Chemical Reactant Is Ethylenically Unsaturated Patents (Class 522/114)
  • Patent number: 6444722
    Abstract: Graft copolymers with low molecular weight side chains are prepared by (1) irradiating a propylene polymer material in the absence of oxygen, (2) adding a controlled amount of oxygen to the irradiated polymer material so that the polymer is exposed to an amount of oxygen greater than 0.004% but less than 15% by volume at a temperature of 40° C. to 140° C., to produce an oxidized propylene polymer material containing greater than 1 mmol total peroxide per kilogram of propylene polymer material, (3) optionally, heating the oxidized propylene polymer material in a non-oxidizing atmosphere to a temperature of at least 80° C.
    Type: Grant
    Filed: November 2, 2000
    Date of Patent: September 3, 2002
    Assignee: Basell Poliolefine Italia S.p.A.
    Inventors: Vu A. Dang, Cheng Q. Song
  • Patent number: 6419858
    Abstract: This invention is directed to a process for the rapid in-situ curing of polymerizable materials to provide macromolecular networks and articles of manufacture that are “morphology-trapped”; that is, they exhibit a fixed phase morphology and/or molecular orientation that is locked in by the curing step. The process includes the steps of mixing together a dead polymer, a reactive plasticizer and an initiator to give a polymerizable composition; further processing the mixture in order to achieve a desired phase morphology and/or molecular orientation of the polymeric constituents; shaping the polymerizable composition into a desired geometry; and exposing the polymerizable composition to a source of polymerizing energy, without mixing, to give a final product with the desired phase morphology and/or molecular orientation locked in place.
    Type: Grant
    Filed: June 13, 2000
    Date of Patent: July 16, 2002
    Assignee: ZMS, LLC
    Inventors: Michael R. Houston, Toshiaki Hino, David S. Soane
  • Publication number: 20020086914
    Abstract: Low viscosity, radiation curable fluid formulations that can be used advantageously as radiation curable, inks. The formulations are easily prepared for use in ink jet systems. The viscosity of the compositions is low enough so that conventional solvent is not required in order to satisfy the requisite low ink jet viscosity specifications. After curing, the compositions form durable, weatherable, abrasion resistant, printed images on a wide variety of porous and nonporous substrates. The formulations are very suitable for outdoor printing applications, especially for printing outdoor graphics onto a variety of surfaces, including vinyl or other polymer films commonly used for signage, retroreflective signage or other retroreflective items.
    Type: Application
    Filed: November 7, 2001
    Publication date: July 4, 2002
    Applicant: 3M Innovative Properties Company
    Inventors: Jennifer L. Lee, Ronald K. Thery, Caroline M. Ylitalo, Richard L. Severance, Dong Wu, Bruce A. Nerad, Verna J. LeMire, James G. Carlson, William J. Hunt
  • Patent number: 6372813
    Abstract: The present invention provides solid supports (e.g., glass) and polymer hydrogels (particularly polymer hydrogel arrays present on a solid support) comprising one or more reactive sites for the attachment of biomolecules, as well as biomolecules comprising one or more reactive sites for attachment to solid supports and polymer hydrogels. The invention further provides novel compositions and methods for the preparation of biomolecules, solid supports, and polymer hydrogels comprising reactive sites. The invention also provides for preparation of crosslinked solid supports, polymer hydrogels, and hydrogel arrays, wherein one or more biomolecules is attached by means of the reactive sites in a photocycloaddition reaction. Advantageously, according to the invention, crosslinking of the hydrogel and attachment of biomolecules can be done in a single step.
    Type: Grant
    Filed: June 25, 1999
    Date of Patent: April 16, 2002
    Assignee: Motorola
    Inventors: Travis Johnson, John McGowen, Allyson Beuhler, Charles Kimball Brush, Robert Emil Lajos
  • Patent number: 6359027
    Abstract: A coated abrasive article comprises a backing, a first binder on the backing, and a plurality of abrasive particles in the first binder. The first binder precursor is an energy-curable preferably, melt-processable resin containing an epoxy resin, an ethylene-vinyl acetate copolymer, and a curing agent for crosslinking the epoxy resin that is cured to provide a crosslinked make coating. The above binder precursors of the invention are preferably free of homopolymers and copolymers of olefinic monomers. In another aspect, the invention also describes an energy curable first binder precursor containing an epoxy resin, an ethylene-vinyl acetate copolymer, a polyfunctional acrylate component and a curing agent for crosslinking the epoxy resin that is cured to provide a crosslinked make coating. The invention also relates to a method of producing such coated abrasive articles and a surface-treated backing material.
