Abstract: A hard surface cleaning composition, methods of cleaning a hard surface with a low hysteresis composition and disposable premoistened pads for cleaning hard surfaces are provided. The hard surface cleaning composition includes from 0.01 wt. % to 7 wt. % of a solvent selected from the group consisting of a propylene glycol phenyl ether, a dipropylene glycol phenyl ethers and mixtures thereof and at least 92% water. The cleaning composition has a pH from about 3.5 to 9.5 and is free of anionic surfactant and alkanolamine.

Abstract: A fabric comprising a cut-resistant polymeric coating including by weight 1 to 10 percent para-aramid particles, the particles having an average particle size of 20 to 500 microns.

Abstract: A method is disclosed for treating or maintaining a hard surface comprising a stone or stone-like material, the method comprising treatment of the surface with a flexible pad, in the presence of abrasive particles, bonded to the pad, on a contact surface between the pad and the hard surface, wherein the abrasive particles comprise diamond particles, and the treatment is performed in the absence of an effective amount of crystallization agent on the contact surface. The treatment is performed on a substantially regular basis, such as daily, weekly or monthly, and the treatment is performed using a pad comprising an open, lofty, three dimensional non-woven webs of fibers. A tool for use in the method is also provided, as well as a floor-surfacing machine comprising such a tool and a method for manufacturing such a tool. Furthermore, methods for treating or maintaining hard, smooth surfaces such as wood, polymer material, lacquer, linoleum, gelcoat, glass and automotive enamel are disclosed.

Abstract: Method for manufacturing a non-woven abrasive article, and non-woven fibers are made of a certain starting material and are subjected to method steps of forming a non-woven web, then consolidating the non-woven web. In order to improve the homogeneity, as well as the reproducibility of the non-woven abrasive article manufactured, the non-woven fibers, prior to the method step of forming a non-woven web and/or prior to the method step of consolidating the non-woven web, are coated with abrasive grains in such a way that the abrasive grains adhere to the certain starting material.

Abstract: A nonwoven abrasive article having a nonwoven web and a binder adhering formed ceramic abrasive particles to fibers of the nonwoven web. The formed ceramic abrasive particles having a formed ceramic abrasive particle size and the fibers having a fiber diameter, and wherein a ratio of the formed ceramic abrasive particle size to the nonwoven fiber diameter is from 0.4 to 3.5.

Abstract: A nonwoven abrasive article includes a lofty open nonwoven fiber web comprising entangled fibers; and abrasive platelets secured to the entangled fibers by at least one binder material. A majority of the abrasive platelets are respectively bonded in an edge-wise manner to at least one of the entangled fibers. Methods of making the nonwoven abrasive article and converted forms, including a convolute abrasive wheel, are also disclosed.

Abstract: Abrasive articles including a non-woven web of staple fibers that form a single layer that is free of any additional layers of non-woven webs of staple fibers. The abrasive articles contain abrasive particles bound to the non-woven web. The abrasive articles can be compressed abrasive articles that include a non-woven web of staple fibers, including blends of staple fibers having a first portion of fibers having a first linear density and a second portion of fibers having a second linear density.

Abstract: A nonwoven abrasive article includes: a lofty open nonwoven fiber web, an abrasive layer bonded to the lofty open nonwoven fiber web, and a peripheral antiloading composition disposed on the abrasive layer. The peripheral antiloading composition comprises at least 50 percent by weight of wax having a melting point onset of from 180° F. (82° C.) to 290° F. (143° C.). A method of abrading a workpiece using the nonwoven abrasive article is also disclosed.

Abstract: A metallic abrasive pad for use in a smoothing operation applied to a worked surface of a workpiece by a catalyst-supported chemical machining method, the metallic abrasive pad including a compression-formed compact of one or more metal fibers made of a transition-metal catalyst, wherein a contact spot of the one or more metal fibers intersecting each other is sintered, the one or more metal fibers are fixed to each other, and the metallic abrasive pad has a prescribed void ratio.

Abstract: An abrasive article comprising a nonwoven substrate material impregnated with a first and second formulation. The first and second formulations have broad spectrum antimicrobial effectiveness against one or more microbial organisms. The first and second formulations include the same or different polymer compositions, which include one or more antimicrobial agents and abrasive particles uniformly dispersed in the polymer compositions.

