Abstract: A silver halide photographic material which comprises a support having a subbing layer containing an aqueous polymer latex represented by the following formula (I), which has a cross linked structure: ##STR1## wherein A represents an ethylenic unsaturated monomer unit; R.sub.1 represents a hydrogen atom or a lower alkyl group having from 1 to 6 carbon atoms; L represents a divalent group having from 1 to 12 carbon atoms; R.sub.2, R.sub.3 and R.sub.4, which may be the same or different, each represents an alkyl group, an aralkyl group or a hydrogen atom; Q represents nitrogen or phosphorus; X-represents an anion other than iodine ion; and B represents a structural unit in which copolymerizable monomers having at least two ethylenic unsaturated groups have been copolymerized: x is selected to constituted from 0 to 90 mol%; y is selected to constitute from 10 to 99.9 mol%; z is selected to constitute from 0.1 to 50 mol%; and R.sub.2, R.sub.3 and R.sub.

Abstract: A silver halide photosensitive material is described, comprising two or more monodisperse silver halide emulsions of different average grain size on a support, wherein at least one of the said monodisperse silver halide emulsions has an average grain size of at least 0.7 .mu.m, and at least one of the silver halide emulsions has a smaller average grain size than the other, the average grain size of the silver halide emulsion as a whole being within the range of from 0.33 to 0.54 .mu.m, with a coated silver weight of from 2.3 to 3.8 g/m.sup.2, and which contains a sensitizing dye represented by formula (I) ##STR1## wherein Z and Z.sub.1 each represents a group of non-metallic atoms forming a thiazole nucleus, a benzothiazole nucleus, or a benzoxazole nucleus; R.sub.0 represents an alkyl group having from 1 to 6 carbon atoms, an allyl group, or an aralkyl group; R and R.sub.1 each represents an alkyl group or an aryl group; L, L.sub.1, and L.sub.

Abstract: A method of processing a silver halide photographic material of total silver amount of no more than 7.0 g/m.sup.2 on a support containing at least one of a dye having a maximum absorption wavelength between 520-560 nm and a dye having a maximum absorption wavelength between 570-700 nm in such an amount that the increase of transmission optical density of the unexposed area after processing is no more than 0.03, comprising processing said silver halide photographic material with a roller-transport type automatic developer under the conditions that satisfy the following relationships:50.ltoreq.l.sup.0.75 .times.T.ltoreq.1240.7.ltoreq.l.ltoreq.3.1where l is the length in meters of delivery path in the developer, and T is the time in seconds taken for the silver halide photographic material to pass through the path.This method is adapted for rapid processing of silver halide photographic materials and the silver image obtained has a desired color and will not experience any "sepia deterioration" during storage.

Abstract: A silver halide photographic material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and at least one other hydrophilic colloid layer, wherein at least one compound represented by formula (I) is contained in at least one layer of the silver halide photographic material and wherein an organic material selected from the group consisting of a natural or synthetic water-soluble polymer is contained in at least one of the light-sensitive silver halide emulsion layer and the other hydrophilic colloid layer such that at least 10% by weight of the organic material originally present in the layers of the silver halide photographic material is washed out from the layer during development processing:A--X--Y--B (I)wherein A represents an alkyl group, an alkenyl group or an aryl group, which has from 8 to 25 carbon atoms; X represents ##STR1## wherein R represents an alkyl group having from 1 to 10 carbon atoms or --Y--B; Y represents a group consisting of at least one of eac

Abstract: A radiographic element is disclosed which exhibits high covering power, reduced crossover without emulsion desensitization, reduced wet pressure sensitivity, and can be fully processed in a rapid transport processor in less than 90 seconds. The radiographic is comprised of tabular grain emulsion layers on opposite sides of a transparent film support and processing solution decolorizable dye particles in hydrophilic colloid layers interposed between the emulsion layers and the support. Hydrophilic colloid on each side of the support is in the range of from 35 to 65 mg/dm.sup.2, with the interposed layer containing hydrophilic colloid in the amount of at least 10 mg/dm.sup.2.

