Forming Nonplanar Surface Patents (Class 430/322)
  • Patent number: 9768355
    Abstract: Methods and apparatuses to produce graphene and nanoparticle catalysts supported on graphene without the use of reducing agents, and with the concomitant production of heat, are provided. The methods and apparatuses employ radiant energy to reduce (deoxygenate) graphite oxide (GO) to graphene, or to reduce a mixture of GO plus one or more metals to produce nanoparticle catalysts supported on graphene. Methods and systems to generate and utilize heat that is produced by irradiating GO, graphene and their metal and semiconductor nanocomposites with visible, infrared and/or ultraviolet radiation, e.g. using sunlight, lasers, etc. are also provided.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: September 19, 2017
    Assignee: Virginia Commonwealth University
    Inventors: M. Samy El-Shall, Victor Abdelsayed, Saud I. Al-Resayes, Zeid Abdullah M. Alothman
  • Patent number: 9766545
    Abstract: A method for forming a pattern on a substrate is described. The method includes providing a substrate, forming a photosensitive layer over the substrate, exposing the photosensitive layer to a first exposure energy through a first mask, exposing the photosensitive layer to a second exposure energy through a second mask, baking the photosensitive layer, and developing the exposed photosensitive layer. The photosensitive layer includes a polymer that turns soluble to a developer solution, at least one photo-acid generator (PAG), and at least one photo-base generator (PBG). A portion of the layer exposed to the second exposure energy overlaps with a portion exposed to the first exposure energy.
    Type: Grant
    Filed: July 24, 2015
    Date of Patent: September 19, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ya Hui Chang, Chia-Chu Liu
  • Patent number: 9753197
    Abstract: An identification film and pattern having high transparency and a reflectance spectrum with respect to a particular wavelength and including photonic crystals patterned into a particular shape and an anticounterfeiting product including the same are disclosed. A highly transparent colloidal photonic crystal film is easily manufactured using photocurable colloidal suspensions. Even though a plurality of patterns (including sub-patterns) is formed in plural films, there is no reduction in optical characteristics such as transparency, reflectance spectra, and the like. Thus, a film patterned into a desired shape is manufactured and thus usability thereof is enhanced, and a plurality of reflectance spectra with various wavelength ranges is provided and thus identification capability or security is enhanced.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: September 5, 2017
    Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY
    Inventors: Shin Hyun Kim, Seung Man Yang, Hye Soo Lee, Tae Soup Shim
  • Patent number: 9753201
    Abstract: Provided is a method of fabricating a wire grid polarizer, the method comprising an organic light-emitting display panel. According to an aspect of the present disclosure, there is provided a method comprising sequentially stacking a conductive wire pattern layer, a first neutral layer, a guide pattern layer and a second neutral layer on a substrate, forming etch-stop patterns on the second neutral layer, forming second neutral layer patterns and guide patterns by patterning the second neutral layer and the guide pattern layer using the etch-stop patterns, coating a block copolymer of two types of monomer blocks having different etch rates on the first neutral layer and the second neutral layer patterns, aligning the block copolymer, removing one type of monomer blocks from the aligned block copolymer, and patterning the conductive wire pattern layer using the remaining monomer blocks, the second neutral layer patterns, and the guide patterns.
    Type: Grant
    Filed: March 25, 2015
    Date of Patent: September 5, 2017
    Assignee: Samsung Display Co., Ltd.
    Inventors: Su Mi Lee, Min Hyuck Kang
  • Patent number: 9705109
    Abstract: There is provided an organic light emitting diode (OLED) comprising an organic electroluminescent layer formed between a first electrode and a second electrode, characterised in that organic electroluminescent layer comprises a nano-structured grating pattern provided therein, wherein the grating is configured to modify the refractive index of the electroluminescent layer.
    Type: Grant
    Filed: May 28, 2014
    Date of Patent: July 11, 2017
    Assignee: Lomox Limited
    Inventor: Nigel Joseph Copner
  • Patent number: 9703918
    Abstract: A method of optimizing a semiconductor mask layout is provided. The method includes accessing a digital file comprising the semiconductor mask layout, accessing processing condition parameters describing process conditions, receiving a request from a user of a mask layout system to initiate a semiconductor mask layout optimization process, applying a set of rules to insert an array of assist features into the semiconductor mask layout, and updating the digital file. The semiconductor mask layout includes a plurality of parallel mask features, wherein pairs of the parallel mask features share an end-to-end region between the parallel mask features of each pair, with an imaginary axis bisecting the end-to-end regions. Each assist feature is located proximate to at least one end-to-end region, and the imaginary axis intersects each assist feature. Related photomasks, design layout systems, and computer-readable media are also provided.
