Including Resin Or Synthetic Polymer Patents (Class 430/18)
  • Patent number: 6656665
    Abstract: The invention concerns a method for producing a pattern on a transparent substrate, particularly a glass or glass-ceramic substrate. According to the invention, there is deposited on at least one area of one face of the substrate, a first layer of a photosensitive resin comprising at least one sensitizing agent and at least one photosensitive compound essentially composed of a polymer with an average degree of cross-linking d° such that it is able to absorb solid particles. Certain areas of said first layer are exposed to light, particularly in order to increase, in a controlled manner, the average degree of cross-linking do of said polymer so as to modulate its absorption capacity. On the first layer is deposited at least one second layer of a mineral-particle-based composition. The substrate is subjected to at least one treatment cycle, particularly in order to fix said mineral particles. The invention also concerns the substrate produced by this method and its applications.
    Type: Grant
    Filed: November 20, 2000
    Date of Patent: December 2, 2003
    Assignee: Saint-Gobain Vitrage
    Inventors: Yves Demars, Jean-Christophe Elluin, Gilles Longchampt
  • Publication number: 20030219656
    Abstract: The present invention provides waterborne printed circuit board coating compositions having surfactants that can bind into the polymeric network that is formed upon curing the printed circuit board coating compositions.
    Type: Application
    Filed: March 24, 2003
    Publication date: November 27, 2003
    Inventors: Donald Richard Baughman, Jon Christopher Klein, James Dennis Leonard, Gary Joseph Robideau
  • Patent number: 6649311
    Abstract: A process is provided for producing a polymeric layer having a desired image thereon or a three dimensional article comprising a number of such layers in which a layer of a liquid photocurable composition which comprises photo colorable particles is cured by light and selected areas thereof are irradiated with light of a different dose, thereby forming the desired image which composition comprises particles dispersed in it which are micro-capsules containing a photosensitive color changing composition within a barrier layer which is substantially impermeable to the components of the color changing composition or are solid particles comprising an immobilized photosensitive color changing composition. The process permits the use of the same initiating mechanism to cure the resin and to change the color of the particles.
    Type: Grant
    Filed: May 2, 2001
    Date of Patent: November 18, 2003
    Assignee: Vantico Limited
    Inventors: Dianne Beth Shirley, Ian Malcolm Shirley, Ajay Haridas Popat, Martin Russell Edwards, Kevin Thomas McAloon, Herbert Benson Scher
  • Patent number: 6646808
    Abstract: By forming a microlens of negative photoresist, economical microlens fabrication processes may be used which, in some embodiments, may achieve microlenses having good optical clarity and high thermal stability. In one embodiment, a positive photoresist may be used as a pattern mask to transfer a pattern to the negative photoresist. The microlenses may be formed by dry etching the positive photoresist which acts as a mask to transfer a pattern to the underlying negative photoresist. At the same time a scratch protection layer may be formed over regions not overlying optical sensors.
    Type: Grant
    Filed: October 31, 2002
    Date of Patent: November 11, 2003
    Assignee: Intel Corporation
    Inventor: Zong-Fu Li
  • Publication number: 20030207194
    Abstract: An image forming method comprising forming a color image on a support, which color image consists of a plurality of color toners each having a melting point or a softening point; then heating the color image upon application of pressure at a first temperature while the color image contacts a surface of a fixing member, which first temperature is not lower than the melting points or softening points of the plurality of color toners; then cooling the color image to a second temperature lower than the melting points or softening points while the color image contacts the surface of the fixing member; and then separating the color image from the fixing member, wherein the surface of the fixing member has a ten-point mean roughness not greater than 20 &mgr;m.
    Type: Application
    Filed: June 9, 2003
    Publication date: November 6, 2003
    Inventor: Kunihiko Tomita
  • Publication number: 20030203294
    Abstract: The present invention is to a method of producing a high resolution image on an electrostatic printer by (a) providing an electrostatic printer having at least five toner fountains; (b) providing a set of at least five liquid toners each having a desired color, the set comprising at least one reduced density toner and at least one dark toner, where the reduced density toner is either white or has the same color, but a lower color density, as at least one other toner in the set, and the dark toner is either black or has the same color but a higher color density as at least one other toner in the set; (c) forming an electrostatic image on a substrate that corresponds to that portion of a final image that is formed from one of the toner colors; (d) developing the electrostatic image with the appropriate color toner; and (e) forming the final image by repeating (b) and (c) for each color toner.
