Post Image Treatment To Produce Elevated Pattern Patents (Class 430/325)
  • Patent number: 11312877
    Abstract: The present disclosure is drawn to fluid sets, material sets, and 3-dimensional printing systems. A fluid set can include a pretreat composition that includes a salt of an alkali metal with bromide or iodide. The fluid set can also include a conductive fusing agent composition including a transition metal for fusing thermoplastic powder when exposed to electromagnetic radiation.
    Type: Grant
    Filed: October 25, 2016
    Date of Patent: April 26, 2022
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Sterling Chaffins, Kevin P. Dekam
  • Patent number: 11276584
    Abstract: A method for producing a glass substrate according to the present invention includes the steps of: (I) forming a through hole (11) in a glass sheet (10); (II) forming a resin layer (20) on a first principal surface of the glass sheet (10) using a resin composition sensitive to light having a predetermined wavelength ?1; (III) photoexposing an area of the resin layer (20) that covers the through hole (11) by irradiating the area with light U having the wavelength ?1 and applied from the direction of a second principal surface of the glass sheet (10); and (IV) forming a through-resin hole (21) by removing the area photoexposed in the step (III). The glass sheet (10) protects the resin layer (20) from the light U so as to prevent the resin layer (20) from being photoexposed by beams of the light U that are incident on the second principal surface of the glass sheet (10) in the step (III).
    Type: Grant
    Filed: August 6, 2019
    Date of Patent: March 15, 2022
    Assignee: NIPPON SHEET GLASS COMPANY, LIMITED
    Inventors: Keiji Tsunetomo, Hideki Hashizume, Kazuya Ohkawa
  • Patent number: 11249396
    Abstract: A resist underlayer composition includes a polymer including a structural unit represented by Chemical Formula 1; and a solvent and a method of forming patterns using the resist underlayer composition: In Chemical Formula 1, at least one of A1 and A2 is a group represented by Chemical Formula A:
    Type: Grant
    Filed: February 12, 2020
    Date of Patent: February 15, 2022
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Hyeon Park, Yoojeong Choi, Soonhyung Kwon, Shinhyo Bae, Jaeyeol Baek
  • Patent number: 11204554
    Abstract: Oxime ester compounds of the formula I, II, III, IV or V wherein Z is for example Z1 for is NO2, unsubstituted or substituted C7-C20 aroyl or unsubstituted or substituted C4-C20heteroaroyl; provided that at least one Z1 is other than NO2; Z2 is for example unsubstituted or substituted C7-C20aroyl; R1, R2, R3, R4, R5 and R6 for example are hydrogen, halogen, or unsubstituted or substituted C1-C20alkyl, unsubstituted or substituted C6-C20aryl, or unsubstituted or substituted C4-C20heteroaryl; R9, R10, R11, R12 and R13 for example are hydrogen, halogen, OR16, unsubstituted or substituted C1-C20alkyl; provided that R9 and R13 are neither hydrogen nor fluorine; R14 is for example unsubstituted or substituted C6-C20aryl or C3-C20heteroaryl Q is for example C6-C20arylene or C3-C20heteroarylene; Q1 is —C1-C20alkylene-CO—; Q2 is naphthoylene; Q3 is for example phenylene; L is for example O-alkylene-O—; R15 is for example hydrogen or C1-C20alkyl; R20 is for example hydrogen, or unsubstituted or substituted C1
    Type: Grant
    Filed: September 9, 2019
    Date of Patent: December 21, 2021
    Inventors: Yuichi Nishimae, Hisatoshi Kura, Kazuhiko Kunimoto, Ryuhei Yamagami, Keita Tanaka
  • Patent number: 11187985
    Abstract: The present invention relates to a method of reducing the LWR (Line Width Roughness) of a photoresist pattern using a negative tone photoresist during the fabrication of a semiconductor, and more specifically to a composition capable of reducing LWR in order to ensure a higher pattern CDU after a negative tone development process, and a processing method using the composition, thus reducing the LWR, thereby providing better CDU than existing methods.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: November 30, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee, Seung Hyun Lee
  • Patent number: 11169444
    Abstract: The present invention relates to a method of reducing the LWR (Line Width Roughness) of a photoresist pattern using a negative tone photoresist during the fabrication of a semiconductor, and more specifically to a composition capable of reducing LWR in order to ensure a higher pattern CDU after a negative tone development process, and a processing method using the composition, thus reducing the LWR, thereby providing better CDU than existing methods.
