layer containing an azolinyl acetic acid derivative and a diazo compound. The azolinyl acetic acid derivative is preferably is a compound represented by the following general formula (1): wherein X represents an oxygen atom or a sulfur atom; R11 represents an alkyl group, an aryl group, a heterocyclic group, —OR13 or —NR14R15; R12 represents a substituent; R13 represents an alkyl group, an aryl group or a heterocyclic group; R14 and R15 each independently represents a hydrogen atom, an alkyl group, an aryl group or a heterocyclic group; n represents an integer from 0 to 4; and, when n is an integer of 2 or greater, two or more R12s may be linked with each other to form a ring.
    Type: Grant
    Filed: February 9, 2004
    Date of Patent: November 27, 2007
    Assignee: Fujifilm Corporation
    Inventors: Naoki Saito, Tetsunori Matsushita, Akinori Fujita, Yohsuke Takeuchi, Satoshi Higuchi, Kimi Ikeda
  • Patent number: 7270928
    Abstract: The present invention provides an isocyanate composition including an adduct of a multifunctional isocyanate compound having two or more isocyanate groups in the molecule thereof with a polymer obtained by radically polymerizing in the presence of a chain transfer agent having active hydrogen at least a vinyl monomer including a polymerizable compound having a polyether represented by the following Formula (I): A1-(L-O)n-B1 ??Formula (I) wherein A1 represents a group having an ethylenically unsaturated double bond; L represents an alkylene group; B1 represents an alkyl group or an aryl group; and n is an average polymerization degree of the polyether and represents a number of 8 to 300.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: September 18, 2007
    Assignee: Fujifilm Corporation
    Inventors: Takashi Tamura, Koreshige Ito
  • Patent number: 7229737
    Abstract: Disclosed is a photopolymerizable composition containing a polymerizable compound having an addition-polymerizable unsaturated bond, an organic dye, and an organoboron compound represented by the following general formula (I), wherein at least one kind of the organoboron compound is included and the proportion thereof is one mole or more per mole of the organic dye B?R)4X?.
    Type: Grant
    Filed: June 29, 2001
    Date of Patent: June 12, 2007
    Assignee: Fujifilm Corporation
    Inventors: Yuuichi Fukushige, Shintaro Washizu
  • Patent number: 7118845
    Abstract: A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inclusive.
    Type: Grant
    Filed: June 5, 2003
    Date of Patent: October 10, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Robert J. DeVoe, Harvey W. Kalweit, Catherine A. Leatherdale, Todd R. Williams
  • Patent number: 7005229
    Abstract: A method of multiphoton photosensitizing comprises (a) providing a multiphoton-activatable, photoreactive composition comprising (1) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction, and (2) a photoinitiator system comprising photochemically-effective amounts of (i) at least one type of semiconductor nanoparticle that has at least one electronic excited state that is accessible by absorption of two or more photons, and (ii) a composition that is capable of interacting with the excited state of the semiconductor nanoparticle to form at least one reaction-initiating species; and (b) irradiating the multiphoton-activatable, photoreactive composition with light sufficient to cause absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: February 28, 2006
    Assignee: 3M Innovative Properties Company
    Inventors: Manoj Nirmal, Catherine A. Leatherdale, David S. Arney
  • Patent number: 6939663
    Abstract: The present invention provides a thermally sensitive composition that may be coated as a water-borne material onto a substrate to yield a printing plate precursor having an imageable coating. The thermally sensitive composition comprises a sulfated phenolic resin. The sulfated phenolic resin may be a sulfated novolak resin or a sulfated resole resin, for example. The thermally sensitive composition may include a water-soluble binder, such as polyvinyl pyrrolidone, and a radiation-absorbing component. The invention also provides a printing plate precursor that is developed in water after imaging. The precursor does not require chemical development with a developing solution containing organic solvents or inorganic additives. The imaged precursor is on-press-developable when used with a fountain solution. Methods for making and using the precursor are also provided.