    Type: Application
    Filed: May 16, 2003
    Publication date: October 30, 2003
    Inventors: Romit Bhattacharya, Giovanni Perrotta, Daryl Schelin
  • Patent number: 6638635
    Abstract: An IC-mounted card substrate comprising a first sheet member having at least a first support, a second sheet member having at least a second support and an electronic part fixing layer having therein an IC-module and provided between the first sheet member and the second sheet member, wherein the second sheet member has a cushion layer comprising an actinic ray-cured resin on the second support, and a displacement value of needle penetration of the cushion layer obtained by a thermo-mechanical analysis (TMA) apparatus is not more than 30% at temperature of 100° C. and not less than 30% at a temperature of 150° C. based on the thickness of the cushion layer.
    Type: Grant
    Filed: January 22, 2002
    Date of Patent: October 28, 2003
    Assignee: Konica Corporation
    Inventors: Ryoji Hattori, Nobuyuki Ishii, Shigehiro Kitamura
  • Patent number: 6638679
    Abstract: The present invention includes an imageable element, which can be: (a) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; a polyvinyl acetal binder; and a sheet substrate; or (b) an imageable element comprising an imaging layer which comprises: an aromatic diazonium salt containing compound having an alkoxy substituent and an aromatic diazonium salt containing compound free of an alkoxy substituent; and a sheet substrate. The imaging layer includes a total aromatic diazonium salt containing compound content of at least 10 weight percent. The molar ratio of the aromatic diazonium salt containing compound having an alkoxy substituent to the aromatic diazonium salt containing compound that is free of an alkoxy substituent is from about 1.0:1 to 70:1.
    Type: Grant
    Filed: July 12, 2001
    Date of Patent: October 28, 2003
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Stephan J. Platzer, Maria T. Sypek, Paul Perron, Harald Baumann, Melinda Alden
  • Patent number: 6638669
    Abstract: A thermal transfer film or a thermal transfer ribbon includes a substrate layer and a donor layer applied thereto. The substrate layer consists of at least one polymer composition which has mechanical stability at a temperature >150° C. and transmission >70% for light having a wavelength of from 700 to 1600 nm. The donor layer comprises at least the following components: a substance which is able to convert the radiation energy of the incident laser light into heat energy, a polymer which contains acidic groups and/or unsubstituted or substituted amide groups thereof, and optionally a wetting aid. The polymer composition also includes a reactive polymer.
    Type: Grant
    Filed: September 13, 2001
    Date of Patent: October 28, 2003
    Assignee: MAN Roland Druckmaschinen AG
    Inventors: Josef Schneider, Andrea Fuchs, Thomas Hartmann
  • Publication number: 20030194632
    Abstract: Multi-layer, negative working imageable elements useful as lithographic printing plate precursors are disclosed. The elements contain, in order, a support; an underlayer; and an imageable layer. The imageable layer comprises a negative working imageable composition; and the underlayer is soluble or dispersible in a developer. Elements that can be imaged with ultraviolet or visible radiation and elements that can be imaged with infrared radiation or with heat are disclosed.
    Type: Application
    Filed: April 5, 2002
    Publication date: October 16, 2003
    Inventors: Kevin Ray, Joanne Ray
  • Publication number: 20030194621
    Abstract: A photosensitive resin composition comprising an oxygen sensitizer and a polyamic acid or a polyimide which has substituents having a cis-diene structure at the side chains; a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating the substrate with the composition and forming fine patterns by exposure of irradiation; and processes for producing a printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device which comprise coating the substrate with the composition and forming fine patterns by crosslinking the cis-diene group by polycondensation with oxidation with the singlet oxygen generated by exposure of irradiation to the oxygen sensitizer in the presence of oxygen.
    Type: Application
    Filed: February 19, 2003
    Publication date: October 16, 2003
    Applicant: RIKEN
    Inventors: Yusuke Tajima, Kazuo Takeuchi, Yasuo Shigemitsu, Etsu Takeuchi
  • Publication number: 20030186139
    Abstract: The optical functional element contains aggregates of developed silver grains obtained by developing silver halide grains arranged so as to constitute a periodical structure. The element includes a substrate and a medium layer The aggregates of the developed silver grains are arranged in the medium layer so as to constitute said periodical structure. The element is produced by first selectively exposing a photo-curing resin layer formed on said substrate in which the silver halide grains are dispersed so as to selectively photo-cure the photo-curing resin layer, then overall exposing the photo-curing resin layer to expose the silver halide grains in the photo-curing resin layer, and thereafter developing the photo-curing resin layer.
