Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.

Abstract: Ultraviolet absorbing compounds of formula (I) and photographic elements containing such compounds: ##STR1## wherein: R.sub.4 is a bivalent linking group; the benzo or phenyl ring shown may be further substituted or unsubstituted;L is a bivalent linking group;p is 0 or 1;A* is an alkyl group having an asymmetric carbon or silicon atom, and;wherein the ultraviolet absorbing compound of formula (I) is a mixture of two enantiomers about the asymmetric carbon or silicon of A*.

Abstract: The present invention provides a bottom anti-reflective coating compositions having a very low level of metal ions and a process for producing such compositions utilizing specially treated ion exchange resins. The present invention also provides photoresists produced using such bottom anti-reflective coating compositions and a method for producing semiconductor devices using such photoresists.

Abstract: A silver halide color photographic material improved in color forming properties and light fastness of color image is disclosed, comprising a support having thereon a light-sensitive silver halide emulsion layer and a nonlight-sensitive layer, wherein the nonlight-sensitive layer contains a UV absorbent and the silver halide emulsion layer contains a polyhydric alcohol.

Abstract: A method for dispersing a water-insoluble phase containing a hydrophobic, photographically useful compound in water or a hydrophilic colloid composition using an anionic surface active agent is disclosed, which comprises dispersing the hydrophobic, photographically useful compound by using an anionic surface active agent having a hydrophobic group and a group represented by --SO.sub.3 M or --OSO.sub.3 M (where M represents a cation) and a specific phosphorus-containing surface active compound, or, adding the anionic surface active agent for dispersion, and after the completion of dispersion further adding the specific phosphorus-containing surface active compound. According to the dispersion method of the present invention, a dispersion favored with maintenance of fine particle performance at the dispersion and free of grain growth during aged storage or generation of coarse grains or precipitated crystals can be obtained.

Abstract: A silver halide color photographic material having excellent color absorption characteristics and good yellow density is achieved by using a support having thereon at least one yellow coloring light-sensitive layer, at least one magenta coloring light-sensitive layer, and at least one cyan coloring light-sensitive layer, wherein the magenta coloring light-sensitive layer contains at least one dye-forming coupler represented by the following formula (M-I), at least one high boiling point organic solvent having a dielectric constant of 6.0 or less and a refractive index of 1.50 or less, and at least one benzotriazole ultraviolet absorber: ##STR1## wherein R.sub.1 represents a branched or aromatic group represented by the formulas (Q-1), (Q-2) or (Q-3); R.sub.2 and R.sub.3 each represents a substituent; n represents an integer of form 0 to 4, and when n is 2 or more, the plurality of R.sub.

Abstract: Disclosed is a silver halide color photographic material containing at least one pyrazolotriazole magenta of formula (I) and at least one 1,3,5-triazine compound of formula (II) in the same photographic constitutive layer. ##STR1## wherein R represents a hydrogen atom or a substituent; Za, Zb and Zc each represent a methine group, a substituted methine group, .dbd.N-- or --NH--; Y represents a hydrogen atom or a group capable of splitting off from the formula by coupling reaction with an oxidation product of a developing agent; and the formula may form a dimer or a higher polymer via R, Y or the substituted methine group for Za, Zb or Zc. ##STR2## wherein A, B and C each represent a substituted or unsubstituted alkyl, substituted or unsubstituted aryl, substituted or unsubstituted alkoxy, substituted or unsubstituted aryloxy or substituted or unsubstituted heterocyclic group, provided that at least one of A, B and C represents a group of a general formula (III): ##STR3## wherein R.sub.1 ' and R.sub.

Abstract: There is disclosed a silver halide color photographic light-sensitive material which excels in a color reproduction and a light fastness at a low density part through a high density part and which is improved in a Y-stain at a background part. The silver halide color photographic light-sensitive material comprises a support and provided thereon at least one photographic constitutional layer, wherein at least one layer of the above photographic constitutional layers contains at least one of the compounds represented by the following Formula (I) and a compound represented by the following Formula (II) in the same layer: ##STR1## wherein R represents a hydrogen atom or a substituent; Z.sub.a, Z.sub.b, and Z.sub.c each represent any group of methine, substituted methine, .dbd.N--, or --NH--; Y represents a hydrogen atom or a group capable of splitting off upon a coupling reaction with an oxidation product of a developing agent; provided that a dimer or a polymer may be formed via R, Y, or Z.sub.a, Z.sub.b or Z.