    Type: Grant
    Filed: March 16, 2015
    Date of Patent: July 11, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wei-De Ho, Chi-Yuan Sun, Ya Hui Chang, Hung-Chang Hsieh
  • Patent number: 9690199
    Abstract: In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: June 27, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Michael K. Gallagher, Owendi Ongayi
  • Patent number: 9690188
    Abstract: A method for manufacturing a photomask is provided. The method includes providing a flexible substrate, forming a plurality of microstructures on the flexible substrate, coating the flexible substrate with a shading material to form a shading layer on the substrate, and solidifying the shading layer which is a single layer.
    Type: Grant
    Filed: June 29, 2015
    Date of Patent: June 27, 2017
    Assignee: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yung-Chun Lee, Chun-Ying Wu, Heng Hsieh, Yi-Ta Hsieh, Jhih-Nan Yan
  • Patent number: 9651870
    Abstract: A tool and a method of lithography are provided. In various embodiments, the method of lithography includes forming a photoresist layer on a substrate. The method further includes exposing the photoresist layer to form an exposed photoresist layer. The method further includes rinsing the exposed photoresist layer. The method further includes treating the exposed photoresist layer with a chemical modifier to form a modified photoresist layer. The method further includes baking the modified photoresist layer. The method further includes developing the modified photoresist layer.
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 16, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Tsung-Pao Chen, Sheng-Min Chuang, Teng-Kuei Chuang
  • Patent number: 9650357
    Abstract: A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: May 16, 2017
    Assignees: Toyo Gosei Co., Ltd., Osaka University
    Inventor: Satoshi Enomoto
  • Patent number: 9632032
    Abstract: A method for manufacturing a substrate for surface-enhanced Raman spectography, includes creating a supporting structure including microstructured pattern including a top and sidewalls; depositing a multilayer on the supporting structure with the multilayer including two metal layers and an intermediate layer arranged between the two metal layers, with the intermediate layer being carried out in a material that can be selectively etched with respect to the metal layers; etching a portion of the multilayer deposited on the top of the microstructured pattern in such a way as to expose ends each layer of the multilayer; selective etching of the ends of the intermediate layers in such a way as to form cavities between the ends of two successive metal layers.
    Type: Grant
    Filed: January 5, 2016
    Date of Patent: April 25, 2017
    Assignee: COMMISSARIAT À L'ÉNERGIE ATOMIQUE ET AUX ÉNERGIES ALTERNATIVES
    Inventors: Stefan Landis, Vincent Reboud
  • Patent number: 9618664
    Abstract: An optical element (transmissive or reflective) includes a transmissive layer comprising two different optical media arranged among discrete volumes arranged along the layer. The discrete volumes are arranged to approximate a desired phase function (typically modulo 2?) and are smaller than an operational wavelength in order to provide a range of phase delays needed to adequately approximate the desired phase function.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: April 11, 2017
    Assignee: Finisar Corporation
    Inventors: Thomas W. Mossberg, Christoph M. Greiner, Dmitri Iazikov
  • Patent number: 9606437
    Abstract: A fluorine-containing compound represented by a following general formula (1) is provided. [In the general formula (1), X represents a halogen atom or an alkoxy group, R1 represents a branched chain or cyclic alkyl group having 3 to 10 carbon atoms, and Rf1 and Rf2 represent fluorinated alkoxy groups. n represents an integer of 0 or greater.
    Type: Grant
    Filed: March 2, 2015
    Date of Patent: March 28, 2017
    Assignees: KANAGAWA UNIVERSITY, NIKON CORPORATION
    Inventor: Kazuo Yamaguchi
  • Patent number: 9599897
    Abstract: A salt represented by the formula (I); wherein Q1 and Q2 each independently represent a fluorine atom or a C1 to C6 perfluoroalkyl group, Lb1 represents a single bond or a divalent C1 to C24 saturated hydrocarbon group where a methylene group may be replaced by an oxygen atom or a carbonyl group and where a hydrogen atom may be replaced by a hydroxyl group or a fluorine atom, and Y represents a hydrogen atom, a fluorine atom, or an optionally substituted C3 to C18 alicyclic hydrocarbon group where a methylene group may be replaced by an oxygen atom, a carbonyl group or a sulfonyl group; and Ar represents a divalent C6 to C20 aromatic hydrocarbon group, and Z+ represents an organic sulfonium cation or an organic iodonium cation.
