Processes Of Treating A Solid Polymer Or Sicp Derived From At Least One Nonethylenic Reactant Or Compositions Therefore Patents (Class 522/162)
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Patent number: 7294673Abstract: A method of modifying a polymeric material whereby the polymeric material is modified to give a highly durable surface without decreasing its strength. Namely, a polymeric material is modified by the method comprising a combination of an impregnation step, an activation step, a step of grafting a monomer and a step of a treatment with a hydrophilic polymer. Thus, the hydrophilic nature, adhesiveness, and so forth of polymeric materials such as polyolefins can be improved without causing any decrease in the practical strength. The thus obtained polymeric materials are usable in articles with a need for high water absorptivity and high adhesiveness, for example, water-absorbing materials and water-retaining materials for medical, sanitary, cosmetic articles or supplies, agricultural materials, synthetic papers, filters and fiber products for clothes, for improving adhesiveness of composite materials and the like.Type: GrantFiled: June 28, 2002Date of Patent: November 13, 2007Assignee: FiberMark Gessner GmbH & Co.Inventor: Hitoshi Kanazawa
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Patent number: 7273896Abstract: This invention relates generally to compositions and systems for forming biomaterials containing a transient colorant for visualizing tissue or surgical materials coated with such biomaterials, to methods of using such compositions as bioadhesives, for tissue augmentation, in the prevention of surgical adhesions, for coating surfaces of synthetic implants, as drug delivery matrices, for ophthalmic applications, and in other applications.Type: GrantFiled: April 10, 2003Date of Patent: September 25, 2007Assignee: Angiotech Pharmaceuticals (US), Inc.Inventors: George Y. Daniloff, John R. Daniels
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Patent number: 7271203Abstract: A process for increasing the molecular weight of polyacrylates, characterized in that polyacrylates which are functionalized at least on one part of their chain ends by photoinitiator groups X are exposed to actinic radiation, so that a direct linking reaction of the polyacrylates takes place.Type: GrantFiled: November 22, 2002Date of Patent: September 18, 2007Assignee: tesa AktiengesellschaftInventors: Marc Husemann, Stephan Zöllner
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Patent number: 7268171Abstract: A radiation curable aqueous coating composition comprises an aqueous resin having a chemically bonded phosphate group and an ethylenic unsaturated double bond, and/or a phosphate compound having an ethylenic unsaturated double bond and an aqueous resin having an ethylenic unsaturated double bond, which has high solvent resistance and adhesion to the surface of the metal material.Type: GrantFiled: April 26, 2001Date of Patent: September 11, 2007Assignee: Dainippon Ink and Chemicals, Inc.Inventors: Shigehiro Tanaka, Masanori Takase, Hiroshi Matsuo
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Patent number: 7265163Abstract: There is provided a process for forming a light emitting polymer comprising photopolymerization of a reactive mesogen having an endgroup which is susceptible to photopolymerization e.g. by a radical polymerization process. Also provided are methods for using the light emitter in displays, backlights, electronic apparatus and security viewers.Type: GrantFiled: June 1, 2004Date of Patent: September 4, 2007Assignee: University of HullInventors: Mary O'Neill, Stephen Malcolm Kelly, Adam Edward Alexander Contoret, Gary James Richards
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Patent number: 7235591Abstract: The present invention relates to an ultraviolet-curable coating composition comprising: (A) an ultraviolet curable four or more functional groups-containing polyfunctional (meth)acrylate having four or more (meth)acryloyl groups in the molecule and a number average molecular weight of 300 to 2,000, (B) a lactone-modified polymer of polyhydric alcohol mono(meth)acrylate containing 20 to 60 percents by weight of ?-caprolactone ring-opening addition product and having a hydroxyl value derived from the lactone modification of 100 to 180 mgKOH/g, and/or a lactone-modified polyester resin containing 10 to 50 percents by weight of lactone ring-opening addition product and having a hydroxyl value of 50 to 180 mgKOH/g, (C) a non-yellow polyisocyanate compound and/or an amino resin, (D) a light stabilizer and, (E) a photopolymerization initiator, wherein a weight ratio of component (A) against to a total weight of component Components (B) and (C) is 10:90 to 50:50, a weight ratio of component (B) against to componentType: GrantFiled: March 20, 2003Date of Patent: June 26, 2007Assignee: BASF Coatings Japan Ltd.Inventors: Takeshi Tsunoda, Shinji Mitsumune
