Including Resin Or Synthetic Polymer Patents (Class 430/18)
  • Patent number: 10889721
    Abstract: Water-based coating compositions or paint having improved gloss retention, including a latex or water-dispersible polymer, a UV-VIS absorber comprising a substituted benzophenone capable of being a free radical generator, a hindered amine light stabilizer, and optionally a low-VOC coalescent provided in a preferably desired amount. A composition comprising a blend a UV-VIS absorber comprising a substituted benzophenone capable of being a free radical generator, a hindered amine light stabilizer, and a low-VOC coalescent, providing a thermally-stable coalescent that can be used in a paint formulation for gloss retention. Gloss retention of paints containing the UV-VIS absorber and hindered amine light stabilizer being markedly improved over paints that do not have both components present.
    Type: Grant
    Filed: May 29, 2019
    Date of Patent: January 12, 2021
    Assignee: SWIMC LLC
    Inventors: Robert W. Sandoval, Matthew D. Andersson, T. Howard Killilea, Mary Jane Hibben, Frank Cusimano, Tyler Bell, Michael C. Wildman
  • Patent number: 10868229
    Abstract: A method of manufacturing an electrode substrate for a transparent light emitting device display that includes laminating copper foil on a transparent base material; forming a copper foil pattern by etching the copper foil; forming a transparent photosensitive resin composition layer on a front surface of the transparent base material and the copper foil pattern; and exposing at least a part of the copper foil pattern by removing at least a part of the transparent photosensitive resin composition layer provided on the copper foil pattern.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: December 15, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Yong Goo Son, Kun Seok Lee, Seung Heon Lee
  • Patent number: 10866512
    Abstract: Provided is a positive photosensitive resin composition having high sensitivity, high definition, and high adhesiveness and being capable of maintaining blackness and high light-blocking properties, even after a high-temperature curing step, e.g., at 250° C. This positive photosensitive resin composition contains: a binder resin (A); a quinonediazide compound (B); and at least one type of black dye (C) selected from black dyes specified by the color indexes of solvent black 27-47. The black dye (C) is ideally specified by the color index of solvent black 27, 29, or 34. This composition is capable of being suitably used in positive radiation lithography and can be used to form organic EL element partitions and insulating films.
    Type: Grant
    Filed: October 19, 2016
    Date of Patent: December 15, 2020
    Assignee: SHOWA DENKO K.K.
    Inventors: Kentaro Furue, Yuki Miyaishi
  • Patent number: 10829586
    Abstract: The present invention provides a curable composition excellent in curability and capable of forming, through light irradiation, a cured product excellent in light resistance, heat resistance, and transparency.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: November 10, 2020
    Assignee: DAECEL CORPORATION
    Inventors: Takeshi Fujikawa, Kyohei Ishida
  • Patent number: 10795258
    Abstract: A resist composition which contains a resin (A1) which has a structural unit having a sulfonyl group, a structural unit represented by formula (II) and a structural unit having an acid-labile group, and an acid generator: wherein R1 represents a hydrogen atom, a halogen atom or a C1 to C6 alkyl group that may have a halogen atom, L1 represents a single bond or *-L2-CO—O-(L3-CO—O)g— where * represents a binding position to an oxygen atom, L2 and L3 independently represent a C1 to C12 divalent hydrocarbon group, “g” represents 0 or 1, and R3 represents a C1 to C12 liner or branched alkyl group except for a tertiary alkyl group.
    Type: Grant
    Filed: June 24, 2016
    Date of Patent: October 6, 2020
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takayuki Miyagawa, Shingo Fujita, Koji Ichikawa
  • Patent number: 10788753
    Abstract: Provided herein are processes for the generation of composite polymer materials utilizing a single resin. The processes utilize diffusion between a region undergoing a polymerization reaction preferentially polymerizing one monomer component and an unreactive region. Diffusion and subsequent/concurrent polymerization results in a higher concentration of the more reactive monomer component in the reacting region and a higher concentration of the less reactive monomer components in the unreactive region. The unreactive region may be later polymerized. In embodiments, photopolymerization is used and the regions are generated by a mask or other mechanism to pattern the light.
    Type: Grant
    Filed: October 29, 2019
    Date of Patent: September 29, 2020
    Assignee: ALIGN TECHNOLOGY, INC.
    Inventor: Michael Christopher Cole
  • Patent number: 10768528
    Abstract: A pattern article comprising a copolymer having polymerized units derived from a cleavable crosslinking monomer, to which a pattern is imparted by the release of incipient acid from a thermal acid generator or photoacid generator. The selective release of the acid provides a pattern of high crosslink density and low crosslink density as result of the incipient acid cleaving a portion of the crosslinks.
