Polyamide Or Polyurethane Patents (Class 430/906)
  • Patent number: 10781337
    Abstract: Disclosed is a composition for improving the corrosion resistance of metals coated with 2K coatings. The composition comprises the reaction product of an aromatic sulfonyl isocyanate and an alcohol or polyol monomer. Also disclosed is a method of improving the corrosion resistance of metals coated with 2K coatings by the addition of a sulfonyl urethane-alcohol composition reaction product of an aromatic sulfonyl isocyanate and a mono-alcohol or poly-alcohol.
    Type: Grant
    Filed: July 26, 2018
    Date of Patent: September 22, 2020
    Assignee: Eastman Chemical Company
    Inventors: Geoffrey Richard Webster, Jr., Joseph Connell Tilly
  • Patent number: 8932801
    Abstract: The present invention relates to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemistry resistance, and flexibility, and can be used as a liquid photo resist or dry film resist, or used in a solder resist, coverlay film, or printed wiring board.
    Type: Grant
    Filed: January 16, 2009
    Date of Patent: January 13, 2015
    Assignee: Eternal Chemical Co., Ltd.
    Inventors: Meng-Yen Chou, Chuan Zong Lee
  • Patent number: 8927195
    Abstract: A photosensitive composition includes (A) a polyurethane obtained by reacting a diol component including a compound represented by the following Formula (I) with a polyisocyanate component; and (B) a photosensitive component. In Formula (I), A represents a single bond, or a divalent linking group including an atom selected from the group consisting of a carbon atom, a hydrogen atom, and an oxygen atoms; B represents a monovalent organic group; each of R1 to R5 independently represents a hydrogen atom or an alkyl group; m represents an integer from 0 to 3; n represents an integer from 0 to 3; and m+n is not zero.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: January 6, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Takashi Aridomi
  • Patent number: 8921019
    Abstract: Disclosed are a positive photosensitive resin composition that includes (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a phenol compound, (D) at least one organic dye having an absorption wavelength of about 400 nm to about 700 nm, and (E) a solvent, wherein the organic dye (D) is included in an amount of about 1 to about 40 parts by weight based on about 100 parts by weight of the alkali soluble resin (A), and a photosensitive resin layer and a display device using the same.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: December 30, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Yun Kwon, Jin-Hee Kang, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Eun-Kyung Yoon, Jong-Hwa Lee, Jun-Ho Lee, Jin-Young Lee, Hwan-Sung Cheon, Hyun-Yong Cho, Chung-Beom Hong, Eun-Ha Hwang
  • Patent number: 8911928
    Abstract: A resist composition including a base component (A) that exhibits changed solubility in a developing solution under action of acid and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1)) containing an acid decomposable group that exhibits increased polarity under action of acid, and the amount of the structural unit (a0) is less than 50 mol %, wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; R1 represents a divalent linking group; R2 represents a —SO2— containing cyclic group; and v represents 0 or 1.
    Type: Grant
    Filed: May 22, 2012
    Date of Patent: December 16, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tomoyuki Hirano, Daiju Shiono, Daichi Takaki, Junichi Tsuchiya
  • Patent number: 8871422
    Abstract: A negative-type photosensitive resin composition which is good in sensitivity and resolution, a pattern forming method by the use thereof wherein a pattern which can be developed in an alkali aqueous solution, is excellent in sensitivity, resolution and heat resistance and has a good shape is obtained, and highly reliable electronic parts are provided. The negative-type photosensitive rein composition includes (a) a polymer that has a phenolic hydroxyl group at a terminal and is soluble in the alkali aqueous solution, (b) a compound that generates an acid by irradiating active light, and (c) a compound that can be crosslinked or polymerized by an action of the acid.
    Type: Grant
    Filed: June 20, 2006
    Date of Patent: October 28, 2014
    Assignee: Hitachi Chemical DuPont Microsystems Ltd.
