Filters Ultraviolet Radiation Patents (Class 430/512)
  • Patent number: 6153363
    Abstract: The present invention is a photographic element which includes a support, at least one silver-halide emulsion layer superposed on the support and a processing-solution-permeable protective overcoat overlying the silver halide emulsion layer. The processing-solution-permeable overcoat is composed of a polyurethane-containing component having acid functionalities wherein the polyurethane-containing component is an interpenetrating network further comprising at least two polymers, including at least one vinyl polymer and at least one urethane polymer. Suitably, a water-soluble polymer is also present in the overcoat. The present invention is also directed to a method of making a photographic print involving developing the photographic element in an alkaline developer solution.
    Type: Grant
    Filed: November 23, 1999
    Date of Patent: November 28, 2000
    Assignee: Eastman Kodak Company
    Inventors: Mridula Nair, Tamara K. Jones, Lloyd A. Lobo, Brian A. Schell
  • Patent number: 6143484
    Abstract: The present invention is a method for stabilizing a photographic coating melt. The photographic melt includes an aqueous medium and a dispersed liquid organic phase containing an ultraviolet ray absorbing compound, and an emulsion containing silver halide particles having an average equivalent circular diameter of from 0.03 to 0.10 microns. The photographically useful ultraviolet ray absorber compound is soluble in a liquid organic phase and substantially insoluble in water. The method includes the step of adding to the emulsion containing silver halide particles a sufficient amount of surfactant to passify surfaces of the silver halide particles. The present invention is also a method of preparing a photographic coating melt. A dispersion is prepared which includes an aqueous medium, a dispersed liquid organic phase and an ultraviolet ray absorber compound wherein the ultraviolet ray absorber compound is soluble in the dispersed liquid organic phase and substantially insoluble in water.
    Type: Grant
    Filed: May 6, 1999
    Date of Patent: November 7, 2000
    Assignee: Eastman Kodak Company
    Inventors: Kurt M. Schroeder, Jayme D. Ribeiro, Gary L. Slater, Timothy J. Hubert
  • Patent number: 6136519
    Abstract: There is disclosed a silver halide color photographic material and a method for forming a color photographic image by processing said color photographic material with a color developer substantially free from sulfite. Said color photographic material comprises the uppermost non-photosensitive colloid layer of photographic constitutional layers containing a dispersion obtained by emulsifying and dispersing a solution containing at least one ultraviolet-absorbing agent represented by the following formula (I) or (II) and at least one water-insoluble polymer compound, and a gelatin having an isoelectric point of 6.0 or over: ##STR1## wherein R.sub.1, R.sub.2, and R.sub.3 each represent a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, or an acylamino group; R.sub.4 and R.sub.
    Type: Grant
    Filed: May 19, 1993
    Date of Patent: October 24, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Kazunori Hasebe
  • Patent number: 6130024
    Abstract: The invention relates to an imaging element comprising support having adhered to the backside a strippable polymer layer that when removed has an adhesive layer thereon.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: October 10, 2000
    Assignee: Eastman Kodak Company
    Inventors: Peter T. Aylward, Robert P. Bourdelais, Thaddeus S. Gula, Robert F. Cournoyer
  • Patent number: 6127104
    Abstract: The present invention concerns a novel film for light boxes, in particular a reversal film for light box displays comprising a transparent support covered, in order, with a red-sensitive silver halide emulsion layer, a green-sensitive silver halide emulsion layer and a blue-sensitive silver halide emulsion layer, the support being covered on at least one of its faces with a layer comprising an opacifying compound in a quantity such that the minimum density of the film is between 0.2 and 0.6. This film also has compatibility with existing processing methods intended for reversal photographic products.
    Type: Grant
    Filed: June 22, 1998
    Date of Patent: October 3, 2000
    Assignee: Eastman Kodak Company
    Inventors: Gerard M. Droin, Yannick Begel, Didier M. Chigot
  • Patent number: 6117618
    Abstract: In one embodiment, the present invention relates to a method of making a carbonized antireflection coating involving the steps of depositing a polymer layer on a semiconductor substrate; and carbonizing at least a portion of the polymer layer in an inert atmosphere to provide the carbonized antireflection coating. In another embodiment, the present invention relates to a method of improving critical dimensional control during lithography, involving the steps of providing a semiconductor substrate; depositing a polymer layer on the semiconductor substrate; carbonizing at least a portion of the polymer layer in an inert atmosphere to provide a carbonized antireflection coating; depositing a photoresist over the carbonized antireflection coating; and patterning the photoresist.