    Type: Grant
    Filed: September 15, 2016
    Date of Patent: September 8, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Jason D. Clapper, Dennis E. Vogel, Ann R. Fornof, Andrew R. Davis, Babu N. Gaddam
  • Patent number: 10764993
    Abstract: The present application electromagnetic signal filtering. More specifically, the application teaches a system and method for affixing a frequency selective surface to an existing antenna radome, such that unwanted signals are attenuated before reaching an antenna structure within the antenna radome.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: September 1, 2020
    Inventors: Walter S. Wall, James H. Schaffner, Hyok Jae Song, David S. Hammon, Timothy J. Talty, Duane S. Carper, Eray Yasan
  • Patent number: 10732502
    Abstract: According to various embodiments, systems, methods, and computer program products for click-chemistry compatible structures, additive manufacturing resins for forming the same, and method of formation of such structures and resins, as well as techniques for functionalizing click-chemistry compatible structures are disclosed. The inventive structures generally include a plurality of photo polymerized molecules structurally arranged according to a three-dimensional pattern, while surfaces of the structure are functionalized with one or more click-chemistry compatible molecules each having one or more click-chemistry compatible functional groups. The structures may be formed from single- or dual-component resins, each having unique synthetic pathways. The resulting structures may be functionalized for utility in a wide range of applications by leveraging click chemistry to further functionalize the structure with organic additives also compatible with click-chemistry reaction schemes.
    Type: Grant
    Filed: August 31, 2016
    Date of Patent: August 4, 2020
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Patrick Campbell, Eric Duoss, James Oakdale
  • Patent number: 10584209
    Abstract: A photosensitive polyimide resin composition is provided. The resin composition comprises an infrared absorber, an epoxy, a photosensitive polyimide and a photo initiator. The infrared absorber includes pigment and has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The epoxy has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The photosensitive polyimide has the structure of formula (1): wherein m, n are independently 1 to 600; X is a tetravalent organic group, and the main chain of X includes alicyclic structure; Y is a divalent organic group, and the main chain of Y includes siloxane structure; Z is a divalent organic group, and the side chain of Z includes phenolic hydroxyl group or carboxyl group. The photosensitive polyimide has an amount of weight accounting for 30-90% of total solid weight of the photosensitive polyimide resin composition.
    Type: Grant
    Filed: July 23, 2019
    Date of Patent: March 10, 2020
    Assignee: Microcosm Technology Co., Ltd.
    Inventors: Tang-Chieh Huang, Kunhan Hsieh
  • Patent number: 10497622
    Abstract: A semiconductor chip manufacturing method includes preparing a semiconductor wafer including a front surface on which a bump is exposed, a rear surface located at a side opposite to the front surface, a plurality of element regions in each of which the bump is formed, and a dividing region defining each of the element regions, forming a mask which covers the bump and has an opening exposing the dividing region on the surface of the semiconductor wafer by spraying liquid which contains raw material of the mask along the bump by a spray coating method, and singulating the semiconductor wafer by exposing the surface of the semiconductor wafer to first plasma and etching the dividing region, which is exposed to the opening, until the rear surface is reached in a state where the bump is covered by the mask.
    Type: Grant
    Filed: June 14, 2017
    Date of Patent: December 3, 2019
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Shogo Okita, Mitsuru Hiroshima, Atsushi Harikai, Noriyuki Matsubara, Akihiro Itou
  • Patent number: 10471633
    Abstract: The present invention relates to a method for the preparation of dies for moulds for the production of tiles with three dimensional texture.
    Type: Grant
    Filed: November 3, 2015
    Date of Patent: November 12, 2019
    Assignee: Lamerti SPA
    Inventors: Elena Bellotti, Emilio Cremona, Silvia Mansi, Giovanni Floridi, Giuseppe Li Bassi
  • Patent number: 10474031
    Abstract: A photosensitive resin composition contains (a) a polyimide which has, at a terminal of the main chain, at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group, (b) a monomer, (c) a thermally crosslinkable compound, (d) a photopolymerization initiator and (e) a polymerization inhibitor, wherein the polymerization inhibitor (e) is a compound obtained by adding at least one hydroxyl group, alkoxy group, aryloxy group or aralkyloxy group to a naphthalene skeleton or an anthracene skeleton of a compound having a naphthalene skeleton or an anthracene skeleton.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: November 12, 2019
    Assignee: Toray Industries, Inc.
