Abstract: A method is described to provide a radiographic silver halide material by coating on at least one side of a support, covered with a hydrophobic subbing layer comprising as a latex copolymer vinylidene chloride, methylacrylate and itaconic acid, following hydrophilic layers: at least one gelatinous dye containing layer comprising one or more dyes, at least one silver halide emulsion layer, at least one protective antistress layer, and optionally an afterlayer, characterized in that said hydrophilic layers have a swelling ratio of not more than 200% and in that said hydrophilic layers are coated simultaneously by the slide-hopper coating or by the slide-hopper curtain coating technique.

Abstract: A new type of yellow dyes with general formula Q--CO--CO--X is disclosed. They can be used in photographic materials as antihalation dyes, acutance dyes or filter dyes. Preferably they are incorporated in UV sensitive contact materials for pre-press applications.

Abstract: A photographic film that is especially useful as a motion picture print film is comprised of a support having, in order, on one side thereof an antihalation undercoat and at least one silver halide emulsion layer and having, in order, on the opposite side thereof an antistatic layer and a protective topcoat; wherein the protective topcoat is comprised of a polyurethane binder and a lubricant and the polyurethane binder has a tensile elongation to break of at least 50% and a Young's modulus measured at 2% elongation of at least 50000 lb/in.sup.2. The polyurethane binder provides a tough but flexible protective topcoat that is capable of resisting abrasion and scratching when the film is conveyed through a projector and capable of standing up to the repeated use to which motion picture print films are typically subjected.

Abstract: A process for production of a micropattern, comprised of a step for forming an antireflection film comprised of an inorganic film on an underlying substrate, a step for forming a resist film on said antireflection film, a step for exposing said resist film using i-rays or light of a wavelength shorter than i-ray and transferring a mask pattern to the resist film, a step for using the resist film on which the mask pattern had been transferred as a mask to etch the antireflection film and transfer the mask pattern to the antireflection film; and a step for using the antireflection film on which said mask pattern had been transferred as a mask to etch the underlying substrate and transfer the mask pattern to the underlying substrate.

Abstract: The invention provides a photographic element comprising a polyester support bearing a light-sensitive silver halide photographic emulsion layer, the support having adjacent thereto a polymer-containing subbing layer, the subbing layer having adjacent thereto a layer comprising a hydrophilic binder containing dispersed droplets of a high boiling hydrophobic organic liquid, said liquid having a logarithm of its octanol/water partition coefficient (log P) value greater than 7.7. The invention also includes a process for preparing a photographic element of the invention and a process for forming an image in an element of the invention. The invention further includes a photographic element comprising a polyester support bearing a hydrophilic layer containing an antihalation agent, such as elemental silver, with or without an intervening subbing layer.

Abstract: A silver halide color photographic material having photographic constituent layers on a support, said photographic constituent layers comprising at least 3 kinds of silver halide emulsion layers different in color sensitivity and each containing a coupler producing a yellow color, a magenta color, or a cyan color and at least one light-insensitive layer, in which a silver halide emulsion contained in at least one layer of said photographic constituent layers comprises silver chloride grains or silver chlorobromide grains having a silver chloride content of 90 mol % or more sensitized by at least one compound selected from the group consisting of a gold compound, a selenium compound and a tellurium compound and at least one layer of said photographic constituent layers contains a pentamethineoxonol dye containing a substituent group at the methine chain, whereby the silver halide color photographic material exhibits excellently rapid processing performance, high purity whiteness in the white background of a fi

Abstract: High-contrast room-light-handleable contact-exposed ultraviolet-sensitive black-and-white silver halide photographic elements useful in the field of graphic arts are provided with an electrically-conductive layer which serves to provide antistatic protection. The electrically-conductive layer is comprised of electrically-conductive metal-containing particles, such as particles of antimony-doped tin oxide, a film-forming polymer, such as gelatin, and an ultraviolet-absorber, such as a solid particle filter dye, in an amount sufficient to provide halation protection.

Abstract: Heat bleachable elements have antihalation layers composed of metallized or unmetallized formazan dyes, hexaarylbiimidzoles having alkoxy substituents and film forming binders that soften upon heating. These layers are rapidly bleached at relatively low temperatures. Polymeric acidic layers adjacent the antihalation layers provide an acidic component that increases bleaching rates when the acidic layer is also softened during processing.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.

