Using Identified Developer Patents (Class 430/435)
  • Patent number: 9034559
    Abstract: A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A? represents —N?—SO2—RD, —COO?, —O? or —SO3?. —SO3? does not directly bond to a carbon atom having a fluorine atom. RD represents a linear or branched monovalent hydrocarbon group, or the like. X+ represents an onium cation.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: May 19, 2015
    Assignee: JSR CORPORATION
    Inventors: Hirokazu Sakakibara, Masafumi Hori, Taiichi Furukawa, Koji Ito
  • Patent number: 9012133
    Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: April 21, 2015
    Assignee: International Business Machines Corporation
    Inventors: Javier J. Perez, Dario L. Goldfarb, Ranee W. Kwong, Libor Vyklicky
  • Patent number: 8986918
    Abstract: The present invention relates to a hybrid photoresist composition for improved resolution and a pattern forming method using the photoresist composition. The photoresist composition includes a radiation sensitive acid generator, a crosslinking agent and a polymer having a hydrophobic monomer unit and a hydrophilic monomer unit containing a hydroxyl group. At least some of the hydroxyl groups are protected with an acid labile moiety having a low activation energy. The photoresist is capable of producing a hybrid response to a single exposure. The patterning forming method utilizes the hybrid response to form a patterned structure in the photoresist layer. The photoresist composition and the pattern forming method of the present invention are useful for printing small features with precise image control, particularly spaces of small dimensions.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: March 24, 2015
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Sen Liu
  • Patent number: 8956802
    Abstract: Provided is a negative type pattern forming method that satisfies high sensitivity, high resolution, good roughness and good dry etching resistance at the same time, and further, has a good development time dependency, the method including (i) forming a film by a chemical amplification resist composition containing (A) a fullerene derivative having an acid-decomposable group, (B) a compound generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) exposing the film, and (iii) developing the exposed film by using an organic solvent-containing developer.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 17, 2015
    Assignee: FUJIFILM Corporation
    Inventor: Kaoru Iwato
  • Patent number: 8951718
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: February 10, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8921031
    Abstract: Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: September 9, 2012
    Date of Patent: December 30, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Rosemary Bell, Jong Keun Park, Seung-Hyun Lee
  • Patent number: 8908007
    Abstract: A transmission device includes an image capturing part that captures a subject and generates a plurality of temporally successive frame images, an analyzer that analyzes a size of a motion of the subject by use of at least two or more of the frame images, a viewing condition receiver that receives viewing conditions from a reception device, and a network bandwidth measurement part that measures a congestion degree of a network. The transmission device further includes a controller that controls a data volume of the plurality of frame images based on the size of the motion of the subject, the viewing conditions, and the congestion degree of the network, to determine a predetermined parameter for encoding, an encoder that encodes the plurality of frame images based on the predetermined parameter, and a transmitter that transmits the plurality of encoded frame images.
    Type: Grant
    Filed: July 12, 2012
    Date of Patent: December 9, 2014
    Assignee: Panasonic Corporation
    Inventor: Taiho Nakazawa
  • Patent number: 8883396
    Abstract: A resist composition containing a base component (A) which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a copolymer (A1) having a structural unit (a0) containing a group represented by the following general formula (a0-1) or (a0-2), a structural unit (a11) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a polycyclic group, and a structural unit (a12) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a monocyclic group. Each of the groups —R3—S+(R4)(R5) and Mm+ in the formula has only one aromatic ring as a whole or has no aromatic ring.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: November 11, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Masahito Yahagi, Jun Iwashita
  • Patent number: 8835098
    Abstract: Provided is a pattern forming method making it possible to obtain a pattern with less scums and watermark defects. The pattern forming method includes the steps of forming a film from an actinic-ray- or radiation-sensitive resin composition includes a resin (A) that exhibits an increased solubility in an alkali developer when acted on by an acid, a compound (B) that generates an acid when exposed to actinic rays or radiation, and a resin (C) containing at least one of a fluorine atom and a silicon atom, exposing the film to light, and developing the exposed film using a tetramethylammonium hydroxide solution whose concentration is less than 2.38 mass %.