    Inventor: Tomonori Minegishi
  • Patent number: 8859170
    Abstract: Disclosed are: a photosensitive modified polyimide resin composition having photo-fabrication property, which is excellent in the electric properties and adhesion as well as in the heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; a resin film formed from the composition; and a printed circuit board, flexible printed circuit board (FPC) and the like which comprises the film as an insulating protective film and/or interlayer insulation film. The photosensitive modified polyimide resin composition comprises a modified polyimide of a specific structure having a flexible structure such as polycarbonate; a photosensitizer; a curing agent; and a solvent.
    Type: Grant
    Filed: April 30, 2010
    Date of Patent: October 14, 2014
    Assignee: PI R&D Co., Ltd.
    Inventors: Toshiyuki Goshima, Maw Soe Win, Sigemasa Segawa, Eika Kyo
  • Patent number: 8765353
    Abstract: A resist composition includes: a crosslinking material that is crosslinked in the presence of an acid; an acid amplifier; and a solvent.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: July 1, 2014
    Assignee: Sony Corporation
    Inventors: Koji Arimitsu, Nobuyuki Matsuzawa, Isao Mita
  • Patent number: 8735029
    Abstract: Disclosed are a positive photosensitive resin composition including (A) an alkali soluble resin including a polybenzoxazole precursor, a polyimide precursor, or a combination thereof, (B) a photosensitive diazoquinone compound, (C) a compound represented by the following Chemical Formula 1, and (D) a solvent, and a display device and an organic light emitting device using the same. The Chemical Formula 1 is the same as defined in the detailed description.
    Type: Grant
    Filed: September 5, 2012
    Date of Patent: May 27, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Eun-Kyung Yoon, Eun-Ha Hwang, Jong-Hwa Lee, Ji-Yun Kwon, Dae-Yun Kim, Sang-Kyeon Kim, Sang-Kyun Kim, Sang-Soo Kim, Kun-Bae Noh, Jun-Ho Lee, Jin-Young Lee, Hyun-Yong Cho, Chung-Beom Hong
  • Patent number: 8735046
    Abstract: A polymer obtained from copolymerization of a recurring unit having a carboxyl group and/or phenolic hydroxyl group substituted with an acid labile group with a methacrylate having a phenolic hydroxyl-bearing pyridine is useful as a base resin in a positive resist composition. The resist composition comprising the polymer is improved in contrast of alkali dissolution rate before and after exposure, acid diffusion control, resolution, and profile and edge roughness of a pattern after exposure.
    Type: Grant
    Filed: November 21, 2011
    Date of Patent: May 27, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Patent number: 8728705
    Abstract: A negative photosensitive material is provided which has a lower linear expansion coefficient and a lower hygroscopic expansion coefficient and is excellent in gradational patternability and PI etchability in patterning.
    Type: Grant
    Filed: May 27, 2010
    Date of Patent: May 20, 2014
    Assignee: Nitto Denko Corporation
    Inventors: Katsutoshi Hirashima, Hirofumi Fujii, Yasushi Tamura, Ryouji Suezaki
  • Patent number: 8703367
    Abstract: A positive photosensitive resin composition includes: (A) a polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a polyamic acid ester compound; and (E) a solvent. The positive photosensitive resin composition can reduce film shrinkage, can have high sensitivity, high resolution, and excellent residue removal properties, and can provide good pattern shapes.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: April 22, 2014
    Assignee: Cheil Industries Inc.
    Inventors: Hyun-Yong Cho, Doo-Young Jung, Yong-Sik Yoo, Ji-Young Jeong, Jong-Hwa Lee, Min-Kook Chung, Kil-Sung Lee, Myoung-Hwan Cha
  • Patent number: 8685618
    Abstract: A resist composition having; (A1) a resin having a structural unit represented by the formula (I), (A2) a resin having a structural unit represented by the formula (II) and being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I) and (B) an acid generator. wherein R1, A1, A13, X12, A14, R3 and ring X1 are defined in the specification.
    Type: Grant
    Filed: July 18, 2012
    Date of Patent: April 1, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Akira Kamabuchi
  • Patent number: 8685620
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R1 represents a sulfur atom or an oxygen atom; R2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.