    Type: Grant
    Filed: May 3, 2000
    Date of Patent: March 19, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Gregg D. Dahlke, Robert J. DeVoe, Clayton A. George, Naimul Karim
  • Patent number: 6342541
    Abstract: A manufacturing method comprising the steps of forming at first solidified wax layer of a desired shape, depositing onto the first solidified wax layer at least one layer of a liquid resin formulation, solidifying the layer of liquid resin formulation, depositing a second wax layer on to the combination of the first solidified wax layer and the layer of solidified resin formulation, solidifying the second wax layer, and separating the solidified resin formulation from first and second wax layers. Preferably, the resin formulation comprises at least one monofunctional water soluble vinyl or acrylic monomer in combination with a low molecular weight aliphatic polymer having acrylic or methacrylic acid functionality. The solidified wax and resin formulation layers can be machined as may be desired to form mold of a given shape comprising wax layers when the layer of formulation is separated from the wax layers.
    Type: Grant
    Filed: December 8, 1999
    Date of Patent: January 29, 2002
    Assignee: Advanced Ceramics Research, Inc.
    Inventors: John Lang Lombardi, Gregory John Artz
  • Patent number: 6340717
    Abstract: The invention relates to a process for producing foamed polyolefin-based plastics blocks by first crosslinking a matrix comprising a) from 51 to 97% by weight of one or more polyolefins, selected from the group consisting of polyethylene and ethylene copolymer, b) from 3 to 20% by weight of a foaming agent, using &bgr;-radiation of energy >6 MeV. The thickness of the matrix is from 25 to 45 mm. The radiation dose is from 20 to 150 kJ/kg. During the irradiation, atmospheric oxygen is at least substantially prevented from reaching the surface of the matrix. After crosslinking, the crosslinked matrix is foamed by heating to a temperature >160° C. and decomposing the blowing agent.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: January 22, 2002
    Assignees: HT Troplast AG, Studer Draht-und Kabelwerk
    Inventors: Werner Hargarten, Hans Jörg Hartmann, Burkhard Voss
  • Patent number: 6326127
    Abstract: The present invention relates to a photo-curable polymer composition comprising (a) a first block copolymer comprising at least two blocks A of polymerised monovinyl aromatic monomer, at least one internal block B of polymerised conjugated diene monomer, and at least one tapered or random block C of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer and/or at least one block D which may be a block of polymerised conjugated diene monomer or a tapered or random block of polymerised monovinyl aromatic monomer and polymerised conjugated diene monomer, wherein block C is an internal polymer block adjacent a terminal block A or an internal block A which is adjacent to a terminal block D, and block D is a terminal block adjacent an internal block A, and, optionally, a residue of a coupling agent, wherein the residue, if present, is derived from a coupling agent containing alkoxy or epoxy functional groups; and (b) a photo-initiator.
    Type: Grant
    Filed: December 16, 1999
    Date of Patent: December 4, 2001
    Assignee: Kraton Polymers U.S. LLC
    Inventors: Karin Marie-Louise Renee Morren, Xavier Muyldermans
  • Patent number: 6323255
    Abstract: The present invention relates to radiation-curable compositions that after cure provide reduced discoloration, or reduced color degradation, and/or high elongation while maintaining other desirable qualities of radiation-cured compositions. These radiation-curable compositions include at least one radiation-curable oligomer and at least one transesterified and/or high-purity monomer. These compositions can be formulated, for example, to serve as protective coatings for substrates manufactured from a wide variety of including glass, plastic, ceramic, metal and wood. The compositions of the present invention are preferably designed for use as an optical fiber coating (including inner primary and, colored or uncolored, outer primary coatings as well as other coatings which include inks, matrix materials and the like) or related optical fiber protective materials.
    Type: Grant
    Filed: September 30, 1998
    Date of Patent: November 27, 2001
    Assignee: DSM N.V.
    Inventor: Paul E. Snowwhite
  • Patent number: 6319603
    Abstract: A liquid curable resin composition comprising (1) a (meth)acrylate polymer having a weight average molecular weight relative to polystyrene standard of at least about 5,000, (2) a ring-opening polymerizable monomer containing at least one epoxy group, and (3) a cationic photopolymerization initiator is disclosed. The composition produces cured products which exhibit superior heat resistance, excellent mechanical strength, and superb adhesive characteristics, and is suitable for use as a photo-curable adhesive, a photo-curable sealing material, a resin for optical three-dimensional molding, and a coating material for optical fibers, and optical fiber ribbon matrix.
    Type: Grant
    Filed: March 2, 1999
    Date of Patent: November 20, 2001
    Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co., Ltd.
