Abstract: A sanding glove for treating an area of an object. The sanding glove includes a glove portion, a sanding portion releasably secured to the glove portion and a device for releasably securing the sanding portion to the glove portion. The user is able to treat a surface of an object by rubbing the sanding portion against the object. The device for releasably securing includes a plurality of recesses extending through the palm area of the glove portion and a plurality of protrusions extending from a first side of the sanding portion, the plurality of protrusions being received by respective recesses securing the sanding portion to the glove portion. Alternatively, the device for releasably securing may include a hook and loop fastener on both the glove portion and sanding portion which engage with one another. The glove portion is fabricated from a flexible material for protecting and bending with the user's hand.

Abstract: An apparatus (46) for reconditioning a protective surface (30) of an optically-read digital recording disc (20) includes a turntable (48) configured to receive a center hole (24) of the disc (20) and a first motor (52), coupled to the turntable (48), for rotating the turntable (48) and the disc (20) at a first rotational speed. The apparatus further includes a buffing element (50) for removing an amount of material from the protective surface (30) as the turntable rotates the disc (20) and a second motor (54), coupled to the buffing element (50) for rotating the buffing element (50) at a second rotational speed. A timing element (56) synchronizes the first and second motors (52, 54) to substantially simultaneously cease rotation of the turntable (48) and the buffing element (50) following removal of an amount of material from the disc (20).

Abstract: Dishing in chemical mechanical polishing (CMP) is reduced by introducing a material that balances electrochemical forces. In a first embodiment of the invention, a polishing pad having copper material in grooves on the polishing pad surface is used in the polishing process to reduce dishing. In a second embodiment of the invention, the polishing pad has perforations with copper fillings. In a third embodiment of the invention, a copper retaining ring on the polishing head introduces copper material to the CMP process to reduce dishing. In a fourth embodiment of the invention, a conditioning plate of copper is used in the polishing apparatus. In a fifth embodiment of the invention, additional copper features are placed on the substrate to be polished. The polishing of the additional features introduces copper steadily through the polishing process. In a sixth embodiment of the invention, copper compounds are added to the polish slurry.

Abstract: A polishing pad for polishing glass and the like has a working layer with a plurality of polishing grains, an attaching layer with which the polishing pad is attachable to a polishing head of a power tool, and a connection layer which connects the working layer, with the attaching layer, and the connection layer is composed of vulcanizable material, which is vulcanized at certain temperature and under certain pressure and thereby connects the working layer with the attaching layer.

Abstract: A composite polishing pad for use in a linear chemical-mechanical polishing apparatus is provided. The pad comprises a hard polishing pad having a polishing surface and an attachment surface opposite the polishing surface, the attachment surface comprising a border comprising an adhesive, the border surrounding a cavity, the cavity being sized and shaped to receive a soft polishing pad. The soft polishing pad is disposed completely in the cavity and completely fills the cavity, and the soft polishing pad has a first side adhered in the cavity of the hard polishing pad, and a second side comprising an adhesive, whereby the attachment surface of the hard polishing pad and the second side of the soft polishing pad are substantially in a common plane. Other composite polishing pads are also provided, as are methods for making composite pads and methods for preventing composite pads from splitting apart into their component pads.

Abstract: An abrasive sanding disk and sanding pad combination for use in sanding drywall surfaces with a motorized drywall sander with a sanding head, the abrasive sanding disk and sanding pad combination comprising an abrasive sanding disk comprising a flat, circular substrate panel wherein the substrate panel is devoid of a central aperture, wherein the substrate panel has a first face comprising a sanding head engaging face for facing a sanding head of a drywall sander and a second face comprising an abrasive face for abrading a given surface; and a sanding pad for being interposed between the abrasive sanding disk and a sanding head of a drywall sander wherein the sanding pad comprises a round disk of resiliently compressible material with a concentric central aperture, an abrasive disk engaging face for engaging the abrasive sanding disk, and a sanding head engaging face for engaging a sanding head of a drywall sander.

Abstract: A sanding glove for treating an area of an object. The sanding glove includes a glove portion, a sanding portion releasably secured to the glove portion and a device for releasably securing the sanding portion to the glove portion. The user is able to treat a surface of an object by rubbing the sanding portion against the object. The device for releasably securing includes a plurality of recesses extending through the palm area of the glove portion and a plurality of protrusions extending from a first side of the sanding portion, the plurality of protrusions being received by respective recesses securing the sanding portion to the glove portion. Alternatively, the device for releasably securing may include a hook and loop fastener on both the glove portion and sanding portion which engage with one another. The glove portion is fabricated from a flexible material for protecting and bending with the user's hand.