Abstract: A novel dye and photographic element comprising the dye are detailed. The dye is especially useful as an antihalation dye in a photographic element. A particularly preferred embodiment is provided in a photographic element comprising an absorbing amount of the dye: ##STR1## wherein X1, X2 independently represents --CR.sup.8 R.sup.9 --, --S--, --Se--, --NR.sup.10 --, --CH.dbd.CH-- or --O--;R.sup.1 and R.sup.2 independently represent alkyl of 1 to 10 carbons or substituted alkyl of 1 to 10 carbons;R.sup.3 represents a ring chosen from the set consisting of aromatic ring of 6 or 10 carbons, substituted aromatic ring of 6 or 10 carbons, a heterocyclic ring and a substituted heterocyclic ring;R.sup.4, R.sup.5, R.sup.6 and R.sup.7 independently represent hydrogen, alkyl of 1-10 carbons, substituted alkyl of 1-10 carbons;R.sup.8, R.sup.9 independently represent alkyl of 1-10 carbons, substituted alkyl of 1-10 carbons, aromatic ring of 6 or 10 carbons, substituted aromatic ring of 6 or 10 carbons;R.sup.

Abstract: Improved photographic properties are obtained if the photographic silver halide material contains a copolymer with polypeptide segments, wherein the polypeptide segments are derived from polypeptides with an average molecular weight M.sub.w of 2000 to 40000.

Abstract: An ultraviolet absorbing compound of formula (I) below, and photographic elements containing such a compound as an ultraviolet absorber: ##STR1## wherein: R.sub.4 is H or an alkyl group, and the benzo or phenyl ring shown may be further substituted or unsubstituted;X is --C(O)O-- wherein the carbonyl carbon is bonded to the N of NR.sub.4, or X is --SO.sub.2 --;L is a bivalent linking group;p is 0 or 1;A* is an alkyl group having an asymmetric carbon or silicon atom, and;wherein the ultraviolet absorbing compound of formula (I) is a mixture of two enantiomers about the asymmetric carbon or silicon of A*.

Abstract: An improvement is proposed in a double-coated patterning plate, which consists of a substrate, an undercoat levelling layer and a photoresist layer thereon, as well as in the patterning method therewith. Different from conventional double-coated patterning plate in which the undercoat levelling layer is formed from poly(methyl methacrylate) resin, the layer in the invention is formed from a copolymeric resin of methyl methacrylate and glycidyl methacrylate in a specified copolymerization ratio and the resin is admixed with 2,2',4,4'-tetrahydroxybenzophenone. By virtue of the use of this unique resin composition for the undercoat levelling layer, the troubles due to intermixing between the undercoat levelling layer and the photoresist layer thereon can be avoided to impart the patterned resist layer with excellent properties.

Abstract: Novel UV absorbers of the bis- or tris-2'-hydroxyphenyltriazine type and their use in photographic materials, inks or recording materials for ink-jet printing, and surface coatings are described which conform to the formula ##STR1## in which the radicals R.sub.1 and R.sub.9 are as defined in claim 1.

Abstract: Yellowing of a processed photographic element is inhibited by incorporating a scavenger compound capable of reacting with magenta coupler, e.g. an epoxy compound, in a layer adjacent a layer containing the magenta coupler. At least one of these layers contains a solubilizing agent for the scavenger compound. In preferred embodiments, the processing solution used to process the photographic element contains an external solubilizing agent for the scavenger compound, preferably benzyl alcohol.

Abstract: Disclosed is a silver halide color photographic material. The material comprises a support having thereon at least one photosensitive silver halide emulsion layer and at least one non-photosensitive hydrophilic colloid layer.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, forms the anti-reflective layer with these conditions and forms a resist pattern using a novel anti-reflective layer.

Abstract: A method of determining an optimum condition of an anti-reflective layer upon forming a resist pattern by exposure with a monochromatic light, a method of forming the anti-reflective layer therewith and a method of forming a resist pattern using a novel anti-reflective layer obtained therewith. The optimum condition of the anti-reflective layer is determined and the anti-reflective layer is formed by the methods described below. Further, an optimal anti-reflective layer is obtained by the method which is used for forming the resist pattern.