    Inventors: Yuki Katsurada, Koichi Aoki, Hideki Shinohara
  • Patent number: 10407549
    Abstract: A photosensitive polyimide resin composition is provided. The resin composition comprises an infrared absorber, an epoxy, a photosensitive polyimide and a photo initiator. The infrared absorber includes pigment and has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The epoxy has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The photosensitive polyimide has the structure of formula (1): wherein m, n are independently 1 to 600; X is a tetravalent organic group, and the main chain of X includes alicyclic structure; Y is a divalent organic group, and the main chain of Y includes siloxane structure; Z is a divalent organic group, and the side chain of Z includes phenolic hydroxyl group or carboxyl group. The photosensitive polyimide has an amount of weight accounting for 30-90% of total solid weight of the photosensitive polyimide resin composition.
    Type: Grant
    Filed: August 29, 2017
    Date of Patent: September 10, 2019
    Assignee: Microcosm Technology Co., Ltd
    Inventors: Tang-Chieh Huang, Kunhan Hsieh
  • Patent number: 10405540
    Abstract: A composite filament includes a core particle comprising a styrene/acrylate polymer resin, and a shell comprising a styrene/acrylate ionomer resin, wherein the styrene/acrylate ionomer resin comprises a metal ion acrylate monomer, and methods of making thereof. Various articles can be manufactured from such composite filaments.
    Type: Grant
    Filed: July 6, 2016
    Date of Patent: September 10, 2019
    Assignee: XEROX CORPORATION
    Inventors: Valerie M. Farrugia, Barkev Keoshkerian, Michelle N. Chretien
  • Patent number: 10353322
    Abstract: An endless intermediate transfer belt includes a substrate layer, and a surface layer to be disposed on the substrate layer. The surface layer is configured by a polymerized cured product of a radical polymerizable composition including a radical polymerizable monomer having a radical polymerizable functional group, an oxime ester-based photopolymerization initiator having a carbazole structure, and a metal oxide particle subjected to surface treatment. The radical polymerizable functional group corresponds to one or both of an acryloyl group and a methacryloyl group. The metal oxide particle subjected to surface treatment includes a metal oxide particle, and a substance for support, to be supported on a surface of the metal oxide particle.
    Type: Grant
    Filed: September 22, 2017
    Date of Patent: July 16, 2019
    Assignee: KONICA MINOLTA, INC.
    Inventors: Akihiro Honya, Teruo Sasaki, Shinichi Yabuki, Junji Kanda
  • Patent number: 10199548
    Abstract: The purpose of the present invention is to provide a photosensitive resin composition for thin film transistors, a cured film of which generates an extremely small amount of an outgas, and which is capable of forming an insulating layer for thin film transistors having excellent drive performance. In order to achieve the above-described purpose, the present invention has the configuration described below. Namely, a photosensitive resin composition for thin film transistors, which contains (A) an alkali-soluble resin having an amide group and/or an imide group, (B) a photosensitive compound and (C) organic solvents, and wherein the content of an organic solvent having nitrogen atoms in the organic solvents (C) is 1% by mass or less relative to the total mass of the organic solvents.
    Type: Grant
    Filed: March 16, 2016
    Date of Patent: February 5, 2019
    Assignee: TORAY INDUSTRIES, INC.
    Inventors: Satoshi Kamemoto, Yusuke Komori, Kazuto Miyoshi
  • Patent number: 10174230
    Abstract: The present invention is a block copolymer composition comprising an aromatic vinyl-isoprene-aromatic vinyl triblock copolymer (A) and an aromatic vinyl-isoprene diblock copolymer (B), (i) a ratio (MwDa/MwDb) of a weight average molecular weight MwDa of a polyisoprene block in the triblock copolymer (A) to a weight average molecular weight MwDb of a polyisoprene block in the diblock copolymer (B) being 0.5 or more to less than 1, (ii) a ratio of an aromatic vinyl monomer unit in all polymer components of the block copolymer composition being 10 to 30 mass %, and (iii) the block copolymer composition having a breaking strength of less than 8 MPa and an elongation at break of less than 1,100%; a pressure-sensitive adhesive composition comprising the block copolymer composition and a tackifying resin; and a pressure-sensitive adhesive sheet comprising a pressure-sensitive adhesive layer that comprises the pressure-sensitive adhesive composition.
    Type: Grant
    Filed: September 24, 2015
    Date of Patent: January 8, 2019
    Assignee: ZEON CORPORATION
    Inventors: Ayako Furuko, Sadaharu Hashimoto
  • Patent number: 10135001
    Abstract: The present disclosure provides an organic electroluminescent compound represented by the formula (I): wherein R1, R2, R3 and R4 each independently represents a substituted or unsubstituted (C6-C30) aryl group, a substituted or unsubstituted 3- to 30-membered heteroaryl group, —NR5R6, —SiR7R8R9, —SR10, —OR11, a cyano group, a nitro group, or a hydroxyl group. The present disclosure further provides an organic electroluminescent device comprising the organic electroluminescent compound represented by the formula (I).