    Type: Grant
    Filed: August 25, 2015
    Date of Patent: March 21, 2017
    Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Takashi Nishimura, Yuko Mukai, Koji Ichikawa
  • Patent number: 9599888
    Abstract: Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and an interface between the reflective material and the transparent substrate is a reflective surface. The reticle pattern is on a second surface of the transparent substrate. A reflectivity of the reticle pattern is less than a reflectivity of the reflective material. Methods for forming similar lithography masks and for using similar lithography masks are disclosed.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: March 21, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chien-Hsuan Liu, Jen-Pan Wang
  • Patent number: 9541478
    Abstract: The present invention provides a method for fluorescence intensity equalization. The method involves providing an assay device having at least one immobilized array of molecular probes that bind to an analyte bound to a fluorescent marker; providing drying apparatus comprising an aspiration tube having open first and second ends, the second end of the aspiration tube being connected a vacuum source for applying a vacuum through said tube; placing the first end of the aspiration tube in proximity of said at least one immobilized array of molecular probes; and applying a vacuum through said aspiration tube for removing vapor from said at least one immobilized array of molecular probes. The application of the present invention provides for more reliable fluorescent signal intensity readings due to a reduction in signal quenching factors.
    Type: Grant
    Filed: October 7, 2009
    Date of Patent: January 10, 2017
    Assignee: SQI DIAGNOSTICS SYSTEMS INC.
    Inventor: Peter Lea
  • Patent number: 9507274
    Abstract: An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.
    Type: Grant
    Filed: January 17, 2013
    Date of Patent: November 29, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Raymond Wilhelmus Louis Lafarre, Sjoerd Nicolaas Lambertus Donders, Nicolaas Ten Kate, Nina Vladimirovna Dziomkina, Yogesh Pramod Karade, Elisabeth Corinne Rodenburg
  • Patent number: 9427915
    Abstract: A method of manufacturing of an alignment material film includes photoaligning the alignment material film by an exposure device to split each of sections of the alignment material film corresponding to picture elements of a liquid crystal display device into two parts in a width direction of the picture elements and exposing the alignment material film from different directions of each other. In the exposure device, each of sections of the alignment material film corresponding to the picture elements of the liquid crystal display device is split into two parts in the width direction of the picture elements and the two parts are exposed from the different directions of each other, whereby the alignment material film is photoaligned. The exposure device includes a first light source and a second light source for outputting exposure light.
    Type: Grant
    Filed: March 6, 2015
    Date of Patent: August 30, 2016
    Assignee: V TECHNOLOGY CO., LTD.
    Inventor: Michinobu Mizumura
  • Patent number: 9423541
    Abstract: A manufacturing method of a mother substrate assembly includes forming a metal layer on substantially an entire surface of a transparent substrate including a cell area including a non-display area and a display area, an align key area, and a substrate area surrounding the cell area and the align key area, etching the metal layer to form an align key in the align key area, etching the metal layer to form a reflection part in the non-display area, and etching the metal layer in the display area to form a metal nanowire in the display area.
    Type: Grant
    Filed: October 14, 2014
    Date of Patent: August 23, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Seung-Won Park, Taewoo Kim, Moongyu Lee, Minhyuck Kang
  • Patent number: 9412615
    Abstract: A patterning method is provided. A substrate including a material layer thereon is provided. A patterned hard mask layer, having a plurality of first holes, is formed on the material layer. Afterward, a mask layer, including a plurality of line pattern masks extending in a direction and dividing each first hole into a second hole and a third hole, is formed. The material layer is patterned using the patterned hard mask layer and the mask layer as masks to form a patterned material layer having a plurality of fourth and fifth holes. Furthermore, a semiconductor structure is provided.
    Type: Grant
    Filed: September 22, 2014
    Date of Patent: August 9, 2016
    Assignee: MACRONIX International Co., Ltd.
