Polyamide Or Polyurethane Patents (Class 430/906)
  • Patent number: 5358999
    Abstract: Polyvinyl alcohol is modified by reaction with a stilbazol quaternary salt acetal to produce a water soluble polymer capable of photodimerizing on exposure to active radiation to yield water-soluble photoresist materials.
    Type: Grant
    Filed: April 5, 1993
    Date of Patent: October 25, 1994
    Assignee: Ulano Corporation
    Inventor: John Curtis
  • Patent number: 5340685
    Abstract: A light-sensitive composition comprises a light-sensitive diazo resin, a polymer binder and a fluorine atom-containing surfactant, wherein the polymer binder is a polyurethane resin having acidic hydrogen atom-containing substituents and comprising structural units derived from a diol represented by the following general formula (I); and the fluorine atom-containing surfactant is a copolymer of (i) an acrylate or methacrylate having a fluoroaliphatic group which has a carbon atom number of 3 to 20 and a fluorine atom content of not less than 30% by weight and in which at least three terminal carbon atoms are completely fluorinated, with (ii) poly(oxyalkylene) acrylate or poly(oxyalkylene)methacrylate, the copolymer containing the fluoroaliphatic group-containing acrylate or methacrylate units in an amount ranging from 35 to 50% by weight on the basis of the weight of the copolymer and the copolymer having has a molecular weight ranging from 20,000 to 100,000:HO--(CH.sub.2 CH.sub.2 O).sub.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: August 23, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiyuki Sekiya
  • Patent number: 5328973
    Abstract: A radiation-sensitive mixture which contains a polymeric binder having acid-labile side groups and a compound which generates a strong acid on irradiation wherein the binder is a polymer built up from novel amides of .alpha.,.beta.-unsaturated carboxylic acids, is highly sensitive in the shortwave uv region and useful in the production of recording material.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: July 12, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Horst Roeschert, Georg Pawlowski, Klaus-Juergen Przybilla
  • Patent number: 5326840
    Abstract: A radiation-sensitive mixture is disclosed that contains a polymeric binder having acid-cleavable side groups and a compound which forms a strong acid on irradiation. Novel amides of .alpha.,.beta.-unsaturated carboxylic acids with which the polymers used as binders are synthesized are also disclosed. A positive- or negative-working radiation-sensitive recording material comprising a base and a layer of the radiation-sensitive mixture according to the invention is also disclosed.
    Type: Grant
    Filed: June 9, 1992
    Date of Patent: July 5, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Klaus-Juergen Przybilla, Georg Pawlowski, Horst Roeschert
  • Patent number: 5320928
    Abstract: A photosensitive composition comprising a sensitizing amount of light-sensitive diazonium compound and a polyurethane resin binder in an amount sufficient to improve physical property of the composition, wherein said polyurethane resin has at least one group selected from a phosphonic acid group, a phosphoric acid group and ester groups thereof in an amount sufficient to improve adhesion to a support. The photosensitive composition of the present invention provides an excellent adhesion to a support, an excellent developability with an aqueous alkali developer, and a high printing durability.
    Type: Grant
    Filed: September 5, 1991
    Date of Patent: June 14, 1994
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aoai
  • Patent number: 5298359
    Abstract: A photosensitive polymer containing a repeating unit represented by the following formula (I) and having a logarithmic viscosity number of from 0.1 to 5 dl/g as measured in a solvent at a temperature of 30.degree..+-.0.01.degree. C. at a concentration of 0.5 g/dl: ##STR1## (wherein R.sup.1 is a trivalent or tetravalent carbocyclic aromatic group or heterocyclic group, R.sup.2 is an aliphatic group having at least two carbon atoms, an alicyclic group, an aromatic aliphatic group, a carbocyclic aromatic group, a heterocyclic group or a polysiloxane group, R.sup.3 is a divalent organic group, R.sup.4 is ##STR2## a hydrogen atom or a monovalent organic group, R.sup.5 is a hydrogen atom or a monovalent organic group, m is independently 1 or 2, n is independently 0 or 1, and m and n meet 1.ltoreq.m+n.ltoreq.
    Type: Grant
    Filed: April 29, 1991
    Date of Patent: March 29, 1994
    Assignee: Chisso Corporation
    Inventors: Hirotoshi Maeda, Kouichi Kunimune
  • Patent number: 5286599
    Abstract: A composition containing novolak polymer, and/or poly(p-vinylphenol), an organometallic material, an amino polymer a cationic photocatalyst. The composition can also include a cosensitizer material which makes a composition sensitive to near U.V. radiation.
