Developing Patents (Class 430/434)
  • Patent number: 9403974
    Abstract: A composition capable of increased impermeability against the passage of ionic liquids therethrough can include a clay mixed with an anionic and cationic polymer. Such compositions can be provided in geosynthetic liners to provide a hydraulic barrier in aggressive leachate environments.
    Type: Grant
    Filed: July 11, 2014
    Date of Patent: August 2, 2016
    Assignee: AMCOL INTERNATIONAL CORPORATION
    Inventors: Nigel Webb, Dolly Batra, Michael Donovan
  • Patent number: 9304398
    Abstract: The present invention is a developing treatment apparatus for performing development by supplying a developing solution to a substrate having a front surface coated with a positive resist or a negative resist and then subjected to exposure wherein a movable cup is raised to introduce one of scattering developing solutions for the positive and negative resists into an inner peripheral flow path of a cup and the movable cup is lowered to introduce the other of scattering developing solutions for the positive and negative resists into an outer peripheral flow path of the cup, and the developing solution introduced into the inner peripheral flow path and the developing solution introduced into the outer peripheral flow path are separately drained.
    Type: Grant
    Filed: September 10, 2013
    Date of Patent: April 5, 2016
    Assignee: Tokyo Electron Limited
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Yoshinori Ikeda, Koki Yoshimura, Yoshiki Okamoto, Masahiro Fukuda
  • Patent number: 9250530
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: November 20, 2014
    Date of Patent: February 2, 2016
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 9145497
    Abstract: A colorant-containing particle that comprises a colorant and a polymer represented by (A1-R2)n—R1—(R3—P1)m wherein R1 is organic linking group; R2 is single bond or divalent linking group; A1 is monovalent organic group containing organic dye residue etc., m is 1 to 8, n is 2 to 9, m+n is 3 to 10; R3 is single bond or divalent linking group; P1 is polymer backbone containing Si, has excellent dispersibility and dispersion stability.
    Type: Grant
    Filed: February 7, 2014
    Date of Patent: September 29, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Toshihide Aoshima, Takashi Katoh, Hidenori Takahashi
  • Patent number: 9034559
    Abstract: A pattern-forming method includes providing a resist film on a substrate using a radiation-sensitive composition. The resist film is exposed. The exposed resist film is developed using a developer solution. The developer solution includes no less than 80% by mass of an organic solvent. The radiation-sensitive composition includes at least two components including a first polymer and a radiation-sensitive acid generator. The first polymer includes a structural unit having an acid-labile group. One or more components of the radiation-sensitive composition have a group represented by a formula (1). A? represents —N?—SO2—RD, —COO?, —O? or —SO3?. —SO3? does not directly bond to a carbon atom having a fluorine atom. RD represents a linear or branched monovalent hydrocarbon group, or the like. X+ represents an onium cation.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: May 19, 2015
    Assignee: JSR CORPORATION
    Inventors: Hirokazu Sakakibara, Masafumi Hori, Taiichi Furukawa, Koji Ito
  • Patent number: 9005884
    Abstract: A developer composition for a printing plate containing (a) alkali metal salt of saturated fatty acid having carbon number of 12 to 18 and (b) alkali metal salt of unsaturated fatty acid having carbon number of 12 to 18 in a weight ratio of from 20:80 to 80:20 in terms of (a):(b). The developer composition may further contain an alkali agent (c). In this case, a weight ratio of (a):(b) may be from 20:80 to 80:20, and the alkali agent (c) may be contained in amount of 0.01 to 10 part(s) by weight to 100 parts by weight in total of the components (a) and (b).
    Type: Grant
    Filed: December 26, 2011
    Date of Patent: April 14, 2015
    Assignee: Toyobo Co., Ltd.