    Inventors: Zen Komiya, Yoshikazu Yamaguchi, Tsuyoshi Watanabe, Takashi Ukachi
  • Patent number: 6306924
    Abstract: This invention provides an improved coating composition for glass substrates that comprises a tetrasubstituted compound. The introduction of a tetrasubstituted compound in a coating composition for a glass substrate, and in particular an optical fiber, acts to delay the rate of deterioration of the glass or optical fiber due to moisture, and improves adhesion between the glass substrate and the coating composition. The introduction of a tetrasubtituted compound into a polymeric coating composition also improves the interlayer adhesion when more than one coating is applied to a glass substrate. This invention further relates to an outer primary coating composition or matrix material that comprises an acid functional ethylenically unsaturated monomer.
    Type: Grant
    Filed: August 21, 1998
    Date of Patent: October 23, 2001
    Assignee: DSM Desotech, Inc.
    Inventor: David M. Szum
  • Patent number: 6287745
    Abstract: The present invention relates to a photocurable liquid resin composition comprising: (A) a cationically polymerizable organic compound; (B) a cationic photopolymerization initiator; (C) an ethylenically unsaturated monomer; (D) a radical photopolymerization initiator; (E) a polyether polyol compound having one or more hydroxyl groups in one molecule; and, optionally, includes elastomer particles having a specific particle diameter and/or an epoxy-branched alicyclic compound.
    Type: Grant
    Filed: February 18, 1999
    Date of Patent: September 11, 2001
    Assignees: DSM N.V., JSR Corporation, Japan Fine Coatings Co.,
    Inventors: Tetsuya Yamamura, Akira Takeuchi, Tsuyoshi Watanabe, Takashi Ukachi
  • Patent number: 6280905
    Abstract: A photosensitive resin composition which comprises (1) a particulate copolymer comprising 10-99.8% by mole of the unit of (i) an aliphatic conjugated diene monomer, 0.1-30% by mole of the unit of (ii) a monomer having one polymerizable unsaturated group and an amino group, 0.1-20% by mole of the unit of (iii) a monomer having at least two polymerizable unsaturated groups and 0-40% by mole of the unit of (iv) a copolymerizable other monomer having one polymerizable unsaturated group, (2) a photopolymerizable unsaturated monomer and (3) a photopolymerization initiator typically represented by 9-fluorenone or 2-i-propylthioxanthone. A photosensitive resin composition is provided which can be developed by using water, has a low hardness and high resilience, and is excellent in balance of properties.
    Type: Grant
    Filed: April 21, 2000
    Date of Patent: August 28, 2001
    Assignee: JSR Corporation
    Inventors: Katsuo Koshimura, Tsukasa Toyoshima, Takashi Nishioka, Tadaaki Tanaka
  • Patent number: 6277450
    Abstract: The present invention relates to novel compositions and methods for preventing corrosion.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: August 21, 2001
    Inventor: Mohammad W. Katoot
  • Patent number: 6225368
    Abstract: A monomer-grafted cross-linked polymer is prepared by the steps of activating a polymer by radiation, quenching the activated polymer so as to effect cross-linking therein, activating the cross-linked polymer by irradiation and contacting the activated cross-linked polymer with an emulsion that includes an unsaturated monomer, an emulsifier and water. The activated cross-linked polymer is contacted with the emulsion for a sufficient time to effect a desired extent of grafting.
    Type: Grant
    Filed: September 7, 1999
    Date of Patent: May 1, 2001
    Assignee: National Power PLC
    Inventors: Vincent F. D'Agostino, John Michael Newton
  • Patent number: 6191184
    Abstract: Radiation-setting compositions suitable for the formation of LCD spacers or protective layers which are excellent in photosetting properties (requiring no heat-setting) and development properties, have high adhesiveness to substrates and excellent mechanical characteristics, remain stable over a long storage time and show excellent working condition-dependency. Such a radiation-setting composition for the formation of LCD spacers or protective layers comprises a (meth)acrylic acid-based copolymer having an acid value of 30 to 200 and a glass transition temperature of −30 to 180° C., a (meth)acrylate-based compound obtained by copolymerizing a monomer having a specific structure with a monomer at least having an acidic group, a radiation-sensitive compound and a solvent.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: February 20, 2001
    Assignees: Fuji Photo Film Co., Ltd., Fujifilm Olin Co., Ltd. Co., Ltd.
    Inventors: Nobuo Suzuki, Tsutomu Okita, Yoshihisa Masaki
  • Patent number: 6162842
    Abstract: This invention discloses a radiation curable coating composition which is comprised of (1) a crosslinked polymeric resin which is comprised of repeat units which are derived from (a) at least one member selected from the group consisting of acrylate monomers and vinyl aromatic monomers and (b) a crosslinking monomer; (2) an acrylate diluting monomer; and (3) a photocatalyst.