    Type: Grant
    Filed: September 26, 1991
    Date of Patent: February 15, 1994
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Eileen A. Galligan, Jeffrey D. Gelorme, Richard P. McGouey, Sharon L. Nunes, Jurij R. Paraszczak, Russell J. Serino, David F. Witman
  • Patent number: 5273862
    Abstract: A photopolymerizable recording material is diclosed comprising a base material, a photopolymerizable layer and a cover layer which comprises a water-soluble polymer which is substantially impermeable to atmospheric oxygen, and a polymer which binds atmospheric oxygen and is virtually completely soluble in water at 20.degree. C. The material displays reduced sensitivity to atmospheric oxygen, even on prolonged storage and at elevated ambient temperatures and elevated atmospheric humidity.
    Type: Grant
    Filed: July 17, 1992
    Date of Patent: December 28, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Rudolf Zertani, Dieter Mohr
  • Patent number: 5260162
    Abstract: A photosensitizer composition comprising a diazo fluorinated ester containing the hexafluoroisopropylidene group, said photosensitizer selected from hexafluoro-bis-phenols having the following formula: ##STR1## where R is selected from hydrogen, methyl, ethyl and phenyl; and bis-hexafluoroethers having the following formula: ##STR2## wherein R' is selected from hydrogen, methyl, ethyl and phenyl.
    Type: Grant
    Filed: December 17, 1990
    Date of Patent: November 9, 1993
    Inventors: Dinesh N. Khanna, Robert E. Potvin
  • Patent number: 5260161
    Abstract: Disclosed is a photosensitive composition comprising a diazo resin and a polymeric compound containing a structural unit represented by the following formula (I) in the molecule: ##STR1## wherein J represents a divalent linking group and n is 0 or 1. Disclosed is also a photosensitive lithographic printing using the photosensitive composition.
    Type: Grant
    Filed: July 31, 1992
    Date of Patent: November 9, 1993
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Toshiyuki Matsumura, Shinichi Matsubara, Masafumi Uehara, Shinichi Bunya, Eriko Katahashi
  • Patent number: 5254431
    Abstract: A radiation sensitive material suitable for the production of radiation sensitive plates for lithographic printing plate manufacture comprises a polymer having appendent azide-substituted aromatic ester groups and sulphonyl urethane groups. The radiation sensitive compound is produced by a process in which some hydroxyl and/or epoxide groups of a polymer are reacted with an azide substituted carboxylic acid or ester forming derivative thereof, and some hydroxyl groups are reacted with a sulphonyl isocyanate.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: October 19, 1993
    Assignee: Vickers plc
    Inventors: Terence Etherington, Victor Kolodziejczyk
  • Patent number: 5254432
    Abstract: The present invention relates to a photosensitive composition comprising an o-quinonediazide compound and a polyurethane resin having a phosphonic acid group, a phosphoric acid group or its ester group. The photosensitive composition of the present invention provides an excellent adhesion to the support, an excellent developability with an aqueous alkali developer, and a high printing durability.
    Type: Grant
    Filed: April 26, 1990
    Date of Patent: October 19, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aoai
  • Patent number: 5242779
    Abstract: A photosensitive mixture is disclosed that contains a photocurable compound, for example, a diazonium salt polycondensation product, or a photocurable combination of compounds, for example, a photopolymerizable mixture, and a polymeric binder, which binder is a graft copolymer with a polyurethane graft backbone onto which chains containing vinyl alcohol units and vinyl acetal units derived from hydroxyaldehydes are grafted. The mixture is suitable for use in the production of printing plates and photoresists, can be developed with purely aqueous solutions, and gives printing plates distinguished by high resistance to mechanical and chemical attacks.
    Type: Grant
    Filed: January 23, 1992
    Date of Patent: September 7, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel
  • Patent number: 5238772
    Abstract: A photopolymerizable mixture is disclosed which contains:a) a graft copolymer having a polyurethane as the graft backbone, onto chains containing vinyl alcohol units and vinyl acetal units are grafted,b) a free-radically polymerizable compound possessing at least one terminal ethylenically unsaturated group and having a boiling point of more than 100.degree. C. at normal pressure, andc) a compound or a combination of compounds which under the action of actinic light is capable of initiating the polymerization of compound b).The mixture is suitable for use in the production of printing plates and photoresists. It is distinguished by high photospeed and can be developed with aqueous solutions. It yields printing plates producing large print runs.