    Type: Grant
    Filed: April 26, 2017
    Date of Patent: November 9, 2021
    Assignee: YOUNG CHANG CHEMICAL CO., LTD
    Inventors: Su Jin Lee, Gi Hong Kim, Seung Hun Lee, Seung Hyun Lee
  • Patent number: 11158809
    Abstract: Provided is an organic electroluminescence device provided with a light absorber represented by Formula 1 below, and a light absorbing layer including the same. In Formula 1, Ar is pyrene, chrysene, or anthracene, and Y is a hydrogen atom or a substituent, and X is represented by any one of Formula 2-1 to 2-3 below.
    Type: Grant
    Filed: October 31, 2018
    Date of Patent: October 26, 2021
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sanghyun Han, Wonmin Yun, Jongwoo Kim, Jangyeol Baek, Eunjae Jeong, Yohan Kim, Yisu Kim, Youngkook Kim, Seokhwan Hwang
  • Patent number: 11014293
    Abstract: Methods, processes, and systems for the manufacture of three-dimensional articles made of polymers using 3D printing are provided. A layer of high performance polymer can be deposited on a build plate to form a powder bed. Then, a solution of a photothermal dye can be printed on the powder bed in a predetermined pattern. Alternatively, the photothermal dye can be added to the entire powder bed. Electromagnetic radiation can be applied, either to the entire bed or in a predetermined pattern, to form the final polymer. After a predetermined period of time, sequential layers are printed to provide the three-dimensional article. The three-dimensional object can be cured to produce the three-dimensional article composed of the final polymers.
    Type: Grant
    Filed: March 8, 2018
    Date of Patent: May 25, 2021
    Assignees: Ricoh Co., Ltd., University of Washington
    Inventors: Chang-Uk Lee, Andrew J. Boydston, Mark A. Ganter, Duane W. Storti
  • Patent number: 10985320
    Abstract: The present disclosure provides an organic transistor and a manufacturing method thereof, an array substrate, and a display device. The method for manufacturing the organic transistor includes: applying a photoresist on a side of an organic insulating layer; patterning the photoresist to form a confinement well; adding a solution of an organic semiconductor material and an orthogonal solvent to the confinement well; volatilizing the orthogonal solvent by an annealing process to induce directional growth of single crystal of the organic semiconductor material in the confinement well, thereby obtaining an organic single crystal layer; and removing remaining photoresist and using the organic single crystal layer as an active layer. The embodiment of the present disclosure produces an organic single crystal in a flexible display device at a low temperature, and the organic single crystal can be used as an active layer, resulting in an organic transistor having high mobility and stability.
    Type: Grant
    Filed: December 26, 2018
    Date of Patent: April 20, 2021
    Assignees: HEFEI BOE DISPLAY TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Ji Zhang, Weiwei Hu, Liang Chen, Jincheng Gao, Guanbao Hui
  • Patent number: 10976675
    Abstract: A lithographic apparatus having a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.
    Type: Grant
    Filed: January 28, 2020
    Date of Patent: April 13, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Hans Butler, Engelbertus Antonius Fransiscus Van Der Pasch, Paul Corné Henri De Wit
  • Patent number: 10890847
    Abstract: A pattern forming method includes, in this order, forming a film on a substrate, using an active-light-sensitive or radiation-sensitive resin composition containing a resin (A) which has a repeating unit having a phenolic hydroxyl group, and a repeating unit having a group that decomposes by the action of an acid to generate a carboxyl group, and a compound (B) that generates an acid upon irradiation with active light or radiation; exposing the film; and developing the exposed film using a developer including an organic solvent, in which the developer including an organic solvent contains an organic solvent having 8 or more carbon atoms and 2 or less heteroatoms in the amount of 50% by mass or more.