    Type: Grant
    Filed: May 18, 1999
    Date of Patent: December 19, 2000
    Assignee: The Goodyear Tire & Rubber Company
    Inventors: Patrick Andre Roger Freche, Franck Constant Emile Duval
  • Patent number: 6162843
    Abstract: Polypropylene is crosslinked by means of an ionizing radiation followed by annealing at a temperature of at least 110.degree. C., in the presence of an unsaturated monomeric compound such as acetylene or 1,3-butadiene or 1,3,5-hexatriene.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: December 19, 2000
    Inventors: Harold M. Fisher, Richard Albert Jones, Ian Macmillan Ward
  • Patent number: 6153660
    Abstract: A photopolymerizable composition is disclosed, comprising at least A) a compound having an addition-polymerizable ethylenically unsaturated bond, B) a metallocene compound photopolymerization initiator and C) a polymer binder having an amido group on the side chain thereof and being substantially soluble in an alkali water.
    Type: Grant
    Filed: December 15, 1998
    Date of Patent: November 28, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuhiro Fujimaki, Yasuo Okamoto, Kazuo Fujita, Tadahiro Sorori
  • Patent number: 6140387
    Abstract: Gels for thermotropic layers, obtainable by irradiating a mixture comprisinga) an uncrosslinked polymer in amounts of less than 5% by weight, based on the sum of a), b) and c),b) monomers which can be polymerized by means of free radicals, andc) water or an organic solvent, or a mixture thereof,with high-energy light.
    Type: Grant
    Filed: July 8, 1998
    Date of Patent: October 31, 2000
    Assignee: BASF Aktiengesellschaft
    Inventor: Matthias Gerst
  • Patent number: 6107361
    Abstract: The invention relates to a solvent-free radiation curable, optical glass fiber coating composition containing:a) a urethane oligomer having a functional group capable of polymerization in the presence of actinic radiation, with an average functionality of at least about 1.2, having a vinyl addition polymer as backbone.b) a urethane compound having a functional group capable of polymerization in the presence of actinic radiation, with an average functionality of at least about 1, containing an organic moiety having about 5 or more carbon atoms as backbone.c) a reactive diluent.Furthermore, the invention relates to a solvent-free method for producing a solvent-free, radiation curable urethane oligomer composition.
    Type: Grant
    Filed: October 8, 1998
    Date of Patent: August 22, 2000
    Assignee: DSM N.V.
    Inventors: Anthony J. Tortorello, Edward J. Murphy
  • Patent number: 6083660
    Abstract: Photopolymerizable plastisol and organosol photoresist and solder mask coating compositions are described herein. These compositions include an ethylenically unsaturated photopolymerizable liquid plasticizer; a particulate, thermoplastic resin is dispersed in the plasticizer, the said resin having a midpoint Tg greater than 110.degree. C. and an acid number greater than 110; a tertiary amine stabilizer; and a photoinitiator. The organosol includes a diluent along with the other ingredients.
    Type: Grant
    Filed: May 11, 1995
    Date of Patent: July 4, 2000
    Assignee: Armstrong World Industries, Inc.
    Inventors: Wendell A. Ehrhart, David A. Smith
  • Patent number: 6060214
    Abstract: Photopolymerizable plastisol and organosol photoresist and solder mask coating compositions are described herein. These compositions include an ethylenically unsaturated photopolymerizable liquid plasticizer; a particulate, thermoplastic resin is dispersed in the plasticizer, the said resin having a midpoint Tg greater than 110.degree. C. and an acid number greater than 110; a tertiary amine stabilizer; and a photoinitiator. The organosol includes a diluent along with the other ingredients.
    Type: Grant
    Filed: July 23, 1992
    Date of Patent: May 9, 2000
    Assignee: Armstrong World Industries, Inc.
    Inventors: Wendell A. Ehrhart, David A. Smith
  • Patent number: 6020394
    Abstract: A process for preparing a modified polyalkylene, preferably polyethylene or polypropylene, polymer product is described. The process involves treating the polymer in an impregnation step with UV radiation in the presence of a carbonyl bearing photoinitiator species and a crosslinking species. The radiation may take place in a gaseous or liquid environment which is substantially free of oxygen gas but which comprises at least one of the species.
