Processes Of Treating A Solid Polymer Or Sicp Derived From At Least One Nonethylenic Reactant Or Compositions Therefore Patents (Class 522/162)
  • Publication number: 20030134125
    Abstract: The present invention relates to powder coating binders containing polyurethanes having (meth)acryloyl groups which are applied onto a substrate, fused with heat and cured by electromagnetic radiation and to a process for preparing the same.
    Type: Application
    Filed: November 15, 2002
    Publication date: July 17, 2003
    Inventors: Thomas Facke, Jan Weikard, Hanno Brummer, Peter Thometzek
  • Publication number: 20030130371
    Abstract: A radiation curable aqueous coating composition comprises an aqueous resin having a chemically bonded phosphate group and an ethylenic unsaturated double bond, and/or a phosphate compound having an ethylenic unsaturated double bond and an aqueous resin having an ethylenic unsaturated double bond, which has high solvent resistance and adhesion to the surface of the metal material.
    Type: Application
    Filed: October 23, 2002
    Publication date: July 10, 2003
    Inventors: Shigehiro Tanaka, Masanori Takase, Hiroshi Matsuo
  • Publication number: 20030114551
    Abstract: Fluoropolymers containing the benzocyclobutenone moiety are provided.
    Type: Application
    Filed: September 13, 2002
    Publication date: June 19, 2003
    Inventors: Kai Li, Yukihiko Sasaki, Prakash Mallya, Pradeep Iyer
  • Patent number: 6552100
    Abstract: A method of treating reaction injection molded polyurethane, polyurethane/urea and polyurea polymers comprising exposing a reaction injection molded polyurethane, polyurethane/urea or polyurea polymer to an amount of infrared energy sufficient to increase the temperature of the polymer to at least 175° C., and then maintaining the temperature of the polymer at or above that temperature, for a time sufficient to increase the Gardner impact property, as measured using ASTMD-3029, when compared to the same polymer which has been heated to the same temperature and maintained thereat for the same time in a convection oven. The invention produces marked improvements in impact, heat sag and heat distortion temperature properties, and thus is particularly suited to rapid preparation of parts using a mass production conveyor and is particularly well-suited to preparation of parts which are to be subjected to later high temperature processes, such as the “E-coat” process.
    Type: Grant
    Filed: February 8, 2001
    Date of Patent: April 22, 2003
    Assignee: The Dow Chemical Company
    Inventors: John W. McLaren, Kenneth J. Rettmann
  • Publication number: 20030073756
    Abstract: A radiation-curable composition is comprised of the reaction product of an amine-terminated (poly)aminoamide and a mono-(meth)acrylate or a poly-(meth)acrylate. The radiation-curable composition is a liquid at room temperature and does not undergo substantial volume contraction upon curing and exhibit excellent adhesion to porous and non porous substrates alike.
    Type: Application
    Filed: September 13, 2002
    Publication date: April 17, 2003
    Inventors: Miguel A. Dones, Anbazhagan Natesh, Daniel Haile, Ramesh L. Narayan
  • Patent number: 6525109
    Abstract: The present invention relates to a process of preparing polycarbonate, more specifically to a process of preparing polycarbonates by solid state polymerization using microwave radiation, which comprises steps of preparing polycarbonate prepolymer having a certain range of viscosity average molecular weight; converting said polycarbonate prepolymer into crystalline particles having a certain degree of crystallinity; and producing polycarbonates by solid state polymerization of said crystalline particles by applying microwave radiation, thus resulting in production of high quality polycarbonates with high molecular weight within short time.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: February 25, 2003
    Assignees: Korea Research Institute of Chemical Technology, S-Oil Corporation
    Inventors: Kil-Yeong Choi, Jae Heung Lee, Young Chan Ko, Il Seok Choi, Cheol-Hyun Kim, Kwang Soo Yoon, Kyong Soon Lee
  • Patent number: 6517910
    Abstract: In one aspect the invention provides an energy efficient polymerization method comprising irradiating a polymerizable composition and a photoinitiator with a source of essentially monochromatic radiation where the photoinitiator and the wavelength of the radiation source are selected such that the extinction coefficient of the photoinitiator at the peak wavelength of the source is greater than about 1000 M−1 cm−1 and such that the photoinitiator absorbs at least two percent of the actinic radiation incident on the coating. In another aspect the invention provides energy efficient methods of polymerizing polymerizable compositions and crosslinking crosslinkable compositions by irradiating the respective compositions with a low power source of essentially monochromatic radiation. The low power energy sources have an input power of less than about 10 W/cm.