    Type: Grant
    Filed: July 8, 2003
    Date of Patent: September 6, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ting Tao, Scott A. Beckley, John Kalamen, Kevin Barry Ray
  • Patent number: 6908727
    Abstract: This invention describes a heat sensitive composition comprising: (A-I) a compound which is represented by the following general formula (I) and generates a radical when heated, and (B-I) a compound having physical and chemical properties that are changed irreversibly by a radical, R—SO2?M+??General formula (I) wherein R represents an alkyl group or aryl group, and M+ represents a counter cation selected from sulfonium, iodonium, diazonium, ammonium and azinium; and a negative planographic printing plate precursor which can be recorded by heat mode using this composition. This invention also describes a planographic printing plate precursor comprising a substrate having disposed thereon a photosensitive layer containing (C-II) a light-heat converting agent, (B-II) a compound having a polymerizable unsaturated group, and (A-II) an onium salt having at least two cation parts in one molecule.
    Type: Grant
    Filed: March 11, 2004
    Date of Patent: June 21, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Shimada, Tadahiro Sorori, Morio Yagihara
  • Patent number: 6875551
    Abstract: A heat-sensitive recording material including a substrate and a heat-sensitive recording layer containing a diazonium salt and a coupler, the heat-sensitive recording layer being disposed on or over the substrate, wherein the diazonium salt is a compound represented by the following general formula (1):
    Type: Grant
    Filed: August 20, 2003
    Date of Patent: April 5, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoshihiro Jimbo, Hisato Nagase, Yasuhiro Mitamura
  • Patent number: 6846608
    Abstract: A method to reduce effluence during or immediately after imaging of a printing plate is described. In one embodiment of the invention, the method comprises: (a) applying to a substrate a coating composition comprising a photothermal converter and at least one polymer comprising thiosulfate groups to obtain a coating; and (b) applying a water soluble topcoat to the coating. Preferably, the water soluble topcoat does not comprise a photothermal converter. In another embodiment of the invention, the method comprises applying to a substrate a composition comprising: (a) a photothermal converter; (b) at least one polymer comprising thiosulfate groups; and (c) an additive selected from the group consisting of diazonium, iodonium, copper(I), alkoxypyridinium or maleimide additives.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: January 25, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Shiying Zheng, Elizabeth Knight, Thap Dominh
  • Patent number: 6818372
    Abstract: A lithographic printing plate precursor comprising a hydrophilic support having provided thereon an image-forming layer containing a radical initiator, an infrared absorbing dye, and at least one component selected from fine particles containing a radical polymerizable compound having the specific structure and microcapsules encapsulating a radical polymerizable compound having the specific structure.
    Type: Grant
    Filed: March 7, 2002
    Date of Patent: November 16, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Kunita, Hiromitsu Yanaka
  • Publication number: 20040180289
    Abstract: This invention describes a heat sensitive composition comprising: (A-I) a compound which is represented by the following general formula (I) and generates a radical when heated, and (B-I) a compound having physical and chemical properties that are changed irreversibly by a radical,
    Type: Application
    Filed: March 11, 2004
    Publication date: September 16, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kazuto Shimada, Tadahiro Sorori, Morio Yagihara
  • Publication number: 20040161694
    Abstract: A heat-sensitive recording material including a substrate and a heat-sensitive recording layer containing a diazonium salt and a coupler, the heat-sensitive recording layer being disposed on or over the substrate, wherein the diazonium salt is a compound represented by the following general formula (1): 1
    Type: Application
    Filed: August 20, 2003
    Publication date: August 19, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yoshihiro Jimbo, Hisato Nagase, Yasuhiro Mitamura
  • Patent number: 6746985
    Abstract: A full-color heat-sensitive recording material. At least a heat-sensitive recording layer that color-develops to yellow color; a heat-sensitive recording layer that color-develops to cyan color and a heat-sensitive recording layer that color-develops to magenta color are sequentially provided on a support in this order from the support side. All of the above-mentioned heat-sensitive recording layers contain a diazo compound and/or diazonium salt, and a coupler compound that reacts with the diazo compound and/or diazonium salt for color development.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: June 8, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Shunsaku Higashi
  • Patent number: 6723495
    Abstract: Negative-working, water-developable imageable elements, useful as printing plate precursors, and methods for their use, are disclosed. The elements can be imaged with ultraviolet radiation, with infrared radiation, or with heat. The elements contain an imageable composition that contains a latent Brönsted acid, a water-soluble or water-dispersible binder, and an acid-activated cross-linking agent.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: April 20, 2004
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Kevin Ray, Paul Kitson
  • Patent number: 6723482
    Abstract: The present invention provides a heat-sensitive recording material comprising a substrate having disposed thereon at least a heat-sensitive recording layer comprising: microcapsules; diazonium salt compounds contained within the microcapules and represented by the following general formula (I); and a coupler which undergoes coupling-reaction with the diazonium salt compounds to cause color development, wherein three or more of the diazonium salt compounds represented by the general formula (I) are contained in the same microcapsule: (wherein R1, R2 and R3 each independently represents an alkyl group, a substituted alkyl group, an aryl group or a substituted aryl group; and X− represents a counter anion).