    Type: Grant
    Filed: November 6, 2012
    Date of Patent: April 1, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daichi Takaki, Daiju Shiono, Yoshiyuki Utsumi, Takaaki Kaiho
  • Patent number: 8673537
    Abstract: The invention relates to a photo-curable resin composition, which contains a polyimide silicone having a primary alcoholic hydroxyl group, as a component (A); at least one compound selected from the group consisting of an amino condensation product modified with formalin or a formalin-alcohol and a phenol compound having two or more in average of methylol group or alkoxymethylol group in one molecule thereof, as a component (B); and a photo-acid generator as a component (C). When used as an adhesive, the photo-curable resin composition further contains a multifunctional epoxy compound as a component (D).
    Type: Grant
    Filed: December 9, 2010
    Date of Patent: March 18, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Furuya, Michihiro Sugo, Hideto Kato, Kazunori Kondo, Shohei Tagami, Tomoyuki Goto
  • Patent number: 8669038
    Abstract: Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings.
    Type: Grant
    Filed: August 7, 2012
    Date of Patent: March 11, 2014
    Assignee: LG Chem, Ltd.
    Inventors: Chan Hyo Park, Sang Woo Kim, Kyung Jun Kim, Hye Ran Seong, Se Jin Shin, Dong Hyun Oh
  • Patent number: 8568954
    Abstract: A positive photosensitive resin composition according to one embodiment of the present invention includes a polyamic acid or a polyamic acid ester compound including a repeating unit represented by Formula 1 defined in this specification, a photosensitive diazoquinone compound, a silane compound, a phenol compound, and a solvent. The positive photosensitive resin composition can be cured at a low temperature of 260° C. or less, and can have high sensitivity, resolution, residue removal, substrate adherence, and pattern-forming capabilities, and low film shrinkage.
    Type: Grant
    Filed: September 17, 2010
    Date of Patent: October 29, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Doo-Young Jung, Ji-Young Jeong, Hyun-Yong Cho, Yong-Sik Yoo, Kil-Sung Lee, Myoung-Hwan Cha
  • Patent number: 8551687
    Abstract: The present invention relates to a polyimide photosensitive resin composition that is capable of being developed by an alkali aqueous solution, and a dry film that is produced by the same, and more particularly to a photosensitive resin composition which comprises a) a polyamic acid, b) two or more (meth)acrylate—based compounds that include one or more double bonds between carbons, c) a photopolymerization initiator, d) a phosphorus—based flame retardant, and e) an organic solvent, and a dry film that is produced by the same.
    Type: Grant
    Filed: August 20, 2008
    Date of Patent: October 8, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Kwang-Joo Lee, Heon-Sik Song, You-Jin Kyung, Joo-Eun Ko, Jung-Il Yoon, Jung-Jin Shim
  • Patent number: 8450041
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes (A) a compound capable of generating a specific acid having a norbornyl structure upon irradiation with an actinic ray or radiation, and (B) a resin capable of increasing the dissolution rate of the resin (B) in an alkali developer by an action of an acid, the resin (B) containing a specific repeating unit having a lactone structure on the resin side chain through a linking group, and a pattern forming method uses the composition.
    Type: Grant
    Filed: January 15, 2010
    Date of Patent: May 28, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Shuhei Yamaguchi
  • Patent number: 8420287
    Abstract: Disclosed is a positive photosensitive resin composition that includes: (A) a polybenzoxazole precursor including a repeating unit represented by the Chemical Formula 1, a repeating unit represented by the Chemical Formula 2, or a combination thereof, and a thermally polymerizable functional group at least one terminal end of the polybenzoxazole precursor; (B) a photosensitive diazoquinone compound; (C) a silane compound; (D) a phenol compound including a cross-linking functional group; and (E) a solvent.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: April 16, 2013
    Assignee: Cheil Industries Inc.