    Inventors: Yukimi Yawata, Daiki Yoshioka
  • Patent number: 8986918
    Abstract: The present invention relates to a hybrid photoresist composition for improved resolution and a pattern forming method using the photoresist composition. The photoresist composition includes a radiation sensitive acid generator, a crosslinking agent and a polymer having a hydrophobic monomer unit and a hydrophilic monomer unit containing a hydroxyl group. At least some of the hydroxyl groups are protected with an acid labile moiety having a low activation energy. The photoresist is capable of producing a hybrid response to a single exposure. The patterning forming method utilizes the hybrid response to form a patterned structure in the photoresist layer. The photoresist composition and the pattern forming method of the present invention are useful for printing small features with precise image control, particularly spaces of small dimensions.
    Type: Grant
    Filed: November 15, 2013
    Date of Patent: March 24, 2015
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Kuang-Jung Chen, Steven J. Holmes, Wu-Song Huang, Sen Liu
  • Publication number: 20150050602
    Abstract: An optimal development method and an apparatus of a resist formed on a half-inch size wafer. The development method is a development method of a resist formed on a wafer with a wafer size for manufacturing a number of minimized units of semiconductor devices. The method includes a first step, a second step, a third step, and a fourth step. The first step drops developer until a thickness of developer becomes maximum on the wafer whose rotation is stopped. The second step performs development while rotating the wafer. The third step supplies the developer about a half of the amount of developer of the first step on the wafer whose rotation is stopped. The fourth step performs development at a development period longer than the second step while rotating the wafer.
    Type: Application
    Filed: October 3, 2012
    Publication date: February 19, 2015
    Applicant: National Institute of Advanced Industrial Science and Technology
    Inventors: Sommawan Khumpuang, Shiro Hara
  • Patent number: 8956694
    Abstract: A pretreatment process, carried out prior to a developing process, spouts pure water, namely, a diffusion-assisting liquid for assisting the spread of a developer over the surface of a wafer, through a cleaning liquid spouting nozzle onto a central part of the wafer to form a puddle of pure water. The developer is spouted onto the central part of the wafer for prewetting while the wafer is rotated at a high rotating speed to spread the developer over the surface of the wafer. The developer dissolves the resist film partly and produces a solution. The rotation of the wafer is reversed, for example, within 7 s in which the solution is being produced to reduce the water-repellency of the wafer by spreading the solution over the entire surface of the wafer. Then, the developer is spouted onto the rotating wafer to spread the developer on the surface of the wafer.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: February 17, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Takeguchi, Tomohiro Iseki, Yuichi Yoshida, Kousuke Yoshihara
  • Patent number: 8956695
    Abstract: A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: February 17, 2015
    Assignee: SCREEN Semiconductor Solutions Co., Ltd.
    Inventors: Masahiko Harumoto, Akira Yamaguchi, Akihiro Hisai, Minoru Sugiyama, Takuya Kuroda
  • Patent number: 8951718
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: August 17, 2012
    Date of Patent: February 10, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Publication number: 20150036110
    Abstract: A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism for moving the turning flow generation mechanism along a surface of the substrate. The line-width uniformity of a pattern can be improved by forming turning flows in a desired region of the substrate and stirring the developer.
    Type: Application
    Filed: August 4, 2014
    Publication date: February 5, 2015
    Inventors: Kousuke YOSHIHARA, Hideharu KYOUDA, Koshi MUTA, Taro YAMAMOTO, Yasushi TAKIGUCHI
  • Publication number: 20150036109
    Abstract: A developing method includes: horizontally holding an exposed substrate by a substrate holder; forming a liquid puddle on a part of the substrate, by supplying a developer from a developer nozzle; rotating the substrate; spreading the liquid puddle on a whole surface of the substrate, by moving the developer nozzle such that a supply position of the developer on the rotating substrate is moved in a radial direction of the substrate; bringing, simultaneously with the spreading of the liquid puddle on the whole surface of the substrate, a contact part into contact with the liquid puddle, the contact part being configured to be moved together with the developer nozzle and having a surface opposed to the substrate which is smaller than the surface of the substrate. According to this method, an amount of liquid falling down to the outside of the substrate can be inhibited. In addition, since the rotating speed of the substrate can be decreased, spattering of the developer can be inhibited.
