X-ray Exposure Process Patents (Class 430/967)
  • Patent number: 9005875
    Abstract: A method of fabricating a substrate including coating a first resist onto a hardmask, exposing regions of the first resist to electromagnetic radiation at a dose of 10.0 mJ/cm2 or greater and removing a portion of said the and forming guiding features. The method also includes etching the hardmask to form isolating features in the hardmask, applying a second resist within the isolating features forming regions of the second resist in the hardmask, and exposing regions of the second resist to electromagnetic radiation having a dose of less than 10.0 mJ/cm2 and forming elements.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: April 14, 2015
    Assignee: Intel Corporation
    Inventors: Robert L. Bristol, Paul A. Nyhus, Charles H. Wallace
  • Patent number: 8465903
    Abstract: Methods for forming photoresists sensitive to radiation on a substrate are provided. Described are chemical vapor deposition methods of forming films (e.g., silicon-containing films) as photoresists using a plasma which may be exposed to radiation to form a pattern. The deposition methods utilize precursors with cross-linkable moieties that will cross-link upon exposure to radiation. Radiation may be carried out in the with or without the presence of oxygen. Exposed or unexposed areas may then be developed in an aqueous base developer.
    Type: Grant
    Filed: October 6, 2011
    Date of Patent: June 18, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Timothy W. Weidman, Timothy Michaelson, Paul Deaton, Nitin K. Ingle, Abhijit Basu Mallick, Amit Chatterjee
  • Patent number: 7957582
    Abstract: Certain embodiments of the present invention provide for a system and method for modeling S-distortion in an image intensifier. In an embodiment, the method may include identifying a reference coordinate on an input screen of the image intensifier. The method also includes computing a set of charged particle velocity vectors. The method also includes computing a set of magnetic field vectors. The method also includes computing the force exerted on the charged particle in an image intensifier. Certain embodiments of the present invention include an iterative method for calibrating an image acquisition system with an analytic S-distortion model. In an embodiment, the method may include comparing the difference between the measured fiducial shadow positions and the model fiducial positions with a threshold value. If the difference is less than the threshold value, the optical distortion parameters are used for linearizing the set of acquired images.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: June 7, 2011
    Assignee: General Electric Company
    Inventors: Dun Alex Li, Joseph Casey Crager, Peter Kelley, Andrey Litvin
  • Patent number: 7824845
    Abstract: Linear or branched functionalized polycarbosilanes having an absorbance less than 3.0 ?m?1 at 193 nm and a relatively high refractive index are provided. The functionalized polycarbosilanes contain at least one pendant group that is acid labile or aqueous base soluble. Also disclosed are photoresists formulations containing the functionalized polycarbosilanes that are suitable for use in lithography, e.g., immersion lithography.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: November 2, 2010
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Matthew E. Colburn, Daniel P. Sanders, Ratnam Sooriyakumaran, Hoa D. Truong
  • Patent number: 7429444
    Abstract: The present invention provides a black and white photothermographic material including at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a binder on a support, wherein the black and white photothermographic material contains a compound represented by the following formula (1) and at least one compound represented by a formula selected from the group consisting of the following formulae (2), (3), (4), and (5): wherein R1, R2, R3, and R4 each independently represent a hydrogen atom or a substituent which substitutes for a hydrogen atom on a benzene ring; and R5 represents an alkyl group, an aryl group, or a heterocyclic group; An image forming method using the black and white photothermographic material and a fluorescent intensifying screen is also provided.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: September 30, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Yasuhiro Yoshioka
  • Patent number: 7344821
    Abstract: A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increases a solubility of the resin (B) in an alkaline developer by an action of an acid, wherein the resin (B) comprises a repeating unit having an alicyclic group connected with a fluorine-substituted alcohol residue; and a pattern formation method using the composition.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: March 18, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Kazuyoshi Mizutani
  • Patent number: 7326520
    Abstract: The present invention provides a polymer represented by the following formula 1 and a chemically amplified resist composition including the polymer, which resist composition is excellent in adhesion, storage stability and dry etch resistance, with good resolution in both C/H and L/S patterns, and provides a good pattern profile irrespective of the type of the substrate due to its good process window:
    Type: Grant
    Filed: April 18, 2005
    Date of Patent: February 5, 2008
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Hyun-Sang Joo, Joo-Hyeon Park, Dong-Chul Seo, Young-Taek Lim, Seong-Duk Cho, Ji-Young Song, Kyoung-Mun Kim
  • Patent number: 7270937
    Abstract: Overcoating compositions for a photoresist and methods of using the same are disclosed. More specifically, overcoating compositions for a photoresist comprising materials which can weaken acid stably are disclosed. These materials neutralize large amounts of acid produced in the upper portion of a photoresist film, thereby uniformizing vertical distribution of the acids. As a result, vertical and fine patterns of less than 100 nm thickness can be obtained.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: September 18, 2007
    Assignee: Hynix semiconductor Inc.
    Inventor: Jae Chang Jung
  • Patent number: 7267932
    Abstract: A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided.
    Type: Grant
    Filed: September 12, 2002
    Date of Patent: September 11, 2007
    Assignee: Postech Foundation
    Inventors: Joon Won Park, Young Hye La, Joong Ho Moon, Bongsoo Kim, Tai Hee Kang, Ki Jeong Kim
  • Patent number: 7261983
    Abstract: An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility where an archive media includes etched alignment attributes. Exposing a pattern of complementary alignment attributes onto the archive media such that the pattern of complementary alignment attributes overlay and interlock with the etched alignment attributes thereby forming completed alignment attributes. Then, measuring offsets in the completed alignment attributes and constructing a calibration file for the archive media based upon the offset measurements and other characteristic data of the exposure tool.
    Type: Grant
    Filed: March 8, 2006
    Date of Patent: August 28, 2007
    Assignee: Litel Instruments
    Inventors: Adlai H. Smith, Robert O. Hunter, Jr.
  • Patent number: 7214476
    Abstract: An image forming method applying X-ray exposure to a photothermographic material having, on at least one surface of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder, wherein the photothermographic material is brought into close contact with a fluorescence intensifying screen containing a fluorescent material that emits light, 50% or more of which has a wavelength in a range of 350 nm or more and 420 nm or less.
    Type: Grant
    Filed: September 27, 2004
    Date of Patent: May 8, 2007
    Assignee: Fujifilm Corporation
    Inventors: Katsutoshi Yamane, Katsuhiro Kohda
  • Patent number: 7179568
    Abstract: A dark-field imaging method for detecting defects in reflective lithography masks (e.g., extreme ultraviolet (EUV) masks) used, e.g., in processes for the fabrication of microelectronic devices. A mask blank is coated with a photoresist layer having a fluorescent dye incorporated therein. The photoresist layer is exposed to a source of radiation (e.g., EUV radiation or glancing soft X-rays). In areas of the mask blank having defects the combined direct and reflected radiation will be insufficient fully to expose the photoresist layer. After development, photoresist will remain on the mask blank surface in areas corresponding to defects. Illumination with the excitation wavelength of the fluorescent dye reveals the location of any remaining photoresist, which can be detected using an optical microscope, thereby to detect defects in the mask blank.
    Type: Grant
    Filed: July 10, 2003
    Date of Patent: February 20, 2007
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Francesco Cerrina, Adam Pawloski, Lin Wang
  • Patent number: 7169544
    Abstract: Black-and-white, dry processable thermally developable materials have increased stability after imaging with the incorporation of at least 0.0001 mol/m2 of a thermal solvent having one or more >N—C(?O)— groups. Such thermally developable materials include both thermographic and photothermographic materials.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: January 30, 2007
    Assignee: Eastman Kodak Company
    Inventors: Kui Chen-Ho, William D. Ramsden, Chaofeng Zou, Doreen C. Lynch, James B. Philip, Jr., Karissa L. Eckert, George J. Burgmaier
  • Patent number: 7166408
    Abstract: Provided is an image forming method including providing a photothermographic material having image forming layers containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on both surfaces of a support, imagewise exposing the photothermographic material with a fluorescent intensifying screen, and thermally developing the photothermographic material in a thermal developing apparatus having a heating section, wherein the heating section has at least two heating means and a difference between a sensitivity when the photothermographic material is developed at 25° C. and relative humidity of 75% and a sensitivity when the photothermographic material is developed at 25° C. and relative humidity of 20% is 0.20 or less. An image forming method similar to that described above in which the photothermographic material has an antistatic layer is also provided.
    Type: Grant
    Filed: October 28, 2004
    Date of Patent: January 23, 2007
    Assignee: Fujifilm Corporation
    Inventors: Takayoshi Oyamada, Takeshi Funakubo
  • Patent number: 7166421
    Abstract: Black-and-white, aqueous-based, silver halide-containing photothermographic materials have increased stability both prior to use and after imaging with the incorporation of at least 0.005 g/m2 of a tetrafluoroborate salt.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: January 23, 2007
    Assignee: Eastman Kodak Company
    Inventors: Sharon M. Simpson, Kumars Sakizadeh, Leif P. Olson
  • Patent number: 7160657
    Abstract: An apparatus and method for manufacturing and using a calibrated registration reference wafer in a semiconductor manufacturing facility. A reference reticle consisting of a 2-dimensional array of standard alignment attributes is exposed several times onto a photoresist coated semiconductor wafer using a photolithographic exposure tool. After the final steps of the lithographic development process the resist patterned wafer is physically etched using standard techniques to create a permanent record of the alignment attribute exposure pattern. The permanently recorded alignment attributes are measured for placement error using a conventional overlay metrology tool. The resulting overlay error data is used to generate a calibration file that contains the positions of the alignment attributes on the reference wafer. The reference wafer and calibration file can be used to determine the wafer stage registration performance for any photolithographic exposure tool.
    Type: Grant
    Filed: January 26, 2004
    Date of Patent: January 9, 2007
    Assignee: Litel Instruments
    Inventors: Adlai Smith, Bruce McArthur, Robert Hunter, Jr.
  • Patent number: 7147982
    Abstract: A radiographic imaging assembly comprises a symmetric radiographic silver halide film has an overall system speed of at least 1100 to provide images with improved contrast and sharpness and reduced fog. The imaging assembly includes a symmetric radiographic film having a speed of at least 700 that includes at least two silver halide emulsions on each side of the support that comprise tabular silver halide grains. The emulsions closer to the support comprise a suitable crossover control agent. The imaging assembly also includes a pair of phosphor intensifying screens that have an average screen sharpness measurement (SSM) greater than reference Curve A of FIG. 4. The screens can have a support that includes a reflective substrate comprising a continuous polyester phase and microvoids containing inorganic particles dispersed within the polyester phase.
    Type: Grant
    Filed: October 5, 2004
    Date of Patent: December 12, 2006
    Assignee: Eastman Kodak Company
    Inventors: Robert E. Dickerson, Phillip C. Bunch, David J. Steklenski
  • Patent number: 7129033
    Abstract: A photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and an X-ray image forming method using the same, wherein 50% or more of a total projected area of the photosensitive silver halide is occupied by tabular grains having an aspect ratio of 2 or more, and the grains have at least one epitaxial junction portion having a multifold structure. A photothermographic material with high sensitivity and excellent storage stability, and an image forming method using the material are provided.
    Type: Grant
    Filed: August 4, 2005
    Date of Patent: October 31, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Takayoshi Mori
  • Patent number: 7112399
    Abstract: Photothermographic materials are coated with thermally developable imaging layers on both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength in imaging assemblies. These imaging assemblies can be exposed to X-radiation and thereby form a latent image in the photothermographic material that can eventually be heat developed and used for medical diagnosis. The photothermographic materials contain an opaque material that acts as a crossover control agent that absorbs radiation at the predetermined wavelength, for example at 300 to 450 nm, and has limited absorption at higher wavelengths. When the photothermographic material is heated, the opaque material loses its opacity. Additional crossover control agents, such as UV-absorbing compounds, can also be added to the support or to an antihalation layer.
    Type: Grant
    Filed: August 19, 2004
    Date of Patent: September 26, 2006
    Assignee: Eastman Kodak Company
    Inventors: Robert E. Dickerson, Alphonse D. Camp
  • Patent number: 7074549
    Abstract: Photothermographic materials contain an X-radiation-sensitive phosphor that emits in the range of from about 100 to about 410 nm. The X-radiation-sensitive phosphor is a rare earth phosphate, a yttrium phosphate, a strontium phosphate or a strontium fluoroborate. These photothermographic materials can be provides out of organic solvent or aqueous solvent coating formulations.
    Type: Grant
    Filed: April 16, 2004
    Date of Patent: July 11, 2006
    Assignee: Eastman Kodak Company
    Inventors: Sharon Mary Simpson, Kurt DeLance Sieber, Andrea Lynnae Hansen
  • Patent number: 7056650
    Abstract: Thermally developable imaging materials have an outermost protective layer that is composed of one or more hydrophilic film-forming components. The predominant film-forming component is a positively-charged latex polymer that has cationic groups. The charged latex polymer is present as latex particles that have prepared in the presence of a non-ionic or cationic stabilizer in an amount of at least 0.5% (by weight) that has an HLB value of 7 to 20. The nonionic or cationic stabilizer becomes associated with the latex polymer particles. Both thermographic and photothermographic materials can be prepared with such protective layers.
    Type: Grant
    Filed: September 7, 2004
    Date of Patent: June 6, 2006
    Assignee: Eastman Kodak Company
    Inventors: Jon A. Hammerschmidt, Jeffrey W. Leon
  • Patent number: 7041428
    Abstract: A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and, and an acid generator: Chemical Formula 1: wherein R1 is a hydrogen atom, a chlorine atom, a fluorine atom, an alkyl group or an alkyl group including a fluorine atom; and R2 is a protecting group released by an acid.
    Type: Grant
    Filed: September 12, 2002
    Date of Patent: May 9, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Mitsuru Ueda, Tsuyohiko Fujigaya
  • Patent number: 7018770
    Abstract: A reflective radiographic material is useful to provide images that can be viewed without a light box. This reflective radiographic material has a reflective support and a silver halide emulsion on one side of the support only. The material can be used with a single green- or blue-light emitting fluorescent intensifying screen as part of an imaging assembly. The reflective support enables the image in the radiographic material to be viewed without a light box and the speed of the material enables the use of low power X-radiation generating equipment.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: March 28, 2006
    Inventors: Robert E. Dickerson, Kenneth A. Duke, Phillip C. Bunch, Alan S. Fitterman
  • Patent number: 7014977
    Abstract: A reflective radiographic material (at least 200 system speed) is useful especially to provide images that can be viewed without a light box. This reflective radiographic material has a reflective support, a silver halide emulsion on one side of the support only, and a photographic speed of at least 200. The reflective material also includes an incorporated black-and-white developing agent and a co-developing agent, and can be used with a single fluorescent intensifying screen as part of an imaging assembly. The reflective support enables viewing the resulting image without a light box and the high speed of the material enables the use of low power X-radiation generating equipment. The incorporated black-and-white developing agent and co-developing agent allow the radiographic material to be quickly processed after exposure using simplified processing chemistry.
    Type: Grant
    Filed: March 28, 2005
    Date of Patent: March 21, 2006
    Assignee: Eastman Kodak Company
    Inventors: Robert E. Dickerson, Kenneth A. Duke, Alan S. Fitterman
  • Patent number: 6936411
    Abstract: A silver halide industrial radiographic material comprising on at least one side of a support a hydrophilic gelatinous non-spectrally sensitized radiation-sensitive emulsion layer, having grains, coated in a total amount in the range from 6 to 20 g, expressed as an equivalent amount of silver nitrate per square meter, and at least one non-radiation sensitive protective gelatinous antistress overcoat layer thereupon, wherein a ratio of gelatin to silver, expressed as silver nitrate in the said layer arrangement is at least 0.70, wherein said gelatinous layers are hardened by a gelatin cross-linking agent in an amount in order to have a dissolving time of at least 40 minutes, said time being defined as the period of time from the moment when the silver halide photographic material, dipped into 50 ml of an aqueous solution of 1.5% by weight of sodium hydroxide at 50° C.
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: August 30, 2005
    Assignee: AGFA-Gevaert
    Inventors: Marc Van de Zegel, Marleen De Vester
  • Patent number: 6916598
    Abstract: This invention discloses compositions that can be polymerized/crosslinked imagewise upon exposure to ionization radiation such as x-ray, electron beam, ion beam, and gamma-ray. This invention also discloses methods of use for these compositions for microfabrication of ceramics, for stereolithography, and for x-ray, e-beam, and ion-beam lithography which can be used for photoresists.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: July 12, 2005
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Ying Wang
  • Patent number: 6866973
    Abstract: There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.
    Type: Grant
    Filed: December 3, 2001
    Date of Patent: March 15, 2005
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiroshi Maehara
  • Patent number: 6861197
    Abstract: A base polymer having incorporated an ester group having a fluorinated alicyclic unit is provided. A resist composition comprising the polymer is sensitive to high-energy radiation, and has excellent sensitivity at a wavelength of less than 200 nm, significantly improved transparency by virtue of the fluorinated alicyclic units incorporated as well as satisfactory plasma etching resistance. The resist composition has a low absorption at the exposure wavelength of a F2 laser and is ideal as a micropatterning material in VLSI fabrication.
    Type: Grant
    Filed: February 28, 2002
    Date of Patent: March 1, 2005
    Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Co., Ltd.
    Inventors: Yuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Michitaka Ootani, Satoru Miyazawa, Kentaro Tsutsumi, Kazuhiko Maeda
  • Patent number: 6847433
    Abstract: A deformable holder, system, and process where long range errors (any of lithography, metrology, or overlay errors) between the image of a mask and an existing pattern on a wafer from a number of potential sources are corrected. The long range errors are determined using either a through-the-lens alignment metrology system or an around-the-lens metrology system. Deformation values are determined to compensate for the longe range errors. The deformation values are determined by either solving simultaneous equations or by finite-element linear-stress-analysis (FEA). The mask or wafer is then distorted, in-plane, by an amount related to the determined deformation values using an actuator such an a piezoelectric ceramic to push or pull the mask or wafer to substantially realign the projected image of the mask and the existing pattern on the wafer.
    Type: Grant
    Filed: June 3, 2002
    Date of Patent: January 25, 2005
    Assignee: Agere Systems, Inc.
    Inventors: Donald L. White, Obert Reeves Wood, II
  • Publication number: 20040241590
    Abstract: A method for nano-scale high resolution patterning of self-assembled monolayer using soft X-rays is provided. The method involves forming an aromatic imine molecular layer having substituents at its terminal rings on a substrate, selectively cleaving bonds to the subsituents of the aromatic imine molecular layer, and hydrolyzing the aromatic imine molecular layer.
    Type: Application
    Filed: March 12, 2004
    Publication date: December 2, 2004
    Inventors: Joon Won Park, Young Hye La, Joong Ho Moon, Bongsoo Kim, Tai Hee Kang, Ki Jeong Kim
  • Patent number: 6815155
    Abstract: An radiographic imaging system for making a radiograph by a radiography apparatus using a photographic combination of a silver halide photographic light sensitive material in combination with intensifying screens, the photographic material comprising a support having a light sensitive silver halide emulsion layer on each both sides of the support, wherein the radiography apparatus conducts making a radiograph under the condition that a distance between a focal point of an X-ray tube and the photographic material is 0.9 to 3.0 m, a distance between the focal point of the X-ray tube and an object is 0.5 to 2.7 m and a distance between the object and the photographic combination is 0.3 to 1.5 m.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: November 9, 2004
    Assignee: Konica Corporation
    Inventor: Masaaki Taguchi
  • Patent number: 6794106
    Abstract: A radiographic imaging assembly comprises a radiographic silver halide film having a film speed of at least 100 and a single fluorescent intensifying screen that has a screen speed of at least 200. This imaging assembly is particularly useful for mammography or imaging or other soft tissues.
    Type: Grant
    Filed: July 17, 2003
    Date of Patent: September 21, 2004
    Assignee: Eastman Kodak Company
    Inventors: Robert E. Dickerson, William E. Moore, David J. Steklenski
  • Patent number: 6787285
    Abstract: A pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator. When the formed pattern is heated, a thermal generator generates acid during the heating process, and a cross-linking reaction occurs to photoresist compositions, thereby preventing pattern width slimming due to SEM-beam for CD measurement.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: September 7, 2004
    Assignee: Hynix Semiconductor Inc.
    Inventors: Keun Kyu Kong, Gyu Dong Park, Jae Chang Jung, Ki Soo Shin
  • Publication number: 20040170924
    Abstract: Compounds of the formulae I, II and III 1
    Type: Application
    Filed: December 8, 2003
    Publication date: September 2, 2004
    Inventors: Kazuhiko Kunimoto, Junichi Tanabe, Hisatoshi Kura, Hidetaka Oka, Masaki Ohwa
  • Patent number: 6777145
    Abstract: The present invention relates to a test structure which is formed on a reticle simultaneously with a pattern that will be used to build an integrated circuit device. The test structure comprises a large rectangular end and several rectangular shapes that extend from one side of the rectangular end in a parallel array. The width of the rectangular shape extensions is equal to the spacing between them and is the same as the width of the minimum feature size in the lithographic process to be monitored. A CD SEM is used to measure the edge width of the convex and concave sections of the structure as printed in photoresist at various focus settings and a plot of edge width vs. focus setting is generated. The intersection of the lines representing the convex section and concave section measurements indicates the best focus setting for the lithographic process.
    Type: Grant
    Filed: May 30, 2002
    Date of Patent: August 17, 2004
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Wen-Zhan Zhou, Hui-Kow Lim, Teng Hwee Ng, Ron Lopez, Goswami Indranil
  • Patent number: 6773862
    Abstract: A negative resist composition comprising: (A) a compound being capable of generating an acid upon irradiation with an actinic ray or a radiation; (B) an alkali-soluble polymer; and (C) at least two crosslinking agents being capable of generating crosslinking with the polymer (B) by an action of an acid, wherein the crosslinking agent (C) comprises at least two compounds having a different skeleton from each other, which are selected from phenol derivatives having at least one of a hydroxymethyl group and an alkoxymethyl group on a benzene ring thereof, in which a sum of the hydroxymethyl group and the alkoxymethyl group is two or more, one of the at least two crosslinking agents comprises one or two benzene rings in the molecule thereof, and other one of the at least two crosslinking agents comprises from 3 to 5 benzene rings in the molecule thereof.
    Type: Grant
    Filed: October 21, 2002
    Date of Patent: August 10, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koji Shirakawa, Yutaka Adegawa, Shoichiro Yasunami
  • Patent number: 6770408
    Abstract: Disclosed is an X-ray mask for use in an exposure apparatus for transferring a circuit pattern onto an exposure substrate by use of an X-ray beam to produce a semiconductor device, wherein the X-ray mask includes an X-ray transmission film having a layered X-ray absorptive material formed thereon, and a holding frame for holding the X-ray transmission film, and wherein the X-ray transmission film is held by the holding frame with an even step-like structure defined at its peripheral portion. With this arrangement, a dust particle adhered to the X-ray mask surface and having a predetermined height can be detected precisely, such that a large integration device can be produced effectively.
    Type: Grant
    Filed: August 20, 2002
    Date of Patent: August 3, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideki Ina, Kenji Itoga
  • Publication number: 20040146814
    Abstract: A silver halide industrial radiographic material comprising on at least one side of a support a hydrophilic gelatinous non-spectrally sensitized radiation-sensitive emulsion layer, having grains, coated in a total amount in the range from 6 to 20 g, expressed as an equivalent amount of silver nitrate per square meter, and at least one non-radiation sensitive protective gelatinous antistress overcoat layer thereupon, wherein a ratio of gelatin to silver, expressed as silver nitrate in the said layer arrangement is at least 0.70, wherein said gelatinous layers are hardened by a gelatin cross-linking agent in an amount in order to have a dissolving time of at least 40 minutes, said time being defined as the period of time from the moment when the silver halide photographic material, dipped into 50 ml of an aqueous solution of 1.5% by weight of sodium hydroxide at 50 °C.
    Type: Application
    Filed: January 15, 2004
    Publication date: July 29, 2004
    Inventors: Marc Van de Zegel, Marleen De Vester
  • Patent number: 6764806
    Abstract: The present invention provides an over-coating composition comprising a basic compound for coating a photoresist composition to provide a vertical photoresist pattern.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: July 20, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Keun Kyu Kong, Cha Won Koh, Jin Soo Kim, Ki Ho Baik
  • Patent number: 6753132
    Abstract: A resist film is formed by applying, on a substrate, a pattern formation material containing a polymer including a first unit represented by Chemical Formula 1 and a second unit represented by Chemical Formula 2, and an acid generator: Chemical Formula 1: Chemical Formula 2:  wherein R1 and R2 are the same or different and selected from the group consisting of an alkyl group, a chlorine atom and an alkyl group including a fluorine atom; R3 is a protecting group released by an acid; and m is an integer of 0 through 5. Subsequently, the resist film is irradiated with exposing light of a wavelength shorter than a 180 nm band for pattern exposure, and a resist pattern is formed by developing the resist film after the pattern exposure.
    Type: Grant
    Filed: January 3, 2002
    Date of Patent: June 22, 2004
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shinji Kishimura, Masayuki Endo, Masaru Sasago, Masamitsu Shirai, Masahiro Tsunooka
  • Publication number: 20040096770
    Abstract: A radiographic imaging assembly comprises a radiographic silver halide film having a film speed of at least 100 and a single fluorescent intensifying screen that has a screen speed of at least 200. This imaging assembly is particularly useful for mammography or imaging or other soft tissues.
    Type: Application
    Filed: July 17, 2003
    Publication date: May 20, 2004
    Applicant: Eastman Kodak Company
    Inventors: Robert E. Dickerson, William E. Moore, David J. Steklenski
  • Publication number: 20040096769
    Abstract: A radiographic silver halide film is designed for improved imaging of dense soft tissue as in mammography. The film includes a silver halide emulsion on each side of the support and at least one silver halide emulsion contains cubic silver halide grains that are doped with a metal hexacoordination complex compound such as a ruthenium hexacoordination complex compound.
    Type: Application
    Filed: May 19, 2003
    Publication date: May 20, 2004
    Applicant: Eastman Kodak Company
    Inventors: Anthony Adin, Richard E. Beal, Robert E. Dickerson, Anthony D. Gingello
  • Publication number: 20040096768
    Abstract: A radiographic silver halide film useful for mammography comprises a support having a cubic grain silver halide emulsion on one side. The cubic grains are spectrally sensitized with a combination of first and second spectral sensitizing dyes that provides a combined maximum J-aggregate absorption of from about 540 to about 560 nm. The first spectral sensitizing dye is an anionic benzimidazole-benzoxazole carbocyanine and the second spectral sensitizing dye is an anionic oxycarbocyanine. The first and second spectral sensitizing dyes are present in a molar ratio of from about 0.25:1 to about 4:1.
    Type: Application
    Filed: May 19, 2003
    Publication date: May 20, 2004
    Applicant: Eastman Kodak Company
    Inventors: Anthony Adin, Stephen A. Hershey, Robert E. Dickerson
  • Patent number: 6713408
    Abstract: A lithographic method for producing high aspect ratio silica micro-structures having the steps of: providing a carrier substrate with a confinement boundary placed on the carrier substrate; placing the SOG material within the confinement boundary and soft baking at a temperature above its glass transition temperature; forming a pattern of interest on the soft baked SOG material by x-ray lithography; and heating the SOG material until it is substantially converted to a silica-like oxide.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: March 30, 2004
    Assignee: Louisiana Tech University Foundation, Inc.
    Inventors: Vijay-Anandh Shanmugam, Michael J. Vasile, Philip J. Coane
  • Patent number: 6713240
    Abstract: Aqueous-based photothermographic materials comprise a hydrophilic binder, preformed silver halides, an organic silver salt other than a silver carboxylate, a reducing agent composition, and one or more mercaptotriazoles as toners in one or more thermally developable imaging layers. These layers have a pH less than 7. These photothermographic materials can be used in combination with phosphor intensifying screens for radiographic imaging.
    Type: Grant
    Filed: July 11, 2002
    Date of Patent: March 30, 2004
    Assignee: Eastman Kodak Company
    Inventors: Doreen C. Lynch, Chaofeng Zou, Stacy M. Ulrich
  • Patent number: 6709807
    Abstract: A process for reducing roughness from a surface of a patterned photoresist. The process includes exposing a substrate having the patterned photoresist thereon to a vapor, wherein the vapor penetrates into and/or reacts with the surface of the photoresist. The substrate having the patterned photoresist thereon is then heated to a temperature and for a time sufficient to cause the surface of the photoresist to flow and/or react with the vapor wherein the surface roughness decreases. Optionally, the substrate is exposed to radiation during the process to increase the etch resistance of the photoresist and/or facilitate the reaction of the vapor with the surface of the photoresist.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: March 23, 2004
    Assignee: Axcelis Technologies, Inc.
    Inventors: John S. Hallock, Robert D. Mohondro
  • Publication number: 20040033447
    Abstract: Aqueous-based photothermographic materials comprise a hydrophilic binder, preformed silver halides, an organic silver salt, a reducing agent composition, and one or more benzothiazolium, benzoselenazolium, or benzotellurazolium salts as antifoggants. These photothermographic materials can be used in combination with phosphor intensifying screens for radiographic imaging.
    Type: Application
    Filed: August 14, 2003
    Publication date: February 19, 2004
    Applicant: Eastman Kodak Company
    Inventors: Chaofeng Zou, Roger L. Klaus
  • Patent number: 6689540
    Abstract: Compositions comprising a polymer having silicon, germanium and/or tin; and a protecting group grafted onto a polymeric backbone are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: February 10, 2004
    Assignee: International Business Machines Corporation
    Inventors: Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong, David R. Medeiros
  • Patent number: 6686119
    Abstract: A blue-sensitive, radiographic silver halide film comprises a silver halide emulsion layer comprising predominantly tabular silver halide grains that have an aspect ratio of from 8 to 14.5, a grain thickness of from about 0.15 to about 0.3 &mgr;m, and comprise at least 90 mol % bromide and up to 6 mol % iodide, based on total silver halide. The tabular silver halide grains are dispersed in a hydrophilic polymeric vehicle mixture comprising at least 0.5% of oxidized gelatin, based on the total dry weight of the polymeric vehicle mixture in the emulsion layer.
    Type: Grant
    Filed: May 29, 2003
    Date of Patent: February 3, 2004
    Assignee: Eastman Kodak Company
    Inventors: Mark P. Pavlik, Joseph P. Pepe, Susan K. Mroczek
  • Patent number: 6686116
    Abstract: A blue-sensitive radiographic silver halide film comprises a silver halide emulsion layer comprising predominantly tabular silver halide grains that have an aspect ratio of at least 15, a grain thickness of at least 0.1 &mgr;m, and comprise at least 90 mol % bromide and up to 4 mol % iodide, based on total silver halide. Substantially all of the iodide is present in an internal localized portion of the tabular silver halide grains that excludes the surface of the grains. The tabular silver halide grains are dispersed in a hydrophilic polymeric vehicle mixture comprising at least 0.5% of oxidized gelatin, based on the total dry weight of the polymeric vehicle mixture in the emulsion layer. The tabular silver halide grains are spectrally sensitized using a combination of spectral sensitizing dyes to provide increased speed and reduced dye stain.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: February 3, 2004
    Assignee: Eastman Kodak Company
    Inventors: Robert E. Dickerson, Anthony Adin, Stephen A. Hershey, Richard F. Davis