    Inventors: Ji-Young Jeong, Min-Kook Chung, Hyun-Yong Cho, Doo-Young Jung, Jong-Hwa Lee, Yong-Sik Yoo, Jeong-Woo Lee, Hwan-Sung Cheon
  • Patent number: 8362103
    Abstract: The invention provides a resin composition which develops excellent flame retardance after curing in spite of its being free from halogen-containing compounds and antimony compounds, which are liable to cause environmental load, and which can give a film meeting the recent sever demands for higher flexing resistance and insulation reliability. Specifically, the invention provides a resin composition which comprises (A) a polyimide precursor and (B) an adduct of an organophosphorus compound represented by formula (1) with a compound having four or more (meth)acrylate groups. It is preferable that the resin composition further contain (C) a phosphazene compound.
    Type: Grant
    Filed: April 30, 2008
    Date of Patent: January 29, 2013
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
  • Patent number: 8318401
    Abstract: Disclosed is a photosensitive resin composition, comprising 0.1 to 20 parts by weight of a polygonal oligomeric silsesquioxane derivative, and 5 to 30 parts by weight of a compound generating acid by light, based on 100 parts by weight of a polyamide derivative.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: November 27, 2012
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Seok Chan Kang, Jin Han Lee
  • Patent number: 8304149
    Abstract: A photosensitive polymer composition, having (a) a polymer selected from polyimide precursors and polyimides having an acid group protected by a protecting group and having no amino group (—NH2) at the end; and (b) a compound that generates an acid when exposed to light and capable of deprotecting the protecting group from the acid group, is employed to form layers of a semiconductor device.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: November 6, 2012
    Assignees: Hitachi Chemical Dupont Microsystems Ltd., Hitachi Chemical Dupont Microsystems L.L.C.
    Inventors: Masataka Nunomura, Masayuki Ooe, Hajime Nakano, Yoshiko Tsumaru, Takumi Ueno
  • Patent number: 8263308
    Abstract: A polyimide silicone having in the molecule a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group is provided. The polyimide silicone comprises the unit represented by the formula (1): wherein X is a tetravalent group at least a part of which is a tetravalent organic group represented by the formula (2): wherein R1 is a monovalent hydrocarbon group, R2 is a trivalent group, and n is an integer of 1 to 120 on average; and Y is a divalent organic group at least a part of which is a divalent organic group having a phenolic hydroxy group in which a part or all of hydrogen atoms are substituted with an acid labile group represented by the formula (3): wherein R3 and R4 are a hydrogen atom or an alkyl group, and R5 is an alkyl group, an aryl group, or an aralkyl group.
    Type: Grant
    Filed: March 11, 2010
    Date of Patent: September 11, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Shohei Tagami, Takanobu Takeda, Michihiro Sugo, Hideto Kato
  • Patent number: 8257901
    Abstract: Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings.
    Type: Grant
    Filed: March 9, 2010
    Date of Patent: September 4, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Sang Woo Kim, Chan Hyo Park, Kyung Jun Kim, Hye Ran Seong, Se Jin Shin, Dong Hyun Oh
  • Patent number: 8198002
    Abstract: Disclosed is a positive photosensitive resin composition that includes (A) a first polybenzoxazole precursor that includes: a repeating unit of Chemical Formula 1 and a thermally polymerizable functional group at at least one terminal end; (B) a second polybenzoxazole precursor that includes a repeating unit of Chemical Formula 3; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent.
    Type: Grant
    Filed: October 20, 2009
    Date of Patent: June 12, 2012
    Assignee: Cheil Industries Inc.
    Inventors: Doo-Young Jung, Ji-Young Jeong, Hyun-Yong Cho, Yong-Sik Yoo, Min-Kook Chung, Jong-Hwa Lee, Kil-Sung Lee, Myoung-Hwan Cha
  • Patent number: 8119326
    Abstract: To provide an infrared-sensitive or heat-sensitive lithographic printing plate precursor which has high printing durability and wide development latitude, and also has good developing properties capable of preventing the formation of deposits during the development. In an infrared-sensitive or heat-sensitive lithographic printing plate precursor, comprising a substrate, a first image recording layer formed on the substrate, and a second image recording layer formed on the first image recording layer, the first image recording layer contains a resin which is soluble or dispersible in an aqueous alkali solution, and the second image recording layer contains a polyurethane which has a substituent having an acidic hydrogen atom.