Abstract: Provided is an abrasive apparatus with a drive shaft terminating with a working head, where this working head is removably attach to an abrasive attachment. Also provided is a drive system arranged to rotate the drive shaft, the drive system being connected to the drive shaft distal from the working head. The abrasive apparatus also includes at least one fluid supply conduit having an inlet and at least one outlet, with the at least one outlet being located adjacent to the working head of the drive shaft and arranged to deliver fluid to the abrasive attachment and/or an immediate working area.

Abstract: An abrasive article may include a substrate, a tacking film overlying the substrate, abrasive particles that may include a coating layer bonded to the tacking film such that a bond between the coating layer and the tacking film defines a metallic bonding region, and a bonding layer overlying the abrasive particles and the tacking film.

Abstract: The present invention discloses a cleaning cloth, an abrasive cloth, a cleaning buff and an abrasive buff which are each formed by knitting/weaving bamboo fibers having excellent cleaning, abrasive capacity and excellent ignition resistance.

Abstract: The present invention relates to a polishing pad and a method for making the same. The polishing pad has a grinding layer. The grinding layer includes a plurality of fibers and a main body. The fineness of the fibers is 0.001 den to 6 den. The main body is a foam and encloses the fibers. The main body has a plurality of first pores and a plurality of second pores, wherein the first pores are communicated with each other, and the second pores are independent from each other. The size of the first pores is at least 5 times greater than the size of the second pores. The hardness of the grinding layer is 30 to 90 shore D, and the compression ratio thereof is 1% to 10%.

Abstract: The present invention relates to a polishing pad comprising a foaming resin frame and a plurality of auxiliary fiber filaments, and each of the auxiliary fiber filaments is independent and dispersed randomly in the foaming resin frame. The invention also relates to a polishing apparatus and a method for manufacturing the polishing pad.

Abstract: For the manufacture of an abrasive bristle, a plastic material is melted, and a granular material made of abrasive particles is mixed into the melt. The melt is extruded together with the abrasive particles into a filament, and the filament is subsequently treated and cut up. The plastic material may be a high-temperature-resistant polymer with a continued use temperature of ?150° C. and for the melt with the abrasive particles to be extruded at a temperature of ?280° C. A brush equipped with corresponding abrasive bristles can be used for the surface treatment of a workpiece, whereby the brush is rotated with a speed in the range of 3,000 rpm to 12,000 rpm and is brought into contact with the surface to be treated.

Abstract: An abrasive article is provided. The article includes (a) a flexible backing having opposing first and second surfaces; (b) an abrasive layer comprising plurality of abrasive particles disposed on the first surface of the flexible backing; and (c) an adhesive layer comprising load bearing particles and an adhesive matrix, the adhesive layer disposed on the second surface of the polymer layer. At least a portion of the load bearing particles is substantially enveloped in the adhesive matrix and is in contact with the second surface of the polymer substrate.

Abstract: The disclosed embodiments relate generally to methods for creating smooth cosmetic surfaces along small features of an electronic device. The disclosed embodiments are well suited for reaching surfaces disposed in constrained spaces. More specifically a method for finishing a workpiece is described. For example, the method may be employed to finish an inlet portion of a cable connector. The method may involve the use of an abrasive brush which may include a single filament and abrasive particles coupled thereto, which can be configured to provide any number of different surface geometries during a finishing operation.

Abstract: A polishing pad is provided herein, which may include a plurality of soluble fibers having a diameter in the range of about 5 to 80 micrometers, and an insoluble component. The pad may also pad include a first surface having a plurality of micro-grooves, wherein the soluble fibers form the micro-grooves in the pad. The micro-grooves may have a width and/or depth up to about 150 micrometers. In addition, a method of forming the polishing pad and a method of polishing a surface with the polishing pad is disclosed.

Abstract: A tungsten jewelry resurfacing kit for consumer end use comprises a buffing cloth; a container of tungsten resurfacing compound having less than 50 ml of resurfacing compound, wherein the resurfacing compound comprises a mixture of i) a diamond powder of at least 1000 grit size; and ii) a binder, such as a fat, which is a semi-solid at ambient temperatures. The kit may further include a plurality of swabs for removing the resurfacing compound from the container. The compound may be a mixture of about 25 to 75% by volume of a diamond powder of at least 1000 grit size; and about 25 to 75% by volume a binder, such as a fat, which is a semi-solid at ambient temperatures.