Abstract: There is provided a laser interference fringe-free photographic material which comprises a support and a near infrared-sensitive emulsion layer provided on one side of said support, wherein said emulsion layer has an absorbance of not more than 0.5 at a wavelength of near infrared laser used for exposure, and the total of the photographic material present on said emulsion layer side of said support has an absorbance of not less than 1.0 at the wavelength of the laser used for exposure.

Abstract: A method for fabricating a semiconductor device, including the steps of: coating an anti-reflective film over a lower layer to be patterned; coating a first photoresist film over the anti-reflective film and subjecting the first photoresist film to a light exposure process using a mask and a development process, thereby forming a first photoresist film pattern having a dimension slightly larger than a desired pattern dimension; etching an exposed portion of the anti-reflective film, thereby forming an anti-reflective film pattern; removing the first photoresist film pattern and coating a second photoresist film over the entire exposed surface of the resulting structure obtained after the removal of the first photoresist film pattern; subjecting the second photoresist film to a light exposure process using the mask and a development, thereby forming a second photoresist film pattern having the desired pattern dimension; and etching an exposed portion of the anti-reflective film pattern and then etching the low

Abstract: Reduction of reflection from an integrated circuit substrate during exposure of a photoresist layer on a surface such as an integrated circuit wafer is minimized by incorporating an antireflective coating between the photoresist layer and the integrated circuit substrate. The antireflective layer, after exposure and development of the photoresist layer, is preferably removed by exposing the non-masked antireflective layer to activating radiation while heating the coating to induce a solubilizing reaction in an antireflective coating and a curing reaction in an overlying photoresist mask. Thereafter, the exposed portions of the antireflective layer are removed by treatment with a suitable developer.

Abstract: A photofinishing system and method of photofinishing. The system includes a film cartridge having a strip of photosensitive film contained therein. The strip of photosensitive film comprising a support web having a back side and a front side, an emulsion layer provided on the back side of the strip of photosensitive film, and a filter array on the front side of the strip of photosensitive material of film. The system further includes a developing apparatus for developing exposed images on the strip of photosensitive film provided in the film cartridge. The developing apparatus includes holding chamber for holding and retaining the thrust film cartridge; a removal mechanism for removing the strip of film out of the cartridge; an application mechanism for applying an activator solution on the strip of photosensitive film after the film has been removed out of the film cartridge.

Abstract: An image forming method is disclosed, comprising exposing a silver halide photographic material through a transparent, high definition-screening original and developing the photographic material with a developer to form a halftone dot image, wherein:the photographic material forms a halftone dot image having a dot area of 57% or less when exposed, through the transparent original comprising a halftone dot image having a dot area of 50%, in two times an amount that gives a halftone dot having a dot area of 50%; and the photographic material has a maximum density of 3.0 or more and a contrast of 8.0 or more;and wherein the photographic material is exposed to light having an emission peak at a wavelength of 360 to 450 nm and developed with a developer having a pH of 10.5 or less.

Abstract: This invention provides a color silver halide photographic element comprising a support having situated thereon a red light-sensitive, cyan dye-forming unit comprising a photosensitive silver halide emulsion layer and an image dye-forming coupler; a green light-sensitive, magenta dye-forming unit comprising a photosensitive silver halide emulsion layer and an image dye-forming coupler; and a blue light-sensitive, yellow dye-forming unit comprising a photosensitive silver halide emulsion layer and an image dye-forming coupler; wherein at least one of the dye-forming units comprises two or more emulsion layers spectrally sensitized to the same region of the visible spectrum, but exhibiting different photographic sensitivities, each such emulsion layer containing an image dye-forming coupler wherein at least one, but not all, of the emulsion layers of the dye-forming unit contains the hydrolyzed or unhydrolyzed form of a benzazolium compound represented by formula (I): ##STR1##

Abstract: A photographic element comprises a polyester support bearing a light-sensitive silver halide photographic emulsion layer, the support having adjacent thereto a polymer-containing subbing layer, the subbing layer having adjacent thereto a layer comprising a hydrophilic binder containing dispersed droplets of a high boiling organic liquid, the liquid being selected form the group consisting of oleyl alcohol and esters of organic or inorganic acids which have a value for the logarithm of their octanol/water partition coefficient (Log P) of from 2.6 to 6.7.

Abstract: A silver halide color photographic material can be formed which exhibits good storage stability and provides excellent sharpness and superior color reproducibility by incorporating therein a dye comprising an indole moiety having a methyl group substituted by an electron-withdrawing group at the 1-position and an acidic nucleus which are connected together via a methine chain. The dye is typically provided in a light-insensitive layer in the form of a solid dispersion. Specific embodiments include the combination of the indole-containing dye with a magenta dye, fogged silver halide grains, a DIR compound or a mercaptoheterocyclic compound.