    Type: Application
    Filed: March 26, 2003
    Publication date: October 2, 2003
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Kimitoshi Nagao
  • Publication number: 20030180635
    Abstract: A visible radiation sensitive composition is disclosed. The composition comprises at least one ethylenically unsaturated monomer capable of free radical initiated addition polymerization; optionally, at least one binder; and a photoinitiator system comprising a coinitiator and a cyanopyridone sensitizer. The coinitiator preferably comprises a metallocene and an onium compound.
    Type: Application
    Filed: February 12, 2002
    Publication date: September 25, 2003
    Inventors: Harald Baumann, Michael Flugel
  • Publication number: 20030180636
    Abstract: A laser imageable flexographic printing plate and a method of making the laser imageable flexographic printing plate using a collapsible UV cross-linkable material comprising a UV-curable elastomer, an IR dye, and microspheres is disclosed. The collapsible UV cross-linkable material is mixed together and then extruded to form a printing plate. An IR laser is used to collapse and melt the collapsible UV cross-linkable material to form a relief image on the printing plate. The printing plate is thereafter UV cured by face exposure to crosslink and cure the formed relief image. The invention addresses a market need for eliminating chemical processing of printing plates, thus going from plate to press much more quickly. The printing plate may also contain a thin layer of a high-density non-collapsible UV-curable elastomer between the collapsible layer and the cover sheet of the plate which acts as the print surface in the final plate.
    Type: Application
    Filed: March 25, 2002
    Publication date: September 25, 2003
    Inventors: Rustom Sam Kanga, Daniel Rosen
  • Patent number: 6617086
    Abstract: A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.
    Type: Grant
    Filed: March 2, 2001
    Date of Patent: September 9, 2003
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Edward D. Babich, Inna V. Babich, Katherina E. Babich, James J. Bucchignano, Karen E. Petrillo, Steven A. Rishton
  • Publication number: 20030165753
    Abstract: Disclosed are a thermally transferable image protective sheet and a method for protective layer formation that can provide a protective layer which can protect an image of a record produced by a nonsilver photographic color hard copy recording method, can impart lightfastness and other properties to the record, and can realize a record having a glossy impression comparable to silver salt photographs. The thermally transferable image protective sheet comprises a support and a thermally transferable resin layer having a single-layer or multilayer structure stacked on the support so as to be separable from the support.
    Type: Application
    Filed: February 28, 2003
    Publication date: September 4, 2003
    Applicant: Dai Nippon Prtg. Co., Ltd.
    Inventors: Taro Suzuki, Daisuke Fukui, Masahiro Fujita
  • Publication number: 20030157417
    Abstract: A printing plate useful in lithographic printing is prepared by a process comprising:
    Type: Application
    Filed: February 5, 2002
    Publication date: August 21, 2003
    Inventors: Patrick R. Friedman, Dominique LaPotre, Patrice Aurenty
  • Publication number: 20030157435
    Abstract: The use of a compound of formula (A), which comprises a group of sub-formula (I) where R1, R2, R3, R4, R5, R6, X1 and Y1 are various specified organic groups wherein at least one of said groups has sufficient electron whitdrawing properties to activate the multiple bonds to polymerisation, in a stereolithographic composition. Stereolithographic applications of these compounds are also described and claimed.
    Type: Application
    Filed: November 6, 2002
    Publication date: August 21, 2003
    Inventors: John W Goodby, Alan W Hall, Keith M Blackwood, Paul E Y Milne, Andrew G Biggs, Ryan M Heath, Robert W Bannister
  • Publication number: 20030152847
    Abstract: Lithographic printing form precursors comprising positive working polymeric coatings on substrates may during storage or transportation undergo undesirable changes in their imaging properties. It has been found that acceptable properties can be restored by carrying out a heat treatment which involves a relatively short heating stage followed by accelerated cooling.