Abstract: A stacked polishing pad includes an upper polishing layer and a lower sub-layer having major faces which are in contact with each other. The polishing layer is substantially impermeable to liquid while the sub-layer is liquid absorbent. The sub-layer has an outer peripheral edge which is sealed to prevent absorption of liquid into the sub-layer through the outer peripheral edge. When the stacked polishing pad is mounted on a platen of a polishing machine, the sub-layer has no exposed surface which can absorb liquid.

Abstract: A retainer for retaining an abrasive pad on a lens making machine and an abrasive pad adapted to such retention comprises a retainer nestable with a lap of a lens making machine wherein when such retainer is nested, a pad placed upon said lap before nesting will be trapped in the desired position. The pad of the invention includes radially outwardly extending members beyond the working area of the pad whose purpose is to be trapped by the retainer. The invention enables automatic loading and unloading of pads on the lens making machine.

Abstract: A sanding pad with a circular cross section for a manually operable grinding device has one 'surface with means (2) for connection to the grinding device. An opposite surface (6) forms a contacting surface (5) for guiding an abrasive. The contacting surface (5) is provided with radially extending grooves (1), which are constructed open towards the contacting surface (5), in order to increase the abrading performance of the sanding pad (2).

Abstract: An apparatus (46) for reconditioning a protective surface (30) of an optically-read digital recording disc (20) includes a turntable (48) configured to receive the disc (20) and a first motor (52) for rotating the turntable (48) and the disc (20). The apparatus further includes a buffing element (122) and a second motor (54) for rotating the buffing element (122). A timing element (56) synchronizes the first and second motors (52, 54) to substantially simultaneously cease rotation of the turntable (48) and the buffing element (122) following removal of an amount of material from the disc (20). The buffing element (122) includes a foam pad (124) having a discoid portion (126) and an annular portion (128) encircling a perimeter (132) of the discoid portion (126). The annular portion (128) is more resistant to compression than the discoid portion (126). A buffing pad (82) is in fixed relation with the foam pad (124).

Abstract: An apparatus (46) for reconditioning a protective surface (30) of an optically-read digital recording disc (20) includes a turntable (48) configured to receive a center hole (24) of the disc (20) and a first motor (52), coupled to the turntable (48), for rotating the turntable (48) and the disc (20) at a first rotational speed. The apparatus further includes a buffing element (50) for removing an amount of material from the protective surface (30) as the turntable rotates the disc (20) and a second motor (54), coupled to the buffing element (50) for rotating the buffing element (50) at a second rotational speed. A timing element (56) synchronizes the first and second motors (52, 54) to substantially simultaneously cease rotation of the turntable (48) and the buffing element (50) following removal of an amount of material from the disc (20).

Abstract: An eraser for removal of dry ink dust and for conditioning of white boards, which includes a stack of fabric layers which may be treated with cleaning and anti-static compounds. The fabric layers are of semi-rectangular shape which wrap around a jacket cover which is folded over a center core and joined together, the fabric layers have tab dispensing ends and other ends which are fastened to the cover and core by a single staple which spans the ends, the ends to permit the layers to be removed one at a time.

Abstract: An apparatus and method for re-surfacing compact discs. The method is a two-step method in which the disc to be re-surfaced is first placed on a shaft. A resilient pad supports an abrasive medium and is positioned so the abrasive medium overlaps only the protective layer of the CD. The disc and abrasive material are rotated in opposite directions at about the same speed to remove deeper blemishes in a wet operation. Subsequent polishing is accomplished in a similar manner using a polishing compound instead of an abrasive. The re-surfacing and polishing apparatus each have motor driven shafts which are parallel and spaced apart and support the CD and pad in a cabinet. A transparent cover extends across the top of the cabinet.