Abstract: A photographic element, is disclosed which includes a support and at least three silver halide emulsion layers, that records exposure information. The exposure information is recorded in three image-recording units and wherein the spectral sensitivities of said image-recording units are chosen such that the average color error, .DELTA.E*.sub.ab, is less than or equal to 3.1. .DELTA.E*.sub.ab is computed for a specified set of test colors of known spectral reflectance, and the light source is specified as D.sub.65. .DELTA.E*.sub.ab is the average CIE 1976 (L*a*b*) .DELTA.E*.sub.ab between the CIE 1976 (L*a*b*)-space coordinates of said test colors and the CIE 1976 (L*a*b*)-space coordinates corresponding to transformed exposure signals.

Abstract: A co-polymer of benzophenone and bisphenol A has been shown to have DUV absorption properties. Therefore, the co-polymer has particular utility as an antireflective coating in microlithography applications. Incorporating anthracene into the co-polymer backbone enhances absorption at 248 nm. The endcapper used for the co-polymer can vary widely depending on the needs of the user and can be selected to promote adhesion, stability, and absorption of different wavelengths.

Abstract: The invention discloses that a photograph with a 3-dimensional image results when the non-angular reflector (of mercury) used in the Lippmann process of color photography is replaced by an angular reflector; the preferred form of the angular reflector is a retro-reflector.A photographic system is described which produces photographs with 3-dimensional images. The photo-sensitive element records the interference patterns of light waves, and the system is an improvement over the Lippmann process of color photography which produces photographs with 2-dimensional images. A photographic system is also described that produces a photograph with a 3-dimensional image from 2-dimensional cross sections of a subject; the system is useful in medical imaging. During exposure, motion of more than one wavelength of light is permissible between the subject and lens or the lens and the photo-sensitive element.These improvements result from the use of a particular type of angular reflector which is a retro-reflecting sheet.

Abstract: Changing (varying, irregular) resist thickness on semiconductor wafers having irregular top surface topography or having different island sizes, affects the percent reflectance (and absorption efficiency) of incident photolithographic light, and consequently the critical dimensions of underlying features being formed (e.g., polysilicon gates). A low solvent content resist solution that can be applied as an aerosol provides a more uniform thickness resist film, eliminating or diminishing photoresist thickness variations. A top antireflective coating (TAR) also aids in uniformizing reflectance, despite resist thickness variations. The two techniques can be used alone, or together. Hence, better control over underlying gate size can be effected, without differential biasing.

Abstract: Loaded latex dispersions of hydrophobic photographically useful compounds with a wide variety of polymer latices are prepared by preparing an oil phase solution of the hydrophobic compound or compounds, preferably essentially free of water-miscible or volatile solvent, combining the oil solution with one or more aqueous solutions, at least one of which contains a polymer latex, and mixing the combination of oil solution, aqueous solution and latex under high shear or turbulence sufficient to cause loading of the photographically useful compound into the dispersed polymer latex wherein the pH of the mixture does not need to be significantly changed.

Abstract: This invention is related to improved hardeners for proteinaceous materials. More specifically this invention is related to improved imidazolium hardeners for crosslinking a proteinaceous material for use in a photographic film.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.

Abstract: A photographic element, is disclosed which includes a support and at least three silver halide emulsion layers, that records exposure information. The exposure information is recorded in three image-recording units and wherein the spectral sensitivities of said image-recording units are chosen such that the average color error, .DELTA.E*.sub.ab, is less than or equal to 3.1. .DELTA.E*.sub.ab is computed for a specified set of test colors of known spectral reflectance, and the light source is specified as D.sub.65. .DELTA.E*.sub.ab is the average CIE 1976 (L*a*b*) .DELTA.E*.sub.ab between the CIE 1976 (L*a*b*)-space coordinates of said test colors and the CIE 1976 (L*a*b*)-space coordinates corresponding to transformed exposure signals.