Abstract: A silver halide photographic material having at least one silver halide light-sensitive emulsion layer on at least one side of a support, wherein said silver halide emulsion layer comprises tabular silver halide grains having a grain thickness of 0.3 .mu.m or less and accounting for at least 50% of the total projected area, and a phthalocyanine blue pigment having a maximum absorption wave length of from 640 to 700 nm is present in said silver halide emulsion layer and/or in another hydrophilic layer of the photographic material.

Abstract: Disclosed is a multilayer color photographic element comprising a support having coated thereon photographic silver halide emulsion layers, the layers including blue sensitive, green sensitive and red sensitive layers, the photographic element comprising at least one of a bleach accelerating releasing coupler and a bleach accelerating silver salt in at least one layer of the photographic element and a layer containing finely divided silver. An interlayer is disposed between the layer containing finely divided silver and a layer containing dye forming coupler.

Abstract: Disclosed is a silver halide color photographic material having at least one non-coloring layer. The layer contains (i) at least one water-insoluble polymer having a number average molecular weight of less than 2000, which is obtained obtained by polymerizing at least one monomer having an aromatic group, and optionally contains (ii) at least one UV absorbent selected from 2-(2'-hydroxyphenyl)benzotriazoles, benzophenones and triazines and (iii) at least one high boiling point organic solvent having a refractive index of 1.50 or less. The photographic material has high light fastness.

Abstract: An ultraviolet absorbing monomer of formula (A): ##STR1## wherein: R.sub.4 and R.sub.5 are, independently, a substituted or unsubstituted alkylene with or without intervening oxygen, sulfur or nitrogen atoms; R.sub.6 is H or a substituted or unsubstituted methyl; and the benzo ring, the hydroxy substituted phenyl ring and the phenyl ring of the styryl group may be further substituted or unsubstituted. A method of making such monomers and photographic elements containing UV absorbing polymers formed from such monomers are also provided.

Abstract: Disclosed is a method for processing color photographic materials having a layer structure in which a cyan color-forming layer is disposed on the upper side of a pyrazoloazole type magenta coupler-containing magenta color-forming layer. A layer which does not contain any hydroquinones but contains a ultraviolet absorbent is provided above the cyan coupler-containing silver halide emulsion layer having a high chloride content, while below the cyan coupler-containing emulsion layer is provided another layer containing hydroquinones but not containing any ultraviolet absorbent. These materials are processed rapidly with a color developer under a reduced replenishment condition, wherein the amount of a color developer replenished is controlled to below 120 ml/m.sup.2, to provide color images fast to light and free from bluish unevenness in the edge part thereof.

Abstract: A thermally developable color photosensitive material comprises a support, having thereon a photosensitive silver halide, a binder, an electron transfer agent, an electron donor, and a reducible dye donating compound which is capable of being reduced and releasing a diffusible dye, wherein the reducible dye donating compound and a compound represented by the following formula (1) are present together in the form of an emulsified dispersion in the binder.

Abstract: An inexpensive, ballasted optical brightener for use in photographic elements is prepared by reacting an optical brightener of the formula ##STR1## where M is a cation; X is a group capable of undergoing nucleophilic displacement; and Z is ##STR2## or --O--R.sub.3, where each of R1 and R2 is a hydrogen atom, or an aromatic group which can be unsubstituted or substituted with one or more groups unreactive towards X; and R3 is an aromatic group which can be unsubstituted or substituted with one or more groups unreactive towards Xwith a water soluble polymer, such as gelatin. The resulting ballasted optical brightener is stable in aqueous photographic compositions.

Abstract: A photographic element comprising a UV absorbing polymer latex which is loaded with a non-polymeric UV absorbing compound. The polymer is a homopolymer or heteropolymer comprising monomeric units containing a 2-hydroxybenzotriazole. The benzotriazole preferably is of the formula I: ##STR1## wherein: the phenyl ring and benzo ring are optionally additionally substituted; and one of m and n is 1, and M and N have the formula: ##STR2## wherein R3 is H or an alkyl group; L is a bivalent linking group; and p is 0 or 1. The elements may additionally have a polmer present (which is preferably different from the UV absorbing polymer) which has a glass transition temperature (T.sub.g) of less than 5.degree. C.