    Type: Grant
    Filed: November 4, 1998
    Date of Patent: September 12, 2000
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Sanjay Yedur, Bhanwar Singh, Bharath Rangarajan, Michael Templeton
  • Patent number: 6093510
    Abstract: A dispersion comprises a solvent having dispersed therein a liquid-crystal forming dye of structural Formula I, II or III: ##STR1## wherein the substituent are as defined in the specification. The dispersion is particularly useful in imaging and photographic elements.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: July 25, 2000
    Assignee: Eastman Kodak Company
    Inventors: Margaret J. Helber, William J. Harrison, Kevin W. Williams, Steven W. Kortum
  • Patent number: 6093529
    Abstract: An imaging material is provided in the form of a photothermographic or thermographic image forming layer containing an organic silver salt on one surface of a support and further comprising a polyvalent metal ion and a phthalic acid compound on the image forming layer-bearing surface of the support. The imaging material has improved shelf stability before and after image formation and the ease of handling and produces high-quality blue black tone images.
    Type: Grant
    Filed: April 16, 1998
    Date of Patent: July 25, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hirohiko Tsuzuki, Hisashi Okamura, Itsuo Fujiwara, Yoshiharu Yabuki, Masaki Noro
  • Patent number: 6090523
    Abstract: An antireflection film includes a base resin and an additive resin, the additive resin having a dry etching rate higher than that of the base resin. A photoresist pattern is formed and the antireflection film is selectively etched using the photoresist pattern as a mask. The molecular weight and weight percent of the additive resin are selected to provide an etching rate for the antireflection film that permits selective removal of the antireflection film while leaving an effective amount of the photoresist.
    Type: Grant
    Filed: April 3, 1998
    Date of Patent: July 18, 2000
    Assignee: NEC Corporation
    Inventors: Norihiko Samoto, Haruo Iwasaki, Atsushi Nishizawa, Tsuyoshi Yoshii, Hiroshi Yoshino
  • Patent number: 6080534
    Abstract: The invention relates to an imaging element comprising a substrate having at least two polymer layers on the side bearing an imaging layer wherein at least one of said layers has incorporated therein a stabilizing amount of hindered amine.
    Type: Grant
    Filed: August 27, 1998
    Date of Patent: June 27, 2000
    Assignee: Eastman Kodak Company
    Inventors: Peter T. Aylward, Valerie J. Harris, Thaddeus S. Gula
  • Patent number: 6077648
    Abstract: The present invention is a photographic element which includes a support, at least one silver halide emulsion layer superposed on the support and a processing solution permeable protective overcoat overlying the silver halide emulsion layer. The processing solution permeable overcoat is composed of a urethane-vinyl copolymer having acid functionalities wherein a weight ratio of the urethane in the copolymer comprises from 20 to 100 percent and a weight ratio of the vinyl in the copolymer comprises from 0 to 80 percent. The present invention is a method of making a photographic element which includes providing an photographic element having a support, a silver halide emulsion layer superposed on the support and a processing solution permeable protective overcoat overlying the silver halide emulsion layer.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: June 20, 2000
    Assignee: Eastman Kodak Company
    Inventors: Mridula Nair, Tamara K. Jones, Lloyd A. Lobo, Brian A. Schell
  • Patent number: 6063539
    Abstract: A thermal recording medium comprising a ultraviolet absorber precursor represented by formula (1-A) or an image forming compound changing hue and an acid, which is high in thermal sensitivity, recordable with such a low output laser that no ablation takes place even when a thermal heat mode image recording system using a laser is utilized, requiring no different receiving sheet, and excellent in keeping quality: ##STR1## wherein P represents a protecting group for a hydroxyl group which is deblocked by heating to 250.degree. C. or less in the presence of an acid; R.sup.1 and R.sup.2, which may be the same or different, each represents a substitutable group; and 1 and m each represents an integer of 0 to 4.