    Type: Grant
    Filed: September 4, 2012
    Date of Patent: September 16, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Toshiaki Fukuhara
  • Patent number: 8815493
    Abstract: A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed with a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a base polymer, a fluorine-atom-containing polymer, a radiation-sensitive acid generator, a solvent, and a compound. The base polymer has an acid-labile group. The fluorine-atom-containing polymer has a content of fluorine atoms higher than a content of fluorine atoms of the base polymer. The compound has a relative permittivity greater than a relative permittivity of the solvent by at least 15. A content of the compound is no less than 10 parts by mass and no greater than 200 parts by mass with respect to 100 parts by mass of the base polymer.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: August 26, 2014
    Assignee: JSR Corporation
    Inventors: Koji Ito, Hirokazu Sakakibara, Masafumi Hori, Taiichi Furukawa
  • Patent number: 8808965
    Abstract: A pattern forming method comprising (i) a step of forming a film from a chemical amplification resist composition (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the chemical amplification resist composition contains (A) a resin containing a repeating unit having two or more hydroxyl groups, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent and (D) a solvent; a pattern formed by the pattern forming method; a chemical amplification resist composition used in the pattern forming method; and a resist film formed using the chemical amplification resist composition.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: August 19, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Shinji Tarutani, Yuichiro Enomoto, Sou Kamimura, Keita Kato
  • Patent number: 8663904
    Abstract: Embodiments in accordance with the present invention provide for non-self imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming top-coat layers for overlying photoresist layers in immersion lithographic process and the process thereof.
    Type: Grant
    Filed: August 7, 2013
    Date of Patent: March 4, 2014
    Assignee: Promerus, LLC
    Inventors: Pramod Kandanarachchi, Kazuyoshi Fujita, Steven Smith, Larry F Rhodes
  • Patent number: 8632961
    Abstract: A processing solution (or developer) has been designed for use to washout non-polymerized photopolymer compositions to prepare flexographic printing plates having flexographic relief images. This processing solution includes one or more esters of monobasic carboxylic acids represented by one or both of Structures (I) and (II) defined herein and one or more aliphatic or aromatic alcohols.
    Type: Grant
    Filed: January 28, 2010
    Date of Patent: January 21, 2014
    Assignee: Eastman Kodak Company
    Inventors: Elsie A. Fohrenkamm, M. Zaki Ali, Michael B. Heller, Kevin M. Kidnie
  • Patent number: 8628911
    Abstract: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: January 14, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Young Cheol Bae, David Richard Wilson, Jibin Sun
  • Patent number: 8617794
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
    Type: Grant
    Filed: October 27, 2011
    Date of Patent: December 31, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Publication number: 20130266898
    Abstract: Transparent conductive films, articles made from them, and methods of making them are disclosed. Some transparent conductive films include flexible glass substrates and conductive layers containing metal nanoparticles. Others include at least one layer with cell walls that contain metal nanorods or conductive nanowires. Still others include a substrate with a coating disposed on it, with the coating including conductive components and photopolymers. Such films are useful in such articles as electronic displays, touch screens, and the like.
    Type: Application
    Filed: June 3, 2013
    Publication date: October 10, 2013
    Inventor: David R. Whitcomb
  • Patent number: 8530148
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: June 24, 2008
    Date of Patent: September 10, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8507193
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: June 24, 2008
    Date of Patent: August 13, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8498778
    Abstract: A turn signal control system for use with a right turn signal and a left turn signal of a motor vehicle and a vehicle navigation system is provided. The turn signal system includes a processor configured to be operably coupled to the vehicle navigation system. The processor is configured to receive map data and route data from the vehicle navigation system. The processor is configured to determine a turn zone of the vehicle based on a set of criteria. A turn signal controller is operably coupled to the processor and configured to activate one of the right and left turn signals when the vehicle is in the turn zone. A method of controlling a right and left turn signal is also provided.