Abstract: The present disclosure relates to a chemical mechanical planarization pad and a method of making and using a chemical mechanical planarization pad. The chemical mechanical planarization pad may include a first component including a water soluble composition and water insoluble composition exhibiting a solubility in water of less than that of the water soluble composition, wherein at least one of the water soluble and water insoluble compositions of the first component is formed of fibers. The chemical mechanical planarization pad may also include a second component, wherein the first component is present as a discrete phase in a continuous of the second component.

Abstract: A macro-porous abrasive article includes a spun lace substrate having a macro-porous structure and a coating. The coating is made of a resin binder and abrasive aggregates. The abrasive aggregates are formed from a composition of abrasive grit particles and a nanoparticle binder. The coating is at least partially embedded in the substrate. A method for making the macro-porous abrasive article includes combining abrasive aggregates of abrasive grit particles and a nanoparticle binder with a resin binder to form a slurry. The slurry is applied to a macro-porous support structure so that the slurry at least partially penetrates the substrate. The resin is then cured to bond the aggregate grains to the substrate.

Abstract: A self-contained fibrous buffing article including at least one layer of a fibrous nonwoven fabric; the nonwoven fabric having a hardened adherent coating including a crosslinked binder, abrasive particles, and a lubricant blend; and the lubricant blend including at least a fatty acid, mineral oil and glycerin.

Abstract: A nonwoven abrasive article formed from a nonwoven web and agglomerates comprising formed ceramic abrasive particles bound together by a first flexible binder, and a second binder binding the agglomerates to the nonwoven fiber web.

Abstract: A self-contained fibrous buffing article. The self-contained fibrous buffing article includes at least one layer of a spunlaced nonwoven fabric having a hardened adherent coating comprising a thermosetting binder, abrasive particles, and a lubricant.

Abstract: A surface treatment device includes an enclosure which has an opening through which the leading edge of an aerofoil passes. A sealing element is provided on the enclosure to seal the device to the surfaces of the aerofoil. An abrasive is located within the enclosure and two fluid openings are also provided through which a chemical accelerant can be pumped. In operation the enclosure is oscillated relative to the component so that material is abraded. Whilst the enclosure is oscillated a chemical accelerant is simultaneously pumped through it. The device allows for the local application of a surface treatment on a component.

Abstract: In a rotating grinding- or cutting tool, in particular a grinding wheel or grinding roller, on one body, a coating of abrasive material, e.g. cubic boron nitride (CBN) or diamond is applied. The body (2, 12, 22, 32, 42) has two side walls (2a, 12a, 22a, 32a, 42a; 2a, 12a, 22a, 32a, 42a) which are connected to each other on their peripheral region, with the side walls being constructed with fiber-reinforced composite, in particular carbon fiber-, glass fiber- or synthetic fiber-reinforced composite.

Abstract: A polishing pad is provided with a compression elastic modulus of 0.17 MPa or more and 0.32 MPa or less produced by preparing a nonwoven fabric formed of bundles of ultrafine fibers with an average monofilament diameter of 3.0 ?m or more and 8.0 ?m or less, preparing a polishing pad base by impregnating the nonwoven fabric with a polyurethane based elastomer in an amount of 20 mass % or more and 50 mass % or less relative to the mass of the polishing pad base, and laminating the polishing pad base with a porous polyurethane layer containing wet-solidified polyurethane as primary component which has openings with an average opening diameter of 10 ?m or more and 90 ?m or less in its surface to serve as polishing surface layer.

Abstract: An abrasive brush includes a securing element and a plurality of abrasive filaments secured to the securing element to form a brush. Each abrasive filament includes a matrix of thermoplastic polymer and a plurality of alumina abrasive particles interspersed throughout at least a portion of the matrix. The abrasive particles comprising a polycrystalline alpha alumina having a fine crystalline microstructure characterized by an alpha alumina average domain size not greater than 500 nm. The alumina abrasive particles further include a pinning agent comprising a dispersed phase in the polycrystalline alpha alumina.

Abstract: A sharpening device with an abrasive material, a polishing coat encapsulating the abrasive material and an instruction card coupled to the polishing coat. The abrasive material having a property of conforming to the shape of a pointed article penetrating the abrasive material and a property of applying resistance pressure to the pointed article. The sharpening pad may be used in the sharpening and polishing of conically and other shaped points as found on various articles such as machine and hand sewing needles, quilting needles, pins, darts, miscellaneous tools, barb-less fishhooks and the like, including various fine pointed articles.