    Type: Grant
    Filed: July 22, 1998
    Date of Patent: May 16, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuhiko Obayashi, Junichi Yamanouchi, Atsuhiko Ohkawa
  • Patent number: 6057085
    Abstract: A colour photographic material having a yellow filter layer containing at least one decolourisable dye or dye to be able to be rinsed out of the material of the formula (I) ##STR1## in which R.sub.1 and R.sub.2 mutually independently mean a substituted or unsubstituted alkyl group,R.sub.3 means a hydrogen or halogen atom, an alkyl or alkoxy groupR.sub.4 means a hydrogen atom, an alkyl or cyano group,R.sub.5 means a dissociable group having a pK.sub.a value of between 4 and 11 andX means an oxygen or sulphur atom,is distinguished in that the dyes are non-diffusible and completely decolourisable and do not impair the properties of the silver halide emulsions.
    Type: Grant
    Filed: November 17, 1998
    Date of Patent: May 2, 2000
    Assignee: Agfa-Gevaert NV
    Inventors: Klaus Sinzger, Hans Langen
  • Patent number: 6048662
    Abstract: This invention relates to antireflective coatings comprising polymeric polyoxyalkylenated colorants. More particularly, the present invention relates to antireflective coatings for utilization in forming thin layers between reflective substrates and photoresist coatings. Such antireflective coatings are very useful and beneficial within the production and fabrication of semiconductors through photolithographic procedures due to the liquid, non-crystallizing nature of polyoxyalkylenated colorants, and the lack of potentially damaging counterions, metals, and/or electrolytes within the inventive antireflective colored coatings. The inventive coatings may also be applied on lenses, mirrors, and other optical components. Methods of forming such antireflective coatings are also contemplated within this invention.
    Type: Grant
    Filed: December 15, 1998
    Date of Patent: April 11, 2000
    Inventors: John D. Bruhnke, John G. Lever
  • Patent number: 6042990
    Abstract: Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage, and improved stability in solution are disclosed. The principal component of these new anti-reflective coatings is a polyester resin produced by the reaction of one or more difunctional aliphatic carboxylic acids with a stoichiometric excess of a di- and/or a trifunctional aliphatic primary alcohol, wherein at least one of the dicarboxylic acids may contain a reactive methylene (--CH.sub.2 --) group. The resulting polyester resin reaction product is further modified by attaching light-absorbing groups to some or all of the reactive methylene groups (if present) and/or hydroxy groups present on the resin. The dye-attached polyester resin is combined with an aminoplast crosslinking agent and acid catalyst in a suitable solvent system to form the final anti-reflective coating.
    Type: Grant
    Filed: June 8, 1999
    Date of Patent: March 28, 2000
    Assignee: Brewer Science, Inc.
    Inventors: Xie Shao, Colin Hester, Tony D. Flaim, Terry Lowell Brewer
  • Patent number: 6036891
    Abstract: Hydrophilic UV light absorbing polymerizing monomers are provided. These monomers are copolymerizable for providing biocompatible hydrogels capable of absorbing at least 90% of the UV light incident to the hydrogels. Such hydrogels are optically transparent, have high refractive indices, and possess long term stability. The hydrogels provided are useful in all applications where hydrogels may be used including intraocular lenses, corneal inlays, corneal onlays, contact lenses and similar applications.
    Type: Grant
    Filed: May 11, 1998
    Date of Patent: March 14, 2000
    Assignee: Pharmacia & Upjohn
    Inventors: Xiugao Liao, Ging-See Lee, Stephen Q. Zhou
  • Patent number: 6030699
    Abstract: This invention provides an ultraviolet ray absorbing polymer particle which includes a first ultraviolet ray absorber represented by formula I as further defined in claim 1: ##STR1## and a second ray absorber represented by formula II as further defined in claim 1: ##STR2##
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: February 29, 2000
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Dennis E. Smith, Kurt M. Schroeder
  • Patent number: 6015655
    Abstract: A color photographic recording material comprising at least one light sensitive silver halide emulsion layer and optionally a light insensitive layer which is disposed nearer the source of light than is the light sensitive silver halide emulsion layer, wherein at least one of said layers contains particles of cerium(IV) oxide, zinc oxide or barium titanate with an average diameter <300 nm, is characterized by improved protection from UV light.
