Processes Of Treating A Solid Polymer Or Sicp Derived From At Least One Nonethylenic Reactant Or Compositions Therefore Patents (Class 522/162)
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Publication number: 20030134125Abstract: The present invention relates to powder coating binders containing polyurethanes having (meth)acryloyl groups which are applied onto a substrate, fused with heat and cured by electromagnetic radiation and to a process for preparing the same.Type: ApplicationFiled: November 15, 2002Publication date: July 17, 2003Inventors: Thomas Facke, Jan Weikard, Hanno Brummer, Peter Thometzek
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Publication number: 20030130371Abstract: A radiation curable aqueous coating composition comprises an aqueous resin having a chemically bonded phosphate group and an ethylenic unsaturated double bond, and/or a phosphate compound having an ethylenic unsaturated double bond and an aqueous resin having an ethylenic unsaturated double bond, which has high solvent resistance and adhesion to the surface of the metal material.Type: ApplicationFiled: October 23, 2002Publication date: July 10, 2003Inventors: Shigehiro Tanaka, Masanori Takase, Hiroshi Matsuo
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Publication number: 20030114551Abstract: Fluoropolymers containing the benzocyclobutenone moiety are provided.Type: ApplicationFiled: September 13, 2002Publication date: June 19, 2003Inventors: Kai Li, Yukihiko Sasaki, Prakash Mallya, Pradeep Iyer
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Patent number: 6552100Abstract: A method of treating reaction injection molded polyurethane, polyurethane/urea and polyurea polymers comprising exposing a reaction injection molded polyurethane, polyurethane/urea or polyurea polymer to an amount of infrared energy sufficient to increase the temperature of the polymer to at least 175° C., and then maintaining the temperature of the polymer at or above that temperature, for a time sufficient to increase the Gardner impact property, as measured using ASTMD-3029, when compared to the same polymer which has been heated to the same temperature and maintained thereat for the same time in a convection oven. The invention produces marked improvements in impact, heat sag and heat distortion temperature properties, and thus is particularly suited to rapid preparation of parts using a mass production conveyor and is particularly well-suited to preparation of parts which are to be subjected to later high temperature processes, such as the “E-coat” process.Type: GrantFiled: February 8, 2001Date of Patent: April 22, 2003Assignee: The Dow Chemical CompanyInventors: John W. McLaren, Kenneth J. Rettmann
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Publication number: 20030073756Abstract: A radiation-curable composition is comprised of the reaction product of an amine-terminated (poly)aminoamide and a mono-(meth)acrylate or a poly-(meth)acrylate. The radiation-curable composition is a liquid at room temperature and does not undergo substantial volume contraction upon curing and exhibit excellent adhesion to porous and non porous substrates alike.Type: ApplicationFiled: September 13, 2002Publication date: April 17, 2003Inventors: Miguel A. Dones, Anbazhagan Natesh, Daniel Haile, Ramesh L. Narayan
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Patent number: 6525109Abstract: The present invention relates to a process of preparing polycarbonate, more specifically to a process of preparing polycarbonates by solid state polymerization using microwave radiation, which comprises steps of preparing polycarbonate prepolymer having a certain range of viscosity average molecular weight; converting said polycarbonate prepolymer into crystalline particles having a certain degree of crystallinity; and producing polycarbonates by solid state polymerization of said crystalline particles by applying microwave radiation, thus resulting in production of high quality polycarbonates with high molecular weight within short time.Type: GrantFiled: July 13, 2001Date of Patent: February 25, 2003Assignees: Korea Research Institute of Chemical Technology, S-Oil CorporationInventors: Kil-Yeong Choi, Jae Heung Lee, Young Chan Ko, Il Seok Choi, Cheol-Hyun Kim, Kwang Soo Yoon, Kyong Soon Lee