    Type: Grant
    Filed: June 12, 2002
    Date of Patent: April 20, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Koreshige Ito
  • Publication number: 20040067431
    Abstract: A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconductor nanoparticle quantum dot that has at least one electronic excited state that is accessible by absorption of two or more photons, and (2) a composition, different from said reactive species, that is capable of interacting with the excited state of the semiconductor nanoparticle quantum dot to form at least one reaction-initiating species.
    Type: Application
    Filed: October 2, 2002
    Publication date: April 8, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: David S. Arney, Catherine A. Leatherdale, Manoj Nirmal
  • Patent number: 6716563
    Abstract: This invention relates to nano-lithography with &pgr;-conjugated azo dyes and azo-metal complexes represented by formula 1 or formula 2(Korea Pat. Appln. Nos. 2001-6879˜6880), which has both electron-donating and electron-accepting groups in the molecular structures, as a resist on Si substrate by using an AFM anodization. lithography. Developing optimum conditions of scan speed, bias voltage, and resist materials are key issues for achieving a high resolution patterning on various substrates. We accomplished nanometer-scale patterning in approximately 35 nm dimensions.
    Type: Grant
    Filed: August 8, 2002
    Date of Patent: April 6, 2004
    Assignee: Hanyang Hakwon Co., Ltd.
    Inventors: Haiwon Lee, Hyeyoung Park
  • Publication number: 20040048185
    Abstract: A heat-sensitive recording material containing a support and a heat-sensitive recording layer formed on the support, the heat-sensitive recording layer including a diazonium salt and a coupler that thermally reacts with the diazonium salt to develop color.
    Type: Application
    Filed: August 29, 2003
    Publication date: March 11, 2004
    Applicant: FUJI PHOTO FILM CO., LTD
    Inventors: Hisao Yamada, Hiroshi Sato, Yoshimitsu Arai, Kimi Ikeda
  • Patent number: 6660446
    Abstract: A heat-sensitive composition comprising a compound of a specific general formula which generates an acid or radical when heated, and a compound whose physical and chemical properties are irreversibly changed by an acid or radical.
    Type: Grant
    Filed: May 29, 2001
    Date of Patent: December 9, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Shimada, Tadahiro Sorori, Kunihiko Kodama
  • Patent number: 6653043
    Abstract: Active particles which when incorporated into a photosensitive composition containing base resin and diazonium-series photosensitizer provide improvement in at least one or both of sensitivity and resolutionn. The active particles include a particulate carrier, such as silica sol, and an aromatic unit directly or indirectly bonded to the carrier. The aromatic unit has a phenolic hydroxyl group and no substituent in at least one of the o- and p-positions, in relation to the phenolic hydroxyl group. The active particles, when incorporated into the photosensitive composition can, after exposure, increase solubility difference between the exposed and non-exposed areas.
    Type: Grant
    Filed: October 31, 2000
    Date of Patent: November 25, 2003
    Assignee: Kansai Research Institute, Inc.