    Type: Grant
    Filed: November 22, 2016
    Date of Patent: January 12, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Toru Tsuchihashi, Wataru Nihashi, Hideaki Tsubaki
  • Patent number: 10879067
    Abstract: In one embodiment, a pattern forming method includes forming a first film on a substrate. The method further includes supplying energy to the first film to form a first region to which the energy have been supplied, and a second region including at least a region to which the energy has not been supplied. The method further includes impregnating at least the first region out of the first and second region with metal atoms. The method further includes developing the first film after impregnating the first region with the metal atoms to remove the second region while leaving the first region.
    Type: Grant
    Filed: February 21, 2019
    Date of Patent: December 29, 2020
    Assignee: Toshiba Memory Corporation
    Inventors: Seiji Morita, Takashi Sato, Ryosuke Yamamoto
  • Patent number: 10864676
    Abstract: Methods for manufacturing articles of footwear are provided. In various aspects, the methods comprise utilizing additive manufacturing methods with foam particles. In some aspects, the disclosed methods comprise selectively depositing a binding material on foam particles in a target area such that the binding material coats at least a portion of defining surfaces of the foam particles with the binding material. The binding material is then cured to affix foam particles in the target area to one another. In various aspects, the disclosed methods can be used to manufacturer articles with sub-regions that differential levels of affixing between the foam particles, and thereby resulting in sub-regions with different properties such as density, resilience, and/or flexural modulus. This abstract is intended as a scanning tool for purposes of searching in the particular art and is not intended to be limiting of the present disclosure.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: December 15, 2020
    Assignee: Nike, Inc.
    Inventors: Jay Constantinou, Harleigh Doremus, Luis Folgar, Brandon Kvamme, Denis Schiller
  • Patent number: 10717232
    Abstract: The present disclosure is drawn to material sets for 3-dimensional printing, 3-dimensional printing systems, and 3-dimensional printed parts. A material set can include a polyamide polymer powder having an average particle size from 20 ?m to 120 ?m and a fusing agent. The polyamide-11 can have a solution viscosity from 1.5 to 1.75 at room temperature, and may increase by no more than 5% after exposure to 180° C. for 20 hours. The fusing agent can include an energy absorber capable of absorbing electromagnetic radiation to produce heat.
    Type: Grant
    Filed: May 13, 2016
    Date of Patent: July 21, 2020
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Yi Feng, Erica Montei Fung, Michael A. Novick
  • Patent number: 10634821
    Abstract: This invention is related to a method of manufacturing an anti-glare cover. The method includes preparing a crosslinking precursor solution, wherein the precursor solution is an organic solution with crosslinkable polymer monomer and crosslinking initiator; applying the crosslinking precursor solution on a cover to form a crosslinking precursor layer; pre-crosslinking and crosslinking the crosslinking precursor layer to form a mesh crosslinked layer; etching the cover with acid solution and the mesh crosslinked layer acting as a hard mask to form an anti-glare microstructure on the cover; and removing the mesh crosslinked layer.