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Patent number: 6517910Abstract: In one aspect the invention provides an energy efficient polymerization method comprising irradiating a polymerizable composition and a photoinitiator with a source of essentially monochromatic radiation where the photoinitiator and the wavelength of the radiation source are selected such that the extinction coefficient of the photoinitiator at the peak wavelength of the source is greater than about 1000 M−1 cm−1 and such that the photoinitiator absorbs at least two percent of the actinic radiation incident on the coating. In another aspect the invention provides energy efficient methods of polymerizing polymerizable compositions and crosslinking crosslinkable compositions by irradiating the respective compositions with a low power source of essentially monochromatic radiation. The low power energy sources have an input power of less than about 10 W/cm.Type: GrantFiled: February 6, 2001Date of Patent: February 11, 2003Assignee: 3M Innovative Properties CompanyInventors: Robin E. Wright, George F. Vesley
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Publication number: 20030027885Abstract: The novel photo-cross-linkable polymers are suitable as coating materials. The photo-cross-linkable polymers contain a biphenylene unit, which can be dimerized by exposure. Attached to the biphenyl unit are side chains of a polymer with a high temperature resistance and a high chemical stability. Through exposure, the biphenylene units dimerize, whereby the polymers are spatially cross-linked.Type: ApplicationFiled: July 1, 2002Publication date: February 6, 2003Inventors: Marcus Halik, Klaus Lowack, Recai Sezi, Andreas Walter
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Publication number: 20030018097Abstract: A process for forming a light emitting polymer wherein photopolymerization is carried out using a reactive mesogen having an endgroup susceptible to photopolymerization, e.g., by a radical polymerization process. Also, the light emitting polymer produced and methods for using the light emitter in displays, backlights, electronic apparatus and security viewers.Type: ApplicationFiled: July 3, 2001Publication date: January 23, 2003Inventors: Mary O'Neill, Stephen Malcolm Kelly, Adam Edward Alexander Contoret, Gary James Richards
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Publication number: 20020128344Abstract: Mica is incorporated into a biodegradable resin material comprised mainly of polylactic acid, for example, into polylactic acid which is an aliphatic polyester resin. It is desired to incorporate into polylactic acid mica and a carbodiimide compound as an additive for suppressing hydrolysis of polylactic acid. Further, the biodegradable resin composition is subjected to aging by heating and desirably further using an electromagnetic wave or the like to suppress rapid lowering of the storage elastic modulus, and the biodegradable resin composition is used as a material for household electric appliances and housing materials.Type: ApplicationFiled: December 4, 2001Publication date: September 12, 2002Inventors: Yuko Fujihira, Tsutomu Noguchi, Hiroyuki Mori
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Patent number: 6447708Abstract: Sulphur product, (P), process for making (P), films, molded articles made therefrom, wherein (P) is obtained by the addition reaction of at least one polythiol (I) with at least one compound of formula (II): in which R1 represents a linear or branched aliphatic residue comprising an ethylenic unsaturation double bond, it being optional for the latter to be that by which R1 is connected to the norbornene ring, it also being optional for the said ring to comprise other substituents chosen from C1-C3 alkyl groups, in proportions corresponding or substantially corresponding to one thiol group of the polythiol or polythiols (I) per mole of the compound or compounds (II), the thiol groups of the compound or compounds (I) adding predominantly to the cyclic double bond of the compound or compounds (II) and, on average, one ethylenic unsaturation of a compound (II) of the two which it carries remaining free; or sulphur product, (P′), obtained by the addition reaction of at least one polythiol (Type: GrantFiled: September 29, 2000Date of Patent: September 10, 2002Assignee: Cray Valley S.A.Inventors: Philippe Thépot, Henri Strub