    Type: Grant
    Filed: April 21, 2011
    Date of Patent: July 30, 2013
    Assignee: Continental Automotive Systems, Inc
    Inventors: Shafer Seymour, Robert Gee
  • Patent number: 8431333
    Abstract: A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover includes 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further includes an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: April 30, 2013
    Assignee: Showa Denko K.K.
    Inventors: Masato Kaneda, Yasuhiro Mikawa, Koji Shimizu, Kouichi Terao
  • Publication number: 20130052593
    Abstract: An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.
    Type: Application
    Filed: August 30, 2011
    Publication date: February 28, 2013
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Javier J. Perez, Dario L. Goldfarb, Ranee W. Kwong, Libor Vyklicky
  • Patent number: 8383321
    Abstract: A method for developing a printing plate precursor comprising the step of immersing the precursor in an aqueous alkaline developing solution comprising a (co)polymer comprising a monomeric unit which is represented by the following formula (I): wherein L is a linking group; R1, R2 and R3 independently represent hydrogen or an alkyl group; R4 represents an optionally substituted hydroxyaryl group; x=0 or 1; y=0 or 1 and when y=0 then x=1 and L is further bound to C* to form a cyclic structure.
    Type: Grant
    Filed: August 19, 2008
    Date of Patent: February 26, 2013
    Assignee: Agfa Graphics, N.V.
    Inventors: Hubertus Van Aert, Pascal Meeus, Stefaan Lingier
  • Patent number: 8372751
    Abstract: A method for fabricating a semiconductor device includes etching a substrate to form a body separated by a trench, forming liner layers that cover sidewalls of the body, forming a sacrificial layer that fills the trench and exposes an upper sidewall of each liner layer, forming a hard mask pattern that covers a first one of the liner layers having the exposed upper sidewalls, forming a barrier layer to be selectively grown over the exposed upper sidewalls of a second one of the liner layers, removing the hard mask pattern, removing a part of the sacrificial layer to expose a lower sidewall of a first one of the liner layers, and removing the lower sidewall of the first one of the liner layers to form a side contact.
    Type: Grant
    Filed: September 20, 2011
    Date of Patent: February 12, 2013
    Assignee: Hynix Semiconductor Inc.
    Inventor: Sung-Eun Park
  • Publication number: 20120196231
    Abstract: A polymer washout solvent for developing a flexographic printing plate comprising:-an ester hydrocarbon component,-an ether hydrocarbon component,-an alcoholic hydrocarbon component. The washout solvent of the invention has less hazardous properties than the known solvents. Use of a polymer washout solvent for developing a flexographic printing plate in a washing step.
    Type: Application
    Filed: June 8, 2010
    Publication date: August 2, 2012
    Inventor: Figen Aydogan
  • Patent number: 8227183
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: December 26, 2007
    Date of Patent: July 24, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8227181
    Abstract: A method of preparing a patterned film on a substrate includes applying a silicone composition onto a substrate to form a film of the silicone composition. A portion of the film is exposed to radiation to produce a partially exposed film having an exposed region and a non-exposed region. The partially exposed film is heated for a sufficient amount of time and at a sufficient temperature to substantially insolubilize the exposed region in a developing solvent that includes a siloxane component. The non-exposed region of the partially exposed film is removed with the developing solvent to reveal a film-free region on the substrate and to form the patterned film including the exposed region that remains on the substrate. The film-free regions is substantially free of residual silicone due to the presence of the siloxane component in the developing solvent.
    Type: Grant
    Filed: August 8, 2007
    Date of Patent: July 24, 2012
    Assignee: Dow Corning Corporation
    Inventors: Herman C. G. D. C. Meynen, Brian Harkness
  • Publication number: 20120183909
    Abstract: A developing treatment method includes: a treatment solution supplying step of supplying a treatment solution made by diluting a hydrophobizing agent hydrophobizing a resist pattern with hydrofluoroether onto a substrate on which a rinse solution has been supplied after development of the resist pattern; a hydrophobic treatment stabilizing step of stabilizing a hydrophobic treatment of the resist pattern with the supply of the treatment solution stopped and rotation of the substrate almost stopped; and a treatment solution removing step of removing the treatment solution from a top of the substrate on which the treatment solution has been supplied. The hydrophobizing agent is trimethylsilyldimethyl-amine.