Abstract: A silver halide photographic material is disclosed, which has on a reflective support at least one light-sensitive layer containing silver halide emulsion grains, wherein said reflective support has at least one waterproof resin coated layer which contains at least 2 g/m.sup.2 of a white pigment in waterproof resin coated layer at the light-sensitive layer coated side and further at least one light-sensitive layer contains at least one compound represented by following general formula (I) in a molecular dispersion state of a monomolecule or a dimer; ##STR1## wherein R.sub.1 to R.sub.4 each represent a hydrogen atom or a substituent, the sum total of the atomic weights of at least one of (R.sub.1 +R.sub.3) and (R.sub.2 +R.sub.4) being not more than 160; n represents 0, 1, or 2; and M represents a hydrogen atom or an alkali metal.

Abstract: The present invention provides a bottom anti-reflective coating compositions having a very low level of metal ions and a process for producing such compositions utilizing specially treated ion exchange resins. The present invention also provides photoresists produced using such bottom anti-reflective coating compositions and a method for producing semiconductor devices using such photoresists.

Abstract: An element for cleaning processing solutions contained in a radiographic film processor is disclosed. The element is comprised of a transparent film support and hydrophilic colloid layers coated on opposite sides of the film support. An infrared opacifying dye is contained within the element capable of reducing specular transmission through the element before, during and after processing to less than 50 percent, measured at a wavelength within the spectral region of from 850 to 1100 nm. A processing solution soluble colorant can be contained in one or more of the hydrophilic colloid layers.

Abstract: An encased photographic material includes a silver halide light-sensitive material having at least one silver halide emulsion layer on a support. The emulsion layer contains gold- and chalcogen-sensitized silver halide grains and a thiocyanate salt therein. At least 60% of a total projected area of the silver halide grains is occupied by tabular grains having an aspect ratio of 3 or more and having on an average 10 or more dislocation lines per grain. A lightproof container contains the light-sensitive material such that an end portion of the light-sensitive material is positioned outside the lightproof container, and that a gas can pass between an inside and an outside of the lightproof container. A light-transmitting case encases and seals the lightproof container. A hydrogen cyanide gas scavenger is present inside the case.

Abstract: A silver halide color photographic material improved in color forming properties and light fastness of color image is disclosed, comprising a support having thereon a light-sensitive silver halide emulsion layer and a nonlight-sensitive layer, wherein the nonlight-sensitive layer contains a UV absorbent and the silver halide emulsion layer contains a polyhydric alcohol.

Abstract: A silver halide photographic material having at least one light-sensitive emulsion layer containing a silver halide emulsion on a support, in which at least one silver halide emulsion layer contains silver halide grains of silver chloride or silver chlorobromide having a silver chloride content of 90 mol % or more, the silver halide grains being tellurium-sensitized, and at least one of light-sensitive emulsion layers or non-light-sensitive emulsion layers on the support contains at least one specific compound represented by formula (I), (II) or (III) herein. The material has excellent rapid processability and a high sensitivity. It involves little photographic fluctuation before and after continuous processing thereof and little photographic fluctuation due to variation of the ambient humidity during exposure thereof. The image sharpness of the material may be noticeably improved without appreciably detracting from the sensitivity thereof.

Abstract: A support sheet for a photographic printing sheet having enhanced anti-fogging and anti-yellowing properties comprises a pulp paper substrate sheet, a front coating layer formed on a front surface of the substrate sheet and comprising a cured resinous material produced from electron beam-curable unsaturated organic compound by an electron beam irradiation thereto and mixed with a white pigment, and a back coating layer formed on a back surface of the substrate sheet and comprising a film-forming synthetic resinous material, in which a magnesium compound is contained, as an anti-fogging agent, in the substrate sheet and/or the front coating layer.

Abstract: A silver halide photographic material comprising at least one silver halide emulsion layer and at least one non-light-sensitive hydrophilic colloidal layer provided on a support. The silver halide emulsion layer or the hydrophilic colloidal layer contains a dye represented by the formula (I): ##STR1## in which A.sup.1 is an alkyl group, a substituted alkyl group, an aryl group or a substituted aryl group; each of Q.sup.1 and Q.sup.2 is hydrogen, an alkyl group or a substituted alkyl group, or Q.sup.1 and Q.sup.2 are combined with each other to form a five or six-membered heterocyclic ring; Q.sup.3 is hydrogen, a halogen atom, carboxyl, hydroxyl, methyl or methoxy; each of M.sup.1 and M.sup.2 is hydrogen, a metal atom or an atomic group that forms a monovalent cation; and p is 2, 3 or 4.