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Patent number: 7232851Abstract: An energy curable lithographic ink composition having an asymptotic relative viscosity of about 0.4 to about 1.5 and a water up-take number of at least about 30%. Also disclosed is a method of improving various rheological properties and increasing the water window of an energy curable lithographic ink by varying the composition of the ink in order to result in an asymptotic relative viscosity of about 0.4 to about 1.5 and a water up-take number of at least about 30%. A method of identifying and selecting an energy curable lithographic ink composition having optimal press performance is also disclosed.Type: GrantFiled: August 7, 2002Date of Patent: June 19, 2007Assignee: Sun Chemical CorporationInventors: Stan Miezeiwski, Paul Sirotto, Mikhail Laksin, Jean Dominique-Turgis
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Patent number: 7214724Abstract: A plastic is converted from an initial condition with a higher density into a foamed condition with a lower density using a blowing agent, wherein the plastic is cross-linked prior to foaming by means of a first cross-linking agent and during the foaming by means of at least one second cross-linking agent.Type: GrantFiled: June 15, 2004Date of Patent: May 8, 2007Assignee: Henkel Kommanditgesellschaft Auf AktienInventor: Marcel Salamon
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Patent number: 7205339Abstract: The present invention provides partial and complete shielding approaches to alter the cross-linking characteristics of irradiated polymers, such as polyethylene. Irradiated polymers and fabricated articles, such as medical prosteses, comprising irradiated polymers also are provided.Type: GrantFiled: December 11, 2001Date of Patent: April 17, 2007Assignee: Massachusetts General HospitalInventor: Orhun K. Muratoglu
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Patent number: 7199167Abstract: There is provided a process for forming a light emitting polymer comprising photopolymerization of a reactive mesogen having an endgroup which is susceptible to photopolymerization e.g. by a radical polymerization process. Also provided are methods for using the light emitter in displays, backlights, electronic apparatus and security viewers.Type: GrantFiled: June 2, 2004Date of Patent: April 3, 2007Assignee: University of HullInventors: Mary O'Neill, Stephen Malcolm Kelly, Adam Edward Alexander Contoret, Gary James Richards
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Patent number: 7166239Abstract: There is provided a process for forming a light emitting polymer comprising photopolymerization of a reactive mesogen having an endgroup which is susceptible to photopolymerization e.g. by a radical polymerization process. Also provided are methods for using the light emitter in displays, backlights, electronic apparatus and security viewers.Type: GrantFiled: June 1, 2004Date of Patent: January 23, 2007Assignee: University of HullInventors: Mary O'Neill, Stephen Malcolm Kelly, Adam Edward Alexander Contoret, Gary James Richards
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Patent number: 7163967Abstract: A method of increasing the gas transmission rate of a packaging film comprises providing a packaging film that comprises at least about 0.001 weight % of single-walled carbon nanotube material based on the weight of the film. The packaging film is exposed to an amount of radiation energy effective to increase the oxygen transmission rate of the packaging film by at least about 100 cc (STP)/m2. day (1 atm, 0% RH, 23° C.).Type: GrantFiled: December 1, 2003Date of Patent: January 16, 2007Assignee: Cryovac, Inc.Inventors: Michael D. Grah, Marvin R. Havens
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Patent number: 7144679Abstract: Laminates for electronic components are produced by applying a polyimide resin precursor solution containing a palladium compound on a polyimide substrate, drying the resulting coating to form a polyimide resin precursor layer, irradiating this layer with ultraviolet rays in the presence of a hydrogen donor to form nuclei for primer plating, forming a metal primer layer by electroless plating, and converting the polyimide resin precursor layer into a polyimide resin layer through imidation by heating either after or before the formation of a surface plating layer. The invention provides laminates for electronic components which are extremely improved in adhesion to metal layers without impairing the characteristics inherent in the substrate and are excellent in insulating properties, and polyimide resin precursor resin solution to be used in the production of the laminates.Type: GrantFiled: December 28, 2001Date of Patent: December 5, 2006Assignee: Toray Engineering Company, LimitedInventors: Shinya Izumida, Koji Itoh, Minoru Oyama, Atsushi Suzuki