    Inventor: Chin-Cheng Yang
  • Patent number: 9371250
    Abstract: A process for forming an array of irregularities or features that are submicron-size in height and that have a characteristic lateral dimension that is micron- or submicron-size, over a surface of a material, by ion erosion, the process including: supplying the material with a thickness at least equal to 100 nm, the material being a solid hybrid material that includes: a simple oxide or a mixed oxide of one or more elements, an oxide molar percentage in the material being at least 40%; and a species, of a different nature to the one or more elements of the oxide, a molar percentage of the species in the material ranging from 6 mol % up to 50 mol % while remaining below the percentage of the oxide, most of the species having a largest characteristic dimension smaller than 50 nm, optionally heating the hybrid material before the erosion; structuring the surface of the hybrid material with an erosion that lasts less than one hour over an erosion area greater than 1 cm2, until the array of features is formed, the
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: June 21, 2016
    Assignee: SAINT-GOBAIN GLASS FRANCE
    Inventors: Elin Sondergard, Sébastien Le Roy, Alban Letailleur, Etienne Barthel, Constance Magne
  • Patent number: 9359528
    Abstract: The present invention relates to a pressure sensitive adhesive composition. The present invention may effectively provide a pressure sensitive adhesive where peel forces for both sides are different and an modulus differs along the thickness direction. By applying the pressure sensitive adhesive as above, the present invention may provide, for example, an optical element, such as a polarizing plate, which can effectively inhibit light leakage and shows excellent durability, while being formed to have a thin thickness as well.
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: June 7, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Sung Soo Yoon, No Ma Kim, In Ho Hwang, In Kyu Park, Min Ki Lee
  • Patent number: 9362106
    Abstract: A wafer is held horizontally and rotated by a substrate holding mechanism. An aqueous alkaline solution is supplied to a wafer by a nozzle and caused to flow from a central portion to a peripheral edge portion of the wafer, thereby etching the wafer. An amount of oxygen, which is equal to or more than the amount of oxygen in atmospheric air involved in the aqueous alkaline solution flowing on the wafer, is previously dissolved in the aqueous alkaline solution.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: June 7, 2016
    Assignees: Sony Corporation, Tokyo Electron Limited
    Inventors: Hayato Iwamoto, Yoshiya Hagimoto, Tomoki Tetsuka, Shinichiro Shimomura, Teruomi Minami, Hiroki Sakurai, Hirotaka Maruyama, Yosuke Kawabuchi, Hiroshi Tanaka
  • Patent number: 9352543
    Abstract: Provided are methods of patterning porous materials on the micro- and nanometer scale using a direct imprinting technique. The present methods of direct imprinting of porous substrates (“DIPS”), can utilize reusable stamps that may be directly applied to an underlying porous material to selectively, mechanically deform and/or crush particular regions of the porous material, creating a desired structure. The process can be performed in a matter of seconds, at room temperature or higher temperatures, and eliminates the requirement for intermediate masking materials and etching chemistries.
    Type: Grant
    Filed: May 31, 2010
    Date of Patent: May 31, 2016
    Assignee: Vanderbilt University
    Inventors: Sharon M. Weiss, Judson D. Ryckman, Marco Liscidini, John E. Sipe
  • Patent number: 9354522
    Abstract: A block copolymer includes: a first block, and a second block copolymerized with the first block. The second block includes a silyl group including a ring-type functional group.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: May 31, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Min Hyuck Kang, Tae Woo Kim, Myung Im Kim, Moon Gyu Lee, Su Mi Lee, Seung-Won Park, Lei Xie, Bong-Jin Moon, Na Na Kang
  • Patent number: 9354523
    Abstract: A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. R1 represents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; R2 represents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; M+ represents a monovalent cation; and R3 represents a monovalent organic group having 1 to 30 carbon atoms.
    Type: Grant
    Filed: July 9, 2015
    Date of Patent: May 31, 2016
    Assignee: JSR Corporation
    Inventors: Yuuko Kiridoshi, Hiroyuki Nii, Tsuyoshi Furukawa, Takeo Shioya
  • Patent number: 9341950
    Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: May 17, 2016
    Assignee: Au Optronics Corporation
    Inventors: Hsiang-Chih Hsiao, Ta-Wen Liao, Tzu-Min Yang, Shan-Fang Chen, Ya-Ping Chang, Chi-Hung Yang, Chung-Yuan Liao
  • Patent number: 9341954
    Abstract: An illumination optical apparatus has an optical unit. The optical unit has a light splitter to split an incident beam into two beams; a first spatial light modulator which can be arranged in an optical path of a first beam; a second spatial light modulator which can be arranged in an optical path of a second beam; and a light combiner which combines a beam having passed via the first spatial light modulator, with a beam having passed via the second spatial light modulator; each of the first spatial light modulator and the second spatial light modulator has a plurality of optical elements arranged two-dimensionally and controlled individually.