    Type: Grant
    Filed: February 23, 1998
    Date of Patent: February 1, 2000
    Assignee: Celgard LLC
    Inventors: Richard A. Jones, Ian M. Ward
  • Patent number: 6001894
    Abstract: A process for modifying the surface of a polymer substrate which comprises (1) pretreating the polymer substrate with a photoinitiator or thermoinitiator and at least one ethylenically unsaturated monomer, and (2) subjecting said pretreated polymer substrate to graft polymerization by said at least one monomer, optionally in the added presence of at least one ethylenically unsaturated monomer that is the same or different from the monomer of step (1), and products produced thereby.
    Type: Grant
    Filed: April 14, 1998
    Date of Patent: December 14, 1999
    Assignee: Huels Aktiengesellschaft
    Inventors: Peter Ottersbach, Martina Inhester
  • Patent number: 5952396
    Abstract: An elastomer has a modulus intermediate between that of a conventional rubber and a gel. The elastomer includes (a) between 20 and 45 parts by weight of a semicrystalline elastomer having between 1 and 15% crystallinity and (b) between 80 and 55 parts by weight of a compatible liquid elastomer having a number-average molecular weight of between 1,500 and 8,500. The elastomer's modulus is sufficiently high to enable it to be fabricated into handleable articles, but is sufficiently low so that it provides effective sealing of substrates it covers without the need for introducing a separate sealing material such as a mastic or adhesive.
    Type: Grant
    Filed: June 16, 1997
    Date of Patent: September 14, 1999
    Assignee: Raychem Corporation
    Inventor: Rong Jong Chang
  • Patent number: 5922509
    Abstract: A negative-acting photoimageable composition useful as a photoresist comprises an acid-functional binder polymer, a photopolymerizable component, and a photoinitiator chemical system, in which the binder polymer has a multi-modal molecular weight distribution used to promote faster photoresist stripping times and a smaller stripped particle size. The combination of faster stripping times and smaller stripped particle size allows for fully aqueous, environmentally friendly, stripping of the photoresist from overplated circuit boards.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: July 13, 1999
    Assignee: Morton International, Inc.
    Inventors: Randall W. Kautz, Robert K. Barr
  • Patent number: 5919834
    Abstract: Disclosed are UV-cured heat transfer labels prepared from a mixture containing at least one thermoplastic resin, at least one material for solvating the thermoplastic resin, the solvating material being either a solvent or liquid monomer, and at least one photo-initiable material which initiates curing of the composition.
    Type: Grant
    Filed: September 29, 1997
    Date of Patent: July 6, 1999
    Assignee: Illinois Tool Works Inc.
    Inventors: Myron H. Downs, James D. Singelyn, Bruce W. Downs
  • Patent number: 5907001
    Abstract: A process comprising:reacting a first polymer containing at least one haloalkyl substituted styrene, with a reactive acrylate compound wherein the haloalkyl substituent is converted to an alkylacrylate ester or an alkylacrylate ester ammonium salt to form an acrylated second polymer, andirradiating said acrylated second polymer.
    Type: Grant
    Filed: September 24, 1997
    Date of Patent: May 25, 1999
    Assignee: Xerox Corporation
    Inventors: Daniel A. Foucher, Katsumi Daimon, Peter M. Kazmaier, Timothy J. Fuller, Ram S. Narang
  • Patent number: 5902837
    Abstract: A photocurable resin composition comprising a propenyl ether group-containing compound (A) having propenyl ether groups of the following formula (1) and having a number-average molecular weight of not less than 500, and a cationic photopolymerization initiator (B).CH.sub.3 --CH.dbd.CH--O-- (1)The object is to provide a photocurable resin composition which cures at a higher speed than a vinyl ether compound on exposure to light irradiation, and has improved flow characteristics, physical property of cured resin, and adhesion to metal.
    Type: Grant
    Filed: August 9, 1996
    Date of Patent: May 11, 1999
    Assignee: Sanyo Chemical Industries, Ltd.
    Inventors: Takao Saito, Kohei Maeda, Naoshi Ozasa
  • Patent number: 5902836
    Abstract: Solute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive .alpha.-cleaving groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers in situ or be added thereto to form the syrup.
    Type: Grant
    Filed: August 23, 1995
    Date of Patent: May 11, 1999
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Greggory S. Bennett, Gaddam N. Babu, Kejian Chen, Louis E. Winslow, George F. Vesley, Patrick G. Zimmerman
  • Patent number: 5883151
    Abstract: Polypropylene mixtures of increased stress-crack resistance and melt strength can be produced by irradiating polypropylene powders with low average particle diameters by low energy electron-beam accelerators with energies of 150 to 300 keV. The polypropylene mixtures produced are suitable particularly for producing films, sheets, panels, coatings, pipes, hollow objects and foamed materials.
    Type: Grant
    Filed: February 28, 1997
    Date of Patent: March 16, 1999
    Assignee: PCD Polymere Ges. m.b.H.