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Patent number: 7129288Abstract: Novel polyurethanes containing sulfide groups which comprise at least one group of the general formula I in the polymer main chain and/or at least one group of the general formula II incorporated at the chain end: —X—A—S—B—Y—??(I) —X—A—S—B—YH??(II) in which the variables have the following definitions: S is the sulfur atom; X and Y independently of one another are oxygen atoms, sulfur atoms or groups —NZ where Z is the hydrogen atom or an alkyl radical of 1 to 10 carbon atoms; and A and B independently of one another are divalent organic radicals; novel polymer mixtures based thereon, and the use of the novel polyurethanes and polymer mixtures and dispersions thereof for the preparation of coating materials, adhesives and sealing compounds.Type: GrantFiled: October 30, 2001Date of Patent: October 31, 2006Assignee: BASF Coatings AGInventors: Wilma Löcken, Heinz-Peter Rink, Thomas Krüger, Stefan Schwarte, Hans-Ulrich Moritz, Hartmut Kagerer
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Patent number: 7115673Abstract: The present photosensitive resin composition 2 comprises a polyamic acid resin 4, a photosensitive agent, a dispersible compound 3 dispersible in the polyamic acid resin 4, and a solvent. The porous resin is obtained by removing the solvent from the photosensitive resin composition 2 to form a composition in which the dispersible compound 3 is dispersed in the polyamic acid resin 4, removing the dispersible compound to make the composition porous, and curing the porous photosensitive resin composition. The porous resin enables forming a fine circuit pattern and has a low dielectric constant and, when used as an insulating layer of a circuit board, brings about improved high frequency characteristics.Type: GrantFiled: December 17, 2003Date of Patent: October 3, 2006Assignee: Nitto Denko CorporationInventors: Amane Mochizuki, Takahiro Fukuoka, Mitsuhiro Kanada, Takayuki Yamamoto, Tomohiro Taruno
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Patent number: 7105272Abstract: It is intended to provide compositions to be used in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. Acid-degradable compositions contain a polymer having a repeating unit represented by the following general formula (I): wherein R1 and R2 independently represent hydrogen atom, halogen atom, C1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(?O)R4 group, S(O)nR4 group, P(?O)(R4)2 group or M(R4)3 group; R3 represents C1-20 hydrocarbon group or a heterocyclic group: R4 represents C1-20 hydrocarbonoxy group, C1-20 hydrocarbon group, C1-20 hydrocarbonthio group or mono- or di-C1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2, and an acid or a compound capable of generating an acid in response to an external stimulus.Type: GrantFiled: February 14, 2003Date of Patent: September 12, 2006Assignee: Nippon Soda Co., Ltd.Inventors: Atsushi Sudo, Hideo Kubo
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Patent number: 7091255Abstract: A method of multiphoton photosensitizing a photoreactive composition comprises irradiating the composition with light sufficient to cause simultaneous absorption of at least two photons, thereby inducing at least one acid- or radical-initiated chemical reaction where the composition is exposed to the light. The composition comprises: (a) at least one reactive species that is capable of undergoing such reaction; and (b) at least one multi-component, multiphoton photoinitiator system.Type: GrantFiled: October 13, 2004Date of Patent: August 15, 2006Assignee: 3M Innovative Properties CompanyInventor: Robert J. DeVoe
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Patent number: 7087691Abstract: Embodiments in accordance with the present invention encompass photo-imageable compositions that include polymers of acrylate-type monomers and norbornene-type monomers. In some embodiments a catalyst system comprising a cationic or a neutral Pd(II) dimer component having the formula (Allyl)Pd(P(R21)3) or (L?)[(L)Pd(R)(X)]2, respectively is employed to effect polymerization. In other embodiments a free radical or living free radical catalyst is employed to effect polymerization. At least one of the acrylate-type monomers and norbornene-type monomers of the polymer embodiments of the present invention encompass an acid labile moiety. Some polymer embodiments of the present invention include more than one type of acrylate-type monomer and norbornene-type monomer. Embodiments of the present invention include forming a patterned layer on a substrate and some embodiments include transferring the patterned structure to a material layer first formed on the substrate.Type: GrantFiled: July 7, 2003Date of Patent: August 8, 2006Assignees: Promerus LLC, Penn State Research FoundationInventors: Larry F. Rhodes, Larry Seger, Ayusman Sen, April Hennis Marchetti