Abstract: A method for making a polishing pad includes rotating a cylinder about a central axis. The cylinder encloses in an interior space a polymer precursor. The method also includes forming the polishing pad from at least some of a polymer formed after the polymer precursor has cured. The rotating of the cylinder may be continued until the polymer has cured. The method may include forming at least two distinct layers in the polishing pad by casting and curing sequentially at least two different polymer precursors. A system for manufacturing a polishing pad includes a centrifugal caster adapted to rotate. A polishing pad made by a method is provided.

Abstract: A self-contained fibrous buffing article comprising at least one layer of a fibrous nonwoven fabric comprising lyocell fiber and having a hardened adherent coating comprising a crosslinked binder, abrasive particles, and a lubricant.

Abstract: The present invention relates to a polishing pad that comprises a polishing sheet for polishing a substrate, a buffer sheet comprising a plurality of holes, and adhesive for adhering the buffer sheet to the polishing sheet; wherein the adhesive is formed by polymerizing macromolecules with fluidity. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad described above are also provided.

Abstract: The present disclosure is directed at a chemical-mechanical planarization polishing pad comprising interconnecting elements and a polymer filler material, wherein the interconnecting elements include interconnecting junction points that are present at a density of 1 interconnecting junction point/cm3 to 1000 interconnecting junction points/cm3, and wherein the interconnecting elements have a length between interconnection junction points of 0.1 microns to 20 cm.

Abstract: The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles. Whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid the scratch of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.

Abstract: A high performance polishing cloth having a densified surface state with ultrafine fiber bundles uniformly dispersed therein and having excellent smoothness is provided. The polishing cloth comprises a nonwoven fabric formed by entangling the ultrafine fiber bundles formed by bundling ultrafine fibers with an average single fiber diameter of 0.05 to 2.0 ?m and a polymeric elastic material, wherein the average size of the surface fiber-napped portions constituted by the aforementioned ultrafine fiber bundles of the aforementioned nonwoven fabric in the width direction of the ultrafine fiber bundles is 50 to 180 ?M.

Abstract: A nonwoven abrasive wheel comprising one or more layers of a nonwoven fiber web, a plurality of super abrasive particles having a Vickers hardness greater than 40 GPa, a polyurethane binder adhering the plurality of super abrasive particles to the nonwoven fibers and adhering the layers of the nonwoven fiber web to each other, and wherein the nonwoven abrasive wheel comprises a Flexural Modulus from 4.0 to 128.0 lb/inch of thickness per inch of displacement.

Abstract: Systems and methods for polishing a lens having a freeform design cut into a surface of the lens are provided. The system may include a lap blank having a substantial inverse of the freeform design cut into a surface of the lap blank, or a conformable lap blank having an inverse of the freeform design molded into a surface of the lap blank. The system also includes a deformable pad mounted on the surface of the lap blank. The surface of the lens is separated from the surface of the lap blank by the deformable pad, and the lens and the lap blank are arranged such that the freeform design of the surface of the lens is substantially aligned with the substantial inverse of the freeform design of the surface of the lap blank.

Abstract: Disclosed herein are abrasive filaments with improved stiffness and industrial brushes comprising the same, wherein the abrasive filaments are formed of polyamide compositions comprising, (a) at least one polyamide; (b) about 0.1-1 wt % of at least one linear chain extending compound that has a molecular weight of 1000 Daltons or lower; (c) about 0.1-1 wt % of at least one antioxidant; and (d) about 10-40 wt % of abrasive particles, with the total wt % of all components in the composition totaling to 100 wt %.

Abstract: Polishing tools and their methods of manufacture and use are disclosed. In one aspect, a polishing device is provided, including a plurality of polymeric fibers longitudinally arranged and embedded in a polymeric binder, the polymeric binder having a stiffness that is less than a stiffness of the polymeric fibers, and a working end of the plurality of polymeric fibers configured such that tips of the polymeric fibers are oriented to contact a work piece.

Abstract: An aspect of the present disclosure relates to a chemical mechanical planarization pad including a first domain and a second continuous domain wherein the first domain includes discrete elements regularly spaced within the second continuous domain. The pad may be formed by forming a plurality of openings for a first domain within a second continuous domain of the pad, wherein the openings are regularly spaced within the second domain, and forming the first domain within the plurality of openings in second continuous domain. In addition, the pad may be used in polishing a substrate with a polishing slurry.