    Inventors: Manfred Raetzsch, Achim Hesse, Hartmut Bucka, Norbert Reichelt, Ulf Panzer, Reiner Mehnert
  • Patent number: 5872158
    Abstract: The claimed invention is an uncured thermosetting composition which is capable of curing upon exposure to actinic radiation, said composition comprising an acetal diacrylate of the formula: ##STR1## wherein R.sub.1 and R.sub.2 are individually hydrogen, C.sub.1-6 alkyl, aryl, or substituted aryl; R.sub.3 and R.sub.4 are individually C.sub.1-6 alkyl, aryl, substituted alkyl, or aryl alkyl; and R.sub.5 and R.sub.6 are individually hydrogen or C.sub.1-6 alkyl; and a free radical curing agent.
    Type: Grant
    Filed: June 12, 1997
    Date of Patent: February 16, 1999
    Assignee: International Business Machines Corporation
    Inventor: Joseph Paul Kuczynski
  • Patent number: 5847015
    Abstract: A radiation-sensitive composition which comprises (A) a binder polymer which is a copolymer comprising (A-1) a monomer containing an alcoholic hydroxyl group, (A-2) a macromonomer, and (A-3) other monomer copolymerizable with the above monomers; (B) a pigment, and (C) a radiation-sensitive compound. This radiation-sensitive composition is suited as a color-dispersed composition for a color filter which does not cause surface soiling and which has an excellent adhesion of a formed pixel to a glass substrate.
    Type: Grant
    Filed: January 13, 1997
    Date of Patent: December 8, 1998
    Assignee: JSR Corporation
    Inventors: Yusuke Tajima, Nobuo Bessho, Hiroaki Nemoto, Fumine Shitani
  • Patent number: 5776996
    Abstract: A photopolymerizable composition is disclosed, comprising i) an addition polymerizable compound having an ethylenically unsaturated double bond, ii) a sensitizing dye represented by the following formula (I) and iii) a titanocene compound: ##STR1## wherein R.sup.1, R.sup.2, R.sup.7 and R.sup.8 each represents a hydrogen atom, an alkyl group, an aryl group or an alkenyl group, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group or an alkoxycarbonyl group, R.sup.1 and R.sup.2 may be combined with each other to form a ring together with the nitrogen atom or R.sup.1 and R.sup.5 or R.sup.2 and R.sup.3 may be combined with each other to form a ring together with the carbon atoms and the nitrogen atom, R.sup.3 and R.sup.4 or R.sup.5 and R.sup.6 may be combined with each other to form a ring together with the two carbon atoms, X.sup.1 represents an oxygen atom or a sulfur atom, and n represents 0, 1 or 2.
    Type: Grant
    Filed: February 19, 1997
    Date of Patent: July 7, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuo Okamoto, Tadahiro Sorori
  • Patent number: 5773485
    Abstract: Solute polymers in solvent monomers form a coatable syrup that can be cured to a viscoelastomeric material when radiation-sensitive hydrogen abstracting groups in either the polymer or one of the monomers are exposed to ultraviolet radiation. The solute polymers can be formed from the solvent monomers.
    Type: Grant
    Filed: August 23, 1995
    Date of Patent: June 30, 1998
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Greggory S. Bennett, Louis E. Winslow, Gaddam N. Babu
  • Patent number: 5723513
    Abstract: Radiation-sensitive organo-halogen compounds that have a photo-labile halomethyl-1,3,5-triazine moiety and a polymeric moiety within the same molecule. The compounds of this invention are comprised of a polymeric moiety having attached or incorporated within its structure at least one 1,3,5-triazine nucleus, said triazine nucleus having at least one halomethyl substituent attached to a carbon atom of the triazine nucleus. These compounds are capable of being stimulated by actinic radiation at wavelengths of from about 250 to about 900 nanometers to generate free radicals and/or acids. The compounds of this invention are useful as photoinitiators in free radical polymerization reactions, oxidation-reduction reactions, or reactions sensitive to acid, and they also exhibit the capability to crosslink upon exposure to light.
    Type: Grant
    Filed: March 8, 1996
    Date of Patent: March 3, 1998
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: James A. Bonham, Mitchell A. Rossman, Richard J. Grant
  • Patent number: 5700417
    Abstract: The invention relates to a process for preparing a fibre-reinforced composite or a fibre-reinforced coating, which comprises impregnating reinforcing fibres with a radiation-curable composition comprising a polymerisable monomer and a polymer which is dissolved or dispersed in the monomer, and exposing the impregnated fibres to radiation to effect curing of the composition.