    Inventor: Makoto Hanabata
  • Publication number: 20030198890
    Abstract: A negative-type planographic printing plate having, disposed on a support, a recording layer comprising an image recording material which contains an infrared ray absorbing agent and can be recorded by irradiation with an infrared ray, in which, as for the infrared ray absorbing agent comprising a cyanine dye, at least one of substituents on nitrogen atoms at both ends was selected from the group consisting of the following substituents: —C(═X)R1; —C(═X)NR2R3; —CH≡CR4R5; —C═CR6; —CHR7R8;—CR9R10R11; and —Ar, wherein X represents O, S or Se; R1 to R6 each independently represent H or a hydrocarbon group having 20 or fewer carbon atoms which may have a substituent; R7 to R11 each independently represent a hydrocarbon group having 20 or fewer carbon atoms which may have a substituent; and Ar represents an aromatic group which may have a substituent.
    Type: Application
    Filed: March 18, 2003
    Publication date: October 23, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yukio Abe, Kazuto Shimada
  • Publication number: 20030194630
    Abstract: Bistable molecules are provided with at least one photosensitive functional group. As thus constituted, the bistable molecules are photopatternable, thereby allowing fabrication of micrometer-scale and nanometer-scale circuits in discrete areas without relying on a top conductor as a mask. The bistable molecules may comprise molecules that undergo redox reactions, such as rotaxanes and catenanes, or may comprise molecules that undergo an electric-field-induced band gap change that causes the molecules, or a portion thereof, to rotate, bend, twist, or otherwise change from a substantially fully conjugated state to a less conjugated state. The change in states in the latter case results in a change in electrical conductivity.
    Type: Application
    Filed: October 24, 2001
    Publication date: October 16, 2003
    Inventors: Patricia A. Beck, Xiao-An Zhang, Zhang-Lin Zhou
  • Publication number: 20030190554
    Abstract: A plate-making method of a printing plate comprising exposing a printing plate precursor having a photosensitive layer comprising a photopolymerizable composition containing (i) a crosslinking agent having two ethylenic polymerizable groups and (ii) a crosslinking agent having three or more ethylenic polymerizable groups, and development processing the exposed printing plate precursor with an alkali developer having a pH of not more than 12.5.
    Type: Application
    Filed: August 29, 2002
    Publication date: October 9, 2003
    Inventor: Kazuto Kunita
  • Publication number: 20030166961
    Abstract: Phenylurethane compounds of the following general formula (1); asymmetric urea compounds of the following general formula (10) obtained from the phenylurethane compounds; barbituric acid derivatives of general formula (18) produced from the asymmetric urea compounds, which have specific substituents and are useful in diazo thermal recording materials; and diazo thermal recording materials containing the barbituric acid derivative.
    Type: Application
    Filed: January 27, 2003
    Publication date: September 4, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Akinori Fujita, Naoto Yanagihara, Yohsuke Takeuchi, Daisuke Arioka, Kimi Ikeda, Sachiko Arai
  • Publication number: 20030162121
    Abstract: The invention provides a negative image recording material comprising: a support and an image recording layer disposed on the support, the image recording layer comprising an amide-acid compound containing a carboxyl group and an amide group expressed by the following General Formula (1): 1
    Type: Application
    Filed: December 31, 2002
    Publication date: August 28, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Keitaro Aoshima
  • Publication number: 20030138720
    Abstract: A multicolor heat-sensitive recording material includes a support having disposed thereon at least a heat-sensitive recording layer that develops yellow, a heat-sensitive recording layer that develops cyan, and a heat-sensitive recording layer that develops magenta, wherein water content of the multicolor heat-sensitive recording material is 5.5% or less.
    Type: Application
    Filed: July 31, 2002
    Publication date: July 24, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Mitsuyuki Tsurumi
  • Publication number: 20030129525
    Abstract: A material for making an electroconductive pattern, the material comprising a support and a light-exposure differentiable element, characterized in that the light-exposure differentiable element comprises a conductivity enhanced outermost layer containing a polyanion and a polymer or copolymer of a substituted or unsubstituted thiophene, and optionally a second layer contiguous with the outermost layer; and wherein the outermost layer and/or the optional second layer contains a monodiazonium salt capable upon exposure of reducing the conductivity of the exposed parts of the outermost layer relative to the unexposed parts of the outermost layer and a method of making an electroconductive pattern.