Abstract: A photographic silver halide material is disclosed which comprises a support and on one or both sides thereof at least one silver halide emulsion layer and a protective gelatin antistress layer and which comprises in an outermost layer on the side(s) containing at least one emulsion layer a polyoxyalkylene compound as an antistatic agent, characterised in that said antistress layer comprises an ionic or nonionic polymer or copolymer latex. In addition to the preservation of antistatic properties after processing of the said material an improvement in surface glare as appreciated upon examination of medical X-ray films is obtained. Moreover the occurrence after processing of water spot defects and sticking is avoided.

Abstract: A forming method of a fine resist pattern improve so as to form a fine pattern of high accuracy can be obtained. A positive-type photoresist 1 including naphthoquinone diazide and novolak resin is applied on a substrate. An anti-reflection film adjusted to alkalinity is applied on positive-type photoresist 1. Positive-type photoresist 1 on which anti-reflection film 9 is applied is selectively irradiated. Positive-type photoresist 1 is developed.

Abstract: A silver halide color photographic material having an excellent color reproducibility, high sensitivity and excellent graininess.The silver halide color photographic material contains at least one of each blue-sensitive emulsion, green-sensitive emulsion, red-sensitive emulsion layer and hydrophilic colloid layers, in which the hydrophilic colloid layer contains a compound of formula (I) and the silver halide emulsion layer, which gives an interlayer effect to said red-sensitive layer, contains a silver halide emulsion spectrally sensitized with a compound represented by formulae (II) and (III).

Abstract: The invention provides a multicolor negative photographic element which contains a layer containing a yellow or orange-yellow azoaniline dye of structure I ##STR1## wherein: R.sub.1 is an alkyl group or a phenyl group;R.sub.2 is hydrogen or an alkyl group;R.sub.3 is an alkoxy, aryloxy or alkyl group when R.sub.2 is hydrogen, or is hydrogen when R.sub.2 is an alkyl group;R.sub.1 and R.sub.2 or R.sub.1 and R.sub.3 may join to form a ring;R.sub.4, which may be in the para or meta position relative to the azo group, is an electron-withdrawing group selected from the group consisting of trifluoromethyl, cyano, halogen, and from alkoxycarbonyl, aryloxycarbonyl, acyloxy, carbonamido, sulfonamido, carbamoyl, sulfamoyl, alkylsulfonyl, arylsulfonyl, sulfonyloxy (--OSO.sub.3 R), alkoxysulfonyl, aryloxysulfonyl, and sulfoxide groups;R.sub.5 is hydrogen or, can be a chlorine in the meta position when R.sub.4 is a chlorine in the para position; andthe total number of carbon atoms in R.sub.1, R.sub.2, R.sub.3, and R.sub.

Abstract: A reflection preventing film for forming a resist pattern and a process for forming the resist pattern using the film. The film comprises a copolymer was copolymerized of monomers which comprise at least one unsaturated carboxylic acid monomer, at least one epoxy group-containing unsaturated monomer, and at least one cinnamoylphenyl group-containing unsaturated monomer. The reflection preventing film exhibits a high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, is free from occurrence of intermixing, possesses excellent heat resistance, exhibits a superb dry etching performance and storage stability, and produces resist patterns with excellent resolution and precision. The resist pattern forming process comprises forming the reflection preventing film on a substrate, forming a resist coating film on said reflection preventing film, irradiating the resist film with a radiation, and developing the resist coating film.

Abstract: Methods of forming a resist pattern allow the size of the resist pattern to be controlled in its formation, and the size of the underlying substrate to be controlled in etching the same even with a step portion existing on the substrate. The methods of forming a resist pattern on a substrate by lithography use far-ultra violet light. An organic silane compound for forming an anti reflection film on the surface of a substrate includes a silicon atom, a leaving group bound to the silicon atom and replaceable with an hydroxyl group existing in the surface of the semiconductor substrate to bind covalently the semiconductor substrate and the organic silane compound, and a substituent group absorbing the far-ultra violet light. The substrate is coated with the organic silane compound. Resist is applied onto the substrate coated with the organic silane compound. The resist is exposed selectively using far-ultra violet light, and then developed.

Abstract: A silver halide color photographic light-sensitive material for use in preparing a color proof image from a halftone image information is provided, comprising a support having thereon blue-sensitive, green-sensitive and red-sensitive silver halide emulsion layers, in which at least one of the silver halide emulsion layers comprises silver halide grains having a silver chloride content of not less than 80 mol % and of which the reflection densities, when unprocessed, at wavelengths of 450, 550 and 700 nm each are not less than 0.8.