    Type: Application
    Filed: August 20, 2010
    Publication date: July 19, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Yuichiro Inatomi, Mitsuaki Iwashita
  • Patent number: 8182980
    Abstract: A developing solution containing at least one of compounds represented by the formulae <1>, <2> and <3> as defined herein, and having a pH of from 2 to 10; and a method for producing a lithographic printing plate, including imagewise exposing a lithographic printing plate precursor including an image recording layer and a support to cure the image recording layer in the exposed area, and developing the exposed lithographic printing plate precursor with an aqueous solution containing at least one of the compounds represented by the formulae <1>, <2> and <3> as defined herein and having a pH of 2 to 10 are provided.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: May 22, 2012
    Assignee: FUJIFILM Corporation
    Inventor: Keiichi Adachi
  • Publication number: 20120115090
    Abstract: The present disclosure is a substrate treatment method of supplying a surface treatment liquid onto a surface of a substrate having a film with high water repellency formed thereon, the method including: a liquid puddle forming step of forming a liquid puddle of the surface treatment liquid by supplying the surface treatment liquid from a nozzle to one location of a peripheral portion of the substrate; and a liquid puddle moving step of then moving the liquid puddle formed at the peripheral portion of the substrate to a central portion of the substrate by moving the nozzle from a position above the peripheral portion of the substrate to a position above the central portion of the substrate while continuing the supply of the surface treatment liquid.
    Type: Application
    Filed: October 25, 2011
    Publication date: May 10, 2012
    Inventors: Hirofumi TAKEGUCHI, Yuichi YOSHIDA
  • Publication number: 20120115088
    Abstract: Gum solutions are formulated to develop a negative-working photopolymer imaging layer coated on an anodized aluminum substrate that has undergone a post-anodic sealing treatment with inorganic phosphate and inorganic fluoride. The gum solution contains at least one polycarboxylic acid—which may be a polymer—that beneficially desensitizes the surface after the unexposed photopolymer layer is removed.
    Type: Application
    Filed: November 10, 2010
    Publication date: May 10, 2012
    Applicant: Presstek, Inc.
    Inventors: Kevin Ray, Frederick Richard Kearney
  • Patent number: 8153357
    Abstract: A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover comprises 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further comprises an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like. It is preferably used for removal of a photosensitive composition containing a pigment.
    Type: Grant
    Filed: December 14, 2004
    Date of Patent: April 10, 2012
    Assignee: Showa Denko K.K.
    Inventors: Masato Kaneda, Yasuhiro Mikawa, Koji Shimizu, Kouichi Terao
  • Patent number: 8137896
    Abstract: A negative-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution having a pH of from about 3 to 11. The precursor has a primary polymeric binder that comprises recurring units derived from one or more N-alkoxymethyl(meth)acrylamides, provided that such recurring units are present in the primary polymeric binder in an amount of at least 10% based on the total dry primary polymeric binder weight. In addition, the primary polymeric binder is present in an amount of from about 12 to about 70% based on total imageable layer dry weight. The imaged precursor can be processed off-press or on-press.
    Type: Grant
    Filed: July 29, 2008
    Date of Patent: March 20, 2012
    Assignee: Eastman Kodak Company
    Inventors: Jayanti Patel, Paul R. West, Shashikant Saraiya, Nicki R. Miller, Frederic E. Mikell
  • Patent number: 7957582
    Abstract: Certain embodiments of the present invention provide for a system and method for modeling S-distortion in an image intensifier. In an embodiment, the method may include identifying a reference coordinate on an input screen of the image intensifier. The method also includes computing a set of charged particle velocity vectors. The method also includes computing a set of magnetic field vectors. The method also includes computing the force exerted on the charged particle in an image intensifier. Certain embodiments of the present invention include an iterative method for calibrating an image acquisition system with an analytic S-distortion model. In an embodiment, the method may include comparing the difference between the measured fiducial shadow positions and the model fiducial positions with a threshold value. If the difference is less than the threshold value, the optical distortion parameters are used for linearizing the set of acquired images.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: June 7, 2011
    Assignee: General Electric Company
    Inventors: Dun Alex Li, Joseph Casey Crager, Peter Kelley, Andrey Litvin
  • Patent number: 7858291
    Abstract: A lithographic printing plate precursor comprising: a support; an image-recording layer; and a protective layer containing an inorganic stratiform compound, provided in this order, wherein the inorganic stratiform compound contains an organic cation.