    Type: Grant
    Filed: June 22, 2006
    Date of Patent: February 21, 2012
    Assignee: Eastman Kodak Company
    Inventors: Masamichi Kamiya, Yasuhiro Asawa, Yasushi Miyamoto, Maru Aburano, Eiji Hayakawa
  • Patent number: 8110338
    Abstract: A heat-sensitive positive-working lithographic printing plate precursor includes a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat-sensitive coating including an IR absorbing agent, a phenolic resin, and a first polymer, wherein the first polymer is an alkaline soluble polymer including a monomeric unit having a structure according to Formula I or Formula II, wherein at least one of the aromatic groups Ar1 and Ar2 is an optionally substituted heteroaromatic group:
    Type: Grant
    Filed: February 20, 2007
    Date of Patent: February 7, 2012
    Assignee: Agfa Graphics NV
    Inventors: Johan Loccufier, Stefaan Lingier, Hubertus Van Aert, Jan Venneman, Marc Van Damme
  • Patent number: 8101333
    Abstract: The present invention provides a method for miniaturizing a pattern without seriously increasing the production cost or impairing the production efficiency. This invention also provides a fine resist pattern and a resist substrate-treating solution used for forming the fine pattern. The pattern formation method comprises a treatment step. In the treatment step, a resist pattern after development is treated with a resist substrate-treating solution containing an amino group-containing, preferably, a tertiary polyamine-containing water-soluble polymer, so as to reduce the effective size of the resist pattern formed by the development. The present invention also relates to a resist pattern formed by that method, and further relates to a treating solution used in the method.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: January 24, 2012
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Go Noya, Ryuta Shimazaki, Masakazu Kobayashi
  • Patent number: 8053161
    Abstract: A resist composition comprises: (A) a resin capable of increasing its solubility in an alkali developer by action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) has a degree of molecular weight dispersion of 1.3 or less and a weight average molecular weight of 1.0×104 or less.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: November 8, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Kenji Wada, Hiroshi Saegusa
  • Patent number: 7989140
    Abstract: A curable composition, including: a polymerizable compound (a) including an ethylenically unsaturated bond; a binder polymer (b); a radical polymerization initiator (c); and an alicyclic compound (d) including a urea bond is provided.
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: August 2, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Shigefumi Kanchiku, Tomoya Sasaki
  • Patent number: 7939241
    Abstract: The present invention relates to a novel (meth)acrylamide compound represented by the general formula (1), a (co)polymer of the (meth)acrylamide compound, and a chemically amplified photosensitive resin composition composed of the polymer and a photoacid generator. In the formula, R1 represents a hydrogen atom or a methyl group; R2 represents an acid-decomposable group; and R3 to R6 independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.
    Type: Grant
    Filed: May 12, 2006
    Date of Patent: May 10, 2011
    Assignee: NEC Corporation
    Inventors: Katsumi Maeda, Kaichirou Nakano
  • Patent number: 7935776
    Abstract: The present invention relates to a radiation curable and developable polyurethane which is characterized by having a carboxy group in its main chain and a acryloyl group in its side chain and comprising the following repeat units (I), (II), and (II) in a random arrangement: wherein R1, R2, R3, R4, and T are defined in the specification. The polyurethane has a weight molecular weight measured by GPC in a range of from 3,000 to 400,000; an acid value in a range of from 5 to 120 mgKOH/g. The present invention also relates to a radiation curable and developable composition containing the polyurethane.
    Type: Grant
    Filed: March 20, 2008
    Date of Patent: May 3, 2011
    Assignee: AGI Corporation
    Inventors: Wei Hsiang Huang, Ying Jen Chen, Jui Ming Chang, Chun Hung Kuo, Hong Ye Lin, Li Chung Chang
  • Patent number: 7932012
    Abstract: A heat resistant photosensitive resin composition having excellent film properties is provided by constituting a photosensitive resin composition containing (A) a polymer having an acid functional group and/or a substituent derived therefrom, (B) a compound having at least one substituent derived from an amine functional group, (C) a photoreactive compound, and (D) a solvent. Using this composition, a pattern with high resolution can be produced, and thus an electronic part having a high quality can be produced.