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Publication number: 20020091173Abstract: A curable re-release adhesive which, when subjected to a curing reaction caused by irradiation with radiation, shows a sufficient drop of adhesion and causes the adherend to be warped to a minimized extent as developed by the shrinkage force caused by the curing reaction. The re-release adhesive contains a radiation-reactive polymer including a main chain and a plurality of intramolecular side chains, each such side chain having a terminal carbon-carbon double bond, a chain length of 6 or more in terms of number of atoms, and the same or a different number of atoms as each other side chain in the polymer. The release adhesive shows a shrinkage force of 30 MPa or less as developed by a curing reaction upon irradiation. A re-release adhesive sheet is also disclosed, including a substrate film and an adhesive layer containing the re-release adhesive, provided on one surface thereof.Type: ApplicationFiled: December 13, 2001Publication date: July 11, 2002Applicant: NITTO DENKO CORPORATIONInventors: Kouichi Hashimoto, Takahiro Fukuoka, Koji Akazawa, Yoshio Nakagawa, Tatsuya Kubozono
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Patent number: 6417243Abstract: In order to offer coatings with improved resistance to solvents which can be prepared by cationic polymerization under irradiation, the choice is made of a composition comprising at least one monomer, oligomer or polymer of general formula (I): in which: A1 is chosen from polyester blocks, polyurethane blocks, hydrocarbon-comprising backbones of mono- or polycarboxylic acid and addition products of a polycarboxylic acid and of a cycloaliphatic diepoxide, m is a number from 1 to 6, R1 is a cycloaliphatic group carrying a hydroxyl group situated in the a position with respect to the oxygen atom to which R1 is bonded, R2 is a second cycloaliphatic group carrying an oxirane group situated at the chain end, and B is chosen from one or more covalent bonds, an oxygen atom and linear, branched or cyclic hydrocarbon-comprising radicals.Type: GrantFiled: July 28, 2000Date of Patent: July 9, 2002Assignee: UCB, S.A.Inventors: Stephan Peeters, Kris Verschueren, Jean-Marie Loutz
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Patent number: 6384103Abstract: Radiation-sensitive resin composition having excellent and well-balanced various properties required for photoresist, such as sensitivity, pattern profile and heat resistance. The radiation-sensitive resin composition comprises an alkali-soluble resin and a photosensitizer having a quinonediazide group. The alkali-soluble resin is a phenol novolak resin which is treated by a thin film distillation method to selectively remove monomer and dimer. The novolak resin treated by thin film distillation method preferably shows the following ratio in area in its profile in gel permeation chromatography with a detector at 280 nm: B2/B1≧0.95; C2/(A2+B2+C2)≦0.060 wherein A1 is a high-molecular region, B1 is a middle-molecular region, and C1 is a monomer/dimer region before the treatment of the starting novolak resin, and A2, B2 and C2 are the corresponding counterparts after the treatment of the novolak resin.Type: GrantFiled: December 1, 2000Date of Patent: May 7, 2002Assignee: Clariant Finance (BVI) LimitedInventors: Akio Arano, Kenji Yamamoto
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Patent number: 6365323Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an interger of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are allyl ether groups, epoxy groups, or mixtures thereof. Also disclosed are a process for preparing a thermal ink jet printhead containing the aforementioned polymers and processes for preparing the aforementioned polymers.Type: GrantFiled: March 16, 1999Date of Patent: April 2, 2002Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6348516Abstract: Process for using microwave irradiation to prepare solutions of polymers functionalized with acid groups The invention relates to a process for preparing aqueous, hydrous and anhydrous solutions of polymers functionalized with acid groups, which comprises using microwave radiation to supply the heat required to prepare the solution. The solutions are suitable as a starting material for producing gas diffusion electrodes, fuel cells and polymer-electrolyte-stabilized platinum nanoparticles.Type: GrantFiled: July 6, 2000Date of Patent: February 19, 2002Assignee: Celanese Ventures GmbHInventors: Thomas Soczka-Guth, Helmut Witteler, Gregor Deckers, Georg Frank, Kilian Brehl, Jürgen Lenze, Harald Bönsel, Rüdiger Knauf