    Type: Grant
    Filed: November 14, 2017
    Date of Patent: April 28, 2020
    Assignee: WUHAN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventor: Yong Yang
  • Patent number: 10613435
    Abstract: A coating solution has a polymer having a formula (1) structural unit, a formula (2) primary, secondary, or tertiary amine, and a formula (3) ester capable of dissolving the polymer and amine: R1 is a hydrogen atom or methyl group. L is a divalent aromatic group optionally having at least one substituent, —C(?O)—O— group, or —C(?O)—NH— group. The —C(?O)—O— or —C(?O)—NH— group carbon atom is attached to a polymer main chain. X is a hydrogen atom or linear or branched alkyl or alkoxy group having a 1-10 carbon atom number. At least one alkyl group hydrogen atom is optionally substituted with a halogen atom or hydroxy group. R2, R3, and R4 are independently a hydrogen atom, hydroxy group, or linear, branched, or cyclic organic group having a 1-16 carbon atom number. R5 and R6 are each independently a linear or branched organic group having a 1-16 carbon atom number.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: April 7, 2020
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Tokio Nishita, Rikimaru Sakamoto
  • Patent number: 10597793
    Abstract: The disclosure improves a position confirmation method for members in a plating tank. A plating apparatus for applying a plating process on a substrate is provided. The plating apparatus includes a plating tank, a first member disposed in the plating tank, a second member disposed opposite to the first member in the plating tank, an optical sensor disposed on one of the first and second members, and a plurality of detected parts disposed on the other of the first and second members to be detectable by the optical sensor.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: March 24, 2020
    Assignee: EBARA CORPORATION
    Inventor: Naoto Takahashi
  • Patent number: 10451974
    Abstract: The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: October 22, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Kazuma Yamamoto, Yuriko Matsuura, Tomoyasu Yashima, Tatsuro Nagahara
  • Patent number: 10437146
    Abstract: A method for forming a 3D pattern structure on a 3D substrate and a device having color resist pattern is disclosed. The disclosure uses the fitting aids to apply pressure on the thin-film mask to paste on the 3D substrate. After the template device had formed, send the template device to the exposure machine, and then the high resolution photo-resist pattern is made on the 3D substrate. After a Lift-off procedure, the thin-film pattern is formed and the photo-resist is removed.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: October 8, 2019
    Inventor: Ming-An Hsu
  • Patent number: 10438822
    Abstract: A method and a device for prefixing substrates, whereby at least one substrate surface of the substrates is amorphized in at least one surface area, characterized in that the substrates are aligned and then make contact and are prefixed on the amorphized surface areas.
    Type: Grant
    Filed: March 6, 2019
    Date of Patent: October 8, 2019
    Assignee: EV Group E. Thallner GmbH
    Inventor: Friedrich Paul Lindner
  • Patent number: 10401727
    Abstract: A resist composition including a polymeric compound having 0 to 20 mol % of a structural unit containing a polar group-containing aliphatic hydrocarbon group, and an acid generator compound represented by general formula (b1-1) in which R101 represents a hydrocarbon group having at least 1 hydroxy group as a substituent; Y101 represents a single bond or a divalent linking group containing an oxygen atom; V101 represents a single bond, an alkylene group or a fluorinated alkylene group; R102 represents a fluorine atom or a fluorinated alkyl group of 1 to 5 carbon atoms; M?m+ represents an organic cation having a valency of m.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: September 3, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takashi Nagamine, Tsuyoshi Nakamura
  • Patent number: 10386723
    Abstract: A method for lithography patterning includes forming a first layer over a substrate, the first layer being radiation-sensitive. The method further includes exposing the first layer to a radiation. The method further includes applying a developer to the exposed first layer, resulting in a pattern over the substrate, wherein the developer includes a developing chemical whose concentration in the developer is a function of time during the applying of the developer.
    Type: Grant
    Filed: March 4, 2016
    Date of Patent: August 20, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventor: Chung-Cheng Wang
  • Patent number: 10353288
    Abstract: A litho-litho-etch double patterning method including forming a resist layer by coating a substrate with a resist composition; exposing the resist layer to a first radiant energy density of UV rays; forming a first pattern in the resist layer by developing the resist layer with a positive developer; exposing the resist layer to a second radiant energy density of UV rays; and forming a second pattern in the resist layer by developing the resist layer with a negative developer, the second pattern including one or more features of the first pattern.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: July 16, 2019
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Vineet Sharma, Sohan S. Mehta, Craig D. Higgins, Sunil K. Singh, Feng Wang
  • Patent number: 10345718
    Abstract: In a pattern forming method, a resist layer disposed on a wafer is exposed by an energy beam. A post-exposure-bake (PEB) is performed on the wafer with the exposed resist layer by using a PEB apparatus. After the PEB, the exposed resist layer is developed, thereby forming a resist pattern. The PEB apparatus includes a baking plate, and the wafer is placed on the baking plate for the PEB when a temperature of the wafer is within a predetermined temperature range.
    Type: Grant
    Filed: May 17, 2017
    Date of Patent: July 9, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chung-Cheng Wang, Chun-Kuang Chen, Chia-Cheng Chao
  • Patent number: 10340161
    Abstract: A method and a device for prefixing substrates, whereby at least one substrate surface of the substrates is amorphized in at least one surface area, characterized in that the substrates are aligned and then make contact and are prefixed on the amorphized surface areas.