    Type: Grant
    Filed: July 14, 1999
    Date of Patent: January 18, 2000
    Assignee: Agfa-Gevaert NV
    Inventors: Jorg Hagemann, Werner Hoheisel
  • Patent number: 5998116
    Abstract: The invention relates to a color-photographic recording material comprising, on a support, a blue-sensitive, a green-sensitive and/or a red-sensitive silver-halide emulsion layer, a protection layer above the sensitive layers, and, if desired, separation layers between the sensitive layers, where at least one of said layers includes a UV absorber of the formula ##STR1## The stabilizers of the formula (1) or (1a) have good inherent stability and high light absorption; the photographic recording material described has excellent stability of the magenta, cyan and yellow layers.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: December 7, 1999
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Pascal Hayoz, Christophe Bulliard, David George Leppard
  • Patent number: 5998117
    Abstract: A silver halide photographic light-sensitive material is disclosed. The light-sensitive material comprises a support and one or more photographic constituent layers and at least one of said layers contains a dye capable of being decolored by reacting with a color developing agent.
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: December 7, 1999
    Assignee: Konica Corporation
    Inventors: Motoaki Sugino, Nobuaki Kagawa, Shigeto Hirabayashi, Atsushi Tomotake, Satoshi Nakagawa
  • Patent number: 5994044
    Abstract: A color photographic recording material which contains particles of elemental silicon and/or of solid compounds in which silicon is present in stoichiometric excess, having an average diameter of .ltoreq.120 nm, is distinguished by improved protection against UV radiation.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: November 30, 1999
    Assignee: Agfa-Gevaert AG
    Inventors: Jorg Hagemann, Werner Hoheisel, Reimer Holm
  • Patent number: 5989794
    Abstract: Disclosed is a polyalkylene naphthalate film, preferably the homopolymer of naphthalene-2,6-dicarboxylic acid and ethylene glycol (PEN), comprising a UV absorbing compound of general formula Q--CO--CO--X (explained in the description) for quenching of the UV fluorescence at 429 nm. The polymeric film is preferably used as support for a photographic material, preferably a colour negative or colour reversal photographic material.
    Type: Grant
    Filed: July 16, 1998
    Date of Patent: November 23, 1999
    Assignee: Agfa-Gevaert, N.V.
    Inventor: August Marien
  • Patent number: 5985517
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: April 1, 1999
    Date of Patent: November 16, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5981155
    Abstract: A silver halide color photographic film element and more particularly a color motion picture projection film element is provided comprising a transparent thermoplastic film support having a subbing layer unit, coated thereon at least one color forming hydrophilic layer and protective layer, characterized in that at least said subbing layer unit comprises at least one light-stabilizer, preferably absorbing ultraviolet radiation, and at least one chemical compound having reducing properties.
    Type: Grant
    Filed: December 23, 1996
    Date of Patent: November 9, 1999
    Assignee: AGFA-Gervaert, N.V.
    Inventors: Geert Vercruysse, Jean Burtin
  • Patent number: 5976775
    Abstract: In a silver halide color photographic light-sensitive material having each at least one red-sensitive silver halide emulsion layer (RL), green-sensitive silver halide emulsion layer (GL) and blue-sensitive silver halide emulsion layer (BL) on a support and further having a hydrophilic colloidal layer (AH-1) containing black colloidal silver between the support and the nearest light-sensitive silver halide emulsion layer, wherein the light-sensitive material further has a light-sensitive silver halide emulsion layer (DL) between the hydrophilic colloidal layer (AH-1) and the support, wherein the silver halide emulsion layer (DL) comprises at least one light-sensitive silver halide emulsion, and optical information is recorded by an exposure to light through the support, and the light-sensitive emulsion layer (DL) or its adjacent layer has a color-forming coupler.
    Type: Grant
    Filed: December 10, 1997
    Date of Patent: November 2, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yoshio Ishii
  • Patent number: 5965339
    Abstract: The present invention is a photographic element which includes a support, at least one light sensitive silver halide layer superposed on the support, and a protective overcoat layer overlying the light sensitive silver halide layer. The protective overcoat layer includes a hydrophilic binder and permanent matte particles. The permanent matte particles are greater than 80 mole percent isobutyl methacrylate.