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Patent number: 6342542Abstract: A radiation sensitive resin composition containing an alkali-soluble resin, for example a novolak-quinonediazide positive-working radiation sensitive resin composition and a chemically amplified negative-working resin composition, wherein the alkali-soluble resin contains at least an alkali-soluble resin obtained by polycondensation of a compound represented by the following general formula (I) and a phenol if necessary, with an aldehyde. wherein R represents a hydroxyl group or an alkyl group with 1 to 4 carbon atoms, n is 0 or an integer of 1 to 3 and, when n is 2 or 3, each R group may be the same or different.Type: GrantFiled: October 12, 2000Date of Patent: January 29, 2002Assignee: Clariant Finance (BVI) LimitedInventors: Satoshi Kobayashi, Hidekazu Shioda, Haruhiko Itoh
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Patent number: 6340718Abstract: A source of radiation (10,12), particularly a pulsed accelerated electron beam, directs a beam of radiation through an irradiation chamber (14, 50). The irradiation chamber is depleted of oxygen and oxygen containing gases, such as being drawn to a vacuum of 10−1 or greater Torr by a vacuum pump (20, 52). Particulate fluoropolymer material is entrained (36) in substantially oxygen free gas and conveyed through the irradiation chamber. The accelerated electrons break chemical bonds in the fluoropolymer particles and electrostatically charge the particles. Magnetic fields (42, 60) of different polarity rotate the charged particles such that they are irradiated from different sides. The irradiated fluoropolymer particles are cooled (24) and separated (26) from the entraining gas. The entraining gas is recirculated through pneumatic line (34) for a continuous cycle. In an alternate batch processing embodiment, the fluoropolymer material is placed in the shallow container (50) which is sealed and evacuated.Type: GrantFiled: July 24, 2000Date of Patent: January 22, 2002Assignee: Steris INCInventors: Sergey Alexandrovich Korenev, John Masefield, Jerry Kriebel
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Publication number: 20010047043Abstract: Describes polymerizing with actinic radiation a cationically polymerizable organic composition comprising (a) at least one polyfunctional thiirane having at least two groups represented by the following general formula I, 1Type: ApplicationFiled: February 28, 2001Publication date: November 29, 2001Inventors: Michael O. Okoroafor, Robert D. Herold, Marvin J. Graham, Robert A. Smith, James R. Franks
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Patent number: 6323301Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140° C.Type: GrantFiled: August 10, 2000Date of Patent: November 27, 2001Assignee: Xerox CorporationInventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
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Publication number: 20010041754Abstract: A method of treating reaction injection molded polyurethane, polyurethane/urea and polyurea polymers comprising exposing a reaction injection molded polyurethane, polyurethane/urea or polyurea polymer to an amount of infrared energy sufficient to increase the temperature of the polymer to at least 180° C., and then maintaining the temperature of the polymer at or above that temperature, for a time sufficient to increase the Gardner impact property, as measured using ASTMD-3029, when compared to the same polymer which has been heated to the same temperature and maintained thereat for the same time in a convection oven. The invention produces marked improvements in impact, heat sag and heat distortion temperature properties, and thus is particularly suited to rapid preparation of parts using a mass production conveyor and is particularly well-suited to preparation of parts which are to be subjected to later high temperature processes, such as the “E-coat” process.Type: ApplicationFiled: February 8, 2001Publication date: November 15, 2001Inventors: John W. McLaren, Kenneth J. Rettmann
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Publication number: 20010031798Abstract: In one aspect the invention provides an energy efficient polymerization method comprising irradiating a polymerizable composition and a photoinitiator with a source of essentially monochromatic radiation where the photoinitiator and the wavelength of the radiation source are selected such that the extinction coefficient of the photoinitiator at the peak wavelength of the source is greater than about 1000 M−1 cm−1 and such that the photoinitiator absorbs at least two percent of the actinic radiation incident on the coating.Type: ApplicationFiled: February 6, 2001Publication date: October 18, 2001Applicant: 3M Innovative Properties CompanyInventors: Robin E. Wright, George F. Vesley