    Type: Grant
    Filed: December 23, 2014
    Date of Patent: July 2, 2019
    Assignee: EV Group E. Thallner GmbH
    Inventor: Friedrich Paul Lindner
  • Patent number: 10332751
    Abstract: A monomer, an organic layer composition including the monomer, an organic layer, and a method of forming patterns, the monomer being represented by Chemical Formula 1:
    Type: Grant
    Filed: December 28, 2015
    Date of Patent: June 25, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Yu-Shin Park, You-Jung Park, Hyun-Ji Song
  • Patent number: 10325813
    Abstract: A method for manufacturing a semiconductor device includes providing a substrate structure including a substrate, semiconductor fins extending in a first direction on the substrate, a hardmask layer on the semiconductor fins, and an isolation region surrounding the semiconductor fins and having an upper surface flush with the hardmask layer, the isolation region including a first region on a side of the semiconductor fins in the first direction and a second region on a side of the semiconductor fins in a second direction different from the first direction. The method also includes removing the hardmask layer, etching a portion of the first region above the semiconductor fins, forming a mask layer on the semiconductor fins and a remaining first region, etching the second region such that an upper surface of the remaining second region is lower than an upper surface of the semiconductor fins, and removing the mask layer.
    Type: Grant
    Filed: October 9, 2017
    Date of Patent: June 18, 2019
    Assignees: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION, SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
    Inventors: Hai Yang Zhang, Fangyuan Xiao, Yan Wang
  • Patent number: 10303054
    Abstract: A photosensitive resin composition includes a binder resin, a black colorant, a photopolymerizable monomer, a photopolymerization initiator, and a solvent. The binder resin includes a first binder resin having a glass transition temperature of about ?50° C. to about 150° C. and a second binder resin having a glass transition temperature of greater than about 150° C.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: May 28, 2019
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sang Soo Kim, Jinhee Kang, Heekyoung Kang, Chang-Hyun Kwon, Jiyun Kwon, Chanwoo Kim, Bumjin Lee, Junho Lee, Chungbeum Hong
  • Patent number: 10274847
    Abstract: A photo-sensitive layer is applied over a wafer. The photo-sensitive layer is exposed. In some embodiments, the photo-sensitive layer is exposed to EUV light. The photo-sensitive layer is baked. The photo-sensitive layer is developed. Humidity is introduced in at least one of: the applying, the baking, or the developing.
    Type: Grant
    Filed: September 19, 2017
    Date of Patent: April 30, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: An-Ren Zi, Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng
  • Patent number: 10203602
    Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise 1) one or more resins and 2) one or more substituted isocyanurate compounds that are distinct from the 1) one or more resins.
    Type: Grant
    Filed: September 30, 2016
    Date of Patent: February 12, 2019
    Assignee: Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Eui-Hyun Ryu, Myung-Yeol Kim, EunHye Cho, Jung-June Lee, Jae Hwan Sim
  • Patent number: 10137644
    Abstract: According to one example, there in provided a system for processing three-dimensional object data representing a three-dimensional object to be generated by an additive manufacturing system. The system comprises a processor to perform a transformation on the three-dimensional object data, and to generate a plurality of slice images from the transformed three dimensional object data.
    Type: Grant
    Filed: April 30, 2014
    Date of Patent: November 27, 2018
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Alejandro Manuel de Pena, Sebastia Cortes Herms, Josep Giralt Adroher
  • Patent number: 10059821
    Abstract: A method is used to provide an electrically-conductive polyaniline pattern by providing a uniform layer of a photocurable composition on a substrate. The photocurable composition comprises a water-soluble reactive polymer comprising (a) greater than 40 mol % of recurring units comprising sulfonic acid or sulfonate groups, and (b) at least 5 mol % of recurring units comprising a pendant group capable of crosslinking via [2+2] photocycloaddition. The photocurable composition is exposed to cause crosslinking via [2+2] photocycloaddition of the (b) recurring units, thereby forming a crosslinked polymer. Any remaining water-soluble reactive polymer is removed. The crosslinked polymer is contacted with an aniline reactive composition having aniline monomer and up to 0.5 molar of an aniline oxidizing agent, thereby forming an electrically-conductive polyaniline disposed either within, on top of, or both within and on top of, the crosslinked polymer.