    Type: Grant
    Filed: April 17, 1998
    Date of Patent: October 12, 1999
    Assignee: Eastman Kodak Company
    Inventors: Dennis E. Smith, Yongcai Wang, Alfred B. Fant, John L. Muehlbauer
  • Patent number: 5952136
    Abstract: A method is disclosed, and a corresponding thermal imaging medium for use with it, for the formation of an improved heat mode image comprising (A) exposing information-wise to laser radiation a thermal imaging medium comprising (1) a transparent support, (2) an image recording layer containing a hydrophilic binder, a substance capable of converting laser radiation into heat, and a dispersion of a hydrophobic polymer capable of undergoing thermocoagulation by the action of heat and having a built-in UV-absorber. A heat mode image with high density and improved resistance to physical damage is obtained.
    Type: Grant
    Filed: November 28, 1997
    Date of Patent: September 14, 1999
    Assignee: AGFA-Gevaert, N.V.
    Inventors: Eddie Daems, Joan Vermeersch, Luc Leenders, Rita Torfs
  • Patent number: 5948605
    Abstract: The present invention provides UV absorbing particles which are a polymerization reaction product of ethylenically unsaturated monomers selected from esters and amides of acrylic on methacrylic acid, vinyl esters, vinyl ethers, and vinyl nitrites; an initiator, a surfactant and an ultraviolet absorber having the general formula: ##STR1## wherein R is each independently a hydrogen, halogen, alkyl, aryl, alkoxy, acyloxy, alkylthio, arylthio, amine, alkylamino, arylamino, hydroxyl, cyano, nitro, acylamino, sulfonyl, sulfamido, acyloxy and oxycarbonyl.
    Type: Grant
    Filed: August 16, 1996
    Date of Patent: September 7, 1999
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Dennis Edward Smith, James Lee Bello, Kurt Michael Schroeder
  • Patent number: 5939236
    Abstract: The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.
    Type: Grant
    Filed: February 7, 1997
    Date of Patent: August 17, 1999
    Assignee: Shipley Company, L.L.C.
    Inventors: Edward K. Pavelchek, Manuel DoCanto
  • Patent number: 5935765
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: August 10, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5935760
    Abstract: Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage, and improved stability in solution are disclosed. The principal component of these new anti-reflective coatings is a polyester resin produced by the reaction of one or more difunctional aliphatic carboxylic acids with a stoichiometric excess of a di- and/or a trifunctional aliphatic primary alcohol, wherein at least one of the dicarboxylic acids may contain a reactive methylene (--CH.sub.2 --) group. The resulting polyester resin reaction product is further modified by attaching light-absorbing groups to some or all of the reactive methylene groups (if present) and/or hydroxy groups present on the resin. The dye-attached polyester resin is combined with an aminoplast crosslinking agent and acid catalyst in a suitable solvent system to form the final anti-reflective coating.
    Type: Grant
    Filed: October 20, 1997
    Date of Patent: August 10, 1999
    Assignee: Brewer Science Inc.
    Inventors: Xie Shao, Colin Hester, Tony D. Flaim, Terry Lowell Brewer
  • Patent number: 5932404
    Abstract: The present invention is a silver halide photographic material including at least one layer which contains; a polymer comprising as constituent components thereof a repeating unit having a photographically useful group and at least one repeating unit having an imidazole group; and a compound having at least one functional group which reacts with an imidazole group and at least one other functional group capable of reacting with an imidazole group and a primary amine group, the amount of the compound being sufficient to insure adequate fixation of said polymer.
    Type: Grant
    Filed: December 18, 1996
    Date of Patent: August 3, 1999
    Assignee: Eastman Kodak Company
    Inventors: Tienteh Chen, Hwei-ling Yau, Dorothy T. Java
  • Patent number: 5925506
    Abstract: A silver halide photographic light-sensitive material is disclosed. The light-sensitive material comprises a support having on one surface thereof photographic layers including a silver halide emulsion layer, at least one of the photographic layers contains a fluorescent whitening agent, and satisfies the following equation 1:(A/B)<0.03 Equation 1wherein A is an intensity of fluorescent light at the maximum fluorescent wavelength generated from the light-sensitive material before processing when the light-sensitive material is irradiated by exciting light of wavelength of 360 nm and B is an intensity of fluorescent light at the maximum fluorescent wavelength thereof generated from the area not exposed to light of the light-sensitive material after processing when the processed light-sensitive material is irradiated by exciting light of wavelength of 400 nm.