    Type: Application
    Filed: August 1, 2014
    Publication date: February 5, 2015
    Inventors: Kousuke YOSHIHARA, Hideharu KYOUDA, Koshi MUTA, Taro YAMAMOTO, Yasushi TAKIGUCHI, Masahiro FUKUDA
  • Patent number: 8921035
    Abstract: A polymer washout solvent for developing a flexographic printing plate comprising: —an ester hydrocarbon component, —an ether hydrocarbon component, —an alcoholic hydrocarbon component. The washout solvent of the invention has less hazardous properties than the known solvents. Use of a polymer washout solvent for developing a flexographic printing plate in a washing step.
    Type: Grant
    Filed: June 8, 2010
    Date of Patent: December 30, 2014
    Assignee: Flexoclean Engineering B.V.
    Inventor: Figen Aydogan
  • Patent number: 8920689
    Abstract: A photosensitive resin composition for a color filter includes (A) a dye polymer composite including a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as described in the detailed description, (B) an acrylic-based photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a solvent, and a color filter using the same.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: December 30, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Taek-Jin Baek, Seong-Ryong Nam, Won-A Noh, Chang-Min Lee, Sang-Won Cho, Gyu-Seok Han
  • Patent number: 8921031
    Abstract: Provided are photoresist overcoat compositions, substrates coated with the overcoat compositions and methods of forming electronic devices by a negative tone development process. The compositions, coated substrates and methods find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: September 9, 2012
    Date of Patent: December 30, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Rosemary Bell, Jong Keun Park, Seung-Hyun Lee
  • Publication number: 20140377709
    Abstract: A method for manufacturing a semiconductor device of the present invention includes steps of (a) preparing a silicon carbide substrate including a photoresist film formed on a principal surface, (b) dropping a first developing solution onto the photoresist film, (c) rotating the silicon carbide substrate to drain the first developing solution dropped onto the photoresist film after a lapse of a first development time since the end of the step (b), (d) dropping a second developing solution onto the photoresist film after the step (c), and (e) rotating the silicon carbide substrate to drain the second developing solution dropped onto the photoresist film after a lapse of a second development time since the end of the step (d).
    Type: Application
    Filed: April 2, 2014
    Publication date: December 25, 2014
    Applicant: Mitsubishi Electric Corporation
    Inventors: Hideaki YUKI, Sunao AYA, Shozo SHIKAMA
  • Patent number: 8911647
    Abstract: Disclosed is a photosensitive resin composition for a color filter including (A) a dye-polymer composite wherein the dye includes a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent.
    Type: Grant
    Filed: October 30, 2013
    Date of Patent: December 16, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Sang-Won Cho, Won-A Noh, Soo-Young Heo, Han-Chul Hwang, Gyu-Seok Han
  • Patent number: 8906271
    Abstract: Disclosed is a photosensitive resin composition for a color filter and a color filter using the same. The photosensitive resin composition for a color filter includes (A) a dye-polymer composite including a structural unit derived from the compound represented by the following Chemical Formula 1, wherein each substituent is the same as defined in the detailed description; (B) an acryl-based photopolymerizable monomer; (C) a photopolymerization initiator; and (D) a solvent.
    Type: Grant
    Filed: October 16, 2012
    Date of Patent: December 9, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Yeon-Soo Lee, Seong-Ryong Nam, Taek-Jin Baek, Sang-Won Cho, Jae-Hyun Kim, Chang-Min Lee, Gyu-Seok Han
  • Patent number: 8883396
    Abstract: A resist composition containing a base component (A) which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, wherein the base component (A) contains a copolymer (A1) having a structural unit (a0) containing a group represented by the following general formula (a0-1) or (a0-2), a structural unit (a11) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a polycyclic group, and a structural unit (a12) containing an acid-decomposable group which exhibits increased polarity by the action of acid and contains a monocyclic group. Each of the groups —R3—S+(R4)(R5) and Mm+ in the formula has only one aromatic ring as a whole or has no aromatic ring.