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Patent number: 7060756Abstract: A method is provided for obtaining crosslinked polymers having pendent sulfonic acid groups by crosslinking through the sulfonic acid groups or their precursors with aromatic crosslinkers or aromatic pendent crosslinking groups to form aromatic sulfones. Such crosslinked polymers may be used to make polymer electrolyte membranes (PEM's) that may be used in electrolytic cells such as fuel cells.Type: GrantFiled: November 24, 2003Date of Patent: June 13, 2006Assignee: 3M Innovative Properties CompanyInventors: Naiyong Jing, Michael A. Yandrasits, Steven J. Hamrock
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Patent number: 7053134Abstract: Chemically cross-linked polymeric particles are formed using mechanical rather than chemical processes, facilitating production of small-diameter particles in a manner largely independent of the viscosity or density of the polymer. For example, an uncross-linked resin may be provided in particulate form, agglomerated, and compressed into a mass of a desired shape with a desired diameter, and subsequently cross-linked.Type: GrantFiled: March 28, 2003Date of Patent: May 30, 2006Assignee: Scimed Life Systems, Inc.Inventors: Samuel P. Baldwin, Robert P. Skribiski
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Patent number: 7037953Abstract: A method for producing a solvent resistant, low-extractable, film from an actinic radiation curable homogenous aqueous composition containing a water soluble compound, having at least one alpha, beta-ethylenically unsaturated radiation polymerizable double bond, and water as essential components.Type: GrantFiled: December 27, 2002Date of Patent: May 2, 2006Assignee: Sun Chemical CorporationInventors: Subhankar Chatterjee, Mikhail Laksin, David Biro, Jean Dominique Turgis
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Patent number: 7034098Abstract: A photoactive side-chain polymer from the class of polyimides, polyamide acids and esters thereof, comprising as a side-chain a dendritic block incorporating photoactive groups at its surface. The dendritic block preferably represents a unit of formulae Ia, Ib or a combination of them, for example formulae Ic, wherein the broken line symbolizes the linkage to the polyimide main chain. The polymer may be used as an orientation layer for liquid crystals and in the construction of unstructured and structured optical elements and multi-layer systems.Type: GrantFiled: February 4, 2002Date of Patent: April 25, 2006Assignee: Rolic AGInventors: Guy Marck, Richard Buchecker, Olivier Muller
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Patent number: 7019045Abstract: An object of the present invention is to provide a material which resolves the drawbacks associated with polyimide polymers, and yet retains the advantages offered by conventional polyimide polymers. An amino group containing phenol derivative of the present invention is represented by a general formula (1) show below, and the present invention also provides a polyimide precursor produced using such an amino group containing phenol derivative. (wherein, R1, R2 and R3, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms, an alkoxy group of 1 to 10 carbon atoms, a COOR group (in which R represents an alkyl group of 1 to 6 carbon atoms) or a hydrogen atom; R4 and R5, which may be the same or different, each represent an alkyl group of 1 to 9 carbon atoms or a hydrogen atom; X represents —O—, —S—, —SO2—, —C(CH3)2—, —CH2—, —C(CH3)(C2H5)—, or —C(CF3)2—; and n represents an integer of 1 or greater).Type: GrantFiled: May 9, 2005Date of Patent: March 28, 2006Assignee: Gun Ei Chemical Industry Co., Ltd.Inventors: Takeshi Tsuihiji, Michiyasu Yamazaki
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Patent number: 7019043Abstract: The invention provides a decomposable resin composition, which is stable at the time of use and which quickly decomposes when discarded. According to the present invention, there is provided a resin composition comprising an agent generating an acid or a base upon response to light or heat together with a hydrolyzable and biodegradable resin. The decomposable resin composition can promote decomposition of the polymer by generating an acid or a base in the resin by carrying out light irradiation and/or a heat treatment at a desired time and can control the decomposition speed of the polymer by controlling the generation amount of an acid or a base.Type: GrantFiled: July 3, 2003Date of Patent: March 28, 2006Assignee: Canon Kabushiki KaishaInventor: Hiroshi Maehara