    Type: Application
    Filed: June 18, 2002
    Publication date: July 10, 2003
    Applicant: AGFA-GEVAERT
    Inventor: Johan Lamotte
  • Publication number: 20030108809
    Abstract: A positive resist composition comprising (A) a resin, which increases a solubility rate in an alkali developing solution by the action of an acid, containing a repeating unit represented by formula (I) defined in the specification, a repeating unit represented by formula (II) defined in the specification and a repeating unit represented by formula (III) defined in the specification, and (B) a compound that generates an acid upon irradiation of an actinic ray or radiation.
    Type: Application
    Filed: September 25, 2002
    Publication date: June 12, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Kenichiro Sato
  • Publication number: 20030073025
    Abstract: A recording material includes a support having disposed thereon a recording layer including at least: a diazo compound having no diazonio group; a coupler compound that colors by reacting with the diazo compound; and a polymerizable compound.
    Type: Application
    Filed: May 31, 2002
    Publication date: April 17, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Masanobu Takashima, Hiroshi Sato, Yoshimitsu Arai, Kyoko Hanasaki
  • Patent number: 6537722
    Abstract: A recording material for producing offset printing plates includes: a support having a hydrophilic surface, and an infrared-imageable layer including a) a component which is capable of absorbing infrared radiation and converting the infrared radiation to heat, b) a compound which is capable of releasing acid under the action of the heat generated by component a), and c) a polymeric binder having at least one group which is cleaved by the acid released from the compound b), and at least one hydrophilic group, and wherein the layer becomes soluble in an aqueous-alkaline developer in areas struck by infrared radiation.
    Type: Grant
    Filed: July 7, 1998
    Date of Patent: March 25, 2003
    Assignee: Afga-Gevaert AG
    Inventors: Mathias Eichhorn, Karin Maerz, Fritz-Feo Grabley
  • Publication number: 20030054288
    Abstract: This invention describes a heat sensitive composition comprising: (A-I) a compound which is represented by the following general formula (I) and generates a radical when heated, and (B-I) a compound having physical and chemical properties that are changed irreversibly by a radical,
    Type: Application
    Filed: May 16, 2002
    Publication date: March 20, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kazuto Shimada, Tadahiro Sorori, Morio Yagihara
  • Patent number: 6489078
    Abstract: According to the present invention there is provided an IR radiation-sensitive imaging element comprising on a hydrophilic surface of a lithographic base an image forming layer comprising (1) a water insoluble, alkali soluble or swellable resin having a phenolic hydroxy group, (2) a latent Bronsted acid, and (3) an amino crosslinking agent capable of reacting with the water insoluble, alkali soluble or swellable resin under the influence of an acid, characterized in that said image forming layer comprises a carbon black pigment as infrared absorber.
    Type: Grant
    Filed: July 8, 1997
    Date of Patent: December 3, 2002
    Assignee: Agfa-Gevaert
    Inventors: Marc Van Damme, Joan Vermeersch, Hendrikx Peter
  • Patent number: 6451506
    Abstract: A material for making a lithographic printing plate is provided comprising on a glass support a surface capable of being differentiated in ink accepting and ink repellant areas in accordance with an image pattern, characterised in that the glass support has a thickness of not more than 0.5 mm, a failure stress of at least 107 Pa and a Youngs modulus of not more than 1011 Pa.
    Type: Grant
    Filed: November 6, 1996
    Date of Patent: September 17, 2002
    Assignee: Agra-Gevaert
    Inventors: Bart Verlinden, Luc de Brabandere
  • Publication number: 20020055063
    Abstract: A coating composition for a chemically amplified positive resist includes (A) an acid generator which generates an acid upon irradiation with active light or radiant ray, (B) a resin ingredient which exhibits increased solubility in an alkaline aqueous solution by action of an acid, (C) an organic solvent, and (D) an octanone in a proportion of from 0.1 to 5 parts by weight relative to 100 parts by weight of the ingredient (B). Using this coating composition, a method of patterning a resist. The coating composition and the method can yield a positive resist having improved definition and depth of focus.