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Publication number: 20010024749Abstract: Grafting a polymer at the surface of a carbonated material containing carboxyl, amine and/or hydroxyl functions at its surface. This material is suspended in a solution comprising the polymer to be grafted, which includes a carboxyl, amine and/or hydroxyl function, the solution also comprising a solvent of the polymer. This is followed by a treatment causing dehydration into a carboxyl function, an amide and/or hydroxyl function and the polymer is thus grafted on the carbonated material by means of ester or amide bonds. Utilization in the cathode or anode of an electrochemical generator, in a polymer material with low polarity, in an ink, and as a conductive deposit on flexible plastic used as electrical contact, electromagnetic protection and antistatic protection.Type: ApplicationFiled: April 6, 2001Publication date: September 27, 2001Applicant: HYDRO-QUEBECInventors: Christophe Michot, Michel Armand, Michel Gauthier, Yves Choquette
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Patent number: 6291543Abstract: A surfacially ultraviolet radiation-crosslinked article formed of a homogeneous composition including an elastoplastic material, a cross-linker component that is cross-linkable by free-radical polymerization, and a free-radical source material generating free radicals in exposure to ultraviolet radiation, wherein the elastoplastic material is surfacially cross-linked by exposure to ultraviolet radiation, wherein the sub-surface bulk volume of the article is non-cross-linked, and the article is resiliently deformable from and resiliently recoverable to a shape of the article when it was exposed to ultraviolet radiation for surfacial cross-linking thereof. The article is particularly amenable to embodiment as a catheter, or other similar medical device for cardiovascular or other medical procedures.Type: GrantFiled: May 24, 2000Date of Patent: September 18, 2001Assignee: Polyzen, Inc.Inventor: Tilak M. Shah
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Patent number: 6273543Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer.Type: GrantFiled: February 9, 1999Date of Patent: August 14, 2001Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6274695Abstract: The present invention relates to a treating agent for liquid crystal alignment, which is an agent for liquid crystal alignment to be used for a method in which polarized ultraviolet rays or electron rays are irradiated on a polymer thin film formed on a substrate in a predetermined direction relative to the substrate plane, and said substrate is used for aligning liquid crystal without rubbing treatment, wherein said agent for liquid crystal alignment contains a polymer compound having photochemically reactive groups in the polymer main chain and a glass transition temperature of at least 200° C.Type: GrantFiled: November 1, 1999Date of Patent: August 14, 2001Assignee: Nissan Chemical Industries, Ltd.Inventors: Hideyuki Endou, Takayasu Nihira, Hiroyoshi Fukuro
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Patent number: 6265464Abstract: A method of treating reaction injection molded polyurethane, polyurethane/urea and polyurea polymers comprising exposing a reaction injection molded polyurethane, polyurethane/urea or polyurea polymer to an amount of infrared energy sufficient to increase the temperature of the polymer to at least 180° C., and then maintaining the temperature of the polymer at or above that temperature, for a time sufficient to increase the Gardner impact property, as measured using ASTMD-3029, when compared to the same polymer which has been heated to the same temperature and maintained thereat for the same time in a convection oven. The invention produces marked improvements in impact, heat sag and heat distortion temperature properties, and thus is particularly suited to rapid preparation of parts using a mass production conveyor and is particularly well-suited to preparation of parts which are to be subjected to later high temperature processes, such as the “E-coat” process.Type: GrantFiled: September 14, 1999Date of Patent: July 24, 2001Assignee: The Dow Chemical CompanyInventors: John W. McLaren, Kenneth J. Rettmann
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Patent number: 6235353Abstract: Production of a dielectric coating on a substrate whereby a poly(arylene ethers) or fluorinated poly(arylene ethers) layer is cured by exposure to electron beam radiation. A wide area electron beam is used which causes chemical reactions to occur in the polymer structure which are thought to cause crosslinks between polymer chains. The crosslinks lead to higher mechanical strength and higher glass transition temperature, lower thermal expansion coefficient, greater thermal-chemical stability and greater resistance to aggressive organic solvents. The polymer layer may also be optionally heated, thermally annealed, and/or exposed to UV actinic light.Type: GrantFiled: February 5, 1999Date of Patent: May 22, 2001Assignee: AlliedSignal Inc.Inventors: James S. Drage, Jingjun Yang, Dong Kyu Choi