    Type: Grant
    Filed: September 13, 2017
    Date of Patent: November 20, 2018
    Assignee: INT TECH CO., LTD.
    Inventor: Meng-Hung Hsin
  • Patent number: 10113066
    Abstract: Provided are: a curable composition that shows good adhesion on a printed wiring board, particularly a flexible substrate or the like, and has a high hardness; a resist coating film of the curable composition; and a printed wiring board having a resist pattern of the resist coating film. The curable composition comprises: (A) a photobase generator; (B-1) an epoxy group-containing (meth)acrylate compound or (B-2) a carboxyl group-containing (meth)acrylate compound; (C) a photopolymerization initiator; and (D-1) a thermosetting component (excluding the (B-1) epoxy group-containing (meth)acrylate compound) or (D-2) a thermosetting component (excluding the (B-2) carboxyl group-containing (meth)acrylate compound).
    Type: Grant
    Filed: November 4, 2014
    Date of Patent: October 30, 2018
    Assignee: TAIYO INK MFG. CO., LTD.
    Inventors: Masayuki Shimura, Yoshiyuki Furuta, Masao Yumoto
  • Patent number: 10113059
    Abstract: A composite powder includes a core particle comprising a styrene/acrylate polymer resin, and a shell comprising a styrene/acrylate ionomer resin, wherein the styrene/acrylate ionomer resin comprises a metal ion acrylate monomer, and methods of making thereof. Various articles can be manufactured from such composite powders.
    Type: Grant
    Filed: July 6, 2016
    Date of Patent: October 30, 2018
    Assignee: XEROX CORPORATION
    Inventors: Valerie M. Farrugia, Barkev Keoshkerian, Michelle N. Chretien
  • Patent number: 9977330
    Abstract: The invention provides a compound for forming an organic film having a partial structure represented by the following formula (vii-2), wherein R1 represents a linear, branched or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group constituting R1 may be substituted by an oxygen atom; a+b is 1, 2 or 3; c and d are each independently 0, 1 or 2; x represents 0 or 1, when x=0, then a=c=0; L7 represents a linear, branched or cyclic divalent organic group having 1 to 20 carbon atoms, L8? represents the partial structure represented by the following formula (i), 0?o<1, 0<p?1 and o+p=1, wherein the ring structures Ar3 represent a substituted or unsubstituted benzene ring or naphthalene ring; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; and L0 represents a divalent organic group.
    Type: Grant
    Filed: September 16, 2015
    Date of Patent: May 22, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Seiichiro Tachibana, Daisuke Kori, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda, Toshiharu Yano
  • Patent number: 9971242
    Abstract: The present invention is a photo-curable resin composition containing (A) a silicone polymer compound having repeating units shown by the formulae (1) and (2), (B) a photosensitive acid generator capable of generating an acid by decomposition with light having a wavelength of 190 to 500 nm, (C) one or more compounds selected from an amino condensate modified with formaldehyde or formaldehyde-alcohol, a phenol compound having on average two or more methylol groups or alkoxymethylol groups per molecule, and a polyhydric phenol compound whose phenolic hydroxyl group is substituted with a glycidoxy group, and (D) one or more compounds selected from polyhydric phenols having 3 or more hydroxyl groups. As a result, there is provided a photo-curable resin composition that can facilitate thick and fine patterning when the composition is used in patterning.
    Type: Grant
    Filed: May 24, 2016
    Date of Patent: May 15, 2018
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Satoshi Asai, Kyoko Soga, Hideto Kato
  • Patent number: 9962461
    Abstract: A conformable coating composition comprising a crystalline copolymer, and use thereof in barrier coating is described.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: May 8, 2018
    Assignee: 3M Innovative Properties Company
    Inventors: Robert A. Asmus, Hae-Seung Lee, Dong-Wei Zhu
  • Patent number: 9926460
    Abstract: An ultraviolet curing type coating resin composition having all of respective beneficial features of excellent state in chemical resistance, under high temperature, against human skin protection creams containing a mixture of alkyl esters of benzoic acid, trademark), excellent state in gas barrier property against metal-corrosive gases as represented by sulfur-containing gases, and excellent state in flexibility that accommodates three-dimensional shape forming processing is demanded, includes an ultraviolet curing type coating resin composition containing an unsaturated-group-containing acrylic resin, with a weight average molecular weight of 5000 to 70000, a number of (meth)acrylate functional groups per molecule of 12 to 40, a hydroxyl value of 2 to 200 mgKOH/g, and with a glass transition temperature of 20 to 90° C., a volatile organic solvent, and a photopolymerization initiator.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: March 27, 2018
    Assignee: Teikoku Printing Inks Mfg. Co., Ltd.