    Type: Grant
    Filed: January 23, 1992
    Date of Patent: August 24, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Waltraud Mueller-Hess, Dieter Mohr, Karl-Josef Rauterkus, Matthias Kroggel
  • Patent number: 5238783
    Abstract: The present invention is concerned with a photosensitive polymer composition for a water-developable, flexographic printing plate, having a phase separating structure in a sea-and-islands state, the phase separating structure comprising island phases and a sea phase, the island phase comprising a thermoplastic elastomer component having a glass transition temperature lower than 25.degree. C., and the sea phase comprising a gelled, ethylenically unsaturated compound component.The photosensitive polymer composition of the present invention affords a printing plate capable of being developed with neutral water and suitable for flexographic printing using a water-based ink.
    Type: Grant
    Filed: February 20, 1991
    Date of Patent: August 24, 1993
    Assignee: Toray Industries, Inc.
    Inventors: Masaharu Taniguchi, Kenji Yoshimura, Tetuo Suzuki, Hisayosi Yamada, Shun-ichi Yanagida
  • Patent number: 5238784
    Abstract: The present invention provides a photosensitive resin composition which comprises, as essential components:(A) a polyamic acid having a recurring unit represented by the following formula [I]: ##STR1## wherein R.sub.1 and R.sub.2 each represents an organic group selected from the group consisting of an aromatic group, an alicyclic group, an aliphatic group, and a heterocyclic group and m is 1 or 2,(B) an amide compound having carbon-carbon double bond, and(C) a photosensitizer.
    Type: Grant
    Filed: November 28, 1990
    Date of Patent: August 24, 1993
    Assignee: Sumitomo Bakelite Company Limited
    Inventors: Akira Tokoh, Nobuyuki Sashida, Etsu Takeuchi, Takashi Hirano
  • Patent number: 5236809
    Abstract: The present invention relates to a photopolymerizable resin composition developable with an aqueous weak alkaine solution and suitable for a printed circuit board.The photopolymerizable resin composition of the present invention is mainly composed of:(a) a linear acrylic copolymer,(b) an ethylenically unsaturated compound, and(c) a photopolymerization initiator,wherein said linear acrylic copolymer comprises as indispensable comonomers:i) at least one compound represented by the general formula: ##STR1## wherein X is a hydrogen atom or a methyl group, Y is an oxygen atom or an imino group and Z is an alkylene group having 1 to 5 carbon atoms, andii) an ethylenically unsaturated compound having a carboxyl group.the photopolymerizable resin composition of the present invention can afford a resist film having excellent flexibility and adhesion through the use of the above-described particular linear acrylic copolymer.
    Type: Grant
    Filed: June 13, 1991
    Date of Patent: August 17, 1993
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Junichi Onodera, Shigeru Otawa
  • Patent number: 5232816
    Abstract: A positive type photosensitive resinous composition comprising a binder resin and a quinone diazide compound, the binder resin being a copolymer of(a) at least one phosphoric acid ester monomer represented by the formula: ##STR1## (b) at least one acid group containing .alpha.,.beta.-ethylenically unsaturated monomer, and(c) other copolymerizable .alpha.,.beta.-ethylenically unsaturated monomers than (a) and (b), which is specifically useful for the formation of resist coating in the preparation of printed circuit board.
    Type: Grant
    Filed: August 31, 1990
    Date of Patent: August 3, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mamoru Seio, Takeshi Ikeda, Kiyomi Sakurai
  • Patent number: 5221595
    Abstract: A photopolymerizable mixture is disclosed that contains a polymer binder, a polymerizable compound having at least one terminal ethylene double bond and a boiling point above 100.degree. C. at normal pressure, a hexaarylbisimidazole and a 1,3-diarylpyrazoline or a 1-aryl-3-aralkenyl-pyrazoline. The mixture is suitable for the preparation of printing plates and photoresists and is distinguished by high photosensitivity and low sensitivity towards acid solutions.
    Type: Grant
    Filed: March 27, 1991
    Date of Patent: June 22, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Juergen Lingnau, Hans-Dieter Frommeld
  • Patent number: 5221594
    Abstract: A water-less PS plate for use in making a water-less lithographic printing plate comprises, on a substrate, a photopolymerizable light-sensitive layer and a silicone rubber layer in this order, wherein the light-sensitive layer is formed from a photopolymerizable light-sensitive composition which contains an urea bond-containing polyurethane as a binder. According to the present invention, there is obtained a water-less PS plate having good resistance to scratch and high printing durability. Moreover, the resulting light-sensitive layer does not get sticky, the light-sensitive layer of the non-image portions is not peeled off during the printing operations, and the lithographic plate shows good dyeability and plate-examination property.