    Type: Grant
    Filed: March 31, 2004
    Date of Patent: April 26, 2011
    Assignee: Hitachi Chemical Dupont Microsystems Ltd.
    Inventors: Hiroshi Komatsu, Nagatoshi Fujieda, Hajime Nakano
  • Patent number: 7889313
    Abstract: An immersion lithography apparatus includes: a projection optical system which projects a pattern of a mask onto a substrate; a substrate cleaning unit which cleans the substrate prior to projection of the pattern; a liquid supply mechanism which supplies the same liquid to an immersion region between the projection optical system and the substrate and to the substrate cleaning unit; a first liquid discharge path through which the liquid discharged from the immersion region is passed; and a second liquid discharge path through which the liquid discharged from the substrate cleaning unit is passed.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: February 15, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Makiko Katano, Takuya Kono, Ayako Mizuno
  • Patent number: 7883827
    Abstract: The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polymerization initiator and a polymerizable compound, wherein R1 represents a hydrogen atom or a methyl group; R2 represents a linking group which includes two or more atoms selected from a carbon atom, a hydrogen atom, an oxygen atom, a nitrogen atom and a sulfur atom and has a number of atoms of 2 to 82; A represents an oxygen atom or —NR3— in which R3 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms; and n represents an integer of 1 to 5. The invention also provides a planographic printing plate precursor provided with a specific photosensitive layer with respect to an alkaline developer.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: February 8, 2011
    Assignee: FUJIFILM Corporation
    Inventors: Atsushi Sugasaki, Kazuto Kunita, Kazuhiro Fujimaki
  • Patent number: 7851121
    Abstract: There is provided a photosensitive composition including a polyimide or polyimide precursor. The polyimide and polyimide precursor of the present invention includes a group of a first acid-cleavable group, a first base-cleavable group or a first thermally-cleavable group, and another group of a hydrophilic group, or a protected hydrophilic group by a second acid-cleavable group, a second base-cleavable group, or a crosslinkable group.
    Type: Grant
    Filed: February 10, 2006
    Date of Patent: December 14, 2010
    Assignees: Central Glass Co., Ltd., Georgia Tech Research Corporation
    Inventors: Kazuhiro Yamanaka, Michael Romeo, Clifford Henderson, Kazuhiko Maeda
  • Patent number: 7820359
    Abstract: A coating composition for forming a heat-sensitive transfer image-receiving sheet provided with at least one receptor layer on a support, wherein the composition comprises a latex polymer containing a repeating unit derived from a monomer represented by formula (1); and a heat-sensitive transfer image-receiving sheet prepared by using the coating composition: wherein, R1 represents a hydrogen atom, a halogen atom or a methyl group; L1 represents a divalent linking group; R2 represents an alkylene group having 1 to 5 carbon atoms which may be further substituted; n represents an integer of 1 to 40; Z1 represents a hydrogen atom, an alkyl group having 1 to 30 carbon atoms, a cycloalkyl group, or an aryl group; and when n is 2 or more, R2s may be the same or different.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: October 26, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Toshihide Yoshitani, Takuya Arai
  • Patent number: 7811742
    Abstract: A lithographic printing plate precursor includes: a support; and a photosensitive layer containing a binder polymer containing a positively charged nitrogen atom in at least one of a main chain and a side chain of the binder polymer, a compound containing an ethylenically unsubstituted bond; and a radical polymerization initiator.
