Abstract: Provided is a method of making a circuit pattern. The method includes: Step (A): providing a master substrate comprising a first photosensitive layer containing photosensitive particles; Step (B): providing an energy beam to reduce metal ions in a predetermined area of the first photosensitive layer to form multiple first metal particles; Step (C): removing unreduced photosensitive particles by a fixer to obtain a master mask; wherein the first metal particles form a first predetermined pattern in the master mask; Step (D): providing a chip comprising a second photosensitive layer containing second photosensitive particles; Step (E): putting the master mask on the second photosensitive layer and providing an energy beam to reduce metal ions of an uncovered part of the second photosensitive layer to form multiple atomized second metal particles; Step (F): removing unreduced photosensitive particles by a fixer to obtain the circuit pattern having line spacing at picoscopic/nanoscopic scale.

Abstract: Provided are a composition which includes a compound having a benzodithiol structure and a compound having an —O—Si—O— structure and is capable of forming a film that has long-wavelength ultraviolet range shielding properties, high pencil hardness and good light fastness; a film; a glass article; a compound; a high purity composition; a method for producing a compound; and a method for producing a film.

Abstract: A method for patterning a substrate with extreme ultraviolet (EUV) radiation is provided. The method includes contacting a surface of the substrate with at least one surface modification agent that reacts with and bonds to the surface 402 of the substrate 401 to provide a modified surface. A layer of photoresist is formed on the modified surface, followed by exposing the layer of photoresist to a pattern of EUV radiation. The surface modification agent has a general formula: X-L-Z, where X is a leaving group; L is a linkage group including a substituted or un-substituted carbon chain having 1 to 20 carbons, a sulfur moiety, a silicon moiety, or combinations thereof; and Z is at least one of an acid functional group, a photoactive acid generator group or a halide.

Abstract: There is provided a composition for forming a resist underlayer film having a large selection ratio of dry etching rate, exhibiting desired values of the k value and the refractive index n at a short wavelength, for example, in an ArF excimer laser, and further, exhibiting solvent resistance. A resist underlayer film forming composition for lithography comprises a linear polymer having, in a main chain thereof, at least one of an aromatic ring-containing structure and a nitrogen atom-containing structure; and a solvent, wherein to the aromatic ring or the nitrogen atom, at least one alkoxyalkyl group or hydroxyalkyl group is directly bonded.

Abstract: The present invention relates to a method of manufacturing semiconductor devices. According to the method, an etch target layer, a chemically amplified photoresist layer, and an Anti-Reflective Coating (ARC) layer are first sequentially formed over a semiconductor substrate. An exposure process is performed in order to form exposure portions in the photoresist layer. A thermal process is performed so that a decrosslinking reaction is generated in the ARC layer on the exposure portions. A development process is performed in order to form photoresist layer patterns and ARC layer patterns by removing the ARC layer at portions in which the decrosslinking reaction has occurred and the exposure portions. A silylation process is performed in order to form silylation patterns on sidewalls of each of the photoresist layer patterns. The ARC layer patterns and the photoresist layer patterns are removed. The etch target layer is patterned using the silylation patterns as an etch mask.

Abstract: Disclosed are-(2?-Hydroxy-4?-aminophenyl)benzotriazole derivatives of formula wherein R1 and R4 independently of each other are hydrogen; C1-C28alkyl; C1-C28alkoxy; C2-C28alkenyl; C2-C28alkinyl; C3-C12cycloalkyl; C3-C12cycloalkenyl; C7-C28aralkyl; C1-C20heteroalkyl; C3-C12cycloheteroalkyl; or C5-C16 heteroaralkyl; and wherein C1-C28alkyl, C1-C28alkoxy, C2-C28alkenyl and C2-C28alkinyl are unsubstituted or may be substituted by at least one C1-C5alkyl, C1-C5alkoxy or hydroxy; R2 and R3 independently of each other are hydrogen; C1-C28alkyl; C2-C28 alkenyl; C2-C22alkinyl; C3-C12cycloalkyl; C3-C12cycloalkenyl; C7-C28 aralkyl; C1-C20 heteroalkyl; C3-C12cycloheteroalkyl; C5-C16heteroaralkyl; and wherein C1-C28alkyl, C1-C28alkoxy, C2-C28alkenyl and C2-C28alkinyl are unsubstituted or may be substituted by at least one C1-C5alkyl, C1-C5alkoxy or hydroxy; or CO—R5; or R2 and R3 together with the linking nitrogen form a 5- to 7-membered, monocyclic, carbocyclic or heterocyclic ring; R5 is C1-C28alkyl; C2-C28alkenyl;

Abstract: Organic coating composition are provided including antireflective coating compositions that can reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing or via-fill layer. Preferred compositions of the invention comprise contain a crosslinker component that is resistant to sublimination or other migration crosslinker from the composition coating layer during lithographic processing.