Abstract: The invention discloses a continuous method of manufacture of gelled dispersion melts of "small-particle" microprecipitated photographic agents. The continuous melt manufacturing process of this invention provides dispersion melts that are invariant in agent concentration, melt viscosity, and turbidity as a function of the run time and are also very reproducible and robust in repetitive preparations. Many photographic melts of this invention exhibit high photographic activity and light stability of the agents when exposed to light.

Abstract: A photographic element with particular polymeric ultraviolet absorbers. The ultraviolet absorbers have repeating units of the formula: ##STR1## wherein: X is O or NH;Y is H or halogen;R.sub.1 is selected from the group consisting of H, halogen, alkoxy , straight chain or branched alkyl group of 1 to 8 carbons;R.sub.2 is C.sub.2 -C.sub.10 alkylene which may be straight chain or branched; andR.sub.3 is H or CH.sub.3.Elements of the invention have good fresh Dmin and image dye stability, and the ultraviolet absorbers therein are highly light stable.

Abstract: A heat-developable photosensitive material is disclosed which has a support and a photosensitive layer containing at least an organic silver salt, a silver halide and a reducing agent, a water-soluble polymeric layer containing a water-soluble polymeric material, and a hydrophobic polymeric layer containing a hydrophobic polymeric material.

Abstract: A photographic element for processing in moderate to large volume photofinishing baths and comprising one and only one dimensionally stable coating support, and coated thereon in reactive association an imaging layer containing radiation sensitive silver halide, a diffusible-dye forming layer containing a diffusible-dye forming compound, and a barrier layer overlaying said diffusible-dye forming layer is disclosed. This coating support is selected from reflection base and transparent base materials, and this diffusible-dye forming layer may be the same or different than this imaging layer. This barrier layer contains a polymer that allows the passage of solutions for processing when this element is contacted with an external processing bath, and impedes the diffusion out of this element of the diffusible dye formed from this diffusible-dye forming compound.

Abstract: A silver halide color photographic light-sensitive material includes at least one light-sensitive silver halide emulsion layer and an outermost protective layer on a support. The protective layer contains an acid polymer having a carboxyl, phosphoric acid and/or sulfonic group, and a matting agent formed of particles of a copolymer of methyl methacrylate, ethyl acrylate and methacrylic acid having a specified molar ratio of the repeating units. Also, at least one protective layer contains an ultraviolet absorbent.

Abstract: A composition and a method for forming an anti-reflective layer for DUV microlithographic processes is disclosed. The compositions of the present invention includes a polymer dissolved in a suitable solvent. The polymers are polysulfone and polyurea polymers which possess inherent light absorbing properties at deep ultraviolet wavelengths. In accordance with the method of the present invention, these compositions are applied to a substrate to form an anti-reflective coating, and thereafter a photoresist material that is compatible with the anti-reflective coating is applied.

Abstract: A lightsafe masking film is disclosed which includes a transparent substrate, and a transparent, lightsafe layer peelably provided over the surface of the substrate and containing a light yellow colorant and a blue colorant so that the color of the lightsafe layer is light green. The spectral transmittance of the lightsafe layer does not exceeds 1% in the wavelength region of between 350 nm and L.sub.max, wherein L.sub.max is 420 nm or more, but exceeds 1% in the wavelength region of longer than L.sub.max with the maximum spectral transmittance of the lightsafe layer in the wavelength region of 500-570 nm being greater than 50%. The light green masking film is suitably used together with a conventional yellow or amber masking film for masking a photosensitive material in photomechanical reproduction process.

Abstract: A silver halide photographic photosensitive material comprising a support, at least one silver halide emulsion layer on the support, a non-photosensitive hydrophilic colloid layer provided between the support and the at least one silver halide emulsion layer, and a backing layer provided on the side of the support which is opposite to the side having the at least one silver halide emulsion layer; wherein(a) the at least one silver halide emulsion layer contains silver halide grains having a grain size of not more than 0.2 .mu.m, and a silver chloride content of at least 90 mol %,(b) the non-photosensitive hydrophilic colloid layer contains a dye solid-dispersed in the form of fine crystals in the range of from 10-80 mg/m.sup.2, and(c) the backing layer has an absorbance at 340-380 nm of from 0.30-0.90. A method for processing the silver halide photographic photosensitive material is also disclosed.