Abstract: A silver halide photographic material is disclosed which has at least one hydrophilic colloidal layer on a support, said photographic material having a water content of 10-20 g/m.sup.2 at the time when the washing step of processing with a roller transport type automatic processor is completed.

Abstract: A self-developing radiation resist having extremely high sensitivity to energetic radiation, which resist is resistant to dry etching. The energetic radiation includes electron beam radiation, ion beam radiation, x-ray radiation, and gamma ray radiation. The resist is substantially amorphous; it has extremely high values of G.sub.s and G.sub.m, whereG.sub.s =number of main chain scission/100 electron volts absorbedandG.sub.m =number of monomers liberated/100 electron volts absorbed.The resist is end-capped to render it thermally stable and typically is cross-linked to reduce dry etching. The polymer that forms the resist includes an oxygen heteroatom linear chain organic polymer having haloalkyl substituents and is adapted to depolymerize in the absence of photoinitiators.

Abstract: A hydrogen-free boron-containing membrane in tension exhibits advantageous properties for use as a mask in X-ray lithography.

Abstract: A silver halide photographic light-sensitive material and a process for processing it are disclosed. The light-sensitive material is improved in photographic sensitivity, drying property and anti-roller-mark property and is suitable for the disclosed ultra-rapid processing by an automatic processor in which the photographic material is processed for the time of 20 sec to 60 sec in total. The light-sensitive material comprises a support having on at least one side thereof one or more hydrophilic layers containing gelatin which comprise at least one light-sensitive silver halide emulsion layer. An amount of the gelatin contained in said hydrophilic layer or layers is within the range of from 1.90 to 3.50 g/m.sup.2 and a swelling amount of said hydrophilic layer or layers is within the range of from 30 to 58 g/m.sup.2 when said light-sensitive material is treated in a specific condition for 15 sec. at 35.degree. C.

Abstract: A mask for radiation beam lithography is formed from a semiconductor wafer by thinning a region into a membrane with a hole pattern defining the pattern of the mask. The membrane is doped with a tensile stress-generating material so that minimum doping exists at the periphery of the membrane with the maximum at its center. The difference in doping between the periphery and the center is chosen so that when the mask is irradiated with a given beam current intensity, the membrane is tension-free. To make a mask in the wafer, a hole pattern is formed by etching holes in the membrane or by depositing a layer on the membrane. The wafer is thinned from the opposite surface until the holes in the hole pattern are throughholes or until the desired thickness is reached. The membrane is doped with tensile-stress-generating material using ion implantation or diffusion proportionally to the temperature distribution existing in the membrane during irradiation with exposure beams.

Abstract: A silver halide photographic material is capable of super-rapid processing with the total time of 20 to 60 minutes and is high in sensitivity, low in fogginess and excellent in pressure resistance and graininess. The photographic material is comprises a support bearing a hydrophilic colloial layer including at least one light sensitive silver halide emulsion layer thereon, whereinsilver halide grains contained in the silver halide emulsion layer are mainly comprised of tabular grains which have an aspect ratio of the grain size to the grain thickness of not lower than 5, and the projective areas of the whole tabular grain occupy not less than 50% of the projective areas of the whole silver halide grain in the emulsion layer,the melting time of the silver halide photographic light-sensitive material is within the range of from not shorter than 45 minutes, andon the side bearing the hydrophilic colloidal layer containing the silver halide emulsion layer, an amount of gelatin is within the range of from 2.

Abstract: A pattern forming method in which a water-soluble organic film absorbing secondary electrons or soft X-rays is formed on a resist layer and thereafter, pattern exposure, development are carried out. The water-soluble organic film containing halogen, sulfur, metal atom, etc. absorbs secondary electrons or soft X-rays which are generated from a mask in X-rays exposure so that only X-rays passed through openings of the mask are applied to a resist layer and a super fine pattern of high aspect ratio can be obtained.