    Inventors: Yoshihumi Kominami, Kenji Kinoshita, Takuya Torihata
  • Patent number: 9921478
    Abstract: Compositions and methods herein include negative tone developer compatible photoresist compositions and methods of using such compositions. This includes a positive tone photoresist that can be developed using negative tone developers in that unexposed portions of the positive tone photoresist are dissolvable by one or more negative tone developer solvents. One embodiment includes a negative tone developer compatible photoresist with little or no etch resistance. Non-resistive photoresist materials as described herein can include one or more radiation-sensitive attributes (for example, the photoresist can be patterned, de-protected, solubility shifted, interact with photo chemistries, and respond to exposure doses), except that these materials have effectively no etch resistance. Such compositions can be effectively free from components, functional groups, or additives that provide or increase etch resistivity to a wet or dry etch process.
    Type: Grant
    Filed: June 26, 2015
    Date of Patent: March 20, 2018
    Assignee: Tokyo Electron Limited
    Inventor: Anton J. deVilliers
  • Patent number: 9921477
    Abstract: Compounds of the Formula (I), (II) and (III) wherein Aris is for example phenylene, biphenylene or naphthylene, all of which are unsubstituted or substituted by C1-C4-alkyl, C2-C4-alkenyl, CN, OR11, SR11, CH2OR11, COOR12, CONR12R13 or halogen; R1, R2, R7 and R8 independently of one another other are hydrogen or C1-C6-alkyl; R3 and R5 together and R4 and R6 together form a C2-C6-alkylene bridge which is unsubstituted or substituted by one or more C1-C4-alkyl; R11 is hydrogen or C1-C6-alkyl; R12 and R13 independently of one another for example are hydrogen, phenyl, C1-C18-alkyl, C1-C18-alkyl which is interrupted by one or more O; n is 1-10; X is O, S or NR10; A and A1 are suitable linking groups; are suitable as photolatent bases.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: March 20, 2018
    Assignee: BASE SE
    Inventors: Kurt Dietliker, Katharina Misteli, Katia Studer, Tunja Jung, Lothar Alexander Engelbrecht
  • Patent number: 9873223
    Abstract: Example implementations may relate to shifting a curing location during a three-dimensional (3D) printing procedure. A system may control components of a 3D printer to form a first layer of the 3D structure from resin in a first area of a resin container. The components may include: (i) a base plate and (ii) light source(s) operable to emit radiation that cures resin. After formation of the first layer, the system may move the resin container with respect to the base plate such that a second layer of the 3D structure can be formed in a second area of the resin container. The second area and the first area may be at least partially non-overlapping. The system may then control the components of the 3D printer to form the second layer of the 3D structure from resin in the second area of the resin container.
    Type: Grant
    Filed: October 24, 2014
    Date of Patent: January 23, 2018
    Assignee: X Development LLC
    Inventors: Jeffrey Linnell, Brandon Kruysman, Jonathan Proto
  • Patent number: 9849660
    Abstract: A yield in a separation process is improved. A separation apparatus which enables easy separation in a large-area substrate is provided. The separation apparatus has a function of dividing a process member into a first member and a second member and includes a support body supply unit, a support body hold unit, a transfer mechanism, a direction changing mechanism, and a structure body. The structure body bonds a support body to a surface of the first member. When at least part of the process member is located between the direction changing mechanism and the structure body or the pressure applying mechanism, the shortest distance between the direction changing mechanism and a first plane including the surface of the first member is longer than the shortest distance between the first plane and the structure body or the pressure applying mechanism.
    Type: Grant
    Filed: May 26, 2016
    Date of Patent: December 26, 2017
    Assignee: Semiconductor Energy Laboratory Co., Ltd.
    Inventors: Saki Eguchi, Koichi Takeshima, Hiroki Adachi
  • Patent number: 9812688
    Abstract: Disclosed are porous substrate and a coating layer positioned on one side or both sides of the porous substrate, wherein the coating layer includes a filler (A) having an average particle diameter of about 0.3 ?m to about 2 ?m; and a binder (B) including an organic polymer and an inorganic particle, an organic particle, or a combination thereof, wherein an average particle diameter of each of the inorganic particle and the organic particle is about 5 nm to about 200 nm, and a rechargeable lithium battery including the separator.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: November 7, 2017
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sam-Jin Park, Ihn Kim, Jung-Ock Yeou, Kwi-Seok Choi
  • Patent number: 9796864
    Abstract: A solder mask ink composition is disclosed. The solder mask ink composition includes an epoxy resin; a solvent in an amount of at least 20% by weight relative to the total weight of the solder mask ink composition; and optionally a non-ionic surfactant. The ink composition has a viscosity that is less than 1000 cps at a shear rate of 10 s?1 and greater than 30 cps at a shear rate of 495 s?1 and a temperature of 25° C.