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Patent number: 6903171Abstract: Methods for the addition polymerization of cycloolefins using a cationic Group 10 metal complex and a weakly coordinating anion of the formula: [(R?)zM(L?)x(L?)y]b[WCA]d wherein [(R?)zM(L?)x(L?)y] is a cation complex where M represents a Group 10 transition metal; R? represents an anionic hydrocarbyl containing ligand; L? represents a Group 15 neutral electron donor ligand; L? represents a labile neutral electron donor ligand; x is 1 or 2; and y is 0, 1, 2, or 3; and z is 0 or 1, wherein the sum of x, y, and z is 4; and [WCA] represents a weakly coordinating counteranion complex; and b and d are numbers representing the number of times the cation complex and weakly coordinating counteranion complex are taken to balance the electronic charge on the overall catalyst complex.Type: GrantFiled: October 15, 2002Date of Patent: June 7, 2005Assignee: Promerus, LLCInventors: Larry Funderburk Rhodes, Andrew Bell, Ramakrishna Ravikiran, John C. Fondran, Saikumar Jayaraman, Brian Leslie Goodall, Richard A. Mimna, John-Henry Lipian
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Patent number: 6887946Abstract: It is an object of the present invention to provide a compound having a (meth)acryloyl group that is suitably used in various applications, a process for producing such compound simply and under mild conditions, and an useful photo-curable composition and aqueous photo-curable composition comprising such compound.Type: GrantFiled: October 31, 2002Date of Patent: May 3, 2005Assignee: Nippon Shokubai Co., Ltd.Inventors: Akihiko Fukada, Keiji Yurugi, Toshio Awaji, Nobuaki Otsuki
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Patent number: 6887916Abstract: A latent material having various controlled shrinkage tensions and patterns and a method of making the same. The materials include polymer materials that are capable of absorbing microwave energy. Different degrees of shrinkage of the material may be controlled to create different tensions in the material. Additionally, various stereo and three-dimensional patterns may be generated on the material. These materials may be used in the formation of personal care articles. The materials are made by incorporating a polymer material onto the film, wherein the polymer material is capable of turning microwave energy into heat. Upon exposure to microwave radiation, the heat will cause the latent material to shrink. The use of different types and amounts of polymer materials will result in a latent material having different tensions and patterns.Type: GrantFiled: December 28, 2000Date of Patent: May 3, 2005Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Peiguang Zhou, Lance James Garrett, Jr.
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Patent number: 6867243Abstract: There is provided a process for forming a light emitting polymer comprising photopolymerization of a reactive mesogen having an endgroup which is susceptible to photopolymerization e.g. by a radical polymerization process. Also provided are methods for using the light emitter in displays, backlights, electronic apparatus and security viewers.Type: GrantFiled: July 1, 2002Date of Patent: March 15, 2005Assignee: University of HullInventors: Mary O'Neill, Stephen Malcolm Kelly, Adam Edward Alexander Contoret, Gary James Richards
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Patent number: 6864300Abstract: A photoreactive adhesive composition which is of the one-pack type, has excellent workability, cures upon irradiation with light, and can have sufficient initial adhesion strength and heat resistance immediately after bonding. The photoreactive adhesive composition comprises a urethane prepolymer and a compound which generates an amine upon irradiation with light, wherein the amine-generating compound is a cobalt/amine complex, O-acyloxime, or carbamic acid derivative.Type: GrantFiled: March 27, 2001Date of Patent: March 8, 2005Assignee: Sekisui Chemical Co., Ltd.Inventor: Hideaki Ishizawa
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Patent number: 6850681Abstract: A buffer coating for optical fibers is disclosed which includes a halogenated epoxy resin for flame-retardancy, and elastomer modified epoxy resin for tensile strength and flexibility, a low viscosity bisphenol resin for structural integrity, a viscosity modifier for improved process or extrusion properties, a polyol to increase the cure rate and cross-linking during curing, a slip agent or surfactant to reduce the adhesion of the buffer layer to the cladding and to further improve the flow characteristics during extrusion, and a photo-initiator. The buffer layer is flame-retardant and has a fast UV cure rate.Type: GrantFiled: August 22, 2002Date of Patent: February 1, 2005Assignee: Addison Clear Wave, LLCInventors: Claire Marie Lepont, Long Van Ha, Chau Thi Minh Ha