    Type: Application
    Filed: January 30, 2002
    Publication date: August 14, 2003
    Inventors: Maru Aburano, Shoichi Hotate, Shinji Shimizu, Yasuhiko Kojima
  • Publication number: 20030143474
    Abstract: A method of preparing an imaged element useful in lithographic printing comprises:
    Type: Application
    Filed: December 21, 2001
    Publication date: July 31, 2003
    Inventors: Patrick Friedman, Dominique LaPotre
  • Publication number: 20030138708
    Abstract: A photoimageable composition comprising finely divided particles of inorganic materials comprising functional phase particles selective from electrically conductive, resistive and dielectric particles; and inorganic binder dispersed in organic medium comprising an aqueous developable polymer; photoinitiation system; and a photospeed enhancer wherein the enhancer comprises a ratio of 30/70 to 70/30 mixture selected from stearic acid and palmitic acid; salt of stearate and salt of palmitate; stearic acid and salt of palmitate; salt of stearate and palmitic acid; and organic solvent.
    Type: Application
    Filed: September 27, 2002
    Publication date: July 24, 2003
    Inventors: Howard David Glicksman, Haixin Yang
  • Patent number: 6593043
    Abstract: A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.
    Type: Grant
    Filed: November 1, 2001
    Date of Patent: July 15, 2003
    Assignee: Toray Industries, Inc.
    Inventors: Mitsuhito Suwa, Kazuto Miyoshi, Masao Tomikawa
  • Patent number: 6593446
    Abstract: The present invention provides an organic anti-reflective film composition suitable for use in submicrolithography. The composition comprises a compound of chemical formula 11 and a compound of chemical formula 12. The organic anti-reflective film effectively absorbs the light penetrating through the photoresist film coated on top of the anti-reflective film, thereby greatly reducing the standing wave effect. Use of organic anti-reflective films of the present invention allows patterns to be formed in a well-defined, ultrafine configuration, providing a great contribution to the high integration of semiconductor devices. wherein a, b, c, R′, R″, R1, R2, R3, and R4 are those defined herein.
    Type: Grant
    Filed: September 7, 2000
    Date of Patent: July 15, 2003
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae-Chang Jung, Keun-Kyu Kong, Min-Ho Jung, Sung-Eun Hong, Geun-Su Lee, Ki-Ho Baik
  • Publication number: 20030129536
    Abstract: A method for fabricating circuitized substrates which reduces the formation of shorts, and which does not require a bake step to drive off solvent before photoimaging, is provided. The method employs an essentially solventless photoimageable dielectric film, having a solvent content typically less than about 5%, preferably less than about 2% and a glass transition temperature, when cured, which is greater than about 110° C. The method for fabricating circuitized structures comprises the following steps: providing a photoimagable dielectric film, which film comprises: from about 95% to about 100% solids, comprising: from 0% to about 30% by weight of the solids, of a particulate rheology modifier; from about 70% to about 100% by weight of the solids of an epoxy resin system comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts by weight of the total resin weight, a cationic photo-initiator; from 0 to about 0.
    Type: Application
    Filed: January 16, 2003
    Publication date: July 10, 2003
    Applicant: International Business Machines Corporation
    Inventors: Elizabeth Foster, Gary A. Johansson, Heike Marcello, David J. Russell
  • Publication number: 20030129506
    Abstract: The present invention also includes an imageable element, comprising a substrate and a thermally imageable composition comprising a thermally sensitive polymer which exhibits an increased solubility in an aqueous developer solution upon heating. The thermally sensitive polymer includes at least one covalently bonded unit and at least one thermally reversible non-covalently bonded unit, which includes a two or more centered H-bond within each of the non-covalently bonded unit. The present invention also includes a method of producing the imaged element. The present invention still further includes a thermally imageable composition comprising comprising a thermally sensitive polymer according to the present invention and a process for preparing the thermally sensitive polymer, which is a supramolecular polymer.
    Type: Application
    Filed: November 19, 2002
    Publication date: July 10, 2003
    Applicant: Kodak Polychrome Graphics, L.L.C.
    Inventors: Peter S. Pappas, Alan Monk, Shashikant Saraiya, Jianbing Huang
  • Publication number: 20030118939
    Abstract: The present invention provides an IR-sensitive composition, which includes: a polymeric binder; and a free radical polymerizable system consisting of: at least one component selected from unsaturated free radical polymerizable monomers, oligomers which are free radical polymerizable and polymers containing C═C bonds in the backbone and/or in the side chain groups; and an initiator system, which includes: (a) at least one compound capable of absorbing IR radiation; (b) at least one compound capable of producing radicals; and (c) at least one carboxylic co-initiator, provided that the total acid number of the polymeric binder is 70 mg KOH/g or less. The present invention further provides a printing plate precursor, a process for preparing the printing plate and a method of producing an image.