    Type: Grant
    Filed: August 28, 2014
    Date of Patent: October 24, 2017
    Assignee: XEROX CORPORATION
    Inventors: Yiliang Wu, Bryan A. Nerger
  • Patent number: 9663685
    Abstract: The present invention relates to a photocurable adhesive composition and the use of the same. Specifically, said photocurable adhesive composition mainly comprises, based on 100 parts by weight of the adhesive composition, component A: from 70 to 99 parts by weight of one or more polymers carrying (meth)acryloxyl group; component B: from 0 to 30 parts by weight, preferably from 0 to 25 parts by weight of one or more (meth)acrylates monomers; component C: from 0.5 to 10 parts by weight of at least one UV absorber; and component D: from 0 to 5 parts by weight of antioxidant. The present invention also relates to the use of the adhesive composition mentioned above in the production of an ITO substrate for temporarily bonding a substrate and a temporary carrier and going through a high temperature processing, for example, at a temperature of ?160° C., preferably, from 160° C. to 260° C., more preferably from 240° C. to 250° C.
    Type: Grant
    Filed: January 23, 2014
    Date of Patent: May 30, 2017
    Assignees: Henkel IP & Holding GmbH, Henkel AG & Co. KGaA
    Inventors: James Wang, Daoqiang Lu
  • Patent number: 9580567
    Abstract: A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 ?/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent.
    Type: Grant
    Filed: November 14, 2013
    Date of Patent: February 28, 2017
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Toshiaki Nonaka, Daishi Tokoyama, Takashi Fuke, Yuji Tashiro
  • Patent number: 9575410
    Abstract: Provided is a photosensitive resin composition which comprises: (A-1) a resin containing a structure represented by general formula (1); and (B) a photo-acid generating agent. In general formula (1), X, R1 to R7, m1 to m4, n1, n2, Y and W are each as defined in the description.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: February 21, 2017
    Assignee: ASAHI KASEI E-MATERIALS CORPORATION
    Inventors: Satoshi Shibui, Tatsuya Hirata, Takahiro Sasaki, Taisuke Yamada
  • Patent number: 9557643
    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin containing an acid-decomposable repeating unit and being capable of decreasing the solubility for an organic solvent-containing developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a compound capable of decomposing by the action of an acid to generate an acid, and (D) a solvent; (2) a step of exposing the film by using an actinic ray or radiation, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
    Type: Grant
    Filed: August 5, 2014
    Date of Patent: January 31, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Tomotaka Tsuchimura, Takeshi Kawabata, Takuya Tsuruta
  • Patent number: 9541827
    Abstract: It is an object of the present invention to improve the curability of a resin composition and a photosensitive composition suitably employed to form e.g., a surface protecting film and an interlaminar insulating film of e.g., an electronic part, while reducing the internal stress remaining in a substrate when the composition is used to form a cured film on the substrate. The photosensitive composition includes a resin (A) having a phenolic hydroxyl group, a crosslinking agent (B1) having at least two oxazoline groups and a crosslinking agent (B2) having at least two groups represented by —CH2OR (wherein R is a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an acetyl group) and a photosensitive acid-generating agent (C).
    Type: Grant
    Filed: January 29, 2014
    Date of Patent: January 10, 2017
    Assignee: JSR Corporation
    Inventors: Tomohiko Sakurai, Masaaki Hanamura
  • Patent number: 9440453
    Abstract: An embossing apparatus comprises an embossing die comprising a printed relief pattern, and a resilient surface for pressing media against the embossing die to emboss features corresponding to the printed relief pattern on the media, in which the printed relief pattern comprises a number of layers of a deposited material, and in which a number of layers of the deposited material closest to the top of the printed relief pattern comprises a deposited material with a relatively lower coefficient of adhesion than layers of the deposited material disposed under the deposited material closest to the top of the printed relief pattern. A printed relief pattern for embossing media comprises a number of preliminary layers, the preliminary layers comprising a first material, and a number of terminal layers, the terminal layers comprising a second material, in which the second material has a lower adhesive coefficient than the first material.
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: September 13, 2016
    Assignee: Hewlett-Packard Indigo B.V.