    Type: Grant
    Filed: April 20, 2016
    Date of Patent: August 28, 2018
    Assignee: EASTMAN KODAK COMPANY
    Inventors: Thomas B. Brust, Anne Troxell Wyand, Grace Ann Bennett, Catherine A. Falkner
  • Patent number: 9996008
    Abstract: Provided are methods of trimming photoresist patterns. The methods involve coating a photoresist trimming composition over a photoresist pattern, wherein the trimming composition includes a matrix polymer, a free acid having fluorine substitution and a solvent, the trimming composition being free of cross-linking agents. The coated semiconductor substrate is heated to cause a change in polarity of the resist polymer in a surface region of the photoresist pattern. The photoresist pattern is contacted with a developing solution to remove the surface region of the photoresist pattern. The methods find particular applicability in the formation of very fine lithographic features in the manufacture of semiconductor devices.
    Type: Grant
    Filed: August 22, 2016
    Date of Patent: June 12, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: Cheng-Bai Xu
  • Patent number: 9996002
    Abstract: A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: wherein R3 represents a hydrogen atom or a methyl group, R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group, R1 represents a hydrogen atom or a methyl group, and L1 represents a single bond or a C1 to C18 divalent saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group, and R2 represents a C3 to C18 alicyclic hydrocarbon group where a hydrogen atom may be replaced by a C1 to C8 aliphatic hydrocarbon group or a hydroxy group, provided that the carbon atom directly bonded to L1 has no aliphatic hydrocarbon group by
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: June 12, 2018
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takashi Nishimura, Shota Nakano, Koji Ichikawa
  • Patent number: 9989846
    Abstract: Substrate patterning techniques herein protect against overlay misalignment. Techniques include using a combination of relief patterns in which one relief pattern includes openings filled with a particular photoresist and these openings have a width that is insufficient to enable wave propagation of electromagnetic radiation having wavelengths greater than a predetermined threshold wavelength. Accordingly, actinic radiation above a certain wavelength cannot affect the photoresist within these relatively small openings. Photoresist filled within these openings can be removed by specific developers with the openings partially uncovered, which helps ensure features and connections are fabricated as designed.
    Type: Grant
    Filed: February 19, 2016
    Date of Patent: June 5, 2018
    Assignee: Tokyo Electron Limited
    Inventors: Anton J. deVilliers, Jeffrey Smith
  • Patent number: 9983478
    Abstract: A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. In the formula (a4), R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom, and a methylene group of the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.
    Type: Grant
    Filed: September 15, 2015
    Date of Patent: May 29, 2018
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Masahiko Shimada, Yuki Suzuki, Koji Ichikawa
  • Patent number: 9971081
    Abstract: A backlight unit includes LEDs, a light guide plate, a prism sheet, exiting light reflecting portions, prisms, concave lenticular lenses, and flat portions. The concave lenticular lenses are configured such that an occupancy rate of concave cylindrical lenses with respect to the second direction is higher in an area closer to a light entering surface with respect to the first direction and the occupancy rate is lower in an area farther from the light entering surface. The flat portions are formed adjacent to the concave cylindrical lenses with respect to the second direction such that an occupancy rate of flat portions with respect to the second direction is lower in an area closer to a light entering surface with respect to the first direction and the occupancy rate of the flat portions with respect to the second direction is higher in an area farther from the light entering surface.
    Type: Grant
    Filed: January 29, 2018
    Date of Patent: May 15, 2018
    Assignee: SHARP KABUSHIKI KAISHA
    Inventors: Yoshinobu Hirayama, Takao Imaoku, Takeshi Ishida, Ryuzo Yuki, Shugo Yagi
  • Patent number: 9952366
    Abstract: A patterning method includes forming guide layer patterns, which are separated from each other, on a top surface of a base substrate, forming a neutral layer, which includes a random copolymer comprising first blocks or second blocks, on an entirety of the top surface of the base substrate exposed between the guide layer patterns, forming hydrophobic layer patterns which extend from top surfaces of the guide layer patterns to side surfaces of the guide layer patterns and are separated from each other, coating a block copolymer, which comprises the first blocks and the second blocks, on a top surface of the neutral layer exposed between the hydrophobic layer patterns, alternately arranging the first blocks and the second blocks by heat-treating or solvent-annealing the block copolymer, and forming block copolymer patterns by removing the first blocks or the second blocks.