    Type: Grant
    Filed: October 31, 2012
    Date of Patent: November 11, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Masahito Yahagi, Jun Iwashita
  • Patent number: 8865396
    Abstract: A developing method including a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the developer being supplied from a first nozzle that is located on a position near a central part of the surface of the rotating wafer, a deionized water as a second liquid is supplied from a second nozzle that is located on a position nearer to an outer peripheral part of the wafer than the first nozzle, to thereby spread out the developer in the rotating direction of the wafer by a wall that is formed by the deionized water flowing to the outer peripheral side of the wafer with the rotation of the wafer.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: October 21, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Takeguchi, Taro Yamamoto, Kousuke Yoshihara
  • Patent number: 8846299
    Abstract: A lithographic processing solution has a pH of less than 12 and comprises at least 0.001 and up to and including 1 weight % of a water-soluble or water-dispersible, non-IR-sensitive compound that has a heterocyclic moiety with a quaternary nitrogen in the 1-position of the heterocyclic ring, and has one or more electron donating substituents attached to the heterocyclic ring, at least one of which electron donating substituents is attached in the 2-position. This processing solution can be used to develop both single-layer and multi-layer positive-working lithographic printing plate precursors that have been imaged using infrared radiation.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: September 30, 2014
    Assignee: Eastman Kodak Company
    Inventors: Celin Savariar-Hauck, Gerhard Hauck, Moshe Nakash
  • Patent number: 8846300
    Abstract: To provide a developer for processing of a lithographic printing plate precursor, containing a non-reducing sugar having bonded therein two or more monosaccharides and having a pH of 6 to 14 and thereby provide a developer having a pH stable to aging and an excellent film-forming property, a method for manufacturing a lithographic printing plate, where a lithographic printing plate excellent in developability and dispersibility of development scum and kept from staining of the non-image area can be manufactured even by simple processing of one solution and one step requiring no water washing step, a developer used therefor, and a printing method of performing printing by using the manufacturing method of a lithographic printing plate.
    Type: Grant
    Filed: March 31, 2011
    Date of Patent: September 30, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Takashi Sato, Toshifumi Inno
  • Patent number: 8835098
    Abstract: Provided is a pattern forming method making it possible to obtain a pattern with less scums and watermark defects. The pattern forming method includes the steps of forming a film from an actinic-ray- or radiation-sensitive resin composition includes a resin (A) that exhibits an increased solubility in an alkali developer when acted on by an acid, a compound (B) that generates an acid when exposed to actinic rays or radiation, and a resin (C) containing at least one of a fluorine atom and a silicon atom, exposing the film to light, and developing the exposed film using a tetramethylammonium hydroxide solution whose concentration is less than 2.38 mass %.
    Type: Grant
    Filed: September 4, 2012
    Date of Patent: September 16, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Toshiaki Fukuhara
  • Patent number: 8815493
    Abstract: A resist pattern-forming method includes coating a radiation-sensitive resin composition on a substrate to provide a resist film. The resist film is exposed. The exposed resist film is developed with a developer solution including no less than 80% by mass of an organic solvent. The radiation-sensitive resin composition includes a base polymer, a fluorine-atom-containing polymer, a radiation-sensitive acid generator, a solvent, and a compound. The base polymer has an acid-labile group. The fluorine-atom-containing polymer has a content of fluorine atoms higher than a content of fluorine atoms of the base polymer. The compound has a relative permittivity greater than a relative permittivity of the solvent by at least 15. A content of the compound is no less than 10 parts by mass and no greater than 200 parts by mass with respect to 100 parts by mass of the base polymer.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: August 26, 2014
    Assignee: JSR Corporation
    Inventors: Koji Ito, Hirokazu Sakakibara, Masafumi Hori, Taiichi Furukawa
  • Patent number: 8808976
    Abstract: A photoresist developer including a basic aqueous solution containing 0.5˜10 mass % of a particular nonionic surfactant and 0.01-10 mass % of particular ammonium compound, the photoresist developer makes it possible to form a favorable resist pattern with out causing scum even when developing thick photoresists.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: August 19, 2014
    Assignee: Tokuyama Corporation
    Inventors: Shunkichi Omae, Seiji Tono, Toshiaki Otani, Yasutaka Natsuka
  • Patent number: 8790868
    Abstract: A method of forming a resist pattern, the method including: forming a resist film on a substrate using a resist composition containing a base component (A) that exhibits reduced solubility in an organic solvent under the action of acid, an acid generator component (B) that generates acid upon exposure and a fluorine-containing polymeric compound (F), exposing the resist film, and patterning the resist film by negative tone development using a developing solution containing the organic solvent, thereby forming a resist pattern, wherein the base component (A) contains a resin component (A1) containing a structural unit (a1) derived from an acrylate ester, the dissolution rates of (A1) and (F) in the developing solution are each at least 10 nm/s, and the absolute value of the difference in the dissolution rates of (A1) and (F) in the developing solution is not more than 80 nm/s.
