Abstract: A photocurable composition comprising a first copolymer having a recurring unit of general formula (I): ##STR1## wherein Ar represents a substituted or unsubstituted phenyl group, R.sub.1 represents a lower alkyl group, and m.sub.1 and m.sub.2 are positive numbers with m.sub.1 being greater than or equal to m.sub.2 ;and a second copolymer having a recurring unit of general formula (II): ##STR2## wherein R.sub.2 represents a lower alkyl group, X represents a hydrogen atom or a methyl group, and R.sub.3 represents an isobutyl group, a t-butyl group or a --CH.sub.2 Ar group where Ar represents a substituted or unsubstituted phenyl group and when R.sub.3 is --CH.sub.2 Ar, R.sub.2 can also be t-butyl and isobutyl, and n.sub.1, n.sub.2 and n.sub.3 are positive numbers but n.sub.1 can be zero and (n.sub.1 +n.sub.2)/n.sub.3 equals to about 0.5 to 20; and containing suitable amounts of a cross-linking agent and a photoactivator.

Abstract: A photosensitive composition containing the 2-trihalomethyl-5-aryl-1,3,4-oxadiazole compound represented by the following general formula: ##STR1## wherein X represents a chlorine atom or a bromine atom and A represents a phenyl group, a naphthyl group or a phenyl or naphthyl group substituted by a halogen atom, an alkyl group, an alkoxy group, a nitro group, a cyano group or a methylenedioxy group.

Abstract: The invention presents a novel photoresist composition used in the photoetching in the manufacture of various electronic semiconductor devices, in which the phenomenon of halation adversely affecting the fidelity of the etching patterns can be very much reduced. The photoresist composition of the invention comprises (a) a cyclized rubber, (b) a bisazide compound, (c) a photoextinction agent which is a 4-phenylazo-N,N-disubstituted aniline compound or a related bis derivative of biphenyl or diphenyl ether, and (d) a fluorescent agent which is a N,N'-di(substituted methylene) derivative of a phenylenediamine or hydrazine.With this formulation, the loss of ultraviolet absorption at about 360 nm caused by the photodecomposition of the component (b) is compensated for by the absorption of the photodecomposition product of the component (c) while the component (d) has no absorption at about 360 nm but emits a fluorescence in the range of 380 to 450 nm.

Abstract: When a low molecular weight dihydric or trihydric alcohol is added to a photoresist composition comprising a water-soluble polymer substance and a bisazide photo-crosslinking agent, the fluidity of the composition is improved and the drying speed is moderately retarded and it enables the formation of a photoresist layer having a uniform film thickness and uniform drying degree. The said alcohol is exemplified by ethylene glycol, glycerol, etc. and is preferably added in an amount of 5-300 parts by weight per 100 parts by weight of the water-soluble polymer substance.

Abstract: An image-forming element is disclosed comprised of a support and a coating thereon containing a cobalt(III)complex and a compound containing a conjugated .pi. bonding system capable of forming at least a bidentate chelate with cobalt(III). The coating is predominantly free of anions which will form conjugate acids by deprotonation of a cobalt(II)complex containing the chelating compound. In one preferred form the image-forming element is radiation-sensitive. In this form the image-forming element can contain a photoactivator capable of initiating reduction of the cobalt(III)complex. An imaging process is disclosed in which the coating is exposed to actinic radiation to produce an image. Images can be recorded directly within the image-forming coating or in a separate image-recording element or layer by use of the residual cobalt(III)complex or by use of one or more of the reaction products produced by exposure.

Abstract: A radiation-sensitive element is disclosed including a radiation-sensitive layer comprised of a cobalt(III)complex and a photoreductant. A process is disclosed in which the photoreductant is converted to a reducing agent by exposure to electromagnetic radiation longer than 300 nanometers. The reducing agent is then reacted with a cobalt(III)complex. Images can be recorded directly within the radiation-sensitive layer or in a separate image-recording element or layer by use of the residual cobalt(III)complex not exposed or one or more of the reaction products produced by exposure. By using the ammonia liberated from ammine ligand containing cobalt(III)complexes on exposure in combination with imagewise and uniform exposures, positive or negative images can be formed in diazo image-recording layers or elements associated with the radiation-sensitive layer. By the selection of amine-responsive reducing agent precursors, the amines released by the cobalt(III) complexes cause an amplified image.