    Type: Grant
    Filed: February 6, 2001
    Date of Patent: February 11, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Robin E. Wright, George F. Vesley
  • Publication number: 20030027885
    Abstract: The novel photo-cross-linkable polymers are suitable as coating materials. The photo-cross-linkable polymers contain a biphenylene unit, which can be dimerized by exposure. Attached to the biphenyl unit are side chains of a polymer with a high temperature resistance and a high chemical stability. Through exposure, the biphenylene units dimerize, whereby the polymers are spatially cross-linked.
    Type: Application
    Filed: July 1, 2002
    Publication date: February 6, 2003
    Inventors: Marcus Halik, Klaus Lowack, Recai Sezi, Andreas Walter
  • Publication number: 20030018097
    Abstract: A process for forming a light emitting polymer wherein photopolymerization is carried out using a reactive mesogen having an endgroup susceptible to photopolymerization, e.g., by a radical polymerization process. Also, the light emitting polymer produced and methods for using the light emitter in displays, backlights, electronic apparatus and security viewers.
    Type: Application
    Filed: July 3, 2001
    Publication date: January 23, 2003
    Inventors: Mary O'Neill, Stephen Malcolm Kelly, Adam Edward Alexander Contoret, Gary James Richards
  • Publication number: 20020128344
    Abstract: Mica is incorporated into a biodegradable resin material comprised mainly of polylactic acid, for example, into polylactic acid which is an aliphatic polyester resin. It is desired to incorporate into polylactic acid mica and a carbodiimide compound as an additive for suppressing hydrolysis of polylactic acid. Further, the biodegradable resin composition is subjected to aging by heating and desirably further using an electromagnetic wave or the like to suppress rapid lowering of the storage elastic modulus, and the biodegradable resin composition is used as a material for household electric appliances and housing materials.
    Type: Application
    Filed: December 4, 2001
    Publication date: September 12, 2002
    Inventors: Yuko Fujihira, Tsutomu Noguchi, Hiroyuki Mori
  • Patent number: 6447708
    Abstract: Sulphur product, (P), process for making (P), films, molded articles made therefrom, wherein (P) is obtained by the addition reaction of at least one polythiol (I) with at least one compound of formula (II): in which R1 represents a linear or branched aliphatic residue comprising an ethylenic unsaturation double bond, it being optional for the latter to be that by which R1 is connected to the norbornene ring, it also being optional for the said ring to comprise other substituents chosen from C1-C3 alkyl groups, in proportions corresponding or substantially corresponding to one thiol group of the polythiol or polythiols (I) per mole of the compound or compounds (II), the thiol groups of the compound or compounds (I) adding predominantly to the cyclic double bond of the compound or compounds (II) and, on average, one ethylenic unsaturation of a compound (II) of the two which it carries remaining free; or sulphur product, (P′), obtained by the addition reaction of at least one polythiol (
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: September 10, 2002
    Assignee: Cray Valley S.A.
    Inventors: Philippe Thépot, Henri Strub
  • Publication number: 20020091173
    Abstract: A curable re-release adhesive which, when subjected to a curing reaction caused by irradiation with radiation, shows a sufficient drop of adhesion and causes the adherend to be warped to a minimized extent as developed by the shrinkage force caused by the curing reaction. The re-release adhesive contains a radiation-reactive polymer including a main chain and a plurality of intramolecular side chains, each such side chain having a terminal carbon-carbon double bond, a chain length of 6 or more in terms of number of atoms, and the same or a different number of atoms as each other side chain in the polymer. The release adhesive shows a shrinkage force of 30 MPa or less as developed by a curing reaction upon irradiation. A re-release adhesive sheet is also disclosed, including a substrate film and an adhesive layer containing the re-release adhesive, provided on one surface thereof.