    Type: Grant
    Filed: April 26, 2012
    Date of Patent: July 29, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hiroaki Shimizu, Hideto Nito
  • Patent number: 8771920
    Abstract: A lithographic printing plate precursor in a positive-type with an infrared-sensitivity, having a support and an image recording layer provided on the support, the support having a hydrophilic surface, the recording layer having a particular resin, an amphoteric surfactant and/or an anionic surfactant, and an infrared absorbing agent, wherein the particular resin being at least one of resins selected from the group consisting of a polyurethane resin, a poly (vinyl acetal) resin, and maleimide resin A.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: July 8, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Shigekatsu Fujii, Norio Aoshima, Yoshinori Taguchi, Yoichiro Ara, Takashi Aridomi
  • Patent number: 8771925
    Abstract: A processing solution is used to provide flexographic relief printing plates. This solution includes diisopropylbenzene, and one or more organic co-solvents, at least one of which is an aliphatic dibasic acid ester. The processing solution may also include one or more alcohols as co-solvents.
    Type: Grant
    Filed: August 25, 2009
    Date of Patent: July 8, 2014
    Assignee: Eastman Kodak Company
    Inventors: Elsie A. Fohrenkamm, M. Zaki Ali, Michael B. Heller
  • Patent number: 8652759
    Abstract: A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer which comprises (m1) primary, secondary and/or tertiary amino groups, and (m2) acid groups selected from —COOH, —SO3H, —PO2H and —PO3H2, and (m3) optionally alkylene oxide units —(CHR1—CH2—O)p—, wherein R1 is H or —CH3 and p is an integer from 1 to 50.
    Type: Grant
    Filed: August 21, 2008
    Date of Patent: February 18, 2014
    Assignee: Eastman Kodak Company
    Inventors: Bernd Strehmel, Christopher D. Simpson, Oliver Plestert, Harald Baumann
  • Patent number: 8637223
    Abstract: Negative-Working Lithographic Printing Plate Precursors can be provided with desired contrast coloration after imaging using a coloring fluid that includes a water-insoluble colorant that is soluble in a water-insoluble fatty alcohol. The coloring fluid provides an optical density change in the exposed regions of at least OD2 that is greater than the original optical density of those regions, OD1. The coloring fluid can be applied immediately after imaging and before processing, or it can be applied as part of the developer or processing solution, or it can be applied after processing. The coloring fluid can also be applied to imaged precursors that are designed for either off-press or on-press development.
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: January 28, 2014
    Assignee: Eastman Kodak Company
    Inventors: Murray Figov, Moshe Marom, Ilan Levi
  • Patent number: 8637229
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: January 28, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8632960
    Abstract: A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure of the resist film, and patterning the resist film by a negative tone development using a developing solution containing an organic solvent, wherein the base component (A) includes a resin component (A1) containing a structural unit (a0) derived from an acrylate ester containing an acid decomposable group which generates an alcoholic hydroxy group by the action of acid to thereby exhibit increased hydrophilicity.