    Type: Application
    Filed: November 6, 2001
    Publication date: May 9, 2002
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Satoshi Kumon, Kazufumi Sato
  • Publication number: 20020051927
    Abstract: Disclosed is a photopolymerizable composition containing a polymerizable compound having an addition-polymerizable unsaturated bond, an organic dye, and an organoboron compound represented by the following general formula (I), wherein at least one kind of the organoboron compound is included and the proportion thereof is one mole or more per mole of the organic dye.
    Type: Application
    Filed: June 29, 2001
    Publication date: May 2, 2002
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Yuuichi Fukushige, Shintaro Washizu
  • Patent number: 6268104
    Abstract: A heat-sensitive recording material comprising a support and a heat-sensitive recording layer thereon, which contains a diazonium salt compound and a coupling component, is provided. The diazonium salt compound contains a benzenediazonium salt compound represented by formula (1) and the coupling component contains a uracil compound represented by formula (2) or a barbituric acid compound represented by formula (3).
    Type: Grant
    Filed: November 10, 1999
    Date of Patent: July 31, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masatoshi Yumoto, Kimi Ikeda, Hiroshi Yamamoto
  • Patent number: 6228553
    Abstract: A pyrrolo[1,2-a]pyrimidine compound providing an excellent color-forming property is provided. Further, a novel cyan color-forming type diazo heat-sensitive recording material having excellent shelf life, image light-resistance and image fixing property is provided. The pyrrolo[1,2-a]pyrimidine compound is represented by following general formula (1). The heat-sensitive recording material comprises a substrate, and on the substrate, a heat-sensitive recording layer containing a diazonium salt compound and a coupler. The coupler contains at least one of pyrrolo[1,2-a]pyrimidine compounds represented by following general formula (1). In the formula, R1 represents an aryl group or the like, R2 represents an alkoxycarbonyl group or the like, R3 and R4 represent an acyl group or the like, and R5 represents a hydrogen atom or the like.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: May 8, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tetsunori Matsushita, Naoto Yanagihara, Masanobu Takashima, Mitsuyuki Tsurumi
  • Patent number: 6190824
    Abstract: Disclosed is a photosensitive composition useful for preparation of various imaging materials and having good stability over time and a high sensitivity. The composition comprises a polymerizable monomer, a photopolymerization initiator, and a diazonium salt having a specific, borate anion portion represented by the general formula (I-1) or (I-2) given below, or the like. A combination of a specific borate compound and a general-purpose diazonium salt can also be used in place of the above-mentioned diazonium salt.
    Type: Grant
    Filed: February 26, 1999
    Date of Patent: February 20, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yuuichi Fukushige, Masanobu Takashima
  • Patent number: 6127085
    Abstract: A novel photo-curable resin composition. The resin composition capable of providing a cured product having excellent mechanical strength, high dimensional accuracy, and excellent toughness. The resin composition is capable of providing a cured product which experiences little change in mechanical strength over time. The resin composition is capable of forming, by photo-fabricating, a three-dimensional object which can be used for a long period of time in a humid atmosphere. The composition comprises, (A) an epoxy compound having a cyclohexene oxide, (B) a cationic photo-initiator, (C) an ethylenically unsaturated monomer, (D) a radical photo-initiator, and (E) a polyol.
    Type: Grant
    Filed: October 17, 1997
    Date of Patent: October 3, 2000
    Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., LTD
    Inventors: Tetsuya Yamamura, Tsuyoshi Watanabe, Akira Takeuchi, Takashi Ukachi
  • Patent number: 6080521
    Abstract: A diazotype reproduction material is a fibrous paper base having at least one overcoat, which is an acidic diazotype layer and a layer strata below the overcoat containing an anionic compound to minimize deep penetration of diazotype diazonium salts.
    Type: Grant
    Filed: June 15, 1998
    Date of Patent: June 27, 2000
    Assignee: Andrews Paper & Chemical Co., Inc.