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Patent number: 6830782Abstract: A method of modifying a polymeric material which comprises the steps of activation-treatment and a hydrophilic polymer-treatment, or comprises the steps of activation-treatment, a hydrophilic polymer-treatment, and monomer grafting in this order, or comprises the step of a solvent-treatment followed by these steps. Thus, the polymeric material, e.g., polyolefin, is improved in hydrophilicity, adhesion, etc. without lowering the practical strength thereof. The polymeric material thus improved in adhesion and other properties can be used in many applications where water absorption and adhesion are required, such as an absorption material, e.g., a wiping/cleansing material, a water retention material, a material for microorganism culture media, a separator for batteries (or cells), a synthetic paper, a filter medium, a textile product for clothing, a medical/sanitary/cosmetic supply, and reinforcing fibers for composite materials.Type: GrantFiled: August 27, 2001Date of Patent: December 14, 2004Inventor: Hitoshi Kanazawa
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Publication number: 20040247908Abstract: The present invention relates to a composition for forming a film for protecting wiring, wherein the content of sulfur atoms in solid contents of the composition is 150 ppm or less. The present invention also relates to a dry film for forming a wiring-protecting film, using the composition, and a substrate having wiring protected by means of the dry film.Type: ApplicationFiled: June 1, 2004Publication date: December 9, 2004Applicant: Mitsui Chemicals, Inc.Inventors: Katsuhiko Funaki, Shuji Tahara, Kazuhito Fujita, Takeshi Tsuda, Etsuo Ohkawado
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Patent number: 6821108Abstract: The invention is concerned with the problem that with known plastic casting moulds, especially those of polypropylene, the lenses produced with these moulds have a slippery surface. The invention solves this problem through the use of polymers which are notable for their very low oxygen permeability.Type: GrantFiled: March 26, 2003Date of Patent: November 23, 2004Assignee: Novartis AGInventors: Peter Hagmann, Axel Heinrich, Willi Hoerner, Robert Allen Janssen, John Martin Lally, Robert Earl Szokolay, Bernhard Seiferling
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Patent number: 6818680Abstract: The invention is directed to the use of multifunctional thiol compounds as adhesion promoters and/or primers to enhance the adhesion of photo or electron beam curable polymers, coatings, adhesives, or sealants to gold, other precious metals, and their alloys. Actinic radiation and electron beam (“EB”) radiation can be used to cure such compositions. The resulting cured compositions are optically clear, low Tg (≦30° C.), high refractive index (>1.50 at 1541 nm), thermally, oxidatively, and hydrolytically stable adhesives and/or coatings for glass and/or metal. The adhesive compositions containing such multifunction thiols can survive, without delamination or separation, testing conditions of 85° C. and 85% relative humidity (“RH”) for a time in excess of 500 hours.Type: GrantFiled: September 23, 2002Date of Patent: November 16, 2004Assignee: Corning IncorporatedInventor: Paul J. Shustack
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Publication number: 20040198863Abstract: There are provided a vinyl compound which is excellent in heat resistance and electric characteristics and excellent in reactivity by introducing a vinyl group into a terminal of a bifunctional polyphenyleneether oligomer, and a cured product thereof which has a high glass transition temperature, has a low dielectric constant and a low dielectric loss tangent and has the excellent properties of polyphenylene ether.Type: ApplicationFiled: July 25, 2003Publication date: October 7, 2004Inventors: Kenji Ishii, Yasumasa Norisue, Daisuke Ohno, Makoto Miyamoto
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Publication number: 20040185215Abstract: A photoactive side-chain polymer from the class of polyimides, polyamide acids and esters thereof, comprising as a side-chain a dentritic block incorporating photoactive groups at its surface. The dentritic block preferably represents a unit of formulae Ia, Ib or a combination of them, for example formulae Ic wherein the broken line symbolizes the linkage to polyimide main chain. The polymer may be used as orientation layer for liquid crystals and in the construction of unstructured and structured optical elements and multi-layer systems.Type: ApplicationFiled: March 8, 2004Publication date: September 23, 2004Inventors: Guy Marck, Richard Buchecker, Olivier Muller