    Type: Grant
    Filed: October 31, 1997
    Date of Patent: July 20, 1999
    Assignee: Konica Corporation
    Inventors: Hirokazu Sato, Shigeo Chino, Masahiro Shibuya
  • Patent number: 5925500
    Abstract: Laser-imageable flexographic printing plates and a method of making same are disclosed. A thin polymeric film doped with a UV absorber is laminated to a photopolymer layer. The film is ablated from the photopolymer using a laser operating at a selected wavelength to create an in situ negative. The resulting negative can be subjected to typical UV flood exposure and development.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: July 20, 1999
    Assignee: Polyfibron Technologies, Inc.
    Inventors: Michael Wen-Chein Yang, Rustom Sam Kanga, Alvin Varnard Randall
  • Patent number: 5919599
    Abstract: Anti-reflective coating compositions having improved etch rate, inter alia, are prepared from certain high molecular weight polymers and copolymers, particularly glycidyl methacrylate with grafted dyes.
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: July 6, 1999
    Assignee: Brewer Science, Inc.
    Inventors: Jim Meador, Douglas J. Guerrero, Xie Shao, Vandana Krishnamurthy
  • Patent number: 5914223
    Abstract: The present invention is a silver halide photographic element which includes a support, at least one light sensitive silver halide emulsion layer; and at least one light-insensitive protective layer. The light insenstive protective layer includes a hydrophilic binder, a colloidal silver particle and an ultraviolet ray absorbing polymer particle having a mean size of greater than 0.01 .mu.m. The ultraviolet ray absorbing polymer particle contains an ultraviolet ray absorber and a polymer derived from monomer A and less than 10 weight percent of monomer B, wherein monomer A represents ethylenically unsaturated monomers which form substantially water insoluble homopolymers, and monomer B represents ethylenically unsaturated monomers capable of forming water soluble homopolymers.
    Type: Grant
    Filed: March 12, 1997
    Date of Patent: June 22, 1999
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Alfred B. Fant, Gary W. Visconte, Kurt M. Schroeder
  • Patent number: 5908738
    Abstract: Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.
    Type: Grant
    Filed: February 5, 1998
    Date of Patent: June 1, 1999
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Mitsuru Sato, Katsumi Oomori, Kiyoshi Ishikawa, Etsuko Iguchi, Toshimasa Nakayama
  • Patent number: 5888703
    Abstract: An antireflective layer comprises a binder component in the form of a rosin which is soluble in both a low polar organic solvent and an aqueous alkaline solution, and a light absorbing component which is also soluble in both the low polar organic solvent and the aqueous alkaline solution. In photolithography, the antireflective layer exhibits excellent anti-reflective properties in a predetermine UV wavelength region, and, when used for forming resist patterns, the antireflective layer can be applied dissolved in the low polar organic solvent in a manner which has no detrimental effect on the resist, and can be removed along with the resist during the development process using the aqueous alkaline solution.
    Type: Grant
    Filed: December 30, 1996
    Date of Patent: March 30, 1999
    Assignee: Sony Corporation
    Inventor: Yoichi Tomo
  • Patent number: 5879853
    Abstract: This invention relates to a top antireflective layer (TAR) which is preferably transparent to some extent and has high-etch resistance and low reflectivity at the photoresist/TAR interface. The TAR also significantly reduces CD variation in exposed photoresist film. The TAR of the present invention comprises an indanone or glutarimide copolymer, a solvent, and an additive sensitizer having an orthodiazonaphthoquinone structure. The present invention is also related to a process of forming a semiconductor by applying a photoresist layer to the surface of a substrate, forming a top antireflection layer on the photoresist layer, and selectively exposing the substrate to ultraviolet light, wherein the TAR comprises an indanone or glutarimide copolymer, a solvent, and an additive sensitizer with an orthodiazonaphthoquinone structure.