    Type: Application
    Filed: November 9, 2001
    Publication date: June 26, 2003
    Applicant: KODAK POLYCHROME GRAPHICS, L.L.C.
    Inventors: Heidi Munnelly, Paul West
  • Publication number: 20030118941
    Abstract: A photocurable composition, wherein a small amount of an alicyclic skeleton-containing mono(meth) acrylate is incorporated in a combination of an alicyclic skeleton-containing bis(meth)acrylate and a mercapto compound, a cured product obtained by the copolymerization thereof, and a process for producing the cured product.
    Type: Application
    Filed: September 30, 2002
    Publication date: June 26, 2003
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Seiichiro Hayakawa, Akihiko Sakai, Akira Esaki, Yutaka Tamura
  • Publication number: 20030118923
    Abstract: A photo-curable composition comprising (a) an elastomeric component containing one or more unsaturated, high molecular weight, endgroup-modified polymers; (b) a photopolymerization initiating system; optionally (c) one or more cross-linking agents; and optionally (d) other additives. Photo-curable compositions of the present invention exhibit faster cross-linking (i.e., curing) rates (i.e., lower minimum exposure times) than similar compositions containing no endgroup-modified polymers. Cured compositions of the present invention exhibit lower solvent swell, and similar or increased softness (i.e., lower hardness as measured by Shore A hardness) when compared to cured compositions containing no unsaturated, high molecular weight, endgroup-modified polymers.
    Type: Application
    Filed: September 27, 2002
    Publication date: June 26, 2003
    Inventors: Andre J. Uzee, Calvin P. Esneault, Michael O. Myers
  • Patent number: 6579664
    Abstract: In accordance with the present invention, there are provided high performance, photoimageable resin compositions for flexographic printing, having excellent physical properties, e.g., resilience, hardness, toughness, and the like, as well as increased rates of cure upon exposure to radiation. In a further aspect of the invention, there are provided printing plates prepared employing invention compositions, wherein said printing plates are characterized as having excellent exposure sensitivity, the capability of rapidly curing upon exposure, excellent retention of fine details, and excellent colorloss performance. Moreover, printing plates prepared employing invention compositions have good flexibility, excellent washout properties, and retain such properties over extended periods of storage. In another aspect of the invention, there are provided methods for the preparation of formulations comprising said compositions and methods for use thereof.
    Type: Grant
    Filed: March 30, 2001
    Date of Patent: June 17, 2003
    Assignee: Napp Systems, Inc.
    Inventors: Yuxin Hu, David H. Roberts, Reny R. Paguio, Maria Teresa A. Castillo
  • Patent number: 6576091
    Abstract: In a deflection member comprising a framework having a web-side, a backside defining an X-Y plane, and a Z-direction perpendicular to the X-Y plane, the framework comprises a multi-layer structure formed by at least two layers joined together in a face-to-face relationship. Each of the layers has a deflection conduit portion extending in the Z-direction. The deflection conduit portion of at least one layer is fluid-permeable and positioned such that portions of that layer comprise a plurality of suspended portions elevated in the Z-direction from the X-Y plane to form void spaces between the X-Y plane and the suspended portions. The deflection member can comprise a reinforcing element positioned between the web-side and at least a portion of the backside of the framework. Each of the layers can comprise a substantially continuous network, a semi-continuous network, or a plurality of discrete protuberances.
    Type: Grant
    Filed: October 24, 2000
    Date of Patent: June 10, 2003
    Assignee: The Procter & Gamble Company
    Inventors: David William Cabell, Paul Dennis Trokhan
  • Patent number: 6576382
    Abstract: An improved photoimagable cationically polymerizable epoxy based solder mask is provided that contains a non-brominated epoxy resin system and from about 0.1 to about 15 parts, by weight per 100 parts of resin system, of a cationic photoinitiator. The non-brominated epoxy-resin system has solids that are comprised of from about 10% to about 80% by weight, of a polyol resin having epoxy functionality; from about 0% to about 90% by weight of a polyepoxy resin; and from about 25% to about 85% by weight of a difunctional epoxy resin. The photosensitive cationically polymerizable epoxy based system is especially useful as a solder mask and does not contain bromine.