Abstract: A polishing pad for planarizing and polishing a semiconductor substrate. The polishing pad (22) includes an adhesive layer (34) that is operative to adhere the polishing pad to a polishing fixture. To protect the adhesive layer from contamination during storage and shipment, a release liner (24) is placed over the adhesive layer. The release liner has sufficient surface characteristics to stay in adhesive connection with the adhesive layer during storage and shipment; however, the release liner is operative to be peeled away from the adhesive layer without disturbing the bond between the polishing pad and the adhesive layer. To aid in the removal of the release liner from the polishing pad, the release liner includes a pull tab (26). The pull tab is comprised of a single-sided tape that is adhered to the outer surface of the release liner. A portion (28) of the pull tab extends beyond the edge of the release liner.

Abstract: The invention provides a polishing sheet comprising a support and an abrasive layer formed thereon with an adhesive layer interposed therebetween, characterized in that the adhesive layer is formed by a cured layer of a thermosetting and/or photo-curable curable adhesive composition based on at least one resin selected from the group consisting of (A) an ethylene-vinyl acetate copolymer, (B) a copolymer of ethylene, vinyl acetate, and an acrylate and/or methacrylate monomer, (C) a copolymer of ethylene, vinyl acetate, and maleic acid and/or maleic anhydride, (D) a copolymer of ethylene, an acrylate and/or methacrylate monomer, and maleic acid and/or maleic anhydride, and (E) an ionomer resin in the form of an ethylene-methacrylic acid copolymer whose molecules are bonded by a metal ion.

Abstract: A method for selectively altering a polishing pad adhesive layer includes providing a mask having transparent regions and opaque regions and directing radiation toward the mask so that the radiation passes through the transparent regions and impinges onto the adhesive layer on the polishing pad. The area of the adhesive layer corresponding to the transparent regions of the mask is cured to be less adhesive. The area of the adhesive layer corresponding to the opaque regions remain adhesive.

Abstract: An abrasive article is formed from a lofty nonwoven abrasive pad and one or more abrasive sheets. In one embodiment, each sheet has an abrasive layer on its front side and a plurality of engagement stems on its back side. Enough of the engagement stems engage fibers on the surface of the nonwoven pad to affix the two components together for workpiece surface treatment. In another embodiment, the nonwoven pad has a slit therein, and each abrasive sheet has a portion thereof inserted into its respective slit to anchor the sheet to the pad. In this embodiment, each sheet has an abrasive layer on its front side but may have no stems on its back side. In either embodiment, the sheets are readily replaceable on the nonwoven pad, thus creating a very simple and versatile arrangement for varying the abrasive characteristics presented to the workpiece.

Abstract: An abrasive article is formed from a lofty nonwoven abrasive pad and one or more abrasive sheets. In one embodiment, each sheet has an abrasive layer on its front side and a plurality of engagement stems on its back side. Enough of the engagement stems engage fibers on the surface of the nonwoven pad to affix the two components together for workpiece surface treatment. In another embodiment, the nonwoven pad has a slit therein, and each abrasive sheet has a portion thereof inserted into its respective slit to anchor the sheet to the pad. In this embodiment, each sheet has an abrasive layer on its front side but may have no stems on its back side. In either embodiment, the sheets are readily replaceable on the nonwoven pad, thus creating a very simple and versatile arrangement for varying the abrasive characteristics presented to the workpiece.

Abstract: An abrasive sheet member is disclosed, including a substrate having first and second major surfaces, an abrasive on the first major surface, and a plurality of hooking stems on the second major surface. The hooking stems are adapted to hook engaging structures on an opposed surface to releasably affix the abrasive sheet member to the surface.

Abstract: A magnetic disc system for grinding or polishing metallographic test specimens on a movable platen includes a barrier that is magnetically attached to a movable platen. A grinding or polishing surface attaches to the barrier. The barrier magnetically attaches to the platen and is also capable of blocking or greatly reducing the magnetic field magnetism from passing through to the grinding or polishing surface and restricting or preventing swarf adhesion resulting from the polishing or grinding operation that could harm the prepared surface.

Abstract: The invention provides a substantially flat coated abrasive article having a fabric-reinforced backing which may include engaging elements such as hooks for releasable attachment to the surface of an abrading apparatus and a method of making the article. The invention also provides an abrading apparatus which includes a back-up pad having releasably attached thereto the abrasive article. The article comprises a substantially flat sheet-like substrate comprised of thermoplastic material and a porous fibrous reinforcing element contained within the substrate and an abrasive layer disposed on a surface of the substrate. The opposite surface of the substrate may include the engaging elements. The article is made by deploying the fabric on a surface, depositing molten thermoplastic polymer over the fabric, removing the substrate from the surface and applying the abrasive layer to one surface of the substrate.