    Type: Grant
    Filed: February 27, 2006
    Date of Patent: December 28, 2010
    Assignee: Fujifilm Corporation
    Inventors: Tomoyoshi Mitsumoto, Akihiro Endo
  • Publication number: 20100203458
    Abstract: A method for developing a printing plate precursor comprising the step of immersing the precursor in an aqueous alkaline developing solution comprising a (co) polymer comprising a monomeric unit which is represented by the following formula (I): wherein L is a linking group; R1, R2 and R3 independently represent hydrogen or an alkyl group; R4 represents an optionally substituted hydroxyaryl group; x=0 or 1; y=0 or 1 and when y=0 then x=1 and L is further bound to C* to form a cyclic structure.
    Type: Application
    Filed: August 19, 2008
    Publication date: August 12, 2010
    Applicant: Agfa Graphics NV
    Inventors: Hubertus Van Aert, Pascal Meeus, Stefaan Lingier
  • Patent number: 7582407
    Abstract: Single- and multi-layer positive-working imageable elements include an ink receptive outer layer includes a primary polymeric binder that is a poly(vinyl phenol) or a phenolic polymer having certain acidic groups. The use of this type of polymeric binder makes the imaged elements developable in low pH (11 or less) alkaline developers.
    Type: Grant
    Filed: July 9, 2007
    Date of Patent: September 1, 2009
    Assignee: Eastman Kodak Company
    Inventors: Celin Savariar-Hauck, Alan S. Monk, Gerhard Hauck
  • Patent number: 7524605
    Abstract: An image-recording materials containing (A) a compound having a specific partial structure and at least one group selected from an acid group having a pKa of 11 or less, the derivative of the acid group and a group capable of generating the acid group, a lithographic printing plate precursor having an image-recording layer containing the compound (A), and a lithographic printing method using the lithographic printing plate precursor, are provided.
    Type: Grant
    Filed: April 8, 2005
    Date of Patent: April 28, 2009
    Assignee: Fujifilm Corporation
    Inventors: Ryuki Kakino, Kazuto Kunita, Hidekazu Oohashi, Yasuhito Oshima
  • Patent number: 7524615
    Abstract: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises an alkaline soluble polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 300 ?J/cm2, and then developed with an aqueous alkaline developer. Higher monomer to polymer weight ratio is advantageously used. A pigment is preferably incorporated into the photosensitive coating solution as a liquid dispersion. The exposed plate is preferably developed on a processor with an alkaline developer coupled with a replenisher having higher pH.
    Type: Grant
    Filed: January 9, 2007
    Date of Patent: April 28, 2009
    Inventor: Gary Ganghui Teng
  • Patent number: 7462437
    Abstract: A presensitized lithographic plate comprises a support and a hydrophilic image-recording layer. The hydrophilic image-recording layer contains a hydrophilic polymer and an agent capable of converting hydrophilic to hydrophobic when the agent is heated. The hydrophilic polymer comprises a main chain and branched chains. Each of the branched chain comprises a hydrophilic chain having a molecular weight in the range of 200 to 1,000,000. A hydrophilic substrate and a lithographic printing process are also disclosed.
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: December 9, 2008
    Assignee: Fujifilm Corporation
    Inventors: Satoshi Hoshi, Kazuto Shimada, Gaku Kumada
  • Patent number: 7462441
    Abstract: An object of the present invention is to provide a planographic printing plate material as well as a printing method in which excellent properties of on-press development, exposure image visualization, scratch resistance, background contamination resistance, and printing durability are exhibited. Disclosed is a planographic printing plate material possessing a hydrophilic layer and an image formation layer provided on a plastic support, wherein the image formation layer contains polyolefin wax having a melting point of 105-120° C. and a melt viscosity of 1-1200 mPa·s, the hydrophilic layer contains spherical silica particles having a particle diameter of 5.0-7.0 ?m, and a content ratio of the spherical silica particles having a particle diameter of 5.0-7.0 ?m is not less than 60% by volume, based on a total volume of particles having a particle diameter of 2-10 ?m contained in the hydrophilic layer.