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: June 10, 2003
    Assignee: International Business Machines Corporation
    Inventors: Richard Allen Day, David John Russell, Donald Herman Glatzel
  • Patent number: 6576381
    Abstract: The present invention alleviates the operational problems in production of flip chips and provides a semiconductor device superior in various reliabilities. The preset invention lies in an encapsulated semiconductor device comprising: (a) a polybenzoxazole resin film for chip protection, obtained by coating, on a circuit-formed chip, a positive photosensitive resin composition comprising 100 parts by weight of a polyamide and 1 to 100 parts by weight of a photosensitive diazoquinone compound, and subjecting the coated composition to patterning and curing, and (b) a bump electrode.
    Type: Grant
    Filed: August 10, 2001
    Date of Patent: June 10, 2003
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Takashi Hirano, Kagehisa Yamamoto, Toshio Banba, Hiroaki Makabe
  • Patent number: 6576090
    Abstract: A deflection member comprising a patterned framework having a web-side and a backside opposite to the web-side and forming an X-Y plane. The framework comprises a plurality of bases extending from the X-Y plane in a Z-direction perpendicular to the X-Y plane, and a plurality of suspended portions laterally extending from the plurality of bases to form void spaces between the X-Y plane and the suspended portions. The deflection member can comprise a reinforcing element joined to the plurality of bases and positioned between the web-side and at least a portion of the backside of the framework. A process for making the deflection member comprises curing a coating of a liquid photosensitive resin supported by a forming surface through a mask having a pattern of transparent and opaque regions. The opaque regions comprise regions having first opacity and regions having second opacity less than the first opacity.
    Type: Grant
    Filed: October 24, 2000
    Date of Patent: June 10, 2003
    Assignee: The Procter & Gamble Company
    Inventors: Paul Dennis Trokhan, David William Cabell, Michael Douglas Hill
  • Publication number: 20030104313
    Abstract: The present invention provides compositions comprising a cationically curable component and a substantially compatible free radical polymerizable component. Compatible free radical polymerizable components include alkoxylated free radical polymerizable components. Objects obtained by curing the present compositions, for instance by rapid prototyping the compositions, have an improved clarity.
    Type: Application
    Filed: March 6, 2002
    Publication date: June 5, 2003
    Inventor: John A. Lawton
  • Patent number: 6573012
    Abstract: The present invention provides compounds represented by formulas 1a and 1b, and photoresist polymers derived from the same. The present inventors have found that photoresist polymers derived from compounds of formulas 1a, 1b, or mixtures thereof, having an acid labile protecting group have excellent durability, etching resistance, reproducibility, adhesiveness and resolution, and as a result are suitable for lithography processes using deep ultraviolet light sources such as KrF, ArF, VUV, EUV, electron-beam, and X-ray, which can be applied to the formation of the ultrafine pattern of 4G and 16G DRAMs as well as the DRAM below 1G: where R1, R2 and R3 are those defined herein.
    Type: Grant
    Filed: August 2, 2000
    Date of Patent: June 3, 2003
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Ho Baik
  • Publication number: 20030099888
    Abstract: A coating solution useful in the preparation of printing plate precursors comprises:
    Type: Application
    Filed: July 5, 2001
    Publication date: May 29, 2003
    Applicant: Kodak Polychrome Graphics L.L.C.
    Inventor: Mathias Jarek
  • Patent number: 6562527
    Abstract: A method of manufacturing a selectively relief-treated image member that comprises: (a) providing a precursor of the image member, the precursor comprising a surface having an image-forming layer comprising a photosensitive resist composition comprising: (i) a polymerizable material, and (ii) a binder; (b) delivering radiation image-wise to the precursor; (c) developing the precursor in a developer in order to selectively remove the image-forming layer in regions to which said radiation was not delivered image-wise in step (b); and (d) contacting the image-wise exposed precursor with a relief-treatment material, in order to selectively relief-treat regions of the surface of the precursor in which the image-forming layer was removed on development in step (c).