    Type: Grant
    Filed: March 20, 2015
    Date of Patent: May 17, 2016
    Assignee: NIKON CORPORATION
    Inventor: Osamu Tanitsu
  • Patent number: 9335634
    Abstract: A display manufacturing method comprises steps of: moving a first substrate and a second substrate by a conveying apparatus; and implementing a first exposure and a second exposure of the first substrate and a first exposure and a second exposure of the second substrate by at least one light emitting element when the conveying apparatus drives the first and second substrates to pass through the light source module. When the first exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite, or when the second exposures of the first and second substrates are implemented, the moving directions of the first and second substrates are opposite. A photo alignment process is also disclosed.
    Type: Grant
    Filed: December 6, 2013
    Date of Patent: May 10, 2016
    Assignee: Innolux Corporation
    Inventors: Ker-Yih Kao, Tsan-Jen Chen, Chien-Hsing Lee
  • Patent number: 9329491
    Abstract: A method of adjusting speed and/or routing of a part of a movement plan of a table under an immersion fluid supply system of a lithographic apparatus. The method includes splitting the movement plan of the table into a plurality of discrete movements; determining a risk of a bubble of a size greater than a certain size being present in immersion fluid through which a patterned beam of the lithographic apparatus will pass during a certain discrete movement by determining whether the immersion fluid supply system passes over a position at which immersion fluid leaked from the immersion fluid supply system is present; and adjusting the speed and/or routing of a part of the movement plan corresponding to (i) a discrete movement earlier than a discrete movement for which the risk of a bubble is determined, and/or (ii) a discrete movement for which the risk of a bubble is determined.
    Type: Grant
    Filed: June 24, 2011
    Date of Patent: May 3, 2016
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Cédric Désiré Grouwstra, Nicolaas Rudolf Kemper, Norbertus Josephus Martinus Van Den Nieuwelaar, Dirk De Vries, Hua Li, Marinus Jochemsen
  • Patent number: 9323143
    Abstract: A nano-imprint lithography process includes forming a multiplicity of hydroxyl groups on a surface of a substantially inorganic nano-imprint lithography template, heating the template, and reacting a pre-selected percentage of the hydroxyl groups on the surface of the template with a mono-functional, non-fluorinated compound to form a monolayer coating on the surface of the nano-imprint lithography template. The coated template may be contacted with a polymerizable composition disposed on a nano-imprint lithography substrate, and the polymerizable composition solidified to form a patterned layer. The coated template is separated from the patterned layer.
    Type: Grant
    Filed: February 3, 2009
    Date of Patent: April 26, 2016
    Assignees: Canon Nanotechnologies, Inc., Molecular Imprints, Inc.
    Inventors: Frank Y. Xu, Weijun Liu
  • Patent number: 9324722
    Abstract: A method of forming metal routing in an IC device utilizing a cut mask in conjunction with a block mask is disclosed. Embodiments include forming a hard-mask layer on an upper surface of a silicon-oxide layer; forming spaced parallel mandrels on an upper surface of the hard-mask; forming spacers on opposite sides of each mandrel, removing the mandrels, forming alternating mandrel and non-mandrel spaces; forming block-mask portions over the mandrel and non-mandrel spaces; removing exposed sections of the hard-mask exposing sections of the silicon-oxide, removing the block-mask portions; forming a cut-mask with openings shorter than the block-mask portions over the upper surface of the hard-mask where the block-mask portions had been; removing the hard-mask through the cut-mask openings, removing the cut-mask; forming cavities in exposed regions of the silicon-oxide; removing the spacers and any remaining hard-mask; and forming metal lines in the cavities.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: April 26, 2016
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Youngtag Woo, Lei Yuan, Jongwook Kye
  • Patent number: 9324563
    Abstract: Methods of forming patterns are provided. The methods may include sequentially forming an etch-target layer and a photoresist layer on a substrate, exposing two first portions of the photoresist layer to light to transform the two first portions into two first photoresist patterns and exposing a second portion of the photoresist layer to light to transform the second portion into a second photoresist pattern disposed between the two first photoresist patterns. The method may also removing portions of the photoresist layer to leave the two first photoresist patterns and the second photo resist pattern on the etch-target layer such that the etch-target layer is exposed.