    Type: Grant
    Filed: March 16, 1992
    Date of Patent: June 22, 1993
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Takahashi, Yoshihiko Urabe, Yukio Abe, Tsumoru Hirano
  • Patent number: 5206117
    Abstract: The present invention relates to photosensitive negative and positive tone compositions for imagewise deposition of polyimide on a substrate.
    Type: Grant
    Filed: March 13, 1992
    Date of Patent: April 27, 1993
    Inventors: Jeffrey W. Labadie, Dennis R. McKean, Willi Volksen, Gregory M. Wallraff
  • Patent number: 5204222
    Abstract: A photocurable elastomeric mixture is described which comprises a compound which contains at least one terminal ethylenically unsaturated group and is polymerizable by free radical polymerization, a photopolymerization initiator and, as binder, a graft polymer which is soluble or dispersible in water or an aqueous solution, the graft base of which is a polymer of diol components and diisocyanate components having at least 2 urethane groups in the molecule, onto which polymer carboxylic acid vinyl ester units having 3 to 20 carbon atoms, or their saponification products, are grafted. The mixture is suitable for the production of relief printing plates, in particular flexographic printing plates, and can be developed with water or aqueous solutions.
    Type: Grant
    Filed: August 6, 1991
    Date of Patent: April 20, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Joachim Gersdorf, Matthias Kroggel, Karl-Josef Rauterkus
  • Patent number: 5204223
    Abstract: A photosensitive resin composition which is excellent in flexibility and impact resilience, which is less affected by humidity is provided. This composition comprises a soluble synthetic polymer, a photo-polymerizable unsaturated compound, and a photo-polymerization initiator, wherein the soluble synthetic polymer comprises an addition polymer obtained by the reaction between a diamine compound having amino groups selected from primary and secondary amino groups and having no amide bonds in its molecule and a diisocyanate compound; and the addition polymer contains a polyoxyalkylene glycol component in an amount of 20 to 80% by weight.
    Type: Grant
    Filed: August 8, 1991
    Date of Patent: April 20, 1993
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventors: Yuji Taguchi, Toshiaki Fujimura
  • Patent number: 5187040
    Abstract: A photocurable mixture is disclosed that contains a diazonium salt polycondensation product or an organic azido compound as the photosensitive compound and a high-molecular weight polymer as the binder, the polymer being a graft copolymer with a polyurethane as the graft backbone, onto which chains containing vinyl alcohol units are grafted. The mixture is suitable for use in the production of printing plates and photoresists, which can be developed with aqueous solutions. It yields printing plates having a good ink acceptance and long shelf life that produce large print runs.
    Type: Grant
    Filed: June 21, 1990
    Date of Patent: February 16, 1993
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel, Karl-Josef Rauterkus
  • Patent number: 5153095
    Abstract: A light-sensitive composition comprises (A) a polymer comprising structural units represented by the following general formula (I): ##STR1## (wherein R.sup.1 represents a hydrogen atom or a methyl group; R.sup.2 represents a hydrogen atom, an alkyl group or an aryl group; and Z represents a bivalent connecting group having at least 3 non-metallic atoms in the main chain); (B) a monomer or an oligomer having at least two polymerizable ethylenically unsaturatred double bonds; and (C) a photopolymerization initiator. The light-sensitive composition has high sensitivity and is excellent in stability of sensitivities such as storage stability, temperature dependency and latent image sensitization.
    Type: Grant
    Filed: July 15, 1991
    Date of Patent: October 6, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kouichi Kawamura, Hiromichi Sano, Masanori Imai
  • Patent number: 5153102
    Abstract: An alkaline-solution-developable liquid image-producing composition useful as a permanent protective layer for printed circuit boards is disclosed comprising at least: (1) an acrylic copolymer with hyroxy group, carboxyl group and branched unsaturated carbon double bond. Its number average molecular weight is 3,000 to 10,000 and its acid value is at least 30 mg KOH/g; (2) a photo reactive monomer with hydroxy group, the number of the unsaturated carbon double bond functional groups should be not less than 2; (3) a melamine compound; and (4) a free radical photo initiator.