    Type: Grant
    Filed: January 26, 1996
    Date of Patent: December 23, 1997
    Assignee: Kabushiki Kaisha Kobe Seiko Sho
    Inventors: Alan Fernyhough, Michael Fryars
  • Patent number: 5663212
    Abstract: A light-sensitive resin composition which can be developed in an alkaline aqueous solution and has an excellent image-forming performance and a sufficient UV absorbance after an image formation is disclosed. The light-sensitive resin composition includes (1) a photopolymerization initiator or a photopolymerization initiator system, (2) an addition-polymerizable monomer having an ethylenically unsaturated double bond, (3) a high molecular binder which is soluble in an alkaline aqueous solution and insoluble in water, and (4) at least one of the compounds which substantially do not absorb light in a specified UV region and which, when subjected to treatment with an aqueous alkali solution and/or to heating, are capable of absorbing light in that region and have substantially no absorption in the visible region.
    Type: Grant
    Filed: February 4, 1994
    Date of Patent: September 2, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yuichi Wakata, Morimasa Sato, Ken Iwakura, Yuuichi Fukushige
  • Patent number: 5652281
    Abstract: Disclosed are graft copolymers of polyolefins and a method of preparing the graft copolymers. The method includes irradiating a mass of olefin polymer particles and thereafter treating the mass of particles with a vinyl monomer in liquid form. A nonoxidizing environment is maintained throughout the process while free radicals produced in the olefin polymer by the irradiation are present, thereby preventing degradation of the polymer. In a final step, residual free radicals are deactivated, and any unreacted monomer is removed.
    Type: Grant
    Filed: November 21, 1994
    Date of Patent: July 29, 1997
    Assignee: Montell North America Inc.
    Inventors: Paolo Galli, Anthony J. DeNicola, Jr., Jeanine A. Smith
  • Patent number: 5550005
    Abstract: Flexographic photosensitive printing plates are made with formulations comprising triblock polymers of poly(vinylpyridine)-poly(butadiene) or poly(isoprene)-poly(vinylpyridine). A variation in the formulations includes the insertion of a copolymerizable monomer such as styrene between the poly(butadiene) and poly(vinylpyridine) blocks. The polymers may be quaternized or neutralized with an organic acid. When made with quaternized polymers, the plates after imaging with UV may be developed in aqueous solutions. The acid neutralized polymers offer further advantages as to ease of synthesis, safety and improved resolution.
    Type: Grant
    Filed: September 8, 1992
    Date of Patent: August 27, 1996
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Arthur L. Berrier, Rustom S. Kanga
  • Patent number: 5530036
    Abstract: An epoxy group-containing thermosetting resin composition comprising (A) a copolymer obtained From (a) at least one member selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, (b) an epoxy group-containing unsaturated compound, (c) a monoolefin unsaturated compound, and optionally (d) a conjugated diolefin unsaturated compound, and (B) an organic solvent for dissolving the above copolymer. There is also provided another epoxy-group containing thermosetting resin composition which contains the above component (A), (C) a polymerizable compound having at least one ethylenically unsaturated double bond, and (D) a photopolymerization initiator. These epoxy-group containing thermosetting resin compositions are excellent in storage stability.
    Type: Grant
    Filed: December 15, 1994
    Date of Patent: June 25, 1996
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Kimiyasu Sano, Masayuki Endo, Atsufumi Shimada, Yasuaki Yokoyama, Nobuo Bessho
  • Patent number: 5445919
    Abstract: A photopolymerizable composition for forming protective layers of color filters, which comprises:(1) a photopolymerization initiator or a photopolymerization initiator system,(2) an addition-polymerizable monomer having an ethylenically unsaturated double bond, and(3) a resin produced by reaction of an anhydride-containing copolymer having a number average molecular weight of 500 to 30,000 which contains repeating units represented by at least formulas (I), (II) and (III), respectively, with a primary amine represented by formula (IV) with the ratio of the primary amine to the copolymer being 0.1 to 1.0 equivalent per equivalent of the anhydride in the copolymer: ##STR1## wherein the variables in formulas (I), (II), (III) and (IV) are defined in the specification.
    Type: Grant
    Filed: June 10, 1994
    Date of Patent: August 29, 1995
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yuichi Wakata, Masayuki Iwasaki, Koji Inoue
  • Patent number: 5420171
    Abstract: A UV curable organic solvent soluble, aqueous nonalkaline soluble and peelable temporary solder mask composition to be applied to a surface to be protected, having a reactive diluent monomer capable of polymerization upon exposure to ultraviolet light and a photoinitiator serving as a free radical source to initiate polymerization.