    Type: Application
    Filed: December 13, 2001
    Publication date: July 11, 2002
    Applicant: NITTO DENKO CORPORATION
    Inventors: Kouichi Hashimoto, Takahiro Fukuoka, Koji Akazawa, Yoshio Nakagawa, Tatsuya Kubozono
  • Patent number: 6417243
    Abstract: In order to offer coatings with improved resistance to solvents which can be prepared by cationic polymerization under irradiation, the choice is made of a composition comprising at least one monomer, oligomer or polymer of general formula (I): in which: A1 is chosen from polyester blocks, polyurethane blocks, hydrocarbon-comprising backbones of mono- or polycarboxylic acid and addition products of a polycarboxylic acid and of a cycloaliphatic diepoxide, m is a number from 1 to 6, R1 is a cycloaliphatic group carrying a hydroxyl group situated in the a position with respect to the oxygen atom to which R1 is bonded, R2 is a second cycloaliphatic group carrying an oxirane group situated at the chain end, and B is chosen from one or more covalent bonds, an oxygen atom and linear, branched or cyclic hydrocarbon-comprising radicals.
    Type: Grant
    Filed: July 28, 2000
    Date of Patent: July 9, 2002
    Assignee: UCB, S.A.
    Inventors: Stephan Peeters, Kris Verschueren, Jean-Marie Loutz
  • Patent number: 6384103
    Abstract: Radiation-sensitive resin composition having excellent and well-balanced various properties required for photoresist, such as sensitivity, pattern profile and heat resistance. The radiation-sensitive resin composition comprises an alkali-soluble resin and a photosensitizer having a quinonediazide group. The alkali-soluble resin is a phenol novolak resin which is treated by a thin film distillation method to selectively remove monomer and dimer. The novolak resin treated by thin film distillation method preferably shows the following ratio in area in its profile in gel permeation chromatography with a detector at 280 nm: B2/B1≧0.95; C2/(A2+B2+C2)≦0.060 wherein A1 is a high-molecular region, B1 is a middle-molecular region, and C1 is a monomer/dimer region before the treatment of the starting novolak resin, and A2, B2 and C2 are the corresponding counterparts after the treatment of the novolak resin.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: May 7, 2002
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Akio Arano, Kenji Yamamoto
  • Patent number: 6365323
    Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an interger of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.
    Type: Grant
    Filed: March 16, 1999
    Date of Patent: April 2, 2002
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 6348516
    Abstract: Process for using microwave irradiation to prepare solutions of polymers functionalized with acid groups The invention relates to a process for preparing aqueous, hydrous and anhydrous solutions of polymers functionalized with acid groups, which comprises using microwave radiation to supply the heat required to prepare the solution. The solutions are suitable as a starting material for producing gas diffusion electrodes, fuel cells and polymer-electrolyte-stabilized platinum nanoparticles.
    Type: Grant
    Filed: July 6, 2000
    Date of Patent: February 19, 2002
    Assignee: Celanese Ventures GmbH
    Inventors: Thomas Soczka-Guth, Helmut Witteler, Gregor Deckers, Georg Frank, Kilian Brehl, Jürgen Lenze, Harald Bönsel, Rüdiger Knauf
  • Patent number: 6342542
    Abstract: A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: January 29, 2002
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Satoshi Kobayashi, Hidekazu Shioda, Haruhiko Itoh
  • Patent number: 6340718
    Abstract: A source of radiation (10,12), particularly a pulsed accelerated electron beam, directs a beam of radiation through an irradiation chamber (14, 50). The irradiation chamber is depleted of oxygen and oxygen containing gases, such as being drawn to a vacuum of 10−1 or greater Torr by a vacuum pump (20, 52). Particulate fluoropolymer material is entrained (36) in substantially oxygen free gas and conveyed through the irradiation chamber. The accelerated electrons break chemical bonds in the fluoropolymer particles and electrostatically charge the particles. Magnetic fields (42, 60) of different polarity rotate the charged particles such that they are irradiated from different sides. The irradiated fluoropolymer particles are cooled (24) and separated (26) from the entraining gas. The entraining gas is recirculated through pneumatic line (34) for a continuous cycle. In an alternate batch processing embodiment, the fluoropolymer material is placed in the shallow container (50) which is sealed and evacuated.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: January 22, 2002
    Assignee: Steris INC
    Inventors: Sergey Alexandrovich Korenev, John Masefield, Jerry Kriebel
  • Publication number: 20010047043
    Abstract: Describes polymerizing with actinic radiation a cationically polymerizable organic composition comprising (a) at least one polyfunctional thiirane having at least two groups represented by the following general formula I, 1
    Type: Application
    Filed: February 28, 2001
    Publication date: November 29, 2001
    Inventors: Michael O. Okoroafor, Robert D. Herold, Marvin J. Graham, Robert A. Smith, James R. Franks
  • Patent number: 6323301
    Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140° C.