    Type: Grant
    Filed: February 16, 2011
    Date of Patent: January 21, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tomoyuki Hirano, Takahiro Dazai, Daiju Shiono, Sho Abe
  • Patent number: 8632953
    Abstract: A process for making a lithographic printing plate, comprising: an exposure step of imagewise exposing a lithographic printing plate precursor that comprises, above a hydrophilic support, a photosensitive layer comprising (A) a compound that generates a radical upon the application of light or heat, (B) a polymer having an aromatic carboxy group in a side chain, (C) a polymerizable compound, and (D) an infrared absorber; and a development processing step using one type of processing liquid, wherein the processing liquid has a pH of 8.5 to 10.8.
    Type: Grant
    Filed: September 23, 2009
    Date of Patent: January 21, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Keisuke Arimura
  • Patent number: 8628911
    Abstract: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: January 14, 2014
    Assignees: Rohm and Haas Electronic Materials LLC, Dow Global Technologies LLC
    Inventors: Young Cheol Bae, David Richard Wilson, Jibin Sun
  • Patent number: 8617794
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
    Type: Grant
    Filed: October 27, 2011
    Date of Patent: December 31, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Publication number: 20130266898
    Abstract: Transparent conductive films, articles made from them, and methods of making them are disclosed. Some transparent conductive films include flexible glass substrates and conductive layers containing metal nanoparticles. Others include at least one layer with cell walls that contain metal nanorods or conductive nanowires. Still others include a substrate with a coating disposed on it, with the coating including conductive components and photopolymers. Such films are useful in such articles as electronic displays, touch screens, and the like.
    Type: Application
    Filed: June 3, 2013
    Publication date: October 10, 2013
    Inventor: David R. Whitcomb
  • Patent number: 8530143
    Abstract: A silicate-free alkaline aqueous developer composition has a pH of at least 12 and comprises a metal cation M2+ selected from barium, calcium, strontium, and zinc cations, and a chelating agent that has a complex formation constant (log K) for the metal cation of at least 3.5 and less than or equal to 4.5, and a log K for aluminum ion that is 7 or less. This developer composition can be used to process positive-working lithographic printing plate precursors to provide lithographic printing plates.
    Type: Grant
    Filed: November 18, 2010
    Date of Patent: September 10, 2013
    Assignee: Eastman Kodak Company
    Inventors: Moshe Levanon, Leonid Askadsky
  • Patent number: 8530148
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: June 24, 2008
    Date of Patent: September 10, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8507193
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: June 24, 2008
    Date of Patent: August 13, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8507181
    Abstract: A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound copolymerizable with the free radical polymerizable group of (i) and comprising at least one functional group with pKs<5.
    Type: Grant
    Filed: September 18, 2007
    Date of Patent: August 13, 2013
    Inventors: Christopher D. Simpson, Bernd Strehmel, Harald Baumann, Ulrich Fiebag, Mathias Jarek
  • Patent number: 8507194
    Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: August 13, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Hideaki Tsubaki, Shinichi Kanna
  • Patent number: 8445189
    Abstract: The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.
    Type: Grant
    Filed: February 10, 2011
    Date of Patent: May 21, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Taro Yamamoto, Kousuke Yoshihara, Hideharu Kyouda, Hirofumi Takeguchi, Atsushi Ookouchi
  • Patent number: 8445180
    Abstract: Disclosed is a method for producing a water-developable photopolymer plate for letterpress printing comprising an exposure step, a development step and a post-exposure step wherein the photopolymer plate is brought into contact with a liquid containing a modified silicone compound and/or a fluorine compound during or after the exposure step.