    Inventors: Zvika Cohen, Eyal Peleg, Shahar Stein, Itzik Shaul
  • Patent number: 9400219
    Abstract: Metallic thermal emitters consisting of two layers of differently structured nickel gratings on a homogeneous nickel layer are fabricated by soft lithography and studied for polarized thermal radiation. A thermal emitter in combination with a sub-wavelength grating shows a high extinction ratio, with a maximum value close to 5, in a wide mid-infrared range from 3.2 to 7.8 ?m, as well as high emissivity up to 0.65 at a wavelength of 3.7 ?m. All measurements show good agreement with theoretical predictions. Numerical simulations reveal that a high electric field exists within the localized air space surrounded by the gratings and the intensified electric-field is only observed for the polarizations perpendicular to the top sub-wavelength grating. This result suggests how the emissivity of a metal can be selectively enhanced at a certain range of wavelengths for a given polarization.
    Type: Grant
    Filed: April 6, 2010
    Date of Patent: July 26, 2016
    Assignee: Iowa State University Research Foundation, Inc.
    Inventors: Jae-Hwang Lee, Kai-Ming Ho, Kristen P. Constant
  • Patent number: 9377689
    Abstract: A silicone structure-bearing polymer comprising recurring units derived from a bis(4-hydroxy-3-allylphenyl) derivative and having a Mw of 3,000-500,000 is provided. A chemically amplified negative resist composition comprising the polymer overcomes the stripping problem that a coating is stripped from metal wirings of Cu or Al, electrodes, and SiN substrates.
    Type: Grant
    Filed: July 23, 2015
    Date of Patent: June 28, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Takayuki Fujiwara, Koji Hasegawa
  • Patent number: 9379325
    Abstract: A donor mask includes a base substrate, a light-to-heat conversion layer disposed on the base substrate and including a first upper surface portion and a second upper surface portion, and a reflection layer interposed between the base substrate and the light-to-heat conversion layer and including through holes corresponding to the first upper surface portion and the second upper surface portion. The first upper surface portion includes a first upper surface and a second upper surface connected to the first upper surface and inclined at an angle other than 90 degrees with respect to the first upper surface.
    Type: Grant
    Filed: February 25, 2015
    Date of Patent: June 28, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Joongu Lee, Yeonhwa Lee, Jinbaek Choi
  • Patent number: 9316912
    Abstract: A positive type resist composition for use in liquid immersion exposure comprises: (A) a resin having a monocyclic or polycyclic cycloaliphatic hydrocarbon structure, the resin increasing its solubility in an alkali developer by an action of acid; (B) a compound generating acid upon irradiation with one of an actinic ray and a radiation; (C) an alkali soluble compound having an alkyl group of 5 or more carbon atoms; and (D) a solvent.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: April 19, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kobayashi, Haruki Inabe
  • Patent number: 9298096
    Abstract: An alkaline development-type curable resin composition having an excellent strength against tearing, breaking, distortion and torsion, and excellent toughness, a cured product of the curable resin composition, a printed circuit board having the cured product, and a process for manufacturing the cured product are disclosed. A curable resin composition is obtained, which contains (A) a thermoplastic resin, (B) a thermosetting component, (C) an alkali-soluble component, and at least one of (D-1) a photopolymerization initiator and (D-2) a photo-base generator, the thermoplastic resin (A) having two or more glass transition points including two glass transition points Tgx and Tgy, which satisfy Tgx>30° C. and Tgy<0° C. and the thermosetting component (B) having a glass transition point Tgz, which satisfies Tgz?Tgy+20° C. Moreover, a cured product of the curable resin composition, a printed circuit board having the cured product, and a process for manufacturing the cured product are obtained.
    Type: Grant
    Filed: July 7, 2014
    Date of Patent: March 29, 2016
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Kazuya Okada, Shuichi Yamamoto, Shoji Minegishi, Daichi Okamoto, Xiaozhu Wei
  • Patent number: 9268222
    Abstract: A photosensitive negative resin composition containing a resin (a) having at least three cyclohexene oxide skeletons in its molecule, an onium salt (b) composed of a cation moiety structure represented by the formula b1 defined in the description and an anion moiety structure represented by the formula b2 defined in the description, a silane compound (c) and an organic solvent (d). A fine structure using the resin composition, a production process of the fine structure and a liquid ejection head.
    Type: Grant
    Filed: January 25, 2013
    Date of Patent: February 23, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hyou Takahashi, Kyosuke Nagaoka, Masako Shimomura
  • Patent number: 9256118
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin selected from a polybenzoxazole precursor, a polyimide precursor, and a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) an organic dye and (E) a solvent, wherein the organic dye (D) includes at least one red dye having an absorption wavelength of 590 to 700 nm, at least one yellow dye having an absorption wavelength of 550 to 590 nm, and at least one blue dye having an absorption wavelength of 450 to 500 nm.