    Type: Grant
    Filed: August 10, 2000
    Date of Patent: November 27, 2001
    Assignee: Xerox Corporation
    Inventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
  • Publication number: 20010041754
    Abstract: A method of treating reaction injection molded polyurethane, polyurethane/urea and polyurea polymers comprising exposing a reaction injection molded polyurethane, polyurethane/urea or polyurea polymer to an amount of infrared energy sufficient to increase the temperature of the polymer to at least 180° C., and then maintaining the temperature of the polymer at or above that temperature, for a time sufficient to increase the Gardner impact property, as measured using ASTMD-3029, when compared to the same polymer which has been heated to the same temperature and maintained thereat for the same time in a convection oven. The invention produces marked improvements in impact, heat sag and heat distortion temperature properties, and thus is particularly suited to rapid preparation of parts using a mass production conveyor and is particularly well-suited to preparation of parts which are to be subjected to later high temperature processes, such as the “E-coat” process.
    Type: Application
    Filed: February 8, 2001
    Publication date: November 15, 2001
    Inventors: John W. McLaren, Kenneth J. Rettmann
  • Publication number: 20010031798
    Abstract: In one aspect the invention provides an energy efficient polymerization method comprising irradiating a polymerizable composition and a photoinitiator with a source of essentially monochromatic radiation where the photoinitiator and the wavelength of the radiation source are selected such that the extinction coefficient of the photoinitiator at the peak wavelength of the source is greater than about 1000 M−1 cm−1 and such that the photoinitiator absorbs at least two percent of the actinic radiation incident on the coating.
    Type: Application
    Filed: February 6, 2001
    Publication date: October 18, 2001
    Applicant: 3M Innovative Properties Company
    Inventors: Robin E. Wright, George F. Vesley
  • Publication number: 20010024749
    Abstract: Grafting a polymer at the surface of a carbonated material containing carboxyl, amine and/or hydroxyl functions at its surface. This material is suspended in a solution comprising the polymer to be grafted, which includes a carboxyl, amine and/or hydroxyl function, the solution also comprising a solvent of the polymer. This is followed by a treatment causing dehydration into a carboxyl function, an amide and/or hydroxyl function and the polymer is thus grafted on the carbonated material by means of ester or amide bonds. Utilization in the cathode or anode of an electrochemical generator, in a polymer material with low polarity, in an ink, and as a conductive deposit on flexible plastic used as electrical contact, electromagnetic protection and antistatic protection.
    Type: Application
    Filed: April 6, 2001
    Publication date: September 27, 2001
    Applicant: HYDRO-QUEBEC
    Inventors: Christophe Michot, Michel Armand, Michel Gauthier, Yves Choquette
  • Patent number: 6291543
    Abstract: A surfacially ultraviolet radiation-crosslinked article formed of a homogeneous composition including an elastoplastic material, a cross-linker component that is cross-linkable by free-radical polymerization, and a free-radical source material generating free radicals in exposure to ultraviolet radiation, wherein the elastoplastic material is surfacially cross-linked by exposure to ultraviolet radiation, wherein the sub-surface bulk volume of the article is non-cross-linked, and the article is resiliently deformable from and resiliently recoverable to a shape of the article when it was exposed to ultraviolet radiation for surfacial cross-linking thereof. The article is particularly amenable to embodiment as a catheter, or other similar medical device for cardiovascular or other medical procedures.
    Type: Grant
    Filed: May 24, 2000
    Date of Patent: September 18, 2001
    Assignee: Polyzen, Inc.
    Inventor: Tilak M. Shah
  • Patent number: 6273543
    Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer.