Abstract: A polishing cloth according to the present invention includes: a polishing cloth substrate; a pressure-sensitive adhesive layer laminated on one face of the polishing cloth substrate; and a release sheet attached to the pressure-sensitive adhesive layer in a releasable manner. The pressure-sensitive adhesive layer includes an adhesive composition containing a polymer, the polymer having a first-order melt transition in a temperature range narrower than 15° C. Thus, the present invention provides a polishing cloth and a method for attaching/detaching the polishing cloth to/from a base plate of a polishing machine such that the polishing cloth can be peeled off the base by simply cooling the base plate and the adhesive layer of the polishing cloth.

Abstract: An attachment means for attaching a sheet-formed abrasive and/or polishing means to a magnetized support, said attachment means comprising a ferromagnetic base layer and an external adhesive layer to which the abrasive and/or polishing means attached, and where said ferromagnetic base layer comprises a ferromagnetic metal foil and that said attachment means comprises a liner sheet having a first side adhered to a first side of the base layer by means of an internal adhesive layer, the liner sheet having the external adhesive layer disposed on the second side of the liner, the external adhesive layer being capable of releasably fixating the abrasive and/or polishing means and said external adhesive layer being capable of substantially retaining its adhesive capacity after removal of the abrasive and/or polishing means. The base layer is optionally and preferably provided with a friction increasing layer on the second side.

Abstract: A system and method for attaching an abrasive article to a backing pad is provided. The system includes a backing pad including loop-textile material applied to an attachment surface thereof and an abrasive article, which is removably attached thereto. The abrasive article has at least first and second surfaces including a plurality of abrasive particles adhered thereto. The first surface of the abrasive article includes abrasive particles having a size and density selected to provide a desired surface finish of a workpiece surface being abraded with the abrasive article. The second surface includes a plurality of abrasive particles having a size and density selected to releasably engage textile loops extending from the loop textile material applied to the backing pad attachment surface. Various embodiments, including double-sided sandpaper sheets and sanding screens, which adhere to the textile loops extending from the loop textile material applied to the backing pad attachment surface are disclosed.

Abstract: The present invention is directed to polishing pads useful in determining an end to the useful wear life thereof. In a simple embodiment of the present invention, a polishing pad that is used with slurries is dyed on one side in a manner that causes the dye to permeate the pad to a limited depth that does not cause total coloring. Another embodiment of the present invention involves a fixed abrasive pad that has fixed abrasives embedded into the pad to a selected depth where at least one color level is within the portion of the pad that contains the fixed abrasives. After dyeing the pad, the pad is attached to the polishing platen. During the polishing operation, a color change signals a time to stop the polishing operation and change the pad. With multiple colors in the pad, limited only by the ability to dye the pad with uniform depth levels, characteristic wear patterns can be observed and adjustments made accordingly to prolong and optimize pad life.

Abstract: A flexible backing for abrasive material in sheets, constituted by a body which is composed of at least three materials which are stably coupled in layers, an intermediate layer being constituted by a steel core, and the outer layers being constituted by laminae made of elastic material which have different moduli of elasticity.

Abstract: An improvement in a polishing apparatus for planarizing substrates comprises a tenacious coating of a low-adhesion material to the platen surface. An expendable polishing pad is adhesively attached to the low-adhesion material, and may be removed for periodic replacement at much reduced expenditure of force. Polishing pads joined to low-adhesion materials such as polytetrafluoroethylene (PTFE) by conventional adhesives resist distortion during polishing but are readily removed for replacement.

Abstract: A hand tool which includes a cushion member of a construction which is capable of preventing the separation of a cushion member due to frictional heat and force generated during the grinding operation. The abrasive hand tool includes a tool body having a generally flat bearing surface and a thin sheet-like cushion member fixedly secured to the bearing surface of the tool body. The cushion member includes an inner layer fixedly bonded to the bearing surface of the tool body via an adhesive and an outer layer layered and bonded with the inner layer. The outer layer defines on the outer surface thereof a generally flat attachment surface for detachably holding an attachment means-backed abrasive sheet. The inner layer is made of a soft resinous foam, such as polyvinyl chloride resin, polyurethane resin or others.