    Type: Grant
    Filed: August 10, 1990
    Date of Patent: October 6, 1992
    Assignee: Industrial Technology Research Institute
    Inventors: Rong-Jer Lee, Chein-Dhau Lee, Wen-Shin Shen, Dhei-Jhai Lin
  • Patent number: 5143819
    Abstract: A photocurable composition suitable for flexible photosensitive articles is prepared by reacting an acid-containing copolymer and a nitrogen-containing compound having polymerizable ethylenically unsaturated groups. The resulting composition can be used "as is" or can be formulated with ethylenically unsaturated monomers and photoinitiators to prepare the flexible photosensitive articles, e.g. flexographic printing plates. The plates prepared from the photocurable composition are aqueous developable and sufficiently flexible and soft to be used for printing on flexible packaging surfaces.
    Type: Grant
    Filed: January 25, 1991
    Date of Patent: September 1, 1992
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Srinivas K. Mirle, Arthur L. Berrier
  • Patent number: 5141838
    Abstract: A photosensitive composition is described, wherein it comprises a high-molecular compound having sulfonamide group to be insoluble in water, but soluble in an aqueous alkaline solution and a positive working photosensitive compound. The photosensitive composition is excellent in coatability and in developability when the composition is used for photosensitive lithographic printing plates.
    Type: Grant
    Filed: February 24, 1989
    Date of Patent: August 25, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keitaro Aoshima, Akira Nagashima
  • Patent number: 5126504
    Abstract: An electrophotographic copying material is disclosed containing, in the photoconductive film, a high-molecular-weight polymer binder which is a graft polymer having a polyurethane as grafting base and grafted-on chains which contain vinyl alcohol units. The material is suitable, in particular, for the production of printing plates and printed circuits which are highly photosensitive and laminatable even at fairly large film thickness. The films can be treated with mild and toxicologically safe stripper solutions.
    Type: Grant
    Filed: September 21, 1990
    Date of Patent: June 30, 1992
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Waltraud Mueller-Hess, Dieter Mohr, Matthias Kroggel
  • Patent number: 5122436
    Abstract: A curable composition which comprises a homogeneous blend of (a) a solvent soluble polyimidesiloxane containing about 0.2-30 weight percent silicon and (b) an ethylenically unsaturated multifunctional monomer. The siloxane units in the polyimide-siloxane have from 10 to about 200 ##STR1## linkages per unit, more preferably from about 15 to about 100 linkages, and most preferably from about 40 to about 60 ##STR2## linkages per siloxane unit. Another embodiment provides the composition produced by curing the above-described composition. The curable compositions of this invention can be cured by either actinic radiation, e.g., uv light, or thermal radiation. In the cured composition, the polymer produced upon polymerization of the monomer, and the polyimide portion of the polyimide-siloxane form a homogeneous blend, in which the siloxane portion of the polyimide-siloxane is phase separated.
    Type: Grant
    Filed: April 26, 1990
    Date of Patent: June 16, 1992
    Assignee: Eastman Kodak Company
    Inventors: Scott E. Tunney, John J. Fitzgerald
  • Patent number: 5106720
    Abstract: A base developable negative acting photoresist composition which is thermally stable, provides high resolution at short exposure times and is capable of development by means of conventional aqueous alkaline developers. The present compositions comprise an alkali soluble hydroxylated polyamide and/or polyimide binder material, a photopolymerizable compound containing at least two ethylenically-unsaturated double bonds, and a light-sensitive photoinitiator.
    Type: Grant
    Filed: September 11, 1989
    Date of Patent: April 21, 1992
    Assignee: Hoechst Celanese Corporation
    Inventors: Werner H. Mueller, Dinesh N. Khanna
  • Patent number: 5104768
    Abstract: The invention relates to positive working photoresists for producing relief structures of high-temperature resistant polyimide prepolymers, which photoresists can be developed in aqueous-alkaline medium and which contain, in an organic solvent, essentially at leasta) one prepolymer which is convertible into a polyimide,b) one radiation-sensitive quinonediazide compound, and further optional components, said prepolymer being a completely esterified polyamic acid polymer.
    Type: Grant
    Filed: November 2, 1989
    Date of Patent: April 14, 1992
    Assignee: Ciba-Geigy Corporation
    Inventors: Jorg Sassmannshausen, Reinhard Schulz, Ekkehard Bartmann
  • Patent number: 5085969
    Abstract: An image-receiving sheet material to be used for the formation of a transferred image by transferring a transferable image formed on an image-forming layer of a photo-sensitive material onto the image-receiving sheet material and then retransferring the image onto a permanent substrate, as well as a process for the formation of a transferred image with the use of the image-receiving sheet material are disclosed.