    Type: Grant
    Filed: June 9, 2014
    Date of Patent: April 26, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Kyoungmi Kim, Joo-Hyung Yang, Jaeho Kim, Jungsik Choi
  • Patent number: 9284195
    Abstract: Aggregated graphene oxide includes a range of specific surface area, and a method of preparing aggregated graphene oxide includes dispersing graphene oxide in an organic solvent and adding an anti-solvent. Aggregated graphene includes a range of specific surface area, and a method of preparing aggregated graphene includes dispersing graphene oxide in an organic solvent, adding an anti-solvent, and reducing the aggregated graphene oxide. Aggregated and nitrogen-doped includes a range of specific surface area, and a method of preparing aggregated and nitrogen-doped graphene includes dispersing graphene oxide in an organic solvent, adding an anti-solvent, and photo-reacting the aggregated graphene oxide.
    Type: Grant
    Filed: January 30, 2014
    Date of Patent: March 15, 2016
    Assignee: RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY
    Inventors: Hyoyoung Lee, Yeo Heung Yoon, Chul Baik, Keun Sik Lee
  • Patent number: 9271936
    Abstract: A method for synthesizing a mesoporous silica nanoparticle, a mesoporous silica nanoparticle, and applications thereof are provided. The method includes fractionating a mesoporous silica nanoparticle suspension to produce size-fractionated mesoporous silica nanoparticle. The method further includes etching the size-fractionated mesoporous silica nanoparticle to produce synthesized mesoporous silica nanoparticle having a hollow, porous morphology configured to receive one of a therapeutic agent and an imaging material. The etching includes differential etching of silica from areas of low polymeric density within the mesoporous silica nanoparticle and re-depositing of the silica in areas of higher polymeric density existing near the surface of the mesoporous silica nanoparticle. A target material is loaded into the synthesized mesoporous silica nanoparticle and a controlled released of the target material is provided by decreasing the physiological pH of the surface of the mesoporous silica nanoparticle.
    Type: Grant
    Filed: March 6, 2009
    Date of Patent: March 1, 2016
    Assignee: UNIVERSITY OF MARYLAND
    Inventors: Philip R. DeShong, Michael R. Zachariah, Peter DeMuth, Anand Prakash, Charles Luckett, Douglas Stephen English
  • Patent number: 9268893
    Abstract: Photolithography mask synthesis is disclosed for spacer patterning masks. In one example, backbone features are extracted from a target layout of a mask design. A connectivity graph is generated based on the target layout in which lines of the backbone features are represented as nodes on the connectivity graph. The nodes are connected based on spacer patterning process limitations and the connections are assigned to sets. A backbone mask layout is then generated based on one of the sets of nodes.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: February 23, 2016
    Assignee: Intel Corporation
    Inventors: Bikram Baidya, Omkar S. Dandekar, Vivek K. Singh
  • Patent number: 9244366
    Abstract: An extreme ultraviolet lithography (EUVL) process is performed on a target, such as a semiconductor wafer, having a photosensitive layer. The method includes providing a one-dimensional patterned mask along a first direction. The patterned mask includes a substrate including a first region and a second region, a multilayer mirror above the first and second regions, an absorption layer above the multilayer mirror in the second region, and a defect in the first region. The method further includes exposing the patterned mask by an illuminator and setting the patterned mask and the target in relative motion along the first direction while exposing the patterned mask. As a result, an accumulated exposure dose received by the target is an optimized exposure dose.
    Type: Grant
    Filed: April 21, 2015
    Date of Patent: January 26, 2016
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yen-Cheng Lu, Shinn-Sheng Yu, Jeng-Horng Chen, Anthony Yen
  • Patent number: 9230820
    Abstract: A method for directed self-assembly (DSA) of block copolymers (BCPs) uses a BCP blend with a small portion of functional homopolymers, called “inks”, before deposition and annealing of the BCP. A substrate has a patterned sublayer formed on it. The BCP blend is deposited on the patterned sublayer and annealed. The BCP blend is guided by the sublayer pattern. The inks selectively distribute into blocks, and part of the inks graft on the substrate underneath the blocks. The BCP blend layer is rinsed away, leaving the grafted inks. The grafted inks form a chemical contrast pattern that has the same geometry with the BCP bulk morphology. This process is repeated, which results in the grafted inks forming a thicker and denser chemical contrast pattern. This chemical contrast pattern of grafted inks is used for the DSA of a BCP that self-assembles as lamellae perpendicular to the substrate.