Abstract: An elastic polishing pad is adhered to the top face of a rotatable table. Above the table is provided a substrate holding apparatus for holding a substrate. The substrate holding apparatus comprises a rotary shaft, a substrate holding head in the form of a disc which is provided integrally with the lower edge of the rotary shaft, a sealing member in the form of a ring which is made of an elastic material and fastened to the peripheral portion of the lower face of the substrate holding head, and a guiding member in the form of a ring which is fastened to the back face of the substrate holding head to be located outside the sealing member. A fluid under pressure is introduced into a fluid flow path formed in the rotary shaft from one end thereof and supplied to a space from the other end of the fluid flow path so as to press the substrate against the polishing pad.

Abstract: A novel reusable flexible hand-held, mitten-shaped glove to which one or more layers of abrasive, cleaning, or polishing material may be attached to the glove's face by means of a suitable non-permanent, pressure-sensitive, and moisture-resistant adhesive that has been applied to the back of the material. The abrasive, cleaning, or polishing material may be peeled off as needed either to expose fresh material or to attach new material to the face of the glove.

Abstract: A grinding member attachable to a grinding disc, an attachment plate of a grinding machine, or a manual holder, and including an abrasive-containing layer, and a perforation substantially uniformly distributed over at least a portion of a surface of the abrasive-containing layer and extending through an entire thickness of the abrasive-containing layer, with the perforation being formed of a plurality of openings so spaced from each other that unhindered suction of abrasive dust is insured; and adapter for attaching the grinding member.

Abstract: A back-up pa supporting and releasably engaging an abrasive article. The back-up pad comprises: a body including a front surface and a back surface in which the front surface comprises a first attachment component thereon and the back surface comprises a second attachment component thereon, and each of the attachment components is adapted for releasable engagement with an abrasive article; a reinforcing plate located within the body between the front surface and the back surface; and tool securing means on the body for securing the back-up pad to a power tool and for selectively orienting the back-up pad in one of a first orientation and a second orientation. When the back-up pad is in the first orientation, substantially the entire front surface is exposed for contacting a workpiece, and when the back-up pad is in the second orientation, substantially the entire back surface is exposed for contacting a workpiece.

Abstract: A polishing pad for use in chemical-mechanical planarization (CMP) of semiconductor wafers includes a multiplicity of elongated microcolumns embedded in a matrix material body. The elongated microcolumns are oriented parallel to each other and extend from a planarizing surface used to planarize the semiconductor wafers. The elongated microcolumns are uniformly distributed throughout the polishing pad in order to impart uniform properties throughout the polishing pad. The polishing pad can also include elongated pores either coaxial width or interspersed between the elongated microcolumns to provide uniform porosity throughout the polishing pad.

Abstract: A back-up pad is provided for supporting an abrasive article during abrading. The back-up pad includes a support portion, such as a polymeric backing, and an engaging portion, such as a loop material, for engaging hooking stems projecting from the abrasive article.

Abstract: A back-up pad for supporting an abrasive article having projecting hooking stems. The back-up pad includes a support member and an engaging means provided on a major surface of the support member for releasably engaging the hooking stems of the abrasive article. The engaging means includes a substrate having a first surface, a second surface, a plurality of loops projecting from the first surface, and an adhesive applied to the second surface. The plurality of loops comprise a continuous strand, the strand including a plurality of loop portions projecting through the substrate from the second side to the first side to thereby form the loops, and a plurality of connecting portions between the loop portions. The substrate is located between the loop portions and connection portions of the strand, and the adhesive adheres the connecting portions of the strand to the second surface of the substrate. Also disclosed is an engaging means for use with a back-up pad, and a method of stitching the engaging means.

Abstract: A method for making an abrasive article is disclosed, including the steps of providing a substrate having abrasive means on one surface, and providing a plurality of hooking stems on the opposite surface thereof. Several illustrative variations of the inventive method are disclosed.

Abstract: A technique for mounting polishing pads to a platen in chemi-mechanical semiconductor wafer polishing apparatus is disclosed. A lower pad is mounted to the platen, and is trimmed to the size of the platen. An upper pad is mounted to the lower pad, and is sized so that an extreme outer edge portion of the upper pad extends beyond the trimmed outer edge of the lower pad. The outer edge portion of the upper pad is deformed downwardly, towards the lower pad. In this manner, polishing slurry is diverted from the pad-to-pad interface. Additionally, an integral annular lip can be formed on the front face of the upper pad, creating a reservoir for slurry to be retained on the face of the upper pad for enhancing residence time of the polishing slurry prior to the slurry washing over the face of the upper pad.

