Quinone Diazide Containing Patents (Class 430/189)
  • Patent number: 4404272
    Abstract: A light-sensitive mixture, which is composed of a light-sensitive compound, for example, an o-quinone-diazide or a diazonium salt polycondensate, or a light-sensitive combination of compounds, for example, a photolytic acid donor and an acetal compound or orthocarboxylic acid compound which can be cleaved by acid, and of a novolak having halogenated phenol units is described. The mixture is preferably used for the preparation of printing plates, in particular planographic printing plates, which have an improved resistance to aqueous-alkaline developer solutions, gasoline hydrocarbons and fountain solutions containing alcohol.
    Type: Grant
    Filed: February 23, 1982
    Date of Patent: September 13, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Paul Stahlhofen
  • Patent number: 4347300
    Abstract: This invention relates to novel photosensitized sheet constructions which, upon exposure to an energy source through a screened image, can accurately and simultaneously reproduce said image in both its negative and positive forms.
    Type: Grant
    Filed: May 11, 1978
    Date of Patent: August 31, 1982
    Assignee: Polychrome Corporation
    Inventors: Ken-Ichi Shimazu, Takao Nakayama
  • Patent number: 4324852
    Abstract: A radiation-sensitive element is disclosed including a radiation-sensitive layer comprised of a cobalt(III)complex and a photoreductant. A process is disclosed in which the photoreductant is converted to a reducing agent by exposure to electromagnetic radiation longer than 300 nanometers. The reducing agent is then reacted with a cobalt(III)complex. Images can be recorded directly within the radiation-sensitive layer or in a separate image-recording element or layer by use of the residual cobalt(III)complex not exposed or one or more of the reaction products produced by exposure. By using the ammonia liberated from ammine ligand containing cobalt(III)complexes on exposure in combination with imagewise and uniform exposures, positive or negative images can be formed in diazo image-recording layers or elements associated with the radiation-sensitive layer.
    Type: Grant
    Filed: June 7, 1979
    Date of Patent: April 13, 1982
    Assignee: Eastman Kodak Company
    Inventors: Anthony Adin, James C. Fleming
  • Patent number: 4294911
    Abstract: Light-sensitive compositions containing a quinone diazide which are useful in positive-working photoresists and positive-working lithographic printing plates are developed with a developing composition comprising a quaternary alkanol ammonium hydroxide developing agent and a stabilizing concentration of a sulfite.
    Type: Grant
    Filed: June 18, 1979
    Date of Patent: October 13, 1981
    Assignee: Eastman Kodak Company
    Inventor: John R. Guild
  • Patent number: 4275139
    Abstract: A positive-working light-sensitive copying material, in particular for the preparation of planographic printing plates, is described, the light-sensitive layer of which contains an ester or amide of a o-naphthoquinone diazide-sulfonic or -carboxylic acid, an alkali-soluble, water-insoluble phenolic resin and a condensation product of a hydroxybenzophenone and formaldehyde. The material is distinguished by an increased light-sensitivity.
    Type: Grant
    Filed: November 1, 1979
    Date of Patent: June 23, 1981
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Paul Stahlhofen
  • Patent number: 4265999
    Abstract: A process for the preparation of planographic printing forms is described, in which a light-sensitive material composed of a support having a hydrophilic surface and of a light-sensitive layer, which contains a 1,2-naphthoquinone-diazide, is exposed imagewise, developed and then heated to a temperature above 180.degree. C. for such a time and at such a temperature level that an oleophilic precipitate is formed on the hydrophilic image background, and the precipitate is then removed by treatment, for example wiping over, with an aqueous solution of about 0.01 to 50% by weight of polyvinyl phosphonic acid. The treatment has the advantage that in this case the support surface, for example anodically produced aluminum oxide, is not significantly attacked and is nevertheless completely freed from impurities.
    Type: Grant
    Filed: December 17, 1979
    Date of Patent: May 5, 1981
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Loni Schell
  • Patent number: 4210449
    Abstract: Copolymers of glycidyl methacrylate and allyl glycidyl ether having pendant epoxy groups, having an inherent viscosity of at least about 0.25, preferably within the range of about 0.25 to about 0.38, and an epoxy equivalent of at least about 0.65 epoxide equivalent per 100 g. of polymer are provided which upon admixture with a radiation-sensitive aryldiazonium salt provide compositions which exhibit improved sensitivity, curing rates and other properties. Articles for recording and storing information from a laser source and other articles such as microfilm are derived from such compositions by subjecting a coated substrate to an energy source of sufficient intensity to decompose the radiation-sensitive catalyst and thus effect polymerization via the epoxy groups of the copolymer.
    Type: Grant
    Filed: February 4, 1975
    Date of Patent: July 1, 1980
    Assignee: American Can Company
    Inventors: Sheldon I. Schlesinger, Veronica Cochran
  • Patent number: 4177073
    Abstract: Disclosed is a novel photosensitive composition comprising an alkali-soluble photosensitive resin and an additive consisting of at least one aromatic polybasic carboxylic cellulose ether ester which is a reaction product of an aromatic polybasic carboxylic anhydride with a cellulose ether compound of the formula (I) or (II):R.sub.a.sup.1 R.sub.b.sup.2 A (I)orR.sub.c.sup.3 R.sub.d.sup.4 R.sub.e.sup.5 A (II)wherein R.sup.1 represents a hydroxyalkyl radical having 3 or 4 carbon atoms; R.sup.2 and R.sup.5 are a hydrogen atom or an alkyl radical having 1 or 2 carbon atoms, respectively; R.sup.3 and R.sup.4 represent a hydroxyalkyl radical having 2 to 4 carbon atoms, respectively, and are different from each other; A represents a cellulose residue, and; a, b, c, d and e, respectively, represent a positive number.
    Type: Grant
    Filed: November 17, 1977
    Date of Patent: December 4, 1979
    Assignee: Oji Paper Co., Ltd.
    Inventors: Yukinori Hata, Tsutomu Watanabe, Fumio Itoh
  • Patent number: 4173470
    Abstract: A novolak resin suitable for use as a light-sensitive photoresist or maskant is prepared by reaction of at least one cresol with an aldehyde or reactive ketone and an aromatic hydroxyl compound having an alkyl side chain of from 3-15 carbon atoms. The addition of a conventional photosensitive agent yields a composition evidencing superior characteristics as compared with prior art novolak photoresists and which requires less sensitizer than such prior art resists.
    Type: Grant
    Filed: November 9, 1977
    Date of Patent: November 6, 1979
    Assignee: Bell Telephone Laboratories, Incorporated
    Inventors: Susan Fahrenholtz, David T. Long, Raymond C. Pitetti