Abstract: A photographic material is described which comprises, on a base, blue-sensitive, green-sensitive and/or red-sensitive silver-halide emulsion layers and if desired a protection layer, a layer containing a UV absorber being arranged between the uppermost silver-halide emulsion layer and the protection layer or on top of the uppermost silver-halide emulsion layer, wherein the UV absorber conforms to the formula ##STR1## in which the radical R.sub.1 is alkyl, substituted alkyl, alkenyl, glycidyl, cycloalkyl or phenylalkyl, and R.sub.12 is alkyl, benzyl, cyclohexyl, phenyl, substituted phenyl or alkoxy.

Abstract: A photoresist composition which comprises a compound of the general formula: ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are the same or different and represent a hydrogen atom, a hydroxyl group, --OCOR.sub.4, --O--R.sub.5, --OSi(R.sub.6).sub.3, a halogen atom, an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted phenyl group or an optionally substituted aralkyl group; R.sub.4, R.sub.5 and R.sub.6 represent an optionally substituted lower alkyl group or an optionally substituted phenyl group; X and Y are the same or different and represent --CN, --COOR.sub.7, --CONR.sub.8 R.sub.9, ##STR2## R.sub.7 represents an alkyl group; R.sub.8 and R.sub.9 are the same or different and represent a hydrogen atom, an optionally substituted alkyl or phenyl group; R.sub.

Abstract: There is disclosed a positive type photoresist composition comprising an alkali-soluble resin, a compound having a 1,2-naphthoquinonediazido group, and at least one light absorbing agent selected from the group consisting of the compounds represented by the following formulae [I] and [II], the content of said light absorbing agent being in the range of 0.1 to 10% by weight based on the total solid content of the composition: ##STR1## wherein X represents a hydrogen atom, a halogen atom, an alkyl group, an aralkyl group, an alkoxy group, an acyl group, or an aryl group; Y represents a single bond, an alkylene group, --O--, --S--, --SO.sub.2 --or ##STR2## R represents a hydrogen atom, an alkyl group, or an aralkyl group; m represents an integer from 1 to 3; and n represents an integer from 1 to 4. The content of light absorbing agent in said composition is in the range of from 0.3% by weight to 5% by weight, based on the total solid content of the composition.

Abstract: A silver halide color photographic material comprising a support having thereon a yellow color forming silver halide emulsion layer, a magenta color forming silver halide emulsion layer and a cyan color forming silver halide emulsion layer. The yellow color forming emulsion layer contains a silver halide emulsion having a silver chloride content of not less than 90 mol %, a yellow coupler and a bisphenol compound and optionally a difficultly water-soluble epoxy compound. One or more layers of the light-sensitive material may contain an ultraviolet light absorber.

Abstract: The present invention provides a silver halide photographic photosensitive material which comprises a transparent support and a silver halide emulsion photosensitive layer provided thereon and a non-photosensitive layer on another side of the support on which the photosensitive layer is not provided, wherein both the photosensitive layer and the non-photosensitive layer contain dyes respectively and transmission density at 350-400 nm of the dye in the photosensitive layer is 0.15 or less and transmission density at 350-400 nm of the dye in the non-photosensitive layer is 0.40 or more.

Abstract: Disclosed is a silver halide color photographic material. The material comprises a support having thereon at least one photosensitive silver halide emulsion layer and at least one non-photosensitive hydrophilic colloid layer.

Abstract: A silver halide color photographic material comprises a support having thereon at least one silver halide emulsion layer. At least one layer of silver halide emulsion layer contains at least one pyrrolotriazole cyan coupler of formula (I) or (II) and at least one lipophilic compound selected from the group consisting of phenol compounds of formula (A), sulfur peroxide compounds of formula (B) and amide compounds of formula (C): ##STR1## wherein the substituents are as defined in the specification.

Abstract: A composition, useful for its excellent resolution, sensitivity, development properties, and heat resistance, having an alkali soluble resin and a quinonediazide compound as essential ingredients, and further containing at least one polyhydroxy compound represented by the following formula (I) or (II): ##STR1## wherein R's, which may be the same or different, each represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group, an alkoxy group or --CH.sub.2 N--(--CH.sub.2 COOH).sub.2 ; X represents a --C(.dbd.O)-- group or an --SO.sub.2 -- group; m is an integer of 1 to 3; and n is an integer of 1 to 4.