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Patent number: 6214488Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) in which Ar is a phenylene ring having p- and/or m-bonds, Ar′ is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit, X, N and M, independently of one another are 0 or 1, Y is 0, 1, 2 or 3, P is 1, 2, 3 or 4, is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.Type: GrantFiled: October 6, 1997Date of Patent: April 10, 2001Assignee: Hoechst AktiengesellschaftInventors: Freddy Helmer-Metzmann, Frank Osan, Arnold Schneller, Helmut Ritter, Konstantin Ledjeff, Roland Nolte, Ralf Thorwirth
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Patent number: 6203143Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.Type: GrantFiled: September 23, 1998Date of Patent: March 20, 2001Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6193909Abstract: Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.Type: GrantFiled: February 2, 1996Date of Patent: February 27, 2001Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Jeffrey D. Gelorme, Yun Hsin Liao, Jane M. Shaw
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Patent number: 6190603Abstract: A novel process for producing mouldings, especially contact lenses, is described, comprising the following steps: a) introducing into a mould a prepolymer containing photo crosslinkable groups that is liquid at room temperature or is readily meltable and is substantially free of solvents; b) initiating the photo cross-linking for a period of <20 minutes; c) opening the mould, so that the moulding can be removed for the mould. In accordance with the process according to the invention, it is possible especially to produce contact lenses having valuable properties.Type: GrantFiled: January 22, 1999Date of Patent: February 20, 2001Assignee: Novartis AGInventors: Bettina Steinmann, Friedrich Stockinger
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Patent number: 6187836Abstract: Photopolymerizable compositions that include free radically active and cationically active functional groups, and methods for polymerizing such compositions, in which the onset of cationic polymerization is controllably delayed to extend the time between formation of a moldable gel and formation of a hardened solid.Type: GrantFiled: June 5, 1998Date of Patent: February 13, 2001Assignee: 3M Innovative Properties CompanyInventors: Joel D. Oxman, Matthew C. Trom, Dwight W. Jacobs
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Patent number: 6187512Abstract: Disclosed is a process which comprises reacting a polymer of the general formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, with a halomethyl alkyl ether, an acetyl halide, and methanol in the presence of a halogen-containing Lewis acid catalyst, thereby forming a halomethylated polymer.Type: GrantFiled: May 17, 1999Date of Patent: February 13, 2001Assignee: Xerox CorporationInventors: Daniel A. Foucher, Nancy C. Stoffel, Roger T. Janezic, Thomas W. Smith, David J. Luca, Bidan Zhang
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Patent number: 6184265Abstract: Wear resistance and oxidation resistance of polymer material or a polymer component for bioimplantation are improved by packaging a polymer object in a sealed gas impermeable package substantially free of oxygen, irradiating the package with penetrating radiation to an extent sufficient to effect a desired substantial level of cross-linking within the polymer, and warming the packaged object while maintaining an elevated hydrostatic pressure to cause gases released during irradiation to recombine, stabilizing the material against subsequent oxidative change. The pressure stabilization terminates active sites, substantially eliminating free radicals. When applied to finished parts, the process simultaneously hardens and sterilizes the parts without degrading mechanical properties or dimensions. When applied to bulk material or unfinished parts, the part may be subsequent machined or otherwise finished, and sterilized by any conventional means.Type: GrantFiled: July 29, 1999Date of Patent: February 6, 2001Assignee: Depuy Orthopaedics, Inc.Inventors: John V. Hamilton, Mary Beth Schmidt, Keith Greer