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Patent number: 6787583Abstract: An intaglio printing ink comprising a first binder compound selected from the group of water-soluble or water-thinnable acrylate oligomers, and optionally, a second monomeric binder compound selected from the group comprising water-soluble or water-thinnable PEG diacrylate or polyethoxylated polyol triacrylate monomers to adjust the viscosity of the ink composition. To initiate polymerization of the binder compounds upon irradiation by electromagnetic radiation or electron beam radiation a photoinitiator is included. Further optional additives, such as pigments, fillers, photosensitizers, stabilizers emulsifiers and security pigments may be present. The ink shows excellent wipeability and allows precipitation from the wiping solution.Type: GrantFiled: January 10, 2003Date of Patent: September 7, 2004Assignee: SICPA Holding S.A.Inventors: Patrick Veya, Olivier Amrein, Alexia Christinat
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Publication number: 20040152799Abstract: Polymerizable compositions are described containing urethane (meth)acrylate oligomers and certain polymerizable monomers useful in thermoforming or in-mold decoration applications.Type: ApplicationFiled: January 31, 2003Publication date: August 5, 2004Inventors: Christopher Wayne Miller, Jo Ann Arceneaux, Larisa Kagansky, Michael J. Idacavage, Marcus Hutchins, Morris Arthur Johnson
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Publication number: 20040132855Abstract: Polymers, methods of use thereof, and methods of decomposition thereof, are provided. One exemplary polymer, among others, includes, a photodefinable polymer having a sacrificial polymer and a photoinitiator.Type: ApplicationFiled: October 16, 2003Publication date: July 8, 2004Inventors: Paul A. Kohl, SueAnn Bidstrup Allen, Xiaoqun Wu, Clifford Lee Henderson
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Patent number: 6716564Abstract: A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.Type: GrantFiled: December 6, 2001Date of Patent: April 6, 2004Assignee: Clariant Finance (BVI) LimitedInventors: Satoshi Kobayashi, Hidekazu Shioda, Haruhiko Itoh
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Patent number: 6710098Abstract: The present invention relates to a method for reforming the surface of polymer, especially to a method for providing hydrophilicity or increasing hydrophobicity by reforming the surface of polymer or polymer membrane. The present invention is a method for reforming the surface of polymer membrane by irradiating it with energized ionic particles under the vacuum condition. The method including the steps of: a) manufacturing polymer membrane, including a surface activated, by inserting polymer membrane into a vacuum chamber, and by irradiating energized ionic particles on the surface of polymer membrane with an ion beam under a high vacuum; and b) manufacturing polymer membrane treated with a reactive gas on the surface of membrane, including the activated surface of step a), by infusing the reactive gas into a vacuum chamber after energized ionic particles of step a) have been irradiated.Type: GrantFiled: July 31, 2000Date of Patent: March 23, 2004Assignee: LG Chemical Ltd.Inventors: Sang-Young Lee, Byeong-In Ahn, Heon-Sik Song, Myung-Man Kim
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Publication number: 20040029991Abstract: The present invention relates to flexible package laminates useful in food packaging that are prepared using a liquid, UV curable, oligomeric, adhesive composition that does not require a photoinitiator.Type: ApplicationFiled: August 12, 2002Publication date: February 12, 2004Inventors: Jeffrey R. Warmkessel, Randy A. Johnson, Thomas M. Moy, Vincent J. Pascarella, Raymond Scott Harvey
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Publication number: 20040006152Abstract: Aqueous coating compositions based on polyurethane dispersions which cure under the influence of high-energy radiation, to a process for preparing them and to their use. The coating compositions contain a polyisocyanate, a polyurethane containing free-radically polymerizable groups, and an initiator which is capable of initiating a free-radical polymerization.Type: ApplicationFiled: June 10, 2003Publication date: January 8, 2004Inventors: Jan Weikard, Erhard Luhmann, Christoph Irle, Thorsten Rische, Karin Naujoks, Thomas Feller, Jan Mazanek
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Patent number: 6673407Abstract: A semiconductive member such as a semiconductive belt or a semiconductive roll used with an image formation apparatus has a portion formed of a thermoplastic elastomer composition comprising a thermoplastic resin 73 as a matrix and rubber particles 72 at least some of which have conductivity and at least some of which are cross-linked as domain.Type: GrantFiled: December 28, 2000Date of Patent: January 6, 2004Assignees: Fuji Xerox Co., Ltd., The Yokohama Rubber Co., Ltd.Inventors: Yukio Hara, Shoichi Morita, Masuo Kuroda, Jiro Watanabe