    Type: Grant
    Filed: February 9, 1999
    Date of Patent: August 14, 2001
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 6274695
    Abstract: The present invention relates to a treating agent for liquid crystal alignment, which is an agent for liquid crystal alignment to be used for a method in which polarized ultraviolet rays or electron rays are irradiated on a polymer thin film formed on a substrate in a predetermined direction relative to the substrate plane, and said substrate is used for aligning liquid crystal without rubbing treatment, wherein said agent for liquid crystal alignment contains a polymer compound having photochemically reactive groups in the polymer main chain and a glass transition temperature of at least 200° C.
    Type: Grant
    Filed: November 1, 1999
    Date of Patent: August 14, 2001
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Hideyuki Endou, Takayasu Nihira, Hiroyoshi Fukuro
  • Patent number: 6265464
    Abstract: A method of treating reaction injection molded polyurethane, polyurethane/urea and polyurea polymers comprising exposing a reaction injection molded polyurethane, polyurethane/urea or polyurea polymer to an amount of infrared energy sufficient to increase the temperature of the polymer to at least 180° C., and then maintaining the temperature of the polymer at or above that temperature, for a time sufficient to increase the Gardner impact property, as measured using ASTMD-3029, when compared to the same polymer which has been heated to the same temperature and maintained thereat for the same time in a convection oven. The invention produces marked improvements in impact, heat sag and heat distortion temperature properties, and thus is particularly suited to rapid preparation of parts using a mass production conveyor and is particularly well-suited to preparation of parts which are to be subjected to later high temperature processes, such as the “E-coat” process.
    Type: Grant
    Filed: September 14, 1999
    Date of Patent: July 24, 2001
    Assignee: The Dow Chemical Company
    Inventors: John W. McLaren, Kenneth J. Rettmann
  • Patent number: 6235353
    Abstract: Production of a dielectric coating on a substrate whereby a poly(arylene ethers) or fluorinated poly(arylene ethers) layer is cured by exposure to electron beam radiation. A wide area electron beam is used which causes chemical reactions to occur in the polymer structure which are thought to cause crosslinks between polymer chains. The crosslinks lead to higher mechanical strength and higher glass transition temperature, lower thermal expansion coefficient, greater thermal-chemical stability and greater resistance to aggressive organic solvents. The polymer layer may also be optionally heated, thermally annealed, and/or exposed to UV actinic light.
    Type: Grant
    Filed: February 5, 1999
    Date of Patent: May 22, 2001
    Assignee: AlliedSignal Inc.
    Inventors: James S. Drage, Jingjun Yang, Dong Kyu Choi
  • Patent number: 6214488
    Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) in which Ar is a phenylene ring having p- and/or m-bonds, Ar′ is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit, X, N and M, independently of one another are 0 or 1, Y is 0, 1, 2 or 3, P is 1, 2, 3 or 4, is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.
    Type: Grant
    Filed: October 6, 1997
    Date of Patent: April 10, 2001
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Freddy Helmer-Metzmann, Frank Osan, Arnold Schneller, Helmut Ritter, Konstantin Ledjeff, Roland Nolte, Ralf Thorwirth
  • Patent number: 6203143
    Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.
    Type: Grant
    Filed: September 23, 1998
    Date of Patent: March 20, 2001
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 6193909
    Abstract: Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.
    Type: Grant
    Filed: February 2, 1996
    Date of Patent: February 27, 2001
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey D. Gelorme, Yun Hsin Liao, Jane M. Shaw
  • Patent number: 6190603
    Abstract: A novel process for producing mouldings, especially contact lenses, is described, comprising the following steps: a) introducing into a mould a prepolymer containing photo crosslinkable groups that is liquid at room temperature or is readily meltable and is substantially free of solvents; b) initiating the photo cross-linking for a period of <20 minutes; c) opening the mould, so that the moulding can be removed for the mould. In accordance with the process according to the invention, it is possible especially to produce contact lenses having valuable properties.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: February 20, 2001
    Assignee: Novartis AG
    Inventors: Bettina Steinmann, Friedrich Stockinger
  • Patent number: 6187836
    Abstract: Photopolymerizable compositions that include free radically active and cationically active functional groups, and methods for polymerizing such compositions, in which the onset of cationic polymerization is controllably delayed to extend the time between formation of a moldable gel and formation of a hardened solid.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: February 13, 2001
    Assignee: 3M Innovative Properties Company
    Inventors: Joel D. Oxman, Matthew C. Trom, Dwight W. Jacobs
  • Patent number: 6187512
    Abstract: Disclosed is a process which comprises reacting a polymer of the general formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, with a halomethyl alkyl ether, an acetyl halide, and methanol in the presence of a halogen-containing Lewis acid catalyst, thereby forming a halomethylated polymer.