Abstract: The appearance of a color print viewed under UV illumination is predicted using a target comprising color patches each printed using a known coverage of printer colorant(s). In one case, the target is illuminated using a UV light source and an electronic image of the target is captured using a digital camera or the like. In another case, a spectrophotometer is used both with and without a UV cutoff filter to measure the target. The captured image data or the spectrophotometric measurements are used to derive a UV printer characterization model that relates any arbitrary combination of printer colorants to a predicted UV color appearance value. Metameric colorant mixture pairs for visible light and UV light viewing can be determined using the UV model together with a conventional visible light printer characterization model. A visual matching task is used to determine a correction factor for the UV printer characterization model.

Abstract: The invention relates to a method for producing a substrate having a resist layer in the form of a relief structure, which represents a diffraction structure. The resist layer at least in certain areas adjoins a conductive layer, which scatters the primary electrons and/or produces secondary electrons when the resist layer is exposed by means of an electron beam. With this method the material of the resist layer and the conductive layer and the exposure parameters are adjusted to each other such that the resist layer is also exposed outside the area impinged with the electron beam such that the flanks of the relief structure obtain an inclined form.

Abstract: The invention provides a photothermographic material including: a support and an image-forming layer including a non-photosensitive silver salt, a photosensitive silver halide, a binder, and a reduction agent disposed on the support, wherein a silver iodide content in the photosensitive silver halide is in a range from 40 mol % to 100 mol %; and an average sphere-equivalent diameter of the photosensitive silver halide is in a range from 0.3 ?m to 5.0 ?m. The photothermographic material may further include a silver iodide complex forming agent as a compound which substantially reduces visible light absorption caused by the photosensitive silver halide after thermal development. At least 50%, in terms of a projected area, of the photosensitive silver halide may be occupied by tabular silver halide grains having an aspect ratio of from 2 to 50 and being deposited with a silver salt in an epitaxial growth manner.

Abstract: Disclosed are multilayered resist structures including bilayer and top surface imaging which utilize tuned underlayers functioning as ARCs, planarizing layers, and etch resistant hard masks whose properties such as optical, chemical and physical properties are tailored to give a multilayer resist structure exhibiting high resolution, residue free lithography and methods of preparing these materials.

Abstract: Anti-reflective materials such as bottom anti-reflective coatings (BARC's) and sacrificial light absorbing materials (SLAM) may be made more effective at preventing coherent light or electron beam reflection from a substrate by including in the anti-reflective material an additive to alter the radiation beam path of the reflected light or electrons. The radiation beam path altering additive may be a reflective material or a refractive material. The inclusion of such a radiation beam bath altering additive may reduce line width roughness and increase critical dimension (CD) control of interconnect lines and vias.

Abstract: A composition for forming anti-reflective coating for use in a lithographic process in manufacture of a semiconductor device, comprising as a component a resin containing cyanuric acid or a derivative thereof, or a resin containing a structural unit derived from cyanuric acid or a derivative thereof. The structural unit is preferably represented by formula (1): and can be contained in a main chain or a side chain, or both main chain and side chain of a resin. The anti-reflective coating for lithography obtained from the composition has a high reflection reducing effect and does not cause intermixing with a resist layer to give an excellent resist pattern. It has a higher selectivity in dry-etching compared with the resists.

Abstract: Photothermographic materials are coated with imaging layers and an antihalation layer between the support and thermally developable imaging layers on one or both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby excited to form a latent image in the photothermographic material that can eventually be used for medical diagnosis. The antihalation layers contain radiation absorbing compounds (such as a UV-radiation absorbing compounds) that absorb radiation at the predetermined wavelength (for example at 300 to 450 nm) and have limited absorption at higher wavelengths.

Abstract: This invention relates to an imaging element comprising an imaging layer having associated therewith a compound of Structure I: wherein: the substituents are as defined in the application.

Abstract: Photothermographic materials are coated with thermally developable imaging layers on both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby form a latent image in the photothermographic material that can eventually be heat developed and used for medical diagnosis. The photothermographic materials contain an opaque material that acts as a crossover control agent that absorbs radiation at the predetermined wavelength, for example at 300 to 450 nm, and has limited absorption at higher wavelengths. When the photothermographic material is heated, the opaque material loses its opacity. Additional crossover control agents, such as UV-absorbing compounds, can also be added to the support or to an antihalation layer.