    Type: Grant
    Filed: February 21, 2006
    Date of Patent: December 9, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Hidetoshi Ezure
  • Publication number: 20080292997
    Abstract: An in-liquid turn bar disposed in a developing tank is set to discharge developer from plural slit-shaped discharge openings of a first cylindrical member such that a discharge rate of the developer per 1 m of the photosensitive material turning member is from 50 to 200 l/min (litter/minute). Regulating plates protruding from a surface of the first cylindrical member are provided at both transverse ends of the first cylindrical member. The amount of the developer discharged from both transverse ends of a photosensitive web is controlled by the regulating plates, thereby adjusting a gap between the first cylindrical member and the photosensitive web. Accordingly, the gap between the photosensitive web and the in-liquid turn bar is substantially uniform in a transverse direction, and thus the photosensitive web is turned without contact with the in-liquid turn bar.
    Type: Application
    Filed: May 20, 2008
    Publication date: November 27, 2008
    Applicant: FUJIFILM CORPORATION
    Inventor: Toyomi MATSUDA
  • Patent number: 7442493
    Abstract: A printing method comprising: imagewise exposing a lithographic printing plate precursor comprising a support and an image recording layer being removable with a fountain solution or a combination of a printing ink and a fountain solution and loading the exposed lithographic printing plate precursor on a plate cylinder of a printing press, or loading the lithographic printing plate precursor on a plate cylinder of a printing press and imagewise exposing the loaded lithographic printing plate precursor, supplying at least a fountain solution comprising a compound represented by the formula (I) defined herein to the exposed lithographic printing plate precursor so as to remove an unexposed area of the image recording layer; and performing printing.
    Type: Grant
    Filed: October 6, 2005
    Date of Patent: October 28, 2008
    Assignee: Fujifilm Corporation
    Inventors: Koji Sonokawa, Kuniharu Watanabe
  • Patent number: 7427465
    Abstract: A method of on-press developing a laser sensitive lithographic printing plate with ink and/or fountain solution is described. The printing member comprises on a substrate a photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to a laser. The plate is exposed with a laser and on-press developed with ink and/or fountain solution. The exposure and development are performed with the plate under lightings that contain no or substantially no radiation below a wavelength selected from 400 to 650 nm, or in the dark or substantially dark.
    Type: Grant
    Filed: February 14, 2005
    Date of Patent: September 23, 2008
    Inventor: Gary Ganghui Teng
  • Patent number: 7425400
    Abstract: A planographic printing plate precursor, including: a substrate; a photosensitive layer containing an IR absorber, a polymerization initiator, a polymerizable compound and a binder polymer; and a protective layer containing a UV absorber, disposed in this order. The photosensitive layer exhibits reduction in solubility in an alkaline developing solution upon being exposed to light having a wavelength of 750 nm to 1400 nm.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: September 16, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Takahiro Goto
  • Patent number: 7425405
    Abstract: A method for making a lithographic printing plate is disclosed which comprises the steps of: (i) providing a negative-working, heat-sensitive lithographic printing plate precursor comprising a support having a hydrophilic surface or which is provided with a hydrophilic layer and a coating provided thereon, the coating comprising an image-recording layer which comprises hydrophobic thermoplastic polymer particles and a hydrophilic binder, wherein the hydrophobic thermoplastic polymer particles have an average particle size in the range from 45 nm to 63 nm, and wherein the amount of the hydrophobic thermoplastic polymer particles in the image-recording layer is at least 70% by weight relative to the image-recording layer; (ii) exposing the coating to heat or infrared light, thereby inducing coalescence of the thermoplastic polymer particles at exposed areas of the coating; (iii) developing the precursor by applying an aqueous alkaline solution, thereby removing non-exposed areas of the coating from the su
    Type: Grant
    Filed: June 30, 2005
    Date of Patent: September 16, 2008
    Assignee: Agfa Graphics, N.V.