    Type: Grant
    Filed: February 23, 2015
    Date of Patent: April 24, 2018
    Assignee: SAMSUNG DISPLAY CO. LTD.
    Inventors: Min Hyuck Kang, Eun Ae Kwak, Lei Xie, Moon Gyu Lee, Hyeong Gyu Jang
  • Patent number: 9915770
    Abstract: A backlight unit includes LEDs, a light guide plate, a prism sheet, exiting light reflecting portions, prisms, concave lenticular lens lenses, and flat portions. The concave lenticular lenses are configured such that an occupancy rate of concave cylindrical lenses with respect to the second direction is higher in an area closer to a light entering surface with respect to the first direction and the occupancy rate is lower in an area farther from the light entering surface. The flat portions are formed adjacent to the concave cylindrical lenses with respect to the second direction such that an occupancy rate of flat portions with respect to the second direction is lower in an area closer to a light entering surface with respect to the first direction and the occupancy rate of the flat portions with respect to the second direction is higher in an area farther from the light entering surface.
    Type: Grant
    Filed: July 22, 2015
    Date of Patent: March 13, 2018
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Yoshinobu Hirayama, Takao Imaoku, Takeshi Ishida, Ryuzo Yuki, Shugo Yagi
  • Patent number: 9833311
    Abstract: This invention describes Ophthalmic Devices with media inserts that have nanostructured Metasurface elements upon or within them. In some embodiments passive ophthalmic devices of various kinds may be formed. Methods and devices for active ophthalmic devices based on Metasurface structures may also be formed.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: December 5, 2017
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: Randall B. Pugh, Frederick A. Flitsch
  • Patent number: 9818612
    Abstract: Disclosed is a method for manufacturing a semiconductor device. The method includes: a first pattern forming step of forming, on a pattern forming target film, a first film that is patterned to have a first pattern that includes lines which are aligned with each other with spaces of a predetermined interval being interposed therebetween, and include a portion separated by using a first cut mask; a step of forming a second film to cover a surface of the first film; and a second pattern forming step of forming a pattern forming target film that is patterned to have a second pattern, by separating a portion of the space of the first step using a second cut mask. The first and second cut mask includes a plurality of openings or light shielding portions that have equal shapes, respectively.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: November 14, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventor: Hidetami Yaegashi
  • Patent number: 9753370
    Abstract: Multiple-pattern forming methods are provided.
    Type: Grant
    Filed: August 26, 2015
    Date of Patent: September 5, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC, Rohm and Haas Electronic Materials Korea Ltd.
    Inventors: Chang-Young Hong, Cheng-Bai Xu, Jung Woo Kim, Cong Liu, Shintaro Yamada, Lori Anne Joesten, Choong-Bong Lee, Phillip D. Hustad, James C. Taylor
  • Patent number: 9753369
    Abstract: Disclosed is a developer, one that does not cause pattern collapse during the formation process, for the formation of a fine pattern and a method for pattern formation using the developer. A developer used in a lithography process includes a polymer for forming a dry-etching mask and an organic solvent. The polymer is preferably a curable resin different from a curable resin forming a resist film. The developer is preferably used after exposure of the resist film. The organic solvent in the developer is preferably butyl acetate or a mixed solvent of butyl acetate and an alcohol, or 2-pentanone or a mixed solvent of 2-pentanone and an alcohol. Also disclosed is a method for producing a semiconductor device.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: September 5, 2017
    Assignee: NISSAN CHEMICAL IDUSTRIES, LTD.