    Type: Grant
    Filed: December 31, 1991
    Date of Patent: May 30, 1995
    Assignee: Tech Spray, Inc.
    Inventor: Greg R. Unruh
  • Patent number: 5411994
    Abstract: Disclosed are graft copolymers of polyolefins and a method of preparing said graft copolymers. The method comprises irradiating a mass of olefin polymer particles and thereafter treating the mass of particles with a vinyl monomer in liquid form. A nonoxidizing environment is maintained throughout the process while free radicals produced in the olefin polymer by the irradiation are present, thereby preventing degradation of the polymer. In a final step, residual free radicals are deactivated, and any unreacted monomer is removed.
    Type: Grant
    Filed: November 6, 1992
    Date of Patent: May 2, 1995
    Assignee: Himont Incorporated
    Inventors: Paolo Galli, Anthony J. DeNicola, Jr., Jeanine A. Smith
  • Patent number: 5399604
    Abstract: An epoxy group-containing thermosetting resin composition comprising (A) a copolymer obtained from (a) at least one member selected from an unsaturated carboxylic acid and an unsaturated carboxylic acid anhydride, (b) an epoxy group-containing unsaturated compound, (c) a monoolefin unsaturated compound, and optionally (d) a conjugated diolefin unsaturated compound, and (B) an organic solvent for dissolving the above copolymer. There is also provided another epoxy-group containing thermosetting resin composition which contains the above component (A), (C) a polymerizable compound having at least one ethylenically unsaturated double bond, and (D) a photopolymerization initiator. These epoxy-group containing thermosetting resin compositions are excellent in storage stability.
    Type: Grant
    Filed: July 21, 1993
    Date of Patent: March 21, 1995
    Assignee: Japan Synthetic Rubber Co., Ltd.
    Inventors: Kimiyasu Sano, Masayuki Endo, Atsufumi Shimada, Yasuaki Yokoyama, Nobuo Bessho
  • Patent number: 5369139
    Abstract: Radiation and peroxide-curable oligomeric emulsions are prepared by mixing water, an .alpha.,.beta.-ethylenically unsaturated oligomer (e.g. an unsaturated polyester), a reactive, nonionic surfactant containing allyl unsaturation, and a metallic salt drier under high shear agitation until a stable emulsion is formed. Coatings prepared from these emulsions are tack and mar free and demonstrate good resistance to organic solvents and water.
    Type: Grant
    Filed: August 17, 1993
    Date of Patent: November 29, 1994
    Assignee: Cook Composites and Polymers Company
    Inventors: Rudolph H. Boeckeler, Delano R. Eslinger
  • Patent number: 5356754
    Abstract: A photopolymerizable or radiation polymerizable alkaline developing crosslinking curable resin composition possessing superior antiplating properties and a short stripping period, in which the stripped plate is not easily dissolved in the stripping fluid, and which is comprising:(a) 5-30 parts by weight of at least one compound possessing in one molecule on the average 1.
    Type: Grant
    Filed: September 25, 1992
    Date of Patent: October 18, 1994
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kenji Kushi, Ken-ichi Inukai, Takayuki Iseki, Seiya Koyanagi
  • Patent number: 5281510
    Abstract: A photosensitive elastomeric composition comprising (1) at least one elastomer, (2) an addition-polymerizable compound having at least one CH.sub.2 .dbd.C< group and (3) a polymerization initiator activatable by actinic light, wherein the elastomer (1) is an elastomer selected from (a) an elastomeric polymer composed of a polyene monomer containing at least two non-conjugated double bonds and a conjugated diene-type monomer or both a conjugated diene-type monomer and a copolymerizable vinyl monomer and (b) an elastomeric linear A-B type (wherein A represents a polymer block of a monovinyl aromatic compound and B represents a polymer block of a conjugated diene-type monomer) block copolymer in which a terminal group having a polymerizable ethylenic double bond is present in at least one end of the molecular chain.
    Type: Grant
    Filed: December 30, 1992
    Date of Patent: January 25, 1994
    Assignee: Nippon Zeon Co., Ltd.
    Inventors: Fusayoshi Sakurai, Hiroto Kidokoro, Mitsuhiro Tamura
  • Patent number: 5196478
    Abstract: This invention relates to radio-derivatized polymers and a method of producing them by contacting non-polymerizable conjugands with radiolysable polymers in the presence of irradiation. The resulting radio-derivatized polymers can be further linked with ligands of organic or inorganic nature to immobilize such ligands.
    Type: Grant
    Filed: April 9, 1990
    Date of Patent: March 23, 1993
    Assignee: Epipharm Allergie-Service Gesellschaft m.b.H.
    Inventors: Janos M. Varga, Peter Fritsch