Abstract: A recording system for megavolt irradiation therapy, in which the recording is carried out by the therapeutic irradiation during the entire period of irradiation, comprising a silver halide film that has a gradation of at least 4 when exposed with visible light and of metal foils having atomic numbers of 22 to 50. It has improved image quality compared with known systems.

Abstract: A process for processing silver halide photographic materials by processing, after development and fixing, the silver halide photographic materials with wash water or a stabilizing solution using a replenisher thereof of not more than 2 liters (including 0) per square meter of the photographic material and drying using a roller transporting type automatic processor, wherein the swelling percentage of the silver halide photographic material is not more than 200% and the total processing time from development to drying is not longer than 70 seconds.

Abstract: A silver halide photographic material is disclosed. The photographic material comprises a support having provided thereon at least one light-sensitive silver halide emulsion layer, the silver halide emulsion layer or a layer adjacent to the emulsion layer comprising a compound represented by the following formula (I): ##STR1## wherein R.sub.1, R.sub.2, and R.sub.3, which may be the same or different, each represents a hydrogen atom or a group cleaved by an alkali; R.sub.4 represents an electron attracting group having .sigma..rho. value of Hammett's substituent constant of 0.3 or more; R.sub.5 represents a group substitutable on the benzene ring; n represents 0 or 1; and DI represents a development restrainer or a precursor thereof; and when any two of R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are adjacent each other, each of the two groups may represent a divalent group and the two groups may be bonded to form a heterocyclic group.

Abstract: The present invention is concerned with methods of converting a single resist layer into a multilayered resist.The upper portion of the single resist layer can be converted into a dry-etch resistant form. The conversion can be a blanket conversion of the upper portion of the resist layer or can be a patterned conversion of areas within the upper portion of the layer. A patternwise-converted resist can be oxygen plasma developed.The upper portion of the single resist layer can be patternwise converted into a chemically different composition or structure having altered absorptivity toward radiation. The difference in radiation absorptivity within the patterned upper portion of the resist enables subsequent use of blanket irradiation of the resist surface to create differences in chemical solubility between areas having the altered absorptivity toward radiation and non-altered areas. The difference in chemical solubility enables wet development of the patterned resist.

Abstract: A process for developing a photographic material containing on a support an image-wise exposed silver halide emulsion layer of which the silver halide is substantially silver chloride and in which the photographic material before its exposure contains already at least one silver halide developing agent in a hydrophilic colloid binder in waterpermeable relationship with the silver halide, said process containing the step of contacting the exposed photographic material with an aqueous alkaline liquid, called activator liquid, being initially substantially free from developing agent(s), said contacting being not followed by a silver complex diffusion transfer processing, characterized in that said aqueous alkaline liquid contains a primary and/or secondary amine.

Abstract: A double coated radiographic element is disclosed comprised of a dye coated between an emulsion layer and a support to reduce crossover to less than 10 percent. The dye is present in the form of microcrystalline particles, yet is capable of being decolorized in less than 90 seconds during processing.

Abstract: A silver halide photographic light-sensitive material comprising a specific silver halide grain is disclosed. The siliver halide grain contains a localized portion containing 20 mol % or more of silver iodide and average content of silver iodide of which grain is from 0.1 to 10.0 mol %, provided that the silver halide grain is prepared by mixing an aqueous solution containing a water soluble halide compound and an aqueous solution containing a water soluble silver salt under a condition that pAg of the mixture is raised at 9.7 or more during a period after a half amount of the silver salt to be used has been added to the mixture. The photographic light-sensitive material has improved photographic characteristics and is suitable for radiographic use.