    Inventors: Peter Muller, Sidney G. Garnish, Ronny L. Gonzalez
  • Patent number: 6077642
    Abstract: The present invention provides a recording material comprising a substrate and a recording layer thereon characterized in that the oxygen transmission rate of the substrate, as measured in accordance with Method B of JIS K 7126, is not greater than 50 cc/m.sup.2 /day. If necessary, a protective layer is formed on the recording layer. The substrate is composed of a sheet of base paper and a plastic film layer present at least on the side of the paper which faces a recording layer to be formed. The plastic film layer is appropriately selected from the group consisting of a polyester film, a polyvinylidene chloride film, a polycarbonate film, a polyvinylchloride film and a film of a random copolymer of ethylene and vinylalcohol. The recording material according to the present invention is excellent in the long-term preservation of images, fading resistance and light fastness.
    Type: Grant
    Filed: April 21, 1997
    Date of Patent: June 20, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuhiro Ogata, Kazuyuki Koike, Shojiro Sano
  • Patent number: 6042987
    Abstract: A negative type image recording material which is capable of effecting direct plate making by recording using a solid-state laser or semiconductor laser emitting an infrared-ray based on digital signals outputted from computers or the like, having components (A) to (E) which are more specifically a compound (A) which is degraded by the action of light or heat to generate an acid such as sulfonic acid or the like, a cross-linking agent (B) which has preferably two or more hydroxymethyl groups or alkoxymethyl groups, bonded to a benzene ring, which contains 3 to 5 benzene nuclei in the molecule, and which is cross-linked in the presence of an acid, such as a phenol derivative having a molecular weight of not greater than 1,200, at least one kind of alkali-soluble resin (C), an infrared absorbing agent (D), and organic basic compound (E) such as guanidine, aminomorpholine, pyridine and the like, or at least one compound selected from amino acids such as phenylalanine, tyrosine, alanylalanine, N-phenyl-.beta.
    Type: Grant
    Filed: October 14, 1997
    Date of Patent: March 28, 2000
    Assignee: Fuji Photo Film Co., Ltd
    Inventor: Fumikazu Kobayashi
  • Patent number: 6017672
    Abstract: A heat-sensitive recording material having formed on a support a heat-sensitive recording layer containing a diazonium salt and a coupling component, wherein the diazonium salt is a compound represented by the following formula (1): ##STR1## wherein R.sup.1 represents an alkyl group or an aryl group; R.sup.2, R.sup.3, R.sup.4 and R.sup.5 each independently represents a hydrogen atom or an alkyl group, at least one of R.sup.2, R.sup.3, R.sup.4, and R.sup.5 represents an alkyl group, and R.sup.2 and R.sup.3, or R.sup.4 and R.sup.5, or R.sup.1 and R.sup.3, or R.sup.1 and R.sup.4, may combine with each other to form a ring; and X.sup.- represents an anion.
    Type: Grant
    Filed: September 1, 1998
    Date of Patent: January 25, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoshimitsu Arai, Masatoshi Yumoto, Kimiatsu Nomura
  • Patent number: 5998082
    Abstract: A thermal recording material comprising a support having provided thereon a thermal recording layer containing a diazonium salt and a coupling component. The diazonium salt is a compound represented by the following general formula (1):General Formula (1) ##STR1## wherein T and U each independently represents a hydrogen atom, a halogen atom, an alkyl group or an acylamino group; V represents a hydrogen atom, a halogen atom, an alkyl group or OR.sup.3 ; R.sup.1, R.sup.2 and R.sup.3 each independently represents an alkyl group or an aryl group; and X.sup.- represents an anion. The thermal recording material has excellent stock storage stability and provides fast color-developed images having an extremely high developed color density.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: December 7, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoshihiro Jimbo, Hiroshi Kawakami
  • Patent number: RE38251
    Abstract: Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with new-infrared radiation. It has been found that dihydroperimidine squarylium dyes that are particularly useful in this invention have an oxidation potential greater than about 0.5 V relative to SCE as measured in dichloromethane.
    Type: Grant
    Filed: February 23, 2000
    Date of Patent: September 16, 2003
    Assignee: Imation Corp.
    Inventors: Stanley C. Busman, Richard J. Ellis, Jeanne E. Haubrich, William D. Ramsden, Tran Van Thien, Gregory D. Cuny