    Type: Grant
    Filed: May 8, 2015
    Date of Patent: January 5, 2016
    Assignee: HGST Netherlands B.V.
    Inventors: Ricardo Ruiz, Lei Wan
  • Patent number: 9182672
    Abstract: A method and an apparatus print a pattern of periodic features into a photosensitive layer. The methods includes the steps of: providing a substrate bearing the layer, providing a mask, arranging the substrate such that the mask has a tilt angle with respect to the substrate in a first plane orthogonal thereto, and providing collimated light for illuminating the mask pattern so as to generate a transmitted light-field composed of a range of transversal intensity distributions between Talbot planes separated by a Talbot distance so that the transmitted light-field has an intensity envelope in the first plane. The mask is illuminated with the light while displacing the substrate relative to the mask in a direction parallel to the first plane and to the substrate. The tilt angle and the intensity envelope are arranged so that the layer is exposed to an average of the range of transversal intensity distributions.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: November 10, 2015
    Assignee: Eulitha AG
    Inventors: Harun Solak, Francis Clube
  • Patent number: 9180715
    Abstract: A donor film and a thermal imaging method, the film including a base layer; a first light-to-heat conversion layer on the base layer; and a second light-to-heat conversion layer on the first light-to-heat conversion layer and to which an organic material is deposited, wherein the first light-to-heat conversion layer and the second light-to-heat conversion layer respectively absorb light of different wavelengths.
    Type: Grant
    Filed: December 23, 2013
    Date of Patent: November 10, 2015
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Hyung-Tag Lim, Young-Gil Kwon, Sok-Won Noh
  • Patent number: 9164376
    Abstract: The invention concerns a method for patterning a surface of a material. A substrate having a polymer film thereon is provided. The polymer is a selectively reactive polymer (e.g., thermodynamically unstable): it is able to unzip upon suitable stimulation. A probe is used to create patterns on the film. During the patterning, the film is locally stimulated for unzipping polymer chains. Hence, a basic idea is to provide a stimulus to the polymeric material, which in turn spontaneously decomposes e.g., into volatile constituents. For example, the film is thermally stimulated in order to break a single bond in a polymer chain, which is sufficient to trigger the decomposition of the entire polymer chain.
    Type: Grant
    Filed: August 9, 2012
    Date of Patent: October 20, 2015
    Assignee: GLOBALFOUNDRIES INC.
    Inventors: Daniel J. Coady, Urs T. Duerig, Jane E. Frommer, Kazuki Fukushima, James L. Hedrick, Armin W. Knoll
  • Patent number: 9140983
    Abstract: A resist composition including a high-molecular weight compound having a constituent unit represented by general formula (a0-1), a constituent unit (a1) containing a group containing a monocyclic group or a chain group among acid decomposable groups whose polarity increases by action of acid, a constituent unit (a1?) containing a group containing a polycyclic group among acid decomposable groups whose polarity increases by the action of an acid, and a constituent unit (a2) containing a lactone-containing monocyclic group, with a proportion of the constituent unit (a1) being equal to a proportion of the constituent unit (a1?) or more; and a method for forming a resist pattern using the resist composition.
    Type: Grant
    Filed: May 29, 2014
    Date of Patent: September 22, 2015
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Junichi Tsuchiya, Yuta Iwasawa
  • Patent number: 9109119
    Abstract: The invention relates to a chromophore of general formula: in which: R1 represents C1-C4 alkyl; R2 represents a sterically hindered group; R3 represents a pi-conjugated system; Y represents O, S, NH or is absent; R4 represents a C3-C18, preferably C3-C8 and more preferably C3 alkyl group; M represents a metal from Group III or IV of the Periodic Table; n is an integer, to its process of preparation and to its uses.
    Type: Grant
    Filed: September 15, 2009
    Date of Patent: August 18, 2015
    Assignee: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE-CNRS
    Inventors: Olivier Dautel, Joel Moreau, Jean-Pierre Lere-Porte
  • Patent number: 9110388
    Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: August 18, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Sascha Bleidistel, Bernhard Geuppert
  • Patent number: 9090782
    Abstract: The present invention relates to a method for cleaning wafers while preventing pattern collapse of the wafers in semiconductor device fabrication, the wafer having at its surface an uneven pattern and containing silicon element at least on surfaces of recessed portions. Provided is: a liquid chemical for forming a protective film which allows efficient cleaning; and a method for cleaning wafers, using the liquid chemical. A liquid chemical for forming a water repellent protective film is provided for forming a protective film on a wafer (having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern), the protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains a dialkylsilyl compound represented by the formula [1] and does not contain an acid and a base.