    Type: Grant
    Filed: December 21, 2004
    Date of Patent: May 21, 2013
    Assignee: Asahi Kasei Chemicals Corporation
    Inventors: Naoyuki Onoda, Katsuhiro Takahashi
  • Patent number: 8440386
    Abstract: A pattern is formed by applying a resist composition comprising a polymer comprising recurring units having an acid labile group-substituted hydroxyl group, an acid generator, and an organic solvent onto a substrate, prebaking the composition to form a resist film, exposing the resist film to high-energy radiation to define exposed and unexposed regions, baking, and developing the exposed film with an organic solvent developer to form a negative pattern wherein the unexposed region of film is dissolved and the exposed region of film is not dissolved.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: May 14, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Takeshi Nagata, Koji Hasegawa
  • Publication number: 20130108969
    Abstract: The invention pertains to a method and apparatus for preparing a printing form from a precursor, particularly a method and apparatus for preparing the printing form by thermally treating a photosensitive precursor having a photopolymerizable layer. The method and apparatus includes heating the photosensitive precursor to a temperature sufficient to cause a portion of the layer to liquefy, contacting the precursor with a development medium to remove the liquefied material, and supporting a development medium with a core member adjacent an exterior surface of the photosensitive precursor, wherein a compressible collar of a closed-cell foam having a Poisson's ratio of less than 0.4 is disposed between the core member and the development medium.
    Type: Application
    Filed: October 31, 2012
    Publication date: May 2, 2013
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventor: E I DU PONT DE NEMOURS AND COMPANY
  • Patent number: 8431333
    Abstract: A photosensitive composition remover used for removal of an uncured photosensitive composition, which remover includes 1 to 80 percent by mass of at least one type of aromatic hydrocarbon having 9 carbon atoms or more within the molecule. The photosensitive composition remover further includes an aprotic polar solvent and/or another solvent other than aprotic polar solvents. The photosensitive composition remover is effective for removal of an uncured photosensitive composition film deposited at the periphery, edges, or back of a substrate or removal of an uncured photosensitive composition deposited at the surface of system members or equipment in a process for forming a photosensitive composition film on a glass substrate, a semiconductor wafer, or the like.
    Type: Grant
    Filed: September 23, 2011
    Date of Patent: April 30, 2013
    Assignee: Showa Denko K.K.
    Inventors: Masato Kaneda, Yasuhiro Mikawa, Koji Shimizu, Kouichi Terao
  • Patent number: 8415092
    Abstract: According to the present invention, an anti-reflective film formed under a resist film is removed in a photolithography process of a wafer without affecting the resist film. According to the present invention, in a photolithography process of a substrate, an anti-reflective film having solubility in the developing solution is formed and thereafter a resist film is formed. In development treatment after exposure processing, a developing solution is supplied to the substrate to develop the resist film. At an instant when the development of the resist film is finished, a second developing solution lower in concentration than the developing solution is supplied to the substrate. Only the anti-reflective film is dissolved and removed by the supply of the second developing solution.
    Type: Grant
    Filed: October 5, 2010
    Date of Patent: April 9, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Momoko Shizukuishi, Hidetami Yaegashi
  • Publication number: 20130059241
    Abstract: According to one embodiment, a monitor pattern is previously exposed together with a device pattern on a resist film, the monitor pattern is developed in a first development condition and a fault occurrence risk is quantified based on a check image. At this time, the range of a second development condition in which the number of faults becomes less than or equal to a permissible value with respect to the quantified fault occurrence risk is determined based on the relationship between fault occurrence risk information and the number of faults. Then, a third development condition in which the pattern dimension becomes a desired value in the second development condition is determined and the device pattern is developed in the thus determined third development condition.
    Type: Application
    Filed: August 14, 2012
    Publication date: March 7, 2013
    Inventors: Hideaki SAKURAI, Masatoshi Terayama
  • Publication number: 20130057618
    Abstract: Provided is a method of manufacturing a liquid ejection head, including: forming a covering resin layer including a photocationic polymerization initiator and a cationically polymerizable resin on a substrate having provided thereon an energy generating element for generating energy for ejecting liquid and a solid layer which is formed of a positive resist and serves as a pattern for a liquid flow path which communicates with a liquid ejection orifice for ejecting the liquid; exposing the covering resin layer to development to form the liquid ejection orifice; and removing the solid layer to form the liquid flow path, in which the covering resin layer includes, as a cationic polymerization inhibitor, an amine compound having a perfluoroalkyl group. Also provided is a liquid ejection head obtained by the method.
    Type: Application
    Filed: August 20, 2012
    Publication date: March 7, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Kazunari Ishizuka