    Type: Grant
    Filed: February 22, 2008
    Date of Patent: October 12, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Yoshinori Taguchi, Keiichi Adachi, Shigekatsu Fujii
  • Patent number: 7807330
    Abstract: A heat-sensitive transfer image-receiving sheet provided with at least one receptor layer on a support, wherein the receptor layer has a polymer containing a repeating unit derived from a monomer represented by formula (1); and a coating composition for forming the heat-sensitive transfer image-receiving sheet: wherein, R1 represents a hydrogen atom, a halogen atom or a methyl group; L1 represents a divalent linking group; R2 represents an alkylene group having 1 to 5 carbon atoms which may be further substituted; n represents an integer of 1 to 40; Z1 represents a hydrogen atom or a linear, branched or cyclic aliphatic hydrocarbon group having 1 to 30 carbon atoms which may be further substituted; and when n is 2 or more, R2s may be the same or different.
    Type: Grant
    Filed: September 28, 2007
    Date of Patent: October 5, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Toshihide Yoshitani, Takuya Arai
  • Patent number: 7745096
    Abstract: A photosensitive polyimide composition, a polyimide film, and a semiconductor device using the same are disclosed. The photosensitive polyimide composition can be cured by heating. A polyhydroxyimide is used as a base resin and can be mixed with a photoacid generator and a cross-linking agent having two or more vinylether groups. A film of the photosensitive polyimide composition can be developed by treatment with an alkaline aqueous solution. Embodiments of the invention enable improvement in production yield and reliability in a highly-integrated memory semiconductor packaging processes.
    Type: Grant
    Filed: September 26, 2007
    Date of Patent: June 29, 2010
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Myung Sup Jung, Sang Mock Lee, Jingyu Lee
  • Patent number: 7741011
    Abstract: A polyurethane resin is synthesized from a compound represented by the following Formula (1), a polymerizable composition includes the polyurethane resin, a planographic printing plate precursor includes a photosensitive layer including the composition, and a method produces a diol compound that can be used as a raw material of the polyurethane resin. In Formula (1), R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, R3 represents a hydrogen atom or an alkyl group, R4 represents a hydrogen atom or an alkyl group, and A represents a divalent or higher linking group, provided that R1 and R2 are not both a single bond.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: June 22, 2010
    Assignee: Fujifilm Corporation
    Inventor: Tetsunori Matsushita
  • Patent number: 7741380
    Abstract: The invention provides (1) an ink composition including a polymerization initiator and at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, (2) an ink composition including a polymerization initiator, at least one compound selected from the group consisting of (meth)acrylic acid and monofunctional (meth)acrylic acid esters and amides each having a carboxy group in the molecule, and a monofunctional (meth)acrylic acid ester or amide having an alkylene oxide repeating unit in the molecule, and (3) an ink composition including a polymerization initiator and a monofunctional (meth)acrylic acid ester or amide having a basic group in the molecule; and an ink jet recording method, a method for producing a planographic printing plate and a planographic printing plate produced by the method for producing a planographic printing plate using the above-mentioned ink compositions.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: June 22, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Ippei Nakamura
  • Patent number: 7666573
    Abstract: A positive photosensitive resin composition containing 100 parts by weight of a polyimide precursor (A) having a constituent unit represented by the formula (1), 15 to 25 parts by weight of a crosslinking agent (B) represented by the formula (2), and 2 to 5 parts by weight of a photosensitizer (C) generating acid upon irradiation of an actinic ray: wherein m is an integer of 1 or greater, and R is an aromatic group or an aliphatic group having a valency of 1 or higher. The positive photosensitive resin composition can be developed by using an aqueous solution of alkali metal carbonate, is capable of forming micropatterns, and has excellent thermal resistance and the like. A method for forming a positive pattern, and uses thereof are also provided.
    Type: Grant
    Filed: July 11, 2006
    Date of Patent: February 23, 2010
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Masaki Okazaki, Hitoshi Ohnishi, Wataru Yamashita
  • Patent number: 7645565
    Abstract: A polymerizable composition comprising: a polyurethane resin synthesized by using a compound represented by the following formula (I) as one of starting materials; a photopolymerization or thermal polymerization initiator; and an addition-polymerizable compound having an ethylenically unsaturated bond: wherein X represents a tri- or higher valent atom; R1 and R2 each independently represent a single bond or an alkylene group optionally having a substituent, provided that R1 and R2 do not represent a single bond at a same time; A represents a straight chain linking group; and n is an integer of from 1 to 5.