    Type: Grant
    Filed: June 15, 2011
    Date of Patent: July 28, 2015
    Assignee: Central Glass Company, Limited
    Inventors: Takashi Saio, Soichi Kumon, Masanori Saito, Shinobu Arata, Hidehisa Nanai
  • Patent number: 9093276
    Abstract: A method for forming a pattern on a substrate is described. The method includes providing a substrate, forming a photosensitive layer over the substrate, exposing the photosensitive layer to a first exposure energy through a first mask, exposing the photosensitive layer to a second exposure energy through a second mask, baking the photosensitive layer, and developing the exposed photosensitive layer. The photosensitive layer includes a polymer that turns soluble to a developer solution, at least one photo-acid generator (PAG), and at least one photo-base generator (PBG). A portion of the layer exposed to the second exposure energy overlaps with a portion exposed to the first exposure energy.
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: July 28, 2015
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ya-Hui Chang, Chia-Chu Liu
  • Patent number: 9063434
    Abstract: Sub-diffraction-limited patterning using a photoswitchable recording material is disclosed. A substrate can be provided with a photoresist in a first transition state. The photoresist can be configured for spectrally selective reversible transitions between at least two transition states based on a first wavelength band of illumination and a second wavelength band of illumination. An optical device can selectively expose the photoresist to a standing wave with a second wavelength in the second wavelength band to convert a section of the photoresist into a second transition state. The optical device or a substrate carrier securing the substrate can modify the standing wave relative to the substrate to further expose additional regions of the photoresist into the second transition state in a specified pattern.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: June 23, 2015
    Assignee: University of Utah Research Foundation
    Inventors: Rajesh Menon, Precious Cantu
  • Patent number: 9052610
    Abstract: A coating and developing system for forming a resist film on a substrate by coating the substrate with a liquid resist and developing the resist film after the resist film has been processed by immersion exposure that forms a liquid layer on the surface of the substrate is capable of reducing difference in property among resist films formed on substrates. The coating and developing system includes: a cleaning unit; a carrying means; and a controller. A set time interval is determined such that the substrate is subjected to the immersion exposure process after contact angle drop rate at which contact angle between the cleaning liquid and a surface of the substrate drops has dropped from an initial level at the wetting time point when the surface of the substrate is wetted with the cleaning liquid to a level far lower than the initial level.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: June 9, 2015
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Seiki Ishida, Taro Yamamoto
  • Patent number: 9046768
    Abstract: A resist overlayer film composition for lithography from which a resist overlayer film is formed. A resist overlayer film forming composition including a benzene compound having at least one amino group. A resist may be an EUV resist or an electron beam resist. The benzene compound may have at least one amino group and at least one alkyl group, one or two amino groups and one to four alkyl groups, or may be a compound of Formula (1): where R1 to R5 are independently a hydrogen atom, a C1-10 alkyl group such as methyl, ethyl or isopropyl, or an amino group.
    Type: Grant
    Filed: September 26, 2012
    Date of Patent: June 2, 2015
    Assignee: NISSAN CHEMICAL INDUSTRIES, LTD.
    Inventors: Ryuji Ohnishi, Takafumi Endo, Rikimaru Sakamoto
  • Patent number: 9046784
    Abstract: A nanoporous film patterned by direct photolithography and a method for preparing the same are provided. Since a precursor of the material is the mixture of a nano template material and a photoresist and the mixture still has the basic physical properties of the photoresist, a film is formed on a substrate by a standard photolithography process and a micro-sized patterned structure is realized. The mixture with the patterned structure is chemically etched to remove the template material to form a porous polymer film, or the mixture with the patterned structure is carbonized at a high temperature and then the template material is removed to form a porous carbon film. The nanoporous film patterned by direct photolithography and the method for preparing the same have the advantages of simple operation, low cost and good integration with other micro electric mechanical systems.
    Type: Grant
    Filed: April 27, 2013
    Date of Patent: June 2, 2015
    Assignee: Tsinghua University
    Inventors: Xiaohong Wang, Caiwei Shen