    Type: Grant
    Filed: May 17, 1999
    Date of Patent: February 13, 2001
    Assignee: Xerox Corporation
    Inventors: Daniel A. Foucher, Nancy C. Stoffel, Roger T. Janezic, Thomas W. Smith, David J. Luca, Bidan Zhang
  • Patent number: 6184265
    Abstract: Wear resistance and oxidation resistance of polymer material or a polymer component for bioimplantation are improved by packaging a polymer object in a sealed gas impermeable package substantially free of oxygen, irradiating the package with penetrating radiation to an extent sufficient to effect a desired substantial level of cross-linking within the polymer, and warming the packaged object while maintaining an elevated hydrostatic pressure to cause gases released during irradiation to recombine, stabilizing the material against subsequent oxidative change. The pressure stabilization terminates active sites, substantially eliminating free radicals. When applied to finished parts, the process simultaneously hardens and sterilizes the parts without degrading mechanical properties or dimensions. When applied to bulk material or unfinished parts, the part may be subsequent machined or otherwise finished, and sterilized by any conventional means.
    Type: Grant
    Filed: July 29, 1999
    Date of Patent: February 6, 2001
    Assignee: Depuy Orthopaedics, Inc.
    Inventors: John V. Hamilton, Mary Beth Schmidt, Keith Greer
  • Patent number: 6184263
    Abstract: A composition which comprises a mixture of (A) a first component comprising a polymer, at least some of the monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution and being of the formulae specified in the claims, and (B) a second component which comprises either (1) a polymer having a second degree of photosensitivity-imparting group substitution lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degree of photosensitivity-imparting group substitution, or (2) a reactive diluent having at least one photosensitivity-imparting group per
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: February 6, 2001
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 6174645
    Abstract: The present invention provides crosslinked polymeric networks that are reversibly crosslinked upon exposure to light of a suitable wavelength. In one embodiment photocrosslinkable branched hydrophilic polymers containing photochromic groups are synthesized. Cinnamylidene groups and derivatives of cinnamylidene are preferably used as the photochromic agents or photocrosslinking agents.
    Type: Grant
    Filed: May 3, 1999
    Date of Patent: January 16, 2001
    Assignee: University of Pittsburgh
    Inventors: Alan J. Russell, Eric J. Beckman, Fotios M. Andreopoulos, William R. Wagner
  • Patent number: 6151042
    Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: November 21, 2000
    Assignee: Xerox Corporation
    Inventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
  • Patent number: 6143233
    Abstract: A polymer which can be crosslinked by high-energy radiation and contains from 0.1 to 50% by weight, based on the polymer, of 2,3-dihydrofuran groups or derivatives thereof, each calculated as 2,3-dihydrofuran.
    Type: Grant
    Filed: September 22, 1998
    Date of Patent: November 7, 2000
    Assignee: BASF Aktiengesellschaft
    Inventors: Wolfgang Reich, Reinhold Schwalm, Erich Beck, Lukas Haussling, Oskar Nuyken, Roman-Benedikt Raether
  • Patent number: 6136499
    Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.
    Type: Grant
    Filed: March 6, 1997
    Date of Patent: October 24, 2000
    Assignee: The B. F. Goodrich Company
    Inventors: Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes
  • Patent number: 6124372
    Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: September 26, 2000
    Assignee: Xerox Corporation
    Inventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
  • Patent number: 6117967
    Abstract: Disclosed is a polymer of the formula ##STR1## wherein A is ##STR2## or a mixture of ##STR3## wherein R is a hydrogen atom, an alkyl group, an aryl group, or mixtures thereof, B is one of specified groups, such as ##STR4## or mixtures thereof, and n is an integer representing the number of repeating monomer units.