    Type: Grant
    Filed: October 8, 2008
    Date of Patent: January 12, 2010
    Assignee: FUJIFILM Corporation
    Inventor: Atsushi Sugasaki
  • Patent number: 7638259
    Abstract: A polyimide resin, characterized in that the polyimide resin comprises three kinds of repeating units represented by the formula (1), and has a weight average molecular weight, reduced to polystyrene, of from 5,000 to 500,000, an acryl equivalent of from 400 to 3,000 g/eq, and a carboxylic acid equivalent of from 300 to 2500 g/eq wherein X is a tetravalent organic group, Y is a divalent organic group, Z is a divalent organic group, W is a divalent organic group having a polyorganosiloxane structure. The polyimide resin is suitable for preparing a patterned or non-patterned protective coating.
    Type: Grant
    Filed: August 21, 2007
    Date of Patent: December 29, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tomoyuki Goto, Michihiro Sugo, Shohei Tagami, Hideto Kato
  • Patent number: 7598009
    Abstract: According to the present invention, there is provided: a photosensitive resin composition comprising a polyamide resin having a specific structure, a photosensitive agent, and a compound having at least two sulfonate ester groups; a production method for a cured relief pattern using the photosensitive resin composition; and a semiconductor device containing the cured relief pattern formed according to the production method.
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: October 6, 2009
    Assignee: FUJIFILM Corporation
    Inventors: Kenichiro Sato, Naoya Sugimoto
  • Patent number: 7579134
    Abstract: The present invention is directed to coverlay compositions derived from two-layer polyamic acid-based composites having a cover layer and adjacent thereto an adhesive layer wherein the cover layer comprises polyamic acid and other additives allowing the composition to be photosensitive and aqueous base developable, and where the adhesive layer can form a polyimide having a glass transition temperature between 170 and 250° C. The two-layer coverlay compositions of the present invention are used to encapsulate metal circuit traces formed on a flexible printed circuit base substrate. These two-layer compositions are particularity useful due to having an overall in-plane CTE between 10 and 40 ppm/° C. a range that is useful in avoiding unwanted curling of a flexible printed circuit when used as a polyimide-based coverlay material.
    Type: Grant
    Filed: March 15, 2005
    Date of Patent: August 25, 2009
    Assignee: E. I. Dupont de Nemours and Company
    Inventors: Thomas Eugene Dueber, Brian C. Auman, Kuppusamy Kanakarajan
  • Patent number: 7569328
    Abstract: The present invention provides a resin composition that includes (A) a polymer compound that has, on a side chain of a main chain polymer, through a linkage group containing a hydrogen-bonding group and a ring structure, a terminal ethylenic unsaturated bond, and is soluble or swelling in water or an alkali aqueous solution, and (B) a compound that generates radicals when exposed to light or heat. The invention further provides a thermo/photosensitive composition that includes (A?) a polymer compound that has a non-acidic hydrogen-bonding group on a side chain and is soluble or swelling in water or an alkali aqueous solution, and (B?) a compound that generates radicals when exposed to light or heat.
    Type: Grant
    Filed: August 12, 2003
    Date of Patent: August 4, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Kazuhiro Fujimaki
  • Patent number: 7524614
    Abstract: A radiation-sensitive composition includes a radically polymerizable component and an iodonium borate initiator composition capable of generating radicals sufficient to initiate polymerization of the free radically polymerizable component upon exposure to imaging radiation. The iodonium borate composition includes a particular diaryliodonium borate compound having organic substituents to provide a sum of at least 6 carbon atoms on the iodonium cation phenyl rings. This composition can be applied to a suitable substrate to provide a negative-working imageable element with improved digital speed and good shelf life and that can be imaged to provide lithographic printing plates. The imaged elements can be developed either on-press or off-press using alkaline developers.
    Type: Grant
    Filed: May 26, 2006
    Date of Patent: April 28, 2009
    Assignee: Eastman Kodak Company
    Inventors: Ting Tao, Scott A. Beckley