    Type: Grant
    Filed: January 18, 1996
    Date of Patent: March 9, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Tsukasa Azuma
  • Patent number: 5866285
    Abstract: The present invention is an imaging element including a support, at least one image-forming layer and an auxiliary layer. The auxilary layer is formed by providing a coating composition of a fluoroolefin-vinyl ether copolymer dissolved in an organic medium, coating the coating composition on the support and drying the coating composition. The present invention also includes a coating composition for use in an imaging element including a fluoroolefin-vinyl ether copolymer dissolved in an organic medium.
    Type: Grant
    Filed: June 12, 1997
    Date of Patent: February 2, 1999
    Assignee: Eastman Kodak Company
    Inventors: Charles C. Anderson, Yongcai Wang
  • Patent number: 5866312
    Abstract: The present invention is a photographic element which includes a support, at least one silver halide emulsion layer, and a light-insensitive protective overcoat. The light insensitive protective overcoat includes a hydrophilic binder and polymer particles having a glass transition temperature of at least 70.degree. C. The polymer particles prepared by the process of mechanically forming oil-in-water droplets having a size less than 400 nm of an ethylenically unsaturated monomer having hydrophobic groups, the hydrophobic groups having a logP.sub.(calc) greater than a logP.sub.(calc) of the ethylenically unsaturated monomer by at least 1 unit in an aqueous medium. A hydrophilic colloid is added to the aqueous medium in an amount sufficient to render the polymer partice compatible with the hydrophilic binder. The droplets are polymerized to a size of less than 400 nm.
    Type: Grant
    Filed: June 19, 1997
    Date of Patent: February 2, 1999
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Dennis E. Smith, Alfred B. Fant
  • Patent number: 5858634
    Abstract: The present invention is a photographic element which includes a support, at least one silver halide emulsion layer; and at least one layer containing a binder and polymer particles. The polymeric particles are prepared by the process of mechanically forming droplets having a size less than 400 nm of an ethylenically unsaturated monomer having hydrophobic groups, the hydrophobic groups having a logP.sub.(calc) greater than a logP.sub.(calc) of the ethylenically unsaturated monomer by at least 1 unit, and polymerizing said droplets so that the polymerized droplets have a size of less than 400 nm. The present invention also is a photographic element which includes a support, at least one silver halide emulsion layer; and at least one layer containing a binder and polymer particles. The polymeric particles are prepared by the process of mechanically forming droplets having a size less than 400 nm of an ethylenically unsaturated monomer having a logP.sub.
    Type: Grant
    Filed: June 19, 1997
    Date of Patent: January 12, 1999
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Dennis E. Smith, Alfred B. Fant, John L. Muehlbauer
  • Patent number: 5858633
    Abstract: Photographic elements containing 3-tertiary alkyl group substituted 2-hydroxyphenylbenzotriazole UV absorbing polymers. In particular, a photographic element having at least one layer containing a light sensitive silver halide emulsion and at least one layer which is not light sensitive, the element having in at least one of the layers an ultraviolet absorbing polymer which includes units formed from monomers of the structure of formula (I): ##STR1## wherein: n is an integer of 1 to 6;p and m are, independently, 0 or 1;tert-Alk is a 4 to 10 carbon atom tertiary alkyl group;G is --CO--, --C(O)--, --C(O)NH--, or --SO.sub.2 --;R.sub.2 and R.sub.3 are, independently, H, halogen, alkyl group or alkoxy group, and if n is more than 1 all of the R.sub.2 may be the same or different and all of the R.sub.
    Type: Grant
    Filed: May 16, 1997
    Date of Patent: January 12, 1999
    Assignee: Eastman Kodak Company
    Inventors: Tienteh Chen, Hwei-Ling Yau
  • Patent number: 5856078
    Abstract: The present invention is a silver halide photographic element which includes a support, at least one light sensitive silver halide emulsion layer, and an antihalation undercoat layer interposed between the at least one light sensitive silver halide layer and the support. The antihalation undercoat layer includes a hydrophilic binder and an ultraviolet ray absorbing polymer particle having a mean size of greater than 0.01 .mu.m. The ultraviolet ray absorbing polymer particle includes an ultraviolet ray absorber and a polymer derived from monomer A and less than 10 weight % of monomer B, wherein monomer A represents ethylenically unsaturated monomers which form substantially water insoluble homopolymers, and monomer B represents ethylenically unsaturated monomers capable of forming water soluble homopolymers.