Abstract: UV-sensitive negative acting silver halide photographic elements for contact processes which can be safely handled under white light and have increased UV exposure latitude, said elements comprising a support base, a hydrophilic colloidal silver halide emulsion layer comprising UV sensitive negative acting silver halide grains, and one or more hydrophilic colloidal layers, wherein said silver halide emulsion is reactively associated with a water-removable UV-absorbing compound having at least 80% of the absorption in the range from 350 to 400 micronmeter.

Abstract: A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.

Abstract: Compounds of the formula ##STR1## wherein R.sub.o, is hydrogen or alkylene-COOR where R is alkyl or hydroxyalkyl, R.sub.1 is hydrogen, alkyl, hydroxyalkyl, alkenyl or acyl, R.sub.2 and R.sub.3 are independently hydrogen, alkyl, alkenyl or alkoxy, R.sub.6 is hydrogen or alkyl, and X is --CH.sub.2 --, --NH--, --S-- or --O--, are suitable as UV absorbers for use in photosensitive organic materials in combination with a sterically hindered amine or hydroxyphenylbenzotriazole derivative.

Abstract: A photographic material is described which comprises, on a base, blue-sensitive, green-sensitive and/or red-sensitive silver-halide emulsion layers and, if desired, a protection layer, a layer containing a UV absorber being arranged between the uppermost silver-halide emulsion layer and the protection layer, or on top of the uppermost silver-halide emulsion layer, wherein the UV absorber conforms to the formula ##STR1## in which the radicals E.sub.1, E.sub.2 and E.sub.3 are independently alkyl, substituted alkyl, alkenyl, glycidyl, cycloalkyl, phenylalkyl or siloxyl.

Abstract: The invention relates to a melt for the coating of a layer in a photographic element and which contains water, gelatin and an anionically charged, hydrophobic group containing compound that is (a) water soluble or soluble in a solution of 5 to 20 percent of water miscible organic solvent,said melt being further characterized by containing an amount of an amphiphilic compound which is sufficient to reduce the viscosity of said melt, said compound selected from the class consisting of:Type A: Sugar (saccharidic) compounds, characterized by having one to three hydrophobic groups, each group containing from about 6 to about 22 carbon atoms, and having one or more attached hydrophilic mono- or oligosaccharidic hydrophilic chains that may or may not be terminated by a negatively charged group such as a sulfate, sulfonate or a carboxyl group; andType B: Compounds compromising a hydrophobic group having from about 6 to about 22 carbon atoms and having one or two attached hydrophilic chains comprising at least 4 oxyet

Abstract: A solid particle aqueous dispersion of a compound useful in imaging is prepared by milling an aqueous slurry of the compound in the presence of a fluorosurfactant. The resulting dispersion has improved stability to particle growth.

Abstract: A direct positive type silver halide photographic light-sensitive material is disclosed, having improved safelight stability and which is capable of providing an image having excellent photographic properties. The light-sensitive material comprises a support having thereon at least one pre-fogged light-sensitive silver halide emulsion layer and at least one light-insensitive hydrophilic colloid layer provided farther from the support than the light-sensitive silver halide emulsion layer. The light-insensitive hydrophilic colloid layer contains a dye dispersed therein in the form of microcrystalline particles.

Abstract: Compounds of formula ##STR1## wherein R.sub.1 is hydrogen, alkyl, phenylalkyl or cyclohexyl, R.sub.2 is alkyl, phenylalkyl, cyclohexyl, alkoxy or hydroxyalkoxy, and R.sub.3 is phenyl or substituted phenyl, are very suitable for use as UV absorbers in photographic materials with transparent substrates.

Abstract: A photographic element is described havinga photographic support;a green sensitive silver halide emulsion layer on the photographic support and having a magenta dye-forming coupler, anda filter layer on the photographic support and associated with the green sensitive layer, wherein the magenta dye-forming coupler is a 2-equivalent magenta dye-forming coupler, and the filter layer includes a filter dye molecule having the formula:D.dbd.CH--M (I)wherein D is a group which, with the remainder of the molecule, forms a dye having an absorption maximum in the blue or green region of the visible spectrum, andM is a five-membered or six-membered unsaturated heterocyclic ring, which may be fused with another five-membered or six-membered ring system, and which is unsubstituted or substituted with a lower alkyl group having from 1 to 10 carbon atoms, or an electron withdrawing group.