Abstract: An optical filter comprises a transparent support and a filter layer. The filter layer contains a dye and a binder polymer. The dye is in an aggregated form exhibiting an absorption maximum in the wavelength region of 750 to 1,100 nm. The support, the filter layer or an optional layer contains an ultraviolet absorbing agent represented by the formula (I), (II), (III) or the like.

Abstract: A silver halide color photosensitive material comprises a blue-sensitive layer, a green-sensitive layer, a red-sensitive layer and a non-light-sensitive layer on a support. The silver halide color photosensitive material contains a compound selected from the following type 1 and type 2 compounds, and wherein the blue-sensitive layer meets the relationship of the following formula (I): SB(370 nm)/SB(420 nm)<0.

Abstract: A photographic element is described comprising a support bearing at least one blue light sensitive silver halide emulsion layer and an ultraviolet filter layer above the light sensitive layer, wherein the ultraviolet filter layer comprises an ultraviolet absorbing dibenzoylmethane compound of formula (I) where R1 through R5 are each independently hydrogen, halogen, nitro, or hydroyxl, or further substituted or unsubstituted alkyl, alkenyl, aryl, alkoxy, acyloxy, ester, carboxyl, alkyl thio, aryl thio, alkyl amine, aryl amine, alkyl nitrile, aryl nitrile, arylsulfonyl, or 5–6 member heterocycle ring groups. The present invention describes photographic elements that include materials that deliver a preferred UV absorption spectrum that provides adequate spark protection, and minimizes UV radiation incident on the element during camera exposure so that accurate color rendition can be achieved, while maximizing photographic speed in the blue record.

Abstract: Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers include an amine organic base whose conjugate acid has a pKa greater than 5. These backside stabilizers can be provided particularly in non-photosensitive compositions that include an antihalation composition.

Abstract: Thermally developable photothermographic materials comprise a backside layer that includes a backside stabilizer to reduce fog formation in high humidity conditions, thereby providing improved shelf stability. Useful backside stabilizers are nitrogen-containing aromatic heterocyclic compounds. These backside stabilizers can be provided particularly in non-photosensitive compositions that include an antihalation composition.

Abstract: A silver halide color photosensitive material composing respectively at least one red-, green-, and blue-sensitive silver halide emulsion layer, the color photosensitive material containing a magenta dye which is fixed in the specific layer and is not colored by a coupling reaction with developing agent oxidation products, and/or containing a cyan dye which is fixed in the specific layer and is not colored by a coupling reaction with developing agent oxidation products, and containing an ultraviolet absorptive polymer latex represented by the formula (I) which is impregnated with a non high molecular weight ultraviolet absorptive compound. wherein a phenyl ring or a benzo ring may be optionally substituted, either of m or n is 1 and another is 0, and M and K are represented by the following formula (II): wherein R3 is H or an alkyl group, L is a divalent binding group, and p is 0 or 1.

Abstract: Contrast enhanced photolithography methods and devices formed by the same are described. In accordance with these methods, a photoresist layer is formed on a substrate. A contrast enhancing system including a solution or dispersion of a photobleachable dye is formed on the photoresist layer. The photoresist layer is exposed through an imaging pattern and through the contrast enhancing system to radiation having a wavelength between about 230 nm and about 300 nm. The contrast enhancing layer is removed, and the photoresist layer is developed to form a photoresist pattern on the substrate. The contrast enhancing system may be removed and the photoresist layer may be developed in a single process step or in different process steps.

Abstract: A silver halide color photographic lightsensitive material comprising a support and, superimposed thereon, at least one blue-sensitive layer, at least one green-sensitive layer, at least one red-sensitive layer and at least one non-lightsensitive layer, wherein at least one fluorinated surfactant represented by the following general formula (A) or general formula (B) is contained and wherein a spectral sensitivity ratio at 370 nm as compared to that at 420 nm, which imparts the same density as that of the sensitivity at 420 nm in the spectral sensitivity distribution of the blue-sensitive layer, is 70% or less.

Abstract: The invention relates to a photographic element comprising at least one light-sensitive silver halide emulsion layer having associated therewith in the same dispersion a certain de-aggregating compound at least one heterocyclic cyan dye-forming coupler of a specified formula and an aromatic stabilizer of a particular formula. The combination provides improved image stability.

Abstract: An imageable element useful as a flexographic printing plate precursor is disclosed. The element is made up of a flexible substrate; a photosensitive layer, which contains a negative working photosensitive composition; an optional barrier layer; and a masking layer. The masking layer is thermally bleachable, comprises a dye that typically has an absorption maximum between about 250 nm and about 600 nm, more typically between about 300 nm and about 500 nm, and is substantially free of photothermal conversion materials.