    Type: Grant
    Filed: July 17, 2012
    Date of Patent: February 9, 2016
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jong-Hwa Lee, Hyun-Yong Cho, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Eun-Kyung Yoon, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 9193828
    Abstract: A polyimide precursor composition includes a polyimide precursor including a repeating unit represented by the following Formula (1), a solvent, and acidic carbon black having a pH of 5.0 or less, wherein R1 represents a tetravalent organic group, R2 represents a divalent organic group, each of R3 and R4 independently represents a monovalent organic group or hydrogen, and R3 and R4 are not hydrogen at the same time.
    Type: Grant
    Filed: August 31, 2012
    Date of Patent: November 24, 2015
    Assignee: FUJI XEROX CO., LTD.
    Inventors: Tsuyoshi Miyamoto, Katsumi Nukada
  • Patent number: 9163163
    Abstract: A multilayer film is provided. The multilayer film includes a barrier layer and an adhesive layer underlying the barrier layer. The adhesive layer contains a block copolymer that can phase separate into two or more different domains. The multilayer film has good gas and moisture barrier properties and is highly flexible. Therefore, the multilayer film can be effectively used in manufacturing encapsulation structures for electronic devices. In addition, the multilayer film is suitable for use as a substrate for a device. Further provided are a method for producing the multilayer film and an encapsulation structure including the multilayer film.
    Type: Grant
    Filed: March 13, 2009
    Date of Patent: October 20, 2015
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Xavier Bulliard, Kwang Hee Lee, Jong Jin Park, Yun Hyuk Choi, In Sik In
  • Patent number: 9108798
    Abstract: A conveying roller for a horizontal continuous substrate treatment plant, has a roller body with two ends and two end caps having a receiving opening. Each end of the roller body is arranged in a receiving opening of an end cap. The end cap has two end cap parts which can be releasably connected to one another and which jointly form the receiving opening. The receiving opening is larger than the outside diameter of the end of the roller body. At least two elastic rings which center the roller body in the receiving opening are arranged on the end of the roller body.
    Type: Grant
    Filed: June 26, 2014
    Date of Patent: August 18, 2015
    Assignee: VON ARDENNE GmbH
    Inventors: Torsten Dsaak, Steffen Mosshammer, Thomas Meyer, Jan Kircheis, Michael Hofmann
  • Patent number: 9104143
    Abstract: A liquid electrophotographic ink is disclosed. The liquid electrophotographic ink includes a carrier liquid, a polymer resin, and a pearlescent pigment particle.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: August 11, 2015
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Doris Chun, Quang P Lam, Hou T Ng
  • Patent number: 9073284
    Abstract: According to one embodiment, there is provided a method of forming a pattern, including forming a thermally crosslinkable molecule layer including a thermally crosslinkable molecule on a substrate, forming a photosensitive composition layer including a photosensitive composition on the thermally crosslinkable molecule layer, chemically binding the thermally crosslinkable molecule to the photosensitive composition by heating, selectively irradiating the photosensitive composition layer with energy rays, forming a block copolymer layer including a block copolymer on the photosensitive composition layer, and forming a microphase-separated structure in the block copolymer layer.
    Type: Grant
    Filed: September 25, 2012
    Date of Patent: July 7, 2015
    Assignee: KABUSHIKI KAISHA TOSHIBA
    Inventors: Atsushi Hieno, Shigeki Hattori, Hiroko Nakamura, Satoshi Mikoshiba, Koji Asakawa, Masahiro Kanno, Yuriko Seino, Tsukasa Azuma
  • Patent number: 9057970
    Abstract: Provided is a method for producing core-shell structured resin particles, comprising the steps of: providing a dispersion liquid of hydrophobic resin particles in which the hydrophobic resin particles are dispersed into an aqueous medium containing an anionic surfactant A and an anionic surfactant B; providing a dispersion liquid of resin microparticles in which resin microparticles are dispersed into an aqueous medium; mixing the dispersion liquid of hydrophobic resin particles and the dispersion liquid of resin microparticles; adhering the resin microparticles to surfaces of the hydrophobic resin particles by adding a water soluble metal salt to a mixture resulting from above step, wherein the surfactant A and the surfactant B satisfy the specific conditions.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: June 16, 2015
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Hayato Ida, Takashi Hirasa, Ryo Natori, Junichi Tamura, Yuya Chimoto, Takaho Shibata