Abstract: An improvement is proposed in a double-coated patterning plate, which consists of a substrate, an undercoat levelling layer and a photoresist layer thereon, as well as in the patterning method therewith. Different from conventional double-coated patterning plate in which the undercoat levelling layer is formed from poly(methyl methacrylate) resin, the layer in the invention is formed from a copolymeric resin of methyl methacrylate and glycidyl methacrylate in a specified copolymerization ratio and the resin is admixed with 2,2',4,4'-tetrahydroxybenzophenone. By virtue of the use of this unique resin composition for the undercoat levelling layer, the troubles due to intermixing between the undercoat levelling layer and the photoresist layer thereon can be avoided to impart the patterned resist layer with excellent properties.

Abstract: Disclosed is a direct positive silver halide color photographic light-sensitive material comprising a support and provided thereon, a blue-sensitive emulsion layer containing previously unfogged internal latent image-forming silver halide grains having a spectral sensitivity to blue-light, a green-sensitive emulsion layer containing previously unfogged internal latent image-forming silver halide grains having a spectral sensitivity to green-light, a red-sensitive emulsion layer containing previously unfogged internal latent image-forming silver halide grains having a spectral sensitivity to red-light and a hydrophilic colloidal layer, wherein said blue-sensitive emulsion layer is provided so as to be located farther than both said green-sensitive and said red-sensitive emulsion layers from the support; and at least one of said blue-sensitive emulsion layer, said-green sensitive emulsion layer and said red-sensitive emulsion layer or said hydrophilic colloidal layer contains an internal latent image forming si

Abstract: There is disclosed a light-sensitive silver halide photographic element comprising at least one hydrophilic colloid layer containing a dihalogenonitriloacylamino compound in combination with a phenolic biocide.

Abstract: Disclosed is a silver halide color photographic light-sensitive material comprising a reflective support comprising polyolefin resin coated paper and provided on one side thereof with photographic component layers comprising a hydrophilic colloidal layer containing a white pigment, a non-sensitive hydrophilic colloidal layer, and a silver halide emulsion layer, wherein at least one of said photographic component layers contains an oil-soluble dye or a colored pigment, either of which is not substantially incapable of being decolorized on a photographic-processing.

Abstract: The synthesis and the application of new dyes is described. In particular said new dyes can be incorporated in non-migratory state in hydrophilic colloid layers of photographic materials wherefrom they can be rapidly removed after being quickly decolorized in alkaline aqueous liquids used in the processing of said materials. In photographic applications dyes of the general formula (I) are provided with at least one ionizable group which permits solubilization in aqueous and/or alkaline medium.

Abstract: A process for making a photographic film support comprising applying a film forming coating composition containing an antistat agent to a first clear transparent polymeric film to form an antistat layer on the polymeric film and overcoating the free surface of the antistat layer with a second polymeric film having the same chemical composition as the first polymeric film.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.

Abstract: A recording material comprising a sheet, ribbon or web support and a hydrophilic colloid binder layer incorporating an ionic polymer in the form of dispersed particulate material providing to said material an antistatic character, characterized in that (i) said ionic polymer is a cross-linked copolymer of an acrylic and/or methacrylic acid ester including 90-99 mole % of acrylate and/or methacrylate and 1 to 10 mole % of tetraallyloxyethane as polyfunctional crosslinking monomer, wherein in said copolymer at least 75% of the ester groups have been transformed into alkali metal carboxylate groups (ii) said ionic polymer is coated at a coverage of at least 14 g/m.sup.2, and (iii) said ionic polymer is present in admixture with said hydrophilic colloid binder in a weight ratio of at least 10/90.

Abstract: Solid particle dispersions of dyes according to the formula: ##STR1## wherein D is selected from the group consisting of ##STR2## are disclosed as filter dyes for photographic elements. In this formula, R.sup.1, R.sup.2, and R.sup.3 are each independently hydrogen, substituted or unsubstituted alkyl, or substituted or unsubstituted alkoxy. At least one of R.sup.1, R.sup.2 and R.sup.3 is substituted or unsubstituted alkoxy, or two of R.sup.1, R.sup.2 and R.sup.3 together consist of --O--L--O-- and form a ring condensed with the phenyl ring to which they are attached wherein L is an alkylene linking group. R.sup.4, R.sup.5, R.sup.6, and R.sup.7 are each independently hydrogen, substituted or unsubstituted alkyl, or substituted or unsubstituted aryl. R is a carboxy or sulfonamido substituent, and L.sup.1, L.sup.2 and L.sup.3 are each independently substituted or unsubstituted methine groups.