Abstract: A coating composition for use in forming an overcoat layer in a photographic element, said composition comprising an aqueous solution of: a mixture of two or more surfactants; a hydrophilic binder; matte beads; and a lubricating agent; wherein one of the surfactants is represented by the following Formula (I) and is the only fluorosurfactant in the composition: Rf—CH2CH2—S-(A)-D??(I) where Rf is —(CF2)nCF3, n represents the number of CF2 groups and is 3 or 5 in at least 60% of the Rf groups present, and in the remainder of Rf groups n is 7, 9, or 11. A is a divalent linking group that includes substituted alkylene or alkylene (N-alkylene)amide; and D is an ionic group. A photographic element with an outermost layer containing the coating composition is also disclosed.

Abstract: An optical filter comprises a transparent support and a filter layer. The filter layer contains a dye and a binder polymer. The dye is in an aggregated form exhibiting an absorption maximum in the wavelength region of 750 to 1,100 nm.

Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.

Abstract: The invention relates to a photographic element comprising at least one light-sensitive silver halide emulsion layer having associated therewith in the same dispersion a certain de-aggregating hydrogen bond donating and hydrogen bond accepting compound and at least one pyrazole fused ring derivative coupler. The combination provides improved colour reproduction.

Abstract: A composition for an anti-reflective layer capable of simultaneously being developed together with a photoresist layer after exposure of the photoresist layer in a photolithography process and a method for forming patterns in a semiconductor device using the composition, wherein the anti-reflective light absorbing layer composition includes a polymer having a (meth)acrylate repeating unit, a light-absorbing group of diazoquinones chemically bound to the (meth)acrylate repeating unit, a photoacid generator, a cross-linker which thermally cross-links the polymer and is decomposed from the polymer by an acid, and a catalyst for the cross-linking reaction of the polymer. The method for forming patterns in a semiconductor device involves forming an anti-reflective layer on a semiconductor substrate using the composition and simultaneously exposing the anti-reflective layer and a photoresist layer, thereby chemically transforming the anti-reflective layer so it is able to be developed.

Abstract: The invention provides a photothermographic material comprising, on a surface of a substrate, a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, a halogen compound represented by the following formula (A), and a development accelerator.

Abstract: There is disclosed a method of preparing a photographic solid fine-grain dispersion, the method comprising the steps of: successively bringing a slurry of a water-insoluble photographically useful compound in a grinding chamber of a dispersing machine, which chamber is filled with media, allowing the compound to contact the media in the grinding chamber, to produce fine grains of the compound successively, successively separating the media from the compound by centrifugal force, and taking the compound out of the grinding chamber, using specific media with given physical properties. There is also disclosed a dispersion obtained by the method. According to the method, the photographic solid fine-grain dispersion is prepared efficiently, without coarse grains or abrasion materials resulting from media or so, and the dispersion causes no defect when coated in a form of a coating film.

Abstract: This invention relates to a silver halide photographic element comprising a support bearing a cyan dye image-forming unit comprised of at least one red-sensitive silver halide emulsion layer having associated therewith at least one cyan dye-forming coupler, a magenta dye image-forming unit comprising at least one green-sensitive silver halide emulsion layer having associated therewith at least one magenta dye-forming coupler, and a yellow dye image-forming unit comprising at least one blue-sensitive silver halide emulsion layer having associated therewith at least one yellow dye-forming coupler, wherein at least one of the dye image forming units contains layers of differing sensitivities, and the layer of highest sensitivity contains a development promoting agent or a specific coupler as described herein, or a combination thereof, and a silver halide emulsion comprising tabular silver halide grains having associated therewith at least two dye layers comprising (a) an inner dye layer adjacent to the silver ha

Abstract: A method to improve the resolution of a photolithography system by using one or more coupling layers between a photo resist and an anti-reflective coating. The coupling layer(s) compensate for a mis-match in indexes of reflection between the photo resist and anti-reflective coating and minimize the amount of energy which is reflected back into the photo resist, thereby improving the quality of the resulting image which is formed on the photo resist during the process.

Abstract: A silver halide color photographic lightsensitive material comprising a support and, superimposed thereon, at least one blue-sensitive layer, at least one green-sensitive layer, at least one red-sensitive layer and at least one non-lightsensitive layer, wherein at least one fluorinated surfactant represented by the following general formula (A) or general formula (B) is contained and wherein a spectral sensitivity ratio at 370 nm as compared to that at 420 nm, which imparts the same density as that of the sensitivity at 420 nm in the spectral sensitivity distribution of the blue-sensitive layer, is 70% or less.