    Inventors: Rikimaru Sakamoto, Yasushi Sakaida, Bangching Ho
  • Patent number: 9665005
    Abstract: Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a block copolymer and a solvent, wherein the block copolymer comprises a first block and a second block, wherein the first block comprises a unit formed from a first monomer comprising an ethylenically unsaturated polymerizable group and a hydrogen acceptor group, wherein the hydrogen acceptor group is a nitrogen-containing group, and the second block comprises a unit formed from a second monomer comprising an ethylenically unsaturated polymerizable group and an aromatic group, provided that the second monomer is not styrene; and (c) rinsing residual pattern treatment composition from the substrate, leaving a portion of the block copolymer bonded to the patterned feature.
    Type: Grant
    Filed: June 3, 2016
    Date of Patent: May 30, 2017
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Vipul Jain, Mingqi Li, Huaxing Zhou, Jong Keun Park, Phillip D. Hustad, Jin Wuk Sung
  • Patent number: 9651863
    Abstract: The pattern forming method includes (1) forming a film using an active light sensitive or radiation sensitive resin composition, (2) exposing the film to active light or radiation, and (3) developing the exposed film using a developer including an organic solvent, in which the active light sensitive or radiation sensitive resin composition contains a resin (A) having a group which generates a polar group by being decomposed due to the action of an acid, the resin (A) has a phenolic hydroxyl group and/or a phenolic hydroxyl group protected with a group leaving due to the action of an acid, and the developer including the organic solvent contains an additive which forms at least one interaction of an ionic bond, a hydrogen bond, a chemical bond, and a dipole interaction, with the polar group.
    Type: Grant
    Filed: October 13, 2015
    Date of Patent: May 16, 2017
    Assignee: FUJIFILM Corporation
    Inventors: Hiroo Takizawa, Shuji Hirano, Natsumi Yokokawa, Wataru Nihashi
  • Patent number: 9613821
    Abstract: Provided are a method of forming patterns and a method of manufacturing an integrated circuit device. In the method of forming patterns, a photoresist pattern having a first opening exposing a first region of a target layer is formed. A capping layer is formed at sidewalls of the photoresist pattern defining the first opening. An insoluble region is formed around the first opening by diffusing acid from the capping layer to the inside of the photoresist pattern. A second opening exposing a second region of the target layer is formed by removing a soluble region spaced apart from the first opening, with the insoluble region being interposed therebetween. The target layer is etched using the insoluble region as an etch mask.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: April 4, 2017
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Yool Kang, Dong-won Kim, Ju-young Kim, Tae-hoon Kim, Hye-ji Kim, Su-min Park, Hyung-rae Lee
  • Patent number: 9499513
    Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
    Type: Grant
    Filed: February 2, 2015
    Date of Patent: November 22, 2016
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Vipul Jain, Paul J. Labeaume, Jin Wuk Sung, James W. Thackeray
  • Patent number: 9494866
    Abstract: A method of forming a resist pattern, including forming a resist film by coating a resist composition including a base component (A) that exhibits increased solubility in an alkali developing solution, a photo-base generator component (C) that generates a base upon exposure, an acid supply component (Z) and a compound (F) containing at least one selected from the group consisting of a fluorine atom and a silicon atom and containing no acid decomposable group which exhibits increased polarity by the action of acid on a substrate; subjecting the resist film to exposure baking the exposed resist film; and subjecting the resist film to alkali development, thereby forming a negative-tone resist pattern.
    Type: Grant
    Filed: January 29, 2015
    Date of Patent: November 15, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Jiro Yokoya, Hiroaki Shimizu, Hideto Nito
  • Patent number: 9352073
    Abstract: A functional film that is applied to a surface of a medical apparatus or a biomaterial includes a film of Ti-doped tetrahedral amorphous carbon (ta-C:Ti film).
    Type: Grant
    Filed: September 17, 2015
    Date of Patent: May 31, 2016
    Assignee: NIKO CORPORATION
    Inventors: Yusuke Taki, Tsukasa Kishiume
  • Patent number: 9335636
    Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: May 10, 2016
    Assignee: ORTHOGONAL, INC.
    Inventors: John Andrew DeFranco, Francis Houlihan, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, Douglas Robert Robello, Sandra Rubsam, Terrence Robert O'Toole