    Type: Grant
    Filed: August 17, 2001
    Date of Patent: May 13, 2003
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Kevin Barry Ray, Hans-Horst Glatt, Ali Cam
  • Publication number: 20030087169
    Abstract: An image formation method for forming an image is proposed, which uses an image formation apparatus capable of performing (1) multi-color image formation and printing by superimposing toner images with different colors by use of a plurality of color toners with different colors, including at least a black toner, and (2) monochrome image formation and printing, using only a black toner, with a maximum transferable amount of each color toner onto the image being in a range of 4×10−3 kg/m2 to 8×10−3 kg/m2, wherein an image glossiness (GKC) obtained by the black toner in the maximum transferable amount thereof at the multi-color image printing, an image glossiness (GCC) obtained by each of the color toners other than the black toner in the maximum transferable amount thereof at the multi-color image printing, and an image glossiness (GKM) obtained by the black toner in the maximum transferable amount thereof at the monochrome image printing satisfy a particular relationship as described in
    Type: Application
    Filed: July 12, 2002
    Publication date: May 8, 2003
    Applicant: RICOH COMPANY, LTD.
    Inventors: Osamu Uchinokura, Hachiroh Tosaka, Hiroshi Yamashita, Shinichi Kuramoto, Masae Nakamura, Takashi Yamamoto, Masakazu Kinoshita, Yoshimi Mizoguchi, Yoshimichi Katagiri
  • Publication number: 20030087170
    Abstract: A photoimageable composition comprising finely divided particles of inorganic material comprising coated silver particles that are at least partially coated with at least one surfactant and inorganic binder dispersed in organic medium comprising an aqueous developable polymer, photo-initiation system and organic solvent.
    Type: Application
    Filed: September 27, 2002
    Publication date: May 8, 2003
    Inventors: Howard David Glicksman, Haixin Yang
  • Patent number: 6551697
    Abstract: A printed circuit board comprises a base substrate including a conductive circuit pattern on a top surface thereof, and at least one photosensitive resin layer positioned on the base substrate. The resin layer exposure is performed through a photomask having light-shielding and exposure amount adjusting portions as part thereof to accommodate for varying resin layer thicknesses.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: April 22, 2003
    Assignee: International Business Machines Corporation
    Inventors: Shinji Yamada, Yutaka Tsukada
  • Patent number: 6552102
    Abstract: Described are chiral liquid crystalline polymer materials and polymerizable compounds used for preparing them. The polymer materials can serve as a carrier material or are coated onto a carrier material. Also described are methods of making such materials and using them to make pigment flakes used in paints, printing inks, spray paints, cosmetic products, colored plastics, optical elements and security applications.
    Type: Grant
    Filed: July 3, 2001
    Date of Patent: April 22, 2003
    Assignee: Merck Patent Gesellschaft mit beschränkter Haftung
    Inventors: Eike Poetsch, Gerhard Pfaff, Matthias Kuntz, Stephan Derow, David Coates
  • Publication number: 20030073012
    Abstract: Additive compositions suitable for rinse water used for processing lithographic printing plates, particularly to additive compositions for rinse water in water recycling systems, are disclosed. The additive compositions contain at least one water-soluble film-forming polymer; optionally, at least one pH regulating agent capable of maintaining the pH value of an aqueous solution at about 7 or below; and at least one compound selected from the group consisting of phosphonic acid derivatives of formula I.
    Type: Application
    Filed: October 17, 2002
    Publication date: April 17, 2003
    Inventor: Ulrich Fiebag
  • Publication number: 20030073011
    Abstract: A method of manufacturing a selectively relief-treated image member comprises:
    Type: Application
    Filed: August 17, 2001
    Publication date: April 17, 2003
    Inventors: Kevin Barry Ray, Hans-Horst Glatt, Ali Cam
  • Publication number: 20030068567
    Abstract: Disclosed is a photosensitive resin composition which can be developed using a dilute aqueous alkaline solution after ultraviolet ray exposure, is excellent in pot life, capable of preventing deposits from being generated in a cured coated film, capable of widening heat control tolerance, and is excellent in sensitivity, in heat resistance, in chemical resistance and in electric insulating properties, thereby rendering the composition suitable for use as a solder resist for producing a printed wiring board. This photosensitive resin composition comprises (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule thereof, (B) at least one kind material selected from acid salts of N-substituted melamine compound and acid salts of guanamine compound, (C) a photopolymerization initiator, (D) a diluent, and (E) a thermosetting compound. There is also disclosed a printed wiring board where this photosensitive resin composition is employed.