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Publication number: 20030225180Abstract: A photocurable composition is provided which yields an excellent tack-free, hard cured product without any addition of photoinitiators. A photocurable composition which is excellent in storage stability is also provided. The photocurable composition contains a resin having an acryloyl group and a chemical structure element selected from the group consisting of &bgr;-diketone groups and &bgr;-ketoester groups, wherein the &bgr;-diketone group or the &bgr;-ketoester group has a tetra-substituted carbon atom between two carbonyl groups, which is capable of generating one or two free radicals under photoirradiation, and the photocurable composition does not increase more than 25% in viscosity when heated at 60° C. for 5 days.Type: ApplicationFiled: March 7, 2003Publication date: December 4, 2003Inventors: Kai-Uwe Gaudl, Artur Lachowicz, Ken-ichi Yatsugi, Gerwald F. Grahe
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Patent number: 6649230Abstract: A photoactive polymer of the general formula I: in which: P is a photoactive group which can photoisomerise and/or photodimerise; B represents an aromatic or alicyclic group, or B further represents a nitrogen atom or —CR2—; A, C, D each independently of the other represents an aromatic or alicyclic group; M represents a repeating monomer unit in a homo- or copolymer; S1, S2, S3, S4, S5 represent a single covalent bond or a spacer unit; n1, n2 are each independently a positive integer up to 2 with the proviso that n1+n2≦2; R1 is a hydrogen atom, or a straight-chain or branched alkyl residue wherein R2 represents a hydrogen atom or lower alkyl. The photoactive polymers may be used as orientation layers for liquid crystals and in the construction of unstructured and structured optical elements and multi-layer systems.Type: GrantFiled: October 3, 2001Date of Patent: November 18, 2003Assignee: Rolic AGInventors: Hubert Seiberle, Guy Marck, Olivier Muller
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Publication number: 20030162858Abstract: Disclosed herein are radiation-curable polymers, a method of preparing radiation-curable polymers and compositions containing radiation-curable polymers. Radiation-curable polymers and compositions containing radiation-curable polymers are useful as coatings and adhesives.Type: ApplicationFiled: December 24, 2001Publication date: August 28, 2003Applicant: University of Massachusetts LowellInventors: Rudolf Faust, Savvas Hadjikyriacou, Toshio Suzuki, Maneesh Bahadur
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Patent number: 6610759Abstract: An adhesive composition that includes a mixture of a cationically polymerizable component, an acidic component, and an initiator is provided. Preferably, the initiator comprises an iodonium salt, a visible light sensitizer, and an electron donor compound, wherein the initiator has a photoinduced potential greater than or equal to that of N,N-dimethylaniline in a standard solution of 2.9×10−5 moles/g diphenyl iodonium hexafluoroantimonate and 1.5×10−5 moles/g camphorquinone in 2-butanone. This adhesive composition is cationically polymerizable and is able to bond to hard tissue and cationic restorative materials upon curing.Type: GrantFiled: March 6, 2000Date of Patent: August 26, 2003Assignees: Curators of the University of Missouri, 3M Innovative Properties CompanyInventors: Cecil C. Chappelow, Charles S. Pinzino, J. David Eick, James Code, Joel D. Oxman, Sharon M. Rozzi
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Patent number: 6599957Abstract: A UV light-curable composition comprises: (a) a first component, said first component being UV light-polymerizable polymer having a first index of refraction; and (b) a second component, the second component being UV light-polymerizable monomer having a second index of refraction, the second index of refraction being higher than said first index of refraction; wherein the first component polymerizes slower upon exposure to UV radiation than the second component.Type: GrantFiled: May 7, 2001Date of Patent: July 29, 2003Assignee: Corning IncorporatedInventors: Steven B. Dawes, Michael E. DeRosa, Robert J. Hagerty, Jianguo Wang
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Patent number: 6596818Abstract: Disclosed is a radiation-crosslinkable thermoplastic polymer composition, a process for the preparation thereof, an angioplasty balloon made using such a composition, and a method of using the angioplasty balloon. The composition contains a reactive monomer cross-linker, that facilitates cross-linking of the reaction product upon contact of the cross-linker-containing composition with a particle beam from a radiation source.Type: GrantFiled: October 8, 1997Date of Patent: July 22, 2003Inventor: Alan M. Zamore