Abstract: A back-up pad is provided for supporting an abrasive article during abrading. The back-up pad includes a support portion, such as a polymeric backing, and an engaging portion, such as a loop material, for engaging hooking stems projecting from the abrasive article.

Abstract: A surfacing pad adapted for use with a lapping tool has a substrate sheet having a plurality of mushroom-shaped projections which interlock with a number of loops on a lapping tool for retention of the pad on the tool. A segmented projection means is also provided.

Abstract: Manicuring device (10) is provided that comprises an elongated cylindrical body (12) having a tapered end (14) and a second end (16) distal to the tapered end (14). An abrasive surface (18) is affixed to the outer surfaces of the body (12) near the end (16). Perforation lines (20) and (22) are disposed along intervals of the abrasive surface (18). The device (10) may be used to hone the inner surface of a fingernail or toenail.

Abstract: A ring-shaped abrasive member is formed of a plurality of sheets of abrasive cloth paper laminated and bonded together. The abrasive member is formed with a plurality of cuts so as to extend inwardly from its outer edge or extend outwardly from its inner edge. On the back of the abrasive member is secured a wheel substrate together with adhesive. The abrasive member is pressed against a workpiece while rotating the abrasive member to abrade the workpiece. The powdery debris and abrasive grains trapped in the cuts will move toward the outer periphery of the abrasive member and be discharged from the outer ends of the cuts. When the topmost abrasive sheet forming the abrasive member gets worn out, the sheet thereunder will be exposed.

Abstract: A multi-piece sanding wheel having two sanding members mounted about peripheral portions of a disc-shaped support member that is secured to a drive means. Each sanding member includes a C-shaped backing portion with a sanding strip removably secured about its outer periphery. The sanding strip also has two end sections which are respectfully secured over the ends of the C-shape. In operation, the C-shaped backing portions are attached to the disc-shaped support member with the ends of the two C-shapes substantially adjacent to one another and preferably pinching the end sections of the sanding strips therebetween. The disc-shaped support member of the sanding wheel is separately and removably attached to the drive means wherein the sanding members can be removed from the support member without having to disconnect the support member from the drive means.

Abstract: A rotary sanding apparatus, includes a circular support plate having a relatively deformable circular ring extending from its front face to form an annular container and reinforcement for a resilient deformable foam pad. The front face of the pad is essentially coplanar with the front edge face of the circular ring, so that an abrasive disk can lie flat against the pad front face, with its outer edge area secured to the circular ring. The circular ring acts as a confinement device for preventing the foam pad from being torn apart by pressure engagement of irregular surfaces against the abrasive disk material.

Abstract: The current invention relates to a lens surfacing assembly and a method for grinding and polishing glass or plastic optical lenses. The assembly is primarily intended for use with a rigid lapping tool and a typical lens grinding machine. The lens surfacing assembly comprises a strippable adhesive member that is attached to the lapping tool for use throughout the grinding and polishing operation for attachment of a reversible, double sided lens surfacing pad having a coarse surface on one side and a fine surface on the other. After the grinding has been completed, the reversible pad is removed and a polishing cloth is attached to the adhesive member. The combined thickness of the pad and the adhesive member is equal to the compensation designed into the radius of curvature of the lapping tool arcuate surface. The combined thickness of the polishing cloth and the adhesive member is also equal to the compensation designed into the lapping tool.

Abstract: A multi-piece sanding wheel having two sanding members mounted about peripheral portions of a disc-shaped support member that is secured to a drive means. Each sanding member includes a C-shaped backing portion with a sanding strip removably secured about its outer periphery. The sanding strip also has two end sections which are respectfully secured over the ends of the C-shape. In operation, the C-shaped backing portions are attached to the disc-shaped support member with the ends of the two C-shapes substantially adjacent to one another and preferably pinching the end sections of the sanding strips therebetween. The disc-shaped support member of the sanding wheel is separately and removably attached to the drive means wherein the sanding members can be removed from the support member without having to disconnect the support member from the drive means.