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Patent number: 6184263Abstract: A composition which comprises a mixture of (A) a first component comprising a polymer, at least some of the monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution and being of the formulae specified in the claims, and (B) a second component which comprises either (1) a polymer having a second degree of photosensitivity-imparting group substitution lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degree of photosensitivity-imparting group substitution, or (2) a reactive diluent having at least one photosensitivity-imparting group perType: GrantFiled: December 23, 1998Date of Patent: February 6, 2001Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6174645Abstract: The present invention provides crosslinked polymeric networks that are reversibly crosslinked upon exposure to light of a suitable wavelength. In one embodiment photocrosslinkable branched hydrophilic polymers containing photochromic groups are synthesized. Cinnamylidene groups and derivatives of cinnamylidene are preferably used as the photochromic agents or photocrosslinking agents.Type: GrantFiled: May 3, 1999Date of Patent: January 16, 2001Assignee: University of PittsburghInventors: Alan J. Russell, Eric J. Beckman, Fotios M. Andreopoulos, William R. Wagner
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Patent number: 6151042Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.Type: GrantFiled: December 23, 1998Date of Patent: November 21, 2000Assignee: Xerox CorporationInventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
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Patent number: 6143233Abstract: A polymer which can be crosslinked by high-energy radiation and contains from 0.1 to 50% by weight, based on the polymer, of 2,3-dihydrofuran groups or derivatives thereof, each calculated as 2,3-dihydrofuran.Type: GrantFiled: September 22, 1998Date of Patent: November 7, 2000Assignee: BASF AktiengesellschaftInventors: Wolfgang Reich, Reinhold Schwalm, Erich Beck, Lukas Haussling, Oskar Nuyken, Roman-Benedikt Raether
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Patent number: 6136499Abstract: The present invention relates to a radiation sensitive photoresist composition comprising a photoacid initiator and a polycyclic polymer comprising repeating units that contain pendant acid labile groups. Upon exposure to an imaging radiation source the photoacid initiator generates an acid which cleaves the pendant acid labile groups effecting a polarity change in the polymer. The polymer is rendered soluble in an aqueous base in the areas exposed to the imaging source.Type: GrantFiled: March 6, 1997Date of Patent: October 24, 2000Assignee: The B. F. Goodrich CompanyInventors: Brian L. Goodall, Saikumar Jayaraman, Robert A. Shick, Larry F. Rhodes
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Patent number: 6124372Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.Type: GrantFiled: August 29, 1996Date of Patent: September 26, 2000Assignee: Xerox CorporationInventors: Thomas W. Smith, Timothy J. Fuller, Ram S. Narang, David J. Luca
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Patent number: 6117967Abstract: Disclosed is a polymer of the formula ##STR1## wherein A is ##STR2## or a mixture of ##STR3## wherein R is a hydrogen atom, an alkyl group, an aryl group, or mixtures thereof, B is one of specified groups, such as ##STR4## or mixtures thereof, and n is an integer representing the number of repeating monomer units.Type: GrantFiled: June 4, 1999Date of Patent: September 12, 2000Assignee: Xerox CorporationInventors: Timothy J. Fuller, John F. Yanus, Damodar M. Pai, Markus R. Silvestri, Ram S. Narang, William W. Limburg, Dale S. Renfer
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Patent number: 6110983Abstract: Foamed and expanded beads of a crosslinked aliphatic polyester resin having a gel fraction of at least 5% by weight. The expanded beads may be obtained by crosslinking beads of a non-crosslinked aliphatic polyester resin with a crosslinking agent including an organic peroxide to obtain crosslinked resin beads having a gel fraction of at least 5% by weight, and then expanding the crosslinked resin beads. A biodegradable foamed article may be obtained by thermally foaming the crosslinked, expanded aliphatic polyester resin beads in a mold.Type: GrantFiled: November 18, 1999Date of Patent: August 29, 2000Assignee: JSP CorporationInventors: Hisao Tokoro, Satoru Shioya, Mitsuru Shinohara