    Type: Grant
    Filed: March 12, 1997
    Date of Patent: January 5, 1999
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Alfred B. Fant, Gary W. Visconte
  • Patent number: 5851730
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Grant
    Filed: November 26, 1997
    Date of Patent: December 22, 1998
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Patent number: 5846693
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method.
    Type: Grant
    Filed: February 10, 1998
    Date of Patent: December 8, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5817444
    Abstract: Proposed is a novel chemical-sensitization positive-working photoresist composition suitable for fine patterning of a resist layer in the manufacture of electronic devices. The composition is advantageous in various properties of photoresist composition without little dependency on the nature of the substrate surface, on which the photoresist layer is formed, with or without an antireflection undercoating layer. The most characteristic ingredient in the inventive composition is the film-forming resinous ingredient which is a combination of a first polyhydroxystyrene resin substituted by tetrahydropyranyl groups for the hydroxyl groups and a second hydroxystyrene resin substituted by alkoxyalkyl groups for the hydroxyl groups in a specified weight proportion of the first and second resins.
    Type: Grant
    Filed: September 11, 1997
    Date of Patent: October 6, 1998
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kazufumi Sato, Kazuyuki Nitta, Akiyoshi Yamazaki, Yoshika Sakai, Toshimasa Nakayama
  • Patent number: 5814438
    Abstract: An ultraviolet absorbing compound of formula (I) below, and photographic elements containing such a compound as an ultraviolet absorber: ##STR1## wherein: R.sub.1 -R.sub.4 independently is a hydrogen atom, a halogen atom such as fluoro, chloro, bromo, iodo or a combination thereof; a carbalkoxy group having at least one asymmetric carbon or asymmetric silicon atom; an alkoxy group having at least one asymmetric carbon or asymmetric silicon atom, with the proviso that R.sub.2 or R.sub.3, or both R.sub.2 and R.sub.3 are other than hydrogen;A* is a group having a carbon atom directly attached to 2'-hydroxyphenyl ring at the 5'-position which contains at least one asymmetric carbon atom or an asymmetric silicon atom, and;wherein the ultraviolet absorbing compound of formula (I) is a mixture of two enantiomers about the asymmetric carbon or silicon atom of A*.
    Type: Grant
    Filed: February 13, 1997
    Date of Patent: September 29, 1998
    Assignee: Eastman Kodak Company
    Inventors: Lal C. Vishwakarma, Glenn M. Brown, Barry F. Briffa
  • Patent number: 5803929
    Abstract: An ultraviolet absorber comprising, as an effective component, a benzotriazole compound represented by the following general formula (I) ##STR1## wherein R represents hydrogen, methyl, ethyl or phenyl. The ultraviolet absorber undergoes minimal sublimation, has excellent thermal resistance, provides satisfactory light fastness for materials made of polyester-based synthetic fibers, particularly cation-dyeable polyester-based fibers, and is also inexpensive, generates few by-products and is easy to produce industrially.
    Type: Grant
    Filed: March 20, 1997
    Date of Patent: September 8, 1998
    Assignee: Nicca Chemical Co., Ltd.
    Inventors: Hajime Saito, Masahiro Makino
  • Patent number: 5786133
    Abstract: A photographic element is disclosed comprising a support bearing at least one photosensitive layer and an antistatic layer comprising a binder, vanadium pentoxide, and an aromatic ketone ultraviolet absorbing compound. The antistatic layer provides the properties of UV absorbance and antistatic protection, which properties are retained after photographic processing. Specifically, in accordance with preferred embodiments, a layer providing a surface and volume resistivity of less than about 10.sup.8 ohm/cm coupled with an optical density of greater than about 1.0 from 300-400 nm and less than about 0.03 as measured in orthochromatic light is provided. The layer composition components are soluble in common coating solvents, compatible with each other, and do not produce any adverse sensitometric effects either in the raw state, during or after processing of the film itself.
    Type: Grant
    Filed: November 19, 1996
    Date of Patent: July 28, 1998
    Assignee: Eastman Kodak Company
    Inventor: Thomas M. Smith