    Type: Grant
    Filed: March 16, 1990
    Date of Patent: February 4, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tomizo Namiki, Tamotsu Suzuki, Fumiaki Shinozaki
  • Patent number: 5081000
    Abstract: The invention provides photosensitive mixtures consisting of a polymer and a photoactive component which meet the requirements placed on photoresists. The polymer has carboxylic acid anhydride groups or phenolic hydroxyl groups and the photoactive component is an N-alkylated or N-arylated 1.4-dihydropyridine or a 1.4- dihydropyridine derivative of the following structure: ##STR1## where the R group is a (substituted) aryl group, which, in the ortho position to the bond with the dihydropyridine ring, carries a NO.sub.2 group; and R.sup.3 is alkyl, cyclohexyl or phenyl.
    Type: Grant
    Filed: March 16, 1990
    Date of Patent: January 14, 1992
    Assignee: Siemens Aktiengesellschaft
    Inventors: Eberhard Kuehn, Albert Hammerschmidt, Erwin Schmidt, Hellmut Ahne
  • Patent number: 5066564
    Abstract: A photopolymerizable mixture is disclosed that comprises,a) a polymeric binder,b) an acrylate or alkacrylate of a polyhydric alcohol containing one or more urea groups and one or more urethane groups,c) a photoreducible dye as photoinitiator,d) a trihalomethyl compound which can be cleaved by irradiation, ande) an acridine or phenazine compound which is active as a photoinitiator.The mixture is suitable for the production of printing plates and photoresists and is distinguished by an increased shelf life.
    Type: Grant
    Filed: July 19, 1989
    Date of Patent: November 19, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Rudolf Zertani, Dieter Mohr, Klaus Rode
  • Patent number: 5053317
    Abstract: A radiation-polymerizable mixture is described which comprisesa) a saturated polyurethane containing carboxyl groups and repeating urea groups as binder,b) a radical-polymerizable compound containing at least one terminal olefinic double bond and having a boiling point above 100.degree. C. at normal pressure, andc) a compound or combination of compounds capable of initiating the polymerization of compound (b) on exposure to actinic radiation.The mixture can be developed with purely aqueous developers and yields lithographic printing plates with high photosensitivity, low stickiness and high print runs.
    Type: Grant
    Filed: November 30, 1989
    Date of Patent: October 1, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Klaus Joerg, Rudolf Zertani
  • Patent number: 5053316
    Abstract: (I) A photosensitive resin composition comprising(i) a thermoplastic elastomer selected from(A) a poly(amide-imide) ester produced by reacting a polyamide-forming monomer with either an aromatic carboxylic acid or its anhydride and either a polyalkylene glycol or an .alpha.,.omega.-dihydroxy hydrocarbon,(B) a poly(amide-imide) urethane produced by reacting the above poly(amide-imide) ester with a diisocyanate compound, and(C) a poly(amide-imide) urethane produced by reacting the above diisocyanate compound with a mixture of polymer diol and a poly(amide-imide) ester obtained from a Chthd 2-C.sub.4 alkylene glycol and a polyamide-forming monomer, and(ii) an ethylenic unsaturated compound, and(iii) a photopolymerization initiator,(II) a photosensitive sheet for printing plate formation which comprises a resin layer formed of the above composition, and(III) the above defined thermoplastic elastomer.
    Type: Grant
    Filed: June 8, 1989
    Date of Patent: October 1, 1991
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yoshio Suzuki, Yutaka Usubuchi, Yakeshi Oguri
  • Patent number: 5034306
    Abstract: A photocurable elastomeric mixture is described which contains a photopolymerization initiator; as binder, a graft polymer which is soluble or dispersible in water or an aqueous solution, the graft backbone of which is a polymer of diol components and diisocyanate components having at least 2 urethane groups in the molecule, onto which polymer chains of units of carboxylic acid vinyl esters having about 3 to 20 carbon atoms or their saponification products and optionally of further ethylenically unsaturated monomers or their saponification products are grafted; and at least one compound which is polymerizable by a free-radical polymerization and corresponds to the general formula ##STR1## wherein R.sub.1 denotes hydrogen or alkyl,X denotes ethylene or propylene,R.sub.2 denotes alkyl andn is a number from 1 to 4.
    Type: Grant
    Filed: May 18, 1990
    Date of Patent: July 23, 1991
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Joachim Gersdorf, Matthias Kroggel
  • Patent number: 5017447
    Abstract: The optical image properties of gelatin holograms are improved by reducing uneven shrinkage during chemical development. This is accomplished by introducing from 2 to 10 weight percent of a water soluble sizing agent into the gelatin. Suitable sizing agents include polyvinylpyrrolidone homopolymer and polyvinylpyrrolidone-vinyl acetate copolymers.