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Patent number: 6090895Abstract: A method is provided for making crosslinked acidic polymers useful as ion conductive membranes, such as crosslinked sulfonated polyether ketones, sulfonated polysulfones, sulfonated polystyrenes, and other acidic polymers, by crosslinking with a species which generates an acidic functionality. The crosslinker preferably binds to acid functions by conversion of acid groups to imide functionality, which, due to the acidity of the N-H bonds therein, compensate for the acidity lost by the occupation of the acid groups and thus preserve membrane conductivity while contributing to membrane strength and resistance to swelling.Type: GrantFiled: May 22, 1998Date of Patent: July 18, 2000Assignee: 3M Innovative Properties Co.,Inventors: Shane S. Mao, Steven J. Hamrock, David A. Ylitalo
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Patent number: 6090453Abstract: Disclosed is a process which comprises the steps of (a) providing a polymer containing at least some monomer repeat units with halomethyl group substituents which enable crosslinking or chain extension of the polymer upon exposure to a radiation source which is electron beam radiation, x-ray radiation, or deep ultraviolet radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several groups, as specified in the claims, and B is one of several groups, as specified in the claims or mixtures thereof, and n is an integer representing the number of repeating monomer units, and (b) causing the polymer to become crosslinked or chain extended through the photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead by the aforementioned curing process.Type: GrantFiled: September 30, 1998Date of Patent: July 18, 2000Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller
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Patent number: 6087414Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3##Type: GrantFiled: December 23, 1998Date of Patent: July 11, 2000Assignee: Xerox CorporationInventors: Timothy J. Fuller, Ram S. Narang, Thomas W. Smith, David J. Luca, Raymond K. Crandall
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Patent number: 6063829Abstract: A treating method for liquid crystal alignment, which comprises applying polarized ultraviolet or electron rays to a polymer thin film formed on a substrate, in a predetermined direction relative to the substrate surface, and using the substrate to align liquid crystal without rubbing treatment, wherein the polymer thin film is a polyimide resin containing a repeating unit of the formula (I): ##STR1## (wherein R.sup.1 is a tetravalent organic group having an alicyclic structure, and R.sup.2 is a bivalent organic group), which is obtained by dehydration ring-closure of a polyimide precursor having a reduced viscosity of from 0.05 to 3.0 dl/g (in N-methyl-2-pyrrolidone at temperature of 300.degree. C. at a concentration of 0.Type: GrantFiled: September 4, 1998Date of Patent: May 16, 2000Assignee: Nissan Chemical Industries, Ltd.Inventors: Hideyuki Endou, Hiroyoshi Fukuro
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Patent number: 6030550Abstract: Cross-linked electrically conductive polymers, in particular electrically conductive, polyaniline are described. Dopants and substituents having pendant cross-linkable functionality are used which form a cross-linked conducting polymer network. The cross-linking functionality can be hydrogen-bonding as well as chemically polymerizable or cross-linkable. A conjugated path between chains can also be incorporated. The resulting cross-linked conducting polymers have enhanced thermal and environmental stability. The dopant cannot readily be washed out with solvents or diffuse out upon exposure to heat. In addition, the cross-linked polymers have enhanced electrical conductivity.Type: GrantFiled: February 2, 1996Date of Patent: February 29, 2000Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Jeffrey D. Gelorme, Yun Hsin Liao, Jane M. Shaw
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Patent number: 6022095Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.Type: GrantFiled: December 23, 1998Date of Patent: February 8, 2000Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller, Thomas W. Smith, David J. Luca, Ralph A. Mosher
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Patent number: 6007877Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer.Type: GrantFiled: August 29, 1996Date of Patent: December 28, 1999Assignee: Xerox CorporationInventors: Ram S. Narang, Timothy J. Fuller