Abstract: A coating composition for use in forming an overcoat layer in a photographic element, said composition comprising an aqueous solution of: a mixture of two or more surfactants; a hydrophilic binder; matte beads; and a lubricating agent; wherein one of the surfactants is represented by the following Formula (I) and is the only fluorosurfactant in the composition:

Abstract: This invention relates to an imaging element comprising an imaging layer having associated therewith a compound of Structure I: wherein: the substituents are as defined in the application.

Abstract: Disclosed is a colour photographic element containing one or more cyan dye-forming couplers, a UV absorber and a specific class of stabiliser, and an imaging process used therewith. The element exhibits improved stability.

Abstract: This invention relates to an imaging element comprising an imaging layer having associated therewith a compound of Structure I: wherein: the substituents are as defined in the application.

Abstract: Disclosed is a photothermographic material comprising a support, a photosensitive layer containing a silver halide having a silver iodide content of 10 mol % or more and a reducing agent and a non-photosensitive layer provided on the support, wherein at least one of the photosensitive layer and the non-photosensitive layer contains a dye showing an absorption maximum in a wavelength range of 350 nm to 430 nm. The photothermographic material exhibits high image quality, superior color tone and superior image stability after development.

Abstract: A radiographic silver halide film useful for mammography comprises a support having a cubic grain silver halide emulsion on one side. The cubic grains are spectrally sensitized with a combination of first and second spectral sensitizing dyes that provides a combined maximum J-aggregate absorption of from about 540 to about 560 nm. The first spectral sensitizing dye is an anionic benzimidazole-benzoxazole carbocyanine and the second spectral sensitizing dye is an anionic oxycarbocyanine. The first and second spectral sensitizing dyes are present in a molar ratio of from about 0.25:1 to about 4:1.

Abstract: Aqueous-based thermally developable emulsions and photothermographic imaging materials include photosensitive silver halide core-shell grains that comprise at least 20 mol % iodide based on total silver, an amount of iodide in the core of the grains that can be up to the iodide saturation limit in silver iodobromide, and an amount of iodide in the shell of the grains that is at least 2 mol % less than the amount of iodide present in the core, and further provided that the total amount of silver in the shell is from about 10 to about 80 mol % of total silver in the grains. These materials provide desired Dmax and reduced image “print out”.

Abstract: A radiographic silver halide film is designed for improved imaging of dense soft tissue as in mammography. The film includes a silver halide emulsion on each side of the support and at least one silver halide emulsion contains cubic silver halide grains that are doped with a metal hexacoordination complex compound such as a ruthenium hexacoordination complex compound.

Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having chromophore moieties and transparent moieties are useful antireflective hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions of the invention are advantageously useful with shorter wavelength lithographic processes and/or have minimal residual acid content.

Abstract: This invention relates to a photothermographic element comprising a support, at least one photothermographic imaging layer, and at least one filter layer, wherein the filer layer comprises a heat-bleachable composition comprising a barbituric acid arylidene filter dye is in the presence of an effective amount of a base precursor.

Abstract: Nonpolymeric fluorochemicals defined as by the following Structure I are useful in thermally developable materials.

Abstract: Aqueous-based thermally sensitive emulsions and photothermographic imaging materials include photosensitive silver halide grains that are predominantly homogeneous and comprise at least 20 mol % iodide based on total silver in the grains. These materials provide desired Dmax and reduced image “print out”.

Abstract: Improved compounds and base precursors that undergo thermal decomposition are disclosed. Thermal-dye-bleach agents, and in particular, a novel class of salts of arylsulfonylacetic acids as bleaching agents for photothermographic use are disclosed. Photothermographic elements employing these thermal-dye-bleach agents are suitable for use as acutance and antihalation systems, bleachable filter dye materials, and in promoting unblocking of various components such as blocked developers, especially in in photothermographic elements.

Abstract: The present invention provides a silver halide photographic photosensitive material in which a silver halide photosensitive layer is disposed on a transparent polyethylene terephthalate (PET) film into which an ultraviolet light absorber has been kneaded, wherein the ultraviolet light absorber is at least one kind of ultraviolet light absorber characterized in that (i) a loss of mass is not greater than 10% when heated to 300° C. at a heating rate of 10° C./minute in a nitrogen gas atmosphere, and/or (ii) a difference between a b-value of a sheet having a thickness of 1.5 mm formed after heating for 1 minute at 300° C., a PET resin including an amount of 0.4% by mass of the ultraviolet light absorber and having a water content of not greater than 50 ppm, and a b-value of a sheet having a thickness of 1.5 mm formed after heating the PET resin for 8 minutes at 300° C., is not greater than 3.0.