    Inventors: Joan Vermeersch, Pascal Meeus
  • Publication number: 20080145801
    Abstract: Use of a combination of a trisphenol reducing agent (developer) and a substituted olefinic co-developer in photothermographic materials reduces their sensitivity to high humidity and improves processing latitude.
    Type: Application
    Filed: December 18, 2006
    Publication date: June 19, 2008
    Inventors: Chaofeng Zou, Fong Vang, Doreen C. Lynch, William D. Ramsden, Sharon M. Simpson, Kumars Sakizadeh
  • Patent number: 7370975
    Abstract: An image processing apparatus which includes: an imaging device; a reference luminance property storage device that stores a predetermined reference luminance property; a luminance property calculating device that calculates a luminance property of the imaging device from an image obtained by the imaging device; a comparing device that compares the reference luminance property and the luminance property; a displacement determining device that determines whether or not the luminance property has relative displacement with respect to the reference luminance property based on a comparison result of the comparing device; and a luminance property correcting device that corrects the luminance property, wherein, when the luminance property is determined by the displacement determining device to have relative displacement with respect to the reference luminance property, the luminance property correcting device corrects the luminance property so as to become equivalent to the reference luminance property.
    Type: Grant
    Filed: November 28, 2005
    Date of Patent: May 13, 2008
    Assignee: Honda Motor Co., Ltd.
    Inventors: Fuminori Taniguchi, Nobuharu Nagaoka
  • Patent number: 7358034
    Abstract: A method of deactivating and on-press developing an exposed lithographic printing plate is disclosed. The plate comprises on a substrate a photosensitive layer developable with ink and/or fountain solution and capable of hardening upon exposure to a radiation. The plate is exposed with the radiation, deactivated, and then on-press developed with ink and/or fountain solution. The deactivation of the exposed plate allows the handling of the plate under regular office light or any other light without causing the hardening of the non-exposed areas of the photosensitive layer.
    Type: Grant
    Filed: February 18, 2006
    Date of Patent: April 15, 2008
    Inventor: Gary Ganghui Teng
  • Patent number: 7348132
    Abstract: High speed violet or ultraviolet laser sensitive lithographic printing plate comprising on a hydrophilic substrate a specific photosensitive composition is described. The photosensitive layer comprises a polymeric binder, a multifunctional (meth)acrylate monomer, a free-radical initiator, and a sensitizing dye, with specific weight ratio of the monomer to the polymer. Combination of multifunctional urethane (meth)acrylate monomer and multifunctional non-urethane (meth)acrylate monomer can be advantageously used. The plate is imagewise exposed with a violet or ultraviolet laser at a dosage of less than 300 ?J/cm2, and then developed with an aqueous developer or with ink and/or fountain solution.
    Type: Grant
    Filed: January 21, 2006
    Date of Patent: March 25, 2008
    Inventor: Gary Ganghui Teng
  • Patent number: 7312022
    Abstract: A method of forming color image, comprising processing a silver halide color photosensitive material with a development processing solution containing a color developing agent, the silver halide color photosensitive material comprising a support and, superimposed thereon, a blue-sensitive layer unit composed of at least one silver halide emulsion layer, a green-sensitive layer unit composed of at least two silver halide emulsion layers, a red-sensitive layer unit composed of at least two silver halide emulsion layers and at least one non-light-sensitive layer, wherein the development processing solution or processing solution applied to the silver halide color photosensitive material before the use of the development processing solution contains compound (A), the compound (A) being a heterocyclic compound having three or more heteroatoms which when added, is capable of substantially enhancing the sensitivity of the silver halide color photosensitive material as compared with that exhibited when not added.
    Type: Grant
    Filed: December 2, 2004
    Date of Patent: December 25, 2007
    Assignee: FUJIFILM Corporation
    Inventors: Naoharu Kiyoto, Junichiro Hosokawa, Takanori Hioki