    Type: Grant
    Filed: January 23, 1989
    Date of Patent: May 21, 1991
    Assignee: Hughes Aircraft Company
    Inventors: Jane Wallner, Kevin Yu
  • Patent number: 5011755
    Abstract: The present invention relates to compositions comprising(a) a titanocene photoinitiator of the formula I ##STR1## (b) a 3-ketocoumarin of the formula II ##STR2## in which both R.sup.1, R.sup.2 and R.sup.3 are as defined in claim 1, R.sup.4 is a radical of the formula V ##STR3## R.sup.5 is C.sub.1 -C.sub.20 alkyl, cycloalkyl having 5-7 ring carbon atoms, phenyl or naphthyl which are unsubstituted or substituted by one to three C.sub.1 -C.sub.6 alkyl groups, C.sub.1 -C.sub.6 alkoxy groups or halogen atoms or by one diphenylamino or C.sub.1 -C.sub.6 dialkylamino group, or is C.sub.7 -C.sub.9 aralkyl, a radical --(CH.dbd.CH).sub.a --C.sub.6 H.sub.5 or a radical of the formula V, a is 1 or 2, preferably 1, and R.sup.10, R.sup.11, R.sup.12, R.sup.13 and R.sup.14 independently of one another are hydrogen, C.sub.1 -C.sub.6 alkyl, C.sub.1 -C.sub.6 alkoxy, phenyl, tolyl, xylyl or benzyl, and R.sup.11 can additionally also be a group --NR.sup.15 R.sup.16 or --OR.sup.15, wherein R.sup.15 and R.sup.
    Type: Grant
    Filed: January 30, 1990
    Date of Patent: April 30, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Ottmar Rohde, Armin Schaffner, Martin Riediker, Kurt Meier
  • Patent number: 5002852
    Abstract: The invention relates to a polyacetylenic recording film of improved resistance to degradation by UV light and increased sensitivity to ionizing radiation and to the process for producing said film which comprises dissolving polyacetylenic imaging crystals in n-butanol before forming a dispersion in a binder material and before coating on a polyester film base.
    Type: Grant
    Filed: June 20, 1988
    Date of Patent: March 26, 1991
    Assignee: GAF Chemicals Corporation
    Inventors: David F. Lewis, Mark L. Moskowitz, Steward E. Purdy
  • Patent number: 4999279
    Abstract: A photosensitive resin composition suitable for a water-developing type photosensitive resin plate as a patrix of a matrix for a rubber plate which comprises a basic nitrogen containing polyamide; a monomer having polymeric unsaturated bond; a compound of the formula (I): ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and are hydrogen, alkyl, aryl or a derivative thereof; m and n are integers of 0 to 2 and the sum of m and n is 1 to 3; and M is an alkaline metal, an alkaline earth metal or a transition metal, and a N-nitrosoamine compound of the formula (II) of the formula: ##STR2## wherein R.sub.3 and R.sub.4 are the same or different and are halogen, hydroxyl, carboxyl, alkyl, cycloalkyl, optionally substituted aryl or acyl group; X and Y are carbonyl or --O--; and p and q are 1 or 0, or a salt thereof.
    Type: Grant
    Filed: January 12, 1989
    Date of Patent: March 12, 1991
    Assignee: Toyo Boseki Kabushiki Kaisha
    Inventor: Shigeo Takenaka
  • Patent number: 4987054
    Abstract: Photopolymerizable compositions for image recording, containing, among other components, addition-polymerizable, ethylenically unsaturated compounds and polymeric binders, wherein at least one of these binders is a copolymer of the formula (I) containing 5 to 50 percent by weight of one or more different structural units C1, C2, or combinations thereof containing carboxyl groups.
    Type: Grant
    Filed: March 1, 1989
    Date of Patent: January 22, 1991
    Assignee: E. I. Du Pont de Nemours and Company
    Inventors: Manfred Sondergeld, Jonathan W. Goodin
  • Patent number: 4985340
    Abstract: A polymerizable composition comprises a polymeric precursor selected from the group consisting of (1) at least one ethylenically-unsaturated monomer, optionally in combination with an epoxy monomer or polyurethane precursors, or (2) at least one epoxy monomer, or (3) polyurethane precursors, and a curing agent comprising an organometallic salt and an onium salt.