    Type: Application
    Filed: September 23, 2002
    Publication date: April 10, 2003
    Applicant: Tamura Kaken Corporation
    Inventors: Takao Ono, Ichiro Miura
  • Publication number: 20030064305
    Abstract: Disclosed is a photosensitive resin composition for use as a solder resist, which is free from anti-tackiness and excellent in flexibility, adhesiveness and heat resistance without other film properties being sacrificed, and can be easily designed so as to obtain properties in conformity with the end use thereof. This photosensitive resin composition comprising (A) an active energy ray-curable resin having at least two ethylenic unsaturated linkages per molecule, (B) a photopolymerization initiator, (C) a reactive diluent, and (D) a thermosetting compound; wherein said (A) comprises a resin which is obtained by a process wherein an epoxy compound is successively reacted with a unsaturated monocarboxylic acid and with a polybasic acid to form a compound, which is then allowed to react with a novolac epoxy resin to obtain the resin. There is also disclosed a printed wiring board formed using the aforementioned photosensitive resin composition.
    Type: Application
    Filed: September 17, 2002
    Publication date: April 3, 2003
    Inventors: Takao Ono, Ichiro Miura, Yasuyuki Hasegawa
  • Publication number: 20030064303
    Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer.
    Type: Application
    Filed: April 23, 2002
    Publication date: April 3, 2003
    Inventors: Isao Nishimura, Nobuo Bessho, Atsushi Kumano, Tsutomu Shimokawa, Kenji Yamada
  • Publication number: 20030064304
    Abstract: Disclosed is a photosensitive resin composition for use as a solder resist, which is free from anti-tackiness and excellent in flexibility, adhesiveness and heat resistance without other film properties being sacrificed, and can be easily designed so as to obtain properties in conformity with the end use thereof.
    Type: Application
    Filed: September 17, 2002
    Publication date: April 3, 2003
    Inventors: Takao Ono, Ichiro Miura, Yasuyuki Hasegawa
  • Patent number: 6537866
    Abstract: A method for forming insulating spacers for separating conducting layers in semiconductor wafer fabrication. The spacers are formed by removing portions of a protective photoresist layer through photolithography, and then through etching of exposed portions of the insulating layer. The spacers allow for fabrication of components that are smaller in size than are obtainable through conventional photolithography methods.
    Type: Grant
    Filed: October 18, 2000
    Date of Patent: March 25, 2003
    Assignees: Advanced Micro Devices, Inc., Fujitsu Limited
    Inventors: Jeffrey A. Shields, Tuan D. Pham, Jusuke Ogura, Bharath Rangarajan, Simon Siu-Sing Chan
  • Publication number: 20030043108
    Abstract: A display panel includes a transparent image recording sheet having electrophotographically formed thereon at least a background portion, wherein space factor of pinholes per unit area of the background portion is no greater than 1×10−2%. A method of manufacturing the display panel is also disclosed. The background portion has a transparent optical density of 3.0 or greater and an image portion has a transparent optical density of 1.0 or less, and preferably 0.1 to 1. A toner used for electrophotographically forming the background portion and the image portion has a number average molecular weight of 1,000 to 6,000 and a weight average molecular weight of 30,000 to 150,000 as measured by gel permeation chromatography with respect to a portion of the toner dissolved in tetrahydrofuran, and has respective molecular weight distribution peaks in molecular weight ranges of 1000 to 10,000 and 100,000 to 1,500,000.
    Type: Application
    Filed: June 12, 2002
    Publication date: March 6, 2003
    Applicant: Denso Corporation
    Inventors: Teruhiko Iwase, Seki Yamaguchi, Yoshifumi Iida, Masanori Ichimura, Yoko Tomita, Yasuyuki Kobayashi
  • Patent number: 6528218
    Abstract: A method for fabricating circuitized substrates which reduces shorts, and does not require baking and resulting film. The method employs a photoimageable dielectric film, having a solvent content less than about 5%, and a glass transition temperature, when cured, which is greater than about 110° C. A photoimageable dielectric film is provided having from about 95% to about 100% solids, and comprising: from 0% to about 30% of the solids, of a particulate rheology modifier; from about 70% to about 100% of the solids of an epoxy resin system (liquid at 20° C.) comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts of the total resin weight, a cationic photoinitiator; from 0 to about 5% solvent; applying the photoimageable dielectric film to a circuitized substrate; and exposing the film to actinic radiation.
    Type: Grant
    Filed: March 14, 2001
    Date of Patent: March 4, 2003
    Assignee: International Business Machines Corporation
    Inventors: Elizabeth Foster, Gary A. Johansson, Heike Marcello, David J. Russell