    Type: Grant
    Filed: June 4, 1999
    Date of Patent: September 12, 2000
    Assignee: Xerox Corporation
    Inventors: Timothy J. Fuller, John F. Yanus, Damodar M. Pai, Markus R. Silvestri, Ram S. Narang, William W. Limburg, Dale S. Renfer
  • Patent number: 6110983
    Abstract: Foamed and expanded beads of a crosslinked aliphatic polyester resin having a gel fraction of at least 5% by weight. The expanded beads may be obtained by crosslinking beads of a non-crosslinked aliphatic polyester resin with a crosslinking agent including an organic peroxide to obtain crosslinked resin beads having a gel fraction of at least 5% by weight, and then expanding the crosslinked resin beads. A biodegradable foamed article may be obtained by thermally foaming the crosslinked, expanded aliphatic polyester resin beads in a mold.
    Type: Grant
    Filed: November 18, 1999
    Date of Patent: August 29, 2000
    Assignee: JSP Corporation
    Inventors: Hisao Tokoro, Satoru Shioya, Mitsuru Shinohara
  • Patent number: 6090895
    Abstract: A method is provided for making crosslinked acidic polymers useful as ion conductive membranes, such as crosslinked sulfonated polyether ketones, sulfonated polysulfones, sulfonated polystyrenes, and other acidic polymers, by crosslinking with a species which generates an acidic functionality. The crosslinker preferably binds to acid functions by conversion of acid groups to imide functionality, which, due to the acidity of the N-H bonds therein, compensate for the acidity lost by the occupation of the acid groups and thus preserve membrane conductivity while contributing to membrane strength and resistance to swelling.
    Type: Grant
    Filed: May 22, 1998
    Date of Patent: July 18, 2000
    Assignee: 3M Innovative Properties Co.,
    Inventors: Shane S. Mao, Steven J. Hamrock, David A. Ylitalo
  • Patent number: 6090453
    Abstract: Disclosed is a process which comprises the steps of (a) providing a polymer containing at least some monomer repeat units with halomethyl group substituents which enable crosslinking or chain extension of the polymer upon exposure to a radiation source which is electron beam radiation, x-ray radiation, or deep ultraviolet radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several groups, as specified in the claims, and B is one of several groups, as specified in the claims or mixtures thereof, and n is an integer representing the number of repeating monomer units, and (b) causing the polymer to become crosslinked or chain extended through the photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead by the aforementioned curing process.
    Type: Grant
    Filed: September 30, 1998
    Date of Patent: July 18, 2000
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller
  • Patent number: 6087414
    Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3##
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: July 11, 2000
    Assignee: Xerox Corporation
    Inventors: Timothy J. Fuller, Ram S. Narang, Thomas W. Smith, David J. Luca, Raymond K. Crandall
  • Patent number: 6063829
    Abstract: A treating method for liquid crystal alignment, which comprises applying polarized ultraviolet or electron rays to a polymer thin film formed on a substrate, in a predetermined direction relative to the substrate surface, and using the substrate to align liquid crystal without rubbing treatment, wherein the polymer thin film is a polyimide resin containing a repeating unit of the formula (I): ##STR1## (wherein R.sup.1 is a tetravalent organic group having an alicyclic structure, and R.sup.2 is a bivalent organic group), which is obtained by dehydration ring-closure of a polyimide precursor having a reduced viscosity of from 0.05 to 3.0 dl/g (in N-methyl-2-pyrrolidone at temperature of 300.degree. C. at a concentration of 0.
    Type: Grant
    Filed: September 4, 1998
    Date of Patent: May 16, 2000
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Hideyuki Endou, Hiroyoshi Fukuro
  • Patent number: 6030550
    Abstract: Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.
    Type: Grant
    Filed: February 2, 1996
    Date of Patent: February 29, 2000
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Jeffrey D. Gelorme, Yun Hsin Liao, Jane M. Shaw
  • Patent number: 6022095
    Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.
    Type: Grant
    Filed: December 23, 1998
    Date of Patent: February 8, 2000
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller, Thomas W. Smith, David J. Luca, Ralph A. Mosher
  • Patent number: 6007877
    Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: December 28, 1999
    Assignee: Xerox Corporation
    Inventors: Ram S. Narang, Timothy J. Fuller