    Type: Grant
    Filed: June 1, 1988
    Date of Patent: January 15, 1991
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Michael C. Palazzotto, Robert J. DeVoe
  • Patent number: 4981769
    Abstract: A light image forming material comprising a support having provided thereon a layer comprising microcapsules containing a leuco dye capable of developing a color through oxidation and a photo oxidizing agent, a reducing agent provided outside the microcapsules, and the layer further comprising carboxy-modified polyvinyl alcohol and epoxidated polyamide resin for imparting high water resistivity.
    Type: Grant
    Filed: August 18, 1989
    Date of Patent: January 1, 1991
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Keiso Saeki, Tosiaki Endo
  • Patent number: 4970134
    Abstract: Multilayer, photosensitive recording materials which can be developed with aqueous media contain one or more layers of a mixture which is crosslinkable by photopolymerization, soluble or dispersible in aqueous media and based on polymer containing hydroxyl and/or amide groups, as binders, compatible photopolymerizable monomers and photopolymerization initiators, which mixture contains from 0.1 to 10% by weight, based on its total amount, of an aldehyde of the general formula I ##STR1## where R is hydrogen, hydroxyl, C.sub.1 -C.sub.6 -alkyl, C.sub.1 -C.sub.6 -alkoxy, C.sub.6 -C.sub.10 -aryl or C.sub.6 -C.sub.10 -aryloxy.
    Type: Grant
    Filed: June 10, 1988
    Date of Patent: November 13, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Bernd Bronstert, Manfred Zuerger
  • Patent number: 4963462
    Abstract: This invention relates to positive working color proofing sheet construction which, upon exposure to an actinic radiation source through a screened image, can accuratley reprouce said image. The construction is useful as a color proofing film which can be employed to accurately predict the image quality from a lithographic printing process. The image is produced by forming a composite of a receiver base, diazo or diazide layer, photopolymerizable layer and cover sheet. Upon imagewise exposure, a positive image appears on the receiver base after dry peel apart development.
    Type: Grant
    Filed: January 8, 1990
    Date of Patent: October 16, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Wojciech A. Wilczak
  • Patent number: 4950582
    Abstract: A light-sensitive composition comprises at least one water-insoluble and aqueous alkaline-soluble polyurethane resin having N-sulfonylamido, N-sulfonylureido or N-aminosulfonylamido groups. The light-sensitive composition is excellent in developing properties in an aqueous alkaline developer and coating properties. In addition, the images obtained from the composition are good in wear resistance and exhibit high adhesion to the substrate. Thus, the composition is very suitable for use in making IC circuits, photomasks and PS plates which provide lithographic printing plates exhibiting high printing durability.
    Type: Grant
    Filed: March 31, 1988
    Date of Patent: August 21, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Toshiaki Aoai, Keitaro Aoshima, Yasuo Okamoto
  • Patent number: 4927739
    Abstract: The present invention relates to a photosensitive composition containing at least one compound selected from the group consisting of N-acyl amino acid derivatives, hydroxycarboxylic acids and their derivatives, condensates of an aliphatic or aromatic aldehyde with a polyhydric alcohol, acylated polysaccharides and metallic soaps. From the photosensitive composition of the present invention, moldings having excellent shape retentivity and/or compatibility of the components thereof with one another can be produced. Therefore, the production of moldings from a composition which has been heretofore impossible is made possible. Particularly a composition having a good moldability during the molding operation can be employed. The composition is useful for the preparation of printing plate materials having a good developability and printing plates, particularly flexible printing plates and flexographic printing plates, having an improved ink solvent resistance.
    Type: Grant
    Filed: October 19, 1987
    Date of Patent: May 22, 1990
    Assignee: Toray Industries, Inc.
    Inventors: Masaharu Taniguchi, Chikara Ichijo, Junichi Fujikawa
  • Patent number: 4927740
    Abstract: Orifices, cavities or spaces which are formed when printing plates are mounted on a plate cylinder are closed and/or sealed by means of a pasty, photocurable sealing or closing compound consisting of one or more photopolymerizable, ethylenically unsaturated low molecular weight compounds (a), one or more polymeric binder (b) which are compatible with the said compounds of component (a), one or more photopolymerization initiators (c) and one or more finely divided oxidic fillers (d) which, when mixed with components (a) to (c), give mixtures which are transparent to long-wavelength UV light. After it has been applied, this sealing or closing compound is cured by exposure and can then be mechanically processed. The process is particularly suitable for closing and/or sealing orifices, cavities or spaces in gravure printing plates mounted on plate cylinders.
    Type: Grant
    Filed: October 21, 1988
    Date of Patent: May 22, 1990
    Assignee: BASF Aktiengesellschaft
    Inventors: Guenter Wallbillich, Gerhard Bleckmann, Dankmar Scholz