Abstract: Process for preparing photographic emulsion comprising bringing aqueous silver and chloride-containing halide salt solutions into contact in the presence of a dispersing medium to form octahedral silver halide grains having a halide content of at least 50 mole percent chloride, based on total moles of silver present, the improvement forming the grains in the presence of a crystal modifying amount of an aminoazapyridine as described in pH range of 2.5 to 9, pCl range of 0 to 3, the aminoazapyridine compound being added after at least about 6% to about 45% of the silver salt solution has been added.The photographic emulsion is useful in x-ray, laser scanner films, as color separation elements and inverse transfer systems, etc.

Abstract: The present invention relates to a radiation-sensitive positive resist comprising a copolymer obtained by copolymerizing 2,2,2-trifluoroethyl .alpha.-chloroacrylate with 2,2,3,3-tetrafluoropropyl .alpha.-chloroacrylate at a weight ratio of between 90:10 and 50:50 and a radiation-sensitive positive resist composition essentially comprising said copolymer and a solvent containing methyl cellosolve acetate as a major component. The resist and the resist composition according to the present invention exhibit high sensitivity and excellent reproducibility, so that they are useful in the production of a photo mask which is used in the production of LSI, VLSI and the like.

Abstract: A method for processing a silver halide light-sensitive material is disclosed, comprising a support having thereon at least one silver halide emulsion layer with an automatic developing machine which comprises developing an imagewise exposed silver halide light-sensitive material, wherein an amount of organic substances remaining in at least one of the emulsion layer or other hydrophilic colloid layers comprising a surface protective layer after said processing with said automatic developing machine, is not more than about 90 wt % of the weight of said organic substances prior to said processing.

Abstract: Radiation-sensitive interpolymers comprising 10-90 mole % of a polymerized maleimide monomer are useful as resists having high sensitivity to E-beams or X-rays.

Abstract: Automatic processing equipment for photographic film, particularly radiographic black-and-white film, are required to handle different brands and constructions of film with the same processing chemistry. The Applicants have found that developer chemistry fluctuations seem to be very high when processing conventional films and newer, lower silver coating weight films. It has been found that the addition of an aqueous soluble, non-photosensitive bromide salt into radiographic film reduces the developer chemistry fluctuations.

Abstract: The invention is a process for making a transmission mask which can be used in structuring a semiconductor substrate in an additive or subtractive way by two galvanic depositions of layers of which one provides the mask structure and the other a grid structure covering the openings in the mask structure. The thickness of the structure is freely selectable self-adjusting (within the limits of the known engineering methods). The aim is the production of a transmission mask with a constant effective thickness above the mask surface.

Abstract: A wide-dynamic-range wide latitude silver halide film is used for X-ray intensifying screen exposure and subsequent computer enhancement of the images produced thereon. The enhanced image is equivalent to images produced by a host of individual films and screens.

Abstract: A silver halide photographic material is disclosed, comprising a support having provided thereon at least one light-sensitive silver halide emulsion layer and at least one substantially light-insensitive silver halide emulsion layer, wherein the substantially light-insensitive silver halide emulsion layer is present between a layer exhibiting the highest sensitivity among the light-sensitive silver halide emulsion layers and the support. This material is decreased in halation and cross-over light, and is excellent in sharpness.

Abstract: A method for microfabrication of a pattern on a substrate in accordance with the present invention comprises steps of; forming a thin film of X-ray sensitive resist of chlorinated polymethylstyrene on the substrate, wherein the chlorinated polymethylstyrene has an average molecular weight of 400,000-700,000 and a chlorine content of 20-40 wt. % and contains fundamental monomer structure of ##STR1## where at least one of the atom sites .alpha., .beta. and .gamma. is occupied by chlorine instead of hydrogen; selectively exposing the film to Pdl.sub..alpha. radiation; developing the exposed film with ethoxyethanol and/or methoxyethanol.

Abstract: An aqueous photographic silver halide developer/replenisher solution particularly useful in low throughput machine processing of X-ray silver halide elements.

Abstract: A light-sensitive silver halide photographic material for X-ray photography characterized in that the material has the characteristic curve whose gamma between optical densities of 0.50 and 1.50 is 2.7 to 3.3 and gamma between optical densities of 2.00 and 3.00 is 1.5 to 2.5, when processed by use of the following developer:______________________________________ Potassium sulfite 55.0 g Hydroquinone 25.0 g 1-Phenyl-3-pyrazolidone 1.2 g Boric acid 10.0 g Potassium hydroxide 21.0 g Triethylene glycol 17.5 g 5-Methylbenztriazole 0.04 g 5-Nitrobenzimidazole 0.11 g 1-Phenyl-5-mercaptotetrazole 0.015 g Glacial acetic acid 16.0 g Potassium bromide 4.0 g Add water to make up one liter.

Abstract: This invention relates to a radiation-sensitive composition having resistance to oxygen reactive-ion etching and a process for forming a pattern by using the same.The radiation-sensitive composition of this invention comprises a mixture of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane and a polysilsesquioxane, said mixture containing 5 to 100 wt. % of cis-(1,3,5,7-tetrahydroxy)-1,3,5,7-tetraphenylcyclotetrasiloxane, and a resist containing a phenolic resin soluble in an aqueous alkali solution.

Abstract: Process for preparing a photographic emulsion containing tabular silver halide grains which have narrow size distribution comprising:A. adding silver nitrate to a vessel containing dispersing medium/bromide mixture, initial bromide ion concentration is 0.08 to 0.25 N to form tabular seed grains;B. adding a basic silver halide solvent, e.g., ammonia, ammoniacal solution, etc. to achieve 0.02 N to 0.2 N of the solvent (e.g., after at least 2% by weight of total silver nitrate has been added);C. stopping silver nitrate addition for 0.5 to 60 minutes, e.g., bromide ion concentration is in the range of 0.005 to 0.05 N;D. neutralizing at least some of the basic silver halide solvent present; andE. adding additional silver nitrate and halide, i.e., Br.sup.- and BrI.sup.-, by balanced double jet procedure.The emulsions are used in photographic elements for x-ray, graphic arts, etc.

Abstract: There is disclosed a mask for X-ray lithography wherein a peroxopolytungsten compound is used as an absorber, and a process for producing the same. Since this compound has a sensitivity for electron beams and light and serves as an absorber for X-rays, a mask for X-ray lithorgraphy is made only by applying this compound to a substrate, exposing the same to light to form a transferred pattern, and effecting development. Thus, the step of etching the absorber which is essential in the conventional process, is not needed. Therefore, masks having a highly accurate pattern and few defects can be produced with a high production yield.

Abstract: A process for manufacturing a mask for use in X-ray photolithography begins with a step of providing a glass disk (50) which is coated with a layer of boron nitride (52). The glass disk is about 1/4 of an inch thick and about 4.5 to 6 inches in diameter. A circular portion (50a) of the boron nitride layer on one side of the glass disk is removed thus exposing a circular portion of the glass disk. The exposed portion of the glass disk is then removed, leaving a glass ring coated with a boron nitride membrane on one side. A layer of polyimide (54) and a layer of x-ray opaque substance (58) is deposited on the boron nitride membrane. The x-ray opaque substance is then patterned, the resulting structure being a mask which is used in X-ray photolithography.

Abstract: An optical recording method which comprises providing a recording layer containing a recording susbstance that has an absorption maximum in the visible and near infrared wavelength region of 600 to 1,200 nm and loses or diminishes its power to absorb visible or near infrared radiation in the aforesaid wavelength region upon exposure to ultraviolet radiation, X-rays, an electron beam or an ion beam, and irradiating desired locations of the recording layer with ultraviolet radiation, X-rays, an electron beam or ion beam to form a pattern based on the presence or absence, or variation in strength, of the power to absorb visible or near infrared radiation in the aforesaid wavelength region so as to record information in the recording layer; a method for reading optically recorded information which comprises illuminating a pattern formed as described above with laser light having a wavelength in the aforesaid visible and near infrared region and detecting the presence or absence, or variation in intensity, of abso

Abstract: Industrial radiographic systems having low grainines and high information density may be constructed with intensifying screens sandwiching radiation sensitive elements having emulsions wherein the average size of the silver halide grains is less than 0.4 micrometers.

Abstract: A method of lithography employing an electromagnetic wave having a very short wave length such as X-ray and a resist layer sensitive to that electromagnetic wave is disclosed. The irradiation process is divided into two steps. One step is selectively irradiating the electromagnetic wave, as in the prior art, to the resist layer in a desired pattern. The other steps is non-selective irradiation over the entire area of the resist layer. The latter step may be conducted with a plurality of workpieces such as semiconductor wafers simultaneously.

Abstract: A photosensitive article comprises a substrate of a triacetate or other polyester film or paper coated with a layer of a photosensitive composition. The photosensitive composition includes at least one photodissociable choline compound sensitive to x-rays or radiation of shorter wave lengths, at least one image-forming compound capable of producing a dye by reaction with the dissociation products of the choline compound, a water soluble polymeric binder and a low melting point fatty acid salt for heat development. The photosensitive article can be used to produce an x-ray image by exposing the article image-wise to x-rays and heating the exposed article to develop the image.

Abstract: An additive process for manufacturing a mask (113) used in x-ray photolithography includes the step of coating a boron nitride layer (102) with a layer of indium tin oxide (104) and a second layer of boron nitride (106). The second boron nitride layer is patterend and used as a stencil during a plating process while the indium tin oxide layer is used as a plating base. Because boron nitride and thin indium tin oxide are both x-ray transparent, neither the stencil nor the plating base need be removed during the manufacturing process.

Abstract: A silver halide light-sensitive photographic material for radiographic use comprising a transparent support and a silver halide emulsion layer on both sides thereof such that the blue light transmission density difference between the support and the silver halide layer is .gtoreq.0.35 and .ltoreq.0.60.

Abstract: The invention relates to persistent screens where the image to be stored is stored in a layer (3) which contains as an active substance an illuminable luminophor (5) and which is tinted to increase the picture sharpness. The luminophor (5) is a rather small quantity of organic and/or inorganic UV luminophor material. In this connection, it has been found to be desirable to at least reduce the light loss caused by the tinting. To this end, the invention avoids dispersions of the scanning beam (14) in the persistence layer (3) during scanning by admixing to the luminophor (5) an UV luminophor (6) as well as an optical brightener (7). It has also been found appropriate to apply the persistence layer (3) on a substrate (2), such as a polyester foil, which is tinted with a substance that absorbs the light of the scanning beam (14) used for illuminating the layer (5). Such a screen utilizing the inventive principles is particularly useful in medical technology applications.

Abstract: A silver halide photographic material is developed with an alkaline black-and-white developer comprising (1) hydroquinone, (2) a 3-pyrazolidone-type developing agent, (3) a dialdehyde-type hardener, (4) at least one antifoggant selected from the group consisting of indazole-type antifoggants, benzimidazole-type antifoggants and benzotriazole-type antifoggants, and (5) at least one chelating agent selected from the group consisting of diethylenetriaminepentaacetic acid, triethylenetetraminehexaacetic acid, 1,3-diamino-2-propanoltetraacetic acid, glycol ether diaminetetraacetic acid, ethylenediaminetetramethylenephosphonic acid, aminotrimethylenephosphonic acid and alkali metal salts of said acids.

Abstract: A laser beam records a digital representation of a medical picture and medical information on an optical data storage strip. The strip is adhered to a medium containing an eye readable picture generated from the same data, such as X-ray pictures, CAT-scan pictures, ultrasonic or NMR images. The medical information may be the image itself, a description or diagnosis related to the picture.

Abstract: A silver halide photographic light-sensitive emulsion contains silver halide particles, chemically sensitized, the average concentration of the silver iodide of which is from 0.5 to 10 mole % and which have inside part wherein not less than 20 mole percent silver iodide is present locally; and at least one cyanine dyes having the Formulas [I], [II] and [III] as herein described.

Abstract: An acetalized polyvinyl alcohol having a molecular weight of 10,000 to 1,000,000 represented by the formula ##STR1## wherein: R.sup.1 represents a residue of an aldehyde or a ketone the residue having no photosenitivity to ultraviolet rays; R.sup.2 represents a hydrogen atom, which may partially be substituted with an acetyl group; R.sup.3 represents naught or a monomeric unit copolymerizable with vinyl acetate; and l, m, n, are integers indicating polymerization degrees, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance and is suitable as a negative-type resist in ionizing radiation lithography.

Abstract: A radiographic element is disclosed having a support capable of transmitting blue light and, coated on each of two opposite major faces of said support, a silver halide emulsion layer capable of forming a latent image in response to exposure to blue light. Interposed between at least one of the latent image forming emulsion layers and the support is a blue absorbing silver iodide emulsion layer exhibiting at temperatures below 25.degree. C. an absorption transition wavelength that is bathochromically displaced by at least 20 nm as compared to the absorption transition wavelength of .beta. phase silver iodide.

Abstract: A silver halide X-ray photosensitive material has a support bearing thereon a silver halide emulsion layer. The layer has at least three kinds of silver halide emulsions whose photographic characteristics are substantially different from each other. Out of at least three kinds of the silver halide emulsions, at least one of them is a monodisperse emulsion E.sub.1 and at least another one of them is a polydisperse emulsion E.sub.2.

Abstract: A silver halide photographic light-sensitive material is described, comprising at least one light-sensitive silver halide emulsion layer on a support, wherein the emulsion in said light-sensitive silver halide emulsion layer comprises a silver iodobromide emulsion containing 3 mol % or more of iodide, and at least one of said light-sensitive emulsion layer or another hydrophilic colloid layer contains a polyoxyethylene type surface active agent and at least one of said light-sensitive emulsion layer or another hydrophilic colloid layer contains a meso-ionic triazolium compound represented by formula (I) ##STR1## wherein X represents a sulfur ion or --N--R.sup.4, and R.sup.1, R.sup.2, R.sup.3, and R.sup.4 each represents a hydrogen atom or a substituted or nonsubstituted alkyl group, aryl group, or heterocyclic group, or R.sup.1 and R.sup.2, R.sup.2 and R.sup.3 or R.sup.3 and R.sup.4 can together form a heterocyclic ring.

Abstract: A method for detecting an endpoint of development including the steps of; forming a resist layer on a conductive layer formed on a substrate; exposing the resist layer by using light, X-rays, or electron beams; forming one electrode by connecting a connector consisting of a first conductive material to the conductive layer through the exposed resist layer on the substrate; forming another electrode by dipping an assembly consisting of a second conductive material into a developing solution; and developing the exposed resist layer while monitoring the current flowing between two electrodes.

Abstract: A silver halide photographic light-sensitive material comprising a support having the first photographic structural layer comprising one or more layers on a side of the support and the second photographic structural layer comprising one or more layers on the other side of the support, in which at least one of the photographic structural layers comprises a silver halide light-sensitive emulsion layer, and the total amount of gelatin contained in the photographic structural layer comprising the silver halide emulsion layer is within the range of from 2.25 g/m.sup.2 to 3.15 g/m.sup.2. The uppermost layer of the photographic structural layer comprising the silver halide emulsion is formed by coating of a solution having a surface tension of from 15 to 26 dyn/cm, and the second photographic structural layer is coated and gelled simultaneously with coating and drying of the first photographic structural layer.