Abstract: To provide a polishing pad (14) useful for polishing semiconductor materials having a high hardness. The polishing pad (14) is used for polishing a workpiece (16) in combination with loose grains and comprises a polishing surface (15) comprising a textile of high-tenacity organic fibers, the fiber has a tenacity of not lower than 15 cN/dtex. In the textile, the high-tenacity organic fiber may have a single fiber fineness within the range between 0.3 dtex and 15 dtex, or a total fineness of within the range between 3 dtex and 3,000 dtex. The fiber may include, for example, a fully-aromatic polyester fiber.

Abstract: An abrasive article including a flexible backing having opposing first and second surfaces. The first surface of the flexible backing includes abrasive features. An adhesive layer including load bearing particles and an adhesive matrix is disposed on the second surface of the flexible backing. At least a portion of the load bearing particles is substantially enveloped in the adhesive matrix and is in contact with the second surface of the polymer substrate. A rigid support is preferably attached to the adhesive layer including the load bearing particles. At least a portion of the load bearing particles is preferably in contact with the rigid support.

Abstract: Abrasive articles including a non-woven web of staple fibers that form a single layer that is free of any additional layers of non-woven webs of staple fibers. The abrasive articles contain abrasive particles bound to the non-woven web. The abrasive articles can be compressed abrasive articles that include a non-woven web of staple fibers, including blends of staple fibers having a first portion of fibers having a first linear density and a second portion of fibers having a second linear density.

Abstract: The disclosure is directed to polishing pads with porous polishing layers, methods of making such polishing pads, and methods of using such pads in a polishing process. The polishing pad includes a compliant layer having first and second opposing sides and a porous polishing layer disposed on the first side of the compliant layer. The porous polishing layer includes a crosslinked network comprising a thermally cured component and a radiation cured component, wherein the radiation cured component and the thermally cured component are covalently bonded in the crosslinked network. The porous polishing layer also includes polymer particles dispersed within the crosslinked network, wherein the polymer particles comprise at least one of thermoplastic polymers or thermoset polymers. The porous polishing layer typically also includes closed cell pores dispersed within the crosslinked network.

Abstract: The present invention mainly relates to a polishing pad and method of producing the same. The polishing pad comprises a base material having a surface for polishing a substrate, wherein the surface comprises a plurality of bundles of first long fibers and an elastomer embedded into the bundles. The bundles of first long fibers are entangled with each other.

Abstract: Disclosed are a polishing pad used in a CMP process of a planar material such as a silicon wafer, plate glass for a display, etc. and a method for manufacturing the same. The polishing pad comprises a non-woven fabric consisting of ultrafine fibers and elastomeric polymer impregnated into the fabric, on which the ultrafine fibers are raised and arranged to simultaneously satisfy the following conditions (I) to (III) such that the ultrafine fibers are oriented in a longitudinal direction to a central axis: The polishing pad of the present invention includes ultrafine fibers, which are arranged at a relatively wide orientation angle and have pores formed therebetween without requiring alternative processes for forming the pores, thus, exhibits excellent polishing performance and low occurrence of scratches during a polishing process.

Abstract: To provide a polishing pad (14) useful for polishing semiconductor materials having a high hardness. The polishing pad (14) is used for polishing a workpiece (16) in combination with loose grains and comprises a polishing surface (15) comprising a textile of high-tenacity organic fibers, the fiber has a tenacity of not lower than 15 cN/dtex. In the textile, the high-tenacity organic fiber may have a single fiber fineness within the range between 0.3 dtex and 15 dtex, or a total fineness of within the range between 3 dtex and 3,000 dtex. The fiber may include, for example, a fully-aromatic polyester fiber.

Abstract: A pest control material (11), such as mosquito netting, has a surface (12) with abrasive/absorptive microprojections (13). Insect pests such as mosquitoes suffer damage to their cuticle, resulting in dehydration and/or invasion by microbial pathogens. The material is made by coating a fabric with abrasive and/or absorptive materials.

Abstract: The present disclosure relates to a polishing pad including a chemical agent present in an amount sufficient to be released and dissolving into an aqueous abrasive particle polishing medium during chemical mechanical planarization and reducing abrasive particle agglomeration and a binder. The pad includes a surface such that as the pad is abraded the